JP5384643B2 - 酸化セリウム粒子の液体懸濁液および粉末、これらの製造方法ならびに研磨におけるこれらの使用 - Google Patents
酸化セリウム粒子の液体懸濁液および粉末、これらの製造方法ならびに研磨におけるこれらの使用 Download PDFInfo
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- JP5384643B2 JP5384643B2 JP2011523363A JP2011523363A JP5384643B2 JP 5384643 B2 JP5384643 B2 JP 5384643B2 JP 2011523363 A JP2011523363 A JP 2011523363A JP 2011523363 A JP2011523363 A JP 2011523363A JP 5384643 B2 JP5384643 B2 JP 5384643B2
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- cerium
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- 239000002245 particle Substances 0.000 title claims description 48
- 238000000034 method Methods 0.000 title claims description 32
- 229910000420 cerium oxide Inorganic materials 0.000 title claims description 11
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 title claims description 11
- 239000000843 powder Substances 0.000 title description 12
- 238000005498 polishing Methods 0.000 title description 11
- 239000006194 liquid suspension Substances 0.000 title description 2
- 238000004519 manufacturing process Methods 0.000 title description 2
- 239000000725 suspension Substances 0.000 claims description 66
- 229910052684 Cerium Inorganic materials 0.000 claims description 21
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims description 20
- 239000011164 primary particle Substances 0.000 claims description 15
- -1 nitrate ions Chemical class 0.000 claims description 14
- 239000011163 secondary particle Substances 0.000 claims description 14
- 239000007791 liquid phase Substances 0.000 claims description 13
- 239000012298 atmosphere Substances 0.000 claims description 10
- 150000003839 salts Chemical class 0.000 claims description 9
- 229910002651 NO3 Inorganic materials 0.000 claims description 8
- 238000005406 washing Methods 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 6
- 230000020477 pH reduction Effects 0.000 claims description 6
- 238000001246 colloidal dispersion Methods 0.000 claims description 3
- 239000002244 precipitate Substances 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- 229910052757 nitrogen Inorganic materials 0.000 description 14
- 239000000203 mixture Substances 0.000 description 12
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 10
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- 238000003756 stirring Methods 0.000 description 8
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
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- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
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- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
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- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
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- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
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- 150000007513 acids Chemical class 0.000 description 2
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- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000001412 amines Chemical group 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 2
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
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- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 239000004584 polyacrylic acid Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- UOHMMEJUHBCKEE-UHFFFAOYSA-N prehnitene Chemical compound CC1=CC=C(C)C(C)=C1C UOHMMEJUHBCKEE-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- OZXIZRZFGJZWBF-UHFFFAOYSA-N 1,3,5-trimethyl-2-(2,4,6-trimethylphenoxy)benzene Chemical compound CC1=CC(C)=CC(C)=C1OC1=C(C)C=C(C)C=C1C OZXIZRZFGJZWBF-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- HYFLWBNQFMXCPA-UHFFFAOYSA-N 1-ethyl-2-methylbenzene Chemical compound CCC1=CC=CC=C1C HYFLWBNQFMXCPA-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 150000000703 Cerium Chemical class 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
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- 125000003158 alcohol group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229940044927 ceric oxide Drugs 0.000 description 1
- VYLVYHXQOHJDJL-UHFFFAOYSA-K cerium trichloride Chemical compound Cl[Ce](Cl)Cl VYLVYHXQOHJDJL-UHFFFAOYSA-K 0.000 description 1
- KKFPIBHAPSRIPB-UHFFFAOYSA-N cerium(3+);oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Ce+3].[Ce+3] KKFPIBHAPSRIPB-UHFFFAOYSA-N 0.000 description 1
- GHLITDDQOMIBFS-UHFFFAOYSA-H cerium(3+);tricarbonate Chemical compound [Ce+3].[Ce+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O GHLITDDQOMIBFS-UHFFFAOYSA-H 0.000 description 1
- OZECDDHOAMNMQI-UHFFFAOYSA-H cerium(3+);trisulfate Chemical compound [Ce+3].[Ce+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O OZECDDHOAMNMQI-UHFFFAOYSA-H 0.000 description 1
- LQCIDLXXSFUYSA-UHFFFAOYSA-N cerium(4+);tetranitrate Chemical compound [Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O LQCIDLXXSFUYSA-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- UNJPQTDTZAKTFK-UHFFFAOYSA-K cerium(iii) hydroxide Chemical compound [OH-].[OH-].[OH-].[Ce+3] UNJPQTDTZAKTFK-UHFFFAOYSA-K 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
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- 125000004122 cyclic group Chemical group 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
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- 238000004090 dissolution Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
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- IPCSVZSSVZVIGE-UHFFFAOYSA-M hexadecanoate Chemical compound CCCCCCCCCCCCCCCC([O-])=O IPCSVZSSVZVIGE-UHFFFAOYSA-M 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical group CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
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- SHOJXDKTYKFBRD-UHFFFAOYSA-N mesityl oxide Natural products CC(C)=CC(C)=O SHOJXDKTYKFBRD-UHFFFAOYSA-N 0.000 description 1
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- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
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- 239000003973 paint Substances 0.000 description 1
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Description
比:
σ/m=(d90−d10)2d50
(式中、
d90は、粒子の90%が、d90未満の直径を有する粒子サイズまたは粒径であり;
d10は、粒子の10%が、d10未満の直径を有する粒子サイズまたは粒径であり;
d50は、粒子の平均サイズまたは直径である。)を意味するものとする。
(a)セリウムIVのコロイド分散液も含むセリウムIII塩の溶液を調製する段階;
(b)この溶液を、不活性雰囲気下で塩基と接触させ、この手順により沈殿物を得る段階;
(c)前段階において得られた媒体を不活性雰囲気下で熱処理に供する段階であり、段階(a)、(b)または(c)の少なくとも1つを硝酸イオンの存在下で実施する段階;
(d)こうして得られた媒体の酸性化および洗浄を、連続的であるが任意の順序で実施し、この手順により懸濁液を得る段階
を含む方法により調製することができる。
2.88Mの硝酸セリウム(III)溶液(d=1.715)6.4kg、68%のHNO3溶液1.0kg、脱イオン水4.8kgおよび1.39Mの硝酸セリウム(IV)(d=1.440)8.87gを添加することにより、希薄硝酸セリウム溶液を調製する。Ce4+/Ce全体のモル比1/1250を有するこの溶液を半密閉容器中に装入し、次いで、激しい撹拌および窒素バブリングにより2時間ガス抜きする。
Claims (5)
- 液相中の酸化セリウム粒子の懸濁液を調製する方法であって、
前記粒子(二次粒子)のレーザ回折技術により測定された平均サイズは、最大120nmであり、
前記二次粒子は、TEMにより測定された平均サイズが最大150nm、標準偏差が前記平均サイズの値の最大20%、及びTEMにより測定された平均サイズとBETにより測定された平均サイズとの比が少なくとも2である一次粒子から成り、
(a)セリウムIVのコロイド分散液も含むセリウムIII塩の溶液を調製する段階,
(b)この溶液を、不活性雰囲気下で塩基と接触させ、この手順により沈殿物を得る段階,
(c)前段階において得られた媒体を不活性雰囲気下で熱処理に供する段階であり、段階(a)、(b)または(c)の少なくとも1つを硝酸イオンの存在下で実施する段階,
(d)こうして得られた媒体の酸性化および洗浄を、連続的であるが任意の順序で実施し、この手順により懸濁液を得る段階
を含むことを特徴とする方法。 - 段階(a)のセリウムIII塩の溶液が、セリウムIVを、セリウムIV/全体のセリウムのモル比率1/5000から1/500で含有することを特徴とする、請求項1に記載の方法。
- 段階(a)のセリウムIII塩の溶液が、セリウムIVを、セリウムIV/全体のセリウムのモル比率1/4000から1/2000で含有することを特徴とする、請求項2に記載の方法。
- 段階(a)、(b)または(c)の少なくとも1つの実行時の硝酸イオンの含有率が、NO3 −/Ce3+のモル比で表現して、1/3から5であることを特徴とする、請求項1から3のいずれか一項に記載の方法。
- 熱処理を最大95℃の温度において実施することを特徴とする、請求項1から4の一項に記載の方法。
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FR0804676A FR2935145B1 (fr) | 2008-08-22 | 2008-08-22 | Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utlisation dans le polissage |
PCT/EP2009/058571 WO2010020466A1 (fr) | 2008-08-22 | 2009-07-07 | Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utilisation dans le polissage |
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US20150096238A1 (en) * | 2012-05-22 | 2015-04-09 | Hitachi Chemical Company, Ltd. | Abrasive particles, slurry, polishing solution, and manufacturing methods therefor |
US20160194539A1 (en) * | 2013-08-09 | 2016-07-07 | Konica Minolta, Inc. | Polishing Material, Polishing Material Slurry |
EP3083501B1 (en) * | 2013-12-16 | 2020-02-12 | Rhodia Operations | Liquid suspension of cerium oxide particles |
JP6691061B2 (ja) * | 2014-06-24 | 2020-04-28 | ローディア オペレーションズ | 金属ドープ酸化セリウム組成物 |
EP3203973A1 (en) * | 2014-10-07 | 2017-08-16 | Imerys Minerals Limited | Components for skin care compositions and their use, methods for improving skin care compositions |
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CN110740974B (zh) * | 2017-06-15 | 2022-06-21 | 罗地亚经营管理公司 | 基于铈的颗粒 |
KR102282872B1 (ko) * | 2019-11-11 | 2021-07-28 | 주식회사 켐톤 | 세륨 산화물 입자의 제조방법, 연마입자 및 이를 포함하는 연마용 슬러리 조성물 |
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CN102131884B (zh) | 2013-12-11 |
TW201010946A (en) | 2010-03-16 |
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US20150030650A1 (en) | 2015-01-29 |
EP2331650B1 (fr) | 2017-09-20 |
US8876926B2 (en) | 2014-11-04 |
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