JP4695410B2 - ドープの調製方法及びポリマーフィルムの製造方法 - Google Patents
ドープの調製方法及びポリマーフィルムの製造方法 Download PDFInfo
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- JP4695410B2 JP4695410B2 JP2005056932A JP2005056932A JP4695410B2 JP 4695410 B2 JP4695410 B2 JP 4695410B2 JP 2005056932 A JP2005056932 A JP 2005056932A JP 2005056932 A JP2005056932 A JP 2005056932A JP 4695410 B2 JP4695410 B2 JP 4695410B2
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- 229910052759 nickel Inorganic materials 0.000 description 1
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 1
- YAFOVCNAQTZDQB-UHFFFAOYSA-N octyl diphenyl phosphate Chemical compound C=1C=CC=CC=1OP(=O)(OCCCCCCCC)OC1=CC=CC=C1 YAFOVCNAQTZDQB-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical class OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- APEJMQOBVMLION-VOTSOKGWSA-N trans-cinnamamide Chemical compound NC(=O)\C=C\C1=CC=CC=C1 APEJMQOBVMLION-VOTSOKGWSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229960002622 triacetin Drugs 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Landscapes
- Processes Of Treating Macromolecular Substances (AREA)
Description
(I)2.5≦A+B≦3.0
(II)0≦A≦3.0
(III)0≦B≦2.9
但し、式中A及びBは、セルロースの水酸基に置換されているアシル基の置換基を表わし、Aはアセチル基の置換度、またはBは炭素原子数3〜22のアシル基の置換度である。
2.0MPa>P(MPa)≧{P0+(T−40)×A}MPa・・(1)
の範囲とすることが好ましい。なお、P0(MPa)は、加熱部における低濃度ドープ16の最高到達温度T(℃)から算出される蒸気圧の理論値である。最高到達温度T(℃)は、60℃〜120℃の範囲となるように加熱機20(図1参照)の温度調整を行う。また、A(MPa/℃)は、溶媒の種類に応じて決められる定数であり、ジクロロメタン系混合溶媒のときには、0.01(MPa/℃)であり、酢酸メチル系混合溶媒のときには、0.008(MPa/℃)である。
2.0MPa>P(MPa)≧{P0+(T−40)×A}MPa・・(1)
を満たしているか否かを判断し、不適切な際には、圧力調整バルブ68に信号を送信し、圧力調整バルブ68の弁の開閉制御を行い、所望の圧力範囲となるように調整する。その後に、フラッシュパイプ27から低濃度ドープをフラッシュタンク30内に噴出させて濃縮する。その後にポンプ50を用いて濃縮されている高濃度ドープ70をフラッシュタンク30から抜き出して図1のドープ調製ライン10と同じ操作を行う。
巻き取られたセルロースアシレートフィルムの性能及びそれらの測定方法は、特願2003−319673号の[0114]から[0140]までに詳しく記述されており、これらの記載も本発明に適用できる。
前記セルロースアシレートフィルムの少なくとも一方の面が表面処理されていることが好ましい。前記表面処理が真空グロー放電処理,大気圧プラズマ放電処理,紫外線照射処理,コロナ放電処理,火炎処理,酸処理またはアルカリ処理の少なくとも一種であることが好ましい。
前記セルロースアシレートフィルムの少なくとも一方の面が下塗りされていても良い。さらに、前記セルロースアシレートフィルムをベースフィルムとして他の機能性層を付与した機能性材料として用いることが好ましい。前記機能性層が帯電防止層,硬化樹脂層,反射防止層,易接着層,防眩層及び光学補償層から選択される少なくとも1層を設けることが好ましい。
16 低濃度ドープ
17 高濃度ドープ
17a 液面
20 加熱機
21 スタティックミキサ
27 フラッシュパイプ
30 フラッシュタンク
Claims (6)
- ポリマーと溶媒とを含むドープの調製方法において、
前記ポリマーを前記溶媒に熱交換器を用いて加熱溶解させてポリマー濃度が15重量%以上20重量%以下の希薄ドープを調製し、
前記加熱温度を前記溶媒の沸点以上とし、
静的混合攪拌手段を用いて前記希薄ドープの攪拌を行った後に、前記希薄ドープを濃縮してポリマー濃度が20重量%以上30重量%以下のドープとし、
前記加熱を行う際に、熱交換器と前記熱交換器の下流側に設けた静的混合攪拌手段とを含む加熱ユニットを複数用い、
1台の熱交換器での前記希薄ドープの昇温温度を20℃以上70℃以下とすることを特徴とするドープの調製方法。 - 前記静的混合攪拌手段の下流側に温度計を設け、
前記温度計を用いて前記希薄ドープの温度を測定し、前記測定結果に基づき前記熱交換器の温度調整を行うことを特徴とする請求項1記載のドープの調製方法。 - 前記静的混合攪拌手段に送液される前記希薄ドープの流量を30L/min以上150L/min以下とし、
前記静的混合攪拌手段の管の径を50mm以上200mm以下とし、
前記静的混合攪拌手段に備えられている邪魔板の数を4枚以上20枚以下とすることを特徴とする請求項1または2記載のドープの調製方法。 - 前記熱交換器にスパイラル熱交換器を用いることを特徴とする請求項1ないし3いずれか1つ記載のドープの調製方法。
- 請求項1ないし4いずれか1つ記載のドープの調製方法により調製された前記ドープを用いてポリマーフィルムを製造することを特徴とするポリマーフィルムの製造方法。
- 前記ポリマーフィルムの60重量%以上が、前記ドープから形成されたものであることを特徴とする請求項5記載のポリマーフィルムの製造方法。
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