JP3316875B2 - Method of manufacturing magnetoresistive head - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a magnetoresistive head used in a high-density storage device.

[0002]

2. Description of the Related Art In recent years, as the performance of computers has increased, the size and capacity of hard disks, which are high-density storage devices, have been required to be reduced. As a result, the need for a magnetoresistive head that does not depend on the relative speed with respect to the magnetic recording medium has increased. The magnetoresistive head is a composite thin film magnetic head using a conventional inductive type thin film magnetic head as a write-only head and a magnetoresistive element as a read-only head. Since the magneto-resistive head uses the magneto-resistive element as a read-only head, the read output does not depend on the relative speed with the magnetic recording medium, and in principle the data can be read even if the magnetic recording medium does not rotate. Can be.

[0003] A conventional magnetoresistive head will be described below. FIG. 2 is a sectional view of a main part of a general magnetoresistive head.

[0004] Reference numeral 1 denotes a substrate made of a material such as Mn-Zn-ferrite, and 2 denotes a substrate having a surface polished by a physical thin film forming method such as a sputtering method or a vapor deposition method.
An insulating layer made of an insulating material such as SiO ₂ formed in Å,
Reference numeral 3 denotes a lower core of a write-only head comprising a lower magnetic layer formed by a physical thin film forming method such as a vapor deposition method, a sputtering method, and a CVD method. Reference numeral 4 denotes a magnetic gap formed by a physical thin film forming method. Upper core of a write-only head comprising an upper magnetic layer formed by a thin film forming method, 6 is a coil,
7 is an insulating layer.

A method of manufacturing the conventional magnetoresistive head having the above-described structure will be described.

FIGS. 3A and 3B are views showing a lift-off process in a conventional method of manufacturing a magnetoresistive head. FIG. 3A shows a process of forming a magnetoresistive element portion, FIG. 3B shows a process of forming a lift-off pattern, and FIG. (D) is a lift-off step of the extraction electrode pattern, (e) is an ion milling step after forming the milling pattern, and (f) is a write head forming step after removing the resist.

First, in the step of FIG. 3A, Mn-Zn-
For example, diameter φ made of material such as ferrite
After finishing polishing the surface of the substrate 1 having a thickness of 3 "2.8 mm,
After forming an insulating layer 2 of, for example, 1500 ° by an insulating material such as iO ₂ by sputtering or physical vapor deposition, a soft magnetic bias auxiliary layer 8 is formed to a thickness of, for example, 500 °, and a nonmagnetic layer 9 is formed thereon. For example, a film having a thickness of 100 ° is formed, and then a permalloy magnetoresistive element layer 10 is formed.

Next, in the step of FIG. 3B, a lift-off pattern 11 of the read track portion is formed, and then, in the step of FIG.
In the step of FIG. 3D, the shape of the extraction electrode 12 is patterned with a photoresist. Next, after removing portions other than the electrode shape by ion milling in the step of FIG. 3E, the magnetic gap 4 and the upper core 5 were formed in the step of FIG.

[0009]

However, in the above-mentioned conventional configuration, there is a problem that it takes a long time for ion milling, productivity is poor, cost is increased, and mass productivity is lacking. Further, as shown in FIGS. 3 (e) and 3 (f), the reattachment portion 13 is formed at the side end of the extraction electrode 12 during ion milling, so that the electrical insulation with the lower core 3 of the write-only head is improved. In the worst case, there is a problem that an output cannot be obtained.

The present invention solves the above-mentioned conventional problems, and simplifies the method of forming the extraction electrodes of the magnetoresistive element of the magnetoresistive head used in the hard disk as a high-density storage device, thereby reducing the time required for milling. An object of the present invention is to provide a method of manufacturing a magnetoresistive head excellent in mass productivity capable of preventing formation of an attached portion and securing a withstand voltage and obtaining a stable output.

[0011]

In order to achieve this object, a method of manufacturing a magnetoresistive head according to the present invention comprises an upper magnetic layer and a lower magnetic layer stacked via a magnetic gap; A write-only head and a read-only head each including a coil having a predetermined number of turns passing through a layer and both magnetic layers and intersecting a magnetic circuit, and an insulating film electrically insulating the coils from each other and between the coil and the upper and lower magnetic layers. And a method of manufacturing a magnetoresistive head, comprising: forming a soft magnetic bias auxiliary layer, a non-magnetic layer, and a magnetoresistive element layer at least when forming a magnetoresistive element portion , The first lift-off putter
And a first lift-off pattern on both sides.
(2) forming a third lift-off pattern,
After that, the first to third lift-off patterns and the first to third lift-off patterns
On the magnetoresistive element layer located between the lift-off patterns
Are formed on both sides, and then the first to third
By removing the lift-off pattern, the first lift-off
Between the lift pattern and the second lift-off pattern.
The first extraction electrode layer is used as one extraction electrode,
Between the lift-off pattern and the third lift-off pattern.
The extracted extraction electrode layer serves as the other extraction electrode.
A pair of extraction electrodes is formed, and a pair of extraction electrodes and
Magnetoresistive element exposed between a pair of extraction electrodes
While continuously forming a milling pattern on the layer,
The ring pattern is at both ends of each of a pair of extraction electrodes
And a pair of drawers
Of the magnetoresistive element layer and the pair of extraction electrodes except between the electrodes.
Both ends are removed by etching or the like.

[0012]

According to this structure, the process of forming the extraction electrode can be simplified. Further, the formation of the reattached portion during milling can be prevented, so that the withstand voltage can be increased.

[0013]

An embodiment of the present invention will be described below with reference to the drawings.

FIGS. 1A and 1B are diagrams showing a lift-off process in the method of manufacturing a magnetoresistive head according to the present embodiment. FIG. 1A shows a process of forming a magnetoresistive element portion, FIG. 1B shows a process of forming a lift-off pattern, and FIG. (D) is a lift-off step of the extraction electrode pattern, (e) is an ion milling step after the formation of the milling pattern, and (f) is a write head formation step after the removal of the resist.

The difference from the conventional example is that the step (b) comprises a step of coating a photoresist entirely and patterning the shape of the lift-off pattern 14 of the magnetoresistive element layer 10, and the step (d). This is a step of applying a milling mask over the entire surface, patterning a pattern shape smaller than the lift-off pattern of the extraction electrode, and removing the remaining magnetoresistive element layer by etching or the like by ion milling.

After patterning the shape of the extraction electrode by combining the lift-off pattern with the reading track portion,
In the step shown in FIG. 1C, the extraction electrode 12 is formed by a method such as a sputtering method or a vapor deposition method. At this time, the thickness of the photoresist film is selected so that the extraction electrode 12 is easily lifted off. For example, if the extraction electrode 12 has a thickness of 2000 °, the thickness of the photoresist is desirably set to 2 μm or more. Next, in the step of FIG. 1D, the extraction electrode 12 is lifted off by a solvent or a remover. Next, in step (e) of FIG. 1, an ion milling mask 15 made of a photoresist or the like is applied to the entire surface, and a pattern shape smaller than the lift-off pattern of the extraction electrode 12 by 1 to 2 μm is applied. A soft magnetic bias auxiliary layer 8, a non-magnetic layer 9,
Then, the magnetoresistive element layer 10 is removed. Further, FIG.
In step (f), the lower core 3 of the write-only head is placed thereon.
And the upper core 5 is formed.

[0017]

As described above, according to the present invention, the magnetic gap is increased.
An upper magnetic layer and a lower magnetic layer
Crossing the magnetic circuit through the lower magnetic layer and both magnetic layers
Coil with a fixed number of turns, between coils, and between coil and upper and lower
An insulating film for electrically insulating the magnetic layers.
Write-only head and read-only head
Method of manufacturing magnetoresistive head comprising magnetoresistive element
Method, at least when forming the magnetoresistive element portion,
Soft magnetic bias auxiliary layer, non-magnetic layer, and magnetoresistive element layer
Is formed, and a first lift-off pattern is provided thereon.
And second and third lift-off patterns on both sides of the first lift-off pattern.
Lift-off patterns are formed respectively, and then
On the third lift-off pattern and the first to third lift-off patterns
On both sides of the magnetoresistive element layer located between
After forming the extraction electrode layer, first to third lift-off
By removing the pattern, the first lift-off pattern
And a drawer provided between the second lift-off pattern
The electrode layer is used as one lead electrode, and the first lift-off
A pull provided between the turn and the third lift-off pattern
A pair of extraction electrodes using the extraction electrode layer as the other extraction electrode
A pair of extraction electrodes and the pair of extraction electrodes
Continuous on the exposed magnetoresistive element layer between the extension electrodes
Forming a milling pattern
Both ends of a pair of extraction electrodes are exposed
And then except between the pair of extraction electrodes
Since both ends of the magnetoresistive element layer and the pair of extraction electrodes are removed by etching or the like, the method of forming the extraction electrodes can be extremely simplified, productivity can be significantly improved, and the reattached portion during milling can be removed. Since the formation can be prevented, a method of manufacturing a magnetoresistive head of low cost and excellent in mass productivity capable of securing a withstand voltage and obtaining a stable output can be realized.

[Brief description of the drawings]

FIG. 1 is a diagram showing a lift-off process in a method of manufacturing a magnetoresistive head according to the present embodiment. (A) A diagram showing a process of forming a magnetoresistive element portion. (B) A diagram showing a process of forming a lift-off pattern. d) Lift-off process of the extraction electrode pattern (e) Ion milling process after forming the milling pattern (f) Write head forming process after removing the resist

FIG. 2 is a sectional view of a main part of a general magnetoresistive head.

3A and 3B are lift-off process diagrams in a conventional method of manufacturing a magnetoresistive head; FIG. 3A is a process diagram of forming a magnetoresistive element portion; FIG. 3B is a process diagram of a lift-off pattern; (E) Ion milling process after forming the milling pattern (f) Write head forming process after removing the resist

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate 2 Insulating layer 3 Lower core 4 Magnetic gap 5 Upper core 6 Coil 7 Insulating layer 8 Soft magnetic bias auxiliary layer 9 Nonmagnetic layer 10 Magnetoresistance element layer 11 Lift-off pattern 12 Leader electrode 13 Reattachment part 14 Lift-off pattern 15 Ion milling mask

Claims (1)

(57) [Claims] An upper magnetic layer and a lower magnetic layer laminated via a magnetic gap; a coil having a predetermined number of turns passing through the upper and lower magnetic layers and both magnetic layers and intersecting a magnetic circuit; A method of manufacturing a magnetoresistive head, comprising: a write-only head including the coil and an insulating film electrically insulating the upper and lower magnetic layers; and a magnetoresistive element serving as a read-only head. In forming at least the magnetoresistive element portion, it is preferable to form a soft magnetic bias auxiliary layer, a nonmagnetic layer, and a magnetoresistive element layer and then provide a first lift-off pattern thereon.
The second and third lift-off patterns on both sides of the first lift-off pattern.
A lift-off pattern is formed, and then the
On the first to third lift-off patterns and the first to third
Of the magnetoresistive element layer located between the lift-off patterns
A lead electrode layer is formed on both of the above, and then the first to first electrodes are formed.
By removing the third lift-off pattern, the first lift-off pattern is removed.
Lift-off pattern and the second lift-off pattern
The extraction electrode layer provided between
And the first lift-off pattern and the third lift-off pattern
The extraction electrode layer provided between the
Forming a pair of extraction electrodes as extraction electrodes for
Between the pair of extraction electrodes and the pair of extraction electrodes
Continuous milling is performed on the exposed magnetoresistive element layer.
Milling pattern, and the milling pattern
Both ends of the pair of extraction electrodes are exposed
And then between the pair of extraction electrodes.
Outside magnetoresistive element layer and both ends of the pair of extraction electrodes
A method for manufacturing a magnetoresistive head, wherein the head is removed by etching or the like.