JP3414521B2 - Method for producing a lithographic printing plate support - Google Patents
Method for producing a lithographic printing plate supportInfo
- Publication number
- JP3414521B2 JP3414521B2 JP23540694A JP23540694A JP3414521B2 JP 3414521 B2 JP3414521 B2 JP 3414521B2 JP 23540694 A JP23540694 A JP 23540694A JP 23540694 A JP23540694 A JP 23540694A JP 3414521 B2 JP3414521 B2 JP 3414521B2
- Authority
- JP
- Japan
- Prior art keywords
- support
- lithographic printing
- plate
- printing plate
- rolling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007639 printing Methods 0.000 title claims description 39
- 238000004519 manufacturing process Methods 0.000 title claims description 22
- 229910052782 aluminium Inorganic materials 0.000 claims description 30
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 29
- 238000009749 continuous casting Methods 0.000 claims description 19
- 238000005096 rolling process Methods 0.000 claims description 18
- 238000007788 roughening Methods 0.000 claims description 18
- 238000005097 cold rolling Methods 0.000 claims description 16
- 238000000137 annealing Methods 0.000 claims description 13
- 230000000630 rising effect Effects 0.000 claims description 5
- 238000000034 method Methods 0.000 description 31
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 12
- 239000002585 base Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 9
- 239000007788 liquid Substances 0.000 description 7
- 238000005266 casting Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 238000005868 electrolysis reaction Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000005098 hot rolling Methods 0.000 description 4
- 235000011121 sodium hydroxide Nutrition 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 239000008151 electrolyte solution Substances 0.000 description 3
- 238000000866 electrolytic etching Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 238000007645 offset printing Methods 0.000 description 3
- 102220253765 rs141230910 Human genes 0.000 description 3
- 238000002791 soaking Methods 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- -1 aluminum ion Chemical class 0.000 description 1
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 1
- 239000010407 anodic oxide Substances 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229920001477 hydrophilic polymer Polymers 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Heat Treatment Of Strip Materials And Filament Materials (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は平版印刷版用支持体の製
造方法に関する、特に電解粗面化性の良いアルミニウム
支持体の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a lithographic printing plate support, and more particularly to a method for producing an aluminum support having a good electrolytic graining property.
【0002】[0002]
【従来の技術】印刷版用アルミニウム支持体、特にオフ
セット印刷版用支持体としてはアルミニウム板(アルミ
ニウム合金板を合む)が用いられている。一般にアルミ
ニウム板をオフセット印刷版用支持体として使用するた
めには、感光材料との適度な接着性と保水性を有してい
ることが必要である。2. Description of the Related Art Aluminum plates (including aluminum alloy plates) are used as aluminum supports for printing plates, especially as supports for offset printing plates. Generally, in order to use an aluminum plate as a support for an offset printing plate, it is necessary to have appropriate adhesiveness to a photosensitive material and water retention.
【0003】このためにはアルミニウム板の表面を均一
かつ緻密な砂目を有するように粗面化しなければならな
い。この粗面化処理は製版後実際にオフセット印刷を行
ったときに版材の印刷性能や耐刷力に著しい影響をおよ
ぼすので、その良否は版材製造上重要な要素となってい
る。印刷版用アルミニウム支持体の粗面化方法として
は、交流電解エッチング法が一般的に採用されており、
電流としては、普通の正弦波交流電流、矩形波などの特
殊交番波形電流が用いられている。そして、黒鉛等の適
当な電極を対極として交流電流によりアルミニウム板の
粗面化処理を行うもので、通常一回の処理で行われてい
るが、そこで得られるピット深さは全体的に浅く、耐刷
性能に劣るものであった。このため、その直径に比べて
深さの深いピットが均一かつ緻密に存在する砂目を有す
る印刷版用支持体として好適なアルミニウム板が得られ
るように、数々の方法が提案されている。その方法とし
ては、特殊電解電源波形を使った粗面化方法(特開昭5
3−67507号公報)、交流を使った電解粗面化時の
陽極時と陰極時の電気量の比率(特開昭54−6560
7号公報)、電源波形(特開昭55−25381号公
報)、単位面積あたりの通電量の組合わせ(特開昭56
−29699号公報)などが知られている。For this purpose, the surface of the aluminum plate must be roughened so as to have a uniform and fine grain. This roughening treatment has a significant influence on the printing performance and printing durability of the plate material when offset printing is actually carried out after plate making, and therefore its quality is an important factor in the plate material production. As a roughening method of the aluminum support for printing plates, AC electrolytic etching method is generally adopted,
As the current, a normal sine wave alternating current or a special alternating waveform current such as a rectangular wave is used. Then, the surface of the aluminum plate is roughened by an alternating current using an appropriate electrode such as graphite as a counter electrode, which is usually performed in a single treatment, but the pit depth obtained there is generally shallow. The printing durability was inferior. Therefore, various methods have been proposed in order to obtain an aluminum plate suitable as a printing plate support having a grain in which pits having a depth deeper than its diameter are present uniformly and densely. As a method thereof, a surface roughening method using a special electrolysis power source waveform (Japanese Patent Laid-Open No. Sho 5)
3-67507), the ratio of the amount of electricity at the time of anode and cathode at the time of electrolytic surface roughening using an alternating current (Japanese Patent Laid-Open No. 6560/54).
No. 7), a power supply waveform (JP-A-55-25381), and an energization amount per unit area (JP-A-56).
No. 29699) is known.
【0004】また、機械的な粗面化と組み合わせた方法
(特開昭55−142695号公報)なども知られてい
る。一方、アルミニウム支持体の製造方法としては、ア
ルミニウムのインゴットを溶解保持してスラブ(厚さ4
00〜600mm、幅1000〜2000mm、長さ2
000〜6000mm)を鋳造し、スラブ表面の不純物
組織部分を面削機にかけて3〜10mmづつ切削する面
削工程を経た後、スラブ内部の応力の除去と組織の均一
化の為、均熱炉において480〜540℃、6〜12時
間保持する均熱化処理工程を行い、しかる後に熱間圧延
を480〜540℃で行う。熱間圧延で5〜40mmの
厚みに圧延した後、室温で所定の厚みに冷間圧延を行
う。またその後組織の均一化のため焼鈍を行い圧延組織
等を均質化した後、規定の厚みに冷間圧延を行い、平坦
度の良い板にするため矯正する。この様にして作られた
アルミニウム支持体を平版印刷版用支持体としていた。Further, a method combined with mechanical surface roughening (Japanese Patent Application Laid-Open No. 55-142695) is also known. On the other hand, as a method of manufacturing an aluminum support, an aluminum ingot is melted and held to form a slab (thickness: 4 mm).
00-600mm, width 1000-2000mm, length 2
000 to 6000 mm) and subjected to a chamfering step of cutting the impurity textured portion of the slab surface with a chamfering machine into 3 to 10 mm increments, and then in a soaking furnace for removing stress inside the slab and homogenizing the texture A soaking treatment step of holding at 480 to 540 ° C for 6 to 12 hours is performed, and then hot rolling is performed at 480 to 540 ° C. After hot rolling to a thickness of 5 to 40 mm, cold rolling is performed to a predetermined thickness at room temperature. Further, after that, annealing is performed to homogenize the structure to homogenize the rolled structure and the like, and then cold rolling is performed to a prescribed thickness to correct the plate so as to have a good flatness. The aluminum support thus prepared was used as a support for a lithographic printing plate.
【0005】しかしながら、電解粗面化処理の場合は特
に対象となるアルミニウム支持体の影響を受けやすく、
アルミニウム支持体を溶解保持→鋳造→面削→均熱とい
う工程を通して製造する場合、加熱、冷却をくり返し、
面削という表面層を削り取る工程があったとしても、表
面層に金属合金成分などのばらつきを生じて平版印刷版
としては得率低下の原因となっていた。However, in the case of electrolytic surface-roughening treatment, it is particularly susceptible to the influence of the aluminum support as a target,
When manufacturing the aluminum support through the process of melting and holding → casting → chamfering → soaking, heating and cooling are repeated,
Even if there is a step of scraping off the surface layer called surface grinding, variations in metal alloy components and the like occur in the surface layer, which causes a reduction in the yield as a lithographic printing plate.
【0006】これに対して、本出願人は先にアルミニウ
ム支持体の材質のばらつきを少くし、電解粗面化処理の
得率を向上させることによって品質の優れた得率のよい
平版印刷版を作れる方法として、アルミニウム溶湯から
鋳造、熱間圧延を連続して行い、薄板の熱間圧延コイル
を形成させた後、冷間圧延、熱処理、矯正を行ったアル
ミニウム支持体を粗面化処理することを特徴とする平版
印刷版用支持体の製造方法を提案した(特開平3−79
798号公報)。On the other hand, the applicant of the present invention first reduced the variation in the material of the aluminum support and improved the yield of the electrolytic surface roughening treatment to obtain a lithographic printing plate of excellent quality and good yield. As a method that can be made, after casting from an aluminum melt and hot rolling continuously to form a thin plate hot rolling coil, cold rolling, heat treatment, straightening the aluminum support to roughen it A method for producing a support for a lithographic printing plate characterized by the following is proposed (JP-A-3-79).
798 publication).
【0007】[0007]
【発明が解決しようとする課題】ところが、本出願人が
先に特開平3−79798号公報て提案した製造方法に
ついても、アルミニウム溶湯から双ロールを用いて連続
鋳造圧延した場合、図2に示すように、連続鋳造圧延後
のアルミニウム板(以下、元板と称する)7の表面に、
その圧延方向に垂直な方向、即ち元板7の幅方向に延び
る段状のムラ8(拡大部分9参照)が生じる不具合があ
った。この段状のムラ8は、その後粗面化処理をした平
版印刷版の表面に波状ムラとなって残る不具合が生じ
た。However, the manufacturing method previously proposed by the present applicant in Japanese Patent Laid-Open No. 3-79798 is also shown in FIG. 2 when continuous casting and rolling is performed from molten aluminum using twin rolls. As described above, on the surface of the aluminum plate (hereinafter referred to as a base plate) 7 after continuous casting and rolling,
There was a problem that stepwise unevenness 8 (see enlarged portion 9) extending in a direction perpendicular to the rolling direction, that is, in the width direction of the base plate 7 was generated. This step-like unevenness 8 causes a problem that it remains as wavy unevenness on the surface of the planographic printing plate that has been subjected to the roughening treatment thereafter.
【0008】本発明の目的は、双ロール連続鋳造圧延時
に生じる段状のムラの発生を少なくし、粗面化後の面質
の優れた平版印刷版用支持体を双ロール連続鋳造圧延法
を用いて安定して作れる平版印刷版用支持体の製造方法
を提供することにある。An object of the present invention is to reduce the occurrence of stepwise unevenness that occurs during twin roll continuous casting and rolling, and to provide a lithographic printing plate support excellent in surface quality after roughening by a twin roll continuous casting and rolling method. An object of the present invention is to provide a method for producing a lithographic printing plate support which can be stably produced by using the support.
【0009】[0009]
【問題を解決するための手段及び作用】本発明者らは、
連続鋳造圧延時に生じる段状ムラについて鋭意研究した
結果、冷間圧延工程における板厚並びにその後の中間焼
鈍工程における処理温度を所定の範囲に規定することに
より、波状ムラの無い平版印刷版用支持体が得られるこ
とを見い出し本発明を完成するに至った。[Means and Actions for Solving the Problems]
As a result of diligent research on the stepwise unevenness that occurs during continuous casting and rolling, the plate thickness in the cold rolling step and the treatment temperature in the subsequent intermediate annealing step are regulated within a predetermined range, thereby providing a support for a lithographic printing plate without wavy unevenness. It was found that the above was obtained, and the present invention was completed.
【0010】即ち本発明の上記目的は、アルミニウム
溶湯から双ロールで直接板状に連続鋳造圧延した後、冷
間圧延、中間焼鈍を行い、さらに最終板厚に圧延して矯
正を行った後、粗面化する一連の工程からなる平版印刷
版用支持体の製造方法において、連続鋳造圧延により得
られた板を、冷間圧延により連続鋳造圧延後の板厚の2
〜8%の厚さにした後、450〜600℃の温度で10
分間〜10時間の中間焼鈍を行い、更にその後最終板厚
に圧延することを特徴とする平版印刷版用支持体の製造
方法、中間焼鈍時の昇温速度を、10℃/sec以下
とすることを特徴とする前項に記載の平版印刷版用支
持体の製造方法によって達成される。That is, the above object of the present invention is to continuously cast and roll an aluminum melt directly into a plate shape with twin rolls, then cold-roll and intermediate-anneal it, and further roll it to a final plate thickness and straighten it. In a method for producing a lithographic printing plate support comprising a series of steps for roughening, a plate obtained by continuous casting and rolling is cold rolled to obtain a plate thickness of 2 after continuous casting and rolling.
~ 8 % thickness, then 10 at 450 ~ 600 ℃
A method for producing a lithographic printing plate support characterized by performing intermediate annealing for 10 minutes to 10 hours, and then rolling to a final plate thickness, and a temperature rising rate during intermediate annealing of 10 ° C./sec or less. And a method for producing a lithographic printing plate support according to the above paragraph.
【0011】本発明において、アルミニウム溶湯から双
ロールを用いて連続的に鋳造したコイルを形成する方法
としては、ハンター法、3C法等の薄板連続鋳造技術が
実用化されている。これらの方法は、アルミニウム溶湯
を凝固させると同時に圧延することが可能で、通常厚さ
2〜10mmの元板を製造することができる。本発明は
平版印刷版用支持体として優れた特性を得るため、アル
ミニウム溶湯から連続鋳造圧延して得た元板を、冷間圧
延工程において該元板の板厚を連続鋳造圧延後の板厚の
2〜8%、好ましくは3〜8%、更に好ましくは4〜7
%とする。In the present invention, as a method for forming a coil continuously cast from molten aluminum by using twin rolls, a thin plate continuous casting technique such as Hunter method or 3C method has been put into practical use. According to these methods, the molten aluminum can be solidified and rolled at the same time, and a base plate having a thickness of 2 to 10 mm can usually be manufactured. The present invention, in order to obtain excellent properties as a lithographic printing plate support, a base plate obtained by continuous casting and rolling from a molten aluminum, the plate thickness of the base plate in the cold rolling step after the continuous casting and rolling. 2 to 8 %, preferably 3 to 8%, more preferably 4 to 7%
%.
【0012】引き続き、中間焼鈍工程において450〜
600℃、好ましくは460〜550℃、更に好ましく
は470〜520℃の温度で処理する。特に、この中間
焼鈍工程において、昇温速度を10℃/sec以下、好
ましくは5℃/sec以下、更に好ましくは2〜0.5
℃/secで緩やかに昇温することが望ましい。前述し
た波状ムラは、支持体内部に結晶粒及び合金成分の分布
が不均一に存在することによるものと判明した。本発明
のように冷間圧延時の板厚並びに中間焼鈍における処理
温度及び昇温速度を規定することにより、この結晶粒及
び合金成分の分布が均一化されて波状ムラの発生が抑制
されるものである。Then, in the intermediate annealing step,
The treatment temperature is 600 ° C., preferably 460 to 550 ° C., more preferably 470 to 520 ° C. In particular, in this intermediate annealing step, the temperature rising rate is 10 ° C./sec or less, preferably 5 ° C./sec or less, more preferably 2 to 0.5.
It is desirable to raise the temperature gently at ° C / sec. It was found that the above-mentioned wavy unevenness was caused by uneven distribution of crystal grains and alloy components inside the support. By regulating the plate thickness during cold rolling and the processing temperature and temperature rising rate during intermediate annealing as in the present invention, the distribution of the crystal grains and alloy components is made uniform and the occurrence of wavy unevenness is suppressed. Is.
【0013】そして、仕上げ圧延により最終的な板厚に
圧延し、更に平坦化のために矯正を行い、その後粗面化
処理して平版印刷版用支持体が得られる。次に、図1
(A)〜(D)の工程概略図を用いて、本発明に用いる
平版印刷版用支持体の製造方法の実施態様ついて更に具
体的に説明する。1は溶解保持炉で、ここでインゴット
は溶解保持される。ここから双ロール連続鋳造機2に送
られる。つまり、アルミニウム溶湯から直接薄板のコイ
ルを形成する、コイラー6によって巻取っても良いし、
引き続いて熱処理、冷間圧延機、矯正装置にかけても良
い。Then, the final plate thickness is rolled by finish rolling, further straightened for flattening, and then roughened to obtain a support for a lithographic printing plate. Next, FIG.
Embodiments of the method for producing a lithographic printing plate support used in the present invention will be described more specifically with reference to the process schematic diagrams of (A) to (D). Reference numeral 1 is a melting and holding furnace, in which the ingot is held by melting. From here, it is sent to the twin roll continuous casting machine 2. In other words, a coil of thin plate may be formed directly from the molten aluminum, and may be wound by the coiler 6.
It may be subsequently subjected to heat treatment, a cold rolling mill, and a straightening device.
【0014】これらの製造条件について更に詳しく説明
すると、溶解保持炉1ではアルミニウムの融点以上の温
度に保持させる必要があり、その温度はアルミニウム合
金成分によって適宜変化する。一般に800℃以上であ
る。また、アルミニウム溶湯の酸化物発生の抑制、品質
上有害となるアルカリ金属の除去策として、適宜不活性
ガスパージ、フラックス処理等が行われる。The manufacturing conditions will be described in more detail. In the melting and holding furnace 1, it is necessary to keep the temperature at the melting point of aluminum or higher, and the temperature changes depending on the aluminum alloy component. Generally, it is 800 ° C or higher. Further, as a measure for suppressing the generation of oxides in the molten aluminum and removing the alkali metal that is harmful to the quality, an inert gas purge, a flux treatment, etc. are appropriately performed.
【0015】引き続き双ロール連続鋳造機2によって鋳
造される。鋳造方法にはいろいろあるが、現在工業的に
稼働しているのはハンター法、3C法等が殆どである。
鋳造温度は鋳型の冷却条件で異なるが、700℃付近が
最適である。連続鋳造後の結晶粒径、冷却条件、鋳造速
度、鋳造中の板厚変化量が制御される。以上のようにし
て得られた元板を、冷間圧延機3によって前述した規定
の板厚、即ち連続鋳造圧延後の板厚の2〜8%の厚さと
なるように圧延する。Subsequently, it is cast by the twin roll continuous casting machine 2. There are various casting methods, but most of them currently in industrial use are the Hunter method, the 3C method, and the like.
The casting temperature varies depending on the cooling conditions of the mold, but the optimum temperature is around 700 ° C. The crystal grain size after continuous casting, cooling conditions, casting speed, and plate thickness change during casting are controlled. The original plate obtained as described above is rolled by the cold rolling mill 3 so as to have a prescribed plate thickness described above, that is, a thickness of 2 to 8 % of the plate thickness after continuous casting and rolling.
【0016】その後、熱処理機4により中間焼鈍を行
う。この中間焼鈍では、冷間圧延されコイル状に巻き取
られた元板を加熱炉内に配置するとともに、前述した規
定の昇温速度10℃/sec以下で緩やかに昇温し、規
定の処理温度450〜600℃に所定時間保持すること
が行われる。焼鈍処理された元板は、再び冷間圧延機3
により最終板厚に圧延される。この時の板厚は通常0.
1〜1mm程度であり、設計に応じて適宜圧延される。Thereafter, the heat treatment machine 4 performs intermediate annealing. In this intermediate annealing, the cold rolled and coiled base plate is placed in a heating furnace, and the temperature is gradually raised at a prescribed temperature rising rate of 10 ° C./sec or less to obtain a prescribed processing temperature. Hold at 450 to 600 ° C. for a predetermined time. The annealed base plate is again cold rolled by the cold rolling mill 3
Is rolled to the final plate thickness. The plate thickness at this time is usually 0.
It is about 1 to 1 mm, and is appropriately rolled depending on the design.
【0017】そして、矯正装置5によって矯正を行い、
所定の平面性を与えて平版印刷版用支持体とし、これを
粗面化する。また、矯正は最後の冷間圧延に含めて行う
こともある。本発明における平版印刷版用支持体の粗面
化の方法は機械的粗面化、化学的粗面化、電気化学的粗
面化及びそれらの組合わせ等各種用いられる。Then, straightening is performed by the straightening device 5,
A support for a lithographic printing plate is provided with a predetermined flatness, and the support is roughened. Further, straightening may be included in the final cold rolling. Various methods such as mechanical surface roughening, chemical surface roughening, electrochemical surface roughening, and combinations thereof may be used as the method of surface roughening the lithographic printing plate support of the invention.
【0018】機械的な砂目立て法としては、例えばボー
ルグレイン、ワイヤーグレイン、ブラッシグレイン、液
体ホーニング法などがある。また電気化学的砂目立て方
法としては、交流電解エッチング法が一般的に採用され
ており、電流としては、普通の正弦波交流電流あるいは
矩形波など、特殊交番電流が用いられている。またこの
電気化学的砂目立ての前処理として、苛性ソーダなどで
エッチング処理をしても良い。Mechanical graining methods include, for example, a ball grain method, a wire grain method, a brass grain method and a liquid honing method. An alternating current electrolytic etching method is generally adopted as the electrochemical graining method, and a special alternating current such as an ordinary sinusoidal alternating current or a rectangular wave is used as the current. Further, as a pretreatment for this electrochemical graining, etching treatment with caustic soda may be performed.
【0019】また電気化学的粗面化を行う場合、塩酸ま
たは硝酸主体の水溶液で交番波形電流によって粗面化さ
れるのが良い。以下詳細に説明する。支持体は、先ずア
ルカリエッチングされる。好ましいアルカリ剤は、苛性
ソーダ、苛性カリ、メタ珪酸ソーダ、炭酸ソーダ、アル
ミン酸ソーダ、グルコン酸ソーダ等である。濃度0.0
1〜20%、温度は20〜90℃、時間は5sec〜5
min間の範囲から選択されるのが適当であり、好まし
いエッチング量としては0.1〜5g/m2である。In the case of performing electrochemical surface roughening, it is preferable that the surface is roughened by an alternating waveform current with an aqueous solution mainly containing hydrochloric acid or nitric acid. The details will be described below. The support is first alkali etched. Preferred alkaline agents are caustic soda, caustic potash, sodium metasilicate, sodium carbonate, sodium aluminate, sodium gluconate and the like. Concentration 0.0
1 to 20%, temperature is 20 to 90 ° C, time is 5 sec to 5
It is suitable to be selected from the range of min, and the preferable etching amount is 0.1 to 5 g / m 2 .
【0020】特に不純物の多い支持体の場合、0.01
〜1g/m2が適当である(特開平1−237197号
公報)。引き続き、アルカリエッチングした支持体の表
面にアルカリ剤に不溶な物質(スマット)が残存するの
で、必要に応じてデスマット処理を行っても良い。前処
理は上記の通りであるが、引き続き、塩酸または硝酸を
主体とする電解液中で交流電解エッチングされる。交流
電解電流の周波数としては、0.1〜100Hz、より
好ましくは0.1〜1.0又は10〜60Hzである。Particularly in the case of a support containing a large amount of impurities, 0.01
-1 g / m 2 is suitable (JP-A-1-237197). Subsequently, a substance (smut) which is insoluble in the alkaline agent remains on the surface of the support which has been subjected to the alkali etching, and therefore a desmut treatment may be performed if necessary. The pretreatment is as described above, but is subsequently subjected to AC electrolytic etching in an electrolytic solution containing hydrochloric acid or nitric acid as a main component. The frequency of the alternating electrolysis current is 0.1 to 100 Hz, more preferably 0.1 to 1.0 or 10 to 60 Hz.
【0021】液濃度としては、3〜150g/l、より
好ましくは5〜50g/l、浴内のアルミニウムの溶解
量としては50g/l以下が適当であり、より好ましく
は2〜20g/lである。必要によって添加物を入れて
も良いが、大量生産をする場合は、液濃度制御などが難
しくなる。また、電流密度は、5〜100A/dm2が
適当であるが、10〜80A/dm2がより好ましい。
また、電源波形としては、求める品質、使用される支持
体の成分によって適宜選択されるが、特公昭56−19
280号、特公昭55−19191号各公報に記載の特
殊交番波形を用いるのがより好ましい。この様な波形、
液条件は、電気量とともに求める品質、使用される支持
体の成分などによって適宜選択される。The liquid concentration is 3 to 150 g / l, more preferably 5 to 50 g / l, and the amount of aluminum dissolved in the bath is preferably 50 g / l or less, more preferably 2 to 20 g / l. is there. If necessary, additives may be added, but in the case of mass production, it becomes difficult to control the liquid concentration. A current density of 5 to 100 A / dm 2 is suitable, but 10 to 80 A / dm 2 is more preferable.
Further, the power source waveform is appropriately selected depending on the desired quality and the components of the support to be used.
It is more preferable to use the special alternating waveforms described in JP-B No. 280 and JP-B-55-19191. Waveform like this,
The liquid conditions are appropriately selected depending on the quality required along with the quantity of electricity, the components of the support used, and the like.
【0022】電解粗面化された支持体は、次にスマット
処理の一部としてアルカリ溶液に浸漬しスマットを溶解
する。アルカリ剤としては、苛性ソーダなど各種ある
が、PH10以上、温度25〜60℃、浸漬時間1〜1
0secの極めて短時間で行うことが好ましい。次に硫
酸主体の液に浸漬する。硫酸の液条件としては、従来よ
り一段と低い濃度50〜400g/l、温度25〜65
℃が好ましい。硫酸の濃度を400g/l以上、又は温
度を65℃以上にすると処理槽などの腐食が大きくな
り、しかもマンガン含有量が多い(例えば、0.3重量
%の)支持体では、電気化学的に粗面化された砂目が崩
れてしまう。また、支持体素地の溶解量が0.2g/m
2以上エッチングされると、耐刷力が低下して来るの
で、0.2g/m2以下にすることが好ましい。The electrolytically roughened support is then immersed in an alkaline solution as part of the smut treatment to dissolve the smut. There are various alkali agents such as caustic soda, but pH 10 or higher, temperature 25 to 60 ° C., immersion time 1 to 1
It is preferable to perform it in an extremely short time of 0 sec. Next, it is dipped in a liquid containing mainly sulfuric acid. As the liquid condition of sulfuric acid, the concentration is 50 to 400 g / l, the temperature is 25 to 65, which is much lower than the conventional one.
C is preferred. When the concentration of sulfuric acid is 400 g / l or more or the temperature is 65 ° C. or more, the corrosion of the treatment tank and the like becomes large, and the support containing a large amount of manganese (for example, 0.3% by weight) electrochemically The roughened grain will collapse. In addition, the amount of the base material dissolved is 0.2 g / m
If it is etched by 2 or more, the printing durability will decrease, so it is preferably 0.2 g / m 2 or less.
【0023】陽極酸化皮膜は、0.1〜10g/m2、
より好ましくは0.3〜5g/m2を表面に形成するの
が良い。陽極酸化の処理条件は、使用される電解液によ
って種々変化するので一概には決定されないが、一般的
には電解液の濃度が1〜80重量%、液温5〜70℃、
電流密度0.5〜60A/cm2、電圧1〜100V、
電解時間1秒〜5分の範囲が適当である。The anodic oxide film has a thickness of 0.1 to 10 g / m 2 ,
More preferably, 0.3 to 5 g / m 2 is formed on the surface. The treatment conditions for anodization are not generally determined because they vary depending on the electrolytic solution used, but generally the concentration of the electrolytic solution is 1 to 80% by weight, the liquid temperature is 5 to 70 ° C,
Current density 0.5 to 60 A / cm 2 , voltage 1 to 100 V,
A range of electrolysis time of 1 second to 5 minutes is suitable.
【0024】この様にして得られた陽極酸化皮膜を持つ
砂目の支持体はそれ自身安定で親水性に優れたものであ
るから、直ちに感光性塗膜を上に設ける事も出来るが、
必要により更に表面処理を施す事が出来る。たとえば、
アルカリ金属珪酸塩によるシリケート層あるいは、親水
性高分子化合物よりなる下塗層を設けることができる。
下塗層の塗布量は5〜150mg/m2が好ましい。Since the grain-like support having the anodized film thus obtained is stable and excellent in hydrophilicity, it is possible to immediately form a photosensitive coating film on it.
If necessary, further surface treatment can be performed. For example,
A silicate layer made of an alkali metal silicate or an undercoat layer made of a hydrophilic polymer compound can be provided.
The coating amount of the undercoat layer is preferably 5 to 150 mg / m 2 .
【0025】次に、このように処理した支持体上に感光
性塗膜を設け、画像露光、現像して製版した後に、印刷
機にセットし、印刷を開始する。Next, a photosensitive coating film is provided on the support thus treated, imagewise exposed and developed to form a plate, which is then set in a printing machine to start printing.
【0026】[0026]
【実施例】(実施例−1〜3、比較例−1、2)
図1(A)に示したような双ロール連続鋳造圧延装置に
て、表1に示す板厚の元板を鋳造し、コイラー6で巻き
取った。尚、溶解保持炉1に充填したアルミニウム材料
は、Fe:0.35、Si:0.12、Cu:0.0
1、Ti:0.03(単位:重量%)、残部Alとなる
ようにアルミニウムインゴット及び母合金を用いて調製
した。Examples (Examples 1 to 3 , Comparative Examples 1 and 2) A twin roll continuous casting and rolling apparatus as shown in FIG. 1 (A) was used to cast a base plate having a plate thickness shown in Table 1. It was wound up with a coiler 6. The aluminum material filled in the melting and holding furnace 1 was Fe: 0.35, Si: 0.12, Cu: 0.0.
1, Ti: 0.03 (unit: wt%), balance Al was prepared using an aluminum ingot and a mother alloy.
【0027】その後、図1(B)に示す冷間圧延機3を
用いて各々の板厚とし、引き続き図1(C)に示す熱処
理機4を用いて各々の加熱条件で中間焼鈍を行い、次い
で図1(B)に示す冷間圧延機3により各々の最終板厚
とし、更に図1(D)に示す矯正装置5によって矯正し
て、実施例及び比較例の各サンプルを作製した。After that, the cold rolling mill 3 shown in FIG. 1 (B) was used to obtain each plate thickness, and then the heat treatment machine 4 shown in FIG. 1 (C) was used to perform intermediate annealing under each heating condition. Next, each of the samples of Examples and Comparative Examples was produced by the cold rolling mill 3 shown in FIG. 1 (B) to each final plate thickness and further straightening by the straightening device 5 shown in FIG. 1 (D).
【0028】[0028]
【表1】 [Table 1]
【0029】更に、このようにして出来たサンプルを平
版印刷版用支持体として用い、次に5%苛性ソーダ水溶
液で温度60℃でエッチング量が5g/m2になる様に
エッチングし、水洗後150g/l、50℃の硫酸液中
に20sec浸漬してデスマットし、水洗した。更に、
16g/lの硝酸水溶液中で、特公昭55−19191
号公報に記載の交番波形電流を用いて、電気化学的に粗
面化した。電解条件としては、アノード電圧VA=14
V、カソード電圧VC=12Vとして、陽極時電気量
が、350クーロン/dm2となる様にした。Further, the sample thus produced was used as a support for a lithographic printing plate, and then etched with a 5% aqueous solution of caustic soda at a temperature of 60 ° C. to an etching amount of 5 g / m 2 , and washed with water to give 150 g. It was immersed in a sulfuric acid solution of 1 / l, 50 ° C. for 20 seconds to desmut, and washed with water. Furthermore,
In a 16 g / l nitric acid aqueous solution, Japanese Examined Patent Publication No. 55-19191
The surface was electrochemically roughened using an alternating waveform current described in Japanese Patent Publication No. As the electrolysis conditions, the anode voltage V A = 14
V and cathode voltage V C = 12 V, and the amount of electricity at the anode was set to 350 coulomb / dm 2 .
【0030】引き続き、60℃、300g/lの硫酸液
中に20秒間浸漬してデスマット処理を行った。更に、
硫酸150g/l、アルミニウムイオン濃度2.5g/
lの水溶液中で極間距離150mmにおいて電圧22V
の直流によって60秒間陽極酸化処理を行った。Subsequently, desmut treatment was carried out by immersing in a sulfuric acid solution of 300 g / l at 60 ° C. for 20 seconds. Furthermore,
Sulfuric acid 150g / l, aluminum ion concentration 2.5g /
Voltage of 22V in 1mm aqueous solution at distance between electrodes of 150mm
Anodizing treatment was carried out for 60 seconds with the direct current.
【0031】以上の如くして作成した支持体に、感光液
を塗布することで感光性平版印刷版となるが、ここで
は、感光液塗布前の支持体の表面面質の評価を行った。
感光性平版印刷版に、ネガフィルム又はポジフィルムを
通して露光を行った後現像すると、(一部感光層が取
れ、)支持体の表面自体が平版印刷版の非画像部または
画像部となるため、感光液塗布前の支持体表面の面質自
体が印刷性、印刷版の視認性に大きな影響を与えるから
である。A photosensitive lithographic printing plate is obtained by applying a photosensitive solution to the support prepared as described above. Here, the surface quality of the support before the application of the photosensitive solution was evaluated.
When the photosensitive lithographic printing plate is exposed through a negative film or a positive film and then developed, the surface of the support itself becomes a non-image part or an image part of the lithographic printing plate. This is because the surface quality of the surface of the support before applying the photosensitive solution has a great influence on the printability and the visibility of the printing plate.
【0032】表1に示すサンプルについて、粗面化後に
おける波状ムラの外観評価を行った結果を表1に併記す
る。表1に示した通り、本発明によるサンプル(実施例
−1〜3)は粗面化後の外観が良好となった。一方、本
発明によらないサンプル(比較例−1、2)について
は、波状ムラが確認された。The results of the appearance evaluation of the wavy unevenness after roughening the samples shown in Table 1 are also shown in Table 1. As shown in Table 1, the samples (Examples 1 to 3 ) according to the present invention had a good appearance after roughening. On the other hand, wavy unevenness was confirmed in the samples (Comparative Examples 1 and 2) not according to the present invention.
【0033】[0033]
【発明の効果】以上のように、本発明の平版印刷版用支
持体の製造方法によって製造された平版印刷版は、従来
のものに比べ、波状ムラの無い、外観の優れたものとな
り、粗面化後の面質が著しく向上する。更に、双ロール
連続鋳造法を採用できることで、製造工程が大幅に合理
化されて、製造コストの低減の効果が大きくなる。INDUSTRIAL APPLICABILITY As described above, the lithographic printing plate produced by the method for producing a lithographic printing plate support of the present invention has no wavy unevenness and is excellent in appearance as compared with the conventional ones, The surface quality after surface treatment is significantly improved. Further, since the twin roll continuous casting method can be adopted, the manufacturing process is greatly streamlined, and the effect of reducing the manufacturing cost becomes large.
【図面の簡単な説明】[Brief description of drawings]
【図1】本発明の平版印刷版用支持体の製造方法の一部
工程である。
(A)双ロール連続鋳造工程の一実施態様の側面図。
(B)冷間圧延工程の一実施態様の側面図。
(C)熱処理工程の一実施態様の側面図。
(D)矯正工程の一実施態様の側面図。FIG. 1 is a partial step of a method for producing a lithographic printing plate support of the present invention. (A) A side view of one embodiment of a twin roll continuous casting process. (B) The side view of one embodiment of the cold rolling process. (C) A side view of one embodiment of the heat treatment step. (D) The side view of one embodiment of the correction process.
【図2】元板の段状ムラ及び平版印刷版用支持体の波状
ムラを説明する概念図。FIG. 2 is a conceptual diagram illustrating stepwise unevenness of a base plate and wavy unevenness of a lithographic printing plate support.
1 溶解保持炉 2 双ロール連続鋳造機 3 冷間圧延機 4 熱処理機 5 矯正装置 6 コイラ 7 元板 8 段状のムラ部 9 拡大部分 1 Melt-holding furnace 2 twin roll continuous casting machine 3 cold rolling mill 4 heat treatment machine 5 Straightening device 6 coiler 7 original plate 8 stepped uneven part 9 Enlarged part
フロントページの続き (51)Int.Cl.7 識別記号 FI C22F 1/00 681 C22F 1/00 681 684 684C 691 691A 691B 691C 694 694A (72)発明者 掛井 勤 静岡県榛原郡吉田町川尻4000番地 富士 写真フイルム株式会社内 (72)発明者 上杉 彰男 静岡県榛原郡吉田町川尻4000番地 富士 写真フイルム株式会社内 (56)参考文献 特開 平5−156414(JP,A) 特開 平6−220593(JP,A) 特開 平6−210308(JP,A) (58)調査した分野(Int.Cl.7,DB名) B41N 1/08 C22F 1/04 - 1/057 B22D 11/06 B21B 1/46 Continuation of the front page (51) Int.Cl. 7 Identification symbol FI C22F 1/00 681 C22F 1/00 681 684 684C 691 691A 691B 691C 694 694A (72) Inventor Kakei Shizuoka Prefecture Yoshida-cho 4000 Kawajiri Fuji Photo Film Co., Ltd. (72) Inventor Akio Uesugi 4000 Kawajiri, Yoshida-cho, Haibara-gun, Shizuoka Prefecture Fuji Photo Film Co., Ltd. (56) Reference JP-A-5-156414 (JP, A) JP-A-6-220593 (JP, A) JP-A-6-210308 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) B41N 1/08 C22F 1/04 -1/057 B22D 11/06 B21B 1 / 46
Claims (2)
状に連続鋳造圧延した後、冷間圧延、中間焼鈍を行い、
さらに最終板厚に圧延して矯正を行った後、粗面化する
一連の工程からなる平版印刷版用支持体の製造方法にお
いて、連続鋳造圧延により得られた板を、冷間圧延によ
り連続鋳造圧延後の板厚の2〜8%の厚さにした後、4
50〜600℃の温度で10分間〜10時間の中間焼鈍
を行い、更にその後最終板厚に圧延することを特徴とす
る平版印刷版用支持体の製造方法。1. A molten aluminum melt is continuously cast and rolled into a plate shape by twin rolls, followed by cold rolling and intermediate annealing,
Further, in a method for producing a lithographic printing plate support comprising a series of steps of roughening after rolling to a final plate thickness and straightening, a plate obtained by continuous casting and rolling is continuously cast by cold rolling. After making the thickness 2 to 8 % of the plate thickness after rolling, 4
A method for producing a lithographic printing plate support, which comprises performing intermediate annealing at a temperature of 50 to 600 ° C. for 10 minutes to 10 hours and further rolling to a final plate thickness.
sec以下とすることを特徴とする請求項1記載の平版
印刷版用支持体の製造方法2. The temperature rising rate during the intermediate annealing is 10 ° C. /
The method for producing a support for a lithographic printing plate according to claim 1, wherein the time is not more than sec.
Priority Applications (1)
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JP23540694A JP3414521B2 (en) | 1994-09-29 | 1994-09-29 | Method for producing a lithographic printing plate support |
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JP23540694A JP3414521B2 (en) | 1994-09-29 | 1994-09-29 | Method for producing a lithographic printing plate support |
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JPH0892709A JPH0892709A (en) | 1996-04-09 |
JP3414521B2 true JP3414521B2 (en) | 2003-06-09 |
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JP23540694A Expired - Fee Related JP3414521B2 (en) | 1994-09-29 | 1994-09-29 | Method for producing a lithographic printing plate support |
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Families Citing this family (8)
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JP4410714B2 (en) | 2004-08-13 | 2010-02-03 | 富士フイルム株式会社 | Method for producing support for lithographic printing plate |
ATE395195T1 (en) | 2005-04-13 | 2008-05-15 | Fujifilm Corp | METHOD FOR PRODUCING A PLATE PRINTING PLATE SUPPORT |
JP2009208140A (en) | 2008-03-06 | 2009-09-17 | Fujifilm Corp | Manufacturing method of aluminum alloy sheet for planographic printing plate, aluminum alloy sheet for planographic printing plate and support for planographic printing plate manufactured by the method |
EP2110261B1 (en) | 2008-04-18 | 2018-03-28 | FUJIFILM Corporation | Aluminum alloy plate for lithographic printing plate, ligthographic printing plate support, presensitized plate, method of manufacturing aluminum alloy plate for lithographic printing plate and method of manufacturing lithographic printing plate support |
US8968530B2 (en) | 2008-09-30 | 2015-03-03 | Fujifilm Corporation | Electrolytic treatment method and electrolytic treatment device |
JP2011205051A (en) | 2009-06-26 | 2011-10-13 | Fujifilm Corp | Light-reflecting substrate and process for manufacture thereof |
KR20120109573A (en) | 2009-12-25 | 2012-10-08 | 후지필름 가부시키가이샤 | Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element |
EP2434592A3 (en) | 2010-09-24 | 2014-09-24 | Fujifilm Corporation | Anisotropically conductive member |
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