JP3455501B2 - Beam forming slit - Google Patents
Beam forming slitInfo
- Publication number
- JP3455501B2 JP3455501B2 JP2000212421A JP2000212421A JP3455501B2 JP 3455501 B2 JP3455501 B2 JP 3455501B2 JP 2000212421 A JP2000212421 A JP 2000212421A JP 2000212421 A JP2000212421 A JP 2000212421A JP 3455501 B2 JP3455501 B2 JP 3455501B2
- Authority
- JP
- Japan
- Prior art keywords
- shape
- size
- slit
- shield
- rotating shaft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007493 shaping process Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、加速器、ビーム照
射装置、イオン注入装置などで得られる電子ビームやイ
オンビームの大きさや形状を成形するためのビーム成形
スリットに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a beam shaping slit for shaping the size and shape of an electron beam or an ion beam obtained by an accelerator, a beam irradiation device, an ion implantation device or the like.
【０００２】[0002]
【従来の技術】加速器、ビーム照射装置、イオン注入装
置などで得られる電子ビームやイオンビームは、通常、
その用途によって要求される大きさや形状が異なるた
め、用途に応じてビームの大きさや形状を規制（成形）
して、照射に供される。2. Description of the Related Art Electron beams and ion beams obtained by accelerators, beam irradiation devices, ion implantation devices, etc. are usually
Since the size and shape required depend on the application, the size and shape of the beam are regulated (molded) according to the application.
And then subjected to irradiation.
【０００３】このような成形を行う場合、ビームが通過
できる開口部分の形状が可変であるスリットやコリメー
タを使用するのが一般的である。When performing such shaping, it is general to use a slit or a collimator in which the shape of the opening through which the beam can pass is variable.
【０００４】例えば、図１に示すごとく、遮蔽板１０
に、数種類の円形スリット１２を直線的に並べて配置
し、これを直線駆動装置１４により、ビームライン８と
直交する方向から直線的に移動して所定の位置まで挿入
し、所望の円形開口を有するスリットを得る方法があ
る。For example, as shown in FIG. 1, the shielding plate 10
, Several kinds of circular slits 12 are arranged in a line and are linearly moved by a linear drive device 14 from a direction orthogonal to the beam line 8 to be inserted to a predetermined position to have a desired circular opening. There is a way to get a slit.
【０００５】あるいは、図２に示すごとく、上下左右方
向に出し入れができる遮蔽板２０を、直線駆動装置２２
により、ビームライン８と直交する方向から、それぞれ
直線的に移動して所定の位置まで挿入し、所望の矩形開
口を有するスリットが得られるよう調整する方法もあ
る。Alternatively, as shown in FIG. 2, the shield plate 20 which can be taken in and out vertically and horizontally is provided with a linear drive device 22.
Therefore, there is also a method of linearly moving from the direction orthogonal to the beam line 8 and inserting each to a predetermined position, and adjusting so as to obtain a slit having a desired rectangular opening.
【０００６】[0006]
【発明が解決しようとする課題】しかしながら、いずれ
の方法も直線駆動方式であるため、比較的設置スペース
が広い場合には適用可能であるが、そうでない場合には
適用できない。又、図１の場合は、遮蔽板１０の移動距
離が大きいため、スリットの切換えに時間が掛かり、迅
速な切換えができないだけでなく、移動時の位置決め精
度を出しにくい。又、図２の場合は、駆動軸数が多いた
め、制御が複雑になる等の問題点を有していた。However, since all the methods are linear drive methods, they can be applied when the installation space is relatively large, but cannot be applied when they are not. In addition, in the case of FIG. 1, since the moving distance of the shielding plate 10 is long, it takes time to switch the slits, and it is not possible to perform the rapid switching, and it is difficult to obtain the positioning accuracy during the movement. Further, in the case of FIG. 2, there are problems that the control becomes complicated because the number of drive axes is large.
【０００７】本発明は、前記従来の問題点を解決するべ
くなされたもので、限られた狭い設置スペースにおい
て、開口部の形状が異なる数種類のスリットを、迅速に
切換え可能とすることを課題とする。The present invention has been made to solve the above-mentioned conventional problems, and it is an object of the present invention to make it possible to quickly switch between several kinds of slits having different opening shapes in a limited narrow installation space. To do.
【０００８】[0008]
【課題を解決するための手段】本発明は、ビームの大き
さや形状を形成するためのビーム成形スリットにおい
て、ビームラインから離れた位置に配置される単一の回
動軸と、該回動軸のまわりに配設される、大きさや形状
が互いに異なるビーム通過用の開口が形成された、複数
の遮蔽板と、前記回動軸を回動して、ビームラインに挿
入される遮蔽板を切換えるための回動手段とを備え、前
記回動軸を回動することにより、遮蔽板を通過したビー
ムの大きさや形状を変更可能として、前記課題を解決し
たものである。SUMMARY OF THE INVENTION The present invention relates to a beam forming slit for forming the size and shape of a beam, and a single rotating shaft arranged at a position distant from the beam line, and the rotating shaft. A plurality of shield plates, which are provided around the window and have openings for beam passage having different sizes and shapes, and a plurality of shield plates which are inserted into the beam line by rotating the rotary shaft. The above-mentioned problem is solved by rotating the rotating shaft for changing the size and shape of the beam that has passed through the shield plate.
【０００９】又、前記遮蔽板に形成されるビーム通過用
開口の大きさや形状を変更可能として、汎用性を高めた
ものである。Further, the size and shape of the beam passage opening formed on the shielding plate can be changed to enhance versatility.
【００１０】[0010]
【発明の実施の形態】以下図面を参照して、本発明の実
施形態を詳細に説明する。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described in detail below with reference to the drawings.
【００１１】本実施形態は、図３に示すごとく、ビーム
ライン８から離れた位置に配置される単一の回動軸３０
と、該回動軸３０のまわりに配設される、大きさや形状
が互いに異なるビーム通過用の開口が形成された、複数
（図では４枚）の羽根状の遮蔽板３２と、前記回動軸３
０を回動して、ビームライン８に挿入される遮蔽板を切
換えるための回転駆動装置３４とを備え、前記回動軸３
０を回動することにより、遮蔽板３２を通過したビーム
の大きさや形状が変更できるようにしたものである。In this embodiment, as shown in FIG. 3, a single rotary shaft 30 is arranged at a position distant from the beam line 8.
A plurality of (four in the figure) blade-shaped shield plates 32 provided around the rotation shaft 30 and having openings for beam passage having different sizes and shapes, and the rotation. Axis 3
And a rotary drive device 34 for switching the shield plate inserted into the beam line 8 by rotating 0.
By rotating 0, the size and shape of the beam that has passed through the shield plate 32 can be changed.
【００１２】前記複数の遮蔽板３２に形成されるビーム
通過用の開口は、スリット板３６の位置を、例えば手動
で変更することにより、変更可能とされている。この遮
蔽板３２は、所望の開口が形成されている遮蔽板以外の
遮蔽板がビームと干渉しないよう、配置される。The beam passage openings formed in the plurality of shield plates 32 can be changed by manually changing the position of the slit plate 36, for example. The shield plate 32 is arranged so that shield plates other than the shield plate having a desired opening do not interfere with the beam.
【００１３】前記回転駆動装置３４は、手動、あるい
は、モータや空気圧による駆動のいずれでもよい。The rotary drive device 34 may be manually operated or driven by a motor or air pressure.
【００１４】ビームを成形する際には、まず遮蔽板３２
上のスリット板３６を調整して、所望の開口を有する遮
蔽板を作成する。ついで、回動軸３０を回動して、該所
望の開口を有する遮蔽板をビームライン８上に配置す
る。ビームは、選択された遮蔽板の開口部分を通って成
形される。When forming the beam, first, the shield plate 32 is formed.
The upper slit plate 36 is adjusted to create a shield plate having a desired opening. Then, the rotating shaft 30 is rotated to arrange the shielding plate having the desired opening on the beam line 8. The beam is shaped through the selected aperture of the shield.
【００１５】ビーム形状を切換えたい場合には、別の遮
蔽板がビームライン８上に配置されるように、回動軸３
０を回転させる。When it is desired to switch the beam shape, the rotary shaft 3 is arranged so that another shield plate is arranged on the beam line 8.
Rotate 0.
【００１６】本実施形態においては、遮蔽板３２を９０
度毎に４枚設けているので、選択されていない遮蔽板が
ビームと干渉することなく、必要な遮蔽板を的確にビー
ムライン上に配置できる。なお、遮蔽板の枚数は４枚に
限定されず、例えば２枚、３枚、あるいは５枚以上とす
ることも可能である。In this embodiment, the shield plate 32 is set to 90.
Since four sheets are provided for each time, the required shielding plate can be accurately arranged on the beam line without the unselected shielding plate interfering with the beam. The number of shield plates is not limited to four, and may be two, three, or five or more, for example.
【００１７】又、本実施形態においては、各遮蔽板３２
に必要に応じてスリット板３６を配設して、開口形状や
サイズを変更可能としているので、汎用性が高い。な
お、各遮蔽板にサイズや形状が固定された開口を予め形
成しておくことも可能である。スリットの形状も矩形に
限定されず、円形や三角形等、他の形状であっても良
い。Further, in this embodiment, each shield plate 32 is provided.
In addition, the slit plate 36 is provided as necessary to change the opening shape and size, so that the versatility is high. It should be noted that it is possible to previously form an opening having a fixed size and shape in each shielding plate. The shape of the slit is not limited to the rectangular shape, and may be another shape such as a circular shape or a triangular shape.
【００１８】前記説明においては、本発明が、電子ビー
ムやイオンビームの成形を例にとって説明されていた
が、本発明の適用対象は、これに限定されず、Ｘ線、ガ
ンマ線、中性子線等の放射線や、光、電波や、流体制御
にも同様に適用できることは明らかである。In the above description, the present invention has been described by taking the shaping of an electron beam or an ion beam as an example, but the application of the present invention is not limited to this, and X-rays, gamma rays, neutron rays, etc. Obviously, the same can be applied to radiation, light, radio waves, and fluid control.
【００１９】[0019]
【発明の効果】本発明によれば、従来の方法で直線的な
ストロークが取れないような狭い設置スペースでも、設
置可能である。又、異なった形状の開口を有する遮蔽板
を迅速に切換えることができる。さらに、制御は回転の
一軸のみであり、且つ制御が単純である。又、直線移動
でなく回転移動であるため、遮蔽板の位置決め精度も出
しやすい等の優れた効果を有する。According to the present invention, it is possible to install even in a narrow installation space where a linear stroke cannot be obtained by the conventional method. Further, it is possible to quickly switch the shield plates having the openings of different shapes. Further, the control is only for one axis of rotation, and the control is simple. Further, since it is not a linear movement but a rotation movement, it has an excellent effect such that the positioning accuracy of the shielding plate can be easily obtained.
【図１】従来のスリット切換え方法の一例を示す斜視図FIG. 1 is a perspective view showing an example of a conventional slit switching method.
【図２】同じく他の例を示す斜視図FIG. 2 is a perspective view showing another example of the same.
【図３】本発明の実施形態の構成を示す斜視図FIG. 3 is a perspective view showing a configuration of an embodiment of the present invention.
８…ビームライン ３０…回動軸 ３２…遮蔽板 ３４…回転駆動装置 ３６…スリット板 8 ... Beam line 30 ... Rotation axis 32 ... Shielding plate 34 ... Rotational drive device 36 ... Slit plate
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平７−312193（ＪＰ，Ａ) 特開 平７−296763（ＪＰ，Ａ) 特開 昭56−143645（ＪＰ，Ａ) 特開2001−15430（ＪＰ，Ａ) 特開 平７−57683（ＪＰ，Ａ) 実開 昭62−58851（ＪＰ，Ｕ) 実公 昭45−5383（ＪＰ，Ｙ１) (58)調査した分野(Int.Cl.7，ＤＢ名) H01J 37/09 G21K 1/04 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) Reference JP-A-7-312193 (JP, A) JP-A-7-296763 (JP, A) JP-A-56-143645 (JP, A) JP-A-2001-15430 (JP, A) JP-A-7-57683 (JP, A) Actual development Sho 62-58851 (JP, U) Actual public 45-5833 (JP, Y1) (58) Fields investigated (Int.Cl. 7) , DB name) H01J 37/09 G21K 1/04
Claims (2)
ーム成形スリットにおいて、 ビームラインから離れた位置に配置される単一の回動軸
と、 該回動軸のまわりに配設される、大きさや形状が互いに
異なるビーム通過用の開口が形成された、複数の遮蔽板
と、 前記回動軸を回動して、ビームラインに挿入される遮蔽
板を切換えるための回動手段とを備え、 前記回動軸を回動することにより、遮蔽板を通過したビ
ームの大きさや形状が変更可能とされていることを特徴
するビーム成形スリット。1. A beam forming slit for forming the size and shape of a beam, wherein a single rotating shaft arranged at a position distant from the beam line and arranged around the rotating shaft. A plurality of shield plates, each having a beam passage opening different in size and shape from each other, and rotating means for rotating the rotating shaft to switch the shield plates to be inserted into the beam line. A beam shaping slit, wherein the size and shape of the beam that has passed through the shield plate can be changed by rotating the rotating shaft.
の大きさや形状が変更可能とされていることを特徴す
る、請求項１に記載のビーム成形スリット。2. The beam shaping slit according to claim 1, wherein a size and a shape of a beam passage opening formed in the shield plate are changeable.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000212421A JP3455501B2 (en) | 2000-07-13 | 2000-07-13 | Beam forming slit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000212421A JP3455501B2 (en) | 2000-07-13 | 2000-07-13 | Beam forming slit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002025488A JP2002025488A (en) | 2002-01-25 |
| JP3455501B2 true JP3455501B2 (en) | 2003-10-14 |
Family
ID=18708349
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000212421A Expired - Fee Related JP3455501B2 (en) | 2000-07-13 | 2000-07-13 | Beam forming slit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3455501B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9269541B2 (en) | 2013-11-21 | 2016-02-23 | Sumitomo Heavy Industries Ion Technology Co., Ltd. | High energy ion implanter, beam current adjuster, and beam current adjustment method |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7485873B2 (en) | 2003-10-16 | 2009-02-03 | Alis Corporation | Ion sources, systems and methods |
| US7488952B2 (en) | 2003-10-16 | 2009-02-10 | Alis Corporation | Ion sources, systems and methods |
| US7504639B2 (en) | 2003-10-16 | 2009-03-17 | Alis Corporation | Ion sources, systems and methods |
| US7495232B2 (en) | 2003-10-16 | 2009-02-24 | Alis Corporation | Ion sources, systems and methods |
| US7601953B2 (en) | 2006-03-20 | 2009-10-13 | Alis Corporation | Systems and methods for a gas field ion microscope |
| JP4901094B2 (en) * | 2004-11-30 | 2012-03-21 | 株式会社Ｓｅｎ | Beam irradiation device |
| WO2006088104A1 (en) * | 2005-02-16 | 2006-08-24 | National Institute Of Radiological Sciences | X-ray shielding apparatus |
| WO2007067296A2 (en) * | 2005-12-02 | 2007-06-14 | Alis Corporation | Ion sources, systems and methods |
| WO2007125726A1 (en) * | 2006-04-28 | 2007-11-08 | University Of Yamanashi | Method and apparatus for ionization by cluster ion impact which can realize imaging, and etching method and apparatus |
| EP3313291B1 (en) * | 2015-06-29 | 2020-03-25 | Koninklijke Philips N.V. | A system for generating and collimating an x-ray beam |
| WO2021117182A1 (en) * | 2019-12-12 | 2021-06-17 | 株式会社日立ハイテク | Incidence angle adjustment mechanism for charged particle beam diaphragm, and charged particle beam device |
-
2000
- 2000-07-13 JP JP2000212421A patent/JP3455501B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9269541B2 (en) | 2013-11-21 | 2016-02-23 | Sumitomo Heavy Industries Ion Technology Co., Ltd. | High energy ion implanter, beam current adjuster, and beam current adjustment method |
| US9576771B2 (en) | 2013-11-21 | 2017-02-21 | Sumitomo Heavy Industries Ion Technology Co., Ltd. | High energy ion implanter, beam current adjuster, and beam current adjustment method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002025488A (en) | 2002-01-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3455501B2 (en) | Beam forming slit | |
| US6833552B2 (en) | System and method for implanting a wafer with an ion beam | |
| US4767930A (en) | Method and apparatus for enlarging a charged particle beam | |
| US8824638B2 (en) | Systems and methods for making and using multi-blade collimators | |
| KR100722159B1 (en) | Ion implantation method and apparatus | |
| JP6243916B2 (en) | Ion source having shutter assembly and ion implantation apparatus including the same | |
| US5086444A (en) | Primary radiation diaphragm | |
| US20090166566A1 (en) | High tilt implant angle performance using in-axis tilt | |
| US20110089334A1 (en) | Ion implanter with variable aperture and ion implant method thereof | |
| WO2007067552A2 (en) | Techniques for preventing parasitic beamlets from affecting ion implantation | |
| JP2926253B2 (en) | Ion implanter and method for controlling ion dose to wafer | |
| CN106267584B (en) | A kind of Double-disk rotation type compact degrader and its application method | |
| JP3965605B2 (en) | Ion implantation apparatus and ion implantation method | |
| US20060124867A1 (en) | Method and apparatus for ion beam profiling | |
| CN110223903B (en) | Ion source baffle plate with uniform symmetrical arrangement and synchronous opening and closing | |
| US3841875A (en) | Method for grading the screen of a color tube | |
| JPS61255022A (en) | Electron beam exposing method | |
| JPH0738989U (en) | Radiation beam positioning device | |
| JPH0949812A (en) | Sample holder for x-ray diffractometer | |
| JPS5855559A (en) | Ion implantation apparatus | |
| JPS58142751A (en) | Ion implantation | |
| WO2021019659A1 (en) | Ionization device | |
| JP2990086B2 (en) | Ion implanter | |
| JP2610943B2 (en) | Radiation attenuator | |
| JPS6345223B2 (en) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |