JP5276338B2 - Coating device - Google Patents

Abstract

The subject of this invention provides a coating device which uses attraction force for rapidly absorbing substrates to reduce the absorption time and to improve the overall operation time of the coating device. The solution of this invention constitutes the following: a coating device, comprising: absorption holes used to generate the attraction force on the surface of the platform, and substrate holding means used to absorb and hold the substrate on the surface of the platform; and a coating unit which moves relative to the substrate while providing coating liquid simultaneously, wherein the absorption holes of the substrate holding means are communicated with a main pipe and a sub pipe for connecting to the attraction force generation device; the main pipes is equipped with a main valve for switching the main pipe route, and the sub pipes is equipped with a sub valve for switching the sub pipe route; in addition, a storage tank with a predetermined capacity is disposed at position closer to the attraction force generation device than the sub valve, and the storage part has a capacity larger than that of the sub pipe within a predetermined interval.

Description

  The present invention relates to a coating apparatus that coats a coating solution on a substrate.

  A flat panel display such as a liquid crystal display or a plasma display uses a glass substrate coated with a resist solution (referred to as a coated substrate). This coating substrate is formed by a coating apparatus that uniformly coats a resist solution.

  This coating apparatus has a stage on which a substrate is placed and a coating unit for discharging a resist solution. By moving the coating unit while discharging the resist solution from the coating unit, a uniform thickness is provided on the substrate. A resist liquid film is formed.

  In such a coating apparatus, as a means for holding the substrate on the stage, a suction hole is formed in the stage. By generating a suction force in the suction hole, the substrate is sucked and held on the stage. Is generally known (see, for example, Patent Document 1). Specifically, the suction hole and the suction force generator are connected via a pipe, and by operating this suction force generator, a suction force is generated in the suction hole through the pipe. That is, when the suction force generator is operated, the atmosphere in the pipe is exhausted, so that the pressure in the pipe becomes the set pressure set by the suction force generator (pressure less than the atmospheric pressure). A suction force corresponding to the pressure is generated. In this way, the substrate can be sucked and held on the stage.

JP 2006-281091 A

  In the coating apparatus, a long time is required to attract and hold the substrate, and there is a problem that the tact time of the entire coating apparatus is prolonged. That is, since the time required to generate the suction force in the suction hole depends on the exhaust speed of the suction force generator, it is necessary to exhaust at high speed in order to quickly adsorb the substrate to the stage. is there.

  However, the suction force generation device is generally installed in the factory where the coating device is installed, and other devices that require the suction force generation device are also connected. Changing the set pressure of the generator may affect other devices.

  The present invention has been made in view of the above-described problems, and reduces the adsorption time by rapidly generating a suction force that sucks the substrate without changing the set pressure of the suction force generation device, thereby applying the coating device. An object of the present invention is to provide a coating apparatus capable of improving the takt time as a whole.

In order to solve the above problems, the coating apparatus of the present invention causes a suction force to be generated in a stage on which a substrate is placed and a suction hole formed in the surface of the stage so that the substrate is adsorbed and held on the surface of the stage. In a coating apparatus comprising: a substrate holding unit; and a coating unit that discharges a coating liquid while moving relative to the substrate held on the surface of the stage, the suction hole of the substrate holding unit has a suction force. The suction force generating device to be generated is connected in communication via a pipe, and the pipe has a main pipe and a sub pipe connected to the suction hole and the suction force generating apparatus through a common pipe. The main pipe has a main valve that communicates or shields with the suction hole through the common pipe, and the sub pipe communicates with or shields the suction hole through the common pipe. Has a blanking said the sub-pipe, the storage tank comprising a reservoir having a predetermined volume is provided in the suction force generating device side of the sub-valve, the reservoir is the capacity of the sub-pipes in a certain section The capacity of the reservoir is larger than the sum of the capacities of pipes extending from the sub-valve to the suction hole .

  According to the coating apparatus, since the storage tank having the storage portion having a capacity larger than the capacity of the sub-pipe in the fixed section is provided, the suction force is generated in the suction hole of the stage, and the substrate is adsorbed rapidly. Can be made. Specifically, by operating the suction force generation device with the main valve and the sub valve closed, the storage portion of the storage tank is set to a set pressure (pressure lower than atmospheric pressure) set by the suction force generation device. Maintained. Then, by opening the main valve and the sub valve while the substrate is placed on the surface of the stage, the storage portion of the storage tank maintained at the set pressure is opened at a stroke, so that the suction hole from the sub valve The air in the pipe leading to is drawn into the reservoir at once. Thereby, a suction force can be rapidly generated in the suction hole. Therefore, since the suction force can be rapidly generated in the suction hole only by operating the sub-valve, the suction time for sucking the substrate can be shortened without changing the set pressure of the suction force generator. The tact time of the whole coating apparatus can be improved.

Moreover, according to this structure, since all the air | atmosphere which exists in the piping from a subvalve to a suction hole is drawn into the storage part by the storage part of a storage tank, the suction force in a suction hole can be generated reliably. .

  The sub pipe is provided with an auxiliary pipe. The auxiliary pipe bypasses the storage tank, and is connected to the storage tank and the suction force generation device side. It is good also as a structure connected and connected to valve side sub piping connected by the sub valve side.

  According to this configuration, when the storage portion of the storage tank maintained at the set pressure is opened at a stroke, the atmosphere in the valve side sub-pipe and the suction side sub-pipe arranged on both sides of the storage tank is immediately stored. Drawn into. Along with this, the air in the auxiliary pipe communicating with the suction side sub pipe is also drawn into the storage tank through the suction side sub pipe, so that the air in the valve side sub pipe is further drawn into the storage tank through the auxiliary pipe. . That is, by providing this auxiliary pipe, the flow rate of the air in the valve-side sub-pipe being drawn into the storage tank is larger than when no auxiliary pipe is provided, so the pipe from the valve-side sub-pipe to the suction hole The atmosphere inside is drawn into the reservoir at once. Thereby, the suction force in the suction hole can be generated more rapidly.

  In addition, a control device for controlling the opening / closing operation of the main valve and the sub valve is provided, and this control device operates the suction force generation device with the main valve and the sub valve closed, thereby controlling the storage portion of the storage tank. After the substrate is placed on the surface of the stage while being maintained at a pressure lower than the atmospheric pressure, the main valve and the sub valve can be opened to adsorb the substrate to the stage surface. .

  In addition, a control device for controlling the opening and closing operations of the main valve and the sub valve is provided. The control device maintains the main valve and the sub valve in a closed state, and when the substrate is placed on the surface of the stage, the main valve After the substrate is adsorbed on the stage surface by opening the sub valve and the sub valve, when the suction hole pressure reaches a predetermined pressure, the sub valve is closed and the substrate is held on the surface of the stage. It can be set as the structure which maintains the state.

  According to this configuration, when the main valve and the sub-valve are changed from the closed state to the open state so that the substrate is rapidly adsorbed on the surface of the stage, an excessively large suction force may be generated in the suction hole. If the substrate is continuously adsorbed with an excessive suction force, application unevenness may occur in the substrate portion corresponding to the suction hole when coating is performed. Therefore, when the pressure of the suction hole reaches a predetermined pressure, it is possible to suppress generation of a suction force larger than necessary in the suction hole by performing suction with only the main pipe with the sub valve closed. It is possible to suppress the occurrence of coating unevenness in the substrate portion corresponding to the suction hole.

  According to the coating apparatus of the present invention, the suction time is shortened by rapidly generating the suction force for sucking the substrate without changing the set pressure of the suction force generating apparatus, and the tact time of the entire coating apparatus is improved. Can be made.

  Embodiments according to the present invention will be described with reference to the drawings.

FIG. 1 is a perspective view schematically showing a coating apparatus according to an embodiment of the present invention, and FIG.
It is a figure which shows the leg part vicinity of a coating unit, and FIG. 3 is a figure which shows the piping system of a coating device.

  As shown in FIGS. 1 to 3, the coating apparatus forms a coating film of a liquid material (hereinafter referred to as a coating solution) such as a chemical solution or a resist solution on a substrate 10. 10, and a coating unit 30 configured to be movable in a specific direction with respect to the stage 21.

  In the following description, the direction in which the coating unit 30 moves is described as the X-axis direction, the direction orthogonal to this in the horizontal plane is defined as the Y-axis direction, and the direction orthogonal to both the X-axis and Y-axis directions is described as the Z-axis direction. To proceed.

  A stage 21 is disposed at the center of the base 2. The stage 21 is for placing the substrate 10 that has been carried in. The stage 21 is provided with a substrate holding means 40, and the substrate 10 is held by the substrate holding means 40. Specifically, a plurality of suction holes 21a formed on the surface of the stage 21 are formed, and by generating a suction force in the suction holes 21a, the substrate 10 can be adsorbed and held on the surface of the stage 21. It has become.

  That is, as shown in FIG. 3, a pipe 50 connected to an existing vacuum pump 81 (suction force generator) used in common with other devices is connected to the plurality of suction holes 21a. When the vacuum pump 81 is operated, the inside of the pipe 50 becomes low pressure (pressure lower than atmospheric pressure), so that a suction force is generated in the suction hole 21a and the substrate 10 can be held on the stage 21. Yes.

  The pipe 50 is provided with a main pipe 51 and a sub pipe 52. The main pipe 51 and the sub pipe 52 are connected to the suction hole 21a. That is, in the example shown in FIG. 3, the pipe 50 connected to the vacuum pump 81 is connected to the main pipe 51 and the sub pipe 52, and the main pipe 51 and the sub pipe 52 are connected to the suction hole 21 a via the pipe 50. Has been. Specifically, the main pipe 51 and the sub pipe 52 are branched from the pipe 50a to which the main pipe 51 and the sub pipe 52 are connected, the pipe 50b branched from the pipe 50a, and the pipe 50b. Are connected to the suction hole 21a via a pipe 50c connected thereto.

  The main pipe 51 is formed in a cylindrical shape and has substantially the same inner diameter over the longitudinal direction. The main pipe 51 is provided with a main valve 51a and a regulator 51b. By opening and closing the main valve 51a, the vacuum pump 81 and the suction hole 21a can be communicated or shielded. Further, the regulator 51b is set so that the main pipe 51 has a predetermined pressure. In this embodiment, the pressure set by the regulator 51b is suitable for holding the substrate 10 (from the atmospheric pressure). (Low pressure), that is, the pressure is set so as not to cause uneven coating in the portion of the substrate 10 corresponding to the suction hole 21a when coating.

  Accordingly, by operating the vacuum pump 81 with the sub valve 52a closed and the main valve 51a fully opened, the inside of the main pipe 51 is controlled to the holding pressure, and a suction force corresponding to the holding pressure is generated in the suction hole 21a. In addition, the substrate 10 placed on the surface of the stage 21 is held without being displaced.

  The sub piping 52 is formed in a cylindrical shape and has substantially the same inner diameter over the longitudinal direction. The sub-pipe 52 is provided with a sub-valve 52a and a storage tank 54. The sub valve 52a is the same as the main valve 51a, and the vacuum pump 81 and the suction hole 21a can be communicated or shielded through the sub pipe 52 by opening and closing the sub valve 52a.

  The storage tank 54 rapidly generates a suction force in the suction hole 21a, and is disposed closer to the vacuum pump 81 than the sub valve 52a. The storage tank 54 includes a storage portion 54a having a predetermined capacity. In the present embodiment, the storage portion 54a is formed to have a larger diameter than the inner diameter of the sub-pipe 52, and further has a cylindrical shape extending in a direction orthogonal to the radial direction. Thereby, the storage part 54a has a capacity | capacitance larger than the capacity | capacitance of the sub piping 52 in a fixed area.

  In the present invention, the constant section refers to a predetermined length (section) based on the direction in which the atmosphere flows (referred to as the flow direction) by operating the vacuum pump 81 (suction force generation device). That is, the large capacity in a certain section means that the capacity in the section in the flow direction (for example, a section of 500 mm) is large. In the present embodiment, the sub pipe 52 and the storage part 54a of the storage tank 54 have a cylindrical shape, and the storage part 54a has a larger diameter than the inner diameter of the sub pipe 52. The storage part 54a is large. And in this embodiment, the capacity | capacitance of the storage part 54a is larger than the sum total of the capacity | capacitance of the piping 50 from the sub valve | bulb 52a to the suction hole 21a. That is, the capacity of the reservoir 54a is larger than the sum of the capacities in the pipe 50 (pipe 50a, pipe 50b, pipe 50c) extending from the sub valve 52a to the suction hole 21a.

  Moreover, the storage part 54a is arrange | positioned so that the direction where the subpipe 52 extends and the direction where the storage part 54a extends may be common, and the subpipe 52 (valve side subpipe 52b) is provided at one end of the storage part 54a. Are connected, and the sub pipe 52 (suction side sub pipe 52c) is connected to the other longitudinal end of the reservoir 54a. Therefore, when the vacuum pump 81 is operated with the sub valve 52a closed, the storage portion 54a of the storage tank 54 is held at the set pressure of the vacuum pump 81 together with the valve side sub pipe 52b and the suction side sub pipe 52c. It has become.

  The set pressure is a pressure that generates a suction force necessary for attracting the substrate 10 to the stage 21 in the suction hole 21a. Then, the pressure is lower than the atmospheric pressure and is lower than the holding pressure.

  The sub-pipe 52 is provided with an auxiliary pipe 55 so as to bypass the storage tank 54. The auxiliary pipe 55 is for rapidly generating a suction force generated in the suction hole 21a. Specifically, the auxiliary pipe 55 has an inner diameter that is the same as the inner diameter of the sub pipe 52 and is connected to the valve side sub pipe 52b and the suction side sub pipe 52c. Thus, when the vacuum pump 81 is operated with the sub valve 52a closed, the inside of the sub pipe 52 on the side of the vacuum pump 81 from the sub valve 52a, the inside of the storage portion 54a of the storage tank 54, and the inside of the auxiliary pipe 55 are held at the set pressure. It has become so. Note that the capacity of the auxiliary pipe 55 is smaller than that of the storage portion 54 a of the storage tank 54.

  In addition, a pressure gauge 53 is provided in the pipe 50. The pressure gauge 53 measures the pressure in the pipe 50, and is provided in the pipe 50 near the suction hole 21a immediately below the stage 21 in this embodiment. As a result, the effect of pressure loss or the like can be suppressed as compared with the case where it is provided at a position away from the suction hole 21a, so that the pressure state of the suction hole 21a can be accurately measured.

  The stage 21 is provided with a substrate lifting mechanism that moves the substrate 10 up and down. Specifically, a plurality of pin holes are formed on the surface of the stage 21, and lift pins (not shown) that can be moved up and down in the Z-axis direction are embedded in the pin holes. That is, when the substrate 10 is carried in with the lift pins protruding from the surface of the stage 21, the tip of the lift pins can contact the substrate 10 to hold the substrate 10, and the lift pins are lowered to be accommodated in the pin holes. By doing so, the substrate 10 can be placed on the surface of the stage 21.

  Further, by lifting the lift pins while the substrate 10 is placed on the surface of the stage 21, the tip portions of the lift pins come into contact with the substrate 10, and the substrate 10 is held at a predetermined height position by the tip portions of the plurality of lift pins. It can be done. Thereby, a contact part with the board | substrate 10 can be hold | suppressed as much as possible, and it can replace | exchange smoothly, without damaging the board | substrate 10. FIG.

  The coating unit 30 is for applying a coating solution on the substrate 10. As shown in FIGS. 1 and 2, the coating unit 30 includes a leg portion 31 connected to the base 2 and a base portion 34 extending in the Y-axis direction. It is attached so as to be movable in the X-axis direction in a state of straddling. Specifically, rails 22 extending in the X-axis direction are installed at both ends of the base 2 in the Y-axis direction, and leg portions 31 are slidably attached to the rails 22. A linear motor 33 is attached to the leg portion 31, and by driving and controlling the linear motor 33, the coating unit 30 moves in the X-axis direction and can be stopped at an arbitrary position.

  As shown in FIG. 2, a base 34 for applying the coating liquid is attached to the leg portion 31 of the coating unit 30. Specifically, the leg portion 31 is provided with a rail 37 extending in the Z-axis direction and a slider 35 that slides along the rail 37, and the slider 35 and the base portion 34 are connected to each other. . A ball screw mechanism that is driven by a servo motor 36 (see FIG. 4) is attached to the slider 35. By controlling the servo motor 36, the slider 35 moves in the Z-axis direction and is arbitrarily controlled. It can be stopped at the position. That is, the base part 34 is supported so as to be able to contact and separate from the substrate 10 held on the stage 21.

  The base 34 forms a coating film on the substrate 10 by applying a coating solution. The base part 34 is a columnar member having a shape extending in one direction, and is provided so as to be substantially orthogonal to the traveling direction of the coating unit 30. A slit nozzle 34a extending in the longitudinal direction is formed in the base part 34, and the coating liquid supplied to the base part 34 is uniformly ejected from the slit nozzle 34a in the longitudinal direction. . Therefore, by running the coating unit 30 in the X-axis direction with the coating liquid being discharged from the slit nozzle 34a, a coating film having a constant thickness is formed on the substrate 10 over the longitudinal direction of the slit nozzle 34a. It has become so.

  Next, the configuration of the control system of the coating apparatus will be described with reference to the block diagram shown in FIG.

  FIG. 4 is a block diagram showing a control system of the control device 90 provided in the mounting apparatus. As shown in FIG. 4, the coating apparatus is provided with a control device 90 that controls driving of the various units described above. The control device 90 includes a control main body 91, a drive control unit 92, a pressure control unit 93, an input / output device control unit 94, and an external device control unit 95.

  The control main body 91 includes a well-known CPU for executing logical operations, a ROM for storing various programs for controlling the CPU in advance, a RAM for temporarily storing various data during operation of the apparatus, various programs and OSs. Further, an HDD for storing various data such as a production program is provided. And the control main-body part 91 has the main control part 91a, the determination part 91b, and the memory | storage part 91c.

  The main control unit 91a drives and controls the drive devices such as the servo motor 36 and the linear motor 33 of each unit via the drive control unit 92 in order to execute a series of coating operations according to a program stored in advance.

  The determination unit 91b determines whether or not a suction force appropriate for holding the sucked substrate 10 is generated in the suction hole 21a. Specifically, it is determined whether or not the pressure state near the suction hole 21a is appropriate. That is, it is determined whether or not the pressure detected by the pressure gauge 53 has reached the set pressure of the vacuum pump 81. In a storage unit 91c described later, preset pressure data is stored, and it is determined whether or not the detected pressure is this set pressure. If the set pressure has been reached, control is performed via a pressure control unit 93 described later so that the sub valve 52a is closed. Thereby, the piping 50 which connects the suction hole 21a and the vacuum pump 81 is switched to only the main piping 51, whereby the pressure generated in the suction hole 21a is adjusted to the holding pressure set by the regulator 51b. ing. When the pressure gauge 53 does not reach the set pressure, the main valve 51a and the sub valve 52a are maintained as they are.

  The storage unit 91c stores various data and temporarily stores calculation results and the like. Specifically, data such as set pressure and holding pressure are stored.

  The drive control unit 92 drives and controls the linear motor 33, the servo motor 36, and the like based on a control signal from the control main body unit 91. Specifically, by controlling the linear motor 33 and the servo motor 36, the movement of the coating unit 30 and the lifting / lowering operation of the base 34 are driven and controlled.

  The pressure control unit 93 detects the pressure in the pipe 50 and controls the pressure generated in the suction hole 21 a based on a control signal from the control main body unit 91. Specifically, the pressure in the pipe 50 near the suction hole 21a is detected by a signal from the pressure gauge 53. Further, when the pressure gauge 53 indicates the set pressure and a signal for switching to the holding pressure is sent from the control main body 91, the sub valve 52a is switched from the open state to the closed state. By controlling the drive, control is performed so that the inside of the pipe 50 (more precisely, the vicinity of the suction hole 21a) becomes a holding pressure.

The input / output device controller 94 controls each input / output device such as the keyboard 83 and the touch panel 82. Specifically, conditions for the application operation can be set from the keyboard 83 and the touch panel 82, and settings such as a set pressure and a holding pressure can be appropriately set. Further, when adjusting from the set pressure to the holding pressure, if the holding pressure in the pipe 50 is not to be adjusted, a warning is displayed on the touch panel to prompt the operator to warn.

  The external device control unit 95 performs drive control of the external device based on a control signal from the control main body unit 91. In this embodiment, the vacuum pump 81 is connected, and by driving the vacuum pump 81, a suction force can be generated in the suction hole 21a.

  Next, the operation of this coating apparatus will be described with reference to the flowchart shown in FIG.

  First, in step S1, the substrate 10 is carried in. Specifically, the apparatus is on standby with a plurality of lift pins protruding from the surface of the stage 21, and the substrate 10 is placed on the tip of the lift pins by a robot hand (not shown). At this time, it is confirmed that the main valve 51a and the sub valve 52a are closed. Accordingly, no suction force is generated in the insertion hole 21a of the stage 21.

  Next, the substrate 10 is placed on the stage 21 in step S2. Specifically, from the state where the substrate 10 is placed on the tip portion of the lift pin, the lift pin is lowered and the substrate 10 is placed on the surface of the stage 21. At this time, the substrate 10 is positioned at a predetermined position by positioning means (not shown).

  Next, the substrate 10 is attracted and held on the stage 21 by steps S3 to S5. First, in step S3, a substrate suction operation is performed, and the substrate 10 is sucked onto the stage 21. Specifically, the suction valve 21a and the vacuum pump 81 are connected to each other by being driven and controlled so that the main valve 51a and the sub valve 52a are opened, so that suction force is generated in the suction hole 21a. Then, the substrate 10 is rapidly adsorbed on the stage 21.

  That is, in steps S1 and S2, since the vacuum pump 81 exhausts with the main valve 51a and the sub valve 52a closed, the inside of the storage portion 54a of the storage tank 54 is maintained at a set pressure (pressure lower than atmospheric pressure). Has been. When the main valve 51a and the sub valve 52a are opened from this state, the storage portion 54a of the storage tank 54 maintained at the set pressure is opened at a stroke, and therefore, the piping from the main valve 51a and the sub valve 52a to the suction hole 21a. The atmosphere in 50 is drawn into the storage part 54a of the storage tank 54 at once. Thereby, the suction force according to the set pressure can be rapidly generated in the suction hole 21a.

  In the present embodiment, since the auxiliary pipe 55 is provided, the suction force can be generated more rapidly in the suction hole 21a. That is, in the state where the main valve 51a and the sub valve 52a are closed, as shown in FIG. 6A, the air present in the auxiliary pipe 55 is exhausted to the vacuum pump 81 side through the suction side sub pipe 52c. And if the main valve 51a and the sub valve 52a are opened from this state and the storage part 54a of the storage tank 54 is opened at a stretch, the air | atmosphere in the sub piping 52 connected to the both ends of the storage part 54a will be drawn in. That is, as shown in FIG. 6B, since the atmosphere in the suction side sub-pipe 52c is drawn into the storage part 54a, the air in the valve-side sub-pipe 52b is drawn into the storage tank 54 through the auxiliary pipe 55. The flow rate at which the atmosphere in the valve-side sub-pipe 52b is drawn into the storage portion 54a increases. Therefore, the suction force in the suction hole 21a can be generated more rapidly by increasing the flow rate at which the atmosphere in the pipe from the valve side sub-pipe 52b to the suction hole 21a is drawn into the storage portion 54a. As a result, a suction force is rapidly generated in the suction hole 21a, so that the substrate 10 is instantaneously sucked onto the stage 21.

  Next, when the substrate 10 is adsorbed on the surface of the stage 21, it is determined whether or not the pressure in the pipe 50 has reached the set pressure (step S4). Specifically, it is determined whether or not the pressure gauge 53 has reached a set pressure. If the set pressure has not been reached, the process proceeds in the NO direction and the substrate suction operation is continued.

  Further, when the pressure gauge 53 reaches the set pressure, the process proceeds in the direction of YES, and the substrate suction holding operation is performed (step S5). Specifically, the sub valve 52a can be switched from the open state to the closed state. That is, since the communication between the vacuum pump 81 and the suction hole 21a is only the main pipe 51, the suction force in the suction hole 21a is adjusted to the suction force according to the holding pressure set by the regulator 51b. Therefore, the substrate 10 is sucked and held on the stage 21 with a suction force corresponding to the holding pressure.

  Next, in step S6, a coating operation is performed. That is, a coating film is formed on the surface of the substrate 10 by discharging the coating liquid while the coating unit 30 is traveling in a specific direction.

  Next, in step S7, the substrate 10 is taken out. That is, after a coating film is formed on the surface of the substrate 10 by the coating operation in S6, the vacuum pump 81 is stopped to return the pressure in the suction hole 21a to atmospheric pressure. Then, by lifting the lift pin, the substrate 10 is held at the tip of the lift pin, the substrate 10 is transferred to a robot hand (not shown), and the substrate 10 is discharged from the surface of the stage 21.

  According to such a coating apparatus, since the main valve 51a and the sub valve 52a are changed from the closed state to the opened state, the storage portion 54a of the storage tank 54 maintained at the set pressure is released all at once. The atmosphere in the pipe 50 extending from 52a to the suction hole 21a is drawn into the reservoir 54a at a stretch. That is, the suction force can be rapidly generated in the suction hole 21 a and the substrate 10 can be sucked to the stage 21 instantaneously. Accordingly, since the suction force can be rapidly generated in the suction hole 21a only by operating the main valve 51a and the sub valve 52a, the suction time for sucking the substrate 10 is shortened without changing the set pressure of the vacuum pump 81. As a result, the tact time of the entire coating apparatus can be improved.

  In the above embodiment, the case where the storage portion 54a of the storage tank 54 has a cylindrical shape larger in diameter than the inner diameter of the sub pipe 52 has been described. However, the capacity is larger than the capacity of the sub pipe 52 in a predetermined section. What is necessary is just to have. That is, if the main pipe 51a and the sub valve 52a are opened from the closed state to the open state, the storage portion 54a of the storage tank 54 maintained at the set pressure can be obtained if the capacity is larger than the capacity of the sub pipe 52. The atmosphere in the pipe 50 that opens from the sub valve 52a to the suction hole 21a is drawn into the storage portion 54a. As a result, a suction force can be rapidly generated in the suction hole 21a, and the substrate 10 can be instantaneously adsorbed to the stage 21. As a specific example of the storage part 54a, if it is cylindrical shape like the said embodiment, a versatile general tank can be used and cost can be restrained low. Further, the cross section is not limited to a cylinder, and the cross section may be a quadrangle, a polygon, or the like and formed in a cylindrical shape. In this case, when the space for installing the storage tank 54 is limited, there is an advantage that the storage tank 54 can be easily designed and installed in accordance with the shape of the vacant space. Further, the entire storage tank 54 may have a spiral shape with a predetermined pitch, and may be formed larger than the capacity of the sub-pipe 52 in a predetermined section.

  Moreover, although the example which provides the auxiliary piping 55 was demonstrated in the said embodiment, the structure only of the storage tank 54 may be sufficient without providing this auxiliary piping 55. FIG. Even in this case, when the storage portion 54a of the storage tank 54 maintained at the set pressure is opened at once, a suction force is generated in the suction hole 21a to rapidly adsorb the substrate 10 to the surface of the stage 21. Can do.

  In the above embodiment, an example in which one auxiliary pipe 55 is provided has been described. However, a plurality of auxiliary pipes 55 may be provided. Even in this case, when the storage part 54a of the storage tank 54 is opened at once, the air that has existed in the plurality of auxiliary pipes 55 enters the storage part 54a through the suction side sub-pipe 52c, so that the valve The flow rate at which the atmosphere in the side sub-pipe 52b is drawn into the storage portion 54a increases, and the suction force in the suction hole 21a can be generated more rapidly. Even in this case, by forming the capacity of the plurality of auxiliary pipes 55 to be smaller than the capacity of the storage part 54a, it is possible to more quickly generate the suction force in the suction hole 21a more effectively. .

  In addition, although the case where the vacuum pump 81 already installed in the factory etc. was used was demonstrated in the said embodiment, you may provide separately separately for application | coating apparatuses. Even in this case, the suction force for attracting the substrate 10 can be rapidly generated without changing the set pressure of the vacuum pump 81.

It is a perspective view which shows the coating device which concerns on embodiment of this invention. It is the schematic which shows the leg part vicinity of an application unit. It is the schematic which shows the piping system of the said coating device. It is a block diagram which shows the control system of the said coating device. It is a flowchart which shows operation | movement of the said coating device. It is a reference figure which shows the flow of the air in piping in the storage tank vicinity.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Substrate 21 Stage 21a Suction hole 40 Substrate holding means 50 Piping 51 Main piping 51a Main valve 52 Sub piping 52a Sub valve 52b Valve side sub piping 52c Suction side sub piping 53 Pressure gauge 54 Storage tank 54a Storage portion 55 Auxiliary piping

Claims (4)

A stage on which a substrate is placed;
A substrate holding means for generating a suction force in a suction hole formed on the surface of the stage to adsorb and hold the substrate on the surface of the stage;
A coating unit that discharges the coating liquid while moving relative to the substrate held on the surface of the stage;
In a coating apparatus comprising:
The suction hole of the substrate holding means is connected in communication with a suction force generator for generating a suction force through a pipe,
The pipe has a main pipe and a sub pipe connected to the suction hole and the suction force generator through a common pipe,
The main pipe has a main valve that communicates with or shields the suction hole through the common pipe.
The sub pipe has a sub valve that communicates with or shields the suction hole through the common pipe.
The sub pipe is provided with a storage tank having a storage portion having a predetermined capacity on the suction force generating device side than the sub valve, and the storage portion has a capacity larger than the capacity of the sub pipe in a fixed section. And the capacity of the reservoir is larger than the sum of the capacities of pipes extending from the sub-valve to the suction hole . The sub-pipe is provided with an auxiliary pipe. The auxiliary pipe bypasses the storage tank and is connected to the storage tank and the suction power generation device side, and the storage tank and the sub-valve side. The coating apparatus according to claim 1, wherein the coating apparatus is connected in communication with a valve-side sub pipe connected by A control device for controlling the opening and closing operations of the main valve and the sub valve is provided. The control device operates the suction force generation device with the main valve and the sub valve closed, thereby causing the storage portion of the storage tank to be at atmospheric pressure. The substrate is attracted to the stage surface by opening the main valve and the sub-valve after the substrate is placed on the surface of the stage while maintaining the pressure at a lower pressure. 2. The coating apparatus according to 2 . The control device opens the main valve and the sub-valve to adsorb the substrate to the stage surface, and when the suction hole pressure reaches a predetermined pressure, closes the sub-valve to the predetermined valve. 4. The coating apparatus according to claim 3, wherein the substrate is maintained in a state where the substrate is held on the surface of the stage at a pressure greater than the pressure of and less than atmospheric pressure .

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