JP4939736B2 - 窒化けい素焼結体の製造方法 - Google Patents
窒化けい素焼結体の製造方法 Download PDFInfo
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- JP4939736B2 JP4939736B2 JP2004214865A JP2004214865A JP4939736B2 JP 4939736 B2 JP4939736 B2 JP 4939736B2 JP 2004214865 A JP2004214865 A JP 2004214865A JP 2004214865 A JP2004214865 A JP 2004214865A JP 4939736 B2 JP4939736 B2 JP 4939736B2
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- silicon nitride
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- 229910052581 Si3N4 Inorganic materials 0.000 title claims description 175
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title claims description 175
- 238000004519 manufacturing process Methods 0.000 title claims description 23
- 239000000843 powder Substances 0.000 claims description 81
- 239000002994 raw material Substances 0.000 claims description 70
- 238000005245 sintering Methods 0.000 claims description 59
- 238000005096 rolling process Methods 0.000 claims description 54
- 238000000034 method Methods 0.000 claims description 45
- 239000002245 particle Substances 0.000 claims description 30
- 239000013078 crystal Substances 0.000 claims description 26
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 22
- 239000001301 oxygen Substances 0.000 claims description 22
- 229910052760 oxygen Inorganic materials 0.000 claims description 22
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 22
- 238000005204 segregation Methods 0.000 claims description 22
- 238000005452 bending Methods 0.000 claims description 15
- 229910052719 titanium Inorganic materials 0.000 claims description 13
- 229910052735 hafnium Inorganic materials 0.000 claims description 12
- 238000005121 nitriding Methods 0.000 claims description 12
- 238000001513 hot isostatic pressing Methods 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 229910052726 zirconium Inorganic materials 0.000 claims description 10
- 239000012535 impurity Substances 0.000 claims description 7
- 229910052750 molybdenum Inorganic materials 0.000 claims description 7
- 230000001590 oxidative effect Effects 0.000 claims description 7
- 229910052804 chromium Inorganic materials 0.000 claims description 6
- 229910052758 niobium Inorganic materials 0.000 claims description 6
- 229910052715 tantalum Inorganic materials 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- 239000012071 phase Substances 0.000 description 31
- 230000000052 comparative effect Effects 0.000 description 26
- 230000002776 aggregation Effects 0.000 description 19
- 229910052782 aluminium Inorganic materials 0.000 description 17
- 238000004220 aggregation Methods 0.000 description 16
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 16
- 238000002156 mixing Methods 0.000 description 15
- 239000010936 titanium Substances 0.000 description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 12
- 238000000465 moulding Methods 0.000 description 11
- 239000011575 calcium Substances 0.000 description 9
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 8
- 238000009826 distribution Methods 0.000 description 8
- 239000011148 porous material Substances 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 238000009694 cold isostatic pressing Methods 0.000 description 6
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 6
- 230000007547 defect Effects 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 239000007791 liquid phase Substances 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 150000003949 imides Chemical class 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000011812 mixed powder Substances 0.000 description 4
- 238000000197 pyrolysis Methods 0.000 description 4
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 4
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 238000005054 agglomeration Methods 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 238000013001 point bending Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000003870 refractory metal Substances 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 238000007088 Archimedes method Methods 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000000280 densification Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000004453 electron probe microanalysis Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000007721 mold pressing method Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 2
- 150000002910 rare earth metals Chemical class 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- QIJNJJZPYXGIQM-UHFFFAOYSA-N 1lambda4,2lambda4-dimolybdacyclopropa-1,2,3-triene Chemical compound [Mo]=C=[Mo] QIJNJJZPYXGIQM-UHFFFAOYSA-N 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910020068 MgAl Inorganic materials 0.000 description 1
- 229910039444 MoC Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 235000019441 ethanol Nutrition 0.000 description 1
- -1 ethyl nitride Chemical class 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
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- Ceramic Products (AREA)
Description
金属窒化法で製造された窒化けい素原料粉末であり、酸素含有量が1.3質量%であり、α相型窒化けい素85%を含む平均粒径0.7μmのSi3N4(窒化けい素)原料粉末と、焼結助剤として平均粒径0.8μmのY2O3(酸化イットリウム)粉末と、アルミニウム成分として平均粒径0.9μmのAl2O3粉末および平均粒径0.9μmのAlN粉末と、平均粒径0.8μmの酸化ハフニウム(HfO2)等の希土類元素酸化物と、平均粒径1μmのTiO2(酸化チタニウム)粉末、平均粒径1μmのMo2C(炭化モリブデン)粉末等の耐火金属化合物粉末とを用意した。
比較例1として、1ロット分(5Kg)の原料混合体を分割せずにそのままボールミルにより24時間湿式混合した点以外は、実施例1と同様に成形・脱脂・焼結して比較例1に係る棒状および球状の窒化けい素焼結体を調製した。
Claims (6)
- 金属窒化法により製造された窒化けい素粉末であり、酸素を1.5質量%以下、α相型窒化けい素を80質量%以上含有し、平均粒径が1μm以下の窒化けい素粉末に、焼結助剤成分として希土類元素を2〜5質量%、Al元素を1〜5質量%、Ti,Zr,Hf,W,Mo,Ta,NbおよびCrからなる群より選択される少なくとも1種の元素を0.5〜5質量%添加し、得られた原料混合体を複数に分割し、分割した各原料混合体をそれぞれ個別に混合した後に、一つの原料体として合体して、さらに混合し得られた原料粉末を成形して成形体を調製し、この成形体を非酸化性雰囲気中で温度1600〜1900℃で0.5〜10時間焼結することにより、気孔率が1%以下であり、上記窒化けい素焼結体を構成する窒化けい素結晶粒子の最大長さが40μm以下であり、上記窒化けい素焼結体の結晶組織における助剤成分の偏析凝集部の最大径が20μm以下であり、上記窒化けい素焼結体が不純物としてFeを10〜3500ppm含有するとともに、Caを10〜1000ppm含有しており、上記窒化けい素焼結体の破壊靭性値が6MPa・m 1/2 以上であり、抗折強度が600MPa以上である窒化けい素焼結体を得ることを特徴とする窒化けい素焼結体の製造方法。
- 焼結後、非酸化性雰囲気中で前記窒化けい素焼結体に対し、圧力30MPa以上の熱間静水圧プレス(HIP)処理を実施することを特徴とする請求項1記載の窒化けい素焼結体の製造方法。
- 請求項1記載の窒化けい素焼結体の製造方法において、酸素量が5質量%以下であることを特徴とする窒化けい素焼結体の製造方法。
- 請求項1記載の窒化けい素焼結体の製造方法において、前記窒化けい素焼結体のビッカース硬度Hvが1300〜1500であることを特徴とする窒化けい素焼結体の製造方法。
- 請求項1記載の窒化けい素焼結体の製造方法において、前記窒化けい素焼結体が軸受けの転動体であることを特徴とする窒化けい素焼結体の製造方法。
- 請求項5記載の窒化けい素焼結体の製造方法において、前記窒化けい素焼結体の圧砕強度が150N/mm2以上であることを特徴とする窒化けい素焼結体の製造方法。
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JP4939736B2 true JP4939736B2 (ja) | 2012-05-30 |
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JP5150064B2 (ja) * | 2006-06-08 | 2013-02-20 | 株式会社東芝 | 耐磨耗性部材の製造方法 |
CN106966735A (zh) | 2010-02-16 | 2017-07-21 | 株式会社东芝 | 耐磨元件以及制造该耐磨元件的方法 |
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JP4795588B2 (ja) * | 2001-01-12 | 2011-10-19 | 株式会社東芝 | 窒化けい素製耐摩耗性部材 |
JP2003034581A (ja) * | 2001-07-24 | 2003-02-07 | Toshiba Corp | 窒化けい素製耐摩耗性部材およびその製造方法 |
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