JP4130837B2 - Stage reaction force processing equipment - Google Patents

Description

  The present invention relates to a stage reaction force processing apparatus, and more particularly to a stage reaction force processing apparatus configured to be installed in a clean room.

  A stage device that precisely moves the stage is installed in a clean room, and is configured so that, for example, a gate-shaped Y stage moves at a constant speed above a substrate adsorbed on a table (for example, Patent Document 1).

  Further, the Y stage extends in a direction (X direction) orthogonal to the moving direction (Y direction), and both ends are supported by a pair of guide members so as to move across the substrate on the table, The moving position is detected by a pair of linear scales (position detectors). Then, both ends of the Y stage are driven in the moving direction by a pair of linear motors (driving means). The pair of linear motors are supported by linear motor support portions fixed to the floor surface.

  Therefore, in the above stage device, when the Y stage is driven by the driving force of the linear motor, the reaction force is transmitted to the linear motor support that supports the linear motor stator (permanent magnet), and the linear motor support is interposed. It is configured to escape to the floor.

On the floor surface of the clean room where the stage device configured as described above is installed, the air flow that has passed through the filter disposed on the ceiling is introduced into the under-floor space and returned to the air cleaning device. . And in the under floor recessed part provided in the floor surface of the clean room, the space for the said air flow to pass through, and the under floor structure which assembled the steel frame so that a stage apparatus may be supported are provided.
JP 2005-52823 A

  However, in the conventional reaction force processing device for a stage, the linear motor support part of the stage device and the stone surface plate that supports the table are supported by the underfloor structure, so that, for example, as the substrate becomes larger, the Y stage When the size of the Y stage is increased, when the Y stage is moved at a higher speed, a larger driving force is required and the reaction force also increases, and the linear motor support portion operates to bend according to the reaction force. It will be.

  In addition, the reaction force when driving the Y stage is transmitted from the linear motor support that supports the linear motor stator to the underfloor structure, and further to the stone surface plate supported on the floor surface. Problem arises.

  In view of the above circumstances, an object of the present invention is to provide a stage reaction force processing apparatus that solves the above-described problems.

  In order to solve the above problems, the present invention has the following means.

  The present invention is supported by a fixed base fixed to the floor, driving means arranged in parallel to the side of the fixed base, a support portion supporting the driving means, and movably supported by the fixed base, In a reaction force processing apparatus for a stage in which a stage apparatus including a stage that is moved by a driving force of the driving means is installed, a first underfloor structure that supports the fixed base and a second that supports the support section. The above-mentioned problem is solved by providing the underfloor structure separately.

  Further, the present invention provides an underfloor recess for storing the first underfloor structure and the second underfloor structure below the floor surface, and the first underfloor structure and the first underfloor in the recess. The above-mentioned problem is solved by separating the two underfloor structures from each other by a predetermined distance.

  Further, the present invention provides a non-contact space formed so as not to contact between the first under-floor structure and the second under-floor structure inside the under-floor recess, It solves the problem.

  Moreover, it is desirable to lay a grating member having a ventilation hole on the floor surface.

  According to the present invention, by separating the first underfloor structure that supports the fixed base and the second underfloor structure that supports the support portion, the vibration of the reaction force when the stage is driven by the drive means is generated. Propagation of vibration from the second underfloor structure directly to the first underfloor structure can be prevented even when propagating to the second underfloor structure via the support portion, and vibration due to reaction force of the drive means is prevented. It is attenuated between the first and second underfloor structures and can be prevented from propagating to the stage.

  The best mode for carrying out the present invention will be described below with reference to the drawings.

  FIG. 1 is a perspective view showing an embodiment of a reaction force processing apparatus for a stage according to the present invention. 2 is a front view of the stage reaction force processing apparatus shown in FIG. FIG. 3 is a side view of the stage reaction force processing apparatus shown in FIG. 4 is a plan view of the stage reaction force processing apparatus shown in FIG.

  As shown in FIGS. 1 to 4, the stage reaction force processing apparatus 100 is provided in a clean room, for example, and includes a first underfloor structure 110 that supports the gantry 12 of the stage apparatus 10, and a linear motor support unit. And a second underfloor structure 120 that supports 46. The first underfloor structure 110 and the second underfloor structure 120 are provided separately, and have a so-called edge cutting structure.

  The first underfloor structure 110 and the second underfloor structure 120 are housed in an underfloor recess 140 formed below the stage installation portion 132 where the stage device 10 on the floor surface 130 is installed. In the underfloor recess 140, the first underfloor structure 110 and the second underfloor structure 120 are separated by a predetermined distance, and the first underfloor structure 110 and the second underfloor structure 120 are separated from each other. A non-contact space 150 that is non-contact is formed.

  The underfloor recess 140 is a structure that is a foundation formed of concrete, and the first underfloor structure 110 and the second underfloor structure 120 are fixed on the foundation. In addition, the underfloor structures 110 and 120 are formed of a steel frame or concrete in a portion indicated by a one-dot chain line in the drawing, are separated via a non-contact space 150, and are installed so as not to interfere with each other.

  As described above, since the first underfloor structure 110 and the second underfloor structure 120 are provided separately, even when the reaction force during stage driving is transmitted to the second underfloor structure 120. The vibration is not propagated directly from the floor surface 130 to the gantry 12 but is transmitted to the gantry 12 via the second underfloor structure 120, the underfloor recess 140, and the first underfloor structure 110. Therefore, the reaction force at the time of driving the stage is attenuated in the process of propagating through the second underfloor structure 120, the underfloor recess 140, and the first underfloor structure 110.

  A grating member 170 is laid on the entire surface of the floor 130. The grating member 170 is a lattice-like floor member having a plurality of ventilation holes 172, and is made of, for example, a lattice-like block formed in a square shape by casting or the like. The grating member 170 is supported by the third underfloor structure 180 fixed to the underfloor recess 140 outside the second underfloor structure 120. Note that the third underfloor structure 180 is adjacent to the outside of the second underfloor structure 120, but is provided separately from the second underfloor structure 120. Moreover, it is good also as a structure which lays the concrete panel which has a vent hole on the floor surface 130 instead of the said grating member 170. FIG.

  Here, the configuration of the stage apparatus 10 will be described. The stage device 10 is a gantry moving stage that moves a gantry section, and includes a gantry 12 fixed on a concrete floor, a stone surface plate 14 supported on the gantry 12, and a stone surface plate 14 supported. The workpiece mounting table 16, the Y stage 18 laid horizontally across the workpiece mounting table 16, and a pair of linear motors (driving means) 20 that drive both ends of the Y stage 18 in the Y direction. Have. In the present embodiment, the fixed base is composed of the above-described gantry 12, stone surface plate 14, and workpiece mounting table 16.

  The linear motor 20 is controlled to be driven in translation based on a position detection signal from a linear scale that detects the movement positions of both ends of the Y stage 18.

  The gantry 12 has a strong configuration in which steel frames are combined in a lattice shape, and is supported by the first underfloor structure 110. Further, the stone surface plate 14 supported on the upper surface of the gantry 12 is formed in a U shape, and rises upward from both sides of the flat surface portion 14a that supports the workpiece mounting table 16 in a stable state. Guide portions 14b and 14c. In addition, the work mounting table 16 is provided with a vacuum suction unit (not shown) for sucking a substrate (for example, a liquid crystal substrate) as a work.

  The Y stage 18 is coupled to the horizontal portion (beam) 30 extending in the X direction above the guide portions 14b and 14c, and is opposed to the side surfaces of the guide portions 14b and 14c from the outside by being coupled to both ends of the horizontal portion 30. And a pair of sliders 32. A processing jig (not shown) or the like for performing a predetermined processing on the work (substrate) adsorbed on the work mounting table 16 is mounted on the horizontal portion 30. The horizontal portion 30 and the slider 32 have static pressure air bearings (static pressure pads) 36 and 38 that move in a non-contact manner with respect to the guide portions 14b and 14c by air pressure. Therefore, the Y stage 18 can move in the Y direction with almost no friction.

  The linear motor 20 includes a stator (having a permanent magnet) 40 formed in a U-shape, and a mover (having a coil) 42 inserted into the stator 40 from the side. The coil applied voltage is controlled so as to move the mover 42 in the Y direction in a non-contact state through the gap. The mover 42 is coupled to the side surface of the slider 32 and transmits a thrust generated between the stator 40 and the stator 40 when a voltage is applied to the coil to drive the slider 32 in the Y direction. At that time, the stator 40 receives a reaction force due to the thrust that drives the mover 42.

  Further, a linear motor support portion 46 that supports the stator 40 of the linear motor 20 stands on the outside of the guide portions 14b and 14c. The linear motor support portion 46 has a structure in which steel frames are coupled in a lattice shape, and includes a pair of leg portions 46a supported by the second underfloor structure 120 and a beam 46b horizontally placed between the leg portions 46a. Have. Accordingly, the reaction force generated when the Y stage 18 is moved in the Y direction by the driving force of the linear motor 20 is transmitted to the second underfloor structure 120 via the linear motor support portion 46.

  Thereby, the reaction force received by the linear motor 20 is propagated from the linear motor support 46 to the second underfloor structure 120, the underfloor recess 140, and the first underfloor structure 110. Since the vibration is damped, vibration due to the reaction force is not transmitted to the gantry 12 fixed to the floor surface 130. Therefore, the reaction force of the linear motor 20 transmitted to the stone surface plate 14 and the work table 16 through the second underfloor structure 120, the underfloor recess 140, and the first underfloor structure 110 is extremely small. .

  As shown in FIG. 5, the linear motor 20 has a configuration in which a mover 42 that protrudes in the horizontal direction from the side surface of the slider 32 is inserted into a U-shaped stator 40. As a countermeasure against vibrations, the clearance S between the upper and lower inner surfaces of the stator 40 and the upper and lower surfaces of the mover 42 is significantly larger than usual, for example, S = 7 mm (usually about 1 mm). . As a result, in the linear motor 20, the clearance S is increased even if vibration in the X direction occurs due to the reaction force, so that the upper and lower inner surfaces of the stator 40 are prevented from contacting the upper and lower surfaces of the mover 42. The

  In the above embodiment, a gantry type stage apparatus has been described as an example. However, the present invention is not limited to this, and the present invention is provided with a stage apparatus other than the above embodiment (for example, a stage apparatus having an X stage and a Y stage). Needless to say, the present invention can also be applied to a stage reaction force processing apparatus.

It is a perspective view which shows one Example of the reaction force processing apparatus for stages which becomes this invention. It is a front view of the reaction force processing apparatus for stages shown in FIG. It is a side view of the reaction force processing apparatus for stages shown in FIG. It is a top view of the reaction force processing apparatus for stages shown in FIG. It is a front view which expands and shows the support structure of a linear motor.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Stage apparatus 12 Base 14 Stone surface plate 16 Work mounting base 18 Y stage 20 Linear motor 32 Slider 40 Stator 42 Movable element 46 Linear motor support part 100 Reaction force processing apparatus 110 for stage 1st underfloor structure 120 2nd Underfloor structure 130 Floor surface 140 Underfloor recess 150 Non-contact space 170 Grating member 180 Third underfloor structure

Claims (4)

A fixed base fixed to a stage installation part on the floor, driving means arranged in parallel to the side of the fixed base, a support part for supporting the driving means, and supported by the fixed base in a movable manner; In a stage reaction force processing apparatus in which a stage apparatus provided with a stage that moves by the driving force of the driving means is installed,
A reaction force processing apparatus for a stage, wherein a first underfloor structure that supports the fixed base and a second underfloor structure that supports the support portion are provided separately. Providing an underfloor recess for storing the first underfloor structure and the second underfloor structure below the floor surface;
The reaction force processing apparatus for a stage according to claim 1, wherein the first underfloor structure and the second underfloor structure are separated by a predetermined distance in the underfloor recess.   The non-contact space formed so that the space between the first under-floor structure and the second under-floor structure may be non-contact is provided inside the under-floor recess. Stage reaction force processing equipment.   The reaction force processing apparatus for a stage according to any one of claims 1 to 3, wherein a grating member having a ventilation hole is laid on the floor surface.

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