JP3525745B2 - Epoxy resin composition and insulating substrate using this epoxy resin composition - Google Patents
Epoxy resin composition and insulating substrate using this epoxy resin compositionInfo
- Publication number
- JP3525745B2 JP3525745B2 JP17301198A JP17301198A JP3525745B2 JP 3525745 B2 JP3525745 B2 JP 3525745B2 JP 17301198 A JP17301198 A JP 17301198A JP 17301198 A JP17301198 A JP 17301198A JP 3525745 B2 JP3525745 B2 JP 3525745B2
- Authority
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- Japan
- Prior art keywords
- epoxy resin
- resin composition
- epoxy
- chemical
- anhydride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【0001】[0001]
【発明の属する技術分野】本発明は、エポキシ樹脂組成
物およびこのエポキシ樹脂組成物を用いた絶縁基板に関
するものであり、具体的には、プリント配線基板等の電
子材料に用いられるエポキシ樹脂組成物に関するもので
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition and an insulating substrate using this epoxy resin composition, and more specifically, an epoxy resin composition used for electronic materials such as printed wiring boards. It is about.
【0002】[0002]
【従来の技術】積層板用、プリント配線基板用等の絶縁
基板に使用されるエポキシ樹脂組成物としては、基材に
含浸させるものであり、そして、情報通信分野で使用さ
れる上述のような絶縁基板は、MHz帯からGHz帯と
いう高周波領域に対応するため、優れた電気特性が要求
され、特に、誘電率(ε)、誘電正接(tanδ)が低
いことを要求されていた。2. Description of the Related Art Epoxy resin compositions used for insulating substrates for laminated boards, printed wiring boards, etc. are those for impregnating a base material and are used in the field of information communication as described above. Since the insulating substrate corresponds to a high frequency region from the MHz band to the GHz band, it has been required to have excellent electric characteristics, and particularly to have a low dielectric constant (ε) and a low dielectric loss tangent (tan δ).
【0003】[0003]
【発明が解決しようとする課題】従来、このような電気
特性を有する基板の一つとして、エポキシ樹脂に、ポリ
フェニレンエーテル樹脂(PPO樹脂ともいう。)を混
合した材料が用いられてきた。この材料は、通常のエポ
キシ樹脂材料よりも、低誘電率性であり、かつ、高耐熱
ではあるが、他の高価な高周波用材料であるテフロン樹
脂、ビスマレイミドトリアジン樹脂、ポリイミド樹脂な
どと比較すると、ガラス転移温度(Tg)が低く、誘電
正接も高いという欠点があった。Conventionally, as one of the substrates having such electrical characteristics, a material in which a polyphenylene ether resin (also referred to as PPO resin) is mixed with an epoxy resin has been used. This material has a lower dielectric constant and a higher heat resistance than a normal epoxy resin material, but when compared with other expensive high-frequency materials such as Teflon resin, bismaleimide triazine resin, and polyimide resin. The glass transition temperature (Tg) is low and the dielectric loss tangent is high.
【0004】そこで、本発明者らは、エポキシ樹脂にポ
リフェニレンエーテル樹脂を混合した材料にシアネート
およびその自重合体を配合し、耐熱性と電気特性をより
向上させる方策について特願平9−71333号公報や
特願平9−82850号公報に示すごとき提案をしてき
た。Therefore, the inventors of the present invention have proposed a method of further improving heat resistance and electric properties by blending a cyanate and its self-polymer into a material obtained by mixing an epoxy resin with a polyphenylene ether resin, and Japanese Patent Application No. 9-71333. And a proposal as shown in Japanese Patent Application No. 9-82850.
【0005】しかしながら、このようなエポキシ樹脂組
成物は、積層板やプリント配線板等の絶縁基板に使用す
ると、密着性、耐熱性が悪くなるという問題があった。However, when such an epoxy resin composition is used for an insulating substrate such as a laminated board or a printed wiring board, there is a problem that adhesion and heat resistance deteriorate.
【0006】本発明は、上述の事実に鑑みてなされたも
のであって、その目的とするところは、高耐熱性と、低
誘電正接を有し、密着性に優れたエポキシ樹脂組成物お
よびこのエポキシ樹脂組成物を用いた絶縁基板を提供す
ることにある。The present invention has been made in view of the above facts, and an object thereof is an epoxy resin composition having high heat resistance, low dielectric loss tangent and excellent adhesion, and An object is to provide an insulating substrate using the epoxy resin composition.
【0007】[0007]
【課題を解決するための手段】本発明の請求項1に係る
エポキシ樹脂組成物は、下記式〔I〕、式〔 II 〕、式
〔 III 〕の群から選ばれたいずれか1種の多官能エポキ
シ化合物、および、これ以外の一分子中に少なくともエ
ポキシ基を2個以上有するエポキシ化合物を併用し、ポ
リフェニレンエーテルをフェノール類とラジカル開始剤
の存在下で再分配反応させて得られたフェノール変性ポ
リフェニレンエーテルと1分子あたり2個以上のシアネ
ート基を有するシアネート化合物、および、硬化促進剤
を必須成分として含有することを特徴とする。The epoxy resin composition according to claim 1 of the present invention has the following formula [I], formula [ II ], formula
Any one multifunctional epoxy selected from the group of [ III ]
Shi compounds, and which at least epoxy groups in one molecule other than a combination of an epoxy compound having two or more polyphenylene ether phenol-modified polyphenylene obtained by redistribution reaction in the presence of a phenol and a radical initiator Ether and 2 or more cyanes per molecule
A cyanate compound having a carboxylate group and a curing accelerator are contained as essential components.
【0008】[0008]
【化4】 [Chemical 4]
【0009】[0009]
【化5】 [Chemical 5]
【0010】[0010]
【化6】 [Chemical 6]
【0011】本発明の請求項2に係るエポキシ樹脂組成
物は、上記必須成分にテトラヒドロ無水フタル酸、メチ
ルヘキサヒドロ無水フタル酸、無水メチルハイミック酸
の群から選ばれた少なくとも1種の酸無水物が配合され
たものであることを特徴とする。The epoxy resin composition according to claim 2 of the present invention comprises, as the essential component, at least one acid anhydride selected from the group consisting of tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride and methylhymic anhydride. It is characterized in that the product is blended.
【0012】本発明の請求項3に係るエポキシ樹脂組成
物は、上記フェノール変性ポリフェニレンエーテルの数
平均分子量が、10000以下であることを特徴とす
る。An epoxy resin composition according to a third aspect of the present invention is characterized in that the phenol-modified polyphenylene ether has a number average molecular weight of 10,000 or less.
【0013】本発明の請求項4に係るエポキシ樹脂組成
物を用いた絶縁基板は、請求項1ないし請求項3何れか
記載のエポキシ樹脂組成物をガラス基材に含浸させ、硬
化させてなることを特徴とする。An insulating substrate using the epoxy resin composition according to claim 4 of the present invention is obtained by impregnating a glass substrate with the epoxy resin composition according to any one of claims 1 to 3 and curing it. Is characterized by.
【0014】[0014]
【発明の実施の形態】以下、本発明の実施形態を詳しく
説明する。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described in detail below.
【0015】本発明に係るエポキシ樹脂組成物は、下記
式〔I〕、式〔 II 〕、式〔 III 〕の群から選ばれたいず
れか1種の多官能エポキシ化合物、および、これ以外の
一分子中に少なくともエポキシ基を2個以上有するエポ
キシ化合物を併用し、ポリフェニレンエーテルをフェノ
ール類とラジカル開始剤の存在下で再分配反応させて得
られたフェノール変性ポリフェニレンエーテルと1分子
あたり2個以上のシアネート基を有するシアネート化合
物、および、硬化促進剤を必須成分として含有するもの
である。The epoxy resin composition according to the present invention, the following
A compound selected from the group consisting of formula [I], formula [ II ] and formula [ III ]
One of these polyfunctional epoxy compounds and another epoxy compound having at least two epoxy groups in one molecule are used in combination, and polyphenylene ether is added in the presence of phenols and a radical initiator. Phenol-modified polyphenylene ether obtained by redistribution reaction and one molecule
A cyanate compound having two or more cyanate groups and a curing accelerator are contained as essential components.
【0016】[0016]
【化7】 [Chemical 7]
【0017】[0017]
【化8】 [Chemical 8]
【0018】[0018]
【化9】 [Chemical 9]
【0019】上記エポキシ樹脂は、1分子あたり2個以
上のエポキシ基を有するものであれば、特に限定される
ものではなく、例えば、ビスフェノールA型エポキシ樹
脂、ビスフェノールF 型エポキシ樹脂、フェノールノボ
ラック型エポキシ樹脂、ナフタレン型エポキシ樹脂、ビ
フェニル型型エポキシ樹脂やこれらのブロモ化エポキシ
樹脂などが挙げられる。これらは、単独あるいは、2種
以上を併用して使用される。The above-mentioned epoxy resin is not particularly limited as long as it has two or more epoxy groups per molecule, for example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin. Examples thereof include resins, naphthalene type epoxy resins, biphenyl type epoxy resins, and brominated epoxy resins thereof. These may be used alone or in combination of two or more.
【0020】上記多官能エポキシ化合物は、上記式
〔I〕、式〔II〕、式〔III 〕の群から選ばれたいずれ
か1種で表わされるものである。The polyfunctional epoxy compound is represented by any one selected from the group of the above formula [I], formula [II] and formula [III].
【0021】これらは、硬化過程において、ポリフェニ
レンエーテル類との反応性が良く、架橋点を増加させる
ことにより、高耐熱性の硬化物を生成することができ
る。さらに、硬化物中の未反応物が減少するため、硬化
物を加熱する際、揮発成分が少なくなり、耐熱性、密着
性に優れた硬化物を生成することができる。These have good reactivity with polyphenylene ethers in the curing process, and by increasing the number of crosslinking points, a highly heat-resistant cured product can be produced. Furthermore, since unreacted substances in the cured product are reduced, when the cured product is heated, the volatile components are reduced, and a cured product excellent in heat resistance and adhesion can be produced.
【0022】これらエポキシの配合量は、15〜35重
量部であることが好ましく、これ未満では硬化不良を生
じ、耐熱性が劣化し、逆に、これを越えると電気特性が
悪くなるものである。The amount of the epoxy compounded is preferably 15 to 35 parts by weight. If the amount is less than this range, curing failure will occur and the heat resistance will be deteriorated. On the contrary, if it exceeds this range, the electrical characteristics will be deteriorated. .
【0023】上記ポリフェニレンエーテル類は、末端に
水酸基を1個以上有するものであれば特に限定されない
が、分子量は10000以下である方が、流動性が良
く、エポキシ樹脂との反応性も高いので好ましい。市販
のポリフェニレンエーテルから低分子量のものを得るに
は、ビスフェノールA等のフェノール類と過酸化物を開
始剤として、トルエン等の溶媒中で加熱すればよく、フ
ェノール類の配合比を増加させるほど、低分子量のもの
が得られる。The polyphenylene ether is not particularly limited as long as it has one or more hydroxyl groups at the terminal, but a molecular weight of 10,000 or less is preferable because it has good fluidity and high reactivity with an epoxy resin. . In order to obtain low molecular weight compounds from commercially available polyphenylene ethers, phenols such as bisphenol A and a peroxide may be used as an initiator and heated in a solvent such as toluene. A low molecular weight product is obtained.
【0024】上記シアネート化合物は、1分子あたり2
個以上のシアネート基を有する芳香族化合物である。例
えば、2,2−ビス(4−シアナートフェニル)プロパ
ン、ビス(3,5ジメチル−4−シアナートフェニル)
メタン、2,2−ビス(4−シアナートフェニル)エタ
ンなどが挙げられる。これらは単独、あるいは2種以上
を併用して使用される。The above cyanate compound has 2 molecules per molecule.
It is an aromatic compound having one or more cyanate groups. For example, 2,2-bis (4-cyanatophenyl) propane, bis (3,5dimethyl-4-cyanatophenyl)
Examples thereof include methane and 2,2-bis (4-cyanatophenyl) ethane. These may be used alone or in combination of two or more.
【0025】上記シアネート化合物による硬化物は、電
気特性に優れる上に、エポキシとポリフェニレンエーテ
ル類の硬化反応に関与し、架橋構造を形成するため、ガ
ラス転移温度も上昇することが考えられる。The cured product of the above cyanate compound is excellent in electrical characteristics and also participates in the curing reaction between the epoxy and the polyphenylene ether to form a crosslinked structure, so that the glass transition temperature is considered to rise.
【0026】上記シアネート化合物の配合比は、エポキ
シ樹脂およびポリフェニレンエーテル類に対して、1〜
30重量%の範囲で有効である。これより多くなると、
含浸性低下や結晶析出の問題がある。The compounding ratio of the above cyanate compound is 1 to epoxy resin and polyphenylene ethers.
Effective in the range of 30% by weight. More than this,
There are problems of impregnating property deterioration and crystal precipitation.
【0027】上記反応促進剤としては、オクタン酸、ス
テアリン酸、アセチルアセトネート、ナフテン酸、サリ
チル酸等の有機酸とZnやCu等の金属塩や、トリエチ
ルアミン、トリエタノールアミン等の3級アミン、2−
エチル−4−イミダゾール、4−メチルイミダゾール等
のイミダゾール類が有効である。これらは、単独、ある
いは2種以上を併用して用いられる。Examples of the reaction accelerator include organic acids such as octanoic acid, stearic acid, acetylacetonate, naphthenic acid and salicylic acid, metal salts such as Zn and Cu, and tertiary amines such as triethylamine and triethanolamine. −
Imidazoles such as ethyl-4-imidazole and 4-methylimidazole are effective. These may be used alone or in combination of two or more.
【0028】これら金属有機酸塩は、シアネートの反応
に寄与し、イミダゾール化合物は、主に、エポキシとポ
リフェニレンエーテル類の反応に寄与すると考えられる
ものである。It is considered that these metal organic acid salts contribute to the reaction of cyanate, and the imidazole compound mainly contributes to the reaction of epoxy and polyphenylene ethers.
【0029】上記必須成分にテトラヒドロ無水フタル
酸、メチルヘキサヒドロ無水フタル酸、無水メチルハイ
ミック酸の群から選ばれた少なくとも1種の酸無水物が
配合されたものは、上記エポキシ化合物とポリフェニレ
ンエーテル類を予備的に反応させたものである。この反
応は、イミダゾール化合物の存在下で容易に進行するも
のである。ただし、反応させすぎると、粘度が上昇し
て、逆効果となるものである。The above-mentioned essential compounds are blended with at least one acid anhydride selected from the group consisting of tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, and methylhymic acid anhydride. The above-mentioned epoxy compound and polyphenylene ether This is a preliminary reaction of the class. This reaction easily proceeds in the presence of the imidazole compound. However, if the reaction is carried out too much, the viscosity will increase, which has the opposite effect.
【0030】なお、上記酸無水物は、テトラヒドロ無水
フタル酸、メチルヘキサヒドロ無水フタル酸、無水メチ
ルハイミック酸の群から選ばれた少なくとも1種のもの
である。The acid anhydride is at least one selected from the group consisting of tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride and methylhymic acid anhydride.
【0031】これらを配合することにより、硬化物中の
未反応物が減少するため、硬化物を加熱する際、揮発成
分が少なくなり、耐熱性、密着性に優れた硬化物を生成
することができる。By blending these, unreacted substances in the cured product are reduced, so that when the cured product is heated, volatile components are reduced, and a cured product excellent in heat resistance and adhesiveness can be produced. it can.
【0032】これら酸無水物の配合量は、1〜30重量
部であることが好ましく、これ未満では、硬化不良を生
じ、耐熱性が劣化し、逆に、これを越えると、電気特性
が悪くなる。The content of these acid anhydrides is preferably 1 to 30 parts by weight. If the amount is less than this, curing failure occurs and the heat resistance is deteriorated. Become.
【0033】なお、本発明のエポキシ樹脂組成物は、適
当な溶剤中で、ガラス基材に含浸させ、乾燥後、加熱硬
化させることによって、積層板、プリント配線板などの
絶縁基板として用いることができるものである。The epoxy resin composition of the present invention can be used as an insulating substrate such as a laminated board or a printed wiring board by impregnating a glass base material in a suitable solvent, drying and then heating and curing. It is possible.
【0034】そして、本発明は、シアネート基を有する
芳香族化合物の硬化物の良好な電気特性と多官能エポキ
シやポリフェニレンエーテル類との反応性を利用したも
のである。すなわち、硬化系にとりこまれることによっ
て、耐熱性、密着性も向上するものである。The present invention utilizes good electrical properties of a cured product of an aromatic compound having a cyanate group and reactivity with a polyfunctional epoxy or polyphenylene ether. That is, when incorporated into a curing system, heat resistance and adhesion are also improved.
【0035】[0035]
【実施例】以下、本発明の実施例を詳しく説明する。EXAMPLES Examples of the present invention will be described in detail below.
【0036】(実施例1)エポキシ樹脂として、ビスフ
ェノールA型エポキシ樹脂およびその臭素化物(ダウケ
ミカル製DER542)を150g、さらに、下式
〔I〕の3官能エポキシ樹脂(油化シェル製エピコート
1032H60)を80g、ポリフェニレンエーテル類
としてポリ(2,6−ジメチル−1,4−フェニレンエ
ーテル)(GE製)60gとビスフェノールA8.2
g、反応開始剤としてベンゾイルパーオキシド(ナカラ
イテスク製)4.5gを加熱反応させたもの(数平均分
子量約4000)を用いた。シアネート化合物として
は、2,2−ビス(4−シアナートフェニル)プロパン
(チバガイギー社製)62.5g、触媒としてアセチル
アセトネート亜鉛を0.016g、2−エチル−4−イ
ミダゾールを0.6g用いた。これらをトルエン100
g中で混合し、エポキシ樹脂組成物の樹脂ワニスを作製
した。Example 1 As an epoxy resin, 150 g of a bisphenol A type epoxy resin and its bromide (DER542 made by Dow Chemical), and a trifunctional epoxy resin of the following formula [I] (Epicoat 1032H60 made by Yuka Shell) are used. 80 g, poly (2,6-dimethyl-1,4-phenylene ether) (manufactured by GE) as polyphenylene ethers, and bisphenol A8.2.
g, benzoyl peroxide (manufactured by Nacalai Tesque) (4.5 g) as a reaction initiator was heated and reacted (number average molecular weight of about 4000). As the cyanate compound, 2,2-bis (4-cyanatophenyl) propane (manufactured by Ciba Geigy) 62.5 g, zinc acetylacetonate as a catalyst 0.016 g, and 2-ethyl-4-imidazole 0.6 g are used. I was there. Toluene 100
The mixture was mixed in g to prepare a resin varnish of the epoxy resin composition.
【0037】[0037]
【化10】 [Chemical 10]
【0038】(実施例2)実施例1において、ビスフェ
ノールA型エポキシおよびその臭素化物を150g、さ
らに、下式〔II〕の3官能エポキシを55g用いた以外
は、全て同じ配合でエポキシ樹脂組成物の樹脂ワニスを
合成した。Example 2 An epoxy resin composition having the same composition except that in Example 1 150 g of bisphenol A type epoxy and its bromide and 55 g of trifunctional epoxy of the following formula [II] were used. The resin varnish of was synthesized.
【0039】[0039]
【化11】 [Chemical 11]
【0040】(実施例3)実施例1において、ビスフェ
ノールA型エポキシおよびその臭素化物を100g、さ
らに、下式〔III 〕の4官能エポキシを75g用いた以
外は、全て同じ配合でエポキシ樹脂組成物の樹脂ワニス
を合成した。Example 3 An epoxy resin composition having the same composition as in Example 1 except that 100 g of bisphenol A type epoxy and its bromide and 75 g of tetrafunctional epoxy of the following formula [III] were used. The resin varnish of was synthesized.
【0041】[0041]
【化12】 [Chemical 12]
【0042】(実施例4)実施例1において、シアネー
ト化合物として、2,2−ビス(4−シアナートフェニ
ル)プロパン(チバガイギー社製)を62.5g、さら
に、酸無水物としてテトラヒドロ無水フタル酸を23g
用いた以外は、全て同じ配合でエポキシ樹脂組成物の樹
脂ワニスを作製した。Example 4 In Example 1, 62.5 g of 2,2-bis (4-cyanatophenyl) propane (manufactured by Ciba Geigy) was used as the cyanate compound, and tetrahydrophthalic anhydride was used as the acid anhydride. 23 g
A resin varnish of the epoxy resin composition was produced with the same composition except that it was used.
【0043】(実施例5)実施例4において、酸無水物
として、メチルヘキサヒドロ無水フタル酸を22g用い
た以外は、全て同じ配合でエポキシ樹脂組成物の樹脂ワ
ニスを作製した。(Example 5) A resin varnish of an epoxy resin composition was prepared in the same manner as in Example 4, except that 22 g of methylhexahydrophthalic anhydride was used as the acid anhydride.
【0044】(実施例6)実施例4において、酸無水物
として、無水メチルハイミック酸を20g用いた以外
は、全て同じ配合でエポキシ樹脂組成物の樹脂ワニスを
作製した。(Example 6) A resin varnish of an epoxy resin composition was prepared in the same manner as in Example 4, except that 20 g of methylhymic acid anhydride was used as the acid anhydride.
【0045】(比較例1)エポキシ樹脂として、ビスフ
ェノールA型エポキシ樹脂およびその臭素化物(ダウケ
ミカル製DER542)を205g、ポリフェニレンエ
ーテル類としてポリ(2,6−ジメチル−1,4−フェ
ニレンエーテル)(GE製)60gとビスフェノールA
8.2g 、さらに、反応開始剤としてベンゾイルパーオ
キシド4.5gを加熱反応させたもの(数平均分子量約
4000)を用いた。硬化剤としてエタキュアー5.2
g、触媒としてアセチルアセトネート亜鉛を5.2g、
2−エチル−4−イミダゾールを3.6g用いた。これ
らを混合し、エポキシ樹脂組成物の樹脂ワニスを作製し
た。Comparative Example 1 As an epoxy resin, 205 g of a bisphenol A type epoxy resin and its bromide (DER542 made by Dow Chemical) and poly (2,6-dimethyl-1,4-phenylene ether) (as polyphenylene ethers) ( GE) 60 g and bisphenol A
Further, 8.2 g of benzoyl peroxide (4.5 g of which the number average molecular weight was about 4000) was reacted by heating was used as a reaction initiator. ETACURE 5.2 as a curing agent
g, 5.2 g of zinc acetylacetonate as a catalyst,
3.6 g of 2-ethyl-4-imidazole was used. These were mixed and the resin varnish of the epoxy resin composition was produced.
【0046】(比較例2)エポキシ樹脂として、ビスフ
ェノールA型エポキシ樹脂およびその臭素化物(ダウケ
ミカル製DER542)を205g、ポリフェニレンエ
ーテル類としてポリ(2,6−ジメチル−1,4−フェ
ニレンエーテル)(GE製)60gとビスフェノールA
8.2g、さらに、反応開始剤としてベンゾイルパーオ
キシド4.5gを加熱反応させたもの(数平均分子量約
4000)を用いた。シアネート化合物としては、2,
2−ビス(4−シアナートフェニル)プロパン(チバガ
イギー社製)62.5gにアセチルアセトネート亜鉛を
1.2g加え、120℃で3時間プレポリマー化させた
もの(平均分子量500)、触媒としてアセチルアセト
ネート亜鉛を0.016g、2−エチル−4−イミダゾ
ールを0.6g用いた。これらをトルエン100g中で
混合し、エポキシ樹脂組成物の樹脂ワニスを作製した。Comparative Example 2 As an epoxy resin, 205 g of a bisphenol A type epoxy resin and its bromide (DER542 manufactured by Dow Chemical) and poly (2,6-dimethyl-1,4-phenylene ether) (as polyphenylene ethers) ( GE) 60 g and bisphenol A
Further, 8.2 g of benzoyl peroxide (4.5 g of which the number average molecular weight was about 4000) was reacted by heating was used as a reaction initiator. The cyanate compound is 2,
1.2 g of zinc acetylacetonate was added to 62.5 g of 2-bis (4-cyanatophenyl) propane (manufactured by Ciba Geigy) and prepolymerized at 120 ° C. for 3 hours (average molecular weight 500), acetyl as a catalyst. 0.016 g of zinc acetonate and 0.6 g of 2-ethyl-4-imidazole were used. These were mixed in 100 g of toluene to prepare a resin varnish of the epoxy resin composition.
【0047】上述のようにして得られた実施例1〜6お
よび比較例1〜2のエポキシ樹脂組成物における評価法
は、以下のとおりである。Evaluation methods for the epoxy resin compositions of Examples 1 to 6 and Comparative Examples 1 and 2 obtained as described above are as follows.
【0048】エポキシ樹脂組成物の樹脂ワニスをEガラ
スクロスに含浸してプリプレグを作製し、これを4枚重
ねて、200℃−2時間プレス成形して、絶縁基板とし
て積層板を作製する。E glass cloth was impregnated with a resin varnish of an epoxy resin composition to prepare a prepreg, and four prepregs were stacked and press-molded at 200 ° C. for 2 hours to prepare a laminate as an insulating substrate.
【0049】この積層板の物性評価は、ガラス転移温
度、誘電率、誘電正接、ピール強度についてJIS−C
6481に従って行った。なお、オーブン耐熱性は、積
層板5枚を260℃の乾燥器内で30分保温し、それぞ
れのふくれ発生等を目視で判定した。そして、この積層
板5枚のうち、何枚ふくれ発生等があったかを不良発生
率として評価した。The physical properties of this laminate were evaluated according to JIS-C with respect to glass transition temperature, dielectric constant, dielectric loss tangent and peel strength.
6481. The oven heat resistance was evaluated by visually observing the occurrence of blistering and the like after keeping the five laminated plates in a dryer at 260 ° C. for 30 minutes. Then, of the five laminated plates, the number of occurrences of blistering or the like was evaluated as a defect occurrence rate.
【0050】ガラス転移温度(表中では、Tgと示
す。)、誘電率(表中では、εと示す。)、誘電正接
(表中では、tanδと示す。)、ピール強度、不良発
生率の結果を下記の表1に実施例1〜6および比較例1
〜2についてそれぞれまとめておいた。The glass transition temperature (denoted by Tg in the table), the dielectric constant (denoted by ε in the table), the dielectric loss tangent (denoted by tan δ in the table), the peel strength, and the defect occurrence rate. The results are shown in Table 1 below in Examples 1 to 6 and Comparative Example 1.
I have summarized each of the above.
【0051】[0051]
【表1】 [Table 1]
【0052】実施例1〜6および比較例1〜2につい
て、それぞれ比べてみてわかるように、いずれの項目に
おいても、実施例1〜6のものの方が比較例1〜2のも
のよりもはるかに上回った結果が得られており、このこ
とから、本発明のエポキシ樹脂組成物は、高耐熱性と、
低誘電正接を有し、密着性に優れたものになるといえる
ことがわかる。As can be seen from comparison between Examples 1 to 6 and Comparative Examples 1 and 2, the items of Examples 1 to 6 are far better than those of Comparative Examples 1 and 2 in any item. It has been obtained results that exceed, from this, the epoxy resin composition of the present invention, high heat resistance,
It can be said that it has a low dielectric loss tangent and excellent adhesion.
【0053】[0053]
【発明の効果】本発明の請求項1に係るエポキシ樹脂組
成物によると、高耐熱性と、低誘電正接を有し、密着性
に優れたものになる。The epoxy resin composition according to the first aspect of the present invention has high heat resistance, low dielectric loss tangent, and excellent adhesion.
【0054】本発明の請求項2または請求項3に係るエ
ポキシ樹脂組成物によると、請求項1記載の場合に加え
て、高耐熱性と、低誘電正接をより一層確実に有し、密
着性としてもより一層確実に優れたものになる。According to the epoxy resin composition according to claim 2 or claim 3 of the present invention, in addition to the case of claim 1, the epoxy resin composition has high heat resistance and low dielectric loss tangent more surely, and has good adhesion. As a result, it will surely become superior.
【0055】本発明の請求項4に係るエポキシ樹脂組成
物を用いた絶縁基板によると、高耐熱性と、低誘電正接
を有し、密着性に優れた基板が得られ、その結果、基板
の品質を上げることができるものとなる。According to the insulating substrate using the epoxy resin composition according to the fourth aspect of the present invention, a substrate having high heat resistance and low dielectric loss tangent and excellent adhesion can be obtained. As a result, The quality can be improved.
フロントページの続き (56)参考文献 特開 平5−239183(JP,A) 特開 平9−291148(JP,A) 特開 平9−235349(JP,A) 特開 平7−242732(JP,A) 特開 平10−292031(JP,A) 特開 平10−265669(JP,A) (58)調査した分野(Int.Cl.7,DB名) C08G 59/00 - 59/72 H05K 1/03 - 1/05 Continuation of front page (56) Reference JP-A-5-239183 (JP, A) JP-A-9-291148 (JP, A) JP-A-9-235349 (JP, A) JP-A-7-242732 (JP , A) JP-A-10-292031 (JP, A) JP-A-10-265669 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) C08G 59/00-59/72 H05K 1/03-1/05
Claims (4)
群から選ばれたいずれか1種の多官能エポキシ化合物、
および、これ以外の一分子中に少なくともエポキシ基を
2個以上有するエポキシ化合物を併用し、ポリフェニレ
ンエーテルをフェノール類とラジカル開始剤の存在下で
再分配反応させて得られたフェノール変性ポリフェニレ
ンエーテルと1分子あたり2個以上のシアネート基を有
するシアネート化合物、および、硬化促進剤を必須成分
として含有することを特徴とするエポキシ樹脂組成物。 【化1】 【化2】 【化3】 1. The following formulas [I], [ II ] and [ III ]
Any one polyfunctional epoxy compound selected from the group,
And, other than this at least epoxy groups in one molecule in combination with an epoxy compound having two or more polyphenylene ether phenol-modified polyphenylene ether obtained by redistribution reaction in the presence of a phenol and a radical initiator and 1 Has two or more cyanate groups per molecule
An epoxy resin composition containing a cyanate compound and a curing accelerator as essential components. [Chemical 1] [Chemical 2] [Chemical 3]
酸、メチルヘキサヒドロ無水フタル酸、無水メチルハイ
ミック酸の群から選ばれた少なくとも1種の酸無水物が
配合されたものであることを特徴とする請求項1記載の
エポキシ樹脂組成物。2. The above essential component is blended with at least one acid anhydride selected from the group consisting of tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, and methylhymic anhydride. The epoxy resin composition according to claim 1.
テルの数平均分子量が、10000以下であることを特
徴とする請求項1または請求項2記載のエポキシ樹脂組
成物。3. The epoxy resin composition according to claim 1 or 2, wherein the phenol-modified polyphenylene ether has a number average molecular weight of 10,000 or less.
ポキシ樹脂組成物をガラス基材に含浸させ、硬化させて
なることを特徴とするエポキシ樹脂組成物を用いた絶縁
基板。4. An insulating substrate using an epoxy resin composition, which is obtained by impregnating a glass substrate with the epoxy resin composition according to any one of claims 1 to 3 and curing the glass substrate.
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JP17301198A JP3525745B2 (en) | 1998-06-19 | 1998-06-19 | Epoxy resin composition and insulating substrate using this epoxy resin composition |
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JP3525745B2 true JP3525745B2 (en) | 2004-05-10 |
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JP6252929B2 (en) * | 2013-07-04 | 2017-12-27 | パナソニックIpマネジメント株式会社 | Method for producing resin composition |
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