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JP3737597B2 - Flip chip mounting circuit board - Google Patents

Flip chip mounting circuit board Download PDF

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Publication number
JP3737597B2
JP3737597B2 JP02506297A JP2506297A JP3737597B2 JP 3737597 B2 JP3737597 B2 JP 3737597B2 JP 02506297 A JP02506297 A JP 02506297A JP 2506297 A JP2506297 A JP 2506297A JP 3737597 B2 JP3737597 B2 JP 3737597B2
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JP
Japan
Prior art keywords
opening
covers
metal plane
wiring board
flip
Prior art date
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Expired - Fee Related
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JP02506297A
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Japanese (ja)
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JPH10224038A (en
Inventor
俊寿 野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Niterra Co Ltd
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NGK Spark Plug Co Ltd
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Priority to JP02506297A priority Critical patent/JP3737597B2/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15172Fan-out arrangement of the internal vias
    • H01L2924/15174Fan-out arrangement of the internal vias in different layers of the multilayer substrate

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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Wire Bonding (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、主表面上にフリップチップを半田付け等により接続するフリップチップ実装用配線基板に関し、特にセラミック積層パッケージ等の配線基板の構造に関する。
【0002】
【従来の技術とその問題点】
表面上に集積回路(IC)やその他の電子部品のフリップチップを実装する配線基板は、平坦性のある表面を求められる。また、その本体の内部には、少なくとも1層以上の電源用や接地用の広い面積にわたり形成されたメタルプレーン層と、所望の回路を形成する任意層数の導体配線層とを内蔵することがある。
例えば、図6(A)に示すように、上記フリップチップと接続するために、セラミック製の基板100の表面100A上に設けられた複数の接続用端子102は、内部の導体配線層108とこれに垂直な円柱形状の導体であるビア配線110を介して接続され、互いに導通している。上記ビア配線110は、途中のメタルプレーン層104に設けた開口部106内を貫通すると共に、各ビア配線110の途中に介在するビアカバーメタライズ(以下、ビアカバーと称する)112が上記開口部106内に位置する。このビアカバー112は、上下のビア110a,110bの位置ズレを吸収して両者を接続するものである。また、ビア110bと同110c、ビア110cと同110dの間にもそれぞれビアカバー112′が介在されている。
尚、基板100の裏面には複数の外部端子114が設けられている。
【0003】
ここで、上記ビアカバー112同士や、ビアカバー112と開口部106の縁106aとの間には短絡を防ぐため、図6(B)に示すように、従来から約100μm程度の間隔Sが設けられている。
ところで、セラミック製の基板100は、例えばアルミナを主成分とする複数のグリーンシート上にWやMo等の高融点金属のペーストを用いてスクリーン印刷等により所要の回路やメタルプレーン層、或いはパッド(端子)を形成した後、これらのグリーンシートを積層し、圧着して焼成することにより製造される。
上記メタルプレーン層104内の開口部106もスクリーン印刷時に形成される。また、ビア配線110は各グリーンシートに細孔を明け、その中に高融点金属ペーストを強制的に吸引し充填して形成され、且つ細孔の一端にはビアカバー112がスクリーン印刷により形成される。
【0004】
ところが、基板100内の開口部106の上方にフリップチップの接続用端子102を設けたフリップチップエリアが位置すると、開口部106の縁106aと複数のビアカバー112との間の間隔Sを形成する開口部106の周囲が、上記圧着及び焼成工程において垂直方向に押し潰され、図6(C)に示すように、基板100の表面100Aに凹みHが発生することがある。そして、この凹みHに起因して基板100の表面100Aの平坦性が損なわれ、実装すべきフリップチップと表面100A上の各接続端子102とが接続できなくなるという不具合を生じることがあった。
上記凹みHは、開口部106内を貫通するビア配線110(同カバー112)が増える程、また、基板100の表面100Aと導体配線層108の間に形成される前記メタルプレーン層104の層数が増加する程、或いは、前記開口部106の厚みが厚くなる程、顕著に発生する傾向がある。
【0005】
この凹みHを減らすため、これまでは、▲1▼メタルプレーン層の厚さを薄くして、前記開口部自体の厚みを薄くする方法や、▲2▼前記グリーンシートを積層し焼結した後で、基板の表面のフリップチップエリアを研磨加工して平坦にする方法が用いられていた。また、▲3▼前記開口部内に絶縁性ペーストを充填することも検討されている。
しかし、上記▲1▼の方法では、メタルプレーン層を薄くしても、メタルプレーン層の層数が増加するに連れて全ての開口部の厚みも増大するため、凹みの防止には不十分となる。また、上記▲2▼及び▲3▼の方法は、研磨加工や絶縁性ペーストを充填する工程が増えるため、生産性の観点から好ましくなかった。
【0006】
【発明が解決すべき課題】
本発明は、以上の従来の技術が抱える問題点を解決し、メタルプレーン層の層数に拘わらず、平坦な主表面を有しフリップチップを確実に実装できると共に、工程を増やすことなく製造可能なフリップチップ実装用配線基板を提供することを目的とする。
【0007】
【課題を解決するための手段】
本発明は、上記課題を解決するため、メタルプレーン層の開口部内において、この開口部を貫通する複数のビア配線のビアカバー同士や各ビアカバーと開口部の縁との間隔(面積)を減らすことで前記凹みの発生を抑制できることに着目して成されたものである。
即ち、本発明のフリップチップ実装用配線基板は、主表面にフリップチップを実装するための接続用端子を有し、且つ、内部に少なくとも1層以上形成され上記フリップチップを実装する領域の直下に開口部を有するメタルプレーン層と、このメタルプレーン層よりも上記主表面から離れた側に形成された導体配線層とを有すると共に、上記メタルプレーン層の開口部内に設けた複数のビアカバーを介して上記接続用端子と上記導体配線層との間をそれぞれ接続する複数のビア配線を有する配線基板であって、平面視したときの上記複数のビアカバーの総面積が、上記開口部の面積の30%以上であることを特徴とする。
【0008】
尚、上記接続用端子としては、接続用パッドを用いることが多いが、主表面に露出するビア配線の端部を接続用端子として用いても良い。
また、本発明のフリップチップ実装用配線基板は、前記複数のビア配線が平面視して略格子状に配置されている領域において、前記複数のビアカバーがそれぞれ略矩形状に形成されていることも特徴とする。
更に、前記複数のビアカバー全体がなす平面形状の輪郭が、前記開口部の縁の形状と略相似形となるように、各々のビアカバーの形状を形成したことも特徴とする。
これらの構成とすることにより、上記複数のビアカバーの総断面積を容易に前記開口部の面積の30%以上とするこが可能になる。
【0009】
更に、前記複数のビアカバー相互及び各ビアカバーと前記メタルプレーン層の開口部の縁との間隔を90μm未満としたフリップチップ実装用配線基板も含まれる。
尚、上記の間隔とはカバー同士等の間における最短距離を指すものである。
また、上記の間隔は約70m程度が望ましい。
以上の構成によれば、ビアカバー同士の間隔及び開口部の縁と各ビアカバーとの間隔は、それらの間の絶縁を保ったまま可及的に小さくでき、セラミック基板製造時の圧着や焼成によっても基板の主表面に凹みを生じにくくなる。
【0010】
また、平面視における開口部の面積に対するビアカバーの総面積の上限は、両者間の絶縁を保つため約50%である。因みに、従来の技術における本面積比は、10〜20%であった。
更に、前記開口部内の前記複数のビアカバー又は各ビアカバーと開口部の縁とに囲まれた位置に、前記メタルプレーン層と略同じ厚さの導電性スペーサが周囲の各ビアカバー又は開口部の縁と90μm未満の間隔を置いて配設されたフリップチップ実装用配線基板も含まれる。
この構成によれば、前記の面積比、及び/又は間隔を一層容易に実現できる。
【0011】
【発明の実施の形態】
以下に本発明の実施に好適な形態を図面と共に説明する。
図1(A)は、フリップチップ実装用配線基板1の部分縦断面図を示し、その主表面1A上には、IC等のフリップチップ(図示せず)を実装するための接続用パッド(端子)2が複数個設けられている。また、基板1の内部には、例えば電源用のメタルプレーン層4と、その下方において所望の回路を形成する複数の導体配線層8が内蔵されている。そして、上記複数ある接続用パッド2の一部は、ビア(ビア配線)11を介してメタルプレーン層4と導通される。また、他の接続用パッド2は、ビア10a、ビアカバー12及びビア10b、或いは、ビア10a,10b,10c及びビアカバー12,12′からなるビア配線10を介して下方の導体配線層8に導通される。
【0012】
この場合、メタルプレーン層4とビアカバー12との短絡を防ぐため、このプレーン層4内には、図1(B)に示すような開口部6が形成されている。上記ビアカバー12は、上下のビア10aと10bを接続するために介在されるもので、且つビア10a・10b間のビアカバー12は略上記開口部6内に位置する。
そして、開口部6は平面視で略1.07mm角の矩形状を呈し、且つ、開口部6の縁6aと周囲のビアカバー12との間隔S、及び各ビアカバー12同士の間隔Sは、略70μm程度である。因みに、ビアカバー12の一辺が略180μmの正方形を呈し、平面視における開口部6の面積に対する全ビアカバー12の総面積の比は、約45%である。
尚、図1(A)において、各導体配線層8はビア10d、又はビア10c,10d及びビアカバー12′を介して基板1の裏面に設けた外部端子用パッド18に導通されている。
【0013】
係る基板1は、次のように製造される。例えばアルミナを主成分とするグリーンシートを複数枚用意し、各シート上にWやMoの高融点金属のペーストをスクリーン印刷によって塗布し、前記メタルプレーン層や所要の各種の回路を構成する導体配線層を形成する。この印刷時に、メタルプレーン層4内には上記開口部6が形成される。また、各グリーンシートには予め細孔が所定の位置に穿設され、その内部に前記金属ペーストと同様のインクメタライズが負圧等を利用して強制的に吸引・充填されてビア10a等を形成し、且つその何れか一端の露出部には上記スクリーン印刷時にビアカバー12が形成される。
これらの各グリーンシートを所定の順序で積層し、圧着した後、焼成することで、セラミックの配線基板1を得ることができる。
【0014】
ここで、本発明と従来の技術を各々の具体例を挙げて比較する。メタルプレーン層内に同じ形状・寸法の開口部を設け、この開口部を貫通するビア配線の全ビアカバーの断面積と開口部の面積との面積比と、これら上方の基板の主表面における最大凹みをビアの配列形態別に測定した。それらの結果を表1に示す。
尚、表1に示す値は次の条件に従ったものである。
▲1▼開口部は、本発明例と従来の技術のものを共に正方形状とした。
▲2▼従来の技術のものでは、ビアカバーを直径100μmの円形とし、ビアカバー相互間の間隔を150μm、ビアカバーと開口部の縁との間隔を90μmとした。従って、開口部の一辺の寸法は、2×2列で530μm、3×3列で780μm、4×4列で1030μm、5×5列で1280μmとなる。
▲3▼本発明例においては、ビアカバー相互間の間隔を70μm、ビアカバーと開口部の縁との間隔を70μmとし、ビアカバーの形状を直径180μmの円形、又は一辺が180μmの正方形として幅を持たせた。従って、開口部の一辺の寸法は、2×2列で570μm、3×3列で820μm、4×4列で1070μm、5×5列で1320μmとなる。
【0015】
【表1】
【0016】
表1において、従来の技術における前記面積比は、11〜12%であるのに対し、本発明によるものは31〜46.5%であった。また、それらの基板の表面における最大凹みは、従来の技術では10〜35μmであるのに対し、本発明によるものは8〜20μmで、且つ同じ配列では何れも従来のものより低かった。更に、これらの基板表面の接続用パッドに、フリップチップを接続したが、従来技術のものは、凹み部分のパッドがチップ側の半田バンプと離間したのに対し、本発明によるものはチップ側の半田バンプと全て十分な接続ができた。これらの結果から、本発明の効果が容易に理解されると共に、前記の面積比を規定した意義も理解されよう。
【0017】
図2は、本発明における他の形態に関し、同図(A)は、メタルプレーン層20に正方形の開口部22を設け、その内部に格子状に配列されたビア26に対応して円形のビアカバー24を縦横3個ずつ配置し、且つ開口部22と各カバー24との間隔Sとカバー24同士間の間隔Sを何れも70μmとしたものである。各カバー24の上下にはビア26がそれぞれ接続されている。
因みに、開口部22を0.82mm角とし、各カバー24の直径を180μm、上記間隔Sを70μmとすると、平面視における開口部22の面積に対する全ビアカバー24の総断面積の比は、34%である。
尚、ビア26が格子状に配列されている場合には、前記図1(B)で示したように、各ビアカバー24を正方形又は矩形状にすると各間隔Sを保ったまま、各カバー24同士も格子状に密に配置でき、上記の各隙間Sも可及的に小さくできるので、上記面積比を50%付近まで容易に高められる。
【0018】
図2(B)は、メタルプレーン層30に四辺が複数の湾曲縁33からなる開口部32を設け、その内部で且つ各湾曲縁33と同心状となる位置に丸形のビアカバー34を縦横3個ずつ配置したものである。尚、開口部32の湾曲縁33と各カバー34との間隔S及びカバー34同士間の間隔Sを何れも90μm未満とし、各カバー34の上下にはビア36がそれぞれ接続されている。
係る形態によると、複数のビアカバー34全体がなす平面形状の輪郭が開口部32と略相似形となるので、開口部32に対する全ビアカバー34の総断面積の比を30%以上に確実に高められ、且つ上記の各間隔Sを90μm未満に小さくすることも容易にできるので、本発明を実施する上で好ましい形態である。
【0019】
図3は、本発明の更に異なる形態に関し、同図(A)は、メタルプレーン層40に四辺が複数の湾曲縁43からなる開口部42を設け、その内部で且つ各湾曲縁43と同心状となる位置に丸形のビアカバー44を縦横3個ずつ配置すると共に、互いに隣接し合う四個のカバー44に囲まれた位置に菱形状の導電性スペーサ48を配設したものである。この導電性スペーサ48は、メタルプレーン層40と同じ材質と厚さを有し、且つ各カバー44に対向する辺には当該カバー44と同心状となるカーブが付され、且つ90μm未満の間隔Sを置いて形成されている。即ち、スペーサ48はメタルプレーン層40と同時にスクリーン印刷できるので、製造工程を増やすことなく形成できる。尚、図中の符号46はカバー44の上下に接続されたビアである。
従って、開口部42の湾曲縁43とカバー44との間隔Sと共に、カバー44と導電性スペーサ48との間隔Sも可及的に小さくでき、且つ開口部42内の複数のカバー44に囲まれた位置においても、メタルプレーン層40の厚さによる段差を解消できるので、基板の主表面に凹みが生じるのを更に確実に抑制することができる。このため、1つの開口部に多数のビア(ビアカバー)が貫通する構造を有するフリップチップ実装用の基板に効果的である。
尚、上記スペーサ48を各カバー44と開口部42の各湾曲縁43とに囲まれた位置に、上記間隔Sを保って配設することもできる。
【0020】
図3(B)は、メタルプレーン層50に周辺が複数の湾曲縁53からなる六角状の開口部52を設け、その内部で且つ各湾曲縁53と同心状となる位置に丸形のビアカバー54を千鳥状にして7個配置したものである。この場合、各ビアカバー54は、千鳥状に配置されているので、それらの間の間隔は前記の各格子状に配置したものに比べ、比較的小さくできる。そのため、開口部52に対する全ビアカバー54の総断面積を30%以上にすることが容易となり、本発明の実施に効果的な形態の一つである。尚、図中の符号56は、ビアカバー54の上下に接続されたビアである。
【0021】
図4は、本発明の別の形態に関し、メタルプレーン層60にコーナーを丸くした正方形状の開口部62を形成し、この開口部62内の各縁に沿って12本のビア65と、中央に4本のビア67を集中して貫通させるため、周囲に配置される上下のビア65同士間には平面視で細長の異形状としたビアカバー64を介在させると共に、中央に配置される上下のビア67同士間には平面視で略八角形のビアカバー66を介在させたものである。
上記の各ビアカバー64は、開口部62内の間隔Sを狭めると共に、それら全体がなす平面形状の輪郭が開口部62と略相似形となるので、開口部62に対する全ビアカバー64,66の総断面積の比を、容易に30%以上とすることができる。また、係る異形状のビアカバー64を活用することで、開口部62内のランダムな位置を上下に貫通する複数のビア配線がある場合に、それらのビアカバーの総断面積を確実に増やすことができる。
【0022】
図5は、本発明のその他の形態に関し、同図(A)はメタルプレーン層70に長円形状の開口部72を形成し、この開口部72内に一対のビアカバー73を配置し、それらの上下にビア74を接続したものである。係るビア74が2本のみの場合にも、これらの真上の主表面上にフリップチップエリアが存在する場合には、前記凹みの発生を防止することができる。
図5(B)は、メタルプレーン層75に達磨形の開口部76を形成し、この開口部76内に大・小径二つのビアカバー77a,77bを略同じ間隔Sを置いて配置し、それらの上下に大・小径のビア78a,78bをそれぞれ接続したものである。
このように、複数のビア78a,78bの直径が異なる場合、それらの間に介在されるビアカバー77a,77b全体がなす平面視の輪郭形状と略相似形となる開口部76を採用することで、本発明を容易に実施することができる。
【0023】
また、図5(C)は、メタルプレーン層80に平面視で略L形状の開口部82を形成し、その内部に大中小径の三種類のビアカバー84,86,88を配置し、それらの上下に大中小径のビア85,87,89をそれぞれ接続したものである。このように、ビアの寸法が複数種あり、且つそれらの配置がランダム状になっても、ビアカバー84,86,88全体がなす平面視の輪郭形状を開口部82の形状と略相似形としたので、開口部82に対する全ビアカバー84,86,88の総断面積を30%以上にしたり、或いは、開口部82と各ビアカバー84,86,88との間隔やビアカバー84,86,88同士間の間隔を容易に90mμ未満に設定することができる。
更に、図5(D)は、メタルプレーン層90に平面視で略菱形状の開口部92を形成し、この開口部92内に所定の間隔を介して図示中央の上下に変形五角形のビアカバー94を対称に配置し、且つ左右に三角形のビアカバー96を対称に配置すると共に、中央のビアカバー94の上下には太径のビア95を、左右のビアカバー96の上下には細径のビア97をそれぞれ接続したものである。
上記の各ビアカバー94,96全体がなす平面視の輪郭形状も、開口部92と略相似形となるので、本発明の実施に適した形態の一つである。
【0024】
本発明は、以上において説明した各形態に限定されるものではない。
例えば、配線基板内においてメタルプレーン層の上下に導体配線層が設けられ、複数のビア配線がこのメタルプレーン層に設けた開口部内を貫通する構造の基板や、複数のメタルプレーン層と複数の導体配線層が交互に設けられ、複数のビア配線が各メタルプレーン層に設けた開口部内を貫通する構造の基板にも適用できる。
また、前記メタルプレーン層の開口部内に配置した導電性スペーサを、複数のビアカバー同士の間を区画する線状、又は網の目状に配置することもできる。
更に、ビア自体の断面形状もその間に介在させる異形状のビアカバーと相似形として、その導電性をも高めることもできる。
尚、フリップチップに接続するための端子としては、前記のメタライズ印刷で形成した接続用パッドを用いる他に、最上部のビアの主表面に露出する端部をそのまま接続用端子として用いることもできる。
【0025】
【発明の効果】
以上において説明した本発明の配線基板によれば、メタルプレーン層の開口部内を複数のビア配線がビアカバーを介して貫通しても、それら上方の基板の主表面には凹みが生じないか生じにくくなるので、主表面上の接続用パッド等にフリップチップを正確且つ確実に実装することができる。しかも、この基板を製造するに当たり、工程を増やすことなく容易に得ることもできる。
また、請求項2乃至5に記載の発明によれば、上記凹みの発生を一層確実に防止することができる。
【図面の簡単な説明】
【図1】 (A)は本発明の配線基板の一形態を示す部分縦断面図、(B)は(A)中のB−B端面図である。
【図2】 (A),(B)は共に本発明の他の形態を示す図1(B)と同様の端面図である。
【図3】 (A),(B)は共に本発明の異なる形態を示す図1(B)と同様の端面図である。
【図4】本発明の別の形態を示す図1(B)と同様の端面図である。
【図5】 (A)〜(D)共に本発明のその他の形態を示す図1(B)と同様の端面図である。
【図6】 (A)は従来の配線基板を示す部分縦断面図、(B)は(A)中のB−B端面図で、(C)は(A)中の部分拡大断面図である。
【符号の説明】
1………………………………………………………………配線基板
2,18………………………………………………………接続用パッド(端子)
4,20,30,40,50,60,70,75,80,90……………………………メタルプレーン層
6,22,32,42,52,62,72,76,82,92……………………………開口部
6a,33,43,53…………………………………………………縁/湾曲縁
8………………………………………………………………導体配線層
10,26,36,46,56,65,67,74,78,85,87,89,95,97…………ビア配線/ビア
12,12′,24,34,44,54,64,66,73,77,84,86,88,94,96……ビアカバー
48……………………………………………………………導電性スペーサ
S………………………………………………………………間隔
【表1】

Figure 0003737597
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a flip chip mounting wiring board in which a flip chip is connected to a main surface by soldering or the like, and more particularly to a structure of a wiring board such as a ceramic laminated package.
[0002]
[Prior art and its problems]
A wiring board on which a flip chip of an integrated circuit (IC) or other electronic components is mounted on the surface is required to have a flat surface. In addition, the main body may include at least one or more metal plane layers formed over a wide area for power supply or grounding and any number of conductor wiring layers forming a desired circuit. is there.
For example, as shown in FIG. 6A, in order to connect to the flip chip, a plurality of connection terminals 102 provided on the surface 100A of the ceramic substrate 100 are connected to the internal conductor wiring layer 108 and this. Are connected via via wirings 110 which are cylindrical conductors perpendicular to each other. The via wiring 110 passes through the opening 106 provided in the middle metal plane layer 104, and a via cover metallization (hereinafter referred to as a via cover) 112 interposed in the middle of each via wiring 110 is provided in the opening 106. Located in. The via cover 112 absorbs the positional deviation between the upper and lower vias 110a and 110b and connects them. Further, via covers 112 'are also interposed between the vias 110b and 110c and between the vias 110c and 110d, respectively.
A plurality of external terminals 114 are provided on the back surface of the substrate 100.
[0003]
Here, in order to prevent a short circuit between the via covers 112 or between the via covers 112 and the edge 106a of the opening 106, an interval S of about 100 μm is conventionally provided as shown in FIG. Yes.
By the way, the ceramic substrate 100 is formed by using a paste of a high melting point metal such as W or Mo on a plurality of green sheets whose main component is alumina, for example, by screen printing or the like, a required circuit, a metal plane layer, or a pad ( After the terminal is formed, these green sheets are laminated, pressed and fired.
The opening 106 in the metal plane layer 104 is also formed during screen printing. The via wiring 110 is formed by opening pores in each green sheet and forcibly sucking and filling a high melting point metal paste therein, and a via cover 112 is formed at one end of the pores by screen printing. .
[0004]
However, when the flip chip area in which the flip chip connection terminal 102 is provided is located above the opening 106 in the substrate 100, the opening that forms the gap S between the edge 106 a of the opening 106 and the plurality of via covers 112. The periphery of the portion 106 may be crushed in the vertical direction in the pressure bonding and firing process, and a dent H may be generated on the surface 100A of the substrate 100 as shown in FIG. Further, due to the dent H, the flatness of the surface 100A of the substrate 100 is impaired, and there is a problem that the flip chip to be mounted and each connection terminal 102 on the surface 100A cannot be connected.
The number of the metal plane layers 104 formed between the surface 100A of the substrate 100 and the conductor wiring layer 108 increases as the number of via wirings 110 (same cover 112) penetrating through the openings 106 increases. As the thickness increases, or the thickness of the opening 106 increases, it tends to occur more remarkably.
[0005]
In order to reduce this dent H, up to now, (1) a method of reducing the thickness of the metal plane layer and reducing the thickness of the opening itself, or (2) after laminating and sintering the green sheet Thus, a method of polishing and flattening the flip chip area on the surface of the substrate has been used. (3) It has also been studied to fill the opening with an insulating paste.
However, in the above method (1), even if the metal plane layer is thinned, the thickness of all the openings increases as the number of metal plane layers increases. Become. Further, the methods (2) and (3) are not preferable from the viewpoint of productivity because the number of steps of polishing and filling with an insulating paste increases.
[0006]
[Problems to be Solved by the Invention]
The present invention solves the problems of the conventional techniques described above, and can be mounted without increasing the number of processes while having a flat main surface and mounting a flip chip reliably regardless of the number of metal plane layers. An object of the present invention is to provide a wiring board for flip chip mounting.
[0007]
[Means for Solving the Problems]
In order to solve the above problems, the present invention reduces the distance (area) between via covers of a plurality of via wirings penetrating through the opening or between each via cover and the edge of the opening in the opening of the metal plane layer. This is made by paying attention to the fact that the generation of the dent can be suppressed.
That is, the flip-chip mounting wiring board of the present invention has a connection terminal for mounting the flip chip on the main surface, and at least one layer is formed in the inside, immediately below the region where the flip chip is mounted. A metal plane layer having an opening and a conductor wiring layer formed on a side farther from the main surface than the metal plane layer, and via a plurality of via covers provided in the opening of the metal plane layer A wiring board having a plurality of via wirings respectively connecting between the connection terminals and the conductor wiring layer, wherein the total area of the plurality of via covers when viewed in plan is 30% of the area of the opening It is the above.
[0008]
As the connection terminal, a connection pad is often used, but an end portion of the via wiring exposed on the main surface may be used as the connection terminal.
In the flip-chip mounting wiring board according to the present invention, the plurality of via covers may be formed in a substantially rectangular shape in a region where the plurality of via wirings are arranged in a substantially lattice shape in plan view. Features.
Furthermore, the shape of each via cover is formed so that the outline of the planar shape formed by the plurality of via covers is substantially similar to the shape of the edge of the opening.
With these configurations, the total cross-sectional area of the plurality of via covers can be easily set to 30% or more of the area of the opening.
[0009]
Further, a flip chip mounting wiring board in which the plurality of via covers and the distance between each via cover and the edge of the opening of the metal plane layer are less than 90 μm is also included.
In addition, said space | interval points out the shortest distance between covers.
In addition, the distance is preferably about 70 m.
According to the above configuration, the interval between the via covers and the interval between the edge of the opening and each via cover can be made as small as possible while maintaining the insulation between them, and also by pressing and firing during the production of the ceramic substrate. It becomes difficult to produce a dent on the main surface of the substrate.
[0010]
Further, the upper limit of the total area of the via cover with respect to the area of the opening in plan view is about 50% in order to maintain insulation between the two. Incidentally, this area ratio in the prior art was 10 to 20%.
Further, a conductive spacer having a thickness substantially the same as that of the metal plane layer is formed between the plurality of via covers in the openings or the edges of the via covers and the edges of the openings. Also included is a flip-chip mounting wiring board disposed with an interval of less than 90 μm.
According to this configuration, the area ratio and / or the interval can be more easily realized.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
In the following, preferred embodiments of the present invention will be described with reference to the drawings.
FIG. 1A shows a partial vertical cross-sectional view of a flip-chip mounting wiring board 1, and a connection pad (terminal) for mounting a flip chip (not shown) such as an IC on its main surface 1A. ) 2 is provided in plural. Further, for example, a metal plane layer 4 for power supply and a plurality of conductor wiring layers 8 forming a desired circuit thereunder are built in the substrate 1. A part of the plurality of connection pads 2 is electrically connected to the metal plane layer 4 via vias (via wirings) 11. The other connection pads 2 are electrically connected to the lower conductor wiring layer 8 via the via 10a, the via cover 12 and the via 10b, or the via wiring 10 including the vias 10a, 10b and 10c and the via covers 12 and 12 '. The
[0012]
In this case, in order to prevent a short circuit between the metal plane layer 4 and the via cover 12, an opening 6 as shown in FIG. 1B is formed in the plane layer 4. The via cover 12 is interposed to connect the upper and lower vias 10 a and 10 b, and the via cover 12 between the vias 10 a and 10 b is located substantially in the opening 6.
The opening 6 has a rectangular shape of approximately 1.07 mm square in plan view, and the interval S between the edge 6a of the opening 6 and the surrounding via cover 12 and the interval S between the via covers 12 are approximately 70 μm. It is. Incidentally, one side of the via cover 12 has a square of about 180 μm, and the ratio of the total area of all the via covers 12 to the area of the opening 6 in plan view is about 45%.
In FIG. 1A, each conductor wiring layer 8 is electrically connected to an external terminal pad 18 provided on the back surface of the substrate 1 through a via 10d or vias 10c and 10d and a via cover 12 '.
[0013]
Such a substrate 1 is manufactured as follows. For example, a plurality of green sheets mainly composed of alumina are prepared, and a refractory metal paste of W or Mo is applied on each sheet by screen printing, and the metal plane layer and the conductor wiring constituting the required various circuits. Form a layer. At the time of printing, the opening 6 is formed in the metal plane layer 4. In addition, each green sheet is previously provided with pores at predetermined positions, and ink metallization similar to that of the metal paste is forcibly sucked and filled using negative pressure or the like to form vias 10a and the like. A via cover 12 is formed on the exposed portion at one end of the screen during the screen printing.
These green sheets are laminated in a predetermined order, pressed, and then fired, whereby the ceramic wiring board 1 can be obtained.
[0014]
Here, the present invention and the prior art will be compared with specific examples. An opening of the same shape and size is provided in the metal plane layer, and the area ratio between the cross-sectional area of the entire via cover and the area of the opening of the via wiring passing through the opening, and the maximum depression on the main surface of the substrate above these Were measured according to the arrangement form of vias. The results are shown in Table 1.
The values shown in Table 1 are according to the following conditions.
{Circle around (1)} The openings are square in both the example of the present invention and the prior art.
(2) In the prior art, the via covers were circular with a diameter of 100 μm, the distance between the via covers was 150 μm, and the distance between the via cover and the edge of the opening was 90 μm. Therefore, the dimension of one side of the opening is 530 μm in 2 × 2 rows, 780 μm in 3 × 3 rows, 1030 μm in 4 × 4 rows, and 1280 μm in 5 × 5 rows.
(3) In the example of the present invention, the interval between the via covers is 70 μm, the interval between the via cover and the edge of the opening is 70 μm, and the via cover has a width of 180 μm in diameter or a square having a side of 180 μm. It was. Therefore, the dimension of one side of the opening is 570 μm in 2 × 2 rows, 820 μm in 3 × 3 rows, 1070 μm in 4 × 4 rows, and 1320 μm in 5 × 5 rows.
[0015]
[Table 1]
[0016]
In Table 1, the area ratio in the prior art is 11 to 12%, while that according to the present invention is 31 to 46.5%. Further, the maximum dent on the surface of the substrate was 10 to 35 μm in the conventional technique, whereas that according to the present invention was 8 to 20 μm, and in the same arrangement, all were lower than the conventional one. Further, flip chips are connected to the connection pads on the surface of the substrate. In the prior art, the recessed portion pads are separated from the solder bumps on the chip side, whereas those according to the present invention are on the chip side. All of the solder bumps were fully connected. From these results, the effect of the present invention can be easily understood, and the significance of defining the area ratio will be understood.
[0017]
FIG. 2 relates to another embodiment of the present invention, and FIG. 2A shows a circular via cover corresponding to the vias 26 in which square openings 22 are provided in the metal plane layer 20 and arranged in a lattice pattern therein. 24 are arranged in three vertical and horizontal directions, and the interval S between the opening 22 and each cover 24 and the interval S between the covers 24 are both set to 70 μm. Vias 26 are respectively connected to the top and bottom of each cover 24.
Incidentally, if the opening 22 is 0.82 mm square, the diameter of each cover 24 is 180 μm, and the interval S is 70 μm, the ratio of the total cross-sectional area of all via covers 24 to the area of the opening 22 in plan view is 34%. is there.
In the case where the vias 26 are arranged in a lattice shape, as shown in FIG. 1B, when the via covers 24 are square or rectangular, the covers 24 are kept in contact with each other while maintaining the intervals S. Can be densely arranged in a lattice pattern, and the gaps S can be made as small as possible. Therefore, the area ratio can be easily increased to around 50%.
[0018]
In FIG. 2B, the metal plane layer 30 is provided with openings 32 each having a plurality of curved edges 33 on the four sides, and round via covers 34 are arranged vertically and horizontally at positions that are concentric with the curved edges 33. They are arranged one by one. Note that the distance S between the curved edge 33 of the opening 32 and each cover 34 and the distance S between the covers 34 are both less than 90 μm, and vias 36 are connected to the top and bottom of each cover 34, respectively.
According to such a configuration, since the outline of the planar shape formed by the plurality of via covers 34 is substantially similar to the opening 32, the ratio of the total cross-sectional area of all the via covers 34 to the openings 32 can be reliably increased to 30% or more. And since each said space | interval S can also be easily reduced to less than 90 micrometers, it is a preferable form when implementing this invention.
[0019]
FIG. 3 relates to still another embodiment of the present invention, and FIG. 3A shows that the metal plane layer 40 is provided with an opening 42 having a plurality of curved edges 43 on its four sides and is concentric with each curved edge 43. In this position, three round via covers 44 are arranged vertically and horizontally, and a diamond-shaped conductive spacer 48 is arranged at a position surrounded by four covers 44 adjacent to each other. The conductive spacer 48 has the same material and thickness as the metal plane layer 40, and a side confronting each cover 44 is provided with a curve concentric with the cover 44, and an interval S less than 90 μm. Is formed. That is, since the spacer 48 can be screen-printed simultaneously with the metal plane layer 40, it can be formed without increasing the manufacturing process. Note that reference numeral 46 in the drawing denotes vias connected to the upper and lower sides of the cover 44.
Therefore, the interval S between the curved edge 43 of the opening 42 and the cover 44 and the interval S between the cover 44 and the conductive spacer 48 can be made as small as possible and are surrounded by the plurality of covers 44 in the opening 42. Even at this position, the step due to the thickness of the metal plane layer 40 can be eliminated, so that the formation of a dent on the main surface of the substrate can be further reliably suppressed. This is effective for a flip chip mounting substrate having a structure in which a large number of vias (via covers) penetrate through one opening.
The spacer 48 may be disposed at a position surrounded by the covers 44 and the curved edges 43 of the openings 42 with the spacing S therebetween.
[0020]
In FIG. 3B, a hexagonal opening 52 having a plurality of curved edges 53 in the periphery is provided in the metal plane layer 50, and a round via cover 54 is located inside and concentrically with each curved edge 53. 7 are arranged in a zigzag pattern. In this case, since the via covers 54 are arranged in a staggered manner, the distance between them can be made relatively small as compared with those arranged in the lattice form. For this reason, it is easy to make the total cross-sectional area of all the via covers 54 with respect to the openings 52 30% or more, which is an effective form for implementing the present invention. Note that reference numeral 56 in the drawing denotes vias connected to the upper and lower sides of the via cover 54.
[0021]
FIG. 4 relates to another embodiment of the present invention, in which a square-shaped opening 62 having rounded corners is formed in the metal plane layer 60, twelve vias 65 are formed along each edge in the opening 62, and the center. In order to concentrate and penetrate the four vias 67, an upper and lower via 65 disposed in the periphery is interposed between the upper and lower vias 65 disposed in the periphery, and an upper and lower via cover 64 disposed in the center is interposed. A substantially octagonal via cover 66 is interposed between the vias 67 in plan view.
Each of the via covers 64 narrows the interval S in the opening 62 and the outline of the planar shape formed by the entirety of the via covers 64 is substantially similar to the opening 62, so that the entire via covers 64 and 66 are completely cut off from the opening 62. The area ratio can be easily set to 30% or more. In addition, by utilizing such an irregularly shaped via cover 64, when there are a plurality of via wirings penetrating up and down a random position in the opening 62, the total cross-sectional area of those via covers can be reliably increased. .
[0022]
FIG. 5 relates to another embodiment of the present invention. FIG. 5A shows that an elliptical opening 72 is formed in the metal plane layer 70, and a pair of via covers 73 are disposed in the opening 72, and those A via 74 is connected to the upper and lower sides. Even when there are only two such vias 74, the occurrence of the dents can be prevented if a flip chip area is present on the main surface directly above them.
In FIG. 5 (B), a polished-shaped opening 76 is formed in the metal plane layer 75, and two large and small via covers 77a and 77b are arranged in the opening 76 with substantially the same spacing S, and Large and small diameter vias 78a and 78b are respectively connected to the upper and lower sides.
In this way, when the diameters of the plurality of vias 78a and 78b are different, by adopting the opening 76 that is substantially similar to the outline shape in plan view formed by the entire via covers 77a and 77b interposed between them, The present invention can be easily implemented.
[0023]
FIG. 5C shows an opening 82 having a substantially L shape in a plan view in the metal plane layer 80, and three types of via covers 84, 86, and 88 having large, medium, and small diameters disposed therein, Large, medium and small diameter vias 85, 87 and 89 are connected to the top and bottom. As described above, even when there are a plurality of types of vias and the arrangement thereof is random, the outline shape in plan view formed by the entire via covers 84, 86, 88 is substantially similar to the shape of the opening 82. Therefore, the total cross-sectional area of all the via covers 84, 86, 88 with respect to the opening 82 is set to 30% or more, or the interval between the opening 82 and each of the via covers 84, 86, 88 and between the via covers 84, 86, 88 are The interval can be easily set to less than 90 mμ.
Further, FIG. 5D shows that a substantially rhombic opening 92 is formed in the metal plane layer 90 in plan view, and a deformed pentagonal via cover 94 is formed vertically in the center of the opening 92 at a predetermined interval. Are arranged symmetrically, and triangular via covers 96 are arranged symmetrically on the left and right, and a large diameter via 95 is provided above and below the central via cover 94, and a small diameter via 97 is provided above and below the left and right via covers 96, respectively. Connected.
The outline shape in plan view formed by each of the via covers 94 and 96 is substantially similar to the opening 92, and thus is one of the forms suitable for the implementation of the present invention.
[0024]
The present invention is not limited to the embodiments described above.
For example, in a wiring board, conductor wiring layers are provided above and below the metal plane layer, and a plurality of via wirings pass through the openings provided in the metal plane layer, or a plurality of metal plane layers and a plurality of conductors. The present invention can also be applied to a substrate having a structure in which wiring layers are alternately provided and a plurality of via wirings penetrate through the openings provided in each metal plane layer.
In addition, the conductive spacers arranged in the openings of the metal plane layer may be arranged in a line shape or a mesh shape that partitions between the plurality of via covers.
Furthermore, the cross-sectional shape of the via itself can be similar to that of an irregularly shaped via cover interposed therebetween, and the conductivity thereof can be enhanced.
As a terminal for connecting to the flip chip, in addition to the connection pad formed by the metallized printing, the end exposed on the main surface of the uppermost via can be used as it is as a connection terminal. .
[0025]
【The invention's effect】
According to the wiring board of the present invention described above, even if a plurality of via wirings penetrates through the opening of the metal plane layer through the via cover, the main surface of the board above them does not or is not likely to be recessed. Therefore, the flip chip can be accurately and reliably mounted on the connection pad on the main surface. In addition, when manufacturing this substrate, it can be easily obtained without increasing the number of steps.
In addition, according to the inventions of claims 2 to 5, it is possible to more reliably prevent the occurrence of the dent.
[Brief description of the drawings]
FIG. 1A is a partial longitudinal sectional view showing one embodiment of a wiring board according to the present invention, and FIG. 1B is an end view taken along line BB in FIG.
FIGS. 2A and 2B are end views similar to FIG. 1B showing another embodiment of the present invention.
FIGS. 3A and 3B are end views similar to FIG. 1B showing different embodiments of the present invention.
FIG. 4 is an end view similar to FIG. 1 (B) showing another embodiment of the present invention.
5 (A) to 5 (D) are end views similar to FIG. 1 (B) showing another embodiment of the present invention.
6A is a partial longitudinal sectional view showing a conventional wiring board, FIG. 6B is an end view taken along line BB in FIG. 6A, and FIG. 6C is a partially enlarged sectional view in FIG. .
[Explanation of symbols]
1 ……………………………………………………………… Wiring board 2, 18 …………………………………………………… ... Pad for connection (terminal)
4,20,30,40,50,60,70,75,80,90 ………………………… Metal plane layer 6,22,32,42,52,62,72,76,82 , 92 …………………………… Opening 6a, 33,43,53 …………………………………………………… Edge / curved edge 8 ………… …………………………………………………… Conductor wiring layer 10,26,36,46,56,65,67,74,78,85,87,89,95,97 ………… Via wiring / via 12,12 ′, 24,34,44,54,64,66,73,77,84,86,88,94,96 …… via cover 48 …………………… ……………………………………… Conductive spacer S ……………………………………………………………… Interval [Table 1]
Figure 0003737597

Claims (5)

主表面にフリップチップを実装するための接続用端子を有し、
且つ、内部に少なくとも1層以上形成され上記フリップチップを実装する領域の直下に開口部を有するメタルプレーン層と、このメタルプレーン層よりも上記主表面から離れた側に形成された導体配線層とを有すると共に、
上記メタルプレーン層の開口部内に設けた複数のビアカバーを介して上記接続用端子と上記導体配線層との間をそれぞれ接続する複数のビア配線を有する配線基板であって、
平面視したときの上記複数のビアカバーの総面積が、上記開口部の面積の30%以上であること
を特徴とするフリップチップ実装用配線基板。
Has a connection terminal for mounting the flip chip on the main surface,
A metal plane layer having at least one layer formed therein and having an opening immediately under the flip chip mounting region; and a conductor wiring layer formed on a side farther from the main surface than the metal plane layer; And having
A wiring board having a plurality of via wirings respectively connecting the connection terminals and the conductor wiring layer via a plurality of via covers provided in the openings of the metal plane layer;
A flip-chip mounting wiring board, wherein a total area of the plurality of via covers in a plan view is 30% or more of an area of the opening.
前記複数のビア配線が平面視して略格子状に配置されている領域において、
前記複数のビアカバーがそれぞれ略矩形状に形成されていること
を特徴とする請求項1に記載のフリップチップ実装用配線基板。
In the region where the plurality of via wirings are arranged in a substantially lattice shape in plan view,
The flip-chip mounting wiring board according to claim 1, wherein each of the plurality of via covers is formed in a substantially rectangular shape.
前記複数のビアカバー全体がなす平面形状の輪郭が、前記開口部の縁の形状と略相似形となるように、各々のビアカバーの形状を形成したこと
を特徴とする請求項1又は2に記載のフリップチップ実装用配線基板。
The shape of each via cover is formed so that the outline of the planar shape formed by the plurality of via covers as a whole is substantially similar to the shape of the edge of the opening. Flip chip mounting wiring board.
前記複数のビアカバー相互及び各ビアカバーと前記メタルプレーン層の開口部の縁との間隔を90μm未満としたこと
を特徴とする請求項1〜3の何れかに記載のフリップチップ実装用配線基板。
4. The flip-chip mounting wiring board according to claim 1, wherein a distance between the plurality of via covers and each via cover and an edge of the opening of the metal plane layer is less than 90 [mu] m.
前記開口部内の前記複数のビアカバー又は各ビアカバーと開口部の縁とに囲まれた位置に、前記メタルプレーン層と略同じ厚さの導電性スペーサが周囲の各ビアカバー又は開口部の縁と90μm未満の間隔を置いて配設されていること
を特徴とする請求項1〜4の何れかに記載のフリップチップ実装用配線基板。
A conductive spacer having a thickness substantially the same as that of the metal plane layer is less than 90 μm from the surrounding edge of each via cover or opening at a position surrounded by the plurality of via covers or each via cover and the edge of the opening in the opening. 5. The flip-chip mounting wiring board according to claim 1, wherein the flip-chip mounting wiring board is disposed with an interval of.
JP02506297A 1997-02-07 1997-02-07 Flip chip mounting circuit board Expired - Fee Related JP3737597B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02506297A JP3737597B2 (en) 1997-02-07 1997-02-07 Flip chip mounting circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02506297A JP3737597B2 (en) 1997-02-07 1997-02-07 Flip chip mounting circuit board

Publications (2)

Publication Number Publication Date
JPH10224038A JPH10224038A (en) 1998-08-21
JP3737597B2 true JP3737597B2 (en) 2006-01-18

Family

ID=12155443

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02506297A Expired - Fee Related JP3737597B2 (en) 1997-02-07 1997-02-07 Flip chip mounting circuit board

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Country Link
JP (1) JP3737597B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4630027B2 (en) * 2004-09-08 2011-02-09 日本シイエムケイ株式会社 Printed wiring board and manufacturing method thereof
US7388158B2 (en) * 2004-09-17 2008-06-17 Terdyne, Inc. Concentric spacer for reducing capacitive coupling in multilayer substrate assemblies
JP5294828B2 (en) * 2008-01-28 2013-09-18 京セラ株式会社 Laminated board

Also Published As

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