JP4409990B2 - A method of manufacturing a solder circuit board. - Google Patents
A method of manufacturing a solder circuit board. Download PDFInfo
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- JP4409990B2 JP4409990B2 JP2004055643A JP2004055643A JP4409990B2 JP 4409990 B2 JP4409990 B2 JP 4409990B2 JP 2004055643 A JP2004055643 A JP 2004055643A JP 2004055643 A JP2004055643 A JP 2004055643A JP 4409990 B2 JP4409990 B2 JP 4409990B2
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- water
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- polyoxyethylene
- solder
- flux
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- 229910000679 solder Inorganic materials 0.000 title claims description 85
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 230000004907 flux Effects 0.000 claims description 69
- 239000000843 powder Substances 0.000 claims description 39
- 239000000203 mixture Substances 0.000 claims description 31
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 25
- 229910052751 metal Inorganic materials 0.000 claims description 25
- -1 polyoxyethylene Polymers 0.000 claims description 25
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 20
- 239000004094 surface-active agent Substances 0.000 claims description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 16
- 150000001875 compounds Chemical class 0.000 claims description 12
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 11
- 239000003960 organic solvent Substances 0.000 claims description 8
- 150000005215 alkyl ethers Chemical class 0.000 claims description 7
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 claims description 6
- 239000012190 activator Substances 0.000 claims description 5
- 239000004166 Lanolin Substances 0.000 claims description 3
- 229930182558 Sterol Natural products 0.000 claims description 3
- 229920001400 block copolymer Polymers 0.000 claims description 3
- 229940039717 lanolin Drugs 0.000 claims description 3
- 235000019388 lanolin Nutrition 0.000 claims description 3
- 150000003333 secondary alcohols Chemical class 0.000 claims description 3
- 150000003432 sterols Chemical class 0.000 claims description 3
- 235000003702 sterols Nutrition 0.000 claims description 3
- 238000005406 washing Methods 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000005037 alkyl phenyl group Chemical group 0.000 claims 1
- 238000000034 method Methods 0.000 description 17
- 238000004140 cleaning Methods 0.000 description 12
- 239000000758 substrate Substances 0.000 description 8
- 235000002639 sodium chloride Nutrition 0.000 description 7
- 238000005476 soldering Methods 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 235000001014 amino acid Nutrition 0.000 description 4
- 229940024606 amino acid Drugs 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 239000006071 cream Substances 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000013543 active substance Substances 0.000 description 2
- 239000002313 adhesive film Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 150000001413 amino acids Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 150000002500 ions Chemical group 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- RPAJSBKBKSSMLJ-DFWYDOINSA-N (2s)-2-aminopentanedioic acid;hydrochloride Chemical compound Cl.OC(=O)[C@@H](N)CCC(O)=O RPAJSBKBKSSMLJ-DFWYDOINSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical class C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- LEHNQGSPRXHYRT-UHFFFAOYSA-N 2-dodecyl-1h-imidazole Chemical compound CCCCCCCCCCCCC1=NC=CN1 LEHNQGSPRXHYRT-UHFFFAOYSA-N 0.000 description 1
- YTZPUTADNGREHA-UHFFFAOYSA-N 2h-benzo[e]benzotriazole Chemical class C1=CC2=CC=CC=C2C2=NNN=C21 YTZPUTADNGREHA-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910020836 Sn-Ag Inorganic materials 0.000 description 1
- 229910020830 Sn-Bi Inorganic materials 0.000 description 1
- 229910020994 Sn-Zn Inorganic materials 0.000 description 1
- 229910020988 Sn—Ag Inorganic materials 0.000 description 1
- 229910018728 Sn—Bi Inorganic materials 0.000 description 1
- 229910009069 Sn—Zn Inorganic materials 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 229940053200 antiepileptics fatty acid derivative Drugs 0.000 description 1
- 125000003785 benzimidazolyl group Chemical class N1=C(NC2=C1C=CC=C2)* 0.000 description 1
- 125000003354 benzotriazolyl group Chemical class N1N=NC2=C1C=CC=C2* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N cyclobenzothiazole Natural products C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000007610 electrostatic coating method Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000006023 eutectic alloy Substances 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000013922 glutamic acid Nutrition 0.000 description 1
- 239000004220 glutamic acid Substances 0.000 description 1
- 229960003707 glutamic acid hydrochloride Drugs 0.000 description 1
- 238000011086 high cleaning Methods 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229940071870 hydroiodic acid Drugs 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- FFJMLWSZNCJCSZ-UHFFFAOYSA-N n-methylmethanamine;hydrobromide Chemical compound Br.CNC FFJMLWSZNCJCSZ-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 125000006353 oxyethylene group Chemical group 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- BBFCIBZLAVOLCF-UHFFFAOYSA-N pyridin-1-ium;bromide Chemical compound Br.C1=CC=NC=C1 BBFCIBZLAVOLCF-UHFFFAOYSA-N 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Landscapes
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Description
本発明は電子部品類の配線回路部金属表面に、均一かつ高精細なハンダ粉末の回路(例えば、プリント回路板に電子部品を取りつけるため、金属回路のパッド面にあらかじめハンダ薄層を形成したもの)を定着する及び該ハンダ粉末を定着した電子部品に他の電子部品を効率よく搭載する方法に関する。 In the present invention, a uniform and high-definition solder powder circuit (for example, a solder thin layer formed in advance on the pad surface of a metal circuit in order to attach the electronic component to a printed circuit board) And an electronic component on which the solder powder is fixed is efficiently mounted on the electronic component.
近年電子部品類、例えばプラスチック基板(フィルムもある。)、セラミック基板、あるいはプラスチック等をコートした金属基板等の絶縁基板上に、適当な方法により電子回路を形成したプリント配線板(プリント基板あるいは印刷配線板とも言う。)が開発され、その配線面上にIC素子、半導体チップ、抵抗、コンデンサー等の電子部品をハンダ付けして電子機器を構成させる手段が広く採用されている。 In recent years, printed circuit boards (printed boards or printed boards) in which electronic circuits are formed by an appropriate method on insulating parts such as electronic parts such as plastic boards (also with films), ceramic boards, metal boards coated with plastics, etc. (Also referred to as a wiring board) has been developed, and means for configuring electronic devices by soldering electronic components such as IC elements, semiconductor chips, resistors, and capacitors on the wiring surface is widely adopted.
ところで上記実装回路装置の製造において、電子部品のリード端子を所定のパッドにハンダ付けするためには、前記パッド面にあらかじめフラックスを含む所謂クリームハンダを印刷しておき、所要の電子部品を位置決め配置した後、クリームハンダをリフローさせてハンダ付けを行うのが普通である。一方、あらかじめパッド面にハンダ薄層を形成させる要求が実装密度の向上と共に高まっている。この理由は前記クリームハンダではハンダブリッジ等の不良が避けられないからである。 By the way, in the manufacture of the mounting circuit device, in order to solder the lead terminals of the electronic component to a predetermined pad, a so-called cream solder containing a flux is printed in advance on the pad surface, and the required electronic component is positioned and arranged. After that, the soldering is usually performed by reflowing the cream solder. On the other hand, the demand for forming a solder thin layer on the pad surface in advance is increasing as the mounting density is improved. This is because the cream solder cannot avoid defects such as solder bridges.
電子部品等におけるハンダ回路(ハンダ薄層)を形成するためには、メッキ法、ハンダ浴ディップ法(浸漬法)などが行われてきたが、実装密度の向上に伴い、要求されるハンダ回路のパターンはますます微細となり、作業効率、オンスペック率の向上と共に回路パターンの微細化の要求のためこれらの方法では対応が困難になりつつある。 In order to form a solder circuit (solder thin layer) in electronic parts, plating methods, solder bath dipping methods (immersion methods), etc. have been performed. Patterns are becoming increasingly finer, and these methods are becoming difficult to cope with due to demands for circuit pattern miniaturization as well as improvement in work efficiency and on-spec ratio.
これら従来のハンダ回路形成法の中で高精細なパターンのハンダ回路に適用可能な方法としてはメッキ法があるが、電子部品類のハンダ回路部となる対象部分が独立したパターンとして存在する場合が多く、電解メッキの適用はパターン間の電気導通の点で困難を伴う。一方、無電解メッキは上記電解メッキにおける電気導通の問題点は解決されるが、ハンダ層厚さが薄く、必要な厚さを得ることが困難であるという技術上の問題がある。 Among these conventional solder circuit forming methods, there is a plating method that can be applied to a solder circuit having a high-definition pattern. However, there are cases where the target portion to be a solder circuit portion of an electronic component exists as an independent pattern. In many cases, the application of electrolytic plating is difficult in terms of electrical conduction between patterns. On the other hand, the electroless plating solves the problem of electrical conduction in the electrolytic plating, but has a technical problem that the solder layer is thin and it is difficult to obtain a necessary thickness.
また表面をフラックスでコーティングしたハンダ粉末を静電塗装法により回路部分に塗布する方法(例えば、特許文献1参照。)、回路部分にフラックスを印刷、塗布し、その上にハンダ粉末を付着させた後、ハンダの融点以上に加熱して溶融させ、このハンダ溶融面上に気体を吹きつけてレベリングを行い、ハンダ回路を形成する方法(例えば、特許文献2参照。)等、数多くの提案があるが、高精細なパターンのハンダ回路形成には問題がある。 Also, a solder powder whose surface is coated with a flux is applied to a circuit part by an electrostatic coating method (see, for example, Patent Document 1), a flux is printed and applied to the circuit part, and the solder powder is adhered thereon. After that, there are many proposals such as a method of forming a solder circuit (for example, refer to Patent Document 2) by heating and melting above the melting point of solder, blowing a gas on the solder melting surface, and performing leveling. However, there is a problem in forming a solder circuit having a high definition pattern.
近年、電子部品の金属回路露出部に、金属と作用して粘着性を発現する粘着性付与化合物を含む組成物で処理することにより金属露出部に粘着性を付与し、該粘着付与部にハンダ粉末を付着させた後、加熱して定着するハンダ回路形成する方法(例えば特許文献3参照)が開発され、高精細なハンダパターンを容易に得ることが可能となったが、該方法において従来のフラックスを使用してハンダ粉末定着部に塗布した場合、フラックスがハンダ粉末表面を完全に覆わず、ハンダ粉末のリフロー後においてハンダ粉末の溶融性が悪いと共に、ハンダ回路上にフラックス残渣も残存し、このフラックス残渣がハンダ回路基板の信頼性を低下させる問題点があった。特に微小チップ実装基板の場合は、ピッチ間隔が約300μmと狭くなるため信頼性に悪影響を及ぼす。残存したフラックスの残渣を、洗浄工程等で除去することは可能ではあるが、このような洗浄工程を入れることは回路基板のコストアップにつながる。また今後、回路基板のパターンがますます微細化することが予想され、残存するフラックスを可能な限り除去することが要求される。さらに、ハンダ粉末のリフロー後の溶融性を高めるためにも、ハンダ粉末の表面を安定的に覆えるフラックスが要求されていた。 In recent years, a metal circuit exposed portion of an electronic component is treated with a composition containing a tackifier compound that develops tackiness by acting with a metal, thereby giving the metal exposed portion tackiness, and soldering the tackifier portion. A method of forming a solder circuit (see, for example, Patent Document 3) in which a powder is attached and then heated and fixed has been developed, and a high-definition solder pattern can be easily obtained. When applied to the solder powder fixing part using a flux, the flux does not completely cover the surface of the solder powder, the solder powder has poor meltability after reflow of the solder powder, and the flux residue also remains on the solder circuit, This flux residue has a problem of reducing the reliability of the solder circuit board. Particularly in the case of a microchip mounting substrate, the pitch interval is as narrow as about 300 μm, which adversely affects reliability. Although it is possible to remove the remaining flux residue by a cleaning process or the like, such a cleaning process leads to an increase in the cost of the circuit board. In the future, it is expected that the pattern of the circuit board will become increasingly finer, and it is required to remove the remaining flux as much as possible. Furthermore, in order to improve the meltability after reflow of the solder powder, a flux that stably covers the surface of the solder powder has been required.
ハンダ付け用フラックスは、ハンダ付けで重要な役割を果たすことは周知であるが、、ハンダ付け後は、かえってこのフラックス残渣がプリント配線基板の品質を悪くし、製品の寿命を短くするので注意が必要である。
フラックス残渣の影響は、
(1)長期間に部品等を腐食させる。
(2)電気絶縁不良をおこす。
(3)インサーキットテストの試験ピンがフラックス残渣により導通不良の誤動作をおこす。等の悪影響がある。
このため洗浄性の高いものも開発されているが、これらのハンダ付け用フラックスは、ハンダのリフロー温度の相違による使用温度の相違や、使用方法の相違から、従来の水溶性フラックスをそのまま用いることは、ハンダの溶融性とリフロー後のフラックスの洗浄性の点で困難であった。
It is well known that soldering flux plays an important role in soldering. However, after soldering, the flux residue will deteriorate the quality of the printed wiring board and shorten the product life. is necessary.
The effect of flux residue is
(1) Corrosion of parts, etc. over a long period.
(2) Causes poor electrical insulation.
(3) In-circuit test pins malfunction due to poor continuity due to flux residue. There are adverse effects such as.
For this reason, high detergency products have also been developed. However, these soldering fluxes should be used as they are because of differences in usage temperature due to differences in solder reflow temperature and usage methods. However, it was difficult in terms of solder meltability and flux cleaning ability after reflow.
本発明はこれらの問題点を解決することを目的とし、ハンダ粉末の溶融性とリフロー後のフラックスの洗浄性の高いフラックスを提供することにより、特許文献3に記載されたハンダ回路形成方法に適用したときに、簡便な洗浄工程のみで、残留するフラックスを低減させた回路基板の製造方法を提供することを目的とする。 The present invention aims to solve these problems, and is applicable to the solder circuit forming method described in Patent Document 3 by providing a flux with high meltability of solder powder and high cleaning performance of the flux after reflow. It is an object of the present invention to provide a circuit board manufacturing method in which residual flux is reduced only by a simple cleaning process.
本発明者は上記課題を解決すべく鋭意努力検討した結果、本発明に到達した。すなわち本発明は、
[1] 電子部品類の金属回路露出部に、金属と作用して粘着性を発現する粘着性付与化合物の少なくとも一種を含む組成物で処理して粘着性を付与し、ハンダ粉末を付着させ、次いでこれを加熱定着した後、該ハンダ粉末定着部に界面活性剤を配合した水溶性フラックス組成物を塗布し、次にハンダ粉末をリフローさせ、その後フラックス残渣を水で洗浄することを特徴とするハンダ回路基板の製造方法、
[2] 電子部品類の金属回路露出部に、金属と作用して粘着性を発現する粘着性付与化合物の少なくとも一種を含む組成物で処理して粘着性を付与し、ハンダ粉末を付着させ、次いでこれを加熱定着した後、該ハンダ粉末定着部に対応して他の実装用部品類を位置合せ配置し、界面活性剤を配合した水溶性フラックス組成物を該他の実装用部品類の配置の前又は後に塗布し、ハンダ粉末をリフローさせ、その後フラックス残渣を水で洗浄することを特徴とする電子回路基板の製造方法。
As a result of diligent efforts to solve the above problems, the present inventor has reached the present invention. That is, the present invention
[1] A metal circuit exposed portion of an electronic component is treated with a composition containing at least one tackifying compound that acts with a metal to develop tackiness to impart tackiness, and solder powder is adhered thereto. Next, after heat-fixing this, a water-soluble flux composition containing a surfactant is applied to the solder powder fixing part, then the solder powder is reflowed, and then the flux residue is washed with water. Solder circuit board manufacturing method,
[2] A metal circuit exposed portion of an electronic component is treated with a composition containing at least one tackifying compound that exhibits tackiness by acting with a metal to impart tackiness, and solder powder is adhered thereto. Next, after this is fixed by heating, other mounting parts are aligned and arranged corresponding to the solder powder fixing portion, and a water-soluble flux composition containing a surfactant is arranged in the other mounting parts. A method for producing an electronic circuit board, wherein the solder powder is reflowed by applying before or after the step, and then the flux residue is washed with water.
[3] 水溶性フラックスにグリコールを添加することを特徴とする上記[1]または[2]に記載のハンダ回路基板の製造方法、
[4] 活性剤、水または水溶性有機溶剤からなる組成物に界面活性剤(ノニオン系)を配合したことを特徴とする水溶性フラックス組成物、
[5] 水溶性フラックス組成物の配合比が、活性剤10質量量部に対して、水または水溶性有機溶剤が30質量部〜100質量部の範囲内、界面活性剤(ノニオン系)が5質量部〜20質量部の範囲内に配合したことを特徴とする水溶性フラックス組成物、及び
[6] 上記[5]に記載の水溶性フラックス組成物100重量部に、グリコールを10質量部〜40質量部の範囲内を配合したことを特徴とする水溶性フラックス組成物、を開発することにより上記の課題を解決した。
[3] A method for producing a solder circuit board according to the above [1] or [2], wherein glycol is added to the water-soluble flux.
[4] A water-soluble flux composition comprising a surfactant (nonionic) mixed with a composition comprising an activator, water or a water-soluble organic solvent,
[5] The mixing ratio of the water-soluble flux composition is such that water or a water-soluble organic solvent is within a range from 30 parts by mass to 100 parts by mass with respect to 10 parts by mass of the active agent, and the surfactant (nonionic) is 5 parts. 10 parts by mass of glycol is added to 100 parts by weight of the water-soluble flux composition according to [6] and [5], wherein the water-soluble flux composition is blended in a range of from 20 parts by mass to 20 parts by mass. The above-mentioned problems have been solved by developing a water-soluble flux composition characterized by blending the range of 40 parts by mass.
本発明の製造方法は、洗浄性の改善された界面活性剤またはそれとグリコールを配合した水溶性フラックス組成物をリフロー工程で使用することにより、リフロー後の回路基板の洗浄性を大きく高めることが可能となり、洗浄後に残留するフラックスが減少し、長期間にわたり腐食が少なく、絶縁不良の発生が少ない信頼性が非常に高いハンダ回路基板、電子回路基板が得ることができるようになった。 The manufacturing method of the present invention can greatly improve the cleaning performance of a circuit board after reflow by using a surfactant having improved cleaning performance or a water-soluble flux composition containing glycol and a surfactant in the reflow process. As a result, the flux remaining after the cleaning is reduced, and it is possible to obtain a highly reliable solder circuit board and electronic circuit board with little corrosion over a long period of time and less insulation failure.
本発明の対象とする電子部品類としては、例えばプリント配線板、各種実装用部品類があり、プリント配線板の例としては、プラスチック基板、プラスチックフィルム基板、ガラス布基板、紙基材エポキシ樹脂基板、セラミックス基板等に金属版を積層した基板あるいは金属基材にプラスチックあるいはセラミックス等を被覆した絶縁基板上に適当な方法により回路を形成した片面電子部品類、両面プリント配線板、多層プリント配線板あるいはフレキシブルプリント配線板に適用できる。又各種実装用部品類としては、例えばIC素子類(ベアチップ、各種パッケージ類)、抵抗、コンデンサー等をあげることができる。 Examples of the electronic components targeted by the present invention include a printed wiring board and various mounting components. Examples of the printed wiring board include a plastic substrate, a plastic film substrate, a glass cloth substrate, and a paper base epoxy resin substrate. A single-sided electronic component, a double-sided printed wiring board, a multilayer printed wiring board, or a circuit in which a circuit is formed by a suitable method on a substrate in which a metal plate is laminated on a ceramic substrate or the like, or an insulating substrate in which a metal base is coated with plastic or ceramics Applicable to flexible printed wiring boards. Examples of various mounting parts include IC elements (bare chips, various packages), resistors, capacitors, and the like.
電子部品類の回路を形成する金属としてはほとんどの場合銅が主として用いられており、本発明の粘着性付与化合物に対してもっとも好ましい金属材料であるが、他の金属であっても良い。他の金属にあっては該粘着性が銅に比して弱い傾向がある。 In most cases, copper is mainly used as a metal for forming circuits of electronic components, and is the most preferable metal material for the tackifying compound of the present invention, but other metals may be used. In other metals, the adhesiveness tends to be weaker than copper.
本発明で使用する粘着性付与化合物としては金属と作用して粘着性を発現する化合物であれば特に限定はないが、例えば、
一般式(1)で表されるベンゾトリアゾール系誘導体、
A benzotriazole derivative represented by the general formula (1),
一般式(2)で表されるナフトトリアゾール系誘導体、
一般式(3)で表されるイミダゾール系誘導体、
一般式(4)で表されるベンゾイミダゾール系誘導体、
一般式(5)で表されるメルカプトベンゾチアゾール系誘導体、
一般式(6)で表されるベンゾチアゾールチオ脂肪酸系誘導体など、
N,S,O,Pなどの元素を有する有機化合物が特に好ましい。
Benzothiazole thio fatty acid derivatives represented by the general formula (6),
An organic compound having an element such as N, S, O, or P is particularly preferable.
これら粘着性付与化合物を処理する方法として水溶液の形で浸漬またはスプレー法などを適用する場合、該粘着性付与化合物の少なくとも一つを水に溶解する為に、酸性、好ましくはpH3〜5程度の微酸性に調整した組成物を用いる。塗布法を適用する場合においては、浸漬またはスプレー法で用いる組成物にカルボキシメチルセルローズ誘導体の如き増粘剤を添加し、インキ状にして用いると使い易い。この際溶液の濃度は、好ましくは全体として0.05質量%乃至20質量%くらいのものが使用し易い。 When applying a dipping or spraying method in the form of an aqueous solution as a method for treating these tackifying compounds, in order to dissolve at least one of the tackifying compounds in water, it is acidic, preferably about pH 3-5 A composition adjusted to be slightly acidic is used. When applying the coating method, it is easy to use it by adding a thickening agent such as a carboxymethyl cellulose derivative to the composition used in the dipping or spraying method and using it in an ink form. At this time, the concentration of the solution is preferably about 0.05% by mass to 20% by mass as a whole.
処理温度は室温よりは若干加温したほうが粘着成膜の生成速度、生成量もよく、粘着性付与化合物濃度、金属の種類になどにより変わり限定的でないが、一般的には30℃乃至60℃くらいの範囲が好適である。浸漬時間は限定的でないが、作業効率から5秒乃至5分間位の範囲になるように他の条件を調整することが好ましい。 The treatment temperature is slightly higher than room temperature, and the formation rate and generation amount of the adhesive film are better, and it varies depending on the tackifying compound concentration, the type of metal, etc., but is generally 30 ° C. to 60 ° C. A range of about is suitable. Although the immersion time is not limited, it is preferable to adjust other conditions so that the working efficiency is in the range of about 5 seconds to 5 minutes.
なおこの場合、ハンダ回路形成用組成物中に銅イオンとして100〜1000ppmを共存させるときは粘着性膜の生成速度、生成量などの生成効率が高まるので好ましい。 In this case, it is preferable to coexist 100 to 1000 ppm as copper ions in the composition for forming a solder circuit because the production efficiency such as the production rate and the production amount of the adhesive film is increased.
処理すべき電子部品類は他の金属回路部分はレジストまたは樹脂等で覆われハンダ回路の部分の金属回路のみが露出した状態にしておき、ハンダ回路形成用組成物で処理する。 The electronic parts to be processed are treated with a composition for forming a solder circuit while the other metal circuit portion is covered with a resist or resin and only the metal circuit of the solder circuit portion is exposed.
ここで使用する前述の粘着性付与化合物を含む組成物中に浸漬、スプレーまたは塗布し、これを適宜溶媒による洗浄、乾燥を経て金属露出面のみに粘着性を付与する。次にこの電子部品類にハンダ粉末をふりかけ、粘着面に付着させ、余分のハンダ粉末を除いた後、加熱処理をする。 It is immersed, sprayed or coated in a composition containing the above-described tackifier compound used here, and this is appropriately washed and dried with a solvent to impart tackiness only to the exposed metal surface. Next, solder powder is sprinkled on the electronic components to adhere to the adhesive surface, and excess solder powder is removed, followed by heat treatment.
ハンダを定着するための加熱処理温度は、好ましくは50〜250℃に設定されるが、加熱定着温度が低いときは、時間を長く設定し、加熱定着温度が高いときは短くすることは必要であって、ハンダ粉末が溶融し流出しない条件を選ぶことが必要である。
然る後、水溶性フラックス組成物を塗布し、次いでリフローを行い残留するフラックスを水で洗浄しハンダ回路を形成させる。更には、該ハンダ粉末の定着処理後、他の電子部品類を該ハンダ粉末パターンに対応して位置合せ後配置し、水溶性フラックス組成物の塗布は該他の電子部品類の配置前又は後で行い、これをリフローし残留するフラックスを水で洗浄することにより効率よく精密に他の電子部品類を、信頼性を確保しつつ搭載できる。この際に使用するハンダの材質としては鉛系の共晶合金や、銀入り、ビスマス入り等の鉛フリー合金である、Sn−Ag系、Sn−Zn系、Sn−Bi系合金を、用途により任意に選択できる。
The heat treatment temperature for fixing the solder is preferably set to 50 to 250 ° C. However, it is necessary to set a longer time when the heat fixing temperature is low and to shorten it when the heat fixing temperature is high. Therefore, it is necessary to select conditions under which the solder powder does not melt and flow out.
Thereafter, a water-soluble flux composition is applied, followed by reflow, and the remaining flux is washed with water to form a solder circuit. Further, after the solder powder is fixed, the other electronic components are arranged after alignment in accordance with the solder powder pattern, and the water-soluble flux composition is applied before or after the other electronic components are arranged. This is done by reflowing and washing the remaining flux with water, so that other electronic components can be mounted efficiently and precisely while ensuring reliability. The solder material used here is a lead-based eutectic alloy or a lead-free alloy such as silver or bismuth, such as Sn-Ag, Sn-Zn, or Sn-Bi. Can be arbitrarily selected.
上記の水溶性フラックスとは、活性剤に水または水溶性有機溶媒を添加したものである。活性剤とは、アミンとアミノ酸の無機酸塩(例えば、ジメチルアミンまたはグルタミン酸の塩酸塩、ピリジンの臭化水素酸塩)、アミンとアミノ酸の有機酸塩(例えば、グルタミン酸のシュウ酸塩、ジメチルアミンのコハク酸塩)、有機酸(例えば、グリコール酸、乳酸、リンゴ酸、ギ酸、酢酸、シュウ酸、マロン酸、コハク酸)、無機酸(例えば、フッ化水素酸、塩化水素酸、臭化水素酸、よう化水素酸、ホウフッ化水素酸、リン酸、塩化亜鉛、塩化アンモン、塩化ナトリウム、塩化第1スズ、フッ化塩化第1スズ、フッ化ナトリウム)等である。この中で特に、アミンとアミノ酸の無機酸塩やアミンとアミノ酸の有機酸塩を用いるのが好ましい。また水溶性有機溶剤としては、炭素数1〜3のアルコール類、または高沸点アルコールエーテル類に、グリセリン、ポリエチレン、ポリプロピレン、フェニルエーテルを添加したものを用いることができる。 The water-soluble flux is a product obtained by adding water or a water-soluble organic solvent to the activator. Activators include amine and amino acid inorganic acid salts (eg, dimethylamine or glutamic acid hydrochloride, pyridine hydrobromide), amine and amino acid organic acid salts (eg, glutamic acid oxalate, dimethylamine) Succinate), organic acids (eg glycolic acid, lactic acid, malic acid, formic acid, acetic acid, oxalic acid, malonic acid, succinic acid), inorganic acids (eg hydrofluoric acid, hydrochloric acid, hydrogen bromide) Acid, hydroiodic acid, borohydrofluoric acid, phosphoric acid, zinc chloride, ammonium chloride, sodium chloride, stannous chloride, stannous fluorochloride, sodium fluoride) and the like. Among these, it is particularly preferable to use an inorganic acid salt of amine and amino acid or an organic acid salt of amine and amino acid. Moreover, as a water-soluble organic solvent, what added glycerol, polyethylene, a polypropylene, and phenyl ether to C1-C3 alcohol or high boiling-point alcohol ether can be used.
本発明の製造方法に用いる水溶性フラックスとしては、活性剤10質量部に、水または水溶性有機溶媒を、好ましくは30質量部〜100質量部の範囲内、より好ましくは、50質量部〜90質量部の範囲内で含むのが好ましい。水溶性有機溶媒の添加量が100質量部より高くなると、リフロー時のフラックスの効果が低くなり、添加量が30質量部より少なくなると、リフロー後のフラックスの残存量が多くなる。 As a water-soluble flux used in the production method of the present invention, water or a water-soluble organic solvent is added to 10 parts by mass of the active agent, preferably within a range of 30 parts by mass to 100 parts by mass, and more preferably 50 parts by mass to 90 parts by mass. It is preferable to contain within the range of a mass part. When the addition amount of the water-soluble organic solvent is higher than 100 parts by mass, the effect of the flux at the time of reflow is reduced, and when the addition amount is less than 30 parts by mass, the residual amount of the flux after the reflow is increased.
本発明の水溶性フラックス組成物においては、ハンダ粉末定着部に塗布漏れのないようにフラックスの塗布の均一性の確保、並びにリフロー後のフラックス残渣の除去率を高めるために界面活性剤を配合する。界面活性剤としては市販のものが使用できるが、特にノニオン系の界面活性剤を用いるのが好ましく、例えば、ポリオキシエチレンアルキルエーテル、ポリオキシエチレン2級アルコールエーテル、ポリオキシエチレンアルキルフェニルエーテル、ポリオキシエチレンステロールエーテル、ポリオキシエチレンラノリン誘導体、ポリオキシエチレンポリオキシプロピレンブロックコポリマー、ポリオキシエチレンポリオキシプロピレンアルキルエーテルを用いるのが好ましい。 In the water-soluble flux composition of the present invention, a surfactant is blended in order to ensure the uniformity of flux application and to improve the removal rate of the flux residue after reflow so that there is no application leakage in the solder powder fixing part. . A commercially available surfactant can be used as the surfactant, but nonionic surfactants are particularly preferably used. For example, polyoxyethylene alkyl ether, polyoxyethylene secondary alcohol ether, polyoxyethylene alkylphenyl ether, polyoxyethylene alkyl ether, It is preferable to use oxyethylene sterol ether, polyoxyethylene lanolin derivative, polyoxyethylene polyoxypropylene block copolymer, polyoxyethylene polyoxypropylene alkyl ether.
本発明の製造方法に用いる水溶性フラックスへの界面活性剤の添加量は、界面活性剤10質量部あたりで、好ましくは5質量部〜20質量部の範囲内、より好ましくは、8質量部〜15質量部の範囲内である。界面活性剤の添加量が20質量部より高くなると、フラックスの効果が低くなり、添加量が5質量部より少なくなると、界面活性剤の添加効果が不十分となる。 The addition amount of the surfactant to the water-soluble flux used in the production method of the present invention is preferably within a range of 5 to 20 parts by mass, more preferably 8 to 10 parts by mass per 10 parts by mass of the surfactant. It is in the range of 15 parts by mass. When the addition amount of the surfactant is higher than 20 parts by mass, the effect of the flux is lowered, and when the addition amount is less than 5 parts by mass, the addition effect of the surfactant is insufficient.
本発明の製造方法では、前記の界面活性剤配合水溶性フラックス組成物に、洗浄性を高めるためにさらにグリコールを添加するのが好ましい。グリコールとは、エチレングリコール、プロピレングリコール、ポリエチレングリコール、ポリプロピレングリコールなどであり、本発明では特にエチレングリコール、ポリエチレングリコールを用いるのが好ましい。
本発明の製造方法に用いる水溶性フラックス組成物へのグリコールの添加量は、水溶性フラックス100質量部に、10質量部〜40質量部の範囲内、好ましくは、15質量部〜35質量部の範囲内である。グリコールの添加量が40質量部より高くなると、フラックスの性能が低くなり、添加量が10質量部より少なくなると、グリコールの添加効果が不十分となり、ハンダ粉末の溶融性とフラックスの洗浄性が悪くなる。
In the production method of the present invention, it is preferable to further add glycol to the surfactant-containing water-soluble flux composition in order to improve the cleaning property. Glycol includes ethylene glycol, propylene glycol, polyethylene glycol, polypropylene glycol, and the like. In the present invention, it is particularly preferable to use ethylene glycol and polyethylene glycol.
The amount of glycol added to the water-soluble flux composition used in the production method of the present invention is in the range of 10 to 40 parts by weight, preferably 15 to 35 parts by weight, per 100 parts by weight of the water-soluble flux. Within range. When the addition amount of glycol is higher than 40 parts by mass, the performance of the flux is lowered. When the addition amount is less than 10 parts by mass, the effect of addition of glycol becomes insufficient, and the meltability of the solder powder and the cleaning property of the flux are poor. Become.
フラックスを塗布した後、リフロー炉等を用いてハンダ粉末を溶融し、残留するフラックスを水で洗浄し、電子部品類回路の金属露出面に高精細かつ均一な厚みを有するフラックスのない信頼性が高いハンダ回路を形成させることができる。また、ハンダブリッジなどのおそれなく、高実装密度で他の電子部品類を搭載することができる。 After applying the flux, the solder powder is melted using a reflow furnace, etc., the remaining flux is washed with water, and the metal exposed surface of the electronic component circuit has a high-definition and uniform thickness without flux reliability A high solder circuit can be formed. Also, other electronic components can be mounted at a high mounting density without fear of a solder bridge or the like.
(実施例1)
0.25mmピッチのTAB部品を接続するため、対応する0.25mmピッチ銅パッド部の銅を露出させたプリント配線板を、酢酸によりpHを約4に調整した2−ドデシルイミダゾール1質量部水溶液中に40℃、30sec浸漬し、水洗、乾燥し、銅パッド部表面に選択的に粘着性物質層を形成させた。該プリント配線板に平均粒径約50μmの共晶ハンダ粉末をふりかけ、余分のハンダ粉末をエアで飛ばして粘着性物質部分に選択的に付着させ高精細なハンダパターンを得た。
Example 1
In order to connect a TAB component having a pitch of 0.25 mm, a printed wiring board in which the copper of the corresponding 0.25 mm pitch copper pad portion was exposed was adjusted to a pH of about 4 with acetic acid in 1 part by mass aqueous solution of 2-dodecylimidazole. The film was soaked at 40 ° C. for 30 seconds, washed with water and dried to selectively form an adhesive substance layer on the surface of the copper pad portion. A eutectic solder powder having an average particle size of about 50 μm was sprinkled on the printed wiring board, and the excess solder powder was blown off with air to selectively adhere to the adhesive substance portion to obtain a high-definition solder pattern.
該電子部品類を170℃、30sec、加熱定着した後、微量な不必要部のハンダ粉末をハケで除去し、水溶性フラックスとして、ジメチルアミン臭化水素酸塩10質量部にイソプロピルアルコール80質量部を添加したもの10質量部に、塗布の均一性と洗浄性を高める目的で界面活性剤としてポリオキシエチレンアルキルエーテルを1.5質量部とポリエチレングリコールを3.5質量部添加したフラックスを塗布した後、230℃、1分間リフロー炉に入れハンダ粉末を溶融してハンダ回路基板を製造した。得られたハンダ回路基板は、銅パッド部表面に均一かつ高精細な厚さ30μmのハンダ回路を有する回路基板であった。このハンダ回路基板を水で洗浄後、回路基板の表面やスルーホール内を観察したところ、フラックスの残留物は観察されなかった。また、回路基板のイオン残渣をオメガメータで測定した結果、1μg・NaCl/インチ2であり、問題のないレベルであった。 After the electronic components were heat-fixed at 170 ° C. for 30 seconds, a small amount of unnecessary part of the solder powder was removed by brushing, and as a water-soluble flux, 10 parts by mass of dimethylamine hydrobromide and 80 parts by mass of isopropyl alcohol In order to improve the uniformity and cleaning properties of the coating, 10 parts by mass of the above was applied with a flux containing 1.5 parts by mass of polyoxyethylene alkyl ether and 3.5 parts by mass of polyethylene glycol as a surfactant. Thereafter, the solder powder was melted in a reflow furnace at 230 ° C. for 1 minute to produce a solder circuit board. The obtained solder circuit board was a circuit board having a uniform and high-definition 30 μm thick solder circuit on the surface of the copper pad portion. After the solder circuit board was washed with water, the surface of the circuit board and the inside of the through hole were observed, and no flux residue was observed. As a result of measuring the ionic residue on the circuit board with an omega meter, it was 1 μg · NaCl / inch 2 , which was a level with no problem.
(実施例2〜4)
上記実施例4は参考例として示す。
表1に示すように、水溶性フラックス、界面活性剤およびグリコールを配合した水溶性フラックス組成物を用い、実施例1と同様な条件でハンダ粉末の溶融性、フラックス残渣の状況(外観検査)及びイオン残渣を測定した。結果を表1に示す。
(Examples 2 to 4)
The above Example 4 is shown as a reference example.
As shown in Table 1, using a water-soluble flux composition containing a water-soluble flux, a surfactant, and a glycol, solder powder meltability, flux residue status (appearance inspection) under the same conditions as in Example 1 and The ion residue was measured. The results are shown in Table 1.
(比較例1)
実施例1において、水溶性フラックス組成物に界面活性剤を添加せず、他の条件は同様にしてハンダ回路基板を製造した。このハンダ回路基板を水で洗浄後、回路基板の表面を観察したところ、フラックスの残留物が観察された。またオメガメータでイオン残渣を測定した結果、40μg・NaCl/インチ2であった。
(Comparative Example 1)
In Example 1, a solder circuit board was produced in the same manner as above except that the surfactant was not added to the water-soluble flux composition. After the solder circuit board was washed with water, the surface of the circuit board was observed, and a flux residue was observed. As a result of measuring the ion residue with an omega meter, it was 40 μg · NaCl / inch 2 .
本発明は電子部品類の配線回路部金属表面に、均一かつ高精細なハンダ粉末の回路(例えば、プリント回路板に電子部品を取りつけるため、金属回路のパッド面にあらかじめハンダ薄層を形成したもの)を、簡便な洗浄工程のみで、残留するフラックスを低減させた回路基板の製造する及び該ハンダ粉末を定着した電子部品に他の電子部品を効率よく搭載することができる。
該回路基板等は洗浄後に残留するフラックスが極めて少ないため、長期間にわたり腐食が少なく、絶縁不良の発生が少ない信頼性が非常に高いハンダ回路基板、電子回路基板の製造に適用できる。
In the present invention, a uniform and high-definition solder powder circuit (for example, a solder thin layer formed in advance on the pad surface of a metal circuit in order to attach the electronic component to a printed circuit board) ) Can be efficiently mounted on an electronic component on which the solder powder is fixed and a circuit board with reduced residual flux can be manufactured by only a simple cleaning process.
Since the circuit board or the like has a very small amount of flux remaining after cleaning, it can be applied to the manufacture of solder circuit boards and electronic circuit boards with very high reliability with little corrosion for a long period of time and little occurrence of insulation failure.
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