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JP3408744B2 - Epoxy resin composition for optical semiconductor encapsulation and optical semiconductor device - Google Patents

Epoxy resin composition for optical semiconductor encapsulation and optical semiconductor device

Info

Publication number
JP3408744B2
JP3408744B2 JP14398398A JP14398398A JP3408744B2 JP 3408744 B2 JP3408744 B2 JP 3408744B2 JP 14398398 A JP14398398 A JP 14398398A JP 14398398 A JP14398398 A JP 14398398A JP 3408744 B2 JP3408744 B2 JP 3408744B2
Authority
JP
Japan
Prior art keywords
epoxy resin
resin
optical semiconductor
mold
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP14398398A
Other languages
Japanese (ja)
Other versions
JPH11335524A (en
Inventor
浩史 山中
郁雄 中筋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP14398398A priority Critical patent/JP3408744B2/en
Publication of JPH11335524A publication Critical patent/JPH11335524A/en
Application granted granted Critical
Publication of JP3408744B2 publication Critical patent/JP3408744B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Led Device Packages (AREA)
  • Light Receiving Elements (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、光半導体装置、及
びその製造に使用される光半導体封止用エポキシ樹脂組
成物に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical semiconductor device and an optical semiconductor encapsulating epoxy resin composition used for manufacturing the same.

【0002】[0002]

【従来の技術】半導体装置などの電子部品の封止方法と
して、エポキシ樹脂組成物による封止が広く行われてい
る。このエポキシ樹脂組成物で封止する方法としては、
作業性及び量産性の面で優れているため、一般にトラン
スファー成形が行われている。
2. Description of the Related Art As an encapsulating method for electronic parts such as semiconductor devices, encapsulation with an epoxy resin composition is widely used. As a method of sealing with this epoxy resin composition,
Transfer molding is generally performed because it is excellent in workability and mass productivity.

【0003】なお、フォトトランジスター、フォトダイ
オード、LED、CCD、EPROM等の発光や受光を
伴う光半導体装置を製造するために用いられる光半導体
封止用エポキシ樹脂組成物(以下、封止樹脂と記す)に
は、透明性、密着性、耐熱性、耐湿信頼性及び電気絶縁
性等が優れていることが要求されている。
Incidentally, an epoxy resin composition for optical semiconductor encapsulation (hereinafter referred to as encapsulating resin) used for manufacturing an optical semiconductor device such as a phototransistor, a photodiode, an LED, a CCD, an EPROM which emits light and receives light. ) Is required to have excellent transparency, adhesion, heat resistance, humidity resistance reliability, electrical insulation, and the like.

【0004】また、トランスファー成形で繰り返し封止
すると、封止樹脂の硬化物(以下、樹脂硬化物と記す)
と金型とが接着して離れにくくなる場合があるため、封
止樹脂には離型性が優れていることも要求されており、
封止樹脂にカルナバワックスやモンタン酸ワックス等の
離型剤を配合することにより、金型と樹脂硬化物の離型
性を改良することが検討されている。
Further, when repeatedly sealed by transfer molding, a cured product of a sealing resin (hereinafter referred to as a cured resin product)
Since the mold and the mold may adhere to each other and become difficult to separate, the sealing resin is also required to have excellent mold releasability.
It has been studied to improve the mold releasability of a mold and a resin cured product by adding a mold releasing agent such as carnauba wax or montanic acid wax to the sealing resin.

【0005】なお、光半導体装置を製造するために用い
られる封止樹脂の場合、透明性が優れていることが特に
重要である。そのため、透明性を満足したうえで離型性
を向上させる必要があり、そのために封止樹脂中に相溶
する離型剤を用いる必要があるが、従来から使用されて
いる相溶する離型剤では、離型性や耐湿信頼性が不十分
であるという問題があった。
In the case of a sealing resin used for manufacturing an optical semiconductor device, it is particularly important that it has excellent transparency. Therefore, it is necessary to improve the releasability while satisfying the transparency, and therefore it is necessary to use a release agent compatible with the sealing resin. The agent has a problem that the releasability and the moisture resistance reliability are insufficient.

【0006】そのため、トランスファー成形する前に、
フッ素系やシリコン系の離型剤を、スプレーや塗布によ
り金型の表面に供給した後、トランスファー成形するこ
とにより金型からの離型性を高めることが検討されてい
る。しかし、このような離型剤を金型の表面に供給した
後、トランスファー成形する方法の場合、離型剤を金型
の表面に供給する時間が必要になるため、成形サイクル
が長くなり生産性が低いという問題や、離型剤を金型の
表面に均一に供給するために、一般的に離型剤に溶剤を
含有させる必要があり、この溶剤の蒸発による環境悪化
の恐れがあるという問題があった。
Therefore, before transfer molding,
It has been considered to improve the mold releasability from the mold by supplying a fluorine-based or silicon-based mold release agent to the surface of the mold by spraying or coating and then performing transfer molding. However, in the case of the transfer molding method in which such a mold release agent is supplied to the surface of the mold, it takes time to supply the mold release agent to the surface of the mold, resulting in a longer molding cycle and increased productivity. Is low, and in order to uniformly supply the mold release agent to the surface of the mold, it is generally necessary to include a solvent in the mold release agent, and the problem that this evaporation of the solvent may cause environmental deterioration was there.

【0007】[0007]

【発明が解決しようとする課題】本発明は、上記問題点
を改善するために成されたもので、その目的とするとこ
ろは、エポキシ樹脂、硬化剤、硬化促進剤及び離型剤を
含有する封止樹脂(光半導体封止用エポキシ樹脂組成
物)であって、繰り返して封止する場合であっても金型
と樹脂硬化物との離型性が優れると共に、透明性及び耐
湿信頼性が優れた樹脂硬化物が得られる封止樹脂を提供
することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and its purpose is to contain an epoxy resin, a curing agent, a curing accelerator and a release agent. It is an encapsulating resin (epoxy resin composition for encapsulating optical semiconductors), and even when repeatedly encapsulating, the mold and the resin cured product are excellent in releasability, and transparency and moisture resistance reliability are high. It is an object of the present invention to provide an encapsulating resin that gives an excellent cured resin.

【0008】また、金型との離型性が優れると共に、透
明性及び耐湿信頼性が優れた光半導体装置を提供するこ
とを目的とする。
It is another object of the present invention to provide an optical semiconductor device which is excellent in mold releasability from a mold and is excellent in transparency and moisture resistance reliability.

【0009】[0009]

【課題を解決するための手段】本発明の請求項1に係る
封止樹脂(光半導体封止用エポキシ樹脂組成物)は、エ
ポキシ樹脂、硬化剤、硬化促進剤及び離型剤を含有する
封止樹脂において、離型剤として、下記式(a)で表さ
れ、且つ、下記式(c)で表される構造部分の重量分率
が40〜90重量%である化合物を含有することを特徴
とする。
The encapsulating resin (epoxy resin composition for optical semiconductor encapsulation) according to claim 1 of the present invention is an encapsulating resin containing an epoxy resin, a curing agent, a curing accelerator and a release agent. In the stop resin, a compound having a weight fraction of a structural portion represented by the following formula (a ) and represented by the following formula (c) of 40 to 90% by weight is contained as a release agent. And

【0010】[0010]

【化2】 [Chemical 2]

【0011】本発明の請求項2に係る封止樹脂は、請求
項1記載の封止樹脂において、上記式(a)で表される
化合物の平均分子量が、500〜3000であることを
特徴とする。
The encapsulating resin according to claim 2 of the present invention is the encapsulating resin according to claim 1, wherein the compound represented by the formula (a ) has an average molecular weight of 500 to 3000. To do.

【0012】本発明の請求項3に係る光半導体装置は、
請求項1又は請求項2記載の封止樹脂を用いて、半導体
チップを封止してなる。
An optical semiconductor device according to claim 3 of the present invention is
A semiconductor chip is sealed with the sealing resin according to claim 1 or 2.

【0013】上記式(a)で表され、且つ、上記式
(c)で表される構造部分の重量分率が40〜90重量
%である化合物は、エポキシ樹脂等と混合したときに白
濁しにくいと共に、耐湿信頼性を低下させにくい化合物
であるため、本発明に係る封止樹脂を用いると、透明性
が優れると共に耐湿信頼性が優れた樹脂硬化物が得られ
る。更にこの化合物は、離型性能をも持ち合わせている
ため、金型と樹脂硬化物との離型性が優れた封止が可能
となる。
The compound represented by the above formula (a ) and having a weight fraction of the structural portion represented by the above formula (c) of 40 to 90% by weight becomes cloudy when mixed with an epoxy resin or the like. Since it is a compound that is difficult and does not easily reduce the moisture resistance reliability, the use of the sealing resin according to the present invention provides a cured resin product having excellent transparency and moisture resistance reliability. Furthermore, since this compound also has a releasing property, it is possible to perform sealing with excellent releasing property between the mold and the resin cured product.

【0014】[0014]

【発明の実施の形態】本発明に係る封止樹脂は、少なく
ともエポキシ樹脂、硬化剤、硬化促進剤、及び、離型剤
として上記式(a)で表され、且つ、上記式(c)で表
される構造部分の重量分率が40〜90重量%である化
合物(以下、これをA化合物と記す)を含有してなる。
このA化合物を含有していることが重要であり、含有し
ていない場合は、繰り返して封止した場合に金型と樹脂
硬化物との離型性が低下したり、得られる樹脂硬化物が
白濁して透明性が低下したり、得られる樹脂硬化物の耐
湿信頼性が低下しやすくなる。
BEST MODE FOR CARRYING OUT THE INVENTION The encapsulating resin according to the present invention is represented by the above formula (a ) as at least an epoxy resin, a curing agent, a curing accelerator, and a release agent, and is represented by the above formula (c). It comprises a compound having a weight fraction of the structural portion represented by 40 to 90% by weight (hereinafter, referred to as A compound).
It is important to contain this A compound, and when it is not contained, the mold releasability between the mold and the resin cured product is lowered when repeatedly sealed, and the obtained resin cured product is It tends to become cloudy and the transparency is lowered, or the moisture resistance reliability of the obtained resin cured product is likely to be lowered.

【0015】なお、上記式(c)で表される構造部分の
重量分率が40重量%未満の場合は、樹脂硬化物の透明
性が低下しやすくなり、90重量%を越える場合は、離
型性が低下しやすくなったり、樹脂硬化物の吸湿性が高
まるため、耐湿信頼性等が低下する恐れがある。なお、
この式(c)で表される構造部分の重量分率とは、A化
合物の分子量中に占める式(c)で表される構造部分の
分子量の比率を表し、例えば、A化合物の分子量が14
00で、式(c)で表される構造部分の分子量が700
の場合、50重量%となる。
When the weight fraction of the structural part represented by the above formula (c) is less than 40% by weight, the transparency of the cured resin tends to be lowered, and when it exceeds 90% by weight, it is separated. The moldability is likely to be lowered, and the moisture absorption of the resin cured product is increased, so that the moisture resistance reliability and the like may be lowered. In addition,
The weight fraction of the structural portion represented by the formula (c) represents the ratio of the molecular weight of the structural portion represented by the formula (c) to the molecular weight of the A compound, and for example, the molecular weight of the A compound is 14
00, the molecular weight of the structural part represented by the formula (c) is 700
In the case of, it becomes 50% by weight.

【0016】なお、A化合物は、平均分子量が500〜
3000であると、安定した離型性と透明性が得られ好
ましい。500未満の場合は、離型性が低下しやすくな
り、3000を越える場合は、樹脂硬化物の透明性が低
下しやすくなる。
The compound A has an average molecular weight of 500 to
When it is 3,000, stable releasability and transparency are obtained, which is preferable. If it is less than 500, the releasability tends to decrease, and if it exceeds 3000, the transparency of the resin cured product tends to decrease.

【0017】また、このA化合物の配合量としては、封
止樹脂100重量部に対して、0.1〜5重量部配合し
ていることが好ましい。0.1重量部未満の場合は、金
型と樹脂硬化物との離型性を改良する効果が小さく、5
重量部を越える場合は、樹脂硬化物の透明性が低下しや
すくなったり、半導体チップと樹脂硬化物の接着強度が
低下して耐湿信頼性等が低下する恐れがある。
Further, the compounding amount of the compound A is preferably 0.1 to 5 parts by weight with respect to 100 parts by weight of the sealing resin. If the amount is less than 0.1 parts by weight, the effect of improving the releasability between the mold and the resin cured product is small.
If it exceeds the weight part, the transparency of the resin cured product may be easily reduced, or the adhesive strength of the semiconductor chip and the resin cured product may be reduced to lower the moisture resistance reliability and the like.

【0018】なお、離型剤としては、A化合物のみを配
合していることに限定するものではなく、本発明の目的
を損なわない程度であれば、必要に応じて天然カルナバ
や、上記式(a)で表されるが、上記式(c)で表され
る構造部分の重量分率が40重量%未満の化合物等をも
配合してもよい。
The release agent is not limited to the one containing only the compound A, and may be natural carnauba or the above formula () as long as the object of the present invention is not impaired. Although represented by a), a compound in which the weight fraction of the structural portion represented by the above formula (c) is less than 40% by weight may be added.

【0019】本発明で使用するエポキシ樹脂としては、
分子内にエポキシ基を2個以上有するエポキシ樹脂を含
有していれば特に限定するものではなく、例えばビスフ
ェノールA型エポキシ樹脂、ビスフェノールF型エポキ
シ樹脂、ビスフェノールS型エポキシ樹脂、オルソクレ
ゾールノボラック型エポキシ樹脂、フェノールノボラッ
ク型エポキシ樹脂、ビフェニル型エポキシ樹脂、脂環式
エポキシ樹脂、線状脂肪族エポキシ樹脂、複素環式エポ
キシ樹脂、トリグリシジルイソシアヌレート等が挙げら
れ、これらを単独で用いても、2種類以上を併用しても
よい。なお、使用するエポキシ樹脂としては、比較的着
色の少ないものを用いると、樹脂硬化物の透明性が優れ
好ましい。
The epoxy resin used in the present invention includes:
It is not particularly limited as long as it contains an epoxy resin having two or more epoxy groups in the molecule. For example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, orthocresol novolac type epoxy resin. , Phenol novolac type epoxy resin, biphenyl type epoxy resin, alicyclic epoxy resin, linear aliphatic epoxy resin, heterocyclic epoxy resin, triglycidyl isocyanurate, and the like. You may use together the above. It is preferable to use an epoxy resin that is relatively less colored as the epoxy resin to be used because the cured product of the resin is excellent in transparency.

【0020】本発明で使用する硬化剤としては、エポキ
シ樹脂と反応して硬化させるものであれば特に限定する
ものではなく、例えば無水ヘキサヒドロフタル酸、無水
メチルヘキサヒドロフタル酸、無水テトラヒドロフタル
酸等の酸無水物や、フェノール、クレゾール、キシレノ
ール、レゾルシン等とホルムアルデヒドとを縮合反応さ
せて得られるノボラック型樹脂等が挙げられる。上記硬
化剤は、単独で用いても、2種類以上を併用してもよ
い。なお、使用する硬化剤としても、比較的着色の少な
いものを用いると、樹脂硬化物の透明性が優れ好まし
い。なお、アミン系硬化剤をも配合しても良いが、アミ
ン系硬化剤を用いると、一般的に樹脂硬化物の着色が大
きくなるため、使用する際には配合量等に注意する必要
がある。硬化剤の配合量としては、エポキシ樹脂に対し
て当量比で0.5〜5の範囲で一般に配合されるが、
0.7〜1.3程度が好ましい。
The curing agent used in the present invention is not particularly limited as long as it cures by reacting with an epoxy resin, and examples thereof include hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, and tetrahydrophthalic anhydride. Examples thereof include acid anhydrides and the like, and novolac resins obtained by condensation reaction of phenol, cresol, xylenol, resorcin and the like with formaldehyde. The above curing agents may be used alone or in combination of two or more. It should be noted that it is preferable to use a curing agent having relatively little coloring as the curing agent to be used because the cured resin product has excellent transparency. An amine-based curing agent may be added, but when an amine-based curing agent is used, coloring of the resin cured product generally becomes large. Therefore, it is necessary to pay attention to the amount of the composition when used. . The amount of the curing agent is generally 0.5 to 5 in terms of an equivalent ratio to the epoxy resin.
About 0.7 to 1.3 is preferable.

【0021】本発明で使用する硬化促進剤としては、エ
ポキシ樹脂と硬化剤との反応を促進させるものであれば
特に限定するものではなく、例えばトリフェニルホスフ
ィン、ジフェニルホスフィン等の有機ホスフィン系化合
物、2−メチルイミダゾール、2−エチル−4−メチル
イミダゾール、2−フェニルイミダゾール等のイミダゾ
ール系化合物、1,8−ジアザ−ビシクロ(5,4,
0)ウンデセン−7、トリエタノールアミン、ベンジル
ジメチルアミン等の三級アミン系化合物、テトラフェニ
ルホスホニウムテトラフェニルボレート、トリフェニル
ホスフィンテトラフェニルボレート等のテトラフェニル
ボレート系化合物が挙げられる。上記硬化促進剤は、単
独で用いても、2種類以上を併用してもよい。なお、使
用する硬化促進剤としても、比較的着色の少ないものを
用いると、樹脂硬化物の透明性が優れ好ましい。
The curing accelerator used in the present invention is not particularly limited as long as it accelerates the reaction between the epoxy resin and the curing agent, and examples thereof include organic phosphine compounds such as triphenylphosphine and diphenylphosphine. Imidazole compounds such as 2-methylimidazole, 2-ethyl-4-methylimidazole and 2-phenylimidazole, 1,8-diaza-bicyclo (5,4,4)
0) tertiary amine compounds such as undecene-7, triethanolamine and benzyldimethylamine, and tetraphenylborate compounds such as tetraphenylphosphonium tetraphenylborate and triphenylphosphine tetraphenylborate. The above curing accelerators may be used alone or in combination of two or more. It should be noted that it is preferable to use, as the curing accelerator to be used, one having relatively little coloring, because the cured resin product has excellent transparency.

【0022】本発明の封止樹脂には、必要に応じて、無
機充填材、変色防止剤、酸化防止剤、難燃剤、着色剤、
変性剤、可塑剤及び希釈剤等を含有することもできる。
なお、無機充填材としては、例えば結晶シリカ、溶融シ
リカ、アルミナ等が挙げられる。
In the encapsulating resin of the present invention, if necessary, an inorganic filler, a discoloration preventing agent, an antioxidant, a flame retardant, a coloring agent,
It may also contain modifiers, plasticizers, diluents and the like.
Examples of the inorganic filler include crystalline silica, fused silica, alumina and the like.

【0023】本発明の封止樹脂は、上記含有物が均一に
混合されていることが好ましい。室温で固体状の封止樹
脂を製造する場合には、例えば、ホモミキサー等の高速
攪拌装置や、3本ロール等を用いて加熱して混練した
後、冷却、粉砕し、必要に応じてタブレット状に打錠す
るなどの方法で製造する。また、室温で液体状の封止樹
脂を製造する場合には、例えば攪拌装置を用いて、必要
に応じて加熱しながら混合した後、必要に応じて冷却す
ることにより製造する。
It is preferable that the encapsulating resin of the present invention has the above-mentioned contents uniformly mixed. In the case of producing a solid sealing resin at room temperature, for example, a high-speed stirring device such as a homomixer or a three-roll mill is used to heat and knead the mixture, followed by cooling and crushing, and optionally a tablet. It is manufactured by a method such as tableting into a shape. Further, when the liquid sealing resin is produced at room temperature, it is produced by, for example, using a stirrer, mixing while heating if necessary, and then cooling if necessary.

【0024】そして、上記で得られた封止樹脂を用い
て、室温で固体状の封止樹脂の場合にはトランスファー
成形等を行い、室温で液体状の封止樹脂の場合にはキャ
スティング法やポッティング法等を行い半導体チップを
封止すると、金型との離型性が優れると共に、透明性及
び耐湿信頼性が優れた光半導体装置(本発明の請求項3
に係る光半導体装置)が得られる。なお成形する方法と
しては、上記封止樹脂を用いること以外は特に限定する
ものではなく、一般の方法で成形が可能である。
Then, using the sealing resin obtained above, transfer molding or the like is carried out in the case of a solid sealing resin at room temperature, and a casting method or the like is carried out in the case of a liquid sealing resin at room temperature. When a semiconductor chip is sealed by a potting method or the like, an optical semiconductor device having excellent releasability from a mold and excellent transparency and moisture resistance reliability (claim 3 of the present invention is provided.
Optical semiconductor device according to the present invention. The molding method is not particularly limited except that the above sealing resin is used, and a general method can be used.

【0025】[0025]

【実施例】(実施例1〜) 封止樹脂の原料として、下記のエポキシ樹脂3種類、硬
化剤、硬化促進剤及び離型剤3種類を用いた。 ・エポキシ樹脂1:ビスフェノールA型エポキシ樹脂
[油化シェルエポキシ社製、商品名827、エポキシ当
量185]と、 ・エポキシ樹脂2:3官能エポキシ樹脂[三井石油化学
社製、商品名VG3101H、エポキシ当量210]
と、 ・エポキシ樹脂3:3官能エポキシ樹脂[日産化学工業
社製、商品名TEPIC、エポキシ当量105]と、 ・硬化剤:無水ヘキサヒドロフタル酸と、 ・硬化促進剤:メチルトリフェニルホスホニウムブロマ
イドと、 ・離型剤1:上記式(a)で表され、且つ、上記式
(c)で表される構造部分の重量分率が50重量%であ
る化合物(平均分子量1400)と、 ・離型剤2:上記式(a)で表され、且つ、上記式
(c)で表される構造部分の重量分率が60重量%であ
る化合物(平均分子量1800)と、 ・離型剤3:上記式(a)で表され、且つ、上記式
(c)で表される構造部分の重量分率が80重量%であ
る化合物(平均分子量2400)。
[Examples] (Examples 1 to 6 ) The following three kinds of epoxy resins, a curing agent, a curing accelerator, and three types of release agents were used as raw materials for the sealing resin. -Epoxy resin 1: bisphenol A type epoxy resin [Okaka Shell Epoxy Co., Ltd., trade name 827, epoxy equivalent 185], and-Epoxy resin 2: trifunctional epoxy resin [Mitsui Petrochemical Co., Ltd., trade name VG3101H, epoxy equivalent]. 210]
Epoxy resin 3: trifunctional epoxy resin [manufactured by Nissan Chemical Industries, trade name TEPIC, epoxy equivalent 105], curing agent: hexahydrophthalic anhydride, curing accelerator: methyltriphenylphosphonium bromide Releasing agent 1: a compound (average molecular weight 1400) represented by the above formula (a) and having a weight fraction of the structural portion represented by the above formula (c) of 50% by weight; Agent 2: a compound represented by the above formula (a) and having a weight fraction of the structural portion represented by the above formula (c) of 60% by weight (average molecular weight 1800), and a releasing agent 3: the above A compound represented by the formula (a) and having a weight fraction of the structural portion represented by the formula (c) of 80% by weight (average molecular weight 2400 ).

【0026】上記の各原料を表1に示す重量部配合した
後、ホモミキサー攪拌装置を用いて、温度120℃で5
分間混練し、次いで冷却した後、粉砕した。そしてその
粉砕物をタブレット状に打錠して封止樹脂を得た。
After blending each of the above-mentioned raw materials in parts by weight shown in Table 1, the mixture was mixed at a temperature of 120 ° C. with a homomixer stirrer.
It was kneaded for a minute, then cooled and then crushed. Then, the crushed product was compressed into tablets to obtain a sealing resin.

【0027】(比較例1)離型剤として、モンタン酸ワ
ックス[ヘキスト社製、商品名ワックスS](離型剤
6)を用いたこと以外は、実施例2と同様にして封止樹
脂を得た。
Comparative Example 1 A sealing resin was prepared in the same manner as in Example 2 except that montanic acid wax [Wax S, trade name, manufactured by Hoechst Co., Ltd.] (mold release agent 6) was used as the mold release agent. Obtained.

【0028】(比較例2)離型剤として、平均分子量が
750であり、下記式(d)で表される化合物(離型剤
7)を用いたこと以外は、実施例2と同様にして封止樹
脂を得た。なお、この離型剤7は、上記式(c)で表さ
れる構造部分の重量分率が0重量%の化合物とも言える
化合物である。
(Comparative Example 2) The same procedure as in Example 2 was repeated except that a compound (release agent 7) having an average molecular weight of 750 and represented by the following formula (d) was used as the release agent. A sealing resin was obtained. The release agent 7 is a compound in which the weight fraction of the structural portion represented by the above formula (c) is 0% by weight.

【0029】[0029]

【化3】 [Chemical 3]

【0030】(比較例3)離型剤として、平均分子量が
1500であり、上記式(a)で表されるが、上記式
(c)で表される構造部分の重量分率が20重量%の化
合物(離型剤8)を用いたこと以外は、実施例2と同様
にして封止樹脂を得た。
(Comparative Example 3) The release agent has an average molecular weight of 1500 and is represented by the above formula (a), but the weight fraction of the structural portion represented by the above formula (c) is 20% by weight. A sealing resin was obtained in the same manner as in Example 2 except that the compound (release agent 8) in Example 1 was used.

【0031】(比較例4)離型剤として、平均分子量が
1500であり、上記式(a)で表されるが、上記式
(c)で表される構造部分の重量分率が20重量%の化
合物(離型剤8)を用いたこと以外は、実施例6と同様
にして封止樹脂を得た。
(Comparative Example 4) The release agent has an average molecular weight of 1500 and is represented by the above formula (a), and the weight fraction of the structural portion represented by the above formula (c) is 20% by weight. A sealing resin was obtained in the same manner as in Example 6 except that the compound (release agent 8) was used.

【0032】[0032]

【表1】 [Table 1]

【0033】(評価)各実施例及び各比較例で得られた
封止樹脂を用いて、評価用サンプルを下記の方法で作製
し、光透過率、白濁性、離型性、密着性及び耐湿信頼性
を下記の方法で測定した。
(Evaluation) Using the sealing resins obtained in each of the examples and each of the comparative examples, a sample for evaluation was prepared by the following method, and the light transmittance, white turbidity, releasability, adhesion and moisture resistance were obtained. The reliability was measured by the following method.

【0034】光透過率は、トランスファー成形機を用い
て、注入時間20秒、注入圧力7.85MPa、金型温
度165℃、キュア時間90秒の条件で成形して、厚み
1mmの評価用サンプルを作製した。そして得られた評
価用サンプルを、分光光度計(日立製作所社製、U−3
400)を用いて、940nmの光透過率を測定した。
The light transmittance was measured by using a transfer molding machine under the conditions of an injection time of 20 seconds, an injection pressure of 7.85 MPa, a mold temperature of 165 ° C., and a cure time of 90 seconds, and an evaluation sample having a thickness of 1 mm was obtained. It was made. Then, the obtained evaluation sample was spectrophotometer (U-3 manufactured by Hitachi, Ltd.).
400) was used to measure the light transmittance at 940 nm.

【0035】白濁性は、光透過率と同様にして成形した
厚み1〜8mmの評価用サンプルを、白色紙にBの鉛筆
で記入した線の上に置き、8mmの評価用サンプルを通
して線が見えた場合を○、8mmでは見えないが5mm
の評価用サンプルを通して線が見えた場合を△、5mm
の評価用サンプルを通して線が見えない場合を×とし
た。
As for the cloudiness, a sample for evaluation having a thickness of 1 to 8 mm, which was molded in the same manner as the light transmittance, was placed on the line marked with a pencil of B on white paper, and the line was seen through the sample for evaluation of 8 mm. In case of 8 mm, not visible at 8 mm but 5 mm
If a line is visible through the sample for evaluation of △, 5mm
The case where no line was visible through the evaluation sample was marked with x.

【0036】離型性は、半導体チップ(4×5mm、ア
ルミニウムパターンチップ、窒化珪素膜、5μm配線
幅)をリードフレーム(42アロイ合金の一部に銀メッ
キを施したもの)に搭載して、25μmの金線で両者を
接続したものを、光透過率と同様の条件で成形して封止
して、16DPI型の評価用サンプルを作製した。そし
て、この成形を繰り返し、スムーズに脱型する連続成形
回数を求め、離型性の値とした。なお、100回繰り返
しても、スムーズに脱型する場合は、○とした。
The releasability is obtained by mounting a semiconductor chip (4 × 5 mm, aluminum pattern chip, silicon nitride film, 5 μm wiring width) on a lead frame (42 alloy alloy with a part of silver plated). A 16 DPI-type evaluation sample was prepared by molding a structure in which both were connected with a 25 μm gold wire under the same conditions as the light transmittance and sealing. Then, this molding was repeated, and the number of times of continuous molding for smoothly releasing the mold was determined and used as the value of the releasability. In addition, in the case of smoothly releasing the mold even after repeating 100 times, it was marked with ◯.

【0037】耐湿信頼性は、離型性の評価用に成形した
評価用サンプルを20個抜き取り、125℃で12時間
アフターキュアーした後、60℃95%の恒温恒湿槽に
投入した。そして、250時間毎に取り出してオープン
・ショ−トを評価し、累積不良が10%を越える処理時
間を求めて、耐湿信頼性の値とした。なお、1000時
間処理しても10%に達しない場合は、○とした。
Regarding moisture resistance reliability, 20 evaluation samples molded for evaluation of mold releasability were taken out, after-cured at 125 ° C. for 12 hours, and then put into a constant temperature and constant humidity chamber of 60 ° C. and 95%. Then, it was taken out every 250 hours, the open short was evaluated, and the processing time at which the cumulative defects exceeded 10% was determined and taken as the value of the moisture resistance reliability. In addition, when it did not reach 10% after 1000 hours of treatment, it was rated as ◯.

【0038】(結果)結果は表1に示したように、各実
施例は各比較例と比べて光透過率及び白濁性が優れてお
り、本発明に係る封止樹脂を用いると、透明性が優れた
樹脂硬化物が得られることが確認された。また、各実施
例は各比較例と比べて離型性及び耐湿信頼性が同等又は
優れており、繰り返して封止する場合であっても、金型
と樹脂硬化物との離型性が優れると共に、耐湿信頼性が
優れた樹脂硬化物が得られることが確認された。
(Results) As shown in Table 1, the results of each example are superior in light transmittance and white turbidity as compared with each of the comparative examples, and when the encapsulating resin according to the present invention is used, the transparency is improved. It was confirmed that an excellent resin cured product was obtained. Further, each of the examples has the same or excellent releasability and moisture resistance reliability as compared with each of the comparative examples, and even when repeatedly sealing, the releasability of the mold and the resin cured product is excellent. At the same time, it was confirmed that a cured resin product having excellent moisture resistance reliability was obtained.

【0039】[0039]

【発明の効果】本発明の請求項1及び請求項2に係る封
止樹脂(光半導体封止用エポキシ樹脂組成物)は、離型
剤としてA化合物を配合しているため、繰り返して封止
する場合であっても金型と樹脂硬化物との離型性が優れ
ると共に、透明性及び耐湿信頼性が優れた樹脂硬化物が
得られる。
The encapsulating resin (epoxy resin composition for encapsulating an optical semiconductor) according to the first and second aspects of the present invention contains the compound A as a release agent, and therefore encapsulation is repeated. Even in such a case, a resin cured product having excellent releasability between the mold and the resin cured product and having excellent transparency and moisture resistance reliability can be obtained.

【0040】本発明の請求項3に係る光半導体装置は、
本発明の請求項1又は請求項2記載の封止樹脂を用いて
いるため、金型との離型性が優れると共に、透明性及び
耐湿信頼性が優れた光半導体装置となる。
An optical semiconductor device according to claim 3 of the present invention is
Since the encapsulating resin according to claim 1 or 2 of the present invention is used, the optical semiconductor device is excellent in mold releasability from the mold, and excellent in transparency and moisture resistance reliability.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平9−208805(JP,A) 特開 平3−287641(JP,A) 特開 平11−302499(JP,A) 特開 平11−43493(JP,A) 特開 平9−176373(JP,A) 特開 平1−215905(JP,A) (58)調査した分野(Int.Cl.7,DB名) C08L 63/00 - 63/10 C08K 5/521 C08L 71/02 - 71/03 H01L 23/29 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) Reference JP-A-9-208805 (JP, A) JP-A-3-287641 (JP, A) JP-A-11-302499 (JP, A) JP-A-11- 43493 (JP, A) JP 9-176373 (JP, A) JP 1-215905 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) C08L 63/00-63 / 10 C08K 5/521 C08L 71/02-71/03 H01L 23/29

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 エポキシ樹脂、硬化剤、硬化促進剤及び
離型剤を含有する光半導体封止用エポキシ樹脂組成物に
おいて、離型剤として、下記式(a)で表され、且つ、
下記式(c)で表される構造部分の重量分率が40〜9
0重量%である化合物を含有することを特徴とする光半
導体封止用エポキシ樹脂組成物。 【化1】
1. An epoxy resin composition for optical-semiconductor encapsulation containing an epoxy resin, a curing agent, a curing accelerator and a release agent, which is represented by the following formula (a ) as a release agent, and:
The weight fraction of the structural portion represented by the following formula (c) is 40 to 9
An epoxy resin composition for encapsulating an optical semiconductor, comprising 0% by weight of a compound. [Chemical 1]
【請求項2】 上記式(a)で表される化合物の平均分
子量が、500〜3000であることを特徴とする請求
項1記載の光半導体封止用エポキシ樹脂組成物。
2. The epoxy resin composition for optical-semiconductor encapsulation according to claim 1, wherein the compound represented by the formula (a ) has an average molecular weight of 500 to 3,000.
【請求項3】 請求項1又は請求項2記載の光半導体封
止用エポキシ樹脂組成物を用いて、半導体チップを封止
してなる光半導体装置。
3. An optical semiconductor device obtained by encapsulating a semiconductor chip using the epoxy resin composition for encapsulating an optical semiconductor according to claim 1.
JP14398398A 1998-05-26 1998-05-26 Epoxy resin composition for optical semiconductor encapsulation and optical semiconductor device Expired - Lifetime JP3408744B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14398398A JP3408744B2 (en) 1998-05-26 1998-05-26 Epoxy resin composition for optical semiconductor encapsulation and optical semiconductor device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
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Publications (2)

Publication Number Publication Date
JPH11335524A JPH11335524A (en) 1999-12-07
JP3408744B2 true JP3408744B2 (en) 2003-05-19

Family

ID=15351592

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
JP (1) JP3408744B2 (en)

Also Published As

Publication number Publication date
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