JP5308398B2 - 光導波路形成用樹脂組成物およびそれを用いた光導波路 - Google Patents
光導波路形成用樹脂組成物およびそれを用いた光導波路 Download PDFInfo
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- JP5308398B2 JP5308398B2 JP2010109631A JP2010109631A JP5308398B2 JP 5308398 B2 JP5308398 B2 JP 5308398B2 JP 2010109631 A JP2010109631 A JP 2010109631A JP 2010109631 A JP2010109631 A JP 2010109631A JP 5308398 B2 JP5308398 B2 JP 5308398B2
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
- G02B1/045—Light guides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optical Integrated Circuits (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
(A)重量平均分子量(Mw)が500〜5000の芳香族系多官能エポキシポリマー。
(B)重量平均分子量(Mw)が10000〜50000の芳香族系多官能エポキシポリマー。
(C)1〜3官能の液状芳香族系エポキシモノマー。
(D)光酸発生剤。
157S70(Mw:900、芳香族系多官能エポキシポリマー)、ジャパンエポキレジン社製
YDCN−700−10(Mw:1400、芳香族系多官能エポキシポリマー)、東都化成社製
マープルーフG−0250SP(Mw:20000、芳香族系多官能エポキシポリマー)、日本油脂社製
マープルーフG−0130SP(Mw:10000、芳香族系多官能エポキシポリマー)、日本油脂社製
JER828(2官能の芳香族系エポキシモノマー)、ジャパンエポキレジン社製
Tris P−RK−OX、本州化学社製
乳酸エチル、和光純薬工業社製
CPI-200K、サンアプロ社製
上記高分子量多官能エポキシポリマーA1を10gと、低分子量多官能エポキシポリマーB1を85gと、液状エポキシモノマー5gとを、乳酸エチル55gに混合し、85℃加熱下にて、これらを完溶させた。その後、上記混合物を、室温まで冷却し、さらに光酸発生剤4gを加えて混合することにより、光導波路形成用樹脂組成物(ワニス)を得た。
)上にアプリケーターを用いて塗工(アプリケーターギャップ:120μm)し、150℃の乾燥炉で3分間の熱乾燥を行い、未硬化コアフィルム層を得た。ついで、上記未硬化コアフィルム層に、フォトマスクを介して、露光装置による紫外線(i線)露光(2000mJ/cm2 )を行い、その後、100℃×10分間の加熱を行い、部分的に硬化させた。その後、スプレー現像機を用い、γ−ブチルラクトンによる現像を行い、さらに、水洗、乾燥することにより、導波路パターン(パターニングされたコア層)を作製した。なお、上記コア層のパターニングは、その断面凸部の幅と、断面凹部(溝部)の幅とが、ともに15μmであり、アスペクト比(縦横比)は約3となるよう形成した。
後記の表1および表2に示すように、各成分材料の配合量等を変更する以外は、実施例1に準じて、光導波路形成用樹脂組成物(ワニス)を調製した。そして、このワニスを用いること以外は、実施例1と同様の方法で、導波路パターンを作製した。
紫外線照射前の未硬化コアフィルム層が形成された光硬化エポキシフィルムに対し、その未硬化コアフィルム層側を外に向けて曲げ(R=1cm)を行った。そして、この曲げにより未硬化コアフィルム層にクラックが発生しなかったものを○、クラックが発生したものを×と評価した。なお、実用に問題ない程度のクラックが発生したものは△と評価した。本発明においては、△以上の評価(○および△)が要求される。
導波路パターン(パターニングされたコア層)の断面形状を、顕微鏡写真にとり、その写真から、コア層の断面凸部の倒れや揺らぎが確認されなかったものを○、コア層の断面凸部の倒れは確認されないが揺らぎは確認されたものを△、コア層の断面凸部の倒れ及び揺らぎが確認されたものを×と評価した。なお、本発明においては、△以上の評価(○および△)が要求される。
〔タック性〕
光導波路形成用樹脂組成物(ワニス)を、塗工乾燥させて未硬化フィルムを作製した。そして、その表面のタック性を、次のようにして評価した。すなわち、上記未硬化フィルム上にSUS板を置き、さらに3kgの重石を載せ、一晩放置した後、上記SUS板を剥がす際に未硬化フィルムが貼り付いているか否かを確認し、タック性(表面粘着性)が認められたものを×、タック性が認められなかったものを○と評価した。
Claims (3)
- 下記の(A)〜(D)成分を含有する光導波路形成用樹脂組成物であって、(A),(B)および(C)成分の合計量100重量部に対して、(A)成分が80〜90重量部、(B)成分が5〜15重量部、(C)成分が1〜10重量部の範囲に設定されていることを特徴とする光導波路形成用樹脂組成物。
(A)重量平均分子量(Mw)が500〜5000の芳香族系多官能エポキシポリマー。
(B)重量平均分子量(Mw)が10000〜50000の芳香族系多官能エポキシポリマー。
(C)1〜3官能の液状芳香族系エポキシモノマー。
(D)光酸発生剤。 - 上記(C)成分が、1〜3官能の液状芳香族系エポキシモノマーとともに、オキセタンモノマーを併用したものである請求項1記載の光導波路形成用樹脂組成物。
- 光信号を伝搬するコア部と、クラッド部とを備えた光導波路であって、上記クラッド部およびコア部の少なくとも一方が、請求項1または2記載の樹脂組成物からなることを特徴とする光導波路。
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US13/098,699 US8437598B2 (en) | 2010-05-11 | 2011-05-02 | Resin composition for production of optical waveguide, and optical waveguide produced by using the resin composition |
KR1020110043558A KR101606221B1 (ko) | 2010-05-11 | 2011-05-09 | 광도파로 형성용 수지 조성물 및 그것을 이용한 광도파로 |
CN201110118570.7A CN102253598B (zh) | 2010-05-11 | 2011-05-09 | 光波导形成用树脂组合物及使用其的光波导 |
TW100116128A TWI504665B (zh) | 2010-05-11 | 2011-05-09 | 光波導形成用樹脂組合物及使用其的光波導 |
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US20130205455A1 (en) * | 2012-02-07 | 2013-08-08 | University Of Western Australia | System and method of performing atomic force measurements |
JP2014102348A (ja) * | 2012-11-19 | 2014-06-05 | Nitto Denko Corp | 光導波路形成用樹脂組成物およびそれを用いた光導波路ならびに光伝送用フレキシブルプリント基板、およびその光導波路の製法 |
JP6026347B2 (ja) | 2013-04-23 | 2016-11-16 | 日東電工株式会社 | 感光性エポキシ樹脂組成物および光導波路コア層形成用硬化性フィルム、ならびにそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板 |
JP6034742B2 (ja) * | 2013-04-26 | 2016-11-30 | 日東電工株式会社 | 光導波路用感光性エポキシ樹脂組成物、光導波路形成用硬化性フィルム、およびそれを用いた光導波路ならびに光・電気伝送用混載フレキシブルプリント配線板、およびその光導波路の製法 |
JP6332590B2 (ja) | 2013-11-08 | 2018-05-30 | 日東電工株式会社 | 光導波路用感光性樹脂組成物および光導波路コア層形成用光硬化性フィルム、ならびにそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板 |
JP6566417B2 (ja) | 2015-06-18 | 2019-08-28 | 日東電工株式会社 | 光導波路形成用感光性エポキシ樹脂組成物および光導波路形成用感光性フィルム、ならびにそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板 |
JP6694180B2 (ja) | 2016-01-29 | 2020-05-13 | 日東電工株式会社 | 光導波路形成用感光性エポキシ樹脂組成物および光導波路形成用感光性フィルム、ならびにそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板 |
JP6830808B2 (ja) | 2016-12-21 | 2021-02-17 | 日東電工株式会社 | 光導波路形成用感光性エポキシ樹脂組成物、光導波路形成用硬化性フィルムおよびそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板 |
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US8437598B2 (en) | 2013-05-07 |
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