JP5099959B2 - 新規な部分酸化反応器 - Google Patents
新規な部分酸化反応器 Download PDFInfo
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Description
‐内部中空容器(5)の内面に沿って位置し、かつ流れ中に供給原料損失を発生させる多孔質装置(8)によって終わる断熱材(6)の十分な厚さによって熱絶縁された内部中空容積(5)により構成される流れの方向の第1反応チャンバ。この供給原料損失が、例えば邪魔板(13)のような、ガス反応体を乱流状態にする手段によって第1チャンバ内にもたらされる大きな再循環と組み合わせて、完全に撹拌されるタイプの反応チャンバ(5)を生み出すことに寄与する。
‐ほぼ円環形状の内部中空容積から構成され、かつ燃焼ガスの大きな再循環を発生させ、かつ前記第1チャンバ(305)に完全に撹拌される流れに近い性質を与えるために、円環形インサート(308)を含む第1反応チャンバ(305)。
下記の比較実施例により、典型的な部分酸化供給原料に対する従来の、すなわち高度でない熱集積により比較的低温で機能する、POX反応器の性能を本発明の反応器‐熱交換器の性能と比較することが可能になる。
本発明の図6による反応器‐熱交換器は、一方で同一量のブタンが供給され、かつ他方で空気及び水蒸気の混合物が供給される。ブタンは、前出の実施例と同じ外部熱交換器内で450℃に予熱される。
7 第2チャンバ
8 連通手段
9 炭化水素供給原料供給手段
11 流出物の排出手段
12 予熱ガス供給手段
Claims (12)
- ‐任意の方向の軸に沿って伸びた密閉容器、
‐酸素及び場合により水蒸気を含む予熱ガスを供給する予熱ガス供給手段(12)、
‐炭化水素供給原料供給手段(9)、
‐水素リッチ流出物の排出手段(11)、
‐前記密閉容器内部の第1内部チャンバ(5)であって、ほぼ等温の部分酸化反応が行われ、炭化水素供給原料供給手段(9)及び予熱ガス供給手段(12)に入口(10)において接続される、第1内部チャンバ(5)、
‐前記第1内部チャンバ(5)内のガス乱流手段(13)であって、完全に攪拌されるタイプの流れを生み出すことに適合した、ガス乱流手段(13)、および
‐前記第1内部チャンバ(5)を第2チャンバ(7)に連通する連通手段(8)
を含む部分酸化反応器であって、
該第2チャンバ(7)は、ピストン流を行うのに適した容積を有し、前記連通手段(8)は、少なくとも1つのオリフィスを含み、かつ第2チャンバ(7)は、その長さの少なくとも一部において前記予熱ガス供給手段(12)からの予熱ガスと間接的に熱交換し、第2チャンバ(7)は、水素リッチ流出物排出手段(11)に接続され、かつ予熱ガス供給手段(12)は、前記密閉容器とほぼ同軸の環状容器を含み、かつ前記第2チャンバ(7)は、反応器の密閉容器とほぼ同軸であり、前記連通手段(8)と連通するほぼ断熱の第1領域、及び予熱ガス供給手段(12)と熱交換する第2領域を含む、部分酸化反応器。 - 第2チャンバ(7)の第1領域は、水蒸気改質触媒を含む請求項1に記載の反応器。
- 第2チャンバ(7)は、セラミックタイプの材料製か、又は、多孔質又は非多孔質のセラミック材料によって熱流体側が被覆されていてもよい金属材料製である請求項1または2に記載の反応器。
- ガス乱流手段(13)は、ガスの内部再循環円環壁、邪魔板、及び一方で供給原料をかつ他方で酸素を含むガスを別個にかつほぼ向流で噴射する装置からなる群から選択される請求項1から3のいずれかに記載の反応器。
- 第1チャンバ(5)及び第2チャンバ(7)は、反応器の密閉容器とほぼ同軸であり、かつガス供給手段(12)の環状容器は、第1チャンバ(5)及び第2チャンバ(7)を取り囲む請求項1から4のいずれかに記載の反応器。
- 請求項1から5のいずれかに記載の反応器を使用して、炭化水素供給原料、アルコール又は生物由来の油から水素リッチ流出物を生成する方法。
- 酸素を含むガスは、理論酸素量に対する質量比0.1〜0.6にあり、かつ第1チャンバ(5)内の再利用率は、25%以上である請求項6に記載の方法。
- 前記ガスは、第2チャンバ(7)内を循環する流出物との間接的熱交換によって800℃〜1400℃の温度で予熱される請求項6又は7のいずれかに記載の方法。
- 第1チャンバ(5)の温度、及び場合により第2チャンバ(7)の第1領域の温度は、1100℃〜1800℃である請求項6から8のいずれかに記載の方法。
- モル比H2O/C(式中、Cは、炭化水素供給原料中に含まれる炭素の量を示す)は、0〜2である請求項6から9のいずれかに記載の方法。
- 酸素を含むガス供給においてガス状炭化水素を噴射し、かつ第1チャンバ(5)の上流で得られる混合物の発火を行って低温点火を行う請求項6から10のいずれかに記載の方法。
- 第1及び第2チャンバ(5)(7)内の滞留時間は、50m秒〜1秒である請求項6から11のいずれかに記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0300751A FR2850372B1 (fr) | 2003-01-23 | 2003-01-23 | Nouveau reacteur d'oxydation partielle |
FR0300751 | 2003-01-23 |
Publications (3)
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JP2004224690A JP2004224690A (ja) | 2004-08-12 |
JP2004224690A5 JP2004224690A5 (ja) | 2007-03-08 |
JP5099959B2 true JP5099959B2 (ja) | 2012-12-19 |
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JP2004015029A Expired - Fee Related JP5099959B2 (ja) | 2003-01-23 | 2004-01-23 | 新規な部分酸化反応器 |
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US (2) | US7422728B2 (ja) |
JP (1) | JP5099959B2 (ja) |
DE (1) | DE102004003468B4 (ja) |
FR (1) | FR2850372B1 (ja) |
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US7625414B2 (en) | 2009-12-01 |
US7422728B2 (en) | 2008-09-09 |
FR2850372A1 (fr) | 2004-07-30 |
US20080307707A1 (en) | 2008-12-18 |
JP2004224690A (ja) | 2004-08-12 |
DE102004003468B4 (de) | 2012-10-25 |
FR2850372B1 (fr) | 2006-06-09 |
DE102004003468A1 (de) | 2004-08-05 |
US20040151663A1 (en) | 2004-08-05 |
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