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JP3310702B2 - Stabilization of acidic aqueous hydrogen peroxide solution. - Google Patents

Stabilization of acidic aqueous hydrogen peroxide solution.

Info

Publication number
JP3310702B2
JP3310702B2 JP26888992A JP26888992A JP3310702B2 JP 3310702 B2 JP3310702 B2 JP 3310702B2 JP 26888992 A JP26888992 A JP 26888992A JP 26888992 A JP26888992 A JP 26888992A JP 3310702 B2 JP3310702 B2 JP 3310702B2
Authority
JP
Japan
Prior art keywords
hydrogen peroxide
general formula
represented
glycol ethers
glycol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP26888992A
Other languages
Japanese (ja)
Other versions
JPH06115909A (en
Inventor
忠彦 南部
敏雄 藤田
一比古 有松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chelest Corp
Original Assignee
Chelest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chelest Corp filed Critical Chelest Corp
Priority to JP26888992A priority Critical patent/JP3310702B2/en
Publication of JPH06115909A publication Critical patent/JPH06115909A/en
Application granted granted Critical
Publication of JP3310702B2 publication Critical patent/JP3310702B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B15/00Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
    • C01B15/01Hydrogen peroxide
    • C01B15/037Stabilisation by additives

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Detergent Compositions (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、銅および銅合金(以
下、銅合金で代表する)にピックリング、エッチング、
ケミカルポリッシング等の化学的処理を施す際に使用さ
れる酸性過酸化水素水溶液の安定性を高める方法に関す
るものである
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for pickling, etching,
The present invention relates to a method for increasing the stability of an acidic hydrogen peroxide aqueous solution used in performing a chemical treatment such as chemical polishing.

【0002】[0002]

【従来の技術】酸性過酸化水素水溶液は銅系金属材料に
対して優れた溶解力を有しいるところから、たとえば銅
合金表面の酸化スケールを溶解除去するためのピックリ
ング、銅合金の一部を溶解除去するためのエッチング、
銅合金表面を光輝処理するためのケミカルポリッシング
等の化学的溶解処理に従来から広範に利用されている。
2. Description of the Related Art Since an acidic hydrogen peroxide aqueous solution has an excellent dissolving power for a copper-based metal material, for example, a pickling for dissolving and removing an oxide scale on a copper alloy surface, a part of a copper alloy. Etching to dissolve and remove
Conventionally, copper alloy surfaces have been widely used for chemical dissolution treatments such as chemical polishing for brightening treatment.

【0003】ところが過酸化水素は非常に分解し易い化
合物であり、特に銅イオンの存在する系では短時間のう
ちに接触分解を起こして酸化活性を失なう。そこでこう
した問題を改善するため、過酸化水素水溶液中に安定化
剤としてフェナセチン、脂肪族アルコール、脂肪族アミ
ン、グリコール類、グリコールエーテル類、アリールス
ルホン酸、フェノール、フェノールスルホン酸等を添加
する方法が採用されている。
[0003] However, hydrogen peroxide is a compound that is very easily decomposed, and particularly in a system in which copper ions are present, catalytic decomposition occurs within a short time and the oxidation activity is lost. Therefore, in order to solve such problems, a method of adding phenacetin, an aliphatic alcohol, an aliphatic amine, glycols, glycol ethers, arylsulfonic acid, phenol, phenolsulfonic acid, or the like as a stabilizer to an aqueous hydrogen peroxide solution has been proposed. Has been adopted.

【0004】[0004]

【発明が解決しようとする課題】ところが上記の様な安
定剤は、50℃程度以上の高温域における安定化効果が
不十分であり、また使用時に揮発して悪臭を発したり或
は好ましくない副反応を起こして沈殿を生じるといった
難点がある。例えば銅系金属材料の酸化スケールの溶解
除去等を行なうための酸洗処理工程等では、処理効率を
高めることの必要上50℃程度以上の処理温度を採用す
ることが多く、処理液中に大量の銅イオンが溶出してく
るため、温度の影響とも相まって過酸化水素の分解は非
常に激しくなり、上記の様な安定剤では安定化の目的が
殆ど達成されない。その結果、過酸化水素の激しい分解
によって生ずる酸素ガスにより大量の酸霧が発生し、作
業環境を著しく悪化させる。
However, such a stabilizer as described above has an insufficient stabilizing effect in a high temperature range of about 50 ° C. or higher, and emits a bad smell by volatilization at the time of use or has an undesirable side effect. There is a problem that a reaction is caused to form a precipitate. For example, in a pickling treatment step for dissolving and removing oxide scale of a copper-based metal material, a treatment temperature of about 50 ° C. or more is often used because of the need to increase treatment efficiency, and a large amount of Of copper peroxide is eluted, and the decomposition of hydrogen peroxide becomes extremely severe in combination with the effect of temperature, so that the stabilization purpose is hardly achieved by the above stabilizer. As a result, a large amount of acid fog is generated by oxygen gas generated by violent decomposition of hydrogen peroxide, which significantly deteriorates the working environment.

【0005】本発明は上記の様な事情に着目してなされ
たものであって、その目的は、かなり高い温度条件下に
おいても、また分解促進作用を持った銅イオンが混入し
てくる酸性溶液中においても、過酸化水素の分解を最小
限に抑制し、酸性過酸化水素水溶液の有する洗浄もしく
は溶解処理効果を最大限有効に発揮させることのできる
技術を確立しようとするものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and has as its object to provide an acidic solution in which copper ions having a decomposition promoting action are mixed even under a considerably high temperature condition. In addition, the present invention aims to establish a technology capable of minimizing the decomposition of hydrogen peroxide and maximally and effectively exerting the cleaning or dissolving treatment effect of the aqueous solution of acidic hydrogen peroxide.

【0006】[0006]

【課題を解決するための手段】上記課題解決することの
できた本発明に係る安定化法とは、銅イオンが混入して
いる酸性過酸化水素水溶液中に、下記一般式[1] で示さ
れるフェニルグリコールエーテル類の一種以上と、下記
一般式[2] で示されるグリコールエーテル類、下記一般
式[3] で示されるグリコール類、下記一般式[4] で示さ
れる酸化エチレン付加脂肪族アミンよりなる群から選択
される化合物の少なくとも一種とを含有させるところに
要旨を有するものである。
Means for Solving the Problems The stabilization method according to the present invention which can solve the above problems is represented by the following general formula [1] in an aqueous solution of acidic hydrogen peroxide mixed with copper ions. From one or more phenyl glycol ethers and a glycol ether represented by the following general formula [2], a glycol represented by the following general formula [3], and an ethylene oxide-added aliphatic amine represented by the following general formula [4] The gist of the present invention resides in that at least one compound selected from the group consisting of:

【0007】[0007]

【化2】 Embedded image

【0008】[0008]

【作用】本発明者らは前述の様な従来技術の問題点を解
決すべく種々研究を進めた結果、過酸化水素を含む酸性
水溶液中に、前記[1] 式で示されるフェニルグリコール
エーテル類、例えばエチレングリコールフェニルエーテ
ル(以下、EPHと略記する)、ジエチレングリコール
フェニルエーテル(以下、DPHと略記する)の1種以
上を含有させておけば、過酸化水素の分解が著しく抑制
されることを知った。
The present inventors have conducted various studies to solve the problems of the prior art as described above. As a result, the phenyl glycol ether represented by the above formula [1] was added to an acidic aqueous solution containing hydrogen peroxide. For example, if one or more of ethylene glycol phenyl ether (hereinafter abbreviated as EPH) and diethylene glycol phenyl ether (hereinafter abbreviated as DPH) are contained, it is known that decomposition of hydrogen peroxide is significantly suppressed. Was.

【0009】ところがフェニルグリコールエーテル類は
銅イオンと結合して沈殿物を生じるため、例えば銅合金
の溶解処理に用いて当該処理液中に銅イオンが溶出して
く様な用途に適用すると、安定化剤として作用すべきフ
ェニルグリコールエーテル類が銅イオンと結合して安定
化効果を喪失するばかりでなく、生成する沈殿物により
銅合金表面が汚染される。
However, phenyl glycol ethers combine with copper ions to form precipitates. Therefore, when phenyl glycol ethers are used for, for example, dissolution treatment of a copper alloy and copper ions are eluted into the treatment solution, the phenyl glycol ethers become stable. Not only does the phenyl glycol ether, which should act as an agent, bind to the copper ions, losing the stabilizing effect, but also contaminates the copper alloy surface with the resulting precipitate.

【0010】銅合金の化学的溶解処理液としては、通常
10〜150g/リットルの過酸化水素と100〜20
0g/リットルの硫酸を含む酸性過酸化水素水溶液が用
いられ、溶解処理工程では処理液中に多量の銅イオンが
溶出してくる。従って、このように処理液中に銅イオン
が溶出してくる酸性過酸化水素水溶液においては、上記
フェルニルグリコールエーテル類の安定化効果を有効に
発揮させることができない。
[0010] The solution for chemically dissolving the copper alloy is usually 10 to 150 g / l of hydrogen peroxide and 100 to 20 g / l.
An acidic aqueous hydrogen peroxide solution containing 0 g / liter of sulfuric acid is used, and a large amount of copper ions are eluted in the treatment liquid in the dissolution treatment step. Therefore, the stabilizing effect of the fernyl glycol ethers cannot be effectively exerted in the acidic hydrogen peroxide aqueous solution in which copper ions are eluted in the treatment liquid.

【0011】そこで、フェニルグリコールエーテル類と
銅イオンの反応を阻止することによって、当該フェニル
グリコールエーテル類の安定化効果を有効に発揮させる
ことはできないかと考え、その方向で更に研究を進め
た。その結果、フェニルグリコールエーテル類と共に前
記[2] 式で示されるグリコールエーテル類、前記一般式
[3] で示されるグリコール類、前記一般式[4] で示され
る酸化エチレン付加脂肪族アミンよりなる群から選択さ
れる化合物の少なくとも一種とを含有させれば、銅イオ
ンとフェニルグリコールエーテル類との反応が抑えら
れ、比較的高い温度域においても沈殿を生じることな
く、過酸化水素に対して優れた安定化効果が発揮される
ことを知り、ここに本発明の完成をみた。
[0011] Therefore, it was considered whether or not the stabilizing effect of the phenyl glycol ethers could be effectively exhibited by preventing the reaction between the phenyl glycol ethers and copper ions, and further research was conducted in that direction. As a result, the glycol ethers represented by the above formula [2] together with the phenyl glycol ethers,
When a glycol represented by [3] and at least one compound selected from the group consisting of ethylene oxide-added aliphatic amine represented by the general formula [4] are contained, copper ions and phenyl glycol ethers can be obtained. It was found that an excellent stabilizing effect on hydrogen peroxide was exhibited without precipitation even in a relatively high temperature range, and the present invention was completed here.

【0012】ここで使用されるフェニルグリコールエー
テル類とは、前記[1] 式で示される化合物、具体的には
EPHおよびDPHであり、これらは夫々単独で使用し
得る他、2種以上を任意の比率で併用することができ
る。その使用量は、酸性過酸化水素水溶液に対して0.
1〜10g/リットル、より好ましくは0.5〜2g/
リットルの範囲であり、0.1g/リットル未満では十
分な安定化効果が発揮されにくく、またその効果はほぼ
10g/リットルで飽和するのでそれ以上の添加は経済
的に無駄である。
The phenyl glycol ethers used herein are the compounds represented by the above formula [1], specifically, EPH and DPH, which can be used alone or in combination of two or more. Can be used in combination. The amount used is 0.1 to the aqueous solution of acidic hydrogen peroxide.
1 to 10 g / liter, more preferably 0.5 to 2 g / liter
When the amount is less than 0.1 g / liter, a sufficient stabilizing effect is hardly exhibited, and the effect is saturated at about 10 g / liter, so that further addition is economically useless.

【0013】次に上記フェニルグリコールエーテル類と
併用される一般式[2] で示されるグリコールエーテル類
としては、1分子中にエーテル基と水酸基を有する化合
物であって、具体例としては、エチレングリコールモノ
メチルエーテル、エチレングリコールモノエチルエーテ
ル、エチレングリコールモノブチルエーテル、ジエチレ
ングリコールモノメチルエーテル、ジエチレングリコー
ルモノエチルエーテル、ジエチレングリコールモノブチ
ルエーテル、プロピレングリコールモノメチルエーテ
ル、プロピレングリコールモノエチルエーテル、プロピ
レングリコールモノブチルエーテル、ジプロピレングリ
コールモノメチルエーテル、ジプロピレングリコールモ
ノエチルエーテル、ジプロピレングリコールモノブチル
エーテル等が例示される。
The glycol ethers represented by the general formula [2] used in combination with the above phenyl glycol ethers are compounds having an ether group and a hydroxyl group in one molecule, and specific examples thereof include ethylene glycol. Monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, dipropylene glycol monomethyl ether, dipropylene glycol Propylene glycol monoethyl ether, dipropylene glycol monobutyl ether and the like. You.

【0014】また前記一般式[3] で示される化合物とし
ては、例えばエチレングリコール、ジエチレングリコー
ル、トリエチレングリコール、プロピレングリコール、
ジプロピレングリコール、トリプロピレングリコール等
が好ましいものとして例示される。
The compound represented by the general formula [3] includes, for example, ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol,
Dipropylene glycol, tripropylene glycol and the like are exemplified as preferable ones.

【0015】前記一般式[4] で示される酸化エチレン付
加脂肪族アミンの代表的なものとしては、モノオキシエ
チレンオクチルアミン、ジオキシエチレンオクチルアミ
ン、ポリオキシエチレンオクチルアミン、モノオキシエ
チレンラウリルアミン、ジオキシエチレンラウリルアミ
ン、ポリオキシエチレンラウリルアミン、ポリオキシエ
チレンオレイルアミン、ポリオキシエチレンステアリル
アミン等が例示される。
Representative examples of the ethylene oxide-added aliphatic amine represented by the general formula [4] include monooxyethylene octylamine, dioxyethylene octylamine, polyoxyethylene octylamine, monooxyethylene laurylamine, Examples thereof include dioxyethylene laurylamine, polyoxyethylene laurylamine, polyoxyethylene oleylamine, and polyoxyethylene stearylamine.

【0016】上記一般式[2] 、[3] 、[4] で示される化
合物は、前述の如く銅イオンとフェニルグリコールエー
テル類との反応を阻止してその安定化効果を有効に発揮
させるために含有させるものであって、その効果は上記
化合物を単独で添加した場合はもとより、2種以上を任
意の比率で併用した場合でも有効に発揮される。
The compounds represented by the above general formulas [2], [3], and [4] prevent the reaction between copper ions and phenyl glycol ethers, as described above, and effectively exhibit the stabilizing effect. The effect is effectively exerted not only when the above compound is added alone, but also when two or more kinds are used in combination at an arbitrary ratio.

【0017】これらの化合物の好まし添加量は、一般式
[1] で示されるフェニルグリコールエーテル類の重量に
対して0.5〜2倍量の範囲が好ましく、0.5倍量未
満ではその効果が十分に発揮されず、またその効果は2
倍量で飽和するのでそれ以上の添加は経済的に無駄であ
る。
The preferred addition amount of these compounds is represented by the general formula
The range of 0.5 to 2 times the weight of the phenyl glycol ethers represented by [1] is preferable. If the amount is less than 0.5 times the effect is not sufficiently exhibited, and the effect is 2 times.
Further addition is economically useless because it saturates twice.

【0018】本発明は以上の様に構成されており、銅イ
オンが混入してくる酸性過酸化水素水溶液中に予め前記
一般式[1] で示されるフェニルグリコールエーテル類と
一般式[2] 〜[4] で示される化合物を含有させておくこ
とによって、比較的高い温度条件下においても過酸化水
素を安定に保つことができ、酸性過酸化水素水溶液の有
する銅または銅合金に対する化学的処理効果を最大限有
効に発揮させることができる。
The present invention is constituted as described above, and a phenyl glycol ether represented by the above general formula [1] and a phenyl glycol ether represented by the above general formula [2] to an aqueous solution of acidic hydrogen peroxide into which copper ions are mixed. By containing the compound represented by [4], hydrogen peroxide can be stably maintained even under relatively high temperature conditions, and the chemical treatment effect on the copper or copper alloy of the acidic aqueous hydrogen peroxide solution Can be exerted as effectively as possible.

【0019】[0019]

【実施例】以下実施例を挙げて本発明をより具体的に説
明するが、本発明はもとより下記実施例によって制限を
受けるものではなく、前・後記の趣旨に適合し得る範囲
で変更して実施することも勿論可能であり、それらはい
ずれも本発明の技術的範囲に含まれる。
EXAMPLES The present invention will be described in more detail with reference to the following examples. However, the present invention is not limited to the following examples, and may be modified within a range that can be adapted to the above and following points. It is of course possible to carry out them, and all of them are included in the technical scope of the present invention.

【0020】実施例1 過酸化水素30g/リットルと硫酸160g/リットル
を含む水溶液に、表1に示す安定化剤を添加した後、こ
れにCu2+イオンを1g/リットル添加し、この混合液
を75℃で6時間保持した後、沈殿物の有無を観察する
と共に、過酸化水素を定量し、表1に示す結果を得た。
尚、表1(および表2)におけるA〜Lは夫々下記の化
合物を意味する。
Example 1 A stabilizer shown in Table 1 was added to an aqueous solution containing 30 g / L of hydrogen peroxide and 160 g / L of sulfuric acid, and 1 g / L of Cu 2+ ion was added thereto. Was kept at 75 ° C. for 6 hours, the presence or absence of a precipitate was observed, and the amount of hydrogen peroxide was quantified. The results shown in Table 1 were obtained.
In addition, A to L in Table 1 (and Table 2) mean the following compounds, respectively.

【0021】A:エチレングリコールメチルエーテル B:ジエチレングリコールブチルエーテル C:プロピレングリコールエチルエーテル D:エチレングリコール E:ジプロピレングリコール F:モノオキシエチレンラウリルアミン G:エチレングリコールブチルエーテル H:ジプロピレングリコールメチルエーテル I:トリエチレングリコール J:ジオキシエチレンオクチルアミン K:ポリオキシエチレンラウリルアミン L:ポリオキシエチレンオレイルアミンA: ethylene glycol methyl ether B: diethylene glycol butyl ether C: propylene glycol ethyl ether D: ethylene glycol E: dipropylene glycol F: monooxyethylene laurylamine G: ethylene glycol butyl ether H: dipropylene glycol methyl ether I: tri Ethylene glycol J: dioxyethylene octylamine K: polyoxyethylene laurylamine L: polyoxyethylene oleylamine

【0022】[0022]

【表1】 [Table 1]

【0023】実施例2 過酸化水素30g/リットルと硫酸160g/リットル
を含む水溶液に、表2に示す安定化剤を添加した後、こ
れにCu2+イオンを30g/リットル添加し、この混合
液を75℃で6時間保持した後、沈殿物の有無を観察す
ると共に、過酸化水素を定量し、表2に示す結果を得
た。
Example 2 A stabilizer shown in Table 2 was added to an aqueous solution containing 30 g / L of hydrogen peroxide and 160 g / L of sulfuric acid, and 30 g / L of Cu 2+ ions were added thereto. After maintaining at 75 ° C. for 6 hours, the presence or absence of a precipitate was observed, and the amount of hydrogen peroxide was quantified. The results shown in Table 2 were obtained.

【0024】[0024]

【表2】 [Table 2]

【0025】表1,2からも明らかである様に、本発明
の規定要件を充足するNo.1〜10および27〜36
は、沈殿の生成が見られず且つ過酸化水素の分解率も低
い値を示している。これに対しNo.11〜19および
37〜45は、安定化剤としてEPHおよび/またはD
PHだけを使用したものであり、中には過酸化水素の分
解率において良好な結果が得られているものもあるが、
いずれも沈殿の生成が見られ、本発明の目的を果たすこ
とができない。またNo.20〜25および46〜51
はEPH及びDPHがいずれも添加されておらず、一般
式[2] 〜[4] の化合物のみを添加したものであり、沈殿
の生成は見られないものの過酸化水素の分解が著しく、
やはり本発明の目的を果たすことができない。
As is evident from Tables 1 and 2, No. satisfying the requirements of the present invention. 1-10 and 27-36
Indicates that no precipitate is formed and the decomposition rate of hydrogen peroxide is low. On the other hand, No. 11 to 19 and 37 to 45 are EPH and / or D as stabilizers.
Although only PH was used, some of which had good results in the decomposition rate of hydrogen peroxide,
In all cases, the formation of a precipitate is observed, and the object of the present invention cannot be achieved. No. 20-25 and 46-51
No EPH or DPH was added, and only the compounds of the general formulas [2] to [4] were added. No formation of a precipitate was observed, but decomposition of hydrogen peroxide was remarkable.
Again, the object of the present invention cannot be achieved.

【0026】[0026]

【発明の効果】本発明は以上の様に構成されており、銅
イオンが混入してくる酸性過酸化水素水溶液における過
酸化水素の分解を抑制すると共に被処理液の汚染原因と
なる沈殿の生成を確実に防止することができ、銅や銅合
金等にピックリング、エッチング、ケミカルポリッシン
グ等の化学的処理を施すための処理液としての性能を著
しく高め得ることになった。
The present invention is constituted as described above and suppresses the decomposition of hydrogen peroxide in an acidic aqueous hydrogen peroxide solution into which copper ions are mixed, and produces a precipitate which causes contamination of the liquid to be treated. Therefore, the performance as a processing solution for performing chemical processing such as pickling, etching, and chemical polishing on copper, a copper alloy, or the like can be significantly improved.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭49−109296(JP,A) 特公 昭54−2607(JP,B1) (58)調査した分野(Int.Cl.7,DB名) C01B 15/00 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-49-109296 (JP, A) JP-B-54-2607 (JP, B1) (58) Fields investigated (Int. Cl. 7 , DB name) C01B 15/00

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 銅イオンが混入している酸性過酸化水素
水溶液中に、下記一般式[1] で示されるフェニルグリコ
ールエーテル類の一種以上と、下記一般式[2] で示され
るグリコールエーテル類、下記一般式[3] で示されるグ
リコール類、下記一般式[4] で示される酸化エチレン付
加脂肪族アミンよりなる群から選択される化合物の少な
くとも一種とを含有させることを特徴とする酸性過酸化
水素水溶液の安定化法。 【化1】
1. An aqueous solution of acidic hydrogen peroxide containing copper ions, wherein at least one of phenyl glycol ethers represented by the following general formula [1] and glycol ethers represented by the following general formula [2]: At least one compound selected from the group consisting of glycols represented by the following general formula [3] and ethylene oxide-added aliphatic amines represented by the following general formula [4]: A method for stabilizing an aqueous hydrogen oxide solution. Embedded image
【請求項2】 酸性過酸化水素水溶液中に、一般式[1]
で示されるフェニルグリコールエーテル類の一種以上
0.1〜10g/リットルと、一般式[2] で示されるグ
リコールエーテル類、一般式[3] で示されるグリコール
類、一般式[4]で示される酸化エチレン付加脂肪族アミ
ンよりなる群から選択される化合物の少なくとも一種
を、上記フェニルグリコールエーテル類の重量に対して
0.5〜2倍量含有させる請求項1に記載の酸性過酸化
水素水溶液の安定化法。
2. An aqueous solution of an acidic hydrogen peroxide having the general formula [1]
One or more phenyl glycol ethers represented by the formula: 0.1 to 10 g / liter, the glycol ethers represented by the general formula [2], the glycols represented by the general formula [3], and the glycols represented by the general formula [4] The acidic hydrogen peroxide aqueous solution according to claim 1, wherein at least one compound selected from the group consisting of ethylene oxide-added aliphatic amines is contained in an amount of 0.5 to 2 times the weight of the phenyl glycol ethers. Stabilization method.
JP26888992A 1992-10-07 1992-10-07 Stabilization of acidic aqueous hydrogen peroxide solution. Expired - Lifetime JP3310702B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26888992A JP3310702B2 (en) 1992-10-07 1992-10-07 Stabilization of acidic aqueous hydrogen peroxide solution.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26888992A JP3310702B2 (en) 1992-10-07 1992-10-07 Stabilization of acidic aqueous hydrogen peroxide solution.

Publications (2)

Publication Number Publication Date
JPH06115909A JPH06115909A (en) 1994-04-26
JP3310702B2 true JP3310702B2 (en) 2002-08-05

Family

ID=17464679

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26888992A Expired - Lifetime JP3310702B2 (en) 1992-10-07 1992-10-07 Stabilization of acidic aqueous hydrogen peroxide solution.

Country Status (1)

Country Link
JP (1) JP3310702B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7109017B2 (en) * 2018-06-13 2022-07-29 中部キレスト株式会社 Aqueous hydrogen peroxide solution

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