JP5273862B2 - Color conversion type organic EL display - Google Patents

Description

  The present invention relates to a color filter that enables high-definition, high-visibility, multicolor display excellent in environmental resistance and productivity, and a color conversion organic EL display including the color filter. Specifically, image sensors, personal computers, word processors, televisions, facsimiles, audio, video, car navigation, electronic desk calculators, telephones, portable terminals, industrial instruments, etc. The present invention relates to a color filter for display and an organic multicolor light emitting display device including the color filter, and more particularly to an organic EL display using a color conversion method.

A color display is provided with red, blue, and green pixels adjacent to each other on the display surface, and expresses various colors and brightness by changing the light emission intensity of each pixel. The color conversion type color display has the same emission color of the backlight, and the emission spectrum is changed to red, blue, and green by the color conversion layer and the color filter. Since the light emission color of the backlight is the same, if the light emission from the light emitting layer corresponding to the adjacent different pixels reaches the same color conversion layer, the color conversion is performed as it is, which causes abnormal light emission. In order to further increase the NTSC (National Television Standards Committee) ratio, which is a ratio to the so-called chromaticity diagram area defined by NTSC, it is necessary to reduce color mixing between pixels, that is, crosstalk.
When patterning the color conversion layer on the color conversion filter substrate by the ink jet method, a dilute solution of the color conversion layer material is used as the ink material, and therefore, when discharging, discharge to an adjacent pixel area different from the target pixel area In order to prevent the solution from flowing out, it is necessary that the height of the partition wall separating each pixel is about 10 times the required film thickness of the color conversion layer. As a result, unevenness is formed on the surface of the color conversion filter substrate. Therefore, the color conversion filter substrate on which the flattening layer for flattening the outermost surface and the organic light emitting device (organic EL device) serving as a backlight are formed. When the mounting substrate is bonded, there may be a gap between the surface of the color conversion layer and the surface of the organic EL element due to the difference between the height of the partition wall and the thickness of the planarization layer in some cases. is there. As a result, there is a concern that optical loss may occur due to light emission from the organic EL element not properly entering the color conversion layer.

  The organic EL element substrate according to the above description has a partition insulating film for electrically separating the lower electrode constituting the organic EL element into each pixel, and covers the organic EL element and the partition insulating film in common. There is a description including a silicon nitride film as a barrier layer (Patent Document 1).

Japanese Patent Laying-Open No. 2005-332589 (FIG. 1, paragraphs 0150-0151)

In general color filters, etc., the direction of transmitted light does not change significantly, so even if there is incident light from adjacent pixels, it has a large oblique angle, which affects the color development in the observing viewpoint (front) direction. It is rare to give. However, since incident light from an oblique direction is also converted into fluorescence in the color conversion layer, so-called crosstalk may occur in which incident light from adjacent pixels is color-converted and converted into light emission to the front. is there. Such crosstalk causes a decrease in RGB color purity, so it must be reduced as much as possible.
The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a color conversion type organic EL display capable of reducing crosstalk.

In order to achieve the object of the present invention, in the present invention, an organic EL in which a plurality of organic EL elements arranged in a row on a support substrate and a barrier layer covering the surface of the support substrate including the organic EL elements are mounted. A color formed by laminating an element substrate, a black matrix in a lattice shape on a transparent substrate, and a color conversion filter substrate in which a color conversion filter layer and a color filter are mounted in the inner partition, with the mounting side facing inward. In the conversion type organic EL display, at least two rows of crosstalk reducing structures are arranged in a line shape between the rows of the organic EL elements below the barrier layer, and the two rows of crosstalk reducing structures are arranged. Each has a discontinuous portion, and the two rows of discontinuous portions are arranged so as to be displaced from each other.
In the present invention, it is preferable that the organic EL element includes at least a reflective electrode, an organic EL layer, and a transparent electrode in this order on a support substrate.

In the present invention, a color conversion organic EL display in which the refractive index of the crosstalk reducing structure is 0.1 or more, preferably 0.2 or more lower than the refractive index of the barrier layer is also preferable.
The present invention may be a color conversion organic EL display in which the height of the convex portion of the barrier layer coated on the crosstalk reducing structure is equal to or greater than the thickness of the barrier layer.
Further, according to the present invention, the convex portion of the barrier layer coated on the crosstalk reducing structure has an angle formed by the side surface of the convex portion and a plane parallel to the substrate of 15 degrees or more, preferably 30 degrees or more. It is preferable to use a color conversion type organic EL display having a side inclined shape.

  According to the present invention, it is possible to provide a color conversion organic EL display that can suppress light propagation in the barrier layer and reduce crosstalk.

It is principal part sectional drawing which shows the Example of the color conversion type organic electroluminescent display which has the crosstalk reduction structure pattern concerning this invention. It is a principal part top view which shows the Example of the color conversion type organic electroluminescent display which has the crosstalk reduction structure pattern concerning this invention. 6 is a cross-sectional view of a main part of a color conversion type organic EL display according to Comparative Example 1. FIG. It is a principal part top view (the 1) which shows the Example of the color conversion type organic electroluminescent display which has a different crosstalk reduction structure pattern concerning this invention. FIG. 6 is a plan view (No. 2) of a principal part showing an embodiment of a color conversion type organic EL display having different crosstalk reducing structure patterns according to the present invention. It is a principal part top view (the 3) which shows the Example of the color conversion type organic EL display which has a different crosstalk reduction structure pattern concerning this invention. It is principal part sectional drawing of the color conversion type organic EL display concerning the comparative example 2. FIG. It is a principal part top view of the color conversion type organic EL display concerning the comparative example 2.

Examples of the color conversion organic EL display of the present invention will be described in detail below with reference to the drawings. The present invention is not limited to the description of the examples described below unless it exceeds the gist.
In order to reduce the crosstalk between the pixels, the inventors studied diligently where the crosstalk propagates between the pixels. As a result, it has been found that the conventional color conversion organic EL display directly propagates to adjacent pixels via a filler that fills a gap formed when the organic EL element substrate and the color conversion filter substrate are bonded together. This is clarified from the fact that crosstalk remains even after light emission from the organic EL element is blocked by the use of a coloring filler or the like for one pixel column. Furthermore, when the details of the crosstalk were investigated by using an optical simulation or the like, it propagated in the direction parallel to the substrate like a waveguide by total reflection in the barrier layer for protecting the organic EL element from oxygen and moisture. It was also found that crosstalk occurs. Therefore, it was considered that crosstalk can be reduced by blocking light propagation in a direction parallel to the substrate in the barrier layer.

  Since the barrier layer has a higher refractive index than that of the surrounding resin or the like, the barrier layer is easily totally reflected in the barrier layer, and light propagates to a long distance. Therefore, before the barrier layer is formed, a crosstalk reducing structure having a thickness equal to or larger than the thickness of the barrier layer is disposed at a position between the pixel columns, and the barrier layer is covered thereon. Since the barrier layer is bent along the convex portion of the crosstalk reducing structure, the angle of light with respect to the barrier layer surface can exceed the total reflection angle at the bent portion in the vicinity of the structure, and the total reflection is performed at that position. Can be suppressed. Therefore, the light that has propagated through the barrier layer by total reflection escapes from the barrier layer in the vicinity of the crosstalk reducing structure, so that light propagation beyond the barrier layer can be prevented. The crosstalk reducing structure simply reduces the total amount of light in the barrier layer without interfering with the barrier performance of protecting the organic EL layer, which is the original purpose of the barrier layer covering it, from oxygen and moisture. Any device that can suppress optical propagation due to reflection may be used. The material properties of the crosstalk reducing structure may be, for example, a material whose refractive index is 0.1 or more lower than the barrier layer, preferably 0.2 or more lower. In addition, as a secondary effect, when the optical propagation in the barrier layer is suppressed, it is preferable that excess light that escapes from the barrier layer is absorbed by the crosstalk reducing structure. The transmittance in is desirably 10% or less per 1 μm. The crosstalk reducing structure is intended to prevent total reflection of light at the gap position between the pixel columns by locally changing the shape and optical properties of the barrier layer. It is necessary that the barrier layer be provided with an angle that does not totally reflect light. Specifically, the angle formed between the side surface of the barrier layer and the surface parallel to the substrate is 15 degrees or more, preferably 30 degrees or more, but it is preferable that the barrier performance of the barrier layer is not deteriorated by the outer shape. In order to sufficiently suppress light propagation and not propagate light directly, the crosstalk reducing structure needs to have a sufficient height, and as a result, the film thickness of the structure or the convexity of the barrier layer on the structure. It is necessary that the height of the part exceeds at least the thickness of the barrier layer. In addition, it is desirable that the crosstalk reducing structure be positioned behind the black matrix so that the light escaped from the barrier layer above the crosstalk reducing structure does not adversely affect the display.

However, as described above, since the height of the crosstalk reducing structure needs to exceed at least the thickness of the barrier layer, it is formed between the pixels and connects the reflective electrode of the organic EL element and the drive circuit. When the electrode wiring is formed by sputtering, the crosstalk reducing structure becomes a problem for forming a highly reliable electrode wiring. This is because, in sputter formation, the wraparound property is small, so that the film thickness on the side surface of the high structure is likely to be thinner than the flat part, and is easily cut and broken. Therefore, in the present invention, the crosstalk reducing structure formed between the pixels is formed in at least two rows of discontinuous lines so that the electrode wiring straddling the top of the crosstalk reducing structure has a thin film thickness and low reliability. Even if there is a characteristic portion, it is formed at the bottom between the pixels and can be reliably connected to the drive circuit by a highly reliable electrode wiring portion having a uniform required film thickness.
In addition, since the at least two rows of discontinuous linear crosstalk reducing structures are arranged so that the discontinuous portions are at least two rows and deviate from each other, the inside of the barrier layer is parallel to the substrate. The crosstalk light propagating linearly can be sufficiently attenuated or suppressed at the bent portion of the barrier layer at least in one row of the crosstalk reducing structure.

The crosstalk reducing structure 3a shown in FIG. 2 is intended to reduce the crosstalk light propagating through the barrier layer 4 formed on the crosstalk reducing structure 3a. Therefore, at least adjacent pixel columns (1a, 1b, 1c) of different colors are used. ) Between them. That is, since it is not always necessary to be disposed between the organic EL elements 1 in the same row, there is no need to surround the organic EL elements. As an example of the shape and arrangement on the plane, it is preferable to arrange them at the boundary between pixel columns of different colors by means of two linear crosstalk reduction structures 3a as shown in FIG.
Further, even if the electrode wiring made of an Ag alloy or the like disposed along the upper surface of the crosstalk reducing structure 3a is reduced in reliability due to sputter formation, the present invention is applied. As shown in FIG. 2, the crosstalk reducing structure has two rows of discontinuous lines, and the two rows of discontinuous portions are arranged so as to be displaced from each other. The fear of disconnection can be eased.

As in the crosstalk reducing structure 3b shown in FIG. 4, the structure 3b can be connected to the electrode wiring by arranging a large number of hemispherical protrusions in two rows as in the crosstalk reducing structure 3b shown in FIG. The function of suppressing light propagation can be sufficiently fulfilled without completely blocking the light. Further, for the purpose of reducing crosstalk between organic EL elements in the same pixel column, crosstalk reducing structures 3c and 3d are provided between organic EL elements in the same pixel column as shown in FIGS. It may be additionally provided.
(Organic materials used in the production of color conversion filter substrates)
(Organic fluorescent dye)
The fluorescent dye used in the color conversion filter substrate constituting the color conversion organic EL display of the present invention, which absorbs light on the short wavelength side and converts the color to light on the long wavelength side to emit light, emits from the light emitting layer. What is necessary is just to emit different visible light by absorbing light in the near ultraviolet region or visible region, in particular, light in the blue or blue-green region. Applicable materials include aluminum chelate dyes such as Alq ₃ (Tris 8-quinolinolato aluminum complex), 3- (2-benzothiazolyl) -7-diethylaminocoumarin (coumarin 6), 3- (2-benzimidazolyl)- Coumarin dyes such as 7-diethylaminocoumarin (coumarin 7) and coumarin 135 are preferred. In addition, low molecular organic fluorescent dyes such as naphthalimide dyes such as Solvent Yellow 43 and Solvent Yellow 44, and polymer fluorescent materials represented by polyphenylene, polyarylene, and polyfluorene can be used.

If necessary, a plurality of these pigments can be mixed and used. When using inkjet as a patterning method, the dye is dissolved in a solvent. It is only necessary to dissolve the fluorescent material as a usable solvent, and since it varies depending on the fluorescent material used, it cannot be described generally. it can. In addition, a plurality of solvents can be mixed and used for the purpose of adjusting viscosity, vapor pressure and solubility.
(Matrix resin for color conversion layer)
Further, when photolithography is used as a patterning method for the formed color conversion layers 5 and 7 shown in FIG. 1, a dye may be dispersed in a matrix resin. The matrix resin is a photocurable or photothermal combination type curable resin that is subjected to light and / or heat treatment to generate radical species and ionic species to be polymerized or crosslinked to be insoluble and infusible. Further, it is desirable that the photocurable or photothermal combination type curable resin is soluble in an organic solvent or an alkali solution before curing to pattern the fluorescent color conversion layers 5 and 7.

(Black matrix)
The black matrix 9 shown in FIG. 1 preferably has a property of absorbing visible light well and not adversely affecting the organic EL element 1, the color conversion layers 5 and 7, and the color filters 6 and 8. For this purpose, it is appropriate to pattern and form a light shielding layer in which a black inorganic film, a black pigment or a black dye is dispersed in a resin. For example, as the black inorganic film, for example, a chromium film (chromium oxide / chromium laminate) is exemplified. Examples of the light shielding layer in which a black pigment or black dye is dispersed in a resin include, for example, a pigment or dye such as carbon black, phthalocyanine, or quinacridone dispersed in a resin such as polyimide, a color resist, or the like. As a method for forming these light shielding layers, a dry process such as sputtering, CVD, or vacuum deposition, or a wet process such as spin coating can be employed. Then, if a process such as photolithography is added, patterning can be performed. The light reflectance is preferable because the pigment-dispersed resin film (light reflectance of 10% or less) is lower than the chromium film (light reflectance of several tens of percent). However, some inorganic films, such as chromium films, have electrical conductivity, and this has the advantage of being able to have a function as an auxiliary electrode of a transparent electrode. This is a preferred choice when you want to use the electrode function.

(Organic materials used to fabricate organic EL element substrates)
As a material of the light emitting layer (organic EL layer) constituting the organic EL element, it is possible to emit light having a wavelength that can be absorbed by the color conversion layer and the color filter, and without adversely affecting the characteristics and functions of the color conversion and filter. Materials with the properties that can be formed are preferred. A known organic light emitting material can be applied as such a material.
(Crosstalk reduction structure forming material)
The most required function of the crosstalk reducing structures 3a, 3b, 3c, and 3d according to the present invention is that they can be easily processed into a required pattern. The shape of the barrier layer formed in the process can be appropriately controlled. As a material having such a function, a general photoresist material can be used.

Hereinafter, embodiments of a specific color conversion type organic EL display of the present invention and a method for manufacturing the same will be described in detail with reference to the drawings. However, the present invention is a color conversion type organic EL display described in the following examples. The display is not limited.
(Production of color conversion filter substrate)
As shown in FIG. 1, a black matrix 9 is formed in a lattice pattern on a glass substrate 10 by using a layer forming material such as a commercially available black matrix, a red color filter 6, a green color filter 8, and a blue color filter. In addition, the color filters 6 and 8 are patterns that fill the in-lattice sections, and the filters of the same color pixels are formed so as to be in the same row pattern. The thickness of each layer is 1 μm (only the green filter is 2 μm). The manufactured color filter has a sub-pixel size of 300 μm × 100 μm. The specification of the glass substrate is (50 mm × 50 mm × thickness 0.7 mm; Corning 1737 glass). The specification of the red color filter 6 is (CK-7001: manufactured by Fuji Film). The specification of the green color filter 8 is (CR-7001: manufactured by Fuji Film). The specification of the blue color filter is (CG-7001: manufactured by Fuji Film). The specification of the black matrix is (CB-7001: manufactured by Fuji Film).

Next, 1000 parts by weight of toluene and 50 parts by weight (molar ratio) of the first dye: coumarin 6 + second dye: DCM (4-dicyanomethylene-2-methyl-6- (p-dimethylaminostyryl) -4H-pyran) Adjusts the coating ink from Coumarin 6: DCM = 48: 2), and uses an inkjet apparatus (Litrex 120L manufactured by Light Rex) to form five rows of red conversion layers having a film thickness of 500 nm in a nitrogen atmosphere. The ink was dried at a vacuum degree of 1.0 × 10 ⁻³ Pa and a temperature of 100 ° C. using a vacuum drying furnace without breaking the nitrogen atmosphere.
Subsequently, a row of green conversion layers 7 is formed. Coin 6 as the first dye and DEQ (quinacridone) as the second dye are combined to dissolve 50 parts by weight (molar ratio of coumarin 6: DEQ = 48: 2) in 1000 parts by weight of toluene. To prepare. Using this coating ink, the green color filter 8 row is coated in a nitrogen atmosphere in the same manner as described above to form a row of green conversion layers 7 having a thickness of 500 nm. The coating ink was dried at a vacuum degree of 1.0 × 10 ⁻³ Pa and a temperature of 100 ° C. using a vacuum drying furnace without breaking the nitrogen atmosphere as described above. In this way, the color conversion filter substrate 11 is manufactured.

(Preparation of organic EL element substrate)
Using another glass substrate 2 (50 mm × 50 mm × thickness 0.7 mm; Corning 1737 glass), a photocurable resin (Photoresin V-259PA (Nippon Steel Chemical Co., Ltd.)) was spin-coated at a film thickness of 4 μm. Then, patterning is performed by photolithography. The pattern has a line width of 5 μm, and two rows of discontinuous linear crosstalk reducing structures 3a are located at the positions where the planned formation portions of the respective rows of the organic EL layer are sandwiched as shown in FIG. Arrange them so that they do not overlap in the horizontal direction.
Subsequently, using a DC magnetron sputtering method (film formation conditions: target product name APC-TR, Furuya Metal Ag alloy; discharge gas Ar; discharge pressure 0.5 Pa; discharge power 0.58 W / cm ² ), an organic EL element A lower electrode film (Ag alloy) to be a first electrode (not shown) constituting 1 is formed on the entire surface with a thickness of 100 nm. Next, a photoresist is spin-coated on the formed Ag alloy film to form a photoresist pattern having a required first electrode pattern shape. A first electrode having a reflecting function by etching the unnecessary silver alloy film by shaking for 20 seconds in an etching solution of Ag alloy film (product name: SEA2, manufactured by Kanto Chemical Co., Ltd.) kept at 22 ° C. (Reflective electrode).

Next, IZO (Indium) having a film thickness of 220 nm is formed using a DC magnetron sputtering method (film formation condition: target In ₂ O ₃ -10% ZnO; discharge gas Ar; discharge pressure 0.3 Pa; discharge power 0.5 W / cm ² ). A Zinc Oxide) film is formed on the first electrode. The film formation rate at this time was 0.33 nm / sec. It is. Subsequently, a transparent electrode (not shown) on the first electrode is formed by patterning using a photolithography method.
The substrate on which the transparent electrode was formed was introduced into a resistance heating vacuum deposition apparatus, and an organic EL layer (organic light emitting layer) composed of an electron injection layer, an electron transport layer, a light emitting layer, a hole transport layer, and a hole injection layer (not shown). Layer) are sequentially formed without breaking the vacuum. During film formation, the internal pressure of the vacuum chamber was reduced to 1 × 10 ⁻⁴ Pa. The organic EL layer was formed in a required pattern through a metal shadow mask. The organic material is deposited by evaporating a sample placed in a metal crucible by resistance heating with a tungsten wire. Lithium is deposited by a Li alkaline dispenser (manufactured by SAES Getters). Control was performed by Nippon Vacuum CRTM-8000.

A method for forming the organic EL layer will be described. The electron injection layer is formed to a thickness of 10 nm by co-evaporating metal lithium with aluminum quinolinol complex (Alq ₃ ) at a ratio of 20: 1 (film thickness ratio). The electron transport layer is formed of an aluminum quinolinol complex (Alq ₃ ) with a thickness of 10 nm. The light emitting layer is formed of 4,4′-bis (2,2′-diphenylvinyl) biphenyl (DPVBi) with a thickness of 30 nm. The hole transport layer is formed of 4,4′-bis [N- (1-naphthyl) -N-phenylamino] biphenyl (α-NPD) with a thickness of 20 nm. The hole injection layer is made of copper phthalocyanine (CuPc) with a thickness of 70 nm.
The laminate on which the organic EL layer is formed is moved to the counter sputtering apparatus without breaking the vacuum. A metal mask is disposed to deposit an IZO film having a thickness of 100 nm, and a transparent electrode to be a second electrode (upper electrode) (not shown) is formed to form the organic EL element 1. According to the counter sputtering apparatus, since the supply of oxygen gas is reduced, damage to the organic EL layer can be almost eliminated as compared with the case where the transparent electrode is formed by normal sputtering. As described above, a plurality of linear crosstalk reducing structures 3a and the organic EL element 1 formed at a position sandwiched between the plurality of crosstalk reducing structures 3a parallel to the substrate surface are included. On the organic EL element substrate, a SiN film is further formed to a thickness of 3000 nm by the CVD method to form the barrier layer 4. When the shape of the barrier layer 4 on the crosstalk reducing structure 3a having a film thickness of 4 μm was measured, the height of the convex portion was 3.7 μm and the angle between the side surface and the substrate surface was 35 degrees. The angle of the side surface of the barrier layer 4 is 15 degrees or more, which has the effect of suppressing total reflection of light, but is preferably 30 degrees or more. In this way, the organic EL element substrate 12 (FIG. 1) is manufactured.

(Lamination)
A thermosetting epoxy resin is dropped on the formed color conversion filter substrate 11, and an ultraviolet curable epoxy resin adhesive containing a spacer having a thickness of 15 μm is applied around the substrate 11 with a dispenser. Subsequently, the organic EL element substrate 12 is lowered and pressure-bonded by an alignment mechanism while accurately aligning the organic EL element and the color conversion layer, and the two substrates 11 and 12 are bonded together. At this time, the gap becomes 15 μm by the spacer. In this way, the color conversion filter substrate 11 and the organic EL element substrate 12 are aligned and then bonded to each other, thereby producing an example of the color conversion type organic EL display of the present invention.
(Comparative Example 1)
(Example without crosstalk reduction structure (partition))
A schematic cross-sectional view of the produced color conversion type organic EL display of Comparative Example 1 is shown in FIG. The formation method of Comparative Example 1 is the same as that of Example 1. Regarding the production of the organic EL element 1, it was produced in the same manner as in Example 1 except that there was no formation step of the crosstalk reducing structure 3a.

(Comparative Example 2)
(Example with a row of crosstalk reduction structures (partition walls))
FIG. 7 is a schematic sectional view of the color conversion type organic EL display of Comparative Example 2 produced, and FIG. The method for forming the color conversion type organic EL display is the same as that of the first embodiment. The difference is that in Example 1, in the production of the organic EL element substrate 12, the two-row crosstalk reducing structures 3a disposed at the positions sandwiching the planned formation portion of the organic EL element 1 are arranged in a single continuous line shape. That is, the crosstalk reducing structure 3 is changed. It was produced in the same manner as in Example 1 except that the crosstalk reducing structure was changed from two rows to one continuous line.
(Evaluation)
Luminance and CIExy chromaticity (CIE: Commission International de l ') when data of 100% red, 0% green, and 0% blue is displayed on each color conversion type organic EL display of Comparative Examples 1 and 2 and Example 1. Table 1 shows the measurement results of Eclairage (International Lighting Commission).

  The CIE chromaticity diagram is a diagram that expresses the color of light in xy plane coordinates. The surroundings indicate the wavelength (unit: [nm]), and a single color is represented by this wavelength. The colors other than the surroundings represent mixed colors, and a color temperature curve is drawn at the center. This curve describes the color of a black body during thermal radiation.

前記比較例１、２の色変換型有機ディスプレイと、実施例１のそれとを比較すると、比較例１、２に比べて、実施例１では色度がよくなってより色純度の高い赤色が発色されており、クロストークが低減されていることがわかる。
以上説明した実施例１によれば、色変換型有機ＥＬディスプレイのバリア層内の光伝播を抑制することができ、その結果、クロストーク低減に効果が得られる。

Comparing the color conversion type organic display of Comparative Examples 1 and 2 with that of Example 1, in Example 1, the chromaticity is improved and red with higher color purity is developed compared to Comparative Examples 1 and 2. It can be seen that crosstalk is reduced.
According to Example 1 demonstrated above, the light propagation in the barrier layer of a color conversion type organic EL display can be suppressed, As a result, an effect is acquired in crosstalk reduction.

DESCRIPTION OF SYMBOLS 1 Organic EL element 2 Glass substrate, support substrate 3a, 3b, 3c, 3d Crosstalk reduction structure 4 Barrier layer 5 Red conversion layer 6 Red color filter 7 Green conversion layer 8 Green color filter 9 Black matrix 10 Glass substrate, transparent substrate 11 Color conversion filter substrate 12 Organic EL element substrate.

Claims (7)

  A plurality of organic EL elements arranged in a row on a support substrate, an organic EL element substrate on which a barrier layer covering the surface of the support substrate including the organic EL elements is mounted, a grid-like black matrix on the transparent substrate, In a color conversion organic EL display in which a color conversion filter substrate on which a color conversion filter layer and a color filter are mounted in an in-lattice section is bonded to each other with the mounting side facing inside, below the barrier layer, In addition, at least two rows of crosstalk reducing structures are arranged in a linear shape between the rows of the organic EL elements, and each of the two rows of crosstalk reducing structures has a discontinuous portion, and the two rows of discontinuous structures are arranged. A color conversion type organic EL display characterized in that the parts are arranged with their positions shifted from each other.   The color conversion type organic EL display according to claim 1, wherein the organic EL element comprises at least a reflective electrode, an organic EL layer, and a transparent electrode in this order on a support substrate. The refractive index of the crosstalk reduction structure, according to claim 1 or 2 color conversion type organic EL display, wherein 0.1 or lower go Metropolitan than the refractive index of the barrier layer.   3. The color conversion organic EL display according to claim 1, wherein a refractive index of the crosstalk reducing structure is 0.2 or more lower than a refractive index of the barrier layer. The height of the convex portion of the barrier layer coated to the crosstalk reducing structure on the color conversion according to any one of claims 1 to 4, characterized in that at least the thickness of the barrier layer Type organic EL display. Protrusions of the barrier layer coated on the crosstalk reduction structure and characterized in that the angle between a plane parallel to the substrate and the convex portion side surface and a side surface inclined shape on 15 degrees or The color conversion organic EL display according to any one of claims 1 to 5 .   The convex part of the barrier layer coated on the crosstalk reducing structure has a side inclined shape in which an angle formed between a side surface of the convex part and a plane parallel to the substrate is 30 degrees or more. The color conversion organic EL display according to claim 1.

Images