JP4998946B2 - Laser irradiation method and apparatus - Google Patents

Description

  The present invention relates to a laser irradiation method and an apparatus therefor, and more particularly, a laser beam from a laser oscillator is condensed or imaged through a lens and irradiated to an irradiation object placed on a stage to modify the irradiation object. In particular, the present invention relates to a laser irradiation method including a mirror for maintaining the temperature of the lens and thus the focal length, and an apparatus therefor.

  Conventionally, when manufacturing crystallized silicon of a thin film transistor, an irradiated object having a thin a-Si (amorphous silicon) film formed on a glass substrate is irradiated with a laser beam to crystallize the a-Si film and thin p-Si. (Polysilicon) film. As one method of modifying the a-Si film by irradiating it with a laser, a uniform intensity laser is applied to the mask, and this is projected onto the a-Si film of the irradiated object by a condenser lens of an optical device. There is a method of forming an image and irradiating (for example, Patent Document 1).

  This is because the laser generated by the laser oscillator that generates the excimer laser is guided to the optical equipment and appropriately redirected by the reflecting mirror, and after uniforming the intensity, it is passed through the mask and the condenser lens. Is shaped into a square line beam (pulse laser) and condensed and transferred to the irradiated object. The irradiated object is installed in a vacuum chamber of a laser annealing apparatus.

  Such a laser irradiation method and apparatus have the following technical problems. In other words, the pulse laser generated by the laser oscillator is passed through the condenser lens and irradiates the irradiated object, so when the laser passes through the condenser lens, part of the laser is absorbed by the lens and converted to heat. The temperature of the lens rises. The temperature of this lens is generally maintained at a predetermined value to prevent a change in focal length. However, when the irradiation is resumed after the series of pulse laser irradiation is stopped, the temperature of the lens once cooled is a predetermined temperature. Therefore, it takes a long time to recover, and this causes a decrease in work efficiency.

  In order to prevent a change in focal length due to such a temperature change, the condenser lens is housed in a lens barrel, and the condenser lens is indirectly kept warm by a temperature control device attached to the lens barrel. It is also practiced to maintain the temperature at a predetermined level. In this case, the lens is heated mainly directly by the laser to increase its temperature, while the temperature control of the lens is performed indirectly from the side. For this reason, the time constant of the temperature rise of the lens by the laser becomes shorter than the time constant of the cooling by the temperature control device. Accordingly, when the irradiation is resumed after the series of pulsed laser irradiation is stopped, the temperature of the lens rises in a short time, eventually falls, and then stabilizes. Since the focal length of the lens continues to change until this temperature becomes stable, when the laser beam is irradiated on the irradiation object, the object is irradiated in a defocused state.

  In addition, in order to suppress a change in focal length due to a temperature change of the condenser lens, an attempt has been made to combine lenses manufactured using a plurality of materials having different temperature characteristics, but the suppression effect is insufficient. .

  In view of this, a laser irradiation method and apparatus therefor have been proposed that includes a mirror for maintaining the temperature of the lens and hence the focal length (for example, Patent Document 2).

  This will be described with reference to FIG. In a laser irradiation method in which a processing laser (a) from a laser oscillator (1) is focused or imaged through a lens (2) and irradiated to an irradiated object (4), the lens (2) and irradiated A reflection position (I) that reflects the processing laser (a) with a predetermined reflectance by blocking the optical path between the lens (2) and the irradiated object (4) between the object (4) and the object (4); The first mirror (5) that can take the open position (II) that opens the optical path between the lens (2) and the irradiated object (4), and the first mirror that takes the reflection position (I) (5) a second mirror (which is arranged perpendicular to the optical axis (L) of the processing laser (a) reflected by (5) and reflects the processing laser (a) with a predetermined reflectance ( 6), and by causing the first mirror (5) to adopt the reflection position (I), a processing ray that passes through the lens (2) is disposed. The processing laser (a) is reflected one after another by the first mirror (5) and the second mirror (6) and again reflected by the first mirror (5). Is matched with the intensity of the processing laser (a) reflected from the irradiated object (4) with the first mirror (5) in the open position (II), and the lens (2) is The laser irradiation method is characterized in that the lens (2) is heated in the same manner as when the irradiation is performed by irradiating the irradiated object (4) with the processing laser (a).

  The first mirror (5) is constituted by a total reflection mirror, the second mirror (6) is constituted by a half mirror having a reflectance equal to the reflectance of the object (4) to be irradiated, The second mirror (6) is separated from the first mirror (5) by a distance (h1) equal to the distance (h2) between the first mirror (5) and the irradiated object (4). Can be placed. Moreover, the lens (2) can be provided with a measuring means (7) for measuring a focal length, and the lens (2) can be attached with a temperature control device (3).

According to this, the intensity of the processing laser reflected again by the first mirror matches the intensity of the processing laser reflected from the irradiated object in a state where the first mirror is in the open position. Thus, it is possible to easily realize heating of the lens similarly to the case where the lens is transmitted and the object to be irradiated is irradiated with the processing laser to be processed.
Japanese Patent No. 3204986 Japanese Patent No. 3845650

  However, such a conventional laser irradiation method / apparatus has a technical problem that it is difficult to apply to irradiated objects having different reflectivities. That is, the irradiated object may have different reflectance depending on the type or film thickness of the coating treatment film (for example, a-Si film). Therefore, when applied to an irradiated object having different reflectance, It is inevitable that the focal length fluctuates due to temperature changes. As a result, the temperature of the lens changes at the beginning of laser irradiation, and the irradiation result of the irradiated object is affected.

  In addition, although the reflectivity of the first and second mirrors changes with time, there is a technical problem that the change with time cannot be confirmed or handled.

  In addition, the first and second mirrors are affected by heat, and it is difficult to heat the lens in the same manner as when the irradiation object is irradiated with the processing laser. For example, the reflection or transmission of the laser at the first and second mirrors changes the temperature of the first and second mirrors, causing a lens effect, etc., affecting the reflected or transmitted light, and for processing. There is also a technical problem that it becomes difficult to heat the lens as in the case of irradiating the irradiated object with the laser.

  In addition, when the measuring means (7) for measuring the focal length is provided, the first mirror (5) is configured to transmit the laser for measuring the focal length, so that the processing laser is irradiated. Only when the reflected light of the processing laser is obtained from the second mirror (6) while passing through the lens (2) so as to irradiate the lens, the focal length of the lens (2) is measured and its suitability is judged. Can do.

  In other words, the conventional means for measuring the focal length of the lens with the optical shutter condenses the focal length measuring laser (b) through the lens and transmits the first mirror 5 to irradiate the surface of the irradiated object. Then, the reflected light is sequentially passed through the first mirror 5 and the lens, and is received by the measuring instrument to be measured. Therefore, when the lens temperature is observed while the optical shutter shuts off the processing laser and stabilizes the lens temperature, the focal length measurement laser (b) heats the lens. There was a technical problem in that it was impossible to accurately observe the temperature. In addition, when the irradiated object is not placed on the stage, the focal length of the lens is measured based on the reflected light on the upper surface of the stage, and similarly, the lens temperature cannot be accurately observed. There was a technical problem. Although it is possible to control the temperature of the lens with an estimated value based on the calculation, it has not been possible to confirm whether or not the temperature of the lens is stable.

The present invention has been made in view of such a conventional technical problem, and the configuration thereof is as follows.
The invention according to claim 1 is a laser irradiation method in which the laser a for processing from the laser oscillator 1 is focused or imaged through the lens 2 to irradiate the irradiated object 4.
Between the lens 2 and the object to be irradiated 4, a reflection position I for blocking the optical path between the lens 2 and the object to be irradiated 4 and reflecting the processing laser a, and between the lens 2 and the object to be irradiated 4. A first mirror 5 that can take an open position II that opens the optical path of
A second mirror that is disposed perpendicular to the optical axis L of the processing laser a reflected by the first mirror 5 that takes the reflection position I and reflects the processing laser a with a predetermined reflectance. 6 is placed,
By causing the first mirror 5 to adopt the reflection position I, the processing laser a transmitted through the lens 2 is reflected by the first mirror 5 and the second mirror 6 one after another, and the first mirror 5 is reflected. The intensity of the processing laser a reflected again by 5 is matched with the intensity of the processing laser a reflected from the irradiated object 4 in a state where the first mirror 5 takes the open position II. In a state where the lens 2 is heated and the first mirror 5 is in the open position II as in the case of passing through the lens 2 and irradiating the object 4 with the processing laser a to give the treatment, The intensity of the processing laser a reflected from the irradiation object 4 and reaching the lens 2 can be measured, and the second mirror 6 is in a state where the reflection position I is taken by the first mirror 5. Measure the intensity of the processing laser a reflected and reaching the lens 2 A light intensity measuring means 8 that can output the laser beam 1 that is output from the laser oscillator 1 and passes through the lens 2; The processing laser a output from the laser oscillator 1 and reflected again by the first mirror 5 can be made incident on the lens 2 in accordance with the sum of the intensity of the laser a for processing. A laser irradiation method characterized by the above.
The invention according to claim 2 is a laser irradiation apparatus in which the processing laser a from the laser oscillator 1 is focused or imaged through the lens 2 to irradiate the irradiated object 4.
Between the lens 2 and the object to be irradiated 4, a reflection position I for blocking the optical path between the lens 2 and the object to be irradiated 4 and reflecting the processing laser a, and between the lens 2 and the object to be irradiated 4. A first mirror 5 that can take an open position II that opens the optical path of
A second mirror that is disposed perpendicular to the optical axis L of the processing laser a reflected by the first mirror 5 that takes the reflection position I and reflects the processing laser a with a predetermined reflectance. 6 is placed,
By causing the first mirror 5 to adopt the reflection position I, the processing laser a transmitted through the lens 2 is reflected by the first mirror 5 and the second mirror 6 one after another, and the first mirror 5 is reflected. The intensity of the processing laser a reflected again by 5 is matched with the intensity of the processing laser a reflected from the irradiated object 4 in a state where the first mirror 5 takes the open position II. In a state where the lens 2 is heated and the first mirror 5 is in the open position II as in the case of passing through the lens 2 and irradiating the object 4 with the processing laser a to give the treatment, The intensity of the processing laser a reflected from the irradiation object 4 and reaching the lens 2 can be measured, and the second mirror 6 is in a state where the reflection position I is taken by the first mirror 5. Measure the intensity of the processing laser a reflected and reaching the lens 2 A light intensity measuring means 8 that can output the laser beam 1 that is output from the laser oscillator 1 and passes through the lens 2; The processing laser a output from the laser oscillator 1 and reflected again by the first mirror 5 can be made incident on the lens 2 in accordance with the sum of the intensity of the laser a for processing. The laser irradiation apparatus characterized by the above.
The invention according to claim 3 is a laser irradiation method in which the laser a for processing from the laser oscillator 1 is focused or imaged through the lens 2 to irradiate the irradiated object 4.
Between the lens 2 and the object to be irradiated 4, a reflection position I for blocking the optical path between the lens 2 and the object to be irradiated 4 and reflecting the processing laser a, and between the lens 2 and the object to be irradiated 4. A first mirror 5 that can take an open position II that opens the optical path of
A second mirror that is disposed perpendicular to the optical axis L of the processing laser a reflected by the first mirror 5 that takes the reflection position I and reflects the processing laser a with a predetermined reflectance. 6 is placed,
By causing the first mirror 5 to adopt the reflection position I, the processing laser a transmitted through the lens 2 is reflected by the first mirror 5 and the second mirror 6 one after another, and from the laser oscillator 1. The lens 2 is transmitted in accordance with the sum of the intensity of the processing laser a output and transmitted through the lens 2 and the intensity of the processing laser a reflected from the irradiated object 4 and incident on the lens 2, The lens 2 is heated in the same manner as when the object to be irradiated 4 is irradiated with the processing laser a to give the processing,
In order to change the reflectance of the second mirror 6, an adjustment mechanism 9 for increasing or decreasing the intensity of the processing laser a is provided, and the intensity of the processing laser a output from the laser oscillator 1 and transmitted through the lens 2. And the intensity of the processing laser a reflected from the irradiated object 4 having different reflectivity and incident on the lens 2, and output from the laser oscillator 1 and again by the first mirror 5. The laser irradiation method is characterized in that the adjustment mechanism 9 can be operated so that the reflected processing laser a is incident on the lens 2.
The invention according to claim 4 is a laser irradiation apparatus in which the processing laser a from the laser oscillator 1 is focused or imaged through the lens 2 to irradiate the irradiated object 4.
Between the lens 2 and the object to be irradiated 4, a reflection position I for blocking the optical path between the lens 2 and the object to be irradiated 4 and reflecting the processing laser a, and between the lens 2 and the object to be irradiated 4. A first mirror 5 that can take an open position II that opens the optical path of
A second mirror that is disposed perpendicular to the optical axis L of the processing laser a reflected by the first mirror 5 that takes the reflection position I and reflects the processing laser a with a predetermined reflectance. 6 is placed,
By causing the first mirror 5 to adopt the reflection position I, the processing laser a transmitted through the lens 2 is reflected by the first mirror 5 and the second mirror 6 one after another, and from the laser oscillator 1. The lens 2 is transmitted in accordance with the sum of the intensity of the processing laser a output and transmitted through the lens 2 and the intensity of the processing laser a reflected from the irradiated object 4 and incident on the lens 2, The lens 2 is heated in the same manner as when the object to be irradiated 4 is irradiated with the processing laser a to give the processing,
In order to change the reflectance of the second mirror 6, an adjustment mechanism 9 for increasing or decreasing the intensity of the processing laser a is provided, and the intensity of the processing laser a output from the laser oscillator 1 and transmitted through the lens 2. And the intensity of the processing laser a reflected from the irradiated object 4 having different reflectivity and incident on the lens 2, and output from the laser oscillator 1 and again by the first mirror 5. The laser irradiation apparatus is characterized in that the adjustment mechanism 9 can be operated so that the reflected processing laser a is incident on the lens 2.
According to the fifth aspect of the present invention, the intensity of the processing laser a reflected from the irradiated object 4 and reaching the lens 2 can be measured with the first mirror 5 in the open position II. In addition, the light intensity measuring means 8 that can measure the intensity of the processing laser a that is reflected from the second mirror 6 and reaches the lens 2 in a state where the first mirror 5 has the reflection position I. The laser irradiation apparatus according to claim 4, wherein:
According to the sixth aspect of the present invention, the second mirror 6 is configured as a concave mirror, and the second mirror 6 is used without changing the focusing or imaging position of the processing laser a reflected from the first mirror 5. The second mirror (6) is disposed at a position farther from the condensing or imaging position of the processing laser (a) reflected from the first mirror (5) so as to be reflected. 5 is a laser irradiation apparatus .

  According to the inventions according to the independent claims 1 and 2, since the temperature of the lens is stabilized without irradiating the object to be irradiated with the processing laser, it is possible to prevent the focal length of the lens from changing due to the temperature change. The quality of the laser irradiating the irradiated object can always be kept constant. As a result, it is possible to avoid irradiating the irradiated object with an out-of-focus laser at the beginning of the irradiation of the processing laser to the irradiated object, and to produce only a high-quality irradiated object without wasting the irradiated object. be able to.

Moreover, this effect is also obtained when the irradiation object is changed to a different reflectance. That is, in the state where the first mirror is in the open position, the intensity of the processing laser reflected from the irradiated object and reaching the lens can be measured, and the reflection position is set in the first mirror. In this state, a light intensity measuring means that can measure the intensity of the processing laser reflected from the second mirror and reaching the lens is provided. For processing to reach the lens by reflecting the intensity of the laser that is reflected from the second mirror and reaches the lens through the first mirror by increasing or decreasing the reflectance of the second mirror. By adjusting so as to match the laser intensity, it is possible to prevent the focal length of the lens from changing due to a temperature change. As a result, when a plurality of new irradiated objects whose types have been changed are irradiated with processing lasers one after another, the temperature of the lens can be stabilized even during replacement of the same type of irradiated objects having the same reflectance. it can. In other words, the processing of one irradiated object is finished, and the first mirror is made to take the reflection position while the next irradiated object is set, so that the temperature of the lens and hence the focal length can be kept constant. .
If the reflectivity of the irradiated object having a different reflectivity is known, the reflectivity of the processing laser incident on the lens is changed by changing the reflectivity of the second mirror so as to match the reflectivity. What is necessary is just to adjust intensity | strength.

  In addition, when the processing laser is sequentially irradiated to a plurality of irradiated objects of the same type having the same reflectance, the intensity of the processing laser reflected from the second mirror during the replacement of the irradiated objects is increased. When the intensity of the processing laser reflected from the irradiated object does not match, it can be considered that the reflectivity of the first and second mirrors has changed with time, and confirmation of this change with time is possible. It can be easily handled.

  According to the inventions according to the independent claims 3 and 4, since the temperature of the lens is stabilized without irradiating the object to be irradiated with the processing laser, it is possible to prevent the focal length of the lens from changing due to the temperature change. The quality of the laser irradiating the irradiated object can always be kept constant. Moreover, this effect is also obtained when the irradiation object is changed to a different reflectance. That is, in order to substantially change the reflectivity of the second mirror, an adjustment mechanism for increasing or decreasing the intensity of the processing laser is provided, and the intensity of the processing laser output from the laser oscillator and transmitted through the lens is , Which is output from the laser oscillator and re-reflected by the first mirror in accordance with the sum of the intensity of the processing laser reflected from the irradiated object having different reflectivity and incident on the lens. Since the adjustment mechanism can be operated so that the laser is incident on the lens, the intensity of the processing laser that passes through the lens when the object is replaced with an object to be irradiated having a different reflectivity is By operating the adjustment mechanism or the like so as to be similar to the case where the object is treated, it is possible to prevent the focal length of the lens from changing due to the temperature change. Accordingly, when a plurality of new irradiated objects whose types have been changed are irradiated with the processing laser one after another, the temperature of the lens is stabilized even during the replacement of the irradiated objects.

  If the intensity of the processing laser reflected from the irradiated object with different reflectivity is known, output from the laser oscillator so that it matches the intensity of the laser that passes through the lens when the irradiated object is processed. The intensity of the processing laser transmitted through the lens and the intensity of the processing laser reflected from the irradiated object having different reflectivity and incident on the lens are matched with each other and output from the laser oscillator. The intensity of the processing laser may be adjusted by operating the adjusting mechanism so that the processing laser reflected again by the one mirror is incident on the lens.

  According to the fifth aspect of the present invention, the intensity of the reflected light of the processing laser reflected by the second mirror is measured by the intensity measuring means, and the intensity of the reflected light is used for processing on the irradiated object. By operating the adjustment mechanism of the intensity of the processing laser so as to match the intensity of the reflected light of the laser, the effect of the invention of claim 2 can be achieved.

  According to the invention according to the independent claim 6, the second mirror is constituted by a concave mirror and reflected by the second mirror without changing the condensing or imaging position of the processing laser reflected from the first mirror. As described above, since the second mirror is disposed at a position farther than the focusing or imaging position of the processing laser reflected from the first mirror, the second mirror serves as the lens, and the first mirror. It can be thermally separated from other devices such as to prevent mutual thermal effects. As a result, the second mirror is prevented from being affected by heat, such as a rise in temperature, and the lens can be heated in the same manner as when the object is irradiated with the processing laser. .

  1 to 4 show an embodiment of a laser irradiation apparatus including a mirror for maintaining the focal length of a condenser lens (lens) according to the present invention. In FIG. 1, reference numeral 1 denotes a laser oscillator, and a processing pulse laser a (wavelength: 308 nm, for example) from the laser oscillator 1 is turned 90 degrees by a mirror 10 that totally reflects the processing laser a. The laser a that has been guided to the condensing lens 2 and transmitted through the condensing lens 2 is condensed (or imaged) to irradiate the irradiated object 4, and the irradiated object 4 is subjected to processing such as crystallization. The laser a is actually passed through a mask (not shown) or the like, shaped into a rectangular laser having uniform intensity and imaged on the irradiated object 4. The condenser lens 2 is housed in the lens barrel 16, and the condenser lens 2 is indirectly cooled or heated by a temperature control device 3 comprising a Peltier element attached to the outside of the lens barrel 16, so that the temperature of the lens is set to a predetermined value. It has come to maintain.

  The irradiated object 4 is placed on the stage 11 in a replaceable manner, and a moving device 12 is attached to the stage 11. The moving device 12 moves the stage 11 relative to the laser oscillator 1 in a predetermined direction X. Thereby, the irradiated object 4 placed on the stage 11 is irradiated with the laser a at predetermined intervals, and the irradiated object 4 is modified and processed.

  Then, a first mirror 5 (reflection mirror) that reflects the processing laser a with a predetermined reflectance can be arranged between the condenser lens 2 and the irradiation object 4. This mirror 5 can block the optical path between the condensing lens 2 and the irradiated object 4, and is driven between the condensing lens 2 and the irradiated object 4 by being driven by the driving device 14. The reflection position I (shown by a solid line) that blocks the optical path of the light source and the open position II (shown by an imaginary line) that opens the optical path between the condenser lens 2 and the irradiated object 4 can be taken. The mirror 5 is usually constituted by a total reflection mirror. In this case, the mirror 5 functions as an optical shutter that blocks the processing laser a toward the stage 11 by taking the reflection position I. However, the processing laser a passes through the condenser lens 2 even when the optical path is closed by the optical shutter.

  Further, the processing laser a reflected from the second mirror 6 is reflected on the condenser lens 2 in accordance with the intensity of the processing laser a reflected from the irradiated object 4 having different reflectivity and incident on the lens 2. A processing laser a intensity adjusting mechanism 9 capable of increasing or decreasing the intensity of the processing laser a so as to be incident is provided, and the processing laser a is reflected at a predetermined reflectance. The mirror 6 is arranged. The mirror 6 is disposed perpendicular to the optical axis L of the processing laser a reflected by the first mirror 5 that takes the reflection position I, and is at a distance h1 from the first mirror 5. Is set to be equal to the distance h2 between the first mirror 5 and the object 4 to be irradiated. The second mirror 6 is usually constituted by a half mirror, and when the mirror 5 is constituted by a total reflection mirror, the reflectance (about 60%) is made the same as the reflectance of the irradiated object 4. is there. A water-cooled damper 17 is attached to the second mirror 6 to absorb the transmitted processing laser a. The adjusting mechanism 9 is disposed between the first mirror 5 and the second mirror 6, and is located at a position outside the optical path A 1 of the processing laser a between the laser oscillator 1 and the irradiated object 4. The intensity of the processing laser a that is incident / reflected by the mirror 6 and returns to the condenser lens 2 is adjusted. That is, the adjusting mechanism 9 is incident on and reflected by the second mirror 6 without affecting the intensity of the processing laser a on the optical path A1 for processing the irradiated object 4. In other words, the intensity of the processing laser a toward the condenser lens 2 is increased or decreased. Thereby, the reflectance of the 2nd mirror 6 can be changed substantially. That is, the processing laser a having the same intensity as when the reflectance of the second mirror 6 is changed can be directed to the condenser lens 2.

  Further, it is possible to measure the intensity of the reflected light c of the processing laser a reflected from the irradiated object 4 and reaching the lens 2 in the state where the first mirror 5 is in the open position II, and Light intensity measuring means capable of measuring the intensity of the reflected light c of the processing laser a which is reflected from the second mirror 6 and reaches the lens 2 in a state where the reflection position I is taken by the first mirror 5. 8 is provided. The light intensity measuring means 8 can measure the intensity of the reflected light c of the third mirror 20 that is transmitted from the laser oscillator 1 and incident from the front surface and incident on the front surface and reflected by the back surface. The reflected light c is reflected light of the processing laser a, and includes reflected light from the irradiated object 4 and reflected light from the second mirror 6. That is, in the state where the mirror 5 is in the open position II, the processing laser a emitted from the laser oscillator 1 passes through the third mirror 20, is redirected by the mirror 10, and passes through the condenser lens 2. After the object 4 is irradiated and reflected, the intensity of the reflected light c that is transmitted through the condenser lens 2, reflected by the mirror 10, and further reflected by the third mirror 20 can be measured. Further, the processing laser a output from the laser oscillator 1 is transmitted through the third mirror 20 while the mirror 5 is in the reflection position I, and the direction is changed by the mirror 10 and transmitted through the condenser lens 2. Then, after being reflected by the mirror 5 and the second mirror 6, the intensity of the reflected light c reflected by the mirror 5, transmitted through the condenser lens 2, reflected by the mirror 10, and further reflected by the third mirror 20. Can be measured.

  The intensity adjustment mechanism 9 of the processing laser a is the same as the reflected light of the processing laser a from the new irradiation object 4 when the irradiation object 4 having a different reflectance is replaced. The intensity of the processing laser a incident on the condenser lens 2 may be adjusted so that the reflected light from the second mirror 6 of the processing laser a is irradiated onto the condenser lens 2. It is also possible to provide between 2 and the first mirror 5. However, when the adjustment mechanism 9 is provided between the condensing lens 2 and the first mirror 5, the adjustment mechanism 9 is positioned at a position away from the optical path A1 and at the optical path A1, and the intensity of the processing laser a is increased. A structure that can take an adjustable position, that is, a structure that can advance and retreat, and a structure that does not affect the intensity of the processing laser a on the optical path A1 for processing the irradiated object 4. In addition, the reciprocating processing laser a passes through the adjustment mechanism 9, but the power (intensity) of the forward laser a before entering the adjustment mechanism 9 after exiting the adjustment mechanism 9. It is sufficient that the power of the returning laser a is adjusted appropriately.

  The adjusting mechanism 9 can be installed so as to be able to advance and retreat with respect to the optical path between the laser oscillator 1 and the condenser lens 2. When the adjustment mechanism 9 is moved between the laser oscillator 1 and the condenser lens 2, the condenser lens 2 is processed by the laser output from the laser oscillator 1 and transmitted through the adjustment mechanism 9 to a predetermined intensity. Laser a and the processing laser a reflected again by the first mirror 5 are transmitted.

  Since the processing laser a reflected again by the first mirror 5 and transmitted through the condenser lens 2 is not transmitted through the adjustment mechanism 9, the presence of the adjustment mechanism 9 serves to heat the condenser lens 2. Has no effect. Therefore, the adjustment mechanism 9 adjusts the intensity of the processing laser a output from the laser oscillator 1 and transmitted through the condenser lens 2.

  In this case, the condenser lens 2 is heated again by the intensity of the processing laser a output from the laser oscillator 1 and transmitted through the adjusting mechanism 9 and given a predetermined intensity, and again by the first mirror 5. Since the sum of the reflected intensity of the processing laser a is related, the sum of the intensity is output from the laser oscillator 1 and transmitted through the condenser lens 2 without passing through the adjusting mechanism 9. The adjusting mechanism 9 is operated so as to match the sum of the intensities of the processing lasers a reflected from the irradiated object 4 to be processed and incident on the condenser lens 2. Such an adjustment mechanism 9 can be operated by grasping in advance the reflectance of the object 4 to be processed next. Of course, the adjustment mechanism 9 retracts from the optical path between the laser oscillator 1 and the condenser lens 2 and starts the output from the laser oscillator 1 before starting the process on the irradiation object 4 to be processed next. Next, it is set to be suitable for processing the irradiated object 4 to be processed. In short, the sum of the intensity of the processing laser a output from the laser oscillator 1 and transmitted through the lens 2 and the intensity of the processing laser a reflected from the irradiated object 4 having different reflectivity and incident on the lens 2. If the processing laser a to be reflected again by the first mirror 5 is incident on the lens 2 in a reciprocating manner, the reflectance of the condenser lens 2 to be processed next is different. Heating can be performed according to the reflectance of the object to be irradiated 4.

  Further, a measuring means 7 for measuring the focal length of the condenser lens 2 is provided. Specifically, as shown in FIG. 2, the measuring means 7 passes a laser b (wavelength: for example, 635 nm) for measuring a focal length through a cylindrical lens 21 and then reflects it by a reflecting mirror 22 made of a half mirror to change the direction. In addition, the light is transmitted through the mirror 10, condensed through the condenser lens 2, transmitted through the first mirror 5 and irradiated onto the surface of the irradiated object 4, and the reflected light is reflected on the first mirror 5 and the condenser lens 2. And the mirrors 10 and 22 are sequentially passed and received by the measuring device 24. Therefore, the mirror 10 and the first mirror 5 can totally reflect the processing laser a, but transmit the focal length measurement laser b. The condensing position of the processing laser a on the irradiated object 4 coincides with the condensing position of the focal length measuring laser b.

  Then, from the shape of the light b received by the measuring device 24, it is possible to determine whether or not the distance on the optical axis between the condenser lens 2 and the object to be irradiated 4 and thus the focal length of the condenser lens 2 is appropriate. The focal length of the condenser lens 2 is measured as a distance difference B-A on the optical axis between the condenser lens 2 and the object 4 to be irradiated. The shape of the light received by the measuring device 24 is as shown in FIG. 3, FIG. 3 (a) shows that the focal length of the condenser lens 2 is too long, FIG. 3 (b) shows an appropriate state, and FIG. Indicates that the focal length of the condenser lens 2 is too short.

Next, the operation will be described.
First, an operation in the case where treatments are given one after another while exchanging irradiated objects 4 having the same reflectance will be described.
The processing pulse laser a from the laser oscillator 1 is transmitted through the third mirror 20, is turned 90 degrees by the mirror 10 that totally reflects, is guided to the condenser lens 2, and is transmitted through the condenser lens 2. The irradiated laser a is condensed and irradiated to the irradiation object 4, and the irradiation object 4 is modified. If the object to be irradiated 4 is formed by forming a thin a-Si film on a glass substrate, the a-Si film is crystallized and modified into a thin p-Si film by irradiation with the laser a. At this time, the first mirror 5 takes an open position II where the optical path between the condenser lens 2 and the object to be irradiated 4 is opened.

  When the irradiation process of the laser a with respect to one irradiation object 4 is completed, the irradiation object 4 on the stage 11 is replaced with a new irradiation object 4. At that time, the first mirror 5 (reflection mirror) is driven by the driving device 14 to block the optical path between the condensing lens 2 and the irradiation object 4 so that the processing laser a has a predetermined reflectance. The reflection position I for reflection is taken.

  As a result, the processing pulse laser a that passes through the condenser lens 2 is reflected by the first mirror 5 that takes the reflection position I, is incident on the second mirror 6 and is partially reflected, Again, the light is reflected by the first mirror 5 and passes through the condenser lens 2. Accordingly, by matching the intensity of the laser a reflected by the first mirror 5 toward the condenser lens 2 with the intensity of the laser a reflected from the irradiated object 4, the irradiated object 4 is irradiated with the laser a. The condenser lens 2 is heated in the same manner as when the condenser lens 2 is irradiated, and the fluctuation of the focal length due to the cooling of the condenser lens 2 is prevented. Note that it is desirable that the processing laser a transmitted through the first mirror 5 does not affect the modification process of the irradiated object 4.

  In particular, when the first mirror 5 is configured by a total reflection mirror, the second mirror 6 is separated by a distance h1 equal to the distance h2 between the first mirror 5 and the irradiated object 4. And by making the reflectance of the second mirror 6 equal to the reflectance of the object 4 to be irradiated, the laser a reflected by the first mirror 5 toward the condenser lens 2 can be easily obtained. The intensity can be matched with the intensity of the pulsed laser a reflected from the irradiation object 4.

  Note that the case where the first mirror 5 adopts the reflection position I is not limited to the replacement of the same type of irradiated object 4, but when the irradiated object 4 is removed from the stage 11, and the condenser lens. The case where it is necessary to maintain the temperature of 2 is widely included.

  Further, the condenser lens 2 is accommodated in the lens barrel 16, and the temperature control device 3 attached to the lens barrel 16 cools the condenser lens 2 via the lens barrel 16, so that the temperature of the lens 2 is maintained at a predetermined level. Similarly to the case where the processing laser a is guided to the irradiated object 4, the lens 2 is directly heated by the laser a to increase the temperature, while the temperature control of the lens a is indirectly performed from the side. However, the temperature control device 3 can be omitted. When the temperature control device 3 is omitted, the condenser lens 2 is heated by the processing laser a and the temperature rise is subsided. What is necessary is just to start irradiation of the processing laser a to the irradiated object 4.

  The measuring means 7 for measuring the focal length of the condenser lens 2 irradiates the surface of the object 4 with a focal length measuring laser b, and the reflected light b is applied to the condenser lens 2 and the mirrors 5, 10 and 22. Since the light is passed and received by the measuring device 24, it can be known from the shape of the laser b received by the measuring device 24 that the focal length of the condenser lens 2 is in an appropriate state. Since the focal length of the condenser lens 2 is appropriate, it can be known that the temperature of the condenser lens 2 is appropriate.

  When the temperature control device 3 is provided, the focal length of the condenser lens 2 is appropriate in a state where the condenser lens 2 is heated by the processing laser a and reaches the equilibrium temperature while suppressing the temperature rise. The measuring device 24 measures whether or not it is in a state. When the temperature control device 3 is omitted, whether or not the focal length of the condensing lens 2 is in an appropriate state in a state where the condensing lens 2 is heated by the processing laser a and the temperature rise has subsided. Is measured by the measuring device 24.

  Actually, a laser a for processing (a wavelength 308 nm, a repetition rate of 300 Hz) is oscillated using a laser oscillator LS2000 manufactured by Lambda Physic as the laser oscillator 1, and a dielectric multilayer film that totally reflects the laser a is made of quartz. The vapor-deposited first mirror 5 was installed between the condenser lens 2 and the object 4 to be tilted by 45 degrees with respect to the optical axis. The first mirror 5 can transmit a diode laser having a wavelength of 635 nm, which is a laser b for measuring a focal length.

  A second mirror 6 made of a half mirror was installed at a position separated by a distance h1 equal to the distance h2 from the mirror 5 to the irradiated object 4 in the traveling direction of the processing laser a reflected by the first mirror 5. The second mirror 6 was arranged perpendicular to the optical axis L bent 90 degrees by the first mirror 5.

  The second mirror 6 has a reflectivity of 60% with respect to light having a wavelength of 308 nm (processing laser a), and the amorphous silicon having a thickness of 50 nm, which is the object to be irradiated 4, has a thickness of 0.5 mm. It was made equal to the reflectance with respect to the light a of wavelength 308nm of the board | substrate vapor-deposited on the glass plate.

  Further, measuring means 7 for irradiating the irradiated object 4 with light having a wavelength of 635 nm (laser b for measuring the focal length) through the mirror 5 and measuring the focal length of the condenser lens 2 using the reflected light b. Was provided.

  A Peltier element (temperature control device 3) was installed outside the lens barrel 16 of the condenser lens 2 to control the temperature of the lens 2.

  It was confirmed that the temperature of the condenser lens 2 can be maintained substantially constant by the first and second mirrors 5 and 6 by using such a laser irradiation apparatus. However, since it is not usually necessary to change the focal length of the condensing lens 2 when exchanging the same type of object 4 to be irradiated, the first mirror 5 can reflect the focal length measuring laser b, Instead of directly irradiating the irradiated object 4 with the laser b for measuring the focal length through the mirror 5 and directly measuring the focal length of the condensing lens 2 by the measuring means 7, the measuring means 7 performs the first measurement. It is also possible to indirectly measure the focal length of the condenser lens 2 by measuring the reflected light of the laser b for measuring the focal length from the second mirrors 5 and 6.

  Next, an operation in the case where the irradiated object 4 is replaced with a different type having different reflectivities and processing is performed one after another while replacing the same irradiated object 4 will be described. First, the reflectance of the irradiation object 4 on the stage 11 scheduled to be exchanged and processed is measured as the intensity of the reflected light c. That is, the light intensity measuring means 8 measures the intensity of the reflected light c of the processing laser a on the irradiated object 4 as described above. Next, the intensity of the reflected light c of the processing laser a reflected by the second mirror 6 is measured by the light intensity measuring means 8 as described above, and the intensity of the reflected light c is measured by the irradiated object 4. The intensity adjusting mechanism 9 of the processing laser a is operated so as to match the intensity of the reflected light c of the processing laser a. In this state, when the irradiated object 4 having the same reflectance is exchanged and processing is performed one after another, when the irradiated object 4 is removed from the stage 11 for exchanging the irradiated object 4, the reflectance described above is obtained. The temperature of the condensing lens 2 can be maintained by the action in the case where processing is performed one after another while exchanging the same irradiated object 4.

  If a plurality of second mirrors 6 with known reflectivities are prepared, the intensity of the reflected light c of the processing laser a from the irradiated object 4 is measured by the light intensity measuring means 8, and this intensity is measured. After grasping the reflectance of the irradiated object 4 scheduled to be processed from the above, the mechanism 9 for adjusting the intensity of the processing laser a is operated by replacing the second mirror 6 with the same reflectance. Similarly, the intensity of the reflected light c of the processing laser a reflected by the second mirror 6 can be matched with the intensity of the reflected light c of the processing laser a on the irradiated object 4. Therefore, the adjustment mechanism 9 can be omitted.

  Actually, a laser a for processing (a wavelength 308 nm, a repetition rate of 300 Hz) is oscillated using a laser oscillator LS2000 manufactured by Lambda Physic as the laser oscillator 1, and a dielectric multilayer film that totally reflects the laser a is made of quartz. The vapor-deposited first mirror 5 was installed between the condenser lens 2 and the object 4 to be tilted by 45 degrees with respect to the optical axis. The first mirror 5 can transmit a diode laser having a wavelength of 635 nm, which is a laser b for measuring a focal length.

  A second mirror 6 made of a half mirror was installed at a position separated by a distance h1 equal to the distance h2 from the mirror 5 to the irradiated object 4 in the traveling direction of the processing laser a reflected by the first mirror 5. The second mirror 6 was arranged perpendicular to the optical axis L bent 90 degrees by the first mirror 5.

  The second mirror 6 has a reflectivity of 60% with respect to light having a wavelength of 308 nm (processing laser a), and the amorphous silicon having a thickness of 50 nm, which is the object to be irradiated 4, has a thickness of 0.5 mm. It was made equal to the reflectance with respect to the light a of wavelength 308nm of the board | substrate vapor-deposited on the glass plate.

  Further, measuring means 7 for irradiating the irradiated object 4 with light having a wavelength of 635 nm (laser b for measuring the focal length) through the mirror 5 and measuring the focal length of the condenser lens 2 using the reflected light b. Was provided.

  A Peltier element (temperature control device 3) was installed outside the lens barrel 16 of the condenser lens 2 to control the temperature of the lens 2.

  Using such a laser irradiation apparatus, the intensity of the reflected light c of the processing laser a reflected by the second mirror 6 is measured by the light intensity measuring means 8, and the intensity of the reflected light c is irradiated. By operating the adjusting mechanism 9 of the intensity of the processing laser a so as to match the intensity of the reflected light c of the processing laser a at the object 4, the first and second mirrors 5 and 6 are used. It was confirmed that the temperature of the condenser lens 2 can be maintained almost constant.

  As described above, when the mechanism for adjusting the intensity of the processing laser a 9 is replaced with the irradiated object 4 having a different reflectance, the reflected light of the processing laser a similar to the new irradiated object 4 is reflected. The intensity of the processing laser a incident on the condensing lens 2 may be adjusted so that the condensing lens 2 is irradiated, and may be provided between the condensing lens 2 and the first mirror 5. . At that time, the light intensity measuring means 8 grasps the reflectivity of the irradiated object 4 having a different reflectivity scheduled to be subjected to a new process by causing the first mirror 5 and the adjusting mechanism 9 to take a position out of the optical path. After that, the first mirror 5 and the adjustment mechanism 9 are positioned on the optical path so that the intensity of the processing laser a can be adjusted, and are incident on the condenser lens 2 by the operation of the adjustment mechanism 9. The intensity of the processing laser a is adjusted.

  Thereby, after changing to the irradiated object 4 with a different reflectance, when processing is performed while exchanging the irradiated object 4 one after another, the processing is performed successively while exchanging the irradiated object 4 having the same reflectance described above. Similarly to the case of giving, the intensity of the laser a reflected by the first mirror 5 and directed to the condenser lens 2 is matched with the intensity of the pulsed laser a reflected from the object 4 to be reflected by the condenser lens 2. It is possible to maintain the temperature. Of course, when the temperature of the condenser lens 2 is maintained, the first mirror 5 and the adjusting mechanism 9 are positioned on the optical path A1 so that the intensity of the processing laser a can be adjusted.

  In short, the light intensity measuring means 8 reflects the intensity of the processing laser a that is reflected by the irradiated object 4 and is incident on the condenser lens 2, and the process that is reflected by the second mirror 6 and incident on the condenser lens 2. It is only necessary to measure the intensity of the laser a for processing, and the adjusting mechanism 9 for the intensity of the processing laser a is reflected by the irradiated object 4 and incident on the condenser lens 2. It is only necessary that the intensity of the processing laser a reflected by the second mirror 6 and incident on the condenser lens 2 can be increased or decreased without affecting the intensity during the process. When the reflectance of the irradiated object 4 having a different reflectance is known and the intensity of the processing laser a reflected from the irradiated object 4 is known, the second is set so as to match the intensity. Since the intensity of the processing laser a reflected from the mirror 6 and incident on the condenser lens 2 may be adjusted by operating the adjusting mechanism 9, the light intensity measuring means 8 can also be omitted.

  By the way, in the first embodiment, the focal length measurement laser b is condensed through the condenser lens 2 and reflected by the irradiated object 4. However, the first mirror 5 and the second mirror are used. 6 can be reflected one after another and received by the measuring device 24. At this time, the second mirror 6 is arranged at a position equivalent to the irradiated object 4 with respect to the first mirror 5.

  That is, the focal length measurement laser b is condensed through the condenser lens 2, reflected one after another by the first mirror 5 and the second mirror 6, and reflected again by the first mirror 5. The laser b for measuring the focal length is guided through the condenser lens 2 and received by the measuring device 24 of the measuring means 7 that measures the focal length of the condenser lens 2. That is, the measuring means 7 passes the laser b (wavelength: 635 nm, for example) for measuring the focal length through the cylindrical lens 21 and then reflects it by the reflecting mirror 22 made of a half mirror to change the direction and transmit the mirror 10 to collect it. A focal length that is condensed through the optical lens 2, reflected one after another by the first mirror 5 and the second mirror 6, and incident on the first mirror 5 and reflected again as indicated by a broken line in FIG. The measuring laser b is sequentially passed through the condenser lens 2 and the mirrors 10 and 22 and is received by the measuring device 24. Accordingly, the mirror 10 can totally reflect the processing laser a, but transmits the focal length measurement laser b. The first mirror 5 may be configured to totally reflect the focal length measurement laser b. However, the focal length measurement laser b reflected from the second mirror 6 and the first mirror 5 may be used. As long as it can be measured separately from the focal length measurement laser b that passes through and returns to the condenser lens 2, it can be configured to reflect a part of the focal length measurement laser b.

  Then, the temperature of the condensing lens 2 is adjusted while increasing or decreasing the intensity of the processing laser a to prevent the focal length of the condensing lens 2 from changing due to the temperature change. Always keep the quality of the laser to irradiate constant. As a result, the first mirror 5 is set to the open position II, and at the initial stage of starting the irradiation / processing of the processing laser a to the irradiation object 4 on the stage 11, the laser beam of defocusing is applied to the irradiation object 4. It is possible to avoid hitting, and it is possible to produce only the high-quality irradiated object 4 without wasting the irradiated object 4.

That is, by causing the first mirror 5 to adopt the reflection position I, the processing laser a and the focal length measurement laser b that are transmitted through the condenser lens 2 are converted into the first mirror 5 and the second mirror 6. In this state, the first mirror 5 takes the open position II with respect to the intensities of the processing laser a and the focal length measuring laser b reflected again by the first mirror 5. When the processing laser a reflected from the irradiated object 4 is matched with the intensity of the processing laser a during the processing, the condensing lens 2 is transmitted, and the processed laser a is irradiated to the irradiated object 4 to be processed. The focal length of the condenser lens 2 can be maintained at a predetermined value by heating the condenser lens 2 in the same manner as in FIG. Since the intensity of the laser b for measuring the focal length is known and very small, the laser oscillator 1 is operated according to the intensity of the laser b for measuring the focal length, and the processing laser a output from the laser oscillator 1 Reduce strength. The intensity of the processing laser a can be grasped by the light intensity measuring means 8 that can measure the intensity of the reflected light c. As described above, it can be known from the shape of the laser b received by the measuring instrument 24 that the focal length of the condenser lens 2 is in an appropriate state. Since the focal length of the condenser lens 2 is appropriate, it can be known that the temperature of the condenser lens 2 is appropriate.
According to this, it is possible to determine the suitability of the focal length of the condenser lens 2 without placing the irradiated object 4 on the stage 11.

  Further, when the processing laser a or the like is reflected by the first mirror 5 and the second mirror 6 for a long time, the temperature of the first mirror 5 and the second mirror 6 rises locally, and the lens effect is increased. As a result, the shape of the reflected light of the processing laser a changes, or the shape of the focal length measurement laser b reflected by the first mirror 5 and the second mirror 6 changes. . In order to prevent this fluctuation, temperature control means 26 and 27 for controlling the temperature can be provided on at least one of the first mirror 5 and the second mirror 6. The temperature control means 26 and 27 are constituted by, for example, a water cooling means for maintaining a constant temperature, a Peltier element, or the like, and are provided at positions that do not hinder the progress of the processing laser a and the focal length measurement laser b. . The influence of temperature change can also be prevented for the focal length measurement laser b.

  Thereby, the intensity of the processing laser a reflected again by the first mirror 5 and the intensity of the focal length measuring laser b from the irradiated object 4 at a constant temperature moving relative to the processing laser a. It is possible to reflect the processing laser a and the focal length measurement laser b from the mirrors 5 and 6 so as to match the intensity distribution of the processing laser a at the time of the reflected process as much as possible. It is also effective to use a material having a high thermal conductivity as the base of the mirrors 5 and 6 to suppress temperature changes.

  Further, as shown in FIG. 4, the second mirror 6 is constituted by a concave mirror 6 ′, and the condensing or imaging positions of the processing laser a and the focal length measuring laser b reflected from the first mirror 5. The second mirror 6 (6 ′) can be disposed so as to be reflected by the second mirror 6 without changing the angle. According to this, the concave mirror 6 ′ is disposed at a position farther from the condensing or imaging position of the processing laser a and the focal length measuring laser b reflected from the first mirror 5, and the first mirror is arranged. The processing laser “a” and the focal length measurement laser “b” reflected from 5 can be returned through the same path as that of the second mirror 6 formed of a plane mirror shown in FIG. Thus, the second mirror 6 (concave mirror 6 ′) and the damper 17 are arranged away from the first mirror 5 and the condenser lens 2, and the temperature of the second mirror 6 and the damper 17 rises to the first. This effectively suppresses the thermal effect on the mirror 5 and the condenser lens 2. When the focal length measurement laser b is reflected by the concave mirror 6 ′, the focal length measurement laser b reflected by the concave mirror 6 ′ is also reflected in substantially the same manner as when the second mirror 6 is configured by a plane mirror. .

1 is a front view showing a laser irradiation apparatus according to an embodiment of the present invention. Similarly, the rear view which shows the measurement means with which a laser irradiation apparatus is equipped concretely. The figure which shows the shape of the laser for focal distance measurement similarly received with the measuring device. The figure which shows the principal part of the structural example which similarly comprised the 2nd mirror with the concave mirror.

Explanation of symbols

1: Laser oscillator 2: Condensing lens (lens)
3: Temperature control device 4: Object to be irradiated 5: First mirror 6: Second mirror 6 ': Concave mirror (second mirror)
7: Measuring means 8: Light intensity measuring means 9: Adjustment mechanism 11: Stage 12: Moving device 24: Measuring device a: Laser for processing b: Laser for measuring focal length c: Reflected light h1, h2: Distance I: Reflection position II: Open position L: Optical axis X: Predetermined direction

Claims (6)

In a laser irradiation method in which a processing laser (a) from a laser oscillator (1) is focused or imaged through a lens (2) and irradiated to an irradiated object (4),
Reflection position (I) between the lens (2) and the object (4) for reflecting the processing laser (a) by blocking the optical path between the lens (2) and the object (4). And a first mirror (5) that can take an open position (II) that opens an optical path between the lens (2) and the irradiated object (4), and
The processing laser (a) is arranged perpendicular to the optical axis (L) of the processing laser (a) reflected by the first mirror (5) taking the reflection position (I). A second mirror (6) that reflects at a reflectance of
By causing the first mirror (5) to adopt the reflection position (I), the processing laser (a) that passes through the lens (2) is changed into the first mirror (5) and the second mirror (6). The intensity of the processing laser (a) reflected one after another by the first mirror (5) and reflected again by the first mirror (5) is set so that the first mirror (5) takes the open position (II). Matching the intensity of the processing laser (a) reflected from the irradiated object (4), transmitting the lens (2), and irradiating the irradiated object (4) with the processing laser (a) Heating the lens (2) in the same way as giving the treatment,
It is possible to measure the intensity of the processing laser (a) reflected from the irradiated object (4) and reaching the lens (2) with the first mirror (5) in the open position (II). The intensity of the processing laser (a) that is reflected from the second mirror (6) and reaches the lens (2) with the first mirror (5) taking the reflection position (I) A light intensity measuring means (8) that can measure the intensity of the processing laser (a) output from the laser oscillator (1) and transmitted through the lens (2), and an object to be irradiated having a different reflectance Matched with the intensity of the processing laser (a) reflected from (4) and incident on the lens (2), and output from the laser oscillator (1) by the first mirror (5). The processing laser (a) reflected again can be incident on the lens (2). Laser irradiation method comprising. In the laser irradiation apparatus for condensing or image-forming the processing laser (a) from the laser oscillator (1) through the lens (2) and irradiating the irradiated object (4),
Reflection position (I) between the lens (2) and the object (4) for reflecting the processing laser (a) by blocking the optical path between the lens (2) and the object (4). And a first mirror (5) that can take an open position (II) that opens an optical path between the lens (2) and the irradiated object (4), and
The processing laser (a) is arranged perpendicular to the optical axis (L) of the processing laser (a) reflected by the first mirror (5) taking the reflection position (I). A second mirror (6) that reflects at a reflectance of
By causing the first mirror (5) to adopt the reflection position (I), the processing laser (a) that passes through the lens (2) is changed into the first mirror (5) and the second mirror (6). The intensity of the processing laser (a) reflected one after another by the first mirror (5) and reflected again by the first mirror (5) is set so that the first mirror (5) takes the open position (II). Matching the intensity of the processing laser (a) reflected from the irradiated object (4), transmitting the lens (2), and irradiating the irradiated object (4) with the processing laser (a) Heating the lens (2) in the same way as giving the treatment,
It is possible to measure the intensity of the processing laser (a) reflected from the irradiated object (4) and reaching the lens (2) with the first mirror (5) in the open position (II). The intensity of the processing laser (a) that is reflected from the second mirror (6) and reaches the lens (2) with the first mirror (5) taking the reflection position (I) A light intensity measuring means (8) that can measure the intensity of the processing laser (a) output from the laser oscillator (1) and transmitted through the lens (2), and an object to be irradiated having a different reflectance Matched with the intensity of the processing laser (a) reflected from (4) and incident on the lens (2), and output from the laser oscillator (1) by the first mirror (5). The processing laser (a) reflected again can be incident on the lens (2). The laser irradiation apparatus according to claim. In a laser irradiation method in which a processing laser (a) from a laser oscillator (1) is focused or imaged through a lens (2) and irradiated to an irradiated object (4),
Reflection position (I) between the lens (2) and the object (4) for reflecting the processing laser (a) by blocking the optical path between the lens (2) and the object (4). And a first mirror (5) that can take an open position (II) that opens an optical path between the lens (2) and the irradiated object (4), and
The processing laser (a) is arranged perpendicular to the optical axis (L) of the processing laser (a) reflected by the first mirror (5) taking the reflection position (I). A second mirror (6) that reflects at a reflectance of
By causing the first mirror (5) to adopt the reflection position (I), the processing laser (a) that passes through the lens (2) is changed into the first mirror (5) and the second mirror (6). And the intensity of the processing laser (a) output from the laser oscillator (1) and transmitted through the lens (2), and reflected from the irradiated object (4) to the lens (2). Same as when processing is performed by irradiating the object to be irradiated (4) with the processing laser (a) through the lens (2) in accordance with the sum of the intensity of the incident processing laser (a). While heating the lens (2)
In order to change the reflectance of the second mirror (6), an adjustment mechanism (9) for increasing or decreasing the intensity of the processing laser (a) is provided, and the lens (2) is output from the laser oscillator (1). To the sum of the intensity of the processing laser (a) that passes through and the intensity of the processing laser (a) that is reflected from the irradiated object (4) having a different reflectance and is incident on the lens (2). The adjustment mechanism (9) is operated so that the processing laser (a) output from the laser oscillator (1) and reflected again by the first mirror (5) is incident on the lens (2). It is possible to perform the laser irradiation method. In the laser irradiation apparatus for condensing or image-forming the processing laser (a) from the laser oscillator (1) through the lens (2) and irradiating the irradiated object (4),
Reflection position (I) between the lens (2) and the object (4) for reflecting the processing laser (a) by blocking the optical path between the lens (2) and the object (4). And a first mirror (5) that can take an open position (II) that opens an optical path between the lens (2) and the irradiated object (4), and
The processing laser (a) is arranged perpendicular to the optical axis (L) of the processing laser (a) reflected by the first mirror (5) taking the reflection position (I). A second mirror (6) that reflects at a reflectance of
By causing the first mirror (5) to adopt the reflection position (I), the processing laser (a) that passes through the lens (2) is changed into the first mirror (5) and the second mirror (6). And the intensity of the processing laser (a) output from the laser oscillator (1) and transmitted through the lens (2), and reflected from the irradiated object (4) to the lens (2). Same as when processing is performed by irradiating the object to be irradiated (4) with the processing laser (a) through the lens (2) in accordance with the sum of the intensity of the incident processing laser (a). While heating the lens (2)
In order to change the reflectance of the second mirror (6), an adjustment mechanism (9) for increasing or decreasing the intensity of the processing laser (a) is provided, and the lens (2) is output from the laser oscillator (1). To the sum of the intensity of the processing laser (a) that passes through and the intensity of the processing laser (a) that is reflected from the irradiated object (4) having a different reflectance and is incident on the lens (2). The adjustment mechanism (9) is operated so that the processing laser (a) output from the laser oscillator (1) and reflected again by the first mirror (5) is incident on the lens (2). A laser irradiation apparatus characterized by that. Measuring the intensity of the processing laser (a) reflected from the irradiated object (4) and reaching the lens (2) with the first mirror (5) in the open position (II). Of the processing laser (a) that is reflected from the second mirror (6) and reaches the lens (2) in a state where the first mirror (5) has taken the reflection position (I). 5. The laser irradiation apparatus according to claim 4, wherein a light intensity measuring means (8) capable of measuring the intensity is provided. The second mirror (6) is a concave mirror, and the second mirror (6) does not change the light condensing or imaging position of the processing laser (a) reflected from the first mirror (5). The second mirror (6) is disposed at a position farther than the condensing or imaging position of the processing laser (a) reflected from the first mirror (5) so as to be reflected. The laser irradiation apparatus according to claim 4 or 5.

Images