JP5051994B2 - Solid-state imaging device, driving method of solid-state imaging device, and imaging device - Google Patents

Description

  The present invention relates to a solid-state imaging device, a driving method for the solid-state imaging device, and an imaging device, and in particular, a solid-state imaging device that achieves a wide dynamic range by a technique for controlling the gate level of a transfer transistor of a pixel, The present invention relates to an imaging apparatus using the solid-state imaging apparatus as an imaging device.

  FIG. 11 shows a basic configuration of a CMOS type solid-state imaging device, for example. As shown in FIG. 11, pixels 101 including photoelectric conversion elements are two-dimensionally arranged in a matrix to form a pixel array unit (imaging region) 102. The pixel array section 102 is provided with a vertical signal line 103 for each column and a plurality of drive control lines 104 for each row with respect to the matrix-like pixel arrangement. As peripheral circuits of the pixel array unit 102, a vertical scanning circuit 105, a column circuit (column parallel signal processing circuit) 106, a horizontal scanning circuit 107, and an output circuit 108 are provided.

  The vertical scanning circuit 105 scans each pixel 101 of the pixel array unit 102 in the vertical direction (vertical direction) in units of rows for each shutter row and readout row, and for the shutter row, sweeps out the signals of the pixels in that row. In addition to supplying a shutter pulse for performing reading, a reading pulse for reading a signal of a pixel in the row is supplied to the reading row.

  The column circuit 106 performs predetermined signal processing on signals output from the pixels 101 in the readout row selected by the vertical scanning by the vertical scanning circuit 105 through the vertical signal line 103 and temporarily holds the signals. The horizontal scanning circuit 107 horizontally scans the column circuit 106 and sequentially outputs signals of pixels for one row (one line) temporarily held in the column circuit 106. The output circuit 108 processes and outputs a signal from the column circuit 106. A MOS transistor is connected as the current source 109 outside the imaging area of the vertical signal line 103.

  FIG. 12 shows the scanning timing of the pixel array unit 102. In FIG. 12, the vertical axis indicates the row address Vaddr of the pixel array unit 102, and the horizontal axis indicates time. Vsync is a vertical synchronization signal, and Hsync is a horizontal synchronization signal.

  At the generation timing of the vertical synchronization pulse Vsync, the vertical scanning circuit 105 starts scanning the readout row. Note that the scanning of the shutter row is started from a timing before the scanning of the readout row. A scanning period from the shutter row to the readout row is an exposure period (signal charge accumulation period) of the photoelectric conversion element of the pixel 101.

  In FIG. 12, a period from when the readout row scans the pixel array portion 102 to the last row until the scanning starts again from the first row is referred to as a vertical blanking period (VBLK). Further, a period from when the shutter row scans the pixel array unit 102 to the last row to when scanning starts again from the first row is called a shutter blanking period (SBLK).

  Here, the readout operation of the signal charges photoelectrically converted by the photoelectric conversion element of the pixel 101, that is, there is a readout row and a shutter row, and a period between the scanning timing of the readout row and the scanning timing of the shutter row is an exposure period. In the operation in the (signal charge accumulation period), only the amount of light in the range until the charge accumulated in the photoelectric conversion element overflows (the saturation level range of the photoelectric conversion element) can be detected.

  If the amount of light exceeds that, the amount of light photoelectrically converted by the photoelectric conversion element overflows, so that the amount of light cannot be detected. Therefore, in the case of a subject with extremely different contrast in the screen, for example, when the aperture or shutter speed is adjusted to the dark part of the subject, the photoelectric conversion element is saturated in the bright part of the subject, and there is no gradation. The image is captured as a pure white subject (without light intensity detection).

  In order to solve such a problem, various techniques for expanding the dynamic range have been proposed. For example, two signals with different accumulation times are output from a photoelectric conversion element within one horizontal period, and contrast enhancement processing is performed on these two signals after A / D conversion to synthesize the luminance dynamic. (For example, refer to Patent Document 1).

  In addition, the signal charge of a certain level or more accumulated in the photoelectric conversion element is swept away at the timing of the wide dynamic range shutter, and the signal charge is accumulated until the readout timing again, thereby widening the dynamic range. Is also known (see, for example, Patent Document 2).

JP 2002-335451 A JP 2001-189893 A

  However, since the conventional technique described in Patent Document 1 employs a configuration in which reading is performed twice in one horizontal period, two signal lines for transmitting two signals from the pixel to the analog signal processing unit are provided for each pixel column. In addition to wiring, it is necessary to provide two systems of circuits that receive two signals in the analog signal processing unit, which increases the chip area and increases the circuit area of the analog signal processing unit. In other words, the recent miniaturization of the chip area and the miniaturization of the pixel cell are hindered.

  On the other hand, the conventional technique described in Patent Document 2 has the problems described below, although the above-described problem of the conventional technique described in Patent Document 1 is not present. As will be described later, in addition to the photoelectric conversion element, the pixel includes various transfer transistors that transfer signal charges photoelectrically converted by the photoelectric conversion element to the signal detection unit, reset transistors that reset the signal detection unit, and the like. It is assumed that a transistor is provided.

  In the prior art described in Patent Document 2, by controlling the potential level of a pulse that drives a transfer transistor that transfers signal charges from a photoelectric conversion element to a signal detection unit, charges of a certain level or more accumulated in the photoelectric conversion element The operation that sweeps away is realized. Before performing the sweeping-out operation, the signal detection unit is set to the drain level of the reset transistor by bringing the reset transistor into a conductive state. Thereafter, the reset transistor is turned off, and signal charges are swept away from the photoelectric conversion element through the signal detection unit.

  What is important here is that by controlling the gate level of the transfer transistor, only the signal charge above a certain level is swept away from the photoelectric conversion element, and then the signal charge is re-accumulated to realize a wide dynamic range technology. It is a point. In this signal charge sweeping-out operation, the reset transistor is turned off once before the photoelectric conversion element is swept away.

  However, if the reset transistor is turned off once before the signal charge from the photoelectric conversion element is swept away, the potential of the signal detection unit is in a floating state, so that the potential fluctuates. Will occur. Specifically, for the following reasons (1) to (3), it is considered that the potential of the signal detection unit varies particularly on the lower side.

(1) Potential fluctuation due to electric charge overflowing from the photoelectric conversion element after the reset transistor is turned off. (2) By electrostatic capacitive coupling between the gate of the reset transistor and the diffusion layer by turning the reset transistor off. Potential fluctuation (3) Potential fluctuation due to the swept away charge during the period when the charge is swept away from the photoelectric conversion element

  If the potential level of the signal detector fluctuates to the lower side, when the charge is swept away from the photoelectric conversion element, it cannot be completely swept away during a certain sweeping period, or the photoelectric conversion element side from the worst signal detector It is conceivable that a state in which electric charge flows into the substrate occurs. Further, since the signal detection unit is in a floating state, the amount of sweeping when the charge is swept away varies.

  Therefore, the present invention adopts a technique for controlling the gate level of the transfer transistor, thereby enabling to cope with the miniaturization of the chip area and the microminiaturization of the pixel cell and suppressing the potential fluctuation of the signal detection unit. Accordingly, an object of the present invention is to provide a solid-state imaging device, a driving method of the solid-state imaging device, and an imaging device capable of expanding the dynamic range while eliminating the problems caused by the potential fluctuation.

In order to achieve the above object, in the present invention, pixels having a photoelectric conversion element, a transfer transistor that transfers charges accumulated in the photoelectric conversion element to a signal detection unit, and a reset transistor that resets the signal detection unit are arranged in a matrix. A two-dimensionally arranged pixel array unit, an electronic shutter operation that sweeps away charges accumulated in the photoelectric conversion elements while scanning each pixel of the pixel array unit, and charges accumulated in the photoelectric conversion elements Scanning means for performing a read-out operation for reading out and a half-shutter operation for sweeping away a part of the charge accumulated in the photoelectric conversion element in the exposure period from the electronic shutter operation to the read-out operation by overflowing the signal detection unit in the solid-state imaging device including bets, a reset pulse for reset operation before Symbol reset transistor Even without is in the active state, adopts a configuration in which a transfer pulse for transferring operating the transfer transistor when in a state of fixing the potential of the signal detection unit in the active state perform the half shutter operation.

  In a solid-state imaging device that achieves a wide dynamic range by controlling the gate level of the pixel transfer transistor, the transfer pulse supplied to the gate of the transfer transistor is at least active when the reset pulse is in an active state during half shutter operation. By making the active state and performing the half-shutter sweeping operation, the potential of the signal detection unit is fixed to the potential of the charge sweeping-out side through the reset transistor, so that the potential variation of the signal detection unit is suppressed.

  According to the present invention, since the potential variation of the signal detection unit during the half shutter operation can be suppressed, the dynamic range can be expanded while solving the problems caused by the potential variation.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

  FIG. 1 is a system configuration diagram showing a configuration of a solid-state imaging device, for example, a MOS type solid-state imaging device according to an embodiment of the present invention.

  As shown in FIG. 1, the MOS type solid-state imaging device 10 according to this embodiment includes a pixel array unit (imaging region) 11 in which pixels 20 including photoelectric conversion elements are two-dimensionally arranged in a matrix (matrix shape). In addition, the peripheral circuit includes a vertical scanning circuit 12, a current source 13, a column circuit (column parallel signal processing circuit) 14, a horizontal scanning circuit 15, an output circuit 16, and a control circuit 17.

  Here, in order to simplify the drawing, the arrangement of the pixels 20 in the pixel array unit 11 is set to 4 rows and 6 columns. With respect to this matrix pixel arrangement, vertical signal lines 111 are wired for each column, and drive control lines such as a transfer control line 112, a reset control line 113, and a drain control line 114 are wired for each row. The drain control line 114 is wired in common for all pixels.

(Pixel circuit)
FIG. 2 is a circuit diagram illustrating an example of a circuit configuration of the pixel 20. As shown in FIG. 2, the pixel 20 according to this example is a pixel circuit having three transistors, for example, a transfer transistor 22, a reset transistor 23, and an amplification transistor 24 in addition to a photoelectric conversion element, for example, a photodiode 21. Yes. Here, as these transistors 22 to 24, for example, N-channel MOS transistors are used.

  The transfer transistor 22 is connected between the cathode of the photodiode 21 and an FD section (floating diffusion section) 25 that is a signal detection section, and is photoelectrically converted by the photodiode 21 and accumulated in the signal charge (here, Electron) is transferred to the FD section 25 when a transfer pulse Trf is applied to the gate.

  The reset transistor 23 has a drain connected to the drain control line 114 and a source connected to the FD unit 25, and a reset pulse Rst is applied to the gate prior to transfer of signal charges from the photodiode 21 to the FD unit 25. The potential of the FD unit 25 is reset. The drain control line 114 is supplied with a drain voltage Drain which is active and has a power supply level, and inactive and has a GND level.

  The amplification transistor 24 has a source follower configuration in which a gate is connected to the FD unit 25, a drain is connected to the drain control line 114, and a source is connected to the vertical signal line 111, and the operation state is activated when the drain voltage Drain becomes active. The pixel 20 is selected, the potential of the FD section 25 after resetting by the reset transistor 23 is output to the vertical signal line 111 as a reset level, and the signal charge is transferred from the photodiode 21 by the transfer transistor 12 The potential of the FD unit 25 is output to the vertical signal line 111 as a signal level.

  Here, the pixel 20 having the transfer transistor 22, the reset transistor 23, and the amplifying transistor 24 and having the three-transistor configuration using the amplifying transistor 24 as a pixel selection transistor has been described as an example. It is not limited to the configuration, but has at least a transfer transistor 22 and a reset transistor 23, such as a 4-transistor configuration in which a selection transistor is connected in series to the source or drain side of the amplification transistor 24. Any configuration is acceptable.

  Returning to FIG. The vertical scanning circuit 12 is configured by a shift register, an address decoder, or the like, and scans each pixel 20 of the pixel array unit 11 in the vertical direction (vertical direction) in units of rows for each of the electronic shutter row and the readout row. Is supplied with an electronic shutter pulse for sweeping out the signals of the pixels in the row, and a readout pulse for reading out the signals of the pixels in the row is supplied to the readout row.

  Here, although not shown in the figure, the vertical scanning circuit 12 reads the signal of each pixel 20 in the read row by supplying the read pulse to the read row while sequentially selecting the pixels 20 in units of rows. The electronic shutter by supplying an electronic shutter pulse to the same row (electronic shutter row) by a time corresponding to the shutter speed before the readout scanning by the readout scanning system and the readout scanning by the readout scanning system The configuration includes an electronic shutter scanning system for performing an electronic shutter operation that discards (resets) charges accumulated so far in the photodiode 21 of each pixel 20 in a row.

  The period from the timing when the unnecessary charge of the photodiode 21 is reset by the shutter scanning by the electronic shutter scanning system to the timing when the signal of the pixel 20 is read by the reading scanning by the readout scanning system is the period of the signal charge in the pixel 20. It becomes an accumulation period (exposure period). That is, the electronic shutter operation is an operation that resets (sweeps out) signal charges accumulated in the photodiode 21 and newly starts accumulation of signal charges after the reset.

  In the present invention, in order to realize a wide dynamic range, a half shutter row is provided within a period (exposure period) from the scanning timing of the electronic shutter row to the scanning timing of the readout row, and at the scanning timing of the half shutter row, It is characterized in that driving is performed to sweep away only the signal charge accumulated in a certain level or more in the photodiode 21.

  In order to realize such driving, the vertical scanning circuit 12 includes a half shutter scanning system for supplying a half shutter pulse to the half shutter row in addition to the readout scanning system and the electronic shutter scanning system. Yes. This half-shutter scanning system is also configured by a shift register or an address decoder, as in the readout scanning system and the electronic shutter scanning system.

  As clearly shown in FIG. 2, the current source 13 is composed of a load MOS transistor 131 connected between the vertical signal line 111 and the ground GND. A load pulse Load is selectively applied to the gate of the load MOS transistor 131 via the load line 132. The load MOS transistor 131 is electrically connected to the amplification transistor 24 of the pixel in the selected row via the vertical signal line 111, thereby forming a source follower circuit with the amplification transistor 24.

  The column circuit 14 is composed of a circuit group arranged for each pixel column of the pixel array unit 11, that is, with a one-to-one correspondence with the pixel column, and is selected by the vertical scanning by the vertical scanning circuit 12. A predetermined signal processing is performed on a signal output from each pixel 20 through the vertical signal line 111, and the pixel signal after the signal processing is temporarily held.

  More specifically, the column circuit 14 receives a signal output from each pixel 20 for one row for each pixel column, and removes a fixed pattern noise peculiar to the pixel from the signal. Performs signal processing such as Double Sampling (correlated double sampling) and signal amplification. It is also possible to adopt a configuration in which the column circuit 14 has an A / D (analog / digital) conversion function.

  The horizontal scanning circuit 15 includes a shift register, an address decoder, or the like, scans each circuit of the column circuit 14 in order, and signals of pixels for one row (one line) temporarily held in the column circuit 14. Are output sequentially. The output circuit 16 performs predetermined processing on the signal output from the column circuit 15, for example, buffering only, or processing such as black level adjustment, correction of variation for each column, and signal amplification before buffering.

  The control circuit 17 receives data for instructing the operation mode of the solid-state imaging device 10 from a host device (not shown), outputs data including information on the solid-state imaging device 10 to the host device, and also generates a vertical synchronization signal Vsync. Based on the horizontal synchronization signal Hsync and the master clock MCK, a clock signal, a control signal, and the like that become a reference for operations of the vertical drive circuit 12, the current source 13, the column circuit 14, and the horizontal scanning circuit 15 are generated. Give against. Also, timing control is performed during electronic shutter operation, half shutter operation, reading operation, and the like.

  FIG. 3 shows a timing relationship among pixel drive pulses, that is, horizontal synchronization pulse Hsync, load pulse Load, drain voltage Drain, reset pulse Rst, and transfer pulse Trf. Here, with respect to the reset pulse Rst and the transfer pulse Trf, the reset pulse R_Rst and transfer pulse R_Trf (read pulse) of the readout row, the reset pulse HS_Rst and transfer pulse HS_Trf (half shutter pulse) of the half shutter row, the reset pulse of the electronic shutter row S_Rst and transfer pulse S_Trf (electronic shutter pulse) are shown.

  Here, when the low level (for example, GND level) of the reset pulse Rst and the transfer pulse Trf is Vl and the high level is Vh, the high level Vm of the transfer pulse HS_Trf of the half shutter row is set as shown in FIG. , A level between Vl level and Vh level (Vh> Vm> Vl) is set.

  Next, the operation of the pixel 20 in the CMOS solid-state imaging device 10 having the above configuration will be described with reference to the timing chart of FIG.

  In the horizontal blanking period, first, the drain voltage Drain applied to all the pixels is activated (power supply level), and at the same time, the load pulse Load is activated (High level), thereby forming the amplification transistor 24 and the source follower circuit. The load MOS transistor 131 is turned on. Thereafter, the reset pulse R_Rst of the read row becomes active and the reset transistor 22 is turned on, whereby the FD unit 25 is reset and the potential of the FD unit 25 is determined to be the drain voltage Drain (power supply level). The potential of the FD unit 25 at the time of resetting is output to the vertical signal line 111 as a reset level by the amplification transistor 24.

  Next, when the transfer pulse R_Trf of the read row becomes active, the transfer transistor 22 is turned on, and the signal charge photoelectrically converted by the photodiode 21 according to the incident light intensity is transferred to the FD unit 25. The potential of the FD unit 25 at the time of signal transfer is output to the vertical signal line 111 as a signal level by the amplification transistor 24. This completes the signal output operation in the pixel 20.

  The reset level and the signal level are sequentially supplied to the column circuit 14 through the vertical signal line 111. In the column circuit 14, the difference between the reset level and the signal level is taken after the horizontal blanking period, and the difference is synchronized with the horizontal scanning pulse from the horizontal scanning circuit 15 as a signal for photoelectric conversion in the photodiode 21. Then, the signals are sequentially output to the output circuit 16 at the subsequent stage.

  Returning to the description of the operation within the horizontal blanking period. After the transfer transistor 22 is turned on and the signal charges photoelectrically converted by the photodiode 21 are transferred to the FD unit 25, reset pulses (R_Rst, HS_Rst, S_Rst) for the readout row, the half shutter row, and the electronic shutter row, respectively. Becomes active (High level), the reset transistors 23 in each row are turned on, and the FD section 25 is reset.

  At the same time, in the half shutter row, the transfer pulse HS_Trf at the Vm level is applied to the gate of the transfer transistor 22, so that the potential under the gate of the transfer transistor 22 has a certain level of depth depending on the Vm level. As a result, only the signal charge of a certain level or higher depending on the Vm level out of the signal charge photoelectrically converted by the photodiode 21 overflows to the FD portion 25, and thus to the drain control line 114 side. Be swept away.

  In the electronic shutter row, since the transfer pulse S_Trf at the Vh level is applied to the gate of the transfer transistor 22, the potential below the gate of the transfer transistor 22 has the deepest depth corresponding to the Vh level. All the signal charges photoelectrically converted by the photodiode 21 and accumulated therein are swept away to the drain control line 114 side through the FD section 25.

  Thereafter, the drain voltage Drain is inactive (GND level) in all three rows of the readout row, the half shutter row, and the electronic shutter row, and at the same time, the load pulse Load is inactive (Low level), and the load MOS transistor 131 is turned off. Thus, the three pixels 20 in the readout row, the half shutter row, and the electronic shutter row are electrically disconnected from the vertical signal line 111.

  Finally, the reset pulse (R_Rst, HS_Rst, S_Rst) for each of the readout row, the half shutter row, and the electronic shutter row becomes inactive (Low level), so that the reset transistors 23 in each row are turned off. Thereafter, a horizontal video period in which a signal corresponding to photoelectric conversion obtained by signal processing in the column circuit 14 is horizontally scanned by the horizontal scanning circuit 15 and output.

  Thereafter, the above-described series of operations is repeated while row selection is performed in the vertical direction by vertical scanning by the horizontal scanning circuit 12. FIG. 4 shows the timing relationship of the scanning timing of the pixel array unit (imaging region) 11.

  Next, as described above, in the CMOS type solid-state imaging device 10 according to the present embodiment using the technology for controlling the gate level of the transfer transistor 22, the photodiode 21 has a certain level or more at the scanning timing of the half shutter row. An operation principle for realizing a wide dynamic range by performing driving to sweep away only the accumulated signal charge will be described with reference to FIG.

  FIG. 5 is a diagram showing a simplified model of signal charges at the photodiode 21 during accumulation, readout, half shutter, and electronic shutter. 5, (A) shows a simplified model at the time of accumulation, (B) at the time of half shutter, (C) at the time of reading, and (D) showing a simple model at the time of electronic shutter.

  First, the photodiode 21 accumulates signal charges obtained by photoelectrically converting incident light. Since the Vh level electronic shutter pulse (reset pulse S_Rst and transfer pulse S_Trf) is supplied from the vertical scanning circuit 12 to the pixel 20 as an electronic shutter row, the reset transistor 23 and the transfer transistor 22 are turned on. As shown in FIG. 5D, charges accumulated in the photodiode 21 are swept away.

  As both the reset pulse S_Rst and the transfer pulse S_Trf transition to the Vl level, the reset transistor 23 and the transfer transistor 22 are turned off. Thereafter, in the photodiode 21, as shown in FIG. Begins.

  Next, half shutter pulses (reset pulse HS_Rst and transfer pulse HS_Trf) are supplied from the vertical scanning circuit 12 to the pixels 20 as a half shutter row. As a result, the reset transistor 23 is turned on by the reset pulse HS_Rst at the Vh level, and the transfer transistor 22 is turned on by the transfer pulse HS_Trf at the Vm level. At this time, as described above, since the potential under the gate of the transfer transistor 22 has a certain level of depth depending on the Vm level, as shown in FIG. Of the charge, only the signal charge accumulated over a certain level is swept away.

  Since both the reset pulse HS_Rst and the transfer pulse HS_Trf transition to the Vl level, the reset transistor 23 and the transfer transistor 22 are turned off, and then the signal charge of the photodiode 21 starts to be accumulated again.

  Next, Vh level readout pulses (reset pulse R_Rst and transfer pulse R_Trf) are supplied from the vertical scanning circuit 12 to the pixels 20 as readout rows. Then, as described in the pixel cell driving, when the reset transistor 23 is turned on by the reset pulse R_Rst at the Vh level, the FD unit 25 is reset once, and the reset pulse R_Rst transitions to the Vl level. The reset transistor 23 is turned off. Further, when the transfer transistor 22 is turned on by the transfer pulse R_Trf at the Vh level, the signal charge accumulated in the photodiode 21 is completely transferred as shown in FIG.

  Here, consider the case where the subject has high and low illuminance. In the pixel that captures the low illuminance part of the subject, the amount of charge accumulated in the photodiode 21 in the exposure period 1 (t1) is small in FIG. Without being received (accumulated charge is not swept away at all), the charge is accumulated until the read timing, and finally read out as a signal.

  On the other hand, in a pixel that captures a high illuminance part of a subject, a large amount of charge is accumulated in the photodiode 21 within the exposure period 1 (t1), so that a charge of a certain level or more, which is a half shutter timing, is swept. Then, it is accumulated again in the exposure period 2 (t2), and the re-accumulated charge is read out as a signal. In other words, the dependence light quantity is dependent on the signal charge quantity so that the inclination becomes smaller from a certain incident light quantity.

  Here, the signal charge amount-time dependency and the signal charge amount-incident light dependency will be described with reference to FIG. In FIG. 4, t1 [exposure period 1] is a period from shutter timing to half shutter timing, and t2 [exposure period 2] is a period from half shutter timing to readout timing.

  FIG. 6 shows the relationship between the half shutter and readout timing and the signal charge amount accumulated in the photodiode 21 (signal charge amount-time dependency). The vertical axis represents the signal charge amount Q, and the horizontal axis represents time t. FIG. 7 shows the relationship between the signal charge amount and the photocurrent density incident on the photodiode 21 (signal charge amount-incident light amount dependency). The vertical axis represents the signal charge amount Q, and the horizontal axis represents the photocurrent density I.

In FIG. 6, a characteristic (line) having a slope of Ia is obtained when a certain low-illuminance subject is imaged, and a slope of Ib is obtained when a high-illuminance subject is imaged compared to the low illumination. Suppose that it is a characteristic. Further, tr is a read timing, and th1 is a half shutter timing. This half shutter timing th1, performs sweep signal charges content accumulated in the predetermined level or higher in the photodiode 21. Let that level be Qlag.

  The signal charge of the photodiode 21 in the case of Ia is not affected by the fact that the signal charge is not accumulated up to a certain level Qlag, although the half shutter operates at timing th1. The data is stored as it is until the read timing tr, and is output to the FD unit 25 at the read timing tr.

The signal charge of the photodiode 21 in the case of Ib is accumulated up to a certain level Qlag or more at the half shutter timing th1, and the accumulated charge above the certain level Qlag is swept away by the operation of the half shutter (photodiode). The charge of a certain level Qlag remains in 21). Thereafter, the data is further accumulated until the read timing tr and output to the FD unit 25 at the read timing tr.

  In FIG. 7, when the photocurrent density when the accumulated charge amount of the photodiode 21 is equal to or higher than a certain level Qlag at the half shutter timing is Ih1, the slope of the exposure period t2 is obtained with that point as a change point. Originally, when the accumulated charge amount of the photodiode 21 reaches the saturation charge amount Qmax, the signal charge amount no longer shows dependence on the optical signal. Amount indicates dependency. That is, the dynamic range can be expanded. A signal level corresponding to the incident light intensity can be obtained by amplifying the signal in the exposure period t2 with an appropriate gain in a subsequent signal processing circuit (corresponding to the camera signal processing circuit 33 in FIG. 10).

  In this way, a half shutter row is provided within the period (exposure period) from the scanning timing of the electronic shutter row to the scanning timing of the readout row, and the transfer pulse HS_Trf at the Vm level is applied to the gate of the transfer transistor 22 of this half shutter row. By performing the operation of sweeping out only the signal charge accumulated in a certain level or more in the photodiode 21, the signal charge amount shows dependency to a large optical signal that does not show dependency originally, so that a wide dynamic range is obtained. Can be achieved. In particular, desired signal charge amount-time dependency and signal charge amount-incident light amount dependency characteristics can be obtained by arbitrarily setting the exposure period t1 and the exposure period t2.

  In the above, the case where one half shutter row is provided within the period (exposure period) from the scanning timing of the electronic shutter row to the scanning timing of the readout row has been described as an example, but the half shutter row is limited to one row. It is possible to provide a plurality of lines instead of the one.

  Here, a case where two half shutter rows are provided will be described. FIG. 8 shows the relationship between the half shutter and readout timing in this case and the signal charge accumulated in the photodiode 21, and FIG. 9 shows the relationship between the signal charge amount and the photocurrent density incident on the photodiode 21.

  In FIG. 8, the timings at which the half shutter pulse is supplied twice before the readout timing tr are denoted by th1 and th2. Similar to the explanation of the operation when the half shutter pulse is supplied once, the signal charge amount of the photodiode 21 becomes the constant level Qlag at the half shutter timings th1 and th2.

  As for the relationship between the signal charge amount and the photocurrent density, in FIG. 9, when the photocurrent density affected by the half shutter at timing th1 is Ih1, and the photocurrent density affected by the half shutter at timing th2 is Ih2. In addition, since the inclination changes at the photocurrent densities Ih1 and Ih2, the dynamic range can be further increased as compared with the case where the half shutter operation is performed once.

  Next, the driving timing of the half shutter pulse (reset pulse HS_Rst and transfer pulse HS_Trf) in the operation of the pixel 20 described above will be described more specifically.

  The half shutter pulse is supplied to the row selected as the half shutter row. First, the Vh level reset pulse HS_Rst is supplied to the gate of the reset transistor 23. As a result, the reset transistor 23 is turned on, and the FD portion 25 serving as the source of the reset transistor 23 is connected to the drain, so that the potential of the FD portion 25 becomes the drain voltage Drain (power supply level).

  In this state, the Vm level transfer pulse HS_Trf is supplied to the gate of the transfer transistor 22 as a half shutter operation, so that charges of a certain level or more accumulated in the photodiode 21 are swept away (FIG. 5 ( B)). Thereafter, the transfer transistor 22 is turned off, and the drain voltage Drain becomes a low level, so that the potential of the FD section 25 also becomes a low level. When the potential of the FD unit 25 becomes the low level, the amplification transistor 24 is turned off, so that the vertical signal line 111 and the pixel 20 are disconnected. Thereafter, the reset transistor 23 is turned off.

  Here, the merit of sweeping out signal charges in the half shutter row with the reset transistor 23 turned on will be described.

  When attention is paid to a certain row, the attention row is selected as an electronic shutter row before being selected as a half shutter row at the scanning timing of the imaging region in FIG. After the signal charges of the photodiodes 21 in the electronic shutter row are completely swept away, the potential of the FD section 25 becomes a low level drain voltage Drain in order to disconnect the vertical signal line 111 from the pixel 20. ing.

  Thereafter, the row is selected as a half shutter row. Here, the reset transistor 23 is turned on, and the potential of the FD unit 25 is set to the high level drain voltage Drain. In the present invention, the transfer transistor 22 is turned on in that state, that is, the reset transistor 23 is turned on, and the half shutter sweep-out operation is performed. By performing the operation in this way, the following effects can be obtained as compared with the operation in which the transfer transistor 22 is turned on after the reset transistor 23 is turned off.

(1) A state in which the photodiode 21 of the pixel affected by the half shutter operation is accumulated near the saturation charge amount or in a state where a signal charge higher than that is generated and overflows to the FD section 25 There are also pixels. If the reset transistor 23 is turned off before the half shutter sweep-out operation is performed, the FD portion 25 enters a floating state, and the potential of the FD portion 25 starts to drop due to the signal charge leaking from the photodiode 21. As the potential of the FD portion 25 decreases, the potential difference between the source and drain of the transfer transistor 22 decreases. On the other hand, since the potential of the FD unit 25 is fixed to the high level drain voltage Drain by performing the above-described operation, such a problem does not occur.

(2) In order to turn off the reset transistor 23 once, there is an electrostatic capacitive coupling between the gate of the transfer transistor 22 and the diffusion layer, and the potential of the FD section 25 is lowered. On the other hand, since the potential of the FD unit 25 is fixed to the high level drain voltage Drain by performing the above-described operation, such a problem does not occur.

  As described above, in the CMOS-type solid-state imaging device 10 according to the present embodiment, by adopting a technique for controlling the gate level of the transfer transistor 22, the column circuit is changed from the pixel 20 as in the conventional technique described in Patent Document 1. Since there is no need to provide two vertical signal lines for transmitting pixel signals to each pixel column or to provide two circuits in the column circuit 14, the chip area can be reduced and the pixel cell poles can be reduced. It becomes possible to cope with miniaturization.

  Further, in controlling the gate level of the transfer transistor 22, the transfer transistor 22 is turned on while the reset transistor 23 is in the on state, and the half-shutter sweeping operation is performed. Since the potential is fixed to the potential of the charge sweep-out destination, that is, the high-level drain voltage Drain, fluctuations in the potential of the FD unit 25 can be suppressed.

  As described above, since the potential fluctuation of the FD unit 25 can be suppressed, the dynamic range can be expanded while solving the problems caused by the potential fluctuation. Problems caused by potential fluctuations in the FD unit 25 include, for example, a state in which when the charge is swept away from the photodiode 21, it cannot be completely swept away in a certain sweeping period, or from the worst FD unit 25 to the photodiode 21 side. For example, a state in which electric charge flows into the substrate occurs, and the amount of sweeping away when the charge is swept away also varies.

  By the way, in the pixel of the CMOS type solid-state imaging device, the signal charge is read near the surface of the Si crystal because of the limitation of the power supply voltage. However, the Si crystal surface has surface levels due to lattice defects such as dangling bonds at the Si-SiO2 interface. When an electric field due to a depletion layer or the like exists up to this surface, electrons excited through the surface level are accumulated in the photodiode 21 more and more regardless of incident light. Such a phenomenon results in an imaging defect called “white scratch” or “dark current”.

  Of course, this phenomenon occurs not only on the surface of the Si on the photodiode 21 but also under the gate of the transfer transistor 22 existing in the immediate vicinity of the photodiode 21. In particular, in the technique for controlling the gate level of the transfer transistor 22 employed in the present invention, a wide dynamic range is realized by adjusting the amount of charge to be swept away and the timing until reading after re-accumulation. If there is a charge generated in a part that is not related to the optical signal, such as white scratches or “dark current”, there are pixels that are affected by charge sweeping despite the low illuminance. In some cases, the image may be a completely different image from the subject.

  Therefore, the present invention employs a configuration in which the low level (Vl) of the transfer pulse HS_Trf supplied to the gate of the transfer transistor 22 during the half shutter operation is set to a negative potential with respect to the well potential (GND level / ground potential). I am doing so. By adopting such a configuration, the potential under the gate of the transfer transistor 22 is pinned to enter a state where holes exist, and unnecessary electrons are not generated. Therefore, the occurrence of the “white scratch” and “dark current” is generated. Can be prevented. As a result, the following great merits occur.

  First, in order to improve the dark current that causes a large characteristic variation for the wide dynamic range technology, it is necessary to form a special impurity profile on the Si surface. In particular, the manufacturing cost increases, such as addition of a new process step, in order to form the profile in the impurity profile which is originally special with respect to the MOS structure of the peripheral circuit called “pixel”. In particular, the cost ratio with respect to the process steps is large with the technological refinement of the CMOS process.

  On the other hand, by adopting a technique in which the low level of the transfer pulse HS_Trf supplied to the gate of the transfer transistor 22 is set to a negative potential, the gate level of the transfer transistor 22 as in the present invention is controlled to achieve wide dynamics. It is possible to suppress dark current, which is essential for a technology for achieving a range, by simply adding a simple negative potential circuit using a charge pump circuit or the like.

  In order to widen the dynamic range by controlling the gate level of the transfer transistor 22, a technique for setting the low level of the transfer pulses R_Trf, HS_Trf, S_Trf supplied to the gate of the transfer transistor 22 to a negative potential is used. Thus, the dynamic range (handled saturated charge amount) of the photodiode 21 can be increased, and the GND level can be used as the Vm level of the transfer transistor 22 during the half-shutter sweep-out operation.

  Further, when the low level (Vl) of the transfer pulse HS_Trf supplied to the gate of the transfer transistor 22 is set to a negative potential, the transfer transistor 22 is set to the ground potential by setting the high level (Vm) to the ground potential. This eliminates the need for a circuit for generating the intermediate potential Vm for setting the gate level, and there is also an advantage that the circuit configuration can be simplified accordingly.

In the above embodiment, as is apparent from FIG. 3, the transfer pulse HS_Trf is in the active state (Vm level) within the active period (Vh level period) of the reset pulse HS_Rst that resets the reset transistor 23 during the half shutter operation. However, when the reset pulse HS_Rst is at least in the active state, the transfer pulse HS_Trf is set in the active state, that is, the active period of the transfer pulse HS_Trf is at least overlapped with the active period of the reset pulse HS_Rst (see FIG. Even if the transfer pulse HS_Trf is in an active state even after the reset pulse HS_Rst is in an inactive state, the potential fluctuation of the FD section 25 during the half shutter operation can be suppressed. wear.

[Application example]
The CMOS solid-state imaging device 10 according to the above-described embodiment is suitable for use as an imaging device in an imaging device such as a digital still camera or a video camera.

  Here, the imaging device includes a solid-state imaging device as an imaging device, an optical system that forms image light of a subject on an imaging surface (light-receiving surface) of the solid-state imaging device, and a signal processing circuit of the solid-state imaging device. A camera module (for example, used by being mounted on an electronic device such as a mobile phone) and a camera system such as a digital still camera or a video camera equipped with the camera module.

  FIG. 10 is a block diagram showing an example of the configuration of the imaging apparatus according to the present invention. As shown in FIG. 10, the imaging apparatus according to the present example includes an optical system including a lens 31, an imaging device 32, a camera signal processing circuit 33, and the like.

  The lens 31 forms image light from the subject on the imaging surface of the imaging device 32. The imaging device 32 outputs an image signal obtained by converting the image light imaged on the imaging surface by the lens 31 into an electrical signal for each pixel. As the imaging device 32, the CMOS solid-state imaging device 10 according to the above-described embodiment is used. The camera signal processing unit 33 performs various signal processing on the image signal output from the imaging device 32.

  As described above, in the imaging device such as a video camera, an electronic still camera, and a camera module for mobile devices such as a mobile phone, the CMOS solid-state imaging device 10 according to the above-described embodiment is used as the imaging device 32. The solid-state imaging device 10 has an advantage that the image quality of the captured image can be further improved because the dynamic range can be expanded while solving the above-described problems caused by the potential fluctuation of the FD section.

1 is a system configuration diagram showing a configuration of a solid-state imaging device according to an embodiment of the present invention, for example, a MOS solid-state imaging device. It is a circuit diagram which shows an example of the circuit structure of a pixel. It is a timing chart for demonstrating operation | movement of a pixel. It is a timing chart which shows the timing relationship of the scanning timing of a pixel array part (imaging area). It is a figure which shows the simple model of the signal charge in the photodiode at the time of accumulation | storage / reading | reading / half shutter / shutter. FIG. 10 is a characteristic diagram showing a relationship between a half shutter when one half shutter row is one row, readout timing, and signal charges accumulated in a photodiode. It is a characteristic view showing the relationship between the signal charge amount and the photocurrent density incident on the photodiode when the number of half shutter rows is one. FIG. 6 is a characteristic diagram showing a relationship between a half shutter when there are two half shutter rows, readout timing, and signal charges accumulated in a photodiode. FIG. 6 is a characteristic diagram showing the relationship between the signal charge amount and the photocurrent density incident on a photodiode when there are two half shutter rows. It is a block diagram which shows an example of a structure of the imaging device which concerns on this invention. 1 is a system configuration diagram showing a basic configuration of a CMOS type solid-state imaging device. It is a timing chart which shows the scanning timing of the pixel array part which concerns on a prior art example.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 10 ... MOS type solid-state imaging device, 11 ... Pixel array part, 12 ... Vertical scanning circuit, 13 ... Current source, 14 ... Column circuit (column parallel signal processing circuit), 15 ... Horizontal scanning circuit, 16 ... Output circuit, 17 ... Control circuit, 20 ... pixel, 21 ... photodiode, 22 ... transfer transistor, 23 ... reset transistor, 24 ... amplification transistor, 25 ... FD (floating diffusion) section

Claims (7)

A pixel array unit in which pixels having a photoelectric conversion element, a transfer transistor that transfers charges accumulated in the photoelectric conversion element to a signal detection unit, and a reset transistor that resets the signal detection unit are two-dimensionally arranged in a matrix;
While scanning the pixels of the pixel array section, the electronic shutter operation sweeping the charges accumulated in the photoelectric conversion element, the read operation and before Symbol photoelectric conversion element reading out the charges stored in the photoelectric conversion element Scanning means for performing a half shutter operation for sweeping away a part of the accumulated charge by overflowing the signal detection unit at a scanning timing of a half shutter row within an exposure period from the electronic shutter operation to the reading operation ;
When the reset pulse for resetting the reset transistor is at least in an active state and the potential of the signal detection unit is fixed, the transfer pulse for transferring the transfer transistor is activated to perform the half shutter operation. And a solid-state imaging device. The solid-state imaging device according to claim 1, wherein the transfer pulse has a high level as a ground potential and a low level as a negative potential with respect to the ground potential. The solid-state imaging device according to claim 1, wherein the control unit activates the transfer pulse within an active period of the reset pulse. The solid-state imaging device according to claim 1, wherein a period from the electronic shutter operation to the half shutter operation and a period from the half shutter operation to the readout operation can be arbitrarily set. The solid-state imaging device according to claim 1, wherein the scanning unit performs the half shutter operation twice or more within the exposure period. A pixel array unit in which pixels having a photoelectric conversion element, a transfer transistor that transfers charges accumulated in the photoelectric conversion element to a signal detection unit, and a reset transistor that resets the signal detection unit are two-dimensionally arranged in a matrix;
While scanning the pixels of the pixel array section, the electronic shutter operation sweeping the charges accumulated in the photoelectric conversion element, the read operation and before Symbol photoelectric conversion element reading out the charges stored in the photoelectric conversion element Scanning means for performing a half shutter operation for sweeping away a part of the accumulated charges by overflowing the signal detection unit at a scanning timing of a half shutter row within an exposure period from the electronic shutter operation to the read operation ; In driving the solid-state imaging device provided,
When the reset pulse for resetting the reset transistor is at least in an active state and the potential of the signal detection unit is fixed, the transfer pulse for transferring the transfer transistor is activated to perform the half shutter operation. A driving method of a solid-state imaging device. A pixel array unit in which pixels having a photoelectric conversion element, a transfer transistor that transfers charges accumulated in the photoelectric conversion element to a signal detection unit, and a reset transistor that resets the signal detection unit are two-dimensionally arranged in a matrix A solid-state imaging device;
An optical system for guiding light from a subject onto the imaging surface of the solid-state imaging device,
The solid-state imaging device
While scanning the pixels of the pixel array section, the electronic shutter operation sweeping the charges accumulated in the photoelectric conversion element, the read operation and before Symbol photoelectric conversion element reading out the charges stored in the photoelectric conversion element Scanning means for performing a half shutter operation for sweeping away a part of the accumulated charge by overflowing the signal detection unit at a scanning timing of a half shutter row within an exposure period from the electronic shutter operation to the reading operation ;
When the reset pulse for resetting the reset transistor is at least in an active state and the potential of the signal detection unit is fixed, the transfer pulse for transferring the transfer transistor is activated to perform the half shutter operation. An imaging apparatus comprising a control means.

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