JP5135101B2 - 基板キャリア用の密閉機構を備えるパワー半導体モジュールおよびその製造方法 - Google Patents
基板キャリア用の密閉機構を備えるパワー半導体モジュールおよびその製造方法 Download PDFInfo
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- JP5135101B2 JP5135101B2 JP2008191060A JP2008191060A JP5135101B2 JP 5135101 B2 JP5135101 B2 JP 5135101B2 JP 2008191060 A JP2008191060 A JP 2008191060A JP 2008191060 A JP2008191060 A JP 2008191060A JP 5135101 B2 JP5135101 B2 JP 5135101B2
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- 239000000758 substrate Substances 0.000 title claims description 61
- 239000004065 semiconductor Substances 0.000 title claims description 43
- 238000007789 sealing Methods 0.000 title claims description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 230000008878 coupling Effects 0.000 claims description 15
- 238000010168 coupling process Methods 0.000 claims description 15
- 238000005859 coupling reaction Methods 0.000 claims description 15
- 239000004033 plastic Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 238000004382 potting Methods 0.000 claims description 4
- 230000000694 effects Effects 0.000 claims description 2
- 238000001816 cooling Methods 0.000 description 6
- 238000005192 partition Methods 0.000 description 4
- 229920002379 silicone rubber Polymers 0.000 description 4
- 239000004945 silicone rubber Substances 0.000 description 4
- 229910001369 Brass Inorganic materials 0.000 description 3
- 239000010951 brass Substances 0.000 description 3
- 238000001746 injection moulding Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- -1 for example Substances 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/16—Fillings or auxiliary members in containers or encapsulations, e.g. centering rings
- H01L23/18—Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device
- H01L23/24—Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device solid or gel at the normal operating temperature of the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4871—Bases, plates or heatsinks
- H01L21/4878—Mechanical treatment, e.g. deforming
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
- H01L23/10—Containers; Seals characterised by the material or arrangement of seals between parts, e.g. between cap and base of the container or between leads and walls of the container
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/07—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
- H01L25/072—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00 the devices being arranged next to each other
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8384—Sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/40—Mountings or securing means for detachable cooling or heating arrangements ; fixed by friction, plugs or springs
- H01L23/4006—Mountings or securing means for detachable cooling or heating arrangements ; fixed by friction, plugs or springs with bolts or screws
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1301—Thyristor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/20—Parameters
- H01L2924/203—Ultrasonic frequency ranges, i.e. KHz
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Casings For Electric Apparatus (AREA)
Description
・二成分射出成形法で、第1の機械的に安定なプラスチックから、好ましくは対応する基板キャリアのための少なくとも1つの開口を有する筐体を形成し、第2の永久弾性プラスチックから密閉機構を形成するステップ。
・筐体に、好ましくは筐体の対応する開口内に、少なくとも1つの基板キャリアを配置するステップ。
・固定手段によって、筐体と基板キャリアとの永続的な接続を形成するステップ。
10 筐体
12 凹部
14 通し穴
16 通し穴
20 突起
30 密閉機構
40 基板キャリア
42 開口
44 内側主面
46 外側主面
50 パワー電子回路構成
60 結合要素
120 隔壁
122 縁部領域
Claims (8)
- 第1のプラスチックからなる筐体(10)と少なくとも1つの基板キャリア(40)とを備えるパワー半導体モジュール(1)であって、基板キャリアは、その上に形成された回路構成(50)、および前記回路構成(50)から延出する電気結合要素(60)を有するパワー半導体モジュール(1)であって、
前記筐体(10)が、前記基板キャリア(40)との永続的な接続のために固定手段(20)を有し、
前記筐体(10)が、当該筐体(10)と一体成形され、環状に延在し、かつ前記基板キャリア(40)の第1の内側主面(44)に対向した、第2のプラスチックからなる永久弾性密閉機構(30)を有するパワー半導体モジュール(1)。 - 前記基板キャリア(40)が、表面仕上げされた銅板として作製され、前記基板キャリア(40)の内側主面(44)に、前記銅板に対して電気的に絶縁されて構築されたパワー電子回路構成(50)が配置されている、請求項1に記載のパワー半導体モジュール。
- 前記基板キャリア(40)が、前記筐体(10)の凹部(12)内に配置され、前記筐体(10)によって側部を取り囲まれており、前記永久弾性密閉機構(30)が、前記凹部(12)内に配置されている、請求項1に記載のパワー半導体モジュール。
- 少なくとも1つの結合要素(60)が、ばね接触機構として形成されている、請求項1に記載のパワー半導体モジュール。
- 前記密閉機構(30)が、前記基板キャリア(40)の固定手段(20)を、少なくとも部分的に取り囲み、これら固定手段を前記凹部(12)の外側におく、請求項1に記載のパワー半導体モジュール。
- 請求項1に記載のパワー半導体モジュール(1)を製造するための方法であって、
・第1の機械的に安定なプラスチックから筐体(10)を形成し、第2の永久弾性プラスチックから密閉機構(30)を形成するステップと、
・前記筐体(10)に少なくとも1つの基板キャリア(40)を配置するステップと、
・固定手段(20)を用いて、前記筐体(10)と前記基板キャリア(40)との永続的な接続を形成するステップと
を有する、方法。 - 前記固定手段(20)が、前記筐体(10)の突起からなり、当該突起が、前記基板キャリア(40)の開口(42)を通って貫入し、温度および/または超音波の効果による前記突起(20)の端部の変形によって、リベット接続が形成される、請求項6に記載の方法。
- 接続形成ステップに引き続いて、前記パワー半導体モジュール(1)の内部空間が、少なくとも部分的に、電気絶縁ポッティング材で充填される、請求項6に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007034848 | 2007-07-26 | ||
DE102007034848.9 | 2007-07-26 |
Publications (2)
Publication Number | Publication Date |
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JP2009033170A JP2009033170A (ja) | 2009-02-12 |
JP5135101B2 true JP5135101B2 (ja) | 2013-01-30 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2008191060A Active JP5135101B2 (ja) | 2007-07-26 | 2008-07-24 | 基板キャリア用の密閉機構を備えるパワー半導体モジュールおよびその製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8053884B2 (ja) |
EP (1) | EP2019424B1 (ja) |
JP (1) | JP5135101B2 (ja) |
CN (1) | CN101355061B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009037257B4 (de) * | 2009-08-12 | 2014-07-31 | Semikron Elektronik Gmbh & Co. Kg | Leistungshalbleitermodul mit Schaltungsträger und Lastanschlusselement sowie Herstellungsverfahren hierzu |
DE102011056848A1 (de) * | 2011-12-22 | 2013-06-27 | Semikron Elektronik Gmbh & Co. Kg | Leistungshalbleitermodul oder Ansteuermodul hierfür |
DE102012222015B4 (de) * | 2012-11-30 | 2019-07-18 | Infineon Technologies Ag | Feuchtigkeitsdichtes Halbleitermodul und ein Verfahren zu dessen Herstellung |
WO2017163638A1 (ja) * | 2016-03-22 | 2017-09-28 | 富士電機株式会社 | ケース、半導体装置、および、ケースの製造方法 |
DE102016110052B4 (de) * | 2016-05-31 | 2018-10-04 | Endress+Hauser SE+Co. KG | Feldgerät mit einer gekapselten Leiterplatte sowie Verfahren zur Kapselung einer Leiterplatte eines solchen Feldgerätes |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
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DE3521572A1 (de) * | 1985-06-15 | 1986-12-18 | Brown, Boveri & Cie Ag, 6800 Mannheim | Leistungshalbleitermodul mit keramiksubstrat |
DE3915707A1 (de) * | 1989-05-13 | 1990-11-22 | Asea Brown Boveri | Kunststoffgehaeuse und leistungshalbleitermodul mit diesem gehaeuse |
US5117279A (en) * | 1990-03-23 | 1992-05-26 | Motorola, Inc. | Semiconductor device having a low temperature uv-cured epoxy seal |
US5268758A (en) | 1990-09-26 | 1993-12-07 | Matsushita Electric Industrial Co., Ltd. | Horizontal line interpolation circuit and image pickup apparatus including it |
US5461774A (en) * | 1994-03-25 | 1995-10-31 | Motorola, Inc. | Apparatus and method of elastically bowing a base plate |
DE4439471A1 (de) * | 1994-11-08 | 1996-05-09 | Telefunken Microelectron | Baugruppe |
FR2773942B1 (fr) * | 1998-01-19 | 2000-04-21 | Ferraz | Composant electronique de puissance et son procede de fabrication |
CN1409942A (zh) * | 1999-10-12 | 2003-04-09 | 电子设备屏蔽公司 | Emi屏蔽设备 |
DE10100460B4 (de) | 2001-01-08 | 2006-06-01 | Semikron Elektronik Gmbh & Co. Kg | Leistungshalbleitermodul mit Gehäuse und Anschlußelementen |
DE10139287A1 (de) * | 2001-08-09 | 2003-03-13 | Bombardier Transp Gmbh | Halbleitermodul |
DE10340974A1 (de) * | 2003-09-05 | 2005-03-24 | Robert Bosch Gmbh | Steuergeräteeinheit und Verfahren zur Hestellung derselben |
DE102005034689B4 (de) * | 2005-07-25 | 2007-07-05 | Siemens Ag | Abdichtungsanordnung eines Piezoaktors in einem Kraftstoffinjektor |
DE102005039947B4 (de) * | 2005-08-24 | 2011-12-15 | Semikron Elektronik Gmbh & Co. Kg | Leistungshalbleitermodul mit Befestigungseinrichtung |
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2008
- 2008-07-09 EP EP08012360.7A patent/EP2019424B1/de active Active
- 2008-07-24 CN CN2008101300648A patent/CN101355061B/zh active Active
- 2008-07-24 JP JP2008191060A patent/JP5135101B2/ja active Active
- 2008-07-28 US US12/220,871 patent/US8053884B2/en active Active
Also Published As
Publication number | Publication date |
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JP2009033170A (ja) | 2009-02-12 |
US8053884B2 (en) | 2011-11-08 |
EP2019424B1 (de) | 2016-11-23 |
CN101355061A (zh) | 2009-01-28 |
US20090039494A1 (en) | 2009-02-12 |
EP2019424A2 (de) | 2009-01-28 |
CN101355061B (zh) | 2012-02-29 |
EP2019424A3 (de) | 2009-12-30 |
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