JP4944642B2 - デバイスの製造方法 - Google Patents
デバイスの製造方法 Download PDFInfo
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- JP4944642B2 JP4944642B2 JP2007060136A JP2007060136A JP4944642B2 JP 4944642 B2 JP4944642 B2 JP 4944642B2 JP 2007060136 A JP2007060136 A JP 2007060136A JP 2007060136 A JP2007060136 A JP 2007060136A JP 4944642 B2 JP4944642 B2 JP 4944642B2
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- 238000004519 manufacturing process Methods 0.000 title claims description 23
- 239000002313 adhesive film Substances 0.000 claims description 107
- 238000000034 method Methods 0.000 claims description 55
- 230000001678 irradiating effect Effects 0.000 claims description 15
- 239000004065 semiconductor Substances 0.000 description 66
- 238000005520 cutting process Methods 0.000 description 26
- 230000011218 segmentation Effects 0.000 description 9
- 230000001681 protective effect Effects 0.000 description 6
- 238000001514 detection method Methods 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910009372 YVO4 Inorganic materials 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/60—Preliminary treatment
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- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/30—Organic material
- B23K2103/42—Plastics
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
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- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
- H01L2221/68336—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
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- H01L2224/29001—Core members of the layer connector
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Description
ウエーハの表面側から分割予定ラインに沿って所定の深さの分割溝を形成した後にウエーハの裏面を研削して裏面に該分割溝を表出させ、ウエーハを個々のデバイスに分割するウエーハ分割工程と、
個々のデバイスに分割されたウエーハの裏面に紫外線を照射することにより硬化する接着フィルムを装着する接着フィルム装着工程と、
該接着フィルムが装着されたウエーハの該接着フィルム側を環状のフレームに装着されたダイシングテープの表面に貼着するウエーハ支持工程と、
該ダイシングテープに貼着されたウエーハの表面側から紫外線を照射し、ウエーハに形成された該分割溝を通して該接着フィルムに紫外線を照射することにより、該接着フィルムにおける該分割溝に対応する領域を硬化せしめる接着フィルム硬化工程と、
ウエーハの表面側から該分割溝に沿って該接着フィルムに対して吸収性を有する波長のレーザー光線を照射し、該分割溝に沿って硬化せしめられた該接着フィルムをデバイス毎に分割する接着フィルム分割工程と、
デバイス毎に分割された該接着フィルムが装着されているデバイスを該ダイシングテープから剥離してピックアップするピックアップ工程と、を含む、
ことを特徴とするデバイスの製造方法が提供される。
なお、接着フィルム硬化工程は、紫外線領域の波長を有するレーザー光線を分割溝210を通して接着フィルム6に照射し、接着フィルム6における分割溝210に対応する領域6a硬化するようにしてもよい。
レーザー光線の種類 :LD励起QスイッチYAGレーザー
波長 :355nm
繰り返し周波数 :100kHz
平均出力 :1W
集光スポット径 :φ15μm
加工送り速度 :100mm/秒
上述した接着フィルム分割工程が実施され裏面に接着フィルム6が装着された個々のデバイス22をダイシングテープTを介して支持した環状のフレームFを図11の(a)に示すようにフレーム保持手段96を構成するフレーム保持部材961の載置面961a上に載置し、クランプ962によってフレーム保持部材961に固定する(フレーム保持工程)。このとき、フレーム保持部材961は図11の(a)に示す基準位置に位置付けられている。
21:分割予定ライン
22:デバイス
3:切削装置
31:切削装置のチャックテーブル
32:切削手段
321:切削ブレード
4:保護部材
5:研削装置
51:研削装置のチャックテーブル
52:研削砥石
53:研削手段
6:接着フィルム
7:紫外線照射器
8:レーザー加工装置
81:レーザー加工装置のチャックテーブル
82:レーザー光線照射手段
822:集光器
9:ピックアップ装置
91:基台
92:第1のテーブル
93:第2のテーブル
94:第1の移動手段
95:第2の移動手段
96:フレーム保持手段
97:テープ拡張手段
98:回動手段
10:検出手段
11:ピックアップ手段
F:環状のフレーム
T:ダイシングテープ
Claims (2)
- 表面に格子状に形成された分割予定ラインによって区画された複数の領域にデバイスが形成されたウエーハを分割予定ラインに沿って個々のデバイスに分割するとともに、各デバイスの裏面にダイボンディング用の接着フィルムを装着するデバイスの製造方法であって、
ウエーハの表面側から分割予定ラインに沿って所定の深さの分割溝を形成した後にウエーハの裏面を研削して裏面に該分割溝を表出させ、ウエーハを個々のデバイスに分割するウエーハ分割工程と、
個々のデバイスに分割されたウエーハの裏面に紫外線を照射することにより硬化する接着フィルムを装着する接着フィルム装着工程と、
該接着フィルムが装着されたウエーハの該接着フィルム側を環状のフレームに装着されたダイシングテープの表面に貼着するウエーハ支持工程と、
該ダイシングテープに貼着されたウエーハの表面側から紫外線を照射し、ウエーハに形成された該分割溝を通して該接着フィルムに紫外線を照射することにより、該接着フィルムにおける該分割溝に対応する領域を硬化せしめる接着フィルム硬化工程と、
ウエーハの表面側から該分割溝に沿って該接着フィルムに対して吸収性を有する波長のレーザー光線を照射し、該分割溝に沿って硬化せしめられた該接着フィルムをデバイス毎に分割する接着フィルム分割工程と、
デバイス毎に分割された該接着フィルムが装着されているデバイスを該ダイシングテープから剥離してピックアップするピックアップ工程と、を含む、
ことを特徴とするデバイスの製造方法。 - 該ピックアップ工程は、該接着フィルムが装着されているデバイスをダイシングテープから剥離する前に、ダイシングテープを拡張してデバイス間の隙間を広げるテープ拡張工程を実施する、請求項1記載のデバイスの製造方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007060136A JP4944642B2 (ja) | 2007-03-09 | 2007-03-09 | デバイスの製造方法 |
US12/038,224 US7910459B2 (en) | 2007-03-09 | 2008-02-27 | Method of manufacturing device having a UV-curable adhesive |
CN200810082925XA CN101261934B (zh) | 2007-03-09 | 2008-03-07 | 器件制造方法 |
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Application Number | Priority Date | Filing Date | Title |
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JP2007060136A JP4944642B2 (ja) | 2007-03-09 | 2007-03-09 | デバイスの製造方法 |
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Publication Number | Publication Date |
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JP2008226982A JP2008226982A (ja) | 2008-09-25 |
JP4944642B2 true JP4944642B2 (ja) | 2012-06-06 |
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Application Number | Title | Priority Date | Filing Date |
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JP2007060136A Active JP4944642B2 (ja) | 2007-03-09 | 2007-03-09 | デバイスの製造方法 |
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US (1) | US7910459B2 (ja) |
JP (1) | JP4944642B2 (ja) |
CN (1) | CN101261934B (ja) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2008235650A (ja) * | 2007-03-22 | 2008-10-02 | Disco Abrasive Syst Ltd | デバイスの製造方法 |
JP5155030B2 (ja) * | 2008-06-13 | 2013-02-27 | 株式会社ディスコ | 光デバイスウエーハの分割方法 |
FR2943176B1 (fr) * | 2009-03-10 | 2011-08-05 | 3D Plus | Procede de positionnement des puces lors de la fabrication d'une plaque reconstituee |
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