JP5287834B2 - Titanium oxide-based vapor deposition material and method for producing the same - Google Patents

Description

  The present invention relates to a vapor deposition material mainly composed of titanium oxide.

Vacuum deposition is a technique for forming a deposited film on an object by evaporating a deposition material by an electron gun or resistance heating in a vacuum chamber. Titanium dioxide (TiO ₂ ) vapor-deposited films are formed by vacuum deposition from titanium oxide-based vapor deposition materials, but have been used for dichroic filters, dichroic mirrors and the like because of their extremely high refractive index and excellent heat resistance. Yes.

JP-A-9-241830

  If an attempt is made to form a titanium dioxide vapor deposition film using titanium dioxide as a vapor deposition material, oxygen gas is released when the vaporized vapor deposition material solidifies to form a film (during vapor deposition film formation), so the quality of the vapor deposition film is not good. Therefore, the vapor deposition material generally takes a form other than titanium dioxide. For example, it takes a form combining some of other titanium oxides and metal titanium.

  Among the titanium oxides, those represented by the composition formula TiOx (1.4 ≦ x ≦ 1.8) (hereinafter also referred to as titanium suboxide) generate less gas when forming a deposited film, and are for a titanium dioxide deposited film. It is most suitable as a vapor deposition material. However, the sintered body of titanium suboxide is very brittle and easily crushed during handling such as packaging, transportation, filling in a crucible during vapor deposition, and a large amount of fine powder is generated. This fine powder contributes to splashing (bumping) in the melting process, heating, and vaporizing process during vapor deposition. As a result of the occurrence of splash, a lump of vapor deposition material scatters on the vapor deposition target, causing contamination of the vapor deposition target. Further, the generation of fine powder causes a decrease in the utilization rate of the vapor deposition material, and the cost performance decreases.

  If the sintered body is handled very gently, the titanium suboxide sintered body will be shattered, but it is usually not practical in an industrial process.

  On the other hand, when the vapor deposition material is manufactured not as a sintered body but as a melt and used after being subjected to a treatment such as pulverization, there is no problem of the generation of fine powder. However, the melting process needs to be performed at a higher temperature than the sintering process, there is a risk of crucible damage due to the difference in thermal expansion between the melt and the crucible at the time of melting, The cost is very high compared to the case of the sintered body because of the maintenance cost.

In Patent Document 1, a titanium oxide having a composition of TiO _x (x = 1.4 to 1.8) is used as a base, and an oxide from the group consisting of zirconium oxide, hafnium oxide, yttrium oxide and ytterbium oxide is 0.1. A sintered vapor deposition material added at 10 wt% has been proposed and specifically disclosed for the case of adding zirconium oxide, but the effect was not sufficient.

  The purpose of the present invention is titanium oxide-based sintering that has the same performance as titanium suboxide represented by the composition formula TiOx (1.4 ≦ x ≦ 1.8), is inexpensive, and does not generate fine powder during handling. It is to provide a vapor deposition material.

  The inventor of the present application has made extensive studies and has completed the present invention. The inventors of the present application have found that a sintered body in which a specific oxide is contained in a titanium oxide having a specific composition is difficult to be crushed during handling, and hardly generates fine powder even when crushed.

  The vapor deposition material of the present invention is a sintered body containing a main component composed of a titanium oxide represented by a composition formula TiOx (1.4 ≦ x ≦ 1.8) and a compound having a garnet structure. To do.

  The sintered body preferably further contains at least one selected from aluminum oxide, zirconium oxide, hafnium oxide, and ytterbium oxide. Further, it is particularly preferable to contain yttrium oxide.

  Another vapor deposition material of the present invention includes a main component composed of a titanium oxide represented by a composition formula TiOx (1.4 ≦ x ≦ 1.8), yttrium oxide, aluminum oxide, zirconium oxide, hafnium oxide, and It is a sintered body containing at least one selected from ytterbium oxide.

  At least one selected from the aluminum oxide, zirconium oxide, hafnium oxide and ytterbium oxide is preferably aluminum oxide.

  The total of the compound having the garnet structure in the sintered body, at least one selected from the aluminum oxide, zirconium oxide, hafnium oxide and ytterbium oxide, and the yttrium oxide is 1 with respect to the vapor deposition material. It is preferable that it is 10 to 10 weight%.

  The compound having the garnet structure is preferably a rare earth aluminum garnet.

The vapor deposition material is preferably a sintered body that is fired at 1300 ° C. to 1750 ° C. under a pressure of 0.1 Pa to 1.0 × 10 ⁻⁴ Pa.

  The vapor deposition material of the present invention is a sintered body containing a compound having a garnet structure or yttrium oxide and at least one selected from aluminum oxide, zirconium oxide, hafnium oxide and ytterbium oxide in addition to the main component. Sometimes difficult to crush. Even if crushing occurs, no fine powder is generated. Therefore, it becomes much easier to handle as a titanium suboxide-based sintered vapor deposition material than before. In addition, it becomes a stable titanium suboxide-based vapor deposition material that does not generate splash. Therefore, when vapor deposition is performed using the vapor deposition material of the present invention, a high-quality vapor deposition film can be stably generated.

  When the sintered body includes a compound having a garnet structure as a component other than the main component, and further includes at least one selected from aluminum oxide, zirconium oxide, hafnium oxide, and ytterbium oxide, the crushing prevention effect is significantly improved. . In particular, aluminum oxide is compatible with a compound having a garnet structure, and the degree of sintering is easily controlled.

  When the sintered body includes yttrium oxide as a component other than the main component, it is essential to include at least one selected from aluminum oxide, zirconium oxide, hafnium oxide, and ytterbium oxide, and in this case also includes aluminum oxide. The effect of preventing crushing is greatly improved and the degree of sintering is easy to control.

  When the compound having the garnet structure is a rare earth aluminum garnet, it is easy to obtain a sintered body having an appropriate strength, and it is easy to suppress the quality variation of the obtained sintered body.

The vapor deposition material of the present invention is particularly difficult to break when it is a sintered body that is fired at 1300 ° C. to 1750 ° C. under a pressure of 0.1 Pa to 1.0 × 10 ⁻⁴ Pa. On the other hand, it is possible to pulverize intentionally with an appropriate stress, and it becomes possible to perform pulverization according to the target particle size. Furthermore, the composition of the obtained sintered body is very stably controlled.

FIG. 1 is a powder X-ray diffraction (XRD) spectrum of the vapor deposition material according to Example 1 of the present invention.

FIG. 2 shows an example of a powder XRD spectrum of a Ti ₃ O ₅ sintered body having a main component of 100% for comparison.

FIG. 3 shows an example of an XRD spectrum of a melt for comparison.

FIG. 4 is a scanning electron microscope (SEM) photograph of the vapor deposition material according to Example 1 of the present invention.

FIG. 5 is a scanning electron micrograph of a Ti ₃ O ₅ sintered body having a main component of 100% for comparison.

FIG. 6 is a scanning electron micrograph of a melt for comparison.

  Hereinafter, the vapor deposition material of this invention is demonstrated in detail using embodiment and an Example. However, the present invention is not limited to these embodiments and examples.

  The main component of titanium oxide is titanium suboxide represented by the composition formula TiOx (1.4 ≦ x ≦ 1.8). When titanium suboxide is used as a vapor deposition material and vapor deposition is performed under an appropriate oxygen partial pressure, gas generation during vapor deposition film formation is suppressed, and a high quality vapor deposition film can be obtained. When the vapor deposition material is titanium dioxide, problems such as formation of vacancies in the vapor deposition film occur due to gas generation, resulting in poor quality of the vapor deposition film.

When the value of x of titanium suboxide TiO _x is less than 1.4, the vapor deposition film tends to be colored, and when it exceeds 1.8, gas generation during vapor deposition film formation tends to increase. It is necessary that ≦ 1.8. It is preferable that 1.5 ≦ x ≦ 1.7 because energy required for vaporizing the vapor deposition material becomes low. It is more preferable that 1.6 ≦ x ≦ 1.7 because particularly necessary energy is reduced.

  Although the vapor deposition material of this invention needs to contain components other than a main component in a sintered compact, the aspect has the following two types.

<First aspect>
In the first aspect, the sintered body includes a compound having a garnet structure in addition to the main component. The presence of a compound having a garnet structure provides a crush preventing effect and a splash preventing effect.

As the compound having the garnet structure, orthosilicate (so-called meteorite) represented by A ₃ B ₂ (SiO ₄ ) ₃ (A is Ca, Fe, Mn, Mg, etc., B is Al, Cr, Ti, etc.) ), Rare earth iron garnet represented by yttrium iron garnet (YIG), and rare earth aluminum garnet represented by yttrium aluminum garnet (YAG). Among these, rare earth aluminum garnet is preferable because it is easy to obtain a sintered body having an appropriate strength.

  Among the rare earth aluminum garnets, those in which at least one element selected from the group consisting of yttrium, lanthanum, gadolinium and lutetium is a rare earth element are more preferable because the properties of the sintered body can be easily controlled. Among them, YAG or a rare earth element whose main component is yttrium is particularly preferable because of little manufacturing variation.

  In the first aspect, when the sintered body further contains at least one selected from aluminum oxide, zirconium oxide, hafnium oxide and ytterbium oxide as a component other than the main component, the anti-crushing effect is significantly improved. preferable. In particular, it is more preferable to include aluminum oxide because the degree of sintering can be easily controlled.

  In the first aspect, the sintered body may further contain yttrium oxide as a component other than the main component.

<Second aspect>
In the second aspect, the sintered body includes, in addition to the main component, yttrium oxide and at least one selected from aluminum oxide, zirconium oxide, hafnium oxide, and ytterbium oxide. The effect similar to the aspect 1 is acquired by both coexisting.

  As in the first embodiment, it is preferable that at least one selected from the aluminum oxide, zirconium oxide, hafnium oxide, and ytterbium oxide is aluminum oxide because the degree of sintering is easily controlled.

  Although not bound by a specific theory, this is presumed to be due to the following mechanism of action.

  In the first aspect, the compound having a garnet structure increases the bond strength between the particles and prevents the generation of fine powder from the sintered body. In general, such substances often promote particle growth, resulting in an increase in grain boundaries, and splash tends to occur on the contrary. However, since a compound having a garnet structure has no effect or weakness for promoting particle growth, the crystallinity of the sintered body is lowered and the grain boundary is reduced. Therefore, despite the increased strength, the sintered body has few grain boundaries, and both fine powder generation and splash generation are effectively suppressed.

  In the second aspect, at least one selected from aluminum oxide, zirconium oxide, hafnium oxide, and ytterbium oxide effectively increases the bond strength between the particles. However, this alone causes one of the causes of splash occurrence as described above. On the other hand, the coexistence of yttrium oxide suppresses the particle growth and effectively suppresses both fine powder generation and splash generation. One or both of these effects cannot be obtained sufficiently by either one.

  The main component in the vapor deposition material of the present invention is a component that substantially determines its chemical and physical characteristics. In the present application, the main component is approximately 80% by weight or more based on the entire vapor deposition material. If the amount of the main component is too small, the chemical and physical characteristics of the vapor deposition film deviate from the chemical and physical characteristics of the vapor deposition film obtained from the vapor deposition material consisting only of the main component.

  The total of the components other than the main component is not preferable if it is too large as discussed for the main component. If the amount is too small, the effect of suppressing fine powder generation and splash is insufficient, which is not preferable. When the total of the components other than the main component is 1 to 10% by weight with respect to the entire vapor deposition material, a vapor deposition film equivalent to the vapor deposition film obtained from the vapor deposition material consisting only of the main component can be obtained, and fine powder generation can be suppressed. This is preferable because the effect of suppressing splash is particularly remarkable. A more preferable range is 1% by weight to 5% by weight, and a further preferable range is 2% by weight to 4% by weight.

  The compound having a garnet structure in the first embodiment, or the total of the compound having a garnet structure and yttrium oxide, or yttrium oxide in the second embodiment is 0.5% by weight to 2.5% with respect to the entire deposition material. It is preferable in terms of the balance between the splash suppressing effect and the main component.

  In any of the embodiments, at least one selected from aluminum oxide, zirconium oxide, hafnium oxide, and ytterbium oxide is 0.5% by weight to 1.5% by weight with respect to the entire deposition material. It is preferable in terms of balance between strength and particle growth.

Regarding the ratio M ₁ / M ₂ of the total weight M ₁ of the compound having a garnet structure and yttrium oxide and at least one weight M ₂ selected from aluminum oxide, zirconium oxide, hafnium oxide and ytterbium oxide, 0.5 It is preferable that the ratio is 1.0 or less because the above-described effects are particularly remarkable.

  The vapor deposition material of the present application is obtained by mixing a raw material of a main component and a raw material of a component other than the main component with a mixer or the like and then firing at a high temperature to obtain a sintered body. The firing method may be such that the atmosphere in the furnace is adjusted so as not to react with titanium and fired in an electric furnace or the like, or the degree of vacuum in the furnace is increased (exhaust and depressurized) and fired in a vacuum furnace. Good. The latter is preferable because it is a realistic method. In the former case, a rare gas atmosphere such as argon is used.

  The firing temperature is appropriately determined depending on the furnace structure, atmosphere, and the like. If it is too low, the sintering is insufficient, and if it is too high, the sintered body tends to be too stiff or grain growth tends to occur. In the case of atmospheric firing, it may be 1200 ° C to 1500 ° C, and preferably 1300 ° C to 1400 ° C. In the case of vacuum firing, it may be 1300 to 1750 ° C, and preferably 1400 to 1600 ° C. Vacuum firing is more preferable because it can almost certainly prevent reaction of titanium with elements other than oxygen as compared to atmosphere firing.

In the case of vacuum firing, firing as a pressure range of 10 Pa or less makes sense as vacuum firing. If the degree of vacuum is high, the pressure is never high, but considering the cost and labor, a pressure range of 1.0 × 10 ⁻¹ Pa to 1.0 × 10 ⁻⁴ Pa is realistic and preferable.

  As the main component material, a commercially available main component having the target composition may be used, or metallic titanium and various titanium oxides may be appropriately selected according to the target composition and used in combination. For example, various combinations such as titanium metal and titanium dioxide, titanium monoxide and titanium dioxide, metal titanium and titanium monoxide and trititanium oxide, and dititanium trioxide and titanium dioxide are possible. In consideration of easy availability of raw materials, price, ease of handling, etc., it is preferable to mix titanium metal and titanium dioxide.

  In the first embodiment, a garnet structure compound can be used as a raw material for components other than the main component. Furthermore, at least one selected from aluminum oxide, zirconium oxide, hafnium oxide and ytterbium oxide can be used as required, and yttrium oxide can be used as necessary. To prevent unexpected reactions at the firing temperature, no other form of raw material is used.

  In the second embodiment, the raw materials for components other than the main component can be yttrium oxide and at least one selected from aluminum oxide, zirconium oxide, hafnium oxide, and ytterbium oxide. To prevent unexpected reactions at the firing temperature, no other form of raw material is used.

  The obtained sintered body may be adjusted in particle size by appropriately providing a pulverization step according to the purpose of use. Or you may cut | divide into the fragment | piece of a specific magnitude | size with a high hydraulic-pressure cutting machine etc. The sintered body vapor-deposited material of the present invention hardly causes unintentional crushing during normal handling, and hardly generates fine powder in the pulverization process.

The vapor deposition material of the present invention does not react between the main component and the components other than the main component, but exists independently. This can be confirmed by powder X-ray diffraction (XRD). That is, the shape of the XRD spectrum is approximately the same as that of the main component. However, the background noise increases, and the peak of the spectrum has a half-width that is slightly broadened. From this, it can be seen that although no change has occurred chemically, a change has occurred in the crystalline characteristics. In addition, since the relative amount is small, the peak of the spectrum related to the subcomponent cannot be clearly observed. 1 XRD spectrum of the present vapor deposition material is _{x = 1.67 (Ti 3 O 5} ), FIG. 2 is XRD spectra of the main component of 100% of the sintered body, FIG. 3 is crushed _Ti 3 _{O 5} melt XRD spectrum of the powder.

  86.7% by weight of titanium dioxide powder having an average particle size of 0.5 μm, 10.4% by weight of titanium metal powder with coarse particles removed by a metal mesh screen having a nominal opening of 45 μm, 1.0% by weight of aluminum oxide powder, and 1.9% by weight of YAG powder was mixed with a stirring mixer, and granulated into granules having a particle size of about 0.5 mm to 3.0 mm with a granulator. The obtained granulated product was fired at 1650 ° C. for 2 hours under a reduced pressure of 1 Pa or less to obtain a sintered body. The obtained sintered body was coarsely pulverized to obtain sintered granules having a particle size of about 0.5 mm to 3.0 mm.

  Sintered granules were obtained in the same manner as in Example 1 except that the aluminum oxide powder was 1.5% by weight and the YAG powder was 1.5% by weight.

    85.9% by weight of titanium dioxide powder having an average particle size of 0.5 μm, 10.3% by weight of titanium metal powder with coarse particles removed by a metal mesh screen having a nominal opening of 45 μm, 1.9% by weight of aluminum oxide powder, and 1.9% by weight of YAG powder was mixed with a stirring mixer, and granulated into granules having a particle size of about 0.5 mm to 3.0 mm with a granulator. Thereafter, sintered granules were obtained in the same manner as in Example 1.

  86.7% by weight of titanium dioxide powder having an average particle size of 0.5 μm, 10.4% by weight of titanium metal powder with coarse particles removed by a metal mesh screen having a nominal opening of 45 μm, 1.7% by weight of aluminum oxide powder, and 1.2 wt% of yttrium oxide powder was mixed with a stirring mixer, and granulated into granules having a particle size of about 0.5 mm to 3.0 mm with a granulator. Thereafter, sintered granules were obtained in the same manner as in Example 1.

  Stirring 86.7% by weight of titanium dioxide powder having an average particle size of 0.5 μm, 10.4% by weight of metal titanium powder from which coarse particles have been removed by a metal mesh screen having a nominal aperture of 45 μm, and 3.0% by weight of YAG powder The mixture was mixed with a mixer and granulated into granules having a particle size of about 0.5 to 3.0 mm with a granulator. Thereafter, sintered granules were obtained in the same manner as in Example 1.

[Comparative Example 1]
A mixture of 89.3 wt% titanium dioxide powder having an average particle size of 0.5 μm and 10.7 wt% of metal titanium powder from which coarse particles have been removed by a metal mesh sieve having a nominal aperture of 45 μm is mixed with a stirring mixer. It was granulated into granules having a particle size of about 0.5 mm to 3.0 mm with a granulator. The obtained granulated product was fired at 1650 ° C. for 2 hours under a reduced pressure of 1 Pa or less to obtain a sintered body. The obtained sintered body was coarsely pulverized to obtain sintered granules having a particle size of about 0.5 mm to 3.0 mm.

[Comparative Example 2]
The raw material was granulated in the same manner as in Comparative Example 1. The obtained granulated product was fired at 1800 ° C. for 2 hours under a reduced pressure of 1 Pa or less to obtain a melt. The obtained melt was coarsely pulverized to obtain granules having a particle size of about 0.5 mm to 3.0 mm.

[Comparative Example 3]
86.7% by weight of titanium dioxide powder having an average particle size of 0.5 μm, 10.4% by weight of metal titanium powder from which coarse particles have been removed by a metal mesh screen having a nominal opening of 45 μm, and 3.0% by weight of aluminum oxide powder The mixture was mixed with a stirring mixer and granulated into granules having a particle size of about 0.5 to 3.0 mm with a granulator. Thereafter, sintered granules were obtained in the same manner as in Example 1.

[Comparative Example 4]
Sintered granules were obtained in the same manner as in Comparative Example 3 except that 3.0% by weight of yttrium oxide powder was used in place of the aluminum oxide powder.

<Fine powder generation rate>
After the sintering, the obtained sintered body was 1) taken out from the firing furnace, 2) coarsely pulverized into granules, 3) packed in a storage nylon bag, taken out from the storage nylon bag and placed in a vapor deposition apparatus. . Then, the vapor deposition film was produced | generated with the electron beam vapor deposition apparatus. For Examples 1 to 5 and Comparative Examples 1 to 4, fine powder generated from the sintered bodies in the steps 1) to 3) was collected. The collected fine powder was sieved with a metal mesh screen having a nominal mesh size of 0.1 mm, and the weight ratio of the fine powder that passed through the sieve to the sintered body was defined as the fine powder generation rate. The larger the fine powder generation rate, the more the sintered body obtained is brittle and it can be said that it is difficult to handle (poor handling).

<Splash generation evaluation>
About Examples 1-5 and Comparative Examples 1-4, a vapor deposition material is installed in a copper hearth (crucible) of an electron beam evaporation apparatus, a glass substrate is installed on a sample stage, and the inside of the apparatus is up to 5.0 × 10 ⁻⁴ Pa. Exhaust and reduced pressure. After decompression, a 250 mA electron beam was generated from an electron gun at an acceleration voltage of 6 kV, and the sintered granules were heated and melted. From the start of heating the sintered granules to the melting of the entire sintered granules, the copper hearth was observed from the window of the electron beam evaporation apparatus, and the frequency of occurrence of splash was compared.

<Evaluation of vapor deposition film>
After confirming the dissolution of the entire sintered granule, the inside of the apparatus is adjusted to an oxygen atmosphere of 1.4 × 10 ⁻² Pa, and the current value of the electron beam is adjusted to a value at which the film formation rate is 0.3 nm / sec. And the vapor deposition film | membrane with an optical film thickness of 2lambda was produced | generated, keeping a glass substrate at 250 degreeC. About the obtained vapor deposition film, the peak of transmission / reflection was calculated | required with the spectrophotometer, the wavelength dispersion characteristic was calculated, and the refractive index in wavelength 560nm was calculated | required.

  In Examples 1 to 5 and Comparative Examples 1 to 4, the weight ratio of each raw material is shown in Table 1, and the evaluation results are shown in Table 2 (the sum of weight percent is not necessarily 100.0% due to rounding off). . Further, XRD spectra of Example 1, Comparative Example 1 and Comparative Example 2 are shown in FIGS. 1, 2 and 3, respectively, and SEM photographs are shown in FIGS. 4, 5 and 6, respectively.

  1, 2, and 3, it can be seen that the vapor deposition material of the present invention has a slightly lower crystallinity than a sintered body without additives and a melt. 4, 5, and 6, it can be seen that the vapor deposition material of the present invention is a sintered body but has as few grain boundaries as the vapor deposition material of the melt.

  From Table 2, the sintered body contains a garnet compound in addition to the main component, or at least one selected from yttrium oxide and aluminum oxide, zirconium oxide, hafnium oxide and ytterbium oxide in addition to the main component. It can be seen that there is a balance between fine powder generation rate suppression and splash suppression. Moreover, it can be seen from the refractive index of the generated vapor deposition film that the vapor deposition film produced from the vapor deposition material of the present invention is substantially equivalent to the vapor deposition film produced from the conventional titanium oxide-based vapor deposition material (with a refractive index of From the values, it can be said that the deposited film is titanium dioxide). From these facts, it can be said that the vapor deposition material of the present invention is a vapor deposition material suitable for forming a titanium dioxide vapor deposition film that has good handling, is advantageous in terms of cost, and hardly generates splash.

  By using the vapor deposition material of the present invention, a titanium dioxide vapor deposition film with high film quality can be stably formed. The vapor deposition material of the present invention has a high yield and is easy to handle, so that the cost can be reduced. As a result, a titanium dioxide vapor-deposited film with high film quality can be formed at a lower cost than before. Therefore, an optical device having a high refractive index and high heat resistance can be manufactured stably and inexpensively.

Claims (16)

A main component composed of a titanium oxide represented by a composition formula TiO _x (1.4 ≦ x ≦ 1.8);
A vapor deposition material comprising a sintered body containing yttrium aluminum garnet, wherein the content of the main component is 80% by weight or more and the content of the yttrium aluminum garnet is 1% by weight to 10% by weight. The vapor deposition material according to claim 1, wherein a part of the yttrium aluminum garnet of the sintered body is replaced only with aluminum oxide. The vapor deposition material according to claim 1, wherein a part of the yttrium aluminum garnet of the sintered body is replaced only with yttrium oxide. The vapor deposition material according to claim 1, wherein a part of the yttrium aluminum garnet of the sintered body is replaced only with aluminum oxide and yttrium oxide. In the sintered body, the weight M of the yttrium aluminum garnet ₁ And the weight M of the aluminum oxide ₂ Ratio M ₁ / M ₂ The vapor deposition material according to claim 2, wherein is not less than 0.5 and not more than 1.0. In the sintered body, the total weight _{M 1} of the yttrium aluminum garnet and the yttrium oxide, claim ratio _M 1 / _{M 2} of the weight _{M 2} of the aluminum oxide, is 0.5 to 1.0 4. The vapor deposition material according to 4 . Including a main component made of a titanium oxide represented by a composition formula TiO _x (1.4 ≦ x ≦ 1.8), yttrium oxide, and aluminum oxide, and the content of the main component is 80 wt% or more, And the vapor deposition material which is a sintered compact whose sum total of content of the said yttrium oxide and the said aluminum oxide is 1 to 10 weight%. The said vapor deposition material is a sintered compact baked by 1300 to 1750 degreeC under the pressure of 0.1 Pa-1.0 * 10 < ^-4 > Pa, The vapor deposition as described in any one of Claims 1 thru | or 7 material. A method for producing a vapor deposition material mainly comprising a titanium oxide represented by a composition formula TiO _x (1.4 ≦ x ≦ 1.8),
From the group consisting of titanium metal and titanium oxide, the raw material of the main component corresponding to 80% by weight or more of the vapor deposition material as the main component, and one of the vapor deposition materials, selected as appropriate according to the target composition of the main component A mixing step of mixing raw materials including yttrium aluminum garnet corresponding to 10% by weight,
A firing step of firing the resulting mixture;
A manufacturing method comprising: The manufacturing method according to claim 9 , wherein in the mixing step, a part of the yttrium aluminum garnet is replaced only with aluminum oxide. The manufacturing method according to claim 9 , wherein in the mixing step, a part of the yttrium aluminum garnet is replaced with only yttrium oxide. The manufacturing method according to claim 9 , wherein in the mixing step, a part of the yttrium aluminum garnet is replaced only with aluminum oxide and yttrium oxide. In the mixing step, the weight M of the yttrium aluminum garnet ₁ And the weight M of the aluminum oxide ₂ Ratio M ₁ / M ₂ The manufacturing method according to claim 10, which is 0.5 or more and 1.0 or less. In the mixing step, the total weight _{M 1} of yttrium aluminum garnet and the yttrium oxide, the ratio _M 1 / _{M 2} of the weight _{M 2} of the aluminum oxide, claim 12 is 0.5 to 1.0 The manufacturing method as described in. A method for producing a vapor deposition material mainly comprising a titanium oxide represented by a composition formula TiO _x (1.4 ≦ x ≦ 1.8),
From the group consisting of titanium metal and titanium oxide, it is appropriately selected according to the target composition of the main component, and the main component raw material corresponding to 80% by weight or more of the vapor deposition material as the main component, and the total thereof is the vapor deposition A mixing step of mixing a raw material containing yttrium oxide and aluminum oxide corresponding to 1 wt% to 10 wt% of the material;
A firing step of firing the resulting mixture;
A manufacturing method comprising: The manufacturing method according to any one of claims 9 to 15 , wherein the firing step is a step of firing at 1300 ° C to 1750 ° C under a pressure of 0.1 Pa to 1.0 × 10 ^-4 Pa.

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