JP4677234B2 - リン−シリコン化合物を有する難燃性ポリカーボネート組成物 - Google Patents
リン−シリコン化合物を有する難燃性ポリカーボネート組成物 Download PDFInfo
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- JP4677234B2 JP4677234B2 JP2004557926A JP2004557926A JP4677234B2 JP 4677234 B2 JP4677234 B2 JP 4677234B2 JP 2004557926 A JP2004557926 A JP 2004557926A JP 2004557926 A JP2004557926 A JP 2004557926A JP 4677234 B2 JP4677234 B2 JP 4677234B2
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- 239000000203 mixture Substances 0.000 title claims abstract description 68
- HIVGXUNKSAJJDN-UHFFFAOYSA-N [Si].[P] Chemical compound [Si].[P] HIVGXUNKSAJJDN-UHFFFAOYSA-N 0.000 title claims abstract description 29
- 239000004417 polycarbonate Substances 0.000 title claims description 51
- 229920000515 polycarbonate Polymers 0.000 title claims description 43
- 239000003063 flame retardant Substances 0.000 title description 32
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 title description 21
- -1 poly(ester) Polymers 0.000 claims abstract description 33
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 10
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims abstract description 10
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 7
- 239000011574 phosphorus Substances 0.000 claims abstract description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000010703 silicon Substances 0.000 claims abstract description 6
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 6
- 238000010438 heat treatment Methods 0.000 claims abstract description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 5
- 238000002411 thermogravimetry Methods 0.000 claims abstract description 5
- 239000011261 inert gas Substances 0.000 claims abstract description 3
- 125000003118 aryl group Chemical group 0.000 claims description 42
- 229920000642 polymer Polymers 0.000 claims description 25
- 239000000178 monomer Substances 0.000 claims description 22
- 229920000578 graft copolymer Polymers 0.000 claims description 18
- 229920000728 polyester Polymers 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 15
- 229920000098 polyolefin Polymers 0.000 claims description 13
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims description 12
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 11
- 239000000654 additive Substances 0.000 claims description 10
- 229920001971 elastomer Polymers 0.000 claims description 10
- 239000005060 rubber Substances 0.000 claims description 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 9
- 229920002554 vinyl polymer Polymers 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 229920006163 vinyl copolymer Polymers 0.000 claims description 8
- 150000001735 carboxylic acids Chemical class 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 125000004104 aryloxy group Chemical group 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 230000009477 glass transition Effects 0.000 claims description 4
- 238000000465 moulding Methods 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000005907 alkyl ester group Chemical group 0.000 claims description 3
- 125000000853 cresyl group Chemical group C1(=CC=C(C=C1)C)* 0.000 claims description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- 125000005023 xylyl group Chemical group 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 abstract description 15
- 150000004756 silanes Chemical class 0.000 abstract description 9
- 238000006384 oligomerization reaction Methods 0.000 abstract description 4
- 230000004580 weight loss Effects 0.000 abstract 1
- 238000012360 testing method Methods 0.000 description 27
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- 239000000839 emulsion Substances 0.000 description 15
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 14
- 229920001577 copolymer Polymers 0.000 description 13
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- 238000000034 method Methods 0.000 description 11
- 229920001283 Polyalkylene terephthalate Polymers 0.000 description 10
- KKEYFWRCBNTPAC-UHFFFAOYSA-N benzene-dicarboxylic acid Natural products OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 9
- 125000004432 carbon atom Chemical group C* 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 7
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 7
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
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- 239000007787 solid Substances 0.000 description 6
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- 239000006085 branching agent Substances 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 5
- 229920003244 diene elastomer Polymers 0.000 description 5
- 238000007720 emulsion polymerization reaction Methods 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 5
- XKZQKPRCPNGNFR-UHFFFAOYSA-N 2-(3-hydroxyphenyl)phenol Chemical compound OC1=CC=CC(C=2C(=CC=CC=2)O)=C1 XKZQKPRCPNGNFR-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 4
- 150000008064 anhydrides Chemical class 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 238000001746 injection moulding Methods 0.000 description 4
- 150000003018 phosphorus compounds Chemical class 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000012662 bulk polymerization Methods 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 3
- 150000003949 imides Chemical class 0.000 description 3
- 150000002825 nitriles Chemical class 0.000 description 3
- 239000010452 phosphate Substances 0.000 description 3
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
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- 238000012545 processing Methods 0.000 description 3
- 150000003377 silicon compounds Chemical class 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 2
- KTZVZZJJVJQZHV-UHFFFAOYSA-N 1-chloro-4-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C=C1 KTZVZZJJVJQZHV-UHFFFAOYSA-N 0.000 description 2
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 2
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 description 2
- BSWWXRFVMJHFBN-UHFFFAOYSA-N 2,4,6-tribromophenol Chemical compound OC1=C(Br)C=C(Br)C=C1Br BSWWXRFVMJHFBN-UHFFFAOYSA-N 0.000 description 2
- XBQRPFBBTWXIFI-UHFFFAOYSA-N 2-chloro-4-[2-(3-chloro-4-hydroxyphenyl)propan-2-yl]phenol Chemical compound C=1C=C(O)C(Cl)=CC=1C(C)(C)C1=CC=C(O)C(Cl)=C1 XBQRPFBBTWXIFI-UHFFFAOYSA-N 0.000 description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 2
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 2
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 239000004641 Diallyl-phthalate Substances 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
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- 239000004809 Teflon Substances 0.000 description 2
- OCKWAZCWKSMKNC-UHFFFAOYSA-N [3-octadecanoyloxy-2,2-bis(octadecanoyloxymethyl)propyl] octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(COC(=O)CCCCCCCCCCCCCCCCC)(COC(=O)CCCCCCCCCCCCCCCCC)COC(=O)CCCCCCCCCCCCCCCCC OCKWAZCWKSMKNC-UHFFFAOYSA-N 0.000 description 2
- YUWBVKYVJWNVLE-UHFFFAOYSA-N [N].[P] Chemical class [N].[P] YUWBVKYVJWNVLE-UHFFFAOYSA-N 0.000 description 2
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- 150000001298 alcohols Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 2
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical group OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 125000005587 carbonate group Chemical group 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
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- 230000000052 comparative effect Effects 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000001142 dicarboxylic acid group Chemical group 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- ATLPLEZDTSBZQG-UHFFFAOYSA-L dioxido-oxo-propan-2-yl-$l^{5}-phosphane Chemical compound CC(C)P([O-])([O-])=O ATLPLEZDTSBZQG-UHFFFAOYSA-L 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 150000002391 heterocyclic compounds Chemical class 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
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- 239000000047 product Substances 0.000 description 2
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 238000010557 suspension polymerization reaction Methods 0.000 description 2
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical class [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 2
- DXZMANYCMVCPIM-UHFFFAOYSA-L zinc;diethylphosphinate Chemical compound [Zn+2].CCP([O-])(=O)CC.CCP([O-])(=O)CC DXZMANYCMVCPIM-UHFFFAOYSA-L 0.000 description 2
- 125000006833 (C1-C5) alkylene group Chemical group 0.000 description 1
- WVAFEFUPWRPQSY-UHFFFAOYSA-N 1,2,3-tris(ethenyl)benzene Chemical compound C=CC1=CC=CC(C=C)=C1C=C WVAFEFUPWRPQSY-UHFFFAOYSA-N 0.000 description 1
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 1
- FYBFGAFWCBMEDG-UHFFFAOYSA-N 1-[3,5-di(prop-2-enoyl)-1,3,5-triazinan-1-yl]prop-2-en-1-one Chemical compound C=CC(=O)N1CN(C(=O)C=C)CN(C(=O)C=C)C1 FYBFGAFWCBMEDG-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L69/00—Compositions of polycarbonates; Compositions of derivatives of polycarbonates
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
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- C—CHEMISTRY; METALLURGY
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Description
Xはハロゲン原子、好ましくは塩素または臭素を示し、
R1は互いに独立して水素またはC1−C4アルキル、好ましくはメチルまたはエチルを示し、
R2はa)要すればアリール(例えばフェニル)またはアルキル(例えばC1−C4−アルキル)、好ましくはフェニルで置換されたアリール基、または
b)要すればアリール(例えばフェニル)、好ましくはメチル、エチル、プロピルまたはブチルで置換されたアルキル基、または
c)要すればアリール(例えばフェニル)またはアルキル(例えばC1−C4−アルキル)、好ましくはフェノキシで置換されたアリーロキシ基、または
d)要すればアリール(例えばフェニル)、好ましくはメトキシ、エトキシまたはプロポキシで置換されたアルコキシ基、または
e)水素、および
R3は互いに独立して、同一または異なってアルキル基、好ましくはC1−C8−アルキル、特にメチル、エチル、プロピルおよびブチル、アリール基またはアルキル、好ましくはC1−C4アルキル、特にフェニル、クレシル、キシレニル、プロピルフェニルまたはブチルフェニルで置換されたアリール基である。]
との反応における水素ハライド、クロロメタンまたはクロロエタンの放出を伴って製造される。
mは数値(numerical value)2〜1000、好ましくは2〜100、特に2〜20、好ましくは2〜10を示し、かつ
R2およびR3はポリマー鎖内で1つのモノマーユニットから別のユニットへと変化し得る。]
を有するものである。
A)芳香族ポリカーボネートおよび/またはポリエステルカーボネートの60〜100重量部、好ましくは70〜100重量部、特に80〜100重量部、特に好ましくは90〜100重量部、最も特に好ましくは93〜100重量部、
B)ビニル(コ)ポリマー、ゴム−変性ビニル(コ)ポリマーおよび芳香族ポリエステルからなる群から選択される少なくとも1つのポリマー0〜40重量部、好ましくは0〜30重量部、特に0〜25重量部、特に好ましくは0〜10重量部、最も特に好ましくは0〜5重量部
C)フッ素化ポリオレフィン0〜5重量部、好ましくは0〜2重量部、特に0〜1重量部、特に好ましくは0〜0.5重量部、最も特に好ましくは0.2〜0.5重量部、および
D)他のポリマーおよび/またはポリマー添加剤の20重量部以下、好ましくは15重量部以下、特に10重量部以下、特に好ましくは5重量部以下、最も特に好ましくは2重量部以下
(成分A〜Dの重量部は足して100になる)、
を含有する。
本発明により好適な成分Aにしたがって、芳香族ポリカーボネートおよび芳香族ポリエステルカーボネートは文献公知であり、文献公知の製造方法によって製造してもよい(芳香族ポリカーボネートの製造については、例えば(Schnell、「ポリカーボネートの化学と物理」(「Chemistry and Physics of Polycarbonates」)、Interscience Publishers、1964年)およびDE-AS 1495626、DE-A 2232877、DE-A 2703376、DE-A 2714544、DE-A 3000610、DE-A 3832396であり、芳香族ポリエステルカーボネートの製造については、例えばDE-A 3077934を参照する)。
または式(VI)または(VII)を有する基:
xは互いに独立して0、1または2であり、
pは1または0であり、および
R5およびR6は、X1と独立に選択され、互いに独立して、水素またはC1〜C6アルキル、好ましくは水素、メチルまたはエチルを示し、
X1は炭素を示し、および
mは4〜7の整数、好ましくは4または5であるが、少なくとも1つのX1原子上で、R5およびR6はともにアルキルである。]
を有する化合物である。
本発明によるポリカーボネート組成物は、成分Bとしてビニル(コ)ポリマー、ゴム−変性ビニル(コ)ポリマーおよび(好ましくは芳香族)ポリエステルからなる群から選択される少なくとも1つの他のポリマーを含有し得る。
B.2 グラフトベースとしてガラス転移温度<10℃、好ましくは<0℃、特に好ましくは<−20℃を有する1以上のゴム95〜5重量%、好ましくは90〜10重量%、特に80〜30重量%上で、
B.1.1. ビニル芳香族および/または環−置換ビニル芳香族(例えば、スチレン、α−メチルスチレン、p−メチルスチレン、p−クロロスチレン)および/またはメタクリル酸(C1−C8)アルキルエステル(例えばメチルメタクリレート、エチルメタクリレート)50〜99重量%、好ましくは50〜90重量%、特に好ましくは55〜85重量%、最も特に好ましくは60〜80重量%および
B.1.2 ビニルシアニド(不飽和ニトリル、例えばアクリロニトリルおよびメタクリロニトリル)および/または(メタ)アクリル酸(C1−C8)アルキルエステル(例えばメチルメタクリレート、n−ブチルアクリレート、t−ブチルアクリレート)および/または不飽和カルボン酸(例えば無水マレイン酸およびN−フェニルマレイミド)の誘導体(例えば無水物およびイミド)1〜50重量%、好ましくは10〜50重量%、特に好ましくは15〜45重量%最も特に好ましくは20〜40重量%
B.1を含有する混合物のモノマー5〜95重量%、好ましくは10〜90重量%、特に20〜70重量%
のグラフトポリマーである。
ビニル芳香族化合物および/または環−置換ビニル芳香族化合物(例えばスチレン、α−メチルスチレン、p−メチルスチレン、p−クロロスチレン)および/またはメタクリル酸(C1−C8)−アルキルエステル(例えばメチルメタクリレート、エチルメタクリレート)50〜99重量部、好ましくは60〜80重量部、および
ビニルシアニド(不飽和ニトリル)、例えばアクリロニトリルおよび/またはメタクリロニトリルおよび/または(メタ)アクリル酸(C1−C8)−アルキルエステル(例えば、メチルメタクリレート、n−ブチルアクリレート、t−ブチルアクリレート)および/または不飽和カルボン酸(例えばマレイン酸)および/または不飽和カルボン酸の誘導体(例えば、無水物およびイミド(具体的には無水マレイン酸およびN−フェニルマレイミド))1〜50重量部、好ましくは20〜40重量部、
を含有する(コ)ポリマーである。
フッ素化ポリオレフィンは要すればいわゆるアンチ−ドリップ剤(anti-drip agents)としてポリカーボネート組成物中で使用され、その物質は材料が燃焼の際に燃焼液滴を形成するのを軽減する。
成分Dとしてポリカーボネート組成物は、他のポリマーおよび/またはポリマー添加剤を含有し得る。
I)リン−シリコン化合物
(表1および2中成分E3とする)
1.)ホスホリル化シランの製造
温度計および還流冷却器を備えた三口フラスコに、ジメチルメタンホスホネート19.6g(158mmol)を室温でジフェニルジクロロシラン20.0g(79mmol)へアルゴン保護ガス雰囲気下で滴下した。添加終了後、反応混合物をそれ以上のガス(塩化メチル)が無くなるまで撹拌した。
1)からの反応混合物を150℃で熱的にオリゴマー化し、かつ製造されたジメチルメタンホスホネートを反応混合物が一定の重量に達するまで、圧力0.08mbar下で連続的に蒸発除去した。無色、高い粘性液体が製造され、室温で冷却すると、固体(ガラス状の物質)へと凝固した。
融点:約54℃
元素分析:炭素55%、シリコン12%、リン10%
熱重量分析:280℃(加熱速度20K/時間で窒素ストリームにおいて測定した)で質量4重量%以下
分子量:Mw=963g/モル(260nmDAD UV検出器を用いてゲル透過クロマトグラフィーによって測定した;定量分析は室温でジクロロメタン中においてポリシロキサンに有効なキャリブレーション関係を用いて行った)
混合物は溶融温度290℃(PC/ABS組成物)または310℃(PC組成物)でTS/I−02ミニ−押出機(DSM)上で溶融コンパウンドすることによって製造される。使用される全ての試験片は、押出機と接続したTS/I−01射出成形機(DSM)上で射出成形することによって得られた。成形温度は80℃である。
25℃で濃度0.5g/100mlのCH2Cl2中で相対溶液粘度1.28を有するビスフェノールAに基づいた直鎖状ポリカーボネート。
25℃で濃度0.5g/100mlのCH2Cl2中で相対溶液粘度1.26を有するビスフェノールAに基づいた直鎖状ポリカーボネート。
エマルジョン重合により製造した粒状架橋ポリブタジエンゴム60重量部上においてスチレン/アクリロニトリルの比が73:27のコポリマー40重量部からなるグラフトポリマー(平均粒径d50=0.3μm)。
水中の上記成分Bによるグラフトポリマーエマルジョンと水中のテトラフルオロエチレンポリマーエマルジョンとの凝集混合物としてテトラフルオロエチレンポリマー。混合中のグラフトポリマーB/テトラフルオロエチレンポリマーの重量比は90重量%〜10重量%である。テトラフルオロエチレンポリマーエマルジョンは固形分含量60重量%、平均粒径0.05〜0.5μmを有する。グラフトポリマーエマルジョンは固形分含量34重量%を有する。
離型剤としてペンタエリスリトールテトラステアレート(PETS)
ホスフィット安定剤
Disflamol(登録商標)TP:トリフェニルホスフェート(Bayer AG(ドイツ国、レーフェルクーゼン)社提供)
Silres(登録商標)SY 300:シラノール−官能性固体フェニルプロピルポリシロキサン(Wacker-Chemie GmbH(ドイツ国、ミュンヘン)社提供)
組成物の難燃性は、合計3つの手法により評価した。
Claims (7)
- リン含量1〜20重量%およびシリコン含量1〜20重量%を有するリン−シリコン化合物を含有し、280℃で、加熱速度20K/分で、窒素不活性ガス下で熱重量分析において評価した揮発分質量含量(volatile content by mass)30重量%以下を示す(上記含量はいずれの場合もリン−シリコン化合物に基づく。)ポリカーボネート組成物であって、
該リン−シリコン化合物が、
一般式(III):
R 1 は、互いに独立して、水素またはC 1 −C 4 アルキルを示し、
R 2 は、アリール基、アルキル基、アリーロキシ基、アルコキシ基および水素からなる群から選択される基を示し、
R 3 は、互いに独立して、アルキル基、アリール基、およびC 1 −C 4 アルキルで置換されたアリール基からなる群から選択される基を示し、
mは、2〜1000を示す]
を有するリン−シリコン化合物、および
一般式(IV):
R 2 は、アリール基、アルキル基、アリーロキシ基、アルコキシ基および水素からなる群から選択される基を示し、
R 3 は、フェニル、クレシルまたはキシリルを示す]
を有するリン−シリコン化合物
からなる群から選択される、ポリカーボネート組成物。 - リン−シリコン化合物が、置換基R2およびR3の少なくとも10モル%がアリール基またはアリーロキシ基であるものである、請求項1記載の組成物。
- リン−シリコン化合物(ポリカーボネート組成物100重量部に対して)0.05〜30重量部を含有する、請求項1記載の組成物。
- ポリカーボネート組成物が
A)芳香族ポリ(エステル)カーボネート60〜100重量部、
B)ビニル(コ)ポリマー、ゴム−変性ビニル(コ)ポリマーおよび芳香族ポリエステルからなる群から選択される少なくとも1つのポリマー0〜40重量部、
C)フッ素化ポリオレフィン0〜5重量部、および
D)その他のポリマーおよび/またはポリマー添加剤20重量部以下
(成分A〜Dの重量部を足して100になる)を含有するものである、請求項1記載の組成物。 - 成分B)が
B.1 ビニル芳香族、環−置換ビニル芳香族およびメタクリル酸(C1−C8)アルキルエステルからなる群から選択される少なくとも1つ50〜99重量%と、ビニルシアニド、(メタ)アクリル酸(C1−C8)アルキルエステルおよび不飽和カルボン酸の誘導体からなる群から選択される少なくとも1つ1〜50重量%とを含有する混合物のモノマー5〜95重量%を、
B.2 グラフトベースとしてガラス転移温度<0℃を有する1以上のゴム95〜5重量%上への、
グラフトポリマーである、請求項4記載の組成物。 - 成形物の製造のための、請求項1記載の組成物の使用。
- 請求項1記載の組成物から得られる成形物。
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EP3078723B1 (de) * | 2015-04-09 | 2018-10-31 | Evonik Degussa GmbH | Addukte aus isocyanatoalkyltrimethoxysilanen und mit ihnen reaktiven flammschutzmitteln |
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CN108129825B (zh) * | 2017-12-29 | 2020-05-05 | 青岛海尔新材料研发有限公司 | 一种高cti、高耐热无卤阻燃pc/abs组合物及其制备方法 |
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- 2003-11-22 WO PCT/EP2003/013151 patent/WO2004052990A1/de active IP Right Grant
- 2003-11-22 BR BR0317042-0A patent/BR0317042A/pt unknown
- 2003-11-22 DE DE50309343T patent/DE50309343D1/de not_active Expired - Lifetime
- 2003-11-22 ES ES03812588T patent/ES2300657T3/es not_active Expired - Lifetime
- 2003-11-22 AU AU2003302908A patent/AU2003302908A1/en not_active Abandoned
- 2003-11-22 EP EP03812588A patent/EP1570002B1/de not_active Expired - Lifetime
- 2003-11-22 CN CNB2003801051848A patent/CN100354353C/zh not_active Expired - Fee Related
- 2003-11-22 CA CA002508628A patent/CA2508628A1/en not_active Abandoned
- 2003-11-22 JP JP2004557926A patent/JP4677234B2/ja not_active Expired - Fee Related
- 2003-11-22 KR KR1020057010076A patent/KR100985945B1/ko not_active IP Right Cessation
- 2003-11-22 AT AT03812588T patent/ATE388203T1/de not_active IP Right Cessation
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Also Published As
Publication number | Publication date |
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US20040110879A1 (en) | 2004-06-10 |
US7144935B2 (en) | 2006-12-05 |
DE10257081A1 (de) | 2004-06-24 |
KR100985945B1 (ko) | 2010-10-06 |
MXPA05005905A (es) | 2005-08-29 |
CA2508628A1 (en) | 2004-06-24 |
ATE388203T1 (de) | 2008-03-15 |
DE50309343D1 (de) | 2008-04-17 |
WO2004052990A1 (de) | 2004-06-24 |
JP2006509079A (ja) | 2006-03-16 |
CN100354353C (zh) | 2007-12-12 |
KR20050085338A (ko) | 2005-08-29 |
AU2003302908A1 (en) | 2004-06-30 |
EP1570002B1 (de) | 2008-03-05 |
ES2300657T3 (es) | 2008-06-16 |
EP1570002A1 (de) | 2005-09-07 |
CN1720293A (zh) | 2006-01-11 |
BR0317042A (pt) | 2005-10-25 |
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