JP4522984B2 - Plasma processing equipment - Google Patents

Description

  The present invention relates to a plasma processing apparatus such as a dry etching apparatus or a plasma CVD apparatus.

  The gas introduced into the chamber in the plasma processing apparatus can be roughly classified into a process gas (for example, an etching gas for supplying radicals and ions for etching in the case of a dry etching apparatus) and a carrier gas for maintaining discharge. . In general, the energy required for turning the etching gas into plasma is smaller than the energy required for turning the carrier gas into plasma. Therefore, when the etching gas and the carrier gas are introduced into the chamber from the same location and the strong magnetic field generated by the coil or the like is simultaneously passed, the etching gas is excessively dissociated (radicalization) or ionized. Causes shortage of dissociation and ionization.

  On the other hand, Patent Document 1 discloses a plasma processing apparatus in which excessive dissociation and ionization of an etching gas are suppressed by changing the positions where the etching gas and the carrier gas are introduced into the chamber. Specifically, in the plasma processing apparatus disclosed in Patent Document 1, a carrier gas is introduced from a plurality of discharge holes formed in a dielectric plate that closes the upper portion of the chamber, and a lower portion in which the dielectric plate and the substrate are arranged. Etching gas is introduced from a metal tube disposed between the electrodes.

  However, in the structure of Patent Document 1, it is necessary to form a plurality of discharge holes and a flow path connecting these discharge holes and a gas source in the dielectric plate, and a metal pipe for introducing an etching gas is required. Etc. The structure is complicated. Further, in the structure of Patent Document 1, it is difficult to increase the size of the apparatus in order to enable processing of a large substrate. Specifically, the dielectric plate must have sufficient mechanical strength to support atmospheric pressure when the chamber is depressurized. However, in the apparatus described in Patent Document 1, the dielectric plate in which the discharge holes and the flow paths are formed is only supported by the chamber main body in the vicinity of the outer peripheral edge. Therefore, it is necessary to increase the size of the dielectric plate. It is difficult to ensure a sufficient mechanical strength.

  Also, depending on the process conditions, it is necessary to place more importance on controlling the flow rate distribution of the etching gas around the substrate and making the etching process uniform than on the dissociation of the etching gas and the proper ionization.

Japanese Patent No. 338495

  The present invention can achieve good processing by suppressing excessive dissociation and ionization of process gas, and uniform plasma processing by uniformizing the flow distribution of process gas around the substrate, and is relatively simple. It is an object of the present invention to provide a plasma treatment that can be realized with a simple structure and large size.

The present invention includes a vacuum container in which a substrate is disposed, an annular outer peripheral portion disposed in an upper opening of the vacuum container facing the substrate, and having a lower surface supported by the vacuum container, and the outer periphery in plan view. A central portion located at the center of the region surrounded by the portion, and a plurality of beam portions extending radially from the central portion to the outer peripheral portion, and surrounded by the outer peripheral portion, the central portion, and the beam portion A beam-shaped structure whose region constitutes a plurality of window portions, a dielectric plate whose lower surface is supported on the upper surface of the beam-shaped structure, and an upper surface side of the dielectric plate, to which high-frequency power is input A coil for generating plasma; an elastic member interposed between the upper surface of the beam-like structure and the lower surface of the dielectric plate; and an individual window portion on the outer peripheral portion of the beam-like structure. It is arranged so as to face the high-frequency power-throw to the coil Wherein an outer peripheral portion gas inlet for injecting a gas obliquely downward so as to pass through the strong magnetic field is formed in the window portion is formed in the central portion of the beam-like structure, toward the center portion of the substrate by the downward A first gas supply source capable of jetting a first gas from at least one of the outer peripheral gas inlet and the central gas inlet; and the outer periphery And a second gas supply source capable of ejecting a second gas different from the first gas from at least one of the partial gas inlet and the central gas inlet. A processing device is provided.

For example, the first gas is a carrier gas, the second gas is a process gas, the first gas supply source ejects the carrier gas from the outer peripheral gas inlet, and the central gas is introduced. The process gas is ejected from the mouth by the second gas supply source.

By applying high-frequency power to the coil, a strong magnetic field (strong alternating electric field) is formed in the window portion of the beam-like structure. Since the carrier gas is ejected obliquely downward from the outer peripheral gas inlet formed in the outer peripheral portion of the beam-like structure, it passes through this strong magnetic field. As a result, the carrier gas is sufficiently dissociated or ionized. On the other hand, the process gas, since it is ejected downward toward the formed in the central portion of the beam-shaped structure central gas inlet port in the central portion of the substrate, does not pass through the strong magnetic field formed in the window portion. Therefore, excessive dissociation or ionization of the process gas does not occur. Therefore, excessive dissociation and ionization of the process gas can be suppressed while the carrier gas is sufficiently dissociated or ionized, and a favorable plasma treatment can be realized. For example, when the process gas is an etching gas, the carrier gas is sufficiently dissociated or ionized, and the etching gas is suppressed from excessive dissociation and ionization, so that depending on the type of gas, that is, between the etching gas and the carrier gas. Since the ratio of radicals and ions can be individually controlled for each of them, an etching process with a good etching rate and selectivity can be realized.

Also, the structure is relatively simple in that both the outer peripheral gas inlet and the central gas inlet are provided in the beam-like structure, and the dielectric plate itself does not need to be provided with a gas inlet or the like. It is.

Further, the beam-like structure in which the outer peripheral gas inlet and the central gas inlet are formed includes an annular outer peripheral portion, a central portion located in the center of a region surrounded by the outer peripheral portion, and an outer peripheral portion from the central portion. And a plurality of beam portions extending radially. Therefore, all portions of the dielectric plate, that is, the outer peripheral portion, the central portion, and the portion between the outer peripheral portion and the central portion are uniformly supported by the beam-like structure. Therefore, even if the area of the dielectric plate is increased, the mechanical strength required to withstand the pressure difference between the reduced pressure inside the vacuum vessel and the atmospheric pressure can be secured, so that the apparatus can be enlarged.

As an alternative, the first gas is a carrier gas, the second gas is a process gas, the second gas supply source ejects the process gas from the outer peripheral gas inlet, and the central portion The first gas supply source ejects the carrier gas from a gas inlet.

By ejecting the process gas obliquely downward from the outer periphery gas inlet formed in the outer periphery of the beam-like structure, the process gas can be made into a high-density plasma. Also, the carrier gas can be ejected from the central gas inlet, and the gas flow distribution at the center of the substrate can be changed without increasing or decreasing the flow rate of the process gas that contributes to etching characteristics such as etching rate and etching. Can do. As a result, the plasma processing for the substrate can be made uniform. For example, when the process gas is an etching gas, a uniform etching process with uniform etching rate and the like can be performed on the entire substrate. Note that, without increasing or decreasing the flow rate of the process gas, it goes without saying that increasing or decreasing the flow rate of the process gas to such an extent that the etching characteristics are not adversely affected is not excluded.

Also, the structure is relatively simple in that both the outer peripheral gas inlet and the central gas inlet are provided in the beam-like structure, and the dielectric plate itself does not need to be provided with a gas inlet or the like. It is. Furthermore, since all portions of the dielectric plate are uniformly supported by the beam-like structure, the required mechanical strength can be ensured even if the area of the dielectric plate is increased, and the apparatus can be increased in size.

Beam-like structure formed the outer peripheral portion gas inlet to the outer peripheral portion and the beam-shaped structure carrier gas supply source from at least one of the central portion a gas inlet port formed in a central portion of the can to allow ejection of the carrier gas, And by enabling the process gas supply source to eject the process gas from at least one of the outer peripheral gas inlet and the central gas inlet , the dissociation and ionization of the process gas can be individually controlled according to the type of gas. Plasma processing can be realized. Alternatively, the plasma processing on the substrate can be made uniform by changing the gas flow rate distribution in the center of the substrate without increasing or decreasing the process gas contributing to the etching characteristics such as the etching rate and the etching shape. In addition, the structure is relatively simple, and the size of the apparatus can be increased.

(First embodiment)
FIG. 1 shows an ICP (inductively coupled plasma) type dry etching apparatus 1 according to a first embodiment of the present invention. The dry etching apparatus 1 includes a chamber (vacuum container) 3 constituting a processing chamber in which a substrate 2 is accommodated. The chamber 3 includes a chamber body 4 having an upper opening and a lid 6 that seals the upper opening of the chamber body 4. The lid 6 includes a beam-like spacer (beam-like structure) 7 supported on the upper end of the side wall of the chamber body 4 and a disk-shaped dielectric plate 8 that is supported by the beam-like spacer 7 and functions as a top plate. . In this embodiment, the beam-like spacer 7 is made of a metal material having sufficient rigidity such as aluminum, and the dielectric plate 8 is made of, for example, quartz or yttrium oxide (Y ₂ O ₃ ). An ICP coil 9 is disposed on the dielectric plate 8. As shown in FIG. 3, the ICP coil 9 is composed of a plurality of (four in this embodiment) conductors 11 extending in a spiral shape. A high frequency power supply 13 is electrically connected to the ICP coil 9 via a matching circuit 12. The chamber body 4 is provided with a gate (not shown) for loading and unloading the substrate 2.

  A substrate susceptor 14 having a function as a lower electrode to which a bias voltage is applied and a function of holding the substrate 2 by electrostatic adsorption or the like is provided on the bottom side in the chamber 3 facing the dielectric plate 8 and the beam-like spacer 7. It is arranged. A high frequency power supply is applied to the substrate susceptor 14 from a high frequency power supply 16 for bias. In addition, a refrigerant circulation passage is provided in the substrate susceptor 14, and the temperature-controlled refrigerant supplied from the refrigerant circulation device 17 circulates in the circulation passage. Further, a heat transfer gas circulation device 18 for supplying heat transfer gas is provided between the upper surface of the substrate susceptor 14 and the back surface of the substrate 2.

  The inside of the chamber 3 is exhausted by a vacuum exhaust device (not shown). Further, a carrier gas is introduced from a carrier gas supply source 19 through a first gas inlet 31 described later, and an etching gas is introduced from an etching gas supply source 20 through a second gas inlet 34 described later. Thereafter, high frequency power is supplied from the high frequency power supply 13 to the ICP coil 9, the carrier gas is dissociated, and plasma is generated in the chamber 3 and maintained. As will be described later in detail, the surface of the substrate 2 is etched as a result of the substrate 2 by the action of radicals and ions of an etching gas generated by plasma. The operation of the entire apparatus including the high frequency power supplies 13 and 16, the carrier gas supply source 19, the etching gas supply source 20, the heat transfer gas circulation device 18, and the refrigerant circulation device 17 is controlled by the controller 21.

  Referring to FIGS. 1, 2, 4, and 5, the beam-shaped spacer 7 includes an annular outer peripheral portion 7a, a central portion 7b positioned in the center of the region surrounded by the outer peripheral portion 7a in plan view, and A plurality of (six in this embodiment) beam portions 7c extending radially from the central portion 7b to the outer peripheral portion 7a are provided.

  A lower surface 7 d of the outer peripheral portion 7 a of the beam-shaped spacer 7 is supported on the upper end surface of the side wall of the chamber body 4. As shown in FIG. 4, annular grooves 7e and 7f are formed on the lower surface 7d of the outer peripheral portion 7a, and the beam-like spacer 7 and the chamber body are formed by O-rings 22 and 23 accommodated in these grooves 7e and 7f. The sealing property of the joining part of 4 is ensured.

  As clearly shown in FIGS. 2 and 4, an annular groove 7k is also formed on the upper surface 7g of the outer peripheral portion 7a, and an O-ring (first elastic member) 24 is accommodated in the groove 7k. The O-ring 24 is interposed between the outer peripheral portion 7 a and the lower surface 8 a of the dielectric plate 8. In other words, the outer peripheral portion 7 a is indirectly in contact with the dielectric plate 8 through the ring 24. The O-ring 24 also has a function of ensuring airtightness at the joint portion between the beam-shaped spacer 7 and the dielectric plate 8.

  The six beam portions 7c of the beam-shaped spacer 7 have a rectangular shape with a substantially constant width, and extend radially from the central portion 7b at equal angular intervals in plan view (see FIGS. 2 and 4). One end of the beam portion 7c is integrally connected to the central portion 7b, and the other end is integrally connected to the outer peripheral portion 7a. As shown in FIG. 4, the six beam portions 7c extend in a direction orthogonal to the four strip-shaped conductors 11 forming the ICP coil 9 in plan view.

  Three concave portions 7h are provided in the upper surface 7g of the central portion 7b of the beam-shaped spacer 7, and O-rings 25 are accommodated in the concave portions 7h, respectively. The O-ring 25 is interposed between the central portion 7 b and the lower surface 8 a of the dielectric plate 8. In other words, the central portion 7 b is in contact with the dielectric plate 8 indirectly via the O-ring 25.

A region surrounded by the outer peripheral portion 7a, the central portion 7b, and the beam portion 7c of the beam-shaped spacer 7 constitutes a window portion 26 where the lower surface 8a of the dielectric plate 8 is exposed when viewed from the substrate susceptor 14 side. In the present embodiment, the beam-shaped spacer 7 includes six window portions 26 each having a fan shape.
Next, a configuration for introducing the carrier gas and the etching gas into the chamber 3 will be described in detail.

  Referring to FIGS. 1, 2, and 4, a plurality (six in this embodiment) of first gas inlets 31 are provided on the outer peripheral portion 7 a of the beam-like spacer 7 on the side wall surface facing the central portion 7 b. Is formed. The six first gas inlets 31 are arranged at equiangular intervals in plan view, and open to separate window portions 26, respectively. In addition, each first gas introduction port 31 has its direction so that the gas is blown obliquely downward, that is, toward the center of the surface of the substrate 2 held by the substrate susceptor 14 through the window 26. The shape is set. An annular gas passage groove 7 i is formed on the upper surface 7 g of the outer peripheral portion 7 a of the beam-shaped spacer 7 on the inner side of the O-ring 24. The upper opening of the gas channel groove 7i is closed by the lower surface of the dielectric plate 8, and a sealed annular gas channel 32 is formed in the gas channel groove 7i. Referring to FIG. 4, each first gas introduction port 31 communicates with the annular gas flow path 32. Referring to FIGS. 1 and 2, there is provided an introduction flow path 33 having one end communicating with the annular gas flow path 32 and the other end connected to the carrier gas supply source 19. Therefore, the carrier gas supplied from the carrier gas supply source 19 is ejected from the first gas inlet 31 into the chamber 3 through the introduction channel 33 and the annular gas channel 32. As described above, the first gas introduction port 31 is formed in the outer peripheral portion 7a of the beam-like spacer 7 and ejects the gas obliquely downward, so that the carrier gas ejected from the first gas introduction port 31 diffuses in the vacuum. However, it goes from the outer peripheral portion of the substrate 2 held on the substrate susceptor 14 to the central portion.

  1, 2, and 5, a receiving recess 7 j is formed in the central portion 7 b of the beam-shaped spacer 7, and an inlet in which a second gas introduction port 34 is formed in the receiving recess 7 j. A plate (introduction port member) 36 is accommodated. An inlet gas flow path 37 whose one end communicates with each second gas flow path 34 via the gas distribution chamber 41 is formed in the central portion 7 b of the beam-shaped spacer 7. As shown most clearly in FIG. 2, the gas flow path 38 is one of six beam portions 7c from the outer peripheral surface of the outer peripheral portion 7a of the beam-shaped spacer 7 (in the direction of “9 o'clock” in FIG. 2). It extends through the interior of the extending beam portion 7c) to the central portion 7b. One end (the end on the outer peripheral portion 7 a side) of the gas flow path 38 is connected to the etching gas supply source 20, and the other end communicates with the inlet gas flow path 37. The gas flow path 38 does not communicate with the annular gas flow path 32, and the flow gas (carrier gas and etching gas) does not mix with each other.

  Referring to FIG. 6, the inlet plate 36 includes through holes (four in this embodiment) 36 a penetrating in the thickness direction in the vicinity of the outer peripheral edge. The introduction port plate 36 is fixed in the housing recess 7j by screwing the screw 39 passed through the through hole 36a into a screw hole formed in the bottom wall of the housing recess 7j. A recess 36d is formed at the center of the upper surface 36b of the inlet plate 36. A gas distribution chamber 41 communicating with the inlet gas flow path 37 is formed by the recess 36d and the bottom wall of the housing recess 7j. The second gas inlet 34 extends in the vertical direction from the bottom wall of the recess 36 d and penetrates to the lower surface 36 e of the inlet plate 36. Specifically, one second gas introduction port 34 is arranged in the center of the recess 36d, and a row of five second gas introduction ports 34 from the center second gas introduction port 34 is equiangularly spaced. Four rows are provided radially. An annular groove 36f surrounding the recess 36d is formed on the upper surface 36b of the inlet port plate 36, and the O-ring 42 accommodated in the annular groove 36f ensures the gas tightness in the gas distribution chamber 41. The etching gas supplied from the etching gas supply source 20 passes through the introduction channel 33, the annular gas channel 32, the inlet gas channel 37, and the gas distribution chamber 41 to the chamber from the second gas introduction port 34 of the introduction port plate 36. 3 is injected. Since the second gas introduction port 34 is provided at the second gas introduction port attached to the central portion 7b of the beam-like spacer 7 and jets the process gas downward, the etching gas ejected from the second gas introduction port 34 is Then, while diffusing in the vacuum, it goes to the central portion of the substrate 2 held on the substrate susceptor 14.

  When high frequency power is supplied from the high frequency power supply 13 to the ICP coil 9, a strong magnetic field (strong alternating electric field) is formed in the window portion 26 of the beam-like spacer 7, as schematically indicated by reference numeral 40 in FIG. . Since the carrier gas is ejected obliquely downward from the first gas inlet 31 formed in the outer peripheral portion 7 a of the beam-shaped spacer 7, it passes through the strong magnetic field 40. As a result, the carrier gas is sufficiently dissociated or ionized. On the other hand, the etching gas is jetted downward from the second gas inlet 34 formed in the central portion 7 b of the beam-shaped spacer 7 toward the central portion of the substrate 2, so that the strong magnetic field 40 formed in the window portion 26. Do not pass through. Therefore, the etching gas is not excessively dissociated or ionized. Radicals generated by dissociation in the plasma diffuse to the substrate 2 along the gas flow, whereas ions are accelerated by a negative bias voltage generated by being applied from the high frequency power supply 16 to the substrate susceptor 14 and collide with the substrate 2. . The surface of the substrate 2 is etched by the action of radicals and ions. That is, in the present embodiment, the carrier gas is sufficiently dissociated and ionized, and the etching gas can be suppressed from excessive dissociation and ionization, so that the controllability of the etching rate, the selection ratio, the etching shape, etc. is remarkably improved and is good Etching process can be realized. In other words, according to the type of gas, that is, for each of the etching gas and the carrier gas, the ratio of radicals and ions can be individually controlled, thereby realizing a good etching process.

  Further, in the dry etching apparatus 1 of the present embodiment, the first and second gas introduction ports 31 and 34 are both provided in the beam spacer 7, and the gas introduction port is provided in the dielectric plate 8 as a gas flow path. The structure is relatively simple in that it does not need to be provided.

  Furthermore, the beam-like spacer 7 in which the first and second gas introduction ports 31 and 34 are formed includes an annular outer peripheral portion 7a, and a central portion 7b located in the center of the region surrounded by the outer peripheral portion 7a, And a plurality of beam portions 7c extending radially from the central portion 7b to the outer peripheral portion 7a. Therefore, all portions of the dielectric plate 8, that is, the outer peripheral portion, the central portion, and the portion between the outer peripheral portion and the central portion are uniformly supported by the beam-like spacer 7. Therefore, even if the dielectric plate 8 has a large area, it is possible to ensure the mechanical strength to withstand the pressure difference between the reduced pressure in the chamber 3 and the atmospheric pressure, and the size of the apparatus can be increased.

(Second Embodiment)
Depending on the mask aperture ratio and the aspect ratio of the etching shape when the substrate 2 is etched, the etching rate may locally decrease at a part of the substrate 2. Specifically, when the mask aperture ratio is large (for example, 10% or more), when the aspect ratio is high (for example, 5 or more), more reaction products are generated during the etching reaction. And the gas containing the reaction product tends to stay in the center of the substrate 2, and the reaction product tends to adhere again to the pattern of the substrate 2. This redeposition of the reaction product may cause a local decrease in the etching rate, resulting in in-plane non-uniform processing. In this case, it is necessary to place more importance on the in-plane uniformity of the etching process than the above-described prevention of dissociation of the etching gas. The second embodiment is a dry etching apparatus 1 configured from such a viewpoint.

  In the dry etching apparatus 1 according to the second embodiment of the present invention shown in FIG. 7, the etching gas supply source 20 is connected to the introduction flow path 33 and the carrier gas supply source is connected to the gas flow path 38, contrary to the first embodiment. 19 is connected. Accordingly, the etching gas supplied from the etching gas supply source 20 passes through the introduction channel 33 and the annular gas channel 32 and is jetted obliquely downward into the chamber 3 from the first gas introduction port 31 and onto the substrate susceptor 14. From the outer peripheral portion of the held substrate 2 toward the central portion. The carrier gas supplied from the carrier gas supply source 19 is directed downward into the chamber 3 from the second gas introduction port 34 of the introduction port plate 36 through the gas flow path 38, the inlet gas flow path 37, and the gas distribution chamber 41. Toward the central portion of the substrate 2 held on the substrate susceptor 14.

  In the present embodiment, the etching gas is ejected obliquely downward from the first gas inlet 31 formed in the outer peripheral portion 7a of the beam-shaped spacer 7, thereby generating the high-density radicals and ions, By ejecting the carrier gas from the gas inlet 34, exhaust of the etching gas and reaction product at the center of the substrate 2 can be promoted to make the flow rate distribution uniform. As a result, it is possible to perform a uniform etching process with uniform etching rate and the like on the entire substrate 2 without increasing or decreasing the flow rate of the process gas contributing to the etching characteristics such as the etching rate and etching. Note that, without increasing or decreasing the flow rate of the process gas, it goes without saying that increasing or decreasing the flow rate of the process gas to such an extent that the etching characteristics are not adversely affected is not excluded.

  Other configurations and operations of the second embodiment are the same as those of the first embodiment.

  In the first and second embodiments described above, the etching gas is ejected from one of the first and second gas inlets 31 and 34, and the carrier gas is ejected from the other. However, the etching gas may be ejected by the etching gas supply source 20 from both the first and second gas introduction ports 31 and 34. Further, regardless of whether the etching gas is ejected from one or both of the first and second gas inlets 31 and 34, the first and second gas inlets 31, The carrier gas may be ejected from one or both of 34 by the carrier gas supply source 20.

  As described above, when the mask aperture ratio is large (for example, 10% or more), when the aspect ratio is high (for example, 5 or more), the gas containing the reaction product generated during the etching reaction stays in the center of the substrate 2. , The reaction product tends to redeposit on the central pattern of the substrate 2. This locally lowers the etching rate at the center of the substrate 2. In addition, when the mask aperture ratio is larger (for example, 30%), a larger amount of reaction product tends to be generated and reattached in the peripheral pattern of the substrate 2. As a result, the etching rate locally decreases at the periphery of the substrate 2.

  However, gas stagnation on the substrate 2 can be improved by ejecting the carrier gas at an appropriate flow rate from one or both of the first and second gas introduction ports 31 and 34. As a result, the local decrease in the etching rate is eliminated, and the etching process for the substrate 2 is made uniform. In this case, it is not necessary to increase or decrease the flow rate of the etching gas that contributes to the etching characteristics such as the etching rate and the etching shape. In other words, by ejecting a carrier gas at an appropriate flow rate from at least one of the first and second gas introduction ports 31 and 34, the substrate 2 is changed without changing the flow rate of the process gas that greatly contributes to the etching characteristics. The etching process can be made uniform. Here, it goes without saying that “without increasing or decreasing the flow rate of the process gas” does not mean to eliminate or increase the flow rate of the process gas to such an extent that the etching characteristics are not adversely affected.

  The present invention is not limited to the above embodiment, and various modifications can be made. For example, the present invention has been described by taking an ICP type dry etching processing apparatus as an example, but the present invention can also be applied to other plasma processing apparatuses such as a plasma CVD apparatus.

1 is a schematic cross-sectional view of a dry etching apparatus according to a first embodiment of the present invention. Sectional drawing in the II-II line of FIG. The top view of an ICP coil. The elements on larger scale of the part IV of FIG. The elements on larger scale of the part V of FIG. The perspective view of an inlet port plate. The typical sectional view of the dry etching device concerning a 2nd embodiment of the present invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Dry etching apparatus 2 Board | substrate 3 Chamber 4 Chamber main body 6 Lid body 7 Beam-shaped spacer 7a Outer peripheral part 7b Center part 7c Beam part 7d Lower surface 7e, 7f Groove 7g Upper surface 7h Recessed part 7i Gas flow path groove 7j Housing recessed part 8 Dielectric board 8a Lower surface 9 ICP coil 11 Conductor 12 Matching circuit 13 High frequency power supply 14 Substrate susceptor 16 High frequency power supply 17 Refrigerant circulation device 18 Heat transfer gas circulation device 19 Carrier gas supply source 20 Etching gas supply source 21 Controller 22, 23 O-ring 24, 25 O Ring 26 Window portion 28 Elastic member 31 First gas introduction port 32 Annular gas passage 33 Introduction passage 34 Second gas introduction port 36 Inlet port plate 36a Screw hole 36b Upper surface 36d Recess 36e Lower surface 36f Annular groove 37 Inlet gas passage 38 Gas flow path 39 Screw 41 Gas distribution chamber 42 O-ring

Claims (3)

A vacuum vessel in which a substrate is placed;
An annular outer peripheral portion disposed in the upper opening of the vacuum vessel facing the substrate and having a lower surface supported by the vacuum vessel; and a central portion located in the center of the region surrounded by the outer peripheral portion in plan view; A plurality of beam portions extending radially from the central portion to the outer peripheral portion, and a beam-shaped structure in which a region surrounded by the outer peripheral portion, the central portion, and the beam portion constitutes a plurality of window portions;
A dielectric plate whose lower surface is supported on the upper surface of the beam-like structure;
A coil for generating plasma that is disposed on the upper surface side of the dielectric plate and is supplied with high-frequency power;
An elastic member interposed between the upper surface of the beam-like structure and the lower surface of the dielectric plate;
Are arranged so as to face each of the window portion to the outer peripheral portion of the beam-like structure, gas obliquely downward so as to pass through the strong magnetic field is formed in the window portion by introduction of the RF power to the coil An outer peripheral gas introduction port for jetting
A central gas inlet that is formed in the central portion of the beam-like structure and ejects gas downward toward the central portion of the substrate;
A first gas supply source capable of ejecting a first gas from at least one of the outer peripheral gas inlet and the central gas inlet;
And a second gas supply source capable of ejecting a second gas different from the first gas from at least one of the outer peripheral gas inlet and the central gas inlet. , Plasma processing equipment. The first gas is a carrier gas and the second gas is a process gas;
The first gas supply source ejects the carrier gas from the outer peripheral gas inlet,
2. The plasma processing apparatus according to claim 1, wherein the second gas supply source ejects the process gas from the central gas introduction port. 3. The first gas is a carrier gas and the second gas is a process gas;
The second gas supply source ejects the process gas from the outer peripheral gas inlet,
The plasma processing apparatus according to claim 1, wherein the first gas supply source ejects the carrier gas from the central part gas introduction port.

Images