JP5089289B2 - Ranging sensor and ranging device - Google Patents

Description

  The present invention relates to a distance measuring sensor and a distance measuring device.

  A conventional active optical distance measuring sensor irradiates light from a light source for light projection such as an LED (Light Emitting Diode), and detects reflected light from the object with a light detection element. It is known to output a signal corresponding to the distance up to. A PSD (Position Sensitive Detector) or the like is known as an optical triangulation type optical distance measuring sensor that can easily measure the distance to an object, but in recent years, in order to perform more precise distance measurement, Development of an optical distance measuring sensor of the TOF (Time-Of-Flight) type is expected.

  In addition, an image sensor that can simultaneously acquire distance information and image information with the same chip is required for in-vehicle use, factory automatic manufacturing system, and the like. If an image sensor is installed in front of the vehicle, it is expected to be used for detection / recognition of a preceding vehicle and detection / recognition of a pedestrian or the like. Apart from image information, an image sensor that acquires a distance image composed of a single distance information or a plurality of distance information is also expected. It is preferable to use the TOF method for such a distance measuring sensor.

  The TOF method emits pulsed light from a light source for projection toward an object, and detects the pulsed light reflected by the object with a light detection element, thereby making the time difference between the emission timing of the pulsed light and the detection timing. Is measuring. This time difference (Δt) is the time required for the pulsed light to fly at the speed of light (= c) twice as much as the distance d to the object (2 × d), so d = (c × Δt) / 2 is established. The time difference (Δt) can be rephrased as the phase difference between the emission pulse from the light source and the detection pulse. If this phase difference is detected, the distance d to the object can be obtained.

  The charge distribution type image sensor has attracted attention as a light detection element for performing distance measurement by the TOF method. That is, in the charge distribution type image sensor, for example, the charge generated in the image sensor in response to the incident detection pulse is distributed in one potential well during the ON period of the emission pulse, and OFF. Distribute to the other potential well during the period. In this case, the ratio of the amount of charge distributed to the left and right is proportional to the phase difference between the detection pulse and the emission pulse, that is, the time required for the pulsed light to fly at the speed of light over twice the distance to the object. It will be. Various methods can be considered as the charge distribution method.

  The distance measuring sensor described in Patent Document 1 has a PN junction diode on the surface of a semiconductor substrate, and electrons as carriers generated in response to light incident on the PN junction diode are contained in the PN junction diode. In accordance with the diffusion potential, when a voltage is applied to the left and right gate electrodes, the voltage is alternately transferred into the potential well adjacent to the gate electrode and sequentially read out. A type of distance measuring sensor that does not use a PN junction diode has also been proposed.

  Patent Document 2 discloses such a distance measuring sensor. The distance measuring sensor described in Patent Document 2 includes a first gate electrode and a second gate electrode that are disposed adjacent to each other on the surface of a semiconductor substrate. The light incident between these gate electrodes is photoelectrically converted in the semiconductor substrate, and the generated carriers are alternately increased by increasing the potential of the first gate electrode and the potential of the second gate electrode, so that the region immediately below the gate electrode Are transferred into the left and right potential wells. In order to perform charge separation more precisely, in Patent Document 2, a central gate electrode is disposed between the first gate electrode and the second gate electrode.

In this case, when light enters the region immediately below the central gate electrode, carriers are generated in response to the incident light, but an appropriate bias voltage is applied to the central gate electrode in advance, and Since the potential of the region is higher than the potential of the region immediately below the gate electrode to which no potential is applied, the probability that carriers are transferred into the region immediately below the gate electrode to which the potential is applied is increased. To do.
JP 2001-281336 A JP 2005-235893 A

  However, the potential applied to the central gate electrode is flat in the lateral direction, and therefore the lateral inclination of the potential in the region immediately below the central gate electrode tends to be highly flat. In this case, not all carriers generated in the region immediately below the central gate electrode are transferred, and some carriers remain in the region. Therefore, the distance measuring sensor described in Patent Document 2 has a problem in that carrier distribution is not precisely performed and accurate distance measurement cannot be performed.

  The present invention has been made in view of such a problem, and an object thereof is to provide a distance measuring sensor and a distance measuring apparatus capable of performing accurate distance measurement.

In order to solve the above-described problems, a distance measuring sensor according to the present invention includes a photosensitive region set on a surface of a semiconductor substrate, and first and second gates provided adjacent to the photosensitive region on the surface. An electrode and first and second semiconductor regions for reading carriers flowing from the photosensitive region to the regions immediately below the first and second gate electrodes, respectively, and the object is irradiated with pulsed light, Carriers generated in the semiconductor substrate with the incidence of reflected pulsed light are supplied with detection gate signals to the first and second gate electrodes, so that the photosensitive region is adjacent to the detection region. After being distributed to the regions directly under the first and second gate electrodes, the signals flow into the first and second semiconductor regions and are read from the signals read from the first and second semiconductor regions to the object. In the distance measuring sensor which is applied to calculate the distance, not provided with the photo gate electrode on the light-sensitive region, the conductivity type of the conductivity type and the photosensitive region of the first and second semiconductor regions On the contrary, the conductivity type of the semiconductor substrate and the photosensitive region is the same, and the impurity concentration of the photosensitive region is a region in the semiconductor substrate located immediately below the first and second gate electrodes into which the carriers flow. It is characterized in that it is set lower than the impurity concentration.

  Since the conductivity type of the photosensitive region is different from that of the first and second semiconductor regions, it depends on the potential caused by the ions ionized in the photosensitive region and the impurities ionized in the first and second semiconductor regions. The potential difference is larger than when these conductivity types are the same. When the conductivity type of the photosensitive region is the same as that of the semiconductor substrate and the impurity concentration is reduced in such a potential difference state, the lateral distribution of potential in the photosensitive region tends to be inclined only in one direction. Thus, the carriers generated in the photosensitive region can easily flow into the first and second semiconductor regions, and the remaining of carriers in the photosensitive region can be suppressed.

  Further, the distance measuring device according to the present invention is synchronized with the pulse driving signal in the distance measuring sensor, the light source that emits light, the driving circuit that supplies the light source with the pulse driving signal, and the first and second gate electrodes. A control circuit for supplying a detection gate signal and an arithmetic circuit for calculating a distance to the object from signals read from the first and second semiconductor regions are provided.

  As described above, the signal read from the first and second semiconductor regions, that is, the ratio of the charge amount of carriers accumulated in the first or second semiconductor region to the total charge amount is the above-described phase difference, That is, it corresponds to the distance to the object.

  The arithmetic circuit calculates the distance to the object according to the phase difference. Assuming that the time difference corresponding to the phase difference is Δt, the distance d is preferably given by d = (c × Δt) / 2, but an appropriate correction operation may be added to this. For example, when the actual distance is different from the calculated distance d, a coefficient β for correcting the latter is obtained in advance, and the product obtained by multiplying the calculated distance d by the coefficient β is finally obtained in the product after shipment. It is good also as a general calculation distance d. In addition, when the outside air temperature is measured and the light speed c varies depending on the outside air temperature, the distance calculation can be performed after performing the calculation for correcting the light speed c. Further, the relationship between the signal input to the arithmetic circuit and the actual distance may be stored in advance in the memory, and the distance may be calculated by a lookup table method. The calculation method can be changed depending on the sensor structure, and a conventionally known calculation method can be used.

  According to the distance measuring sensor and the distance measuring apparatus of the present invention, accurate distance measurement can be performed.

  Hereinafter, the distance measuring sensor and the distance measuring apparatus according to the embodiment will be described. The same reference numerals are used for the same elements, and duplicate descriptions are omitted.

  FIG. 1 is an explanatory diagram showing the configuration of the distance measuring apparatus.

Although the distance measuring sensor 1 of this example is a back-illuminated distance measuring sensor, it can also be a front-illuminated distance measuring sensor as described later. The distance measuring device includes a distance measuring sensor 1, a light source 3 for emitting near-infrared light, a driving circuit 4 for giving a pulse drive signal S _P to the light source 3, included in each pixel of the back-illuminated distance measuring sensor 1 first and second gate electrodes (TX1, TX2: see FIG. 5), the pulse drive signal _S gate signal detection is synchronous with the _{P S} L, a control circuit 2 to give _{S R,} the first distance measuring sensor 1 And an arithmetic circuit 5 that calculates the distance to the object H such as a pedestrian from a signal d ′ (m, n) indicating distance information read from the second semiconductor region (FD1, FD2: see FIG. 5). I have. The distance in the horizontal direction D from the distance measuring sensor 1 to the object H is defined as d.

The control circuit 2 is input to the pulse drive signal S _P to the switch 4b of the driving circuit 4. A light projecting light source 3 comprising an LED or a laser diode is connected to a power source 4a via a switch 4b. Therefore, when the pulse drive signal S _P is input to the switch 4b, a drive current having the same waveform as the pulse drive signal S _P is supplied to the light source 3, the pulse light L _P as a probe light for distance measurement from the light source 3 Is output.

When the pulse light L _P is irradiated on the object H, the pulse light is reflected by the object H, the pulse light L _D, and enters the back-illuminated distance measuring sensor 1 outputs a pulse detection signal S _D . Pulse detection signal S _D represents the total amount of charges generated in the substrate in response to the incidence of pulsed light L _D, although the timing of the rising and falling is equal to the pulse light L _D, an amount corresponding pulses corresponding to the distance d phase is delayed with respect to the light L _P.

  The distance measuring sensor 1 is fixed on the wiring board 10, and a signal d ′ (m, n) having distance information is output from each pixel via the wiring on the wiring board 10.

The waveform of the pulse drive signal S _P, a square wave of period T, the high level "1", when the low level is "0", the voltage V (t) is given by the following equation.
・ Pulse drive signal S _P :
・ V (t) = 1 (provided that 0 <t <(T / 2))
・ V (t) = 0 (provided that (T / 2) <t <T)
・ V (t + T) = V (t)

The waveforms of the detection gate signals S _L and S _R are square waves with a period T, and the voltage V (t) is given by the following equation.
・ Detection gate signal S _L :
・ V (t) = 1 (provided that 0 <t <(T / 2))
・ V (t) = 0 (provided that (T / 2) <t <T)
・ V (t + T) = V (t)
· Detection gate signal _S R (= _{S L} inversion):
・ V (t) = 0 (provided that 0 <t <(T / 2))
V (t) = 1 (provided that (T / 2) <t <T)
・ V (t + T) = V (t)

The pulse signal _{S P, S L, S R} , S D , it is assumed that has all pulse period 2 × _{T P.} Detection gate signal S _L and the pulse detection signal S _D are both the amount of charge generated in the distance measuring sensor 1 when "1" Q1, the detection gate signal S _R and the pulse detection signal S _D are both "1" In this case, the amount of charge generated in the distance measuring sensor 1 is Q2.

The phase difference between one detection gate signal S _L and the pulse detection signal S _D in the distance measuring sensor 1, the other detection gate signal S _R and the pulse detection signal S _D is the overlap period when the "1", the back surface This is proportional to the amount of charge Q2 generated in the incident type distance measuring sensor 1. That is, the charge amount Q2 is the charge amount for the period logical product of the detection gate signal S _R and the pulse detection signal S _D is "1". The total charge quantity generated in one pixel is Q1 + Q2, when the pulse width of the half cycle of the drive signal _{S P} and _{T P, Δt = T P ×} Q2 / (Q1 + Q2) long enough, with respect to the drive signal _{S P} The pulse detection signal _SD is delayed. The flight time Δt of one pulsed light is given by Δt = 2d / c, where d is the distance to the object and c is the speed of light. Therefore, two charges are used as a signal d ′ having distance information from a specific pixel. If the amount (Q1, Q2) are output, the arithmetic circuit 5, a charge amount Q1, Q2 input, based on the half cycle pulse width T _P that is known in advance, the distance to the object H d = Calculate (c × Δt) / 2 = c × _TP × Q2 / (2 × (Q1 + Q2)).

  As described above, if the charge amounts Q1 and Q2 are read out separately, the arithmetic circuit 5 can calculate the distance d. The above-described pulse is repeatedly emitted, and the integrated value can be output as the respective charge amounts Q1 and Q2.

  The ratio of the charge amounts Q1 and Q2 to the total charge amount corresponds to the above-described phase difference, that is, the distance to the object H, and the arithmetic circuit 5 determines the distance to the object H according to this phase difference. Is calculated. As described above, when the time difference corresponding to the phase difference is Δt, the distance d is preferably given by d = (c × Δt) / 2, but an appropriate correction operation may be added to this. . For example, when the actual distance and the calculated distance d are different, a coefficient β for correcting the latter is obtained in advance, and the product after shipping is obtained by multiplying the calculated distance d by the coefficient β. The calculation distance d may be used. In addition, when the outside air temperature is measured and the light speed c varies depending on the outside air temperature, the distance calculation can be performed after performing the calculation for correcting the light speed c. Further, the relationship between the signal input to the arithmetic circuit and the actual distance may be stored in advance in the memory, and the distance may be calculated by a lookup table method. The calculation method can also be changed depending on the sensor structure, and a conventionally known calculation method can be used for this.

  FIG. 2 is a plan view of the distance measuring sensor 1.

  The distance measuring sensor 1 includes a semiconductor substrate 1A having an imaging region 1B composed of a plurality of pixels P (m, n) arranged in a two-dimensional manner. From each pixel P (m, n), two charge amounts (Q1, Q2) are output as the signal d '(m, n) having the above-described distance information. Since each pixel P (m, n) outputs a signal d ′ (m, n) corresponding to the distance to the object H as a minute distance measuring sensor, the reflected light from the object H is coupled to the imaging region 1B. If an image is obtained, a distance image of the object as a collection of distance information to each point on the object H can be obtained.

  FIG. 3 is a cross-sectional view taken along the line III-III of the distance measuring sensor shown in FIG.

The distance measuring sensor 1, the pulse light _{L D} is made incident from the light incident surface 1BK. A surface 1FT opposite to the light incident surface 1BK of the back-illuminated distance measuring sensor 1 is connected to the wiring substrate 10 via an adhesive region AD. The adhesion region AD is a region including an adhesion element such as a bump, and has an insulating adhesive or filler as necessary. The semiconductor substrate 1A constituting the back-illuminated distance measuring sensor 1 has a reinforcing frame portion F and a thin plate portion TF thinner than the frame portion F, and these are integrated. The thickness of the thin plate portion TF is 10 μm or more and 100 μm or less. The thickness of the frame portion F in this example is 200 μm or more and 600 μm or less.

  FIG. 4 is a cross-sectional view of a distance measuring sensor according to a modification.

This distance measuring sensor differs from that shown in FIG. 3 only in the shape of the semiconductor substrate 1A, and the other configurations are the same. The semiconductor substrate 1A further includes reinforcing portions AF formed in a stripe shape or a lattice shape, and a thin plate portion TF is formed between the reinforcing portions AF, and these are integrated. The thickness of the reinforcing portion AF in this example is the same as the thickness of the frame portion F , and is 200 μm or more and 600 μm or less. Each pixel described above is formed in the thin plate portion TF. The thin plate portion TF is formed by wet etching using an alkaline etching solution such as KOH. The roughness of the exposed surface formed by etching is 1 μm or less.

  FIG. 5 is an enlarged view of the region V of the distance measuring sensor shown in FIG. 3 or FIG.

The back-illuminated distance measuring sensor 1 includes a semiconductor substrate 1A, 1A ′ having a light incident surface 1BK and a surface 1FT opposite to the light incident surface 1BK, and a photosensitive region 1G on the surface 1FT via an insulating layer 1E. First and second semiconductor regions for reading first and second gate electrodes TX1 and TX2 provided adjacent to each other and carriers (electrons e) flowing into regions immediately below the first and second gate electrodes TX1 and TX2, respectively. FD1 and FD2 are provided. In this example, the semiconductor substrates 1A and 1A ′ are made of Si, and the insulating layer 1E is made of SiO ₂ . By increasing the thickness of the insulating layer 1E, a fringing electric field can be formed. A preferable thickness of the insulating layer 1E for forming a fringing electric field is 50 to 5000 nm.

  The semiconductor substrate of this example includes a substrate body 1A having a light incident surface and an epitaxial layer 1A 'on the gate electrode side, but the epitaxial layer may be omitted.

  The semiconductor substrates 1A and 1A ′ are made of a low impurity concentration P-type semiconductor substrate, and the first and second semiconductor regions FD1 and FD2 are floating diffusion regions made of a high impurity concentration N-type semiconductor, and are formed in the epitaxial layer 1A ′. Is formed.

Part of the first and second semiconductor regions FD1, FD2 is in contact with a region immediately below the gate electrodes TX1, TX2 in the epitaxial layer 1A ′ of the semiconductor substrate. An antireflection film 1D is provided on the light incident surface 1BK side of the semiconductor substrates 1A and 1A ′. The surface roughness of the exposed surface of the semiconductor substrate 1A, that is, the difference between the maximum height and the minimum height of the surface irregularities is 1 μm or less. The material of the antireflection film 1D is SiO ₂ or SiN (silicon nitride).

  The region immediately below the region between the gate electrodes TX1 and TX2 is a P-type having the same conductivity type as the semiconductor substrates 1A and 1A ′, and has a lower impurity concentration than the impurity concentration of the semiconductor substrates 1A and 1A ′. It consists of a sensitive area 1G. The photosensitive region 1G has a relatively lower impurity concentration than the semiconductor substrate 1A.

Conductivity type photosensitive region 1G is different from the first semiconductor region FD1 and the conductive type of the second semiconductor region FD2, and the potential phi _PG by ionized impurities in the photosensitive region 1G, the first and second semiconductor The difference between the potentials φ _FD1 and φ _FD2 due to the impurities ionized in the regions FD1 and FD2 is larger than when the conductivity types are the same. When the conductivity type of the photosensitive region 1G is set to the same P type as that of the semiconductor substrates 1A and 1A ′ and the impurity concentration is lowered in the state where there is a potential difference in this way, the potential lateral distribution in the photosensitive region 1G is reduced. However, it becomes easy to incline only in one direction. The horizontal direction is a direction of a straight line connecting the gate electrodes TX1 and TX2. If the lateral distribution of the potential is likely to be inclined only in one direction, the carriers generated in the photosensitive region 1G are more likely to flow into the first semiconductor region FD1 and the second semiconductor region FD2, so that the inside of the photosensitive region 1G. It is possible to suppress the remaining of the carrier.

  The photosensitive region 1G is formed using an epitaxial growth method, or using an impurity diffusion method or an ion implantation method.

  The wiring substrate 10 includes a semiconductor substrate 10A made of Si, and readout wirings 11h and 15h formed on the semiconductor substrate 10A. These readout wirings 11h and 15h are respectively the first semiconductor region FD1 and the second semiconductor region FD1. It is electrically connected to the semiconductor region FD2.

  A contact electrode 11a, a pad electrode 11b, a bump 11c, a pad electrode 11d, a contact electrode 11e, an intermediate electrode 11f, and a contact electrode 11g are interposed between the first semiconductor region FD1 and the readout wiring 11h.

  A contact electrode 15a, a pad electrode 15b, a bump 15c, a pad electrode 15d, a contact electrode 15e, an intermediate electrode 15f, and a contact electrode 15g are interposed between the second semiconductor region FD2 and the read wiring 15h.

  A first gate line 12g and a second gate line 14g are provided on the semiconductor substrate 10A, and these are electrically connected to the first gate electrode TX1 and the second gate electrode TX2, respectively.

  A contact electrode 12a, a pad electrode 12b, a bump 12c, a pad electrode 12d, a contact electrode 12e, and an intermediate electrode 12f are interposed between the first gate electrode TX1 and the first gate wiring 12g.

  A contact electrode 14a, a pad electrode 14b, a bump 14c, a pad electrode 14d, a contact electrode 14e, and an intermediate electrode 14f are interposed between the second gate electrode TX2 and the second gate wiring 14g.

  Reset lines 18h and 21h are formed on the semiconductor substrate 10A, and these reset lines 18h and 21h are electrically connected to the reset drain region RD1 and the reset drain region RD2, respectively.

  A contact electrode 18a, a pad electrode 18b, a bump 18c, a pad electrode 18d, a contact electrode 18e, an intermediate electrode 18f, and a contact electrode 18g are interposed between the reset drain region RD1 and the reset wiring 18h.

  A contact electrode 21a, a pad electrode 21b, a bump 21c, a pad electrode 21d, a contact electrode 21e, an intermediate electrode 21f, and a contact electrode 21g are interposed between the reset drain region RD2 and the reset wiring 21h.

  Reset gate lines 19g and 20g are formed on the semiconductor substrate 10A, and these reset gate lines 19g and 20g are electrically connected to the reset gate electrode RG1 and the reset gate electrode RG2, respectively. ing.

  A contact electrode 19a, a pad electrode 19b, a bump 19c, a pad electrode 19d, a contact electrode 19e, and an intermediate electrode 19f are interposed between the reset gate electrode RG1 and the reset gate wiring 19g.

  A contact electrode 20a, a pad electrode 20b, a bump 20c, a pad electrode 20d, a contact electrode 20e, and an intermediate electrode 20f are interposed between the reset gate electrode RG2 and the reset gate wiring 20g.

  Each contact electrode is embedded in a contact hole provided in the insulating layers 1F, 10B, and 10C as shown in the figure.

  The adhesion area AD includes an adhesion layer AD1 made of resin and bumps 11c, 12c, 14c, 15c, 18c, 19c, and 20c for connecting the electrodes of the back-illuminated distance measuring sensor 1 to various wirings on the wiring board 10. , 21c.

  In this distance measuring device, the front surface 1FT of the back-illuminated distance measuring sensor 1 is fixed on the mounting surface M of the wiring substrate 10 via the insulating layer 1E, various electrodes, and the adhesion region AD, and the first gate electrode TX1. The second gate electrode TX2, the reset gate electrodes RG1 and RG2, and the reset drain regions RD1 and RD2 are connected to the wiring on the wiring substrate 10 via bumps. In this distance measuring device, when the back-illuminated distance measuring sensor 1 is mounted on the wiring board 10, the signal can be given to each electrode through each wiring, and the device is miniaturized.

  A light absorption layer SH made of a black resin is formed on the mount surface M of the wiring board 10 to suppress the incidence of light transmitted through the back-illuminated distance measuring sensor 1 to the wiring board 10 and The light reflected by the wiring on the wiring board 10 is prevented from returning to the back-illuminated distance measuring sensor 1 and causing crosstalk. The various electrodes or wirings described above are made of aluminum or polysilicon. The thickness t1 of the semiconductor substrate made of Si in the back-illuminated distance measuring sensor 1 is 10 to 100 μm, preferably 15 to 50 μm, and 20 μm in this example.

  In this back-illuminated distance measuring sensor 1, carriers generated in the deep part of the semiconductor in response to the incidence of light for projection are drawn into a potential well provided in the vicinity of the carrier generation position on the side opposite to the light incident surface 1BK. High speed and accurate distance measurement are possible.

Semiconductor substrate 1A, 1A 'pulse light L _D from the light incident surface (back surface) object entering from 1BK of the semiconductor substrate 1A, 1A' leads to the photosensitive region 1G which is provided on the surface side of the. Carriers generated in the semiconductor substrates 1A and 1A ′ with the incidence of the pulsed light are distributed from the photosensitive region 1G to the regions immediately below the first and second gate electrodes T X1 and TX2 adjacent thereto. That is, the first and second gate electrodes TX1, TX2 to the light source drive signal _S gate signal detection is synchronous with the _{P S} L, the _{S R,} via the wiring board 10, given alternately photosensitive region 1G and Carriers generated in the semiconductor region in the vicinity flow into regions immediately below the first and second gate electrodes TX1 and TX2, respectively, and flow into the first and second semiconductor regions FD1 and FD2.

The ratio of the charge amounts Q1 and Q2 of the carriers accumulated in the first semiconductor region FD1 or the second semiconductor region FD2 to the total charge amount (Q1 + Q2) is the emitted pulse light emitted by applying the drive signal _SP to the light source. This corresponds to the phase difference of the detected pulse light that has returned by reflecting the emitted pulse light by the object H.

Even if the charge distribution speed is increased by increasing the frequency of the drive signals (detection gate signals S _L and S _R ) to the gate electrodes TX1 and TX2, it is generated in response to the incidence of near-infrared light. Since the carrier generation region is closer to the surface 1FT on the opposite side than the light incident surface 1BK of the semiconductor substrate 1A, many carriers flow from the photosensitive region 1G into the first and second semiconductor regions FD1, FD2. The accumulated charges Q1 and Q2 can be read from the region via the wirings 11h and 15h of the wiring board 10. In addition, since light having a wavelength shorter than near infrared tends to be removed in the region on the light incident surface 1BK side of the semiconductor substrates 1A and 1A ′, a visible light cut filter is not provided on the light incident surface side. The detection accuracy of the detection pulse light for distance measurement can be improved.

  The N-type first and second semiconductor regions FD1 and FD2 serving as the floating diffusion regions are reset after the accumulated charges are read. That is, the reset drain regions RD1 and RD2 are N-type, and are connected to the power supply potential via the reset wirings 18h and 21h on the wiring substrate 10, and are connected to the reset gate electrodes RG1 and RG2 for the reset gate. When a positive potential is applied via the wirings 19g and 20g, the first and second semiconductor regions FD1 and FD2 and the reset drain regions RD1 and RD2 are turned on, and the first and second semiconductor regions FD1 and FD2 are reset. The

The thickness / impurity concentration of each semiconductor region is as follows.
Substrate body 1A: thickness 10 to 100 μm / impurity concentration 1 × 10 ¹² to 10 ¹⁹ cm ⁻³
Epitaxial layer 1A ′: thickness 1 to 5 μm / impurity concentration 1 × 10 ¹² to 10 ¹⁶ cm ⁻³
Semiconductor regions FD1, FD2: thickness 0.1 to 0.4 μm / impurity concentration 1 × 10 ¹⁸ to 10 ²⁰ cm ⁻³
Photosensitive region 1G: thickness 0.2 to 3 μm / impurity concentration 1 × 10 ¹² to 10 ¹⁵ cm ⁻³
Reset drain regions RD1 and RD2: thickness 0.1 to 0.4 μm / impurity concentration 1 × 10 ¹⁸ to 10 ²⁰ cm ⁻³

  Note that a reference potential such as a ground potential is applied to the semiconductor substrates 1A and 1A 'via a back gate or a through electrode.

  FIG. 6 is a cross-sectional view in the vicinity of the back gate.

  That is, in order to fix the potentials of the semiconductor substrates 1A and 1A ′ of the back-illuminated distance measuring sensor 1 to the reference potential, the distance measuring sensor according to the present embodiment has a high concentration in the P-type epitaxial layer 1A ′. A P-type back gate semiconductor region BG containing impurities is provided. A ground wiring 16h is provided on the semiconductor substrate 10A of the wiring substrate 10 provided with the signal readout circuit. A contact electrode 16a, a pad electrode 16b, a bump 16c, a pad electrode 16d, a contact electrode 16e, an intermediate electrode 16f, and a contact electrode 16g are interposed between the back gate semiconductor region BG and the ground wiring 16h. Electrically connected.

  FIG. 7 is a sectional view of the vicinity of the through electrode.

  In order to fix the potential of the semiconductor substrate 1A of the back-illuminated distance measuring sensor 1 to the reference potential, a P-type semiconductor layer such as a P-type diffusion region W4 embedded in the substrate is used instead of the back gate electrode. However, the through electrode 17x electrically connected thereto may be provided. A ground wiring 17 h is provided on the semiconductor substrate 10 </ b> A of the wiring substrate 10. A contact electrode 17a, a pad electrode 17b, a bump 17c, a pad electrode 17d, a contact electrode 17e, an intermediate electrode 17f, and a contact electrode 17g are interposed between the through electrode 17x and the ground wiring 17h. Connected to.

  FIG. 8 is a potential diagram in the vicinity of the substrate surface for explaining the carrier accumulation operation according to the embodiment.

In this potential diagram, the downward direction is the positive direction of the potential. During the light incidence, the potential phi _PG in the photosensitive region 1G, when the potential of the region directly under the adjacent gate electrodes when no bias (phi _TX2) and a reference potential is set higher than the substrate potential. That is, the potential φ _TX2 of a partial region of the substrate is made of a P-type semiconductor, and negatively ionized acceptors exist in this region. The impurity concentration of the photosensitive region 1G are the low concentration, the potential phi _PG is higher than the potential phi _TX2, the potential diagram of this region becomes recessed downward of the drawing.

In the first and second semiconductor regions FD1 and FD2 doped with the N-type impurity, since the N-type impurity is added, the potential is recessed in the positive direction, and when a high potential is applied to the gate electrode TX1, potential phi _PG in the photosensitive region 1G is easily inclined only in the direction of one of the semiconductor regions FD1.

In the figure, the potential φ _TX1 in the region immediately below the gate electrode _TX1 , the potential φ _{TX2 in} the region immediately below the gate electrode TX2, the potential φ _{FD1 in} the semiconductor region _FD1 , the potential φ _{FD2 in} the semiconductor region _FD2 , and the reset drain RD1 potential phi _RD1, potential phi _RD2 of the reset drain RD2, regions of potential phi _RG1 immediately below the reset gate electrode RG1, potential phi _RG2 of the region immediately below the reset gate electrode RG2 is shown.

High potential of the detection gate signal S _L is inputted to the gate electrode TX1, the carriers generated in the vicinity of the photosensitive region 1G (electrons e), according to the potential gradient, through a region immediately below the gate electrode TX1 Thus, the charge is accumulated in the potential well of the first semiconductor region FD1, and the charge amount Q1 is accumulated in the potential well.

  FIG. 9 is a potential diagram in the vicinity of the substrate surface for explaining the carrier accumulation operation.

During the light incidence, the potential phi _PG in the photosensitive region 1G is slightly higher than the potential phi _TX1 in the region immediately below the adjacent gate electrodes TX1.

Following detection gate signal S _L, the high potential of the detection gate signal S _R is inputted to the gate electrode TX2, the carriers generated in the photosensitive region 1G (electrons e), according to potential gradient Then, it is accumulated in the potential well of the second semiconductor region FD2 via the region immediately below the gate electrode TX2, and the charge amount Q2 is accumulated in this potential well.

  As described above, the charges Q1 and Q2 accumulated in each potential well are read out to the outside through the read wirings 11h and 15h (see FIG. 5) provided on the wiring board 10.

  Further, if the gate electrodes TX1 and TX2 are made of metal or a metal film is formed on the light incident surface side as polysilicon, the light once transmitted through the semiconductor substrate is reflected by this metal, so that the light Use efficiency can be increased.

  Further, a visible band cut filter may be deposited on the light incident surface side of the semiconductor substrate. Moreover, the above-mentioned distance measuring sensor can also be modularized including a light source.

  10 and 11 are potential diagrams in the vicinity of the substrate surface of the distance measuring sensor according to the first comparative example, and show the state of carrier transfer when a high potential is applied to the gate electrodes TX1 and TX2, respectively.

  The distance measuring sensor of the first comparative example is the same as the distance measuring sensor shown in FIG. 5 except that a photogate electrode PG is arranged between the gate electrodes TX1 and TX2 as shown in FIG. In this configuration, charge is distributed by applying a high potential. Note that the distance measuring sensor according to the first comparative example does not include the photosensitive region 1G.

In the first comparative example, the higher the flatness of the potential phi _PG region immediately below the photogate, carriers (electrons e) is the amount flowing into the left and right potential well, less than that of the structure according to the embodiment . That is, in the distance measuring sensor according to the above-described embodiment, it is expected that a larger proportion of carriers are transferred to each potential well than the distance measuring sensor according to the first comparative example.

  FIG. 12 is a diagram showing a detailed potential distribution in the vicinity of the surface of the semiconductor substrate of the distance measuring sensor according to the above embodiment, and this potential distribution is calculated by simulation.

  A photosensitive region 1G is formed in the region indicated by the light receiving area, and the semiconductor regions FD1 and FD2 are located at two positions separated by about 6 μm from the center position between the semiconductor regions FD2 and FD1 and the photosensitive region 1G. Gate electrodes TX1 and TX2 are located at This figure shows the potential distribution when a high potential is applied to the gate electrode TX2. However, the potential in the light receiving area is inclined only in one direction, and carriers generated inside the substrate are efficiently generated in the potential well. It has come to flow into.

  FIG. 13 is a diagram showing a detailed potential distribution near the surface of the semiconductor substrate according to the second comparative example, and this potential distribution is calculated by simulation.

  The distance measuring sensor of the second comparative example does not include the photogate electrode as in the first comparative example, and does not include the light-sensitive region 1G having a low impurity concentration. It is the same as the comparative example. This figure shows the potential distribution when a high potential is applied to the gate electrode TX2, but the potential in the light receiving area has a low potential at the 0 μm position (center position between the gate electrodes) and has a convex shape. Yes. Therefore, a part of the carriers generated inside the substrate, that is, the carriers generated in the negative region from the position 0 μm flow into the side opposite to the originally intended right potential well.

  In this respect, the distance measuring sensor according to the embodiment is superior to the distance measuring sensor according to the comparative example 2.

  FIG. 14 is a plan view of the distance measuring sensor when the distance measuring sensor according to the above-described embodiment is viewed from the gate electrode side. Note that the insulating layer is omitted.

  In this distance measuring sensor, gate electrodes TX1 and TX2 are disposed adjacent to the photosensitive region 1G. Between the gate electrodes TX1 and TX2 and the reset gate electrodes RG1 and RG2, semiconductor regions FD1 and FD2 as floating diffusion regions are positioned, respectively. Reset drain regions RD1 and RD2 are located outside the semiconductor regions FD1 and FD2.

  On the semiconductor region FD1, electrodes 11a that are in contact with the semiconductor region FD1 are provided at a plurality of locations. On the semiconductor region FD2, electrodes 15a that are in contact with the semiconductor region FD2 are provided at a plurality of locations. An electrode 18a that contacts the reset drain region RD1 at a plurality of locations is provided on the reset drain region RD1, and an electrode 21a that contacts the reset drain region RD2 at a plurality of locations is provided on the reset drain region RD2. Is provided.

  FIG. 15 is a circuit diagram showing a carrier reading circuit.

  In the back-illuminated distance measuring sensor described above, the distance measuring sensor is mounted on the wiring board via bumps. In this case, the carrier readout transistor connected to the pixel P (m, n) is provided on the wiring board side, and the number of elements included in the distance measuring sensor alone is reduced. As will be described later, the distance measuring sensor can be a front-illuminated type, and a carrier reading transistor can be disposed on the same semiconductor substrate. In this case, the transistor is provided in the semiconductor substrate of the distance measuring sensor. Therefore, the number of elements included in a single pixel (indicated by a dotted line as P ′ (m, n)) increases. In other words, if the pixel area of the back-illuminated distance measuring sensor is the same as that of the front-illuminated distance measuring sensor, the area of the photosensitive region can be increased.

  In the figure, the gate electrodes TX1, TX2, RG1, and RG2 constitute the gate electrodes of the field effect transistors. For simplification of description, these field effect transistors are represented by the corresponding gate electrodes (TX1). , TX2, RG1, and RG2).

  When the high potential is applied to the gate electrode TX1, the field effect transistor (TX1) is ON (the field effect transistor (TX2) is OFF), and the generated carrier in the photosensitive region 1G is It flows into the potential well constituted by the first semiconductor region FD1 through the transistor (TX1).

Carriers (charges) accumulated in the first semiconductor region FD1 are input to the gate electrode (read wiring 11h: see FIG. 5) of the field effect transistor QFD1. The power supply potential V + and the source of the selection transistor SEL1 are connected in accordance with the potential input to the gate electrode (readout wiring 11h) of the field effect transistor QFD1, and when a read potential is applied to the gate electrode of the selection transistor SEL1 (selection signal) S _SEL is at a high level), and the charge corresponding to the amount of charge of the carriers accumulated in the first semiconductor region FD1 is held in the sample hold circuit S / H (1) via the vertical read wiring LL. The charges accumulated in the sample hold circuit S / H (1) are output to the horizontal read line H1 when the horizontal read signal from the horizontal shift register is input to the switch SW1.

When the reading of the charge is finished, a high potential is applied to the reset gate electrode RG1 (the reset signal S _RESET is at a high level), the field effect transistor (RG1) is turned on, and the reset drain region RD1 connected to the power supply potential V ++ 1 The semiconductor region FD1 is connected, and the first semiconductor region FD1 is reset. Note that when electrons are accumulated in the first semiconductor region FD1, the potential thereof decreases as the negative charge increases.

  Note that the sample-and-hold circuit S / H (1) samples the charge from the drain of the selection transistor SEL1 not only when the selection signal is high level but also when the reset signal is high level. 1 The potential of the semiconductor region FD1 can also be held. That is, by holding both the potential of the first semiconductor region FD1 at the time of reset and the potential of the first semiconductor region FD1 after charge accumulation in the sample hold circuit S / H (1), the difference between these potentials is changed to the first. 1 It is possible to detect the amount of charge accumulated in the semiconductor region FD1 and output the difference as the accumulated charge amount Q1 to the horizontal readout line H1 via the switch SW1.

  When the high potential is applied to the gate electrode TX2, the field effect transistor (TX2) is ON (the field effect transistor (TX1) is OFF). It flows into the potential well constituted by the second semiconductor region FD2 through the transistor (TX2).

Carriers (charges) accumulated in the second semiconductor region FD2 are input to the gate electrode (readout wiring 15h: see FIG. 5) of the field effect transistor QFD2. The power supply potential V + and the source of the selection transistor SEL2 are connected in accordance with the potential input to the gate electrode (readout wiring 15h) of the field effect transistor QFD2, and when a read potential is applied to the gate electrode of the selection transistor SEL2 (selection signal) S _SEL is at a high level), and the charge corresponding to the amount of charge of the carriers accumulated in the second semiconductor region FD2 is held in the sample hold circuit S / H (2) via the vertical read wiring RL. The charges accumulated in the sample hold circuit S / H (2) are output to the horizontal read line H2 when the horizontal read signal from the horizontal shift register is input to the switch SW2.

When the reading of charges is completed, a high potential is applied to the reset gate electrode RG2 (the reset signal S _RESET is at a high level), the field effect transistor (RG2) is turned on, and the reset drain region RD2 connected to the power supply potential V ++ The two semiconductor regions FD2 are connected, and the second semiconductor region FD2 is reset. Note that when electrons are accumulated in the second semiconductor region FD2, the potential thereof decreases as the negative charge increases.

  Note that if the sample-and-hold circuit S / H (2) samples the charge from the drain of the selection transistor SEL2 not only when the selection signal is high level but also when the reset signal is high level, 2 The potential of the semiconductor region FD2 can also be held. That is, by holding both the potential of the second semiconductor region FD2 at the time of reset and the potential of the second semiconductor region FD2 after charge accumulation in the sample hold circuit S / H (2), the difference between these potentials is changed to the first. 1 It is possible to detect the amount of charge accumulated in the semiconductor region FD2 and output the difference as the accumulated charge amount Q2 to the horizontal readout line H2 via the switch SW2.

  A charge amount Q1 is input to the horizontal read line H1, and a charge amount Q2 is input to the horizontal read line H2, and is output to the outside.

  FIG. 16 is a timing chart of charge reading.

16A is a pulse drive signal S _P , FIG. 16B is a detection gate signal S _L , FIG. 16C is a detection gate signal S _R , FIG. _16D is a reset signal S _RESET , 16 (e) is a selection signal _{SSEL (i)} input to the gate electrode of the selection transistor SEL1 (SEL2) in the i-th row, and FIG. 16 (f) is a gate electrode of the selection transistor SEL1 (SEL2) in the i + 1-th row. The input selection signal S _{SEL (i + 1)} , FIG. _16G shows the potential φ _FD (φ _FD1 , φ _FD2 ) of the floating diffusion region (first semiconductor region FD1 or second semiconductor region FD2) as a representative. ).

When the selection signal _{SSEL (i)} is set to the high level, the charge accumulated in each semiconductor region of the i-th pixel row is read (time t _{1 to} t ₃ ), and all the pixel rows are reset. When the signal S _RESET becomes high level (time t _{1 to} t ₂ ), the reset is performed and the potential φ _FD of the floating diffusion region becomes high, and then the pulse drive signal S from time t ₃ onward. _P is applied to the light source, and gate signal S _L for detection in synchronization with this, the detection gate signal S _R is the gate electrode TX1, TX2 shifted a half period from now, between the first detection cycle period T _F, are given .

As the electrons accumulate in the floating diffusion region, the potential φ _FD decreases. In the period from time t _{4 to} t ₇ , the selection signal S _{SEL (i + 1)} of the target pixel row is set to the high level, and in the period from time t _{5 to} t ₆ , the reset signal S _{RESET is set} to the high level to perform the reset. . Between the selected read start time t ₄ and the reset start time t _5, the signal sampling time t (SAMPLE) is set, as described above, a value corresponding to the charge amount accumulated in the floating diffusion region is sampled Is done. Further, the reset signal sampling time t (RESET) is set between the reset end time t6 and the selective read end time t7. As described above, a value corresponding to the potential of the floating diffusion region at the time of reset is sampled. Is done. Thereafter, this operation is repeated.

  Next, an example of application to the surface incidence type distance measuring sensor having the above structure will be described. The circuit structure can also be applied to a back-illuminated distance measuring sensor.

  FIG. 17 is a plan view of the surface incidence type distance measuring sensor 1.

  The distance measuring sensor 1 includes a semiconductor substrate 1A having an imaging region 1B composed of a plurality of pixels P (m, n) arranged in a two-dimensional manner. Each pixel P (m, n) has the same circuit structure as the pixel P ′ (m, n) shown in FIG. From each pixel P (m, n), two charge amounts (Q1, Q2) are output as the signal d '(m, n) having the above-described distance information. Since each pixel P (m, n) outputs a signal d ′ (m, n) corresponding to the distance to the object H as a minute distance measuring sensor, the reflected light from the object H is coupled to the imaging region 1B. If an image is obtained, a distance image of the object as a collection of distance information to each point on the object H can be obtained.

  On the semiconductor substrate 1A, there is provided a sample hold circuit group SHG having the sample hold circuit S / H shown in FIG. 15 for each pixel column, and each sample hold circuit S / H is shown in FIG. The switches SW1 and SW2 are connected to the horizontal readout lines H1 and H2 through a readout switch group RS having each pixel column. The horizontal read lines H1 and H2 are input to the amplifier AP. Each switch of the read switch group RS is turned ON / OFF by a horizontal read signal from a horizontal shift register HS formed on (or in the vicinity of) the semiconductor substrate 1A.

A vertical shift register VS is formed on (or in the vicinity of) the semiconductor substrate 1A, and the above-described selection signals _{SSEL (i), SSEL (i + 1)} ,. Are sequentially applied to the gate electrodes of the transistors SEL1 (SEL2) (see FIG. 15). Note that the reset signal is also supplied from the vertical shift register VS.

  The reference clock signal from the timing generation circuit TG is input to the horizontal shift register HS and the vertical shift register VS, and the horizontal shift register HS and the vertical shift register VS receive a horizontal read signal and a selection signal based on the reference clock signal. And a reset signal.

  FIG. 18 is a cross-sectional view of one pixel in the surface incidence type distance measuring sensor.

  A light shielding film SHL having an opening above the photosensitive region 1G is disposed on the light incident surface side. This structure is the same as that of the back-illuminated distance measuring sensor 1 shown in FIG. 5 except that the semiconductor substrates 1A and 1A ′ are thicker than the back-illuminated distance measuring sensor. . The thickness of the semiconductor substrates 1A and 1A 'is 200 μm or more, and the antireflection film 1D on the back side of the substrate shown in FIG. 5 is omitted.

  That is, the distance measuring sensor 1 also has a photosensitive region 1G set on the surface of the semiconductor substrates 1A and 1A ′, and first and second gate electrodes provided on the surface adjacent to the photosensitive region 1G. TX1 and TX2 and first and second semiconductor regions FD1 and FD2 for reading out carriers flowing from the photosensitive region 1G into the regions immediately below the first and second gate electrodes TX1 and TX2, respectively. The conductivity type (N type) of the semiconductor regions FD1, FD2 and the conductivity type (P type) of the photosensitive region 1G are opposite, and the conductivity type (P type) of the semiconductor substrates 1A, 1A ′ and the photosensitive region 1G is The impurity concentration of the photosensitive region 1G is the same as that of the semiconductor substrates 1A and 1A ′.

  FIG. 19 is a cross-sectional view of one pixel in the distance measuring sensor according to the first comparative example.

  The distance measuring sensor of the first comparative example has a configuration in which a photogate electrode PG is disposed between the gate electrodes TX1 and TX2, and a slight potential is applied to the photogate electrode PG to perform charge distribution. Further, the distance measuring sensor according to the first comparative example does not include the photosensitive region 1G.

As described above, in the distance measuring sensor of the first comparative example, the flatness of the potential φ _{PG in} the semiconductor region immediately below the photogate electrode PG is increased, and the amount of carriers (electrons e) flowing into the left and right potential wells is increased. , Less than that of the structure according to the embodiment. That is, in the distance measuring sensor according to the above-described embodiment, it is expected that a larger proportion of carriers are transferred to each potential well than the distance measuring sensor according to the first comparative example.

  Note that the above-described light sensitive area 1G may be one for each distance measuring sensor, and a plurality of minute distance measuring sensors including the light sensitive area 1G are arranged in a one-dimensional or two-dimensional manner as pixels. It is good also as a ranging sensor which can obtain the distance image. It is also possible to provide a light-shielding film SHL opened only above the photosensitive region 1G on the light incident surface side of the back-illuminated distance measuring sensor 1, whereby crosstalk due to oblique incidence on the semiconductor regions FD1 and FD2. Can also be reduced.

  As described above, the distance measuring sensor described above is a sensor that performs distance measurement by taking out a signal that depends on the delay time of the return light reflected from the measurement object by the repeated pulsed light projected from the light source. Insulating layer 1E provided on semiconductor substrates 1A and 1A ′ having one conductivity type, two gate electrodes TX1 and TX2 arranged at a predetermined interval on insulating layer 1E, and gate electrodes TX1 and TX2, respectively. On the other hand, it is composed of floating diffusion regions FD1 and FD2 provided at the lower layer at the end thereof, and a semiconductor region immediately below the two gate electrodes TX1 and TX2 and a semiconductor region between the two gate electrodes TX1 and TX2 The photosensitive region 1G having the same conductivity type as that of the semiconductor substrate and located at least between the gate electrodes TX1 and TX2 is formed on the semiconductor substrate 1A. Than 1A 'made of low-concentration impurity diffusion layer.

It is explanatory drawing which shows the structure of a distance measuring device. 2 is a plan view of the distance measuring sensor 1. FIG. FIG. 3 is a sectional view of the distance measuring sensor shown in FIG. 2 along arrows III-III. It is sectional drawing of the distance measuring sensor which concerns on a modification. FIG. 5 is an enlarged view of a region V of the distance measuring sensor shown in FIG. 3 or FIG. 4. It is sectional drawing of the back gate vicinity. It is sectional drawing of the penetration electrode vicinity. FIG. 5 is a potential diagram in the vicinity of the substrate surface for explaining a carrier accumulation operation according to the embodiment. It is a potential diagram in the vicinity of the substrate surface for explaining the carrier accumulation operation. It is a potential diagram near the substrate surface of the distance measuring sensor according to the first comparative example. It is a potential diagram near the substrate surface of the distance measuring sensor according to the first comparative example. It is a figure which shows the detailed potential distribution of the semiconductor substrate surface vicinity of the ranging sensor which concerns on embodiment. It is a figure which shows the detailed potential distribution of the semiconductor substrate surface vicinity which concerns on a 2nd comparative example. It is a top view of the ranging sensor which looked at the ranging sensor which concerns on the above-mentioned embodiment from the gate electrode side. It is a circuit diagram which shows the read-out circuit of a carrier. It is a timing chart of charge reading. 1 is a plan view of a surface incidence type distance measuring sensor 1. FIG. It is sectional drawing of 1 pixel in a surface incidence type distance measuring sensor. It is sectional drawing of 1 pixel in the ranging sensor which concerns on a 1st comparative example.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1A ... Semiconductor substrate, 1G ... Photosensitive area | region, TX1, TX2 ... Gate electrode, FD1, FD2 ... Semiconductor area | region (floating diffusion area | region).

Claims (2)

A photosensitive region set on the surface of the semiconductor substrate;
First and second gate electrodes provided adjacent to the photosensitive region on the surface;
First and second semiconductor regions for reading out carriers flowing from the photosensitive region into regions immediately below the first and second gate electrodes, respectively;
With
Pulse light is applied to the object, and carriers generated in the semiconductor substrate with the incidence of the pulse light reflected by the object are given detection gate signals to the first and second gate electrodes. Accordingly, after being distributed from the photosensitive region to the region immediately below the first and second gate electrodes adjacent thereto, the light flows into the first and second semiconductor regions and is read from the first and second semiconductor regions. In the distance measuring sensor applied to calculate the distance to the object from the issued signal,
No photogate electrode is provided on the photosensitive region,
The conductivity type of the first and second semiconductor regions and the conductivity type of the photosensitive region are opposite,
The semiconductor substrate and the photosensitive region have the same conductivity type, and
The impurity concentration of the photosensitive region is set lower than the impurity concentration of the region located immediately below the first and second gate electrodes into which the carriers flow in the semiconductor substrate.
A distance measuring sensor characterized by that. A distance measuring sensor according to claim 1;
A light source that emits light;
A drive circuit for applying a pulse drive signal to the light source;
A control circuit for providing a detection gate signal in synchronization with the pulse drive signal to the first and second gate electrodes;
A distance measuring apparatus comprising: an arithmetic circuit that calculates a distance to an object from signals read from the first and second semiconductor regions.

Images