JP5090631B2 - 変性シリカ粒子並びにそれを含む感光性組成物及び感光性平版印刷版 - Google Patents
変性シリカ粒子並びにそれを含む感光性組成物及び感光性平版印刷版 Download PDFInfo
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- JP5090631B2 JP5090631B2 JP2005140411A JP2005140411A JP5090631B2 JP 5090631 B2 JP5090631 B2 JP 5090631B2 JP 2005140411 A JP2005140411 A JP 2005140411A JP 2005140411 A JP2005140411 A JP 2005140411A JP 5090631 B2 JP5090631 B2 JP 5090631B2
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
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- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/02—Cover layers; Protective layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/08—Developable by water or the fountain solution
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B2200/00—Indexing scheme relating to specific properties of organic compounds
- C07B2200/11—Compounds covalently bound to a solid support
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
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- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
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- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Description
RはC1-C6アルキル基であり、
Xは、-CH2-、-O-、-S-、及び、-NZ-から選択される2価の有機基(ZはH又はC1-C6アルキル基を表す)であり、
Yは、C1-C6アルキル基又はハロゲン原子であり、
mは0-100の整数であり、
nは0-100の整数であり、
但し、m+nは1以上であり、
oは0-10の整数であり、
pは0-5の整数であり、
qは0-10の整数であり、
但し、o+qは1以上である〕
を有するものが好ましい。
RはC1-C6アルキル基であり、好ましくはメチル基又はエチル基であり、
Xは、-CH2-、-O-、-S-、及び、-NZ-から選択される2価の有機基(ZはH又はC1-C6アルキル基を表す)であり、好ましくはHであり、
Yは、C1-C6アルキル基又はハロゲン原子であり、好ましくはメチル基又はフッ素原子であり、
mは0-100の整数であり、好ましくは1-50の整数であり、
nは0-100の整数であり、好ましくは0-20の整数であり、
但し、m+nは1以上であり、
oは0-10の整数であり、好ましくは1-10の整数であり、
pは0-5の整数であり、好ましくは0-2の整数であり、
qは0-10の整数であり、好ましくは1-10の整数であり、
但し、o+qは1以上であり、好ましくは2以上である)
を有するものが好ましい。
本発明の感光性組成物に含まれる光重合性化合物は特に限定されるものではないが、好ましくは、付加重合可能なエチレン性不飽和結合を有する化合物である。そのような化合物は光重合末端であるエチレン性不飽和二重結合基を少なくとも1個、好ましくは2個以上有する化合物の中から任意に選択することができ、例えば、モノマー、プレポリマー、すなわち2量体、3量体およびオリゴマー、またはこれらの混合物ならびにこれらの共重合体等の化学的形態を持つものである。モノマーおよびその共重合体の例としては、不飽和カルボン酸(例えば、アクリル酸、メタクリル酸、イタコン酸、クロトン酸、イソクロトン酸、マレイン酸等)と脂肪族多価アルコール化合物とのエステル、不飽和カルボン酸と脂肪族多価アミン化合物とのアミド等が挙げられる。
更に、前述のエステルモノマーの混合物もあげることができる。
(a)赤外線吸収剤、
(b)光重合開始剤、及び
(c)バインダー樹脂
を含むことが好ましい。
本発明の感光性組成物に配合されうる赤外線吸収剤とは、最大吸収波長が近赤外線から赤外線領域にある物質、具体的には最大吸収波長が760nm〜1200nmの領域にある物質である。このような物質としては、例えば、種々の顔料または染料が挙げられる。
D+ は近赤外線領域に吸収を持つ陽イオン色素を示し、
A− はアニオンを示す。)
光重合開始剤としては、使用する光源の波長により、特許文献、非特許文献等で公知である種々の光重合開始剤、あるいは2種以上の光重合開始剤の併用系(光重合開始系)を適宜選択して使用することができる。なお、本発明においては単独で用いる光重合開始剤、2種以上の光重合開始剤を併用した系を総括して単に「光重合開始剤」という。
バインダー樹脂としては、アルカリ現像液を使用する場合は、アルカリ水に可溶性又は膨潤性である有機高分子重合体が好適に使用される。アルカリ水に可溶性又は膨潤性である有機高分子重合体としては、種々のものが挙げられるが、主鎖または側鎖にアルカリ可溶性基(酸基)を有するものが好ましい。酸基としてはpKa0〜12以下の酸基が好ましく、特にカルボン酸基、フェノール性水酸基、スルホンアミド基、N−スルホニルカルバモイル基、N−アシルカルバモイル基などに代表される活性アミノ、イミノ基がより好ましい。この様な有機高分子重合体としては、側鎖にカルボン酸基を有する付加重合体、例えば特開昭59−44615号、特公昭54−34327号、特公昭58−12577号、特公昭54−25957号、特開昭54−92723号、特開昭59−53836号、特開昭59−71048号の各公報に記載されているもの、即ちメタクリル酸共重合体、アクリル酸共重合体、イタコン酸共重合体、クロトン酸共重合体、マレイン酸共重合体、部分エステル化マレイン酸共重合体等や、側鎖にカルボン酸基を有する酸性セルロース誘導体、水酸基を有する付加重合体に環状酸無水物を付加させたもの、ポリビニルピロリドン、ポリエチレンオキサイド、並びに、硬化皮膜の強度を上げ得るアルコール可溶性ポリアミドや2,2−ビス−(4−ヒドロキシフェニル)−プロパンとエピクロロヒドリンのポリエーテル等が挙げられる。これらの中で、〔ベンジル(メタ)アクリレート/(メタ)アクリル酸/必要に応じてその他の付加重合性ビニルモノマー〕共重合体及び〔アリル(メタ)アクリレート/(メタ)アクリル酸/必要に応じてその他の付加重合性ビニルモノマー〕共重合体が、特に好ましい。更には、特公平7−120040号、特公平7−120041号、特公平7−120042号、特公平8−12424号、特開昭63−287944号、特開昭63−287947号、特開平1−271741号、特開平11−352691号の各公報に記載のポリウレタン樹脂も本発明の用途に使用できる。
よって、ポリアルキレンオキシドセグメントは、
-(CH2-O-),-(CH2CH2-O-),-(CH(CH3)-O-),-(CH2CH2CH2-O-),-(CH(CH3)CH2-O-),
-(CH2CH(CH3)-O-)、またはこれらの組み合わせのように、1〜3の炭素原子を有する直鎖もしくは側鎖のアルキレンオキサイド基を挙げられる。これらの中でも、-(CH2CH2-O-)構成単位を有することがより好ましい。
アルキレンオキシド単位の数平均分子量は、100から10万が好ましく、さらに500から1万の高分子重合体が特に好ましい。
-C(=O)O-((CH2)xO)y-R,
xは1〜3を、yは5〜180を、Rは末端基を示す。Rに制限はないが、水素原子、1〜6の炭素原子を有するアルキル基を用いることが好ましい。アルキル基の具体例として、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、イソブチル基、t-ブチル基、n-ペンチル基、イソペンチル基、neo-ペンチル基、n-ヘキシル基、イソヘキシル基、1、1-ジメチルブチル基、2、2-ジメチルブチル基、シクロペンチル基、またシクロヘキシル基が用いられる。
-C(=O)O-(CH2CH2O)y-CH3,
yは12〜200であり、より好ましくは25〜75である。さらに好ましくは、yは40〜50である。
共重合成分A)アクリロニトリル、メタクリロニトリル、またはその混合物
共重合成分B)ポリ(エチレングリコール)メチルエーテルアクリレートあるいはポリ(エチレングリコール)メチルエーテルメタクリレートのようなアクリル酸あるいはメタクリル酸のポリ(アルキレングリコール)エステル
共重合成分C)必要であれば、スチレンやメタクリルアミドなどのようなモノマー、あるいはモノマーの混合物
本発明の感光性平版印刷版の支持体は、表面が親水性であれば如何なるものでも使用し得るが、寸度的に安定な板状物が好ましく、例えば、紙、プラスチック(例えばポリエチレン、ポリプロピレン、ポリスチレン等)がラミネートされた紙、また、例えばアルミニウム(アルミニウム合金も含む。)、亜鉛、銅等のような金属またはその合金(例えばケイ素、銅、マンガン、マグネシウム、クロム、亜鉛、鉛、ビスマス、ニッケルとの合金)の板、更に、例えば二酢酸セルロース、三酢酸セルロース、プロピオン酸セルロース、酪酸セルロース、酪酸酢酸セルロース、硝酸セルロース、ポリエチレンテレフタレート、ポリエチレン、ポリスチレン、ポリプロピレン、ポリカーボネート、ポリビニルアセタール等のようなプラスチックのフィルム、上記の如き金属又は合金がラミネートもしくは蒸着された紙もしくはプラスチックフィルム等が挙げられる。これらの支持体のうち、アルミニウム板は寸度的に著しく安定であり、しかも安価であるので特に好ましい。更に、特公昭48−18327号に記載されているようなポリエチレンテレフタレートフィルム上にアルミニウムシートが結合された複合体シートも好ましい。通常その厚さは0.05mm〜1mm程度である。
砂目立て処理方法は、特開昭56−28893号公報に開示されているような機械的砂目立て、化学的エッチング、電解グレイン等がある。更に塩酸又は硝酸電解液中で電気化学的に砂目立てする電気化学的砂目立て方法、及びアルミニウム表面を金属ワイヤーでひっかくワイヤーブラシグレイン法、研磨球と研磨剤でアルミニウム表面を砂目立てするボールグレイン法、ナイロンブラシと研磨剤で表面を砂目立てするブラシグレイン法のような機械的砂目立て法を用いることができ、上記砂目立て方法を単独あるいは組み合わせて用いることもできる。その中でも本発明において有用に使用される表面粗さを作る方法は、塩酸又は硝酸電解液中で化学的に砂目立てする電気化学的方法であり、適する電流密度は100〜400C/dm2の範囲である。さらに具体的には、0.1〜50%の塩酸又は硝酸を含む電解液中、温度20〜100℃、時間1秒〜30分、電流密度100〜400C/dm2の条件で電解を行うことが好ましい。
以上のようにして処理されたアルミニウム支持体は、さらに陽極酸化処理が施される。陽極酸化処理は、当該技術分野において従来より行われている方法で行うことができる。具体的には、硫酸、リン酸、クロム酸、シュウ酸、スルファミン酸、ベンゼンスルフォン酸等あるいはこれらの二種以上を組み合わせて、水溶液又は非水溶液中でアルミニウムに直流又は交流を流すと、アルミニウム支持体表面に陽極酸化皮膜を形成することができる。陽極酸化処理の条件は、使用される電解液によって種々変化するので一概に決定され得ないが、一般的には電解液の濃度が1〜80%、液温5〜70℃、電流密度0.5〜60アンペア/dm2、電圧1〜100V、電解時間10〜100秒の範囲が適当である。
100mlのフラスコ中に22.27gのポリエチレングリコールモノメチルエーテル(Mn=550、アルドリッチ社製)を導入した。ポリエチレングリコールモノメチルエーテルをメカニカルスターラーで撹拌しつつ、10gの3−イソシアネート プロピルトリエトキシシラン(ユニオンカーバイド社製A−1310)をフラスコに導入した。3−イソシアネート プロピルトリエトキシシランの導入後、0.5gのジブチル錫ジラウレート(東京化成工業(株)製)を添加した。反応混合物の温度が上昇したので、当該反応混合物を水浴で冷却した。反応混合物は一晩撹拌された。撹拌後、IRスペクトルでは残存イソシアネートは確認されなかった。次に、0.5gのメタノールを添加して、内容物をフラスコから取り出した。
100mlのフラスコ中に20.73gのポリエチレングリコールモノアクリレート(Mn=512、日本油脂(株)製AE−400)を導入した。ポリエチレングリコールモノアクリレートをメカニカルスターラーで撹拌しつつ、10gの3−イソシアネート プロピルトリエトキシシラン(ユニオンカーバイド社製A−1310)をフラスコに導入した。3−イソシアネート プロピルトリエトキシシランの導入後、0.5gのジブチル錫ジラウレート(東京化成工業(株)製)を添加した。反応混合物の温度が上昇したので、当該反応混合物を水浴で冷却した。反応混合物は一晩撹拌された。撹拌後、IRスペクトルでは残存イソシアネートは確認されなかった。次に、0.5gのメタノールを添加して、内容物をフラスコから取り出した。
100mlのフラスコ中に17.09gのポリエチレングリコール−ポリプロピレングリコールモノメタクリレート(日本油脂(株)製ブレンマー70PEP−350E)及びMEKを導入した。混合物をメカニカルスターラーで撹拌しつつ、10gの3−イソシアネート プロピルトリエトキシシラン(ユニオンカーバイド社製A−1310)をフラスコに導入した。3−イソシアネート プロピルトリエトキシシランの導入後、0.5gのジブチル錫ジラウレート(東京化成工業(株)製)を添加した。反応混合物の温度が上昇したので、当該反応混合物を水浴で冷却した。反応混合物は一晩撹拌された。撹拌後、IRスペクトルでは残存イソシアネートは確認されなかった。次に、0.5gのメタノールを添加して、内容物をフラスコから取り出した。
100mlのフラスコ中に15.0gのポリエチレングリコール変性末端ジイソシアネート化合物(住化バイエルウレタン VPLS2306)と15gのMEKの混合物をメカニカルスターラーで撹拌しつつ、6.33gの3−アミノプロピルトリエトキシシラン(信越化学製KBM−903)と6.33gのMEKをフラスコに導入した。VPLS2306は、下記式で表される。
100mlのフラスコ中に15.0gのポリエチレングリコール変性末端ジイソシアネート化合物(住化バイエルウレタン VPLS2306)と15gのMEKの混合物をメカニカルスターラーで撹拌しつつ、6.33gの3−アミノプロピルトリエトキシシラン(信越化学製KBM−903)と6.33gのMEK混合物をフラスコに導入した。3−アミノプロピルトリエトキシシラン混合物の導入後、3時間攪拌を行い、その後0.5gのジブチル錫ジラウレート(東京化成工業(株)製)を添加した。その後に1.11gのアリルアルコール(東京化成工業(株)製)と1.11gのMEK混合物を滴下した。アリルアルコールは下記式で表される。
100mlのフラスコ中に15.0gのポリエチレングリコール変性末端ジイソシアネート化合物(住化バイエルウレタン VPLS2306)と15gのMEKの混合物をメカニカルスターラーで撹拌しつつ、6.33gの3−アミノプロピルトリエトキシシラン(信越化学製KBM−903)と6.33gのMEK混合物をフラスコに導入した。3−アミノプロピルトリエトキシシラン混合物の導入後、3時間攪拌を行った。その後に1.11gのアリルアミン(東京化成工業(株)製)と1.11gのMEK混合物を滴下した。アリルアミンは下記式で表される。
5.15gのシラン含有モノマー2、40gのコロイダルシリカ(MEK−ST)を200mlのフラスコに導入した。混合物をメカニカルスターラーで撹拌しつつ、フラスコを80℃に加熱した。温度が80℃に達した後、0.86gのイソプロピルアルコール(以下、「IPA」という)及び0.52gの脱ミネラル水をフラスコに添加した。3時間後、3.1gのトリメチルオルトホルメート(東京化成工業(株)製)を添加し、更に1時間撹拌した。撹拌後、内容物をフラスコから取り出した。不揮発分は39.6質量%であった。
1.72gのシラン含有モノマー1、3.43gのシラン含有モノマー2、40gのコロイダルシリカ(MEK−ST)を200mlのフラスコに導入した。混合物をメカニカルスターラーで撹拌しつつ、フラスコを80℃に加熱した。温度が80℃に達した後、0.86gのIPA及び0.52gの脱ミネラル水をフラスコに添加した。3時間後、3.1gのトリメチルオルトホルメート(東京化成工業(株)製)を添加し、更に1時間撹拌した。撹拌後、内容物をフラスコから取り出した。不揮発分は40.3質量%であった。
3.43gのシラン含有モノマー2、40gのコロイダルシリカ(MEK−ST)を200mlのフラスコに導入した。混合物をメカニカルスターラーで撹拌しつつ、フラスコを80℃に加熱した。温度が80℃に達した後、0.86gのIPA及び0.52gの脱ミネラル水をフラスコに添加した。3時間後、3.1gのトリメチルオルトホルメート(東京化成工業(株)製)を添加し、更に1時間撹拌した。撹拌後、内容物をフラスコから取り出した。不揮発分は38.1質量%であった。
1.72gのシラン含有モノマー2、40gのコロイダルシリカ(MEK−ST)を200mlのフラスコに導入した。混合物をメカニカルスターラーで撹拌しつつ、フラスコを80℃に加熱した。温度が80℃に達した後、0.86gのIPA及び0.52gの脱ミネラル水をフラスコに添加した。3時間後、3.1gのトリメチルオルトホルメート(東京化成工業(株)製)を添加し、更に1時間撹拌した。撹拌後、内容物をフラスコから取り出した。不揮発分は35.3質量%であった。
5.15gのシラン含有モノマー3、40gのコロイダルシリカ(MEK−ST)を200mlのフラスコに導入した。混合物をメカニカルスターラーで撹拌しつつ、フラスコを80℃に加熱した。温度が80℃に達した後、0.86gのIPA及び0.52gの脱ミネラル水をフラスコに添加した。3時間後、3.1gのトリメチルオルトホルメート(東京化成工業(株)製)を添加し、更に1時間撹拌した。撹拌後、内容物をフラスコから取り出した。不揮発分は40.4質量%であった。
5.15gのシラン含有モノマー4、40gのコロイダルシリカ(MEK−ST)を200mlのフラスコに導入した。混合物をメカニカルスターラーで撹拌しつつ、フラスコを80℃に加熱した。温度が80℃に達した後、0.86gのIPA及び0.52gの脱ミネラル水をフラスコに添加した。3時間後、3.1gのトリメチルオルトホルメート(東京化成工業(株)製)を添加し、更に1時間撹拌した。撹拌後、内容物をフラスコから取り出した。不揮発分は39.9質量%であった。
5.15gのシラン含有モノマー5、40gのコロイダルシリカ(MEK−ST)を200mlのフラスコに導入した。混合物をメカニカルスターラーで撹拌しつつ、フラスコを80℃に加熱した。温度が80℃に達した後、0.86gのIPA及び0.52gの脱ミネラル水をフラスコに添加した。3時間後、3.1gのトリメチルオルトホルメート(東京化成工業(株)製)を添加し、更に1時間撹拌した。撹拌後、内容物をフラスコから取り出した。不揮発分は39.9質量%であった。
5.15gのシラン含有モノマー6、40gのコロイダルシリカ(MEK−ST)を200mlのフラスコに導入した。混合物をメカニカルスターラーで撹拌しつつ、フラスコを80℃に加熱した。温度が80℃に達した後、0.86gのIPA及び0.52gの脱ミネラル水をフラスコに添加した。3時間後、3.1gのトリメチルオルトホルメート(東京化成工業(株)製)を添加し、更に1時間撹拌した。撹拌後、内容物をフラスコから取り出した。不揮発分は40.1質量%であった。
46.5gのN,N'−ジメチルアセトアミド(以下、「DMAC」という)、28.65gのヘキサメチレンジイソシアネートビウレット型ポリイソシアネート(バイエル社製DESMODUR(登録商標)N−3200)、及び、3.48gの2−アミノ−4−ヒドロキシ−6−メチルピリミジン(アルドリッチ社製)を、加熱ジャケット、温度調節機、メカニカルスターラー、コンデンサー、窒素ガス導入口、及び、等圧漏斗(pressure equalized funnel)を装備した300mlの四つ首フラスコに導入した。反応混合物をゆっくりと約87℃から90℃へ加熱し、加熱を2時間継続した。反応が進むと、反応混合物は徐々に透明となった。
ブラシ粗面化及び硫酸陽極酸化され、ポリエチレングリコールメチルエーテルメタクリレート−ビニルリン酸コポリマーで後処理されたアルミニウム基板上に、シリカ化合物1〜8を含む表1に記載の溶液を、被覆物の乾燥重量が1.5g/m2となるように塗布した。具体的には、シリカ化合物1〜8のいずれかを含む溶液をワイヤ巻回26番ロッドを用いて塗布し、100℃に設定されたコンベアオーブン内で約90秒の間乾燥した。
2:n−プロパノール/水の80/20混合物中のアクリロニトリル/ポリエチレングリコールメチルエーテルメタクリレート/スチレンのコポリマーの21%分散液
3:DESMODUR N3200(ヘキサメチレンジイソシアネートをベースとする脂肪族ポリイソシアネート樹脂、バイエル社製)を2−アミノ−4−ヒドロキシ−6−メチルピリミジン及びポリエチレングリコールモノアクリレート(Mn=512、日本油脂(株)製AE−400)と反応させて得られた、DMAC中の40質量%溶液。
4:プロピレンカーボネート中のヨードニウム(4−メトキシフェニル[4−(2−メチルプロピル)フェニル]ヘキサフルオロリン酸)の75%溶液(チバスペシャルティケミカルズ社製)
5:[化9]
6:PCAS社(仏)から入手可能なメルカプト−3−トリアゾール−1H,2,4
7:キシレン/メトキシプロピル酢酸溶液中の変性ジメチルポリシロキサンコポリマーの25%溶液(Bykケミー社(仏)製)
ブラシ粗面化及び硫酸陽極酸化され、ポリエチレングリコールメチルエーテルメタクリレート−ビニルリン酸コポリマーで後処理されたアルミニウム基板上に、シリカ化合物に代えてコロイダルシリカMEK−STを含む表1に記載の溶液を、被覆物の乾燥重量が1.5g/m2となるように塗布した。具体的には、被覆溶液をワイヤ巻回26番ロッドを用いて塗布し、100℃に設定されたコンベアオーブン内で約90秒の間乾燥した。
ブラシ粗面化及び硫酸陽極酸化され、ポリエチレングリコールメチルエーテルメタクリレート−ビニルリン酸コポリマーで後処理されたアルミニウム基板上に、シリカ化合物を含まない表1に記載の溶液を、被覆物の乾燥重量が1.5g/m2となるように塗布した。具体的には、被覆溶液をワイヤ巻回26番ロッドを用いて塗布し、100℃に設定されたコンベアオーブン内で約90秒の間乾燥した。
5.15gのシラン含有モノマー1、40gのコロイダルシリカ(日産化学(株)製MEK−ST、10−20nmの粒子の30%固体MEK溶液)を200mlのフラスコに導入した。混合物をメカニカルスターラーで撹拌しつつ、フラスコを80℃に加熱した。温度が80℃に達した後、0.86gのIPA及び0.52gの脱ミネラル水をフラスコに添加した。3時間後、3.1gのトリメチルオルトホルメート(東京化成工業(株)製)を添加し、更に1時間撹拌した。撹拌後、内容物をフラスコから取り出した。不揮発分は39.4質量%であった(以下、「比較用シリカ化合物」という)。
実施例1−8及び比較例1−3で得られた感光性平版印刷版について、基板に対する感光層の接着度及び印刷時のインク滓特性について評価を行った。結果を表2に示す。画像形成は、クレオトレンドセッター3244を用いて、ドラムスピードは90rpmとし、セッティングパワーを10W(225mJ/cm2)に設定して行った。上記の各特性は実験室にて手作業でインクを付けて行われた。すなわち、画像形成された平版印刷版は1%のIPA及び1%のNA−108W(大日本インキ化学工業(株)製エッチ液)を含む湿し水で洗浄され、その一部をインクを含む布で1回、2回、3回、5回及び20回擦られた。次に、湿された非画像領域がインクを含む布でゆっくりと擦られた。幾つかの平版印刷版では、インクはこの非画像領域に移動しなかったが、その場合に、それらの平版印刷版は良好な耐インク汚れ性を有すると判定された。画像領域も上記接着度を判定するために擦られた。この擦りによる画像領域のダメージから接着度を判定した。
Claims (3)
- 少なくとも1つのエチレン性不飽和基、少なくとも1つの親水性部位及び少なくとも1つのシリルオキシ基を有する有機化合物によって表面改質されている変性シリカ粒子であって、前記有機化合物が以下の式:
RはC 1 -C 6 アルキル基であり、
Xは、-CH 2 -、-O-、-S-、及び、-NZ-から選択される2価の有機基(ZはH又はC 1 -C 6 アルキル基を表す)であり、
Yは、C 1 -C 6 アルキル基又はハロゲン原子であり、
mは0-100の整数であり、
nは0-100の整数であり、
但し、m+nは1以上であり、
oは0-10の整数であり、
pは0-5の整数であり、
qは0-10の整数であり、
但し、o+qは1以上である〕
を有する、変性シリカ粒子。 - 請求項1に記載の変性シリカ粒子と、
光重合性化合物と
を含む感光性組成物。 - 請求項2に記載の感光性組成物からなる感光層を支持体上に備える感光性平版印刷版。
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WO2020045587A1 (ja) * | 2018-08-31 | 2020-03-05 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の作製方法、平版印刷方法、及び、硬化性組成物 |
CN112638657A (zh) * | 2018-08-31 | 2021-04-09 | 富士胶片株式会社 | 平版印刷版原版、平版印刷版的制作方法、平版印刷方法及固化性组合物 |
JP7321261B2 (ja) * | 2019-06-28 | 2023-08-04 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法 |
US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
KR20220165244A (ko) * | 2020-03-13 | 2022-12-14 | 모멘티브 퍼포먼스 머티리얼즈 게엠베하 | 관능화된 실리카 입자 및 그 용도 |
JPWO2022225039A1 (ja) * | 2021-04-23 | 2022-10-27 | ||
CN113234386A (zh) * | 2021-04-30 | 2021-08-10 | 苏州赛荣建筑装饰工程有限公司 | 一种发热抗寒的隔热纤维涂层及其制备方法 |
EP4129682A1 (en) * | 2021-08-05 | 2023-02-08 | Agfa Offset Bv | A lithographic printing plate precursor |
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US4756993A (en) * | 1986-01-27 | 1988-07-12 | Fuji Photo Film Co., Ltd. | Electrophotographic photoreceptor with light scattering layer or light absorbing layer on support backside |
JPH0699136B2 (ja) * | 1989-08-02 | 1994-12-07 | 株式会社トクヤマ | 疎水化無機粒子 |
JP3235864B2 (ja) * | 1992-03-28 | 2001-12-04 | 触媒化成工業株式会社 | 無機酸化物コロイド粒子 |
JP3474330B2 (ja) * | 1995-10-03 | 2003-12-08 | Jsr株式会社 | 反応性シリカ粒子、その製法および用途 |
US6160067A (en) * | 1995-10-03 | 2000-12-12 | Dsm N.V. | Reactive silica particles, process for manufacturing the same, use of the same |
JP3819983B2 (ja) * | 1997-02-10 | 2006-09-13 | 宇部日東化成株式会社 | 樹脂被覆シリカ微粒子およびその製造方法 |
JP3724137B2 (ja) * | 1997-08-19 | 2005-12-07 | 東亞合成株式会社 | 光カチオン重合性シリカ微粒子及びその製造方法、並びに光カチオン硬化性樹脂組成物 |
US6114083A (en) * | 1997-09-12 | 2000-09-05 | Fuji Photo Film Co., Ltd. | Radiation-sensitive planographic printing plate |
US6534235B1 (en) * | 2000-10-31 | 2003-03-18 | Kansai Research Institute, Inc. | Photosensitive resin composition and process for forming pattern |
JP2002166670A (ja) * | 2000-11-30 | 2002-06-11 | Fuji Photo Film Co Ltd | 平版印刷版用原版 |
JP2003137530A (ja) * | 2001-11-02 | 2003-05-14 | Ge Toshiba Silicones Co Ltd | 微粉末シリカの表面処理方法およびポリオルガノシロキサン組成物 |
JP4690090B2 (ja) * | 2005-03-30 | 2011-06-01 | コダック株式会社 | 感光性平版印刷版 |
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US20090092923A1 (en) | 2009-04-09 |
EP1880978A4 (en) | 2012-03-28 |
CN101175695A (zh) | 2008-05-07 |
CN101175695B (zh) | 2010-06-09 |
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US7951526B2 (en) | 2011-05-31 |
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