JP3342645B2 - Semiconductor integrated circuit device - Google Patents
Semiconductor integrated circuit deviceInfo
- Publication number
- JP3342645B2 JP3342645B2 JP13223697A JP13223697A JP3342645B2 JP 3342645 B2 JP3342645 B2 JP 3342645B2 JP 13223697 A JP13223697 A JP 13223697A JP 13223697 A JP13223697 A JP 13223697A JP 3342645 B2 JP3342645 B2 JP 3342645B2
- Authority
- JP
- Japan
- Prior art keywords
- integrated circuit
- chip
- common
- circuit
- semiconductor integrated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4911—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
- H01L2224/49113—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting different bonding areas on the semiconductor or solid-state body to a common bonding area outside the body, e.g. converging wires
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
Landscapes
- Dram (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、リードフレームの
チップ搭載部の両面に、それぞれ集積回路チップが搭載
され、該各集積回路チップの各電極と各リード端子間が
ボンディングワイヤにて接続された樹脂封止型半導体集
積回路装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an integrated circuit chip mounted on both sides of a chip mounting portion of a lead frame, and each electrode of each integrated circuit chip and each lead terminal are connected by bonding wires. The present invention relates to a resin-sealed semiconductor integrated circuit device.
【0002】[0002]
【従来の技術】樹脂封止型半導体集積回路装置は、リー
ドフレームのチップ搭載部に集積回路チップが搭載さ
れ、該集積回路チップの各電極とリード端子間がボンデ
ィングワイヤにより接続された構成となっている。かか
る通常の樹脂封止型半導体集積回路装置に対して、機能
の向上、或いは実装密度の向上を企図して、リードフレ
ームのチップ搭載部の両面に、それぞれ集積回路チップ
を搭載する構成とした両面搭載型半導体集積回路装置が
提案されている。2. Description of the Related Art A resin-sealed semiconductor integrated circuit device has a configuration in which an integrated circuit chip is mounted on a chip mounting portion of a lead frame, and each electrode of the integrated circuit chip and a lead terminal are connected by a bonding wire. ing. With respect to such a normal resin-encapsulated semiconductor integrated circuit device, in order to improve the function or the mounting density, both sides of the chip mounting portion of the lead frame are configured to mount integrated circuit chips on both surfaces. A mounted semiconductor integrated circuit device has been proposed.
【0003】図2に、従来の両面搭載型半導体集積回路
装置の構成図を示す。図において、31は、リードフレ
ームのチップ搭載部であり、その両面に、それぞれ、集
積回路チップ32、33が搭載されている。各集積回路
チップ32及び33の電極(図示せず)と、リード端子
34との間は、それぞれボンディングワイヤ35にて接
続されている。36は封止樹脂である。例えば、集積回
路チップ32及び33が、それぞれ、同一容量のメモリ
チップであり、両面搭載により、容量を2倍とする場合
は、チップ選択信号入力に基づき内部回路に選択信号を
出力するデコーダ回路部分のみが相違し、他の部分は同
一構成の2つのメモリチップ(但し、一方のチップは、
他方のチップに対して、左右(又は上下)反転構造とな
っている)をチップ搭載部の両面に搭載し、各メモリチ
ップの対応する電極は同一のリード端子に接続する構成
とすることにより、面積的に同一でありながら、機能
(容量)を2倍とした半導体集積回路装置を得ることが
できる。かかる半導体集積回路装置は、例えば、特開平
2−87661号公報に開示されている。FIG. 2 shows a configuration diagram of a conventional double-sided semiconductor integrated circuit device. In the figure, reference numeral 31 denotes a chip mounting portion of a lead frame, and integrated circuit chips 32 and 33 are mounted on both surfaces thereof, respectively. The electrodes (not shown) of each of the integrated circuit chips 32 and 33 and the lead terminals 34 are connected by bonding wires 35, respectively. 36 is a sealing resin. For example, when the integrated circuit chips 32 and 33 are each a memory chip having the same capacity, and the capacity is doubled by mounting on both sides, a decoder circuit portion that outputs a selection signal to an internal circuit based on a chip selection signal input Only the difference, the other part is the same configuration of two memory chips (however, one chip is
By mounting the left and right (or upside down) structure on the other chip on both sides of the chip mounting portion, the corresponding electrodes of each memory chip are connected to the same lead terminal. A semiconductor integrated circuit device having twice the function (capacitance) with the same area can be obtained. Such a semiconductor integrated circuit device is disclosed, for example, in Japanese Patent Laid-Open No. 2-87661.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、上記従
来の両面搭載型半導体集積回路装置には、以下に示す問
題点があった。However, the conventional double-sided semiconductor integrated circuit device has the following problems.
【0005】すなわち、上記従来の両面搭載型半導体集
積回路装置においては、2つの集積回路チップ間で、回
路が無駄に重複することがあるという問題点があった。
すなわち、両チップ間で共通の機能を実現する回路を、
それぞれ、個別に有する場合があり、その場合、チップ
面積、或いは消費電力の点で無駄が生じるという問題点
があった。That is, in the above-mentioned conventional double-sided semiconductor integrated circuit device, there is a problem that circuits may be redundantly used between two integrated circuit chips.
In other words, a circuit that realizes a common function between both chips is
Each of them may be individually provided, and in that case, there is a problem that waste occurs in terms of chip area or power consumption.
【0006】本発明は、かかる従来の問題点を解決すべ
くなされたものであり、上記の無駄を排し、チップ面積
の縮小、及び消費電力の低減を図った両面搭載型半導体
集積回路装置を提供するものである。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned conventional problems. A double-sided semiconductor integrated circuit device which eliminates the above waste, reduces the chip area, and reduces the power consumption is provided. To provide.
【0007】[0007]
【課題を解決するための手段】上記課題を解決するた
め、本発明の半導体集積回路装置は、リードフレームの
チップ搭載部の両面に、それぞれ集積回路チップが搭載
され、該各集積回路チップの各電極と各リード端子間が
ボンディングワイヤにて接続された樹脂封止型半導体集
積回路装置において、上記各集積回路チップに共通の機
能を実現する共通回路が、何れか一方の集積回路チップ
にのみ設けられ、上記一方の集積回路チップにのみ設け
られた上記共通回路の出力信号が、この出力信号を受け
る電極、封止樹脂の内部に設けられて外部には導出され
ないリードおよびボンディングワイヤを介して、他方の
集積回路チップに伝達される構成としたことを特徴とす
る。 Means for Solving the Problems To solve the above problems,
Therefore, in the semiconductor integrated circuit device of the present invention , integrated circuit chips are mounted on both sides of the chip mounting portion of the lead frame, and each electrode of each integrated circuit chip and each lead terminal are connected by a bonding wire. In a resin-sealed semiconductor integrated circuit device, a common device for each of the above integrated circuit chips is used.
The common circuit that realizes the function is one of the integrated circuit chips
And only on one of the integrated circuit chips.
The received output signal of the common circuit receives the output signal.
Electrode and sealing resin
No lead and no bonding wire through the other
The configuration is such that the signal is transmitted to the integrated circuit chip .
【0008】また、本発明の半導体集積回路装置は、リ
ードフレームのチップ搭載部の両面に、それぞれ集積回
路チップが搭載され、該各集積回路チップの各電極と各
リード端子間がボンディングワイヤにて接続された樹脂
封止型半導体集積回路装置において、上記各集積回路チ
ップに共通の機能を実現する共通回路が、何れか一方の
集積回路チップにのみ設けられ、上記一方の集積回路チ
ップにのみ設けられた上記共通回路の出力信号が上記一
方の集積回路チップの基板に与えられると共に、上記出
力信号を受ける電極、リードフレームのチップ搭載部お
よびボンディングワイヤを介して、他方の集積回路チッ
プに伝達される構成としたことを特徴とする。 [0008] In addition, the semiconductor integrated circuit device of the present onset Ming, Li
On both sides of the chip mounting part of the card frame.
Circuit chip is mounted, each electrode of each integrated circuit chip and each electrode
Resin with lead wires connected by bonding wires
In sealed semiconductor integrated circuit device, the common circuit for realizing the functions common to each of the integrated circuit chip is provided only in one of the integrated circuit chip, the common provided on only one of the integrated circuit chip described above the output signal of the circuit is the one
To the integrated circuit chip substrate
Electrodes that receive force signals, chip mounting parts of the lead frame,
And through the bonding wires, it you wherein where the structure is transmitted to the other integrated circuit chip.
【0009】一実施形態の半導体集積回路装置は、上記
各集積回路チップが、それぞれメモリチップであり、上
記共通回路がアドレス遷移検出回路であることを特徴と
する。 In one embodiment, the semiconductor integrated circuit device is
Each integrated circuit chip is a memory chip.
The common circuit is an address transition detection circuit.
I do.
【0010】一実施形態の半導体集積回路装置は、上記
共通回路が、基板バイアス発生回路であることを特徴と
する。 In one embodiment, the semiconductor integrated circuit device is
The common circuit is a substrate bias generation circuit.
I do.
【0011】一実施形態の半導体集積回路装置は、上記
各集積回路チップに共通する第1の共通回路が、何れか
一方の集積回路チップにのみ設けられ、上記一方の集積
回路チップにのみ設けられた上記第1の共通回路の出力
信号が、この出力信号を受ける電極、封止樹脂の内部に
設けられて外部には導出されないリードおよびボンディ
ングワイヤを介して、上記他方の集積回路チップに伝達
されると共に、上記各集積回路チップに共通する第2の
共通回路が、上記他方の集積回路チップにのみ設けら
れ、上記他方の集積回路チップにのみ設けられた上記第
2の共通回路の出力信号が、この出力信号を受ける電
極、封止樹脂の内部に設けられて外部には導出されない
リードおよびボンディングワイヤを介して、上記一方の
集積回路チップに伝達される構成としたことを特徴とす
る。 In one embodiment, the semiconductor integrated circuit device is
The first common circuit common to each integrated circuit chip is:
Provided on only one of the integrated circuit chips,
Output of the first common circuit provided only on the circuit chip
The signal is applied to the electrode receiving this output signal,
Leads and bonds that are provided and are not led out
To the other integrated circuit chip via
And the second common circuit chip
A common circuit is provided only on the other integrated circuit chip.
And the second integrated circuit chip provided only on the other integrated circuit chip.
The output signal of the common circuit 2 receives the output signal.
The poles are provided inside the sealing resin and are not led out
One of the above via a lead and a bonding wire
Characterized in that it is configured to be transmitted to an integrated circuit chip.
You.
【0012】かかる本発明の半導体集積回路装置によれ
ば、チップ面積の縮小、及び、消費電力の低減を図るこ
とができるものである。According to the semiconductor integrated circuit device of the present invention , the chip area and power consumption can be reduced.
【0013】[0013]
【発明の実施の形態】以下、本発明の実施形態につい
て、図面を参照して詳細に説明する。Embodiments of the present invention will be described below in detail with reference to the drawings.
【0014】図1は、本発明の一実施形態である半導体
集積回路装置の概略的構成図である。FIG. 1 is a schematic configuration diagram of a semiconductor integrated circuit device according to one embodiment of the present invention.
【0015】本実施形態は、構造的には、図2に示す従
来の半導体集積回路装置の構造と同一であり、図1にお
いては、特徴部分のみを示している。図において、11
及び12は、それぞれ、集積回路チップであり、例え
ば、同一容量のメモリチップ(DRAM、ROM等)で
ある。本実施形態においては、両集積回路チップに共通
の機能を実現する共通回路13を、集積回路チップ11
の側にのみ設けている。したがって、該共通回路13の
出力信号を他方の集積回路チップ12に伝達する必要が
ある。上記信号伝達は、共通回路13の出力信号を受け
る電極14、ボンディングワイヤ15、内部リード16
(封止樹脂の外部には導出されない、すなわち、封止樹
脂の内部に埋設させて設けられるリード)、ボンディン
グワイヤ17、及び、他方の集積回路チップ12の電極
18を介して行われる。なお、図においては、共通回路
13の出力信号線を1本として示しているが、これは、
複数本であってもよいことは言うまでもない。また、図
において、19は、集積回路チップ11において、上記
共通回路13の出力を受ける内部回路であり、20は、
集積回路チップ12において、上記共通回路13の出力
を受ける内部回路である。更に、21及び22は、それ
ぞれ、集積回路チップ11及び12に設けられる通常の
電極、23は共通リード端子(その一端は封止樹脂の外
部に導出されている)、24及び25は、それぞれ、共
通リード端子23と、電極21及び22との間を接続す
るボンディングワイヤである。また、26及び27は、
それぞれ、電極21及び22に接続される静電保護回路
である。なお、電極14及び18に対しては、リード1
6が封止樹脂の外部には導出されないため、特に、静電
保護回路を設ける必要は無い。The present embodiment is structurally the same as the structure of the conventional semiconductor integrated circuit device shown in FIG. 2, and FIG. 1 shows only the characteristic portions. In the figure, 11
And 12 are integrated circuit chips, for example, memory chips (DRAM, ROM, etc.) having the same capacity. In the present embodiment, a common circuit 13 that realizes a function common to both integrated circuit chips is provided by an integrated circuit chip 11.
Is provided only on the side of. Therefore, it is necessary to transmit the output signal of the common circuit 13 to the other integrated circuit chip 12. The signal transmission is performed by the electrode 14 receiving the output signal of the common circuit 13, the bonding wire 15, and the internal lead 16.
(Leads that are not led out of the sealing resin, that is, are provided by being buried inside the sealing resin), bonding wires 17, and electrodes 18 of the other integrated circuit chip 12. In the drawing, the output signal line of the common circuit 13 is shown as a single line.
Needless to say, there may be more than one. In the figure, reference numeral 19 denotes an internal circuit of the integrated circuit chip 11 which receives an output of the common circuit 13;
In the integrated circuit chip 12, the internal circuit receives the output of the common circuit 13. Further, 21 and 22 are ordinary electrodes provided on the integrated circuit chips 11 and 12, respectively, 23 is a common lead terminal (one end thereof is led out of the sealing resin), and 24 and 25 are respectively This is a bonding wire that connects between the common lead terminal 23 and the electrodes 21 and 22. Also, 26 and 27 are
These are electrostatic protection circuits connected to the electrodes 21 and 22, respectively. Note that the leads 1 and
Since 6 is not led out of the sealing resin, it is not particularly necessary to provide an electrostatic protection circuit.
【0016】図3に、外部より入力されるチップ選択信
号に応じて、集積回路チップ11と、集積回路チップ1
2の何れか一方を有効とする制御回路部分の構成を示
す。FIG. 3 shows an integrated circuit chip 11 and an integrated circuit chip 1 according to a chip selection signal input from the outside.
2 shows a configuration of a control circuit portion that makes one of the two effective.
【0017】図に示す電極に、外部よりのチップ選択信
号が印加される。配線修正部の接続を集積回路チップ1
1と12とで異ならせることにより、チップ選択信号の
H、Lに応じて、何れか一方の集積回路チップの内部制
御信号がH、他方の集積回路チップの内部制御信号がL
となり、チップ選択が行われる。An external chip select signal is applied to the electrodes shown in FIG. Connect the wiring correction unit to the integrated circuit chip 1.
1 and 12, the internal control signal of one of the integrated circuit chips is H and the internal control signal of the other integrated circuit chip is L in accordance with the H and L of the chip selection signal.
And the chip selection is performed.
【0018】上記実施形態においては、一方の集積回路
チップ11に設けられた共通回路13の出力信号を、ボ
ンディングワイヤ、内部リードを介して、他方の集積回
路チップ12に伝達させる構成としているが、共通回路
を、基板バイアス発生回路とし、該回路の出力を、導電
性リードフレームのチップ搭載部を介して、他方の集積
回路チップの基板に伝達させる構成とすることもでき
る。In the above embodiment, the output signal of the common circuit 13 provided on one integrated circuit chip 11 is transmitted to the other integrated circuit chip 12 via bonding wires and internal leads. The common circuit may be a substrate bias generation circuit, and the output of the circuit may be transmitted to the substrate of the other integrated circuit chip via the chip mounting portion of the conductive lead frame.
【0019】かかる構成とした実施形態の概略構成図を
図7に示す。FIG. 7 shows a schematic configuration diagram of an embodiment having such a configuration.
【0020】本実施形態は、構造的には、図2に示す従
来の半導体集積回路装置の構造と同一であり、図7にお
いては、特徴部分のみを示している。図において、71
及び72は、それぞれ、同一容量のDRAMチップであ
る。本実施形態においては、基板バイアス発生回路73
を、DRAMチップ71の側にのみ設けている。該基板
バイアス発生回路73の出力である負電圧VBBは、DR
AMチップ71の基板74に与えられると共に、導電性
のチップ搭載部75を介して、他方のDRAMチップ7
2の基板76にも与えられる。The present embodiment is structurally the same as the structure of the conventional semiconductor integrated circuit device shown in FIG. 2, and FIG. 7 shows only the characteristic portions. In the figure, 71
And 72 are DRAM chips having the same capacity. In the present embodiment, the substrate bias generation circuit 73
Are provided only on the DRAM chip 71 side. The negative voltage V BB output from the substrate bias generation circuit 73 is equal to DR
The other DRAM chip 7 is provided to the substrate 74 of the AM chip 71 and is also connected to the other DRAM chip 7 through the conductive chip mounting portion 75.
The second substrate 76 is also provided.
【0021】なお、77は、基板バイアス発生回路73
及びその他の部分にGND電位を印加するためのGND
電極であり、78は該GND電極77とボンディングワ
イヤ79を介して接続されるGND端子である。GND
端子78は、DRAMチップ72のGND電極(図示せ
ず)とも、ボンディングワイヤ80を介して接続されて
いる。Reference numeral 77 denotes a substrate bias generating circuit 73.
And GND for applying a GND potential to other parts
Reference numeral 78 denotes a GND terminal connected to the GND electrode 77 via a bonding wire 79. GND
The terminal 78 is also connected to a GND electrode (not shown) of the DRAM chip 72 via a bonding wire 80.
【0022】図8に、DRAMチップ71の概略構成図
を示す。図に於いて、81は、P基板であり、82はN
ウェルである。また、83は、P基板81上に形成され
た、周辺回路を構成するNチャネルMOSトランジスタ
であり、84は、Nウェル上に形成された、同Pチャネ
ルMOSトランジスタである。更に、85は、メモリセ
ルの選択トランジスタであり、86は、同キャパシタで
ある。そして、87は、基板バイアス発生回路であり、
P基板81に対して、所定の負電圧VBBを与えている。
このように、基板バイアス電圧VBBを発生し、基板に与
えることにより、メモリセルの選択トランジスタ(Nチ
ャネルMOSトランジスタ)85の閾値が高くなり、メ
モリセル・キャパシタ86のリーク電流が減少し、デー
タ保持時間の増大を図ることができるものである。FIG. 8 shows a schematic configuration diagram of the DRAM chip 71. In the figure, 81 is a P substrate, and 82 is an N substrate.
Well. Reference numeral 83 denotes an N-channel MOS transistor formed on a P substrate 81 and constituting a peripheral circuit, and reference numeral 84 denotes a P-channel MOS transistor formed on an N well. Further, 85 is a select transistor of the memory cell, and 86 is the same capacitor. Reference numeral 87 denotes a substrate bias generation circuit,
A predetermined negative voltage V BB is applied to P substrate 81.
As described above, by generating and applying the substrate bias voltage V BB to the substrate, the threshold value of the selection transistor (N-channel MOS transistor) 85 of the memory cell increases, the leak current of the memory cell capacitor 86 decreases, and the data The holding time can be increased.
【0023】上記実施形態においては、共通回路13
(基板バイアス発生回路73)を一方の集積回路チップ
11(DRAMチップ71)にのみ設ける構成としてい
るが、例えば、第1の共通回路は、一方の集積回路チッ
プ11にのみ設け、その出力信号を、ボンディングワイ
ヤ及び内部リード、又はチップ搭載部を介して、他方の
集積回路チップ12に伝達させると共に、第2の共通回
路は、他方の集積回路チップ12にのみ設け、その出力
信号を、他のボンディングワイヤ及び内部リード、又は
チップ搭載部を介して、一方の集積回路チップ11に伝
達させる構成とすることもできる。In the above embodiment, the common circuit 13
Although the (substrate bias generation circuit 73) is provided only on one integrated circuit chip 11 (DRAM chip 71), for example, the first common circuit is provided only on one integrated circuit chip 11 and its output signal is The second common circuit is provided only to the other integrated circuit chip 12 via the bonding wire and the internal lead or the chip mounting portion, and the second common circuit is provided only to the other integrated circuit chip 12, and the output signal is transmitted to another integrated circuit chip 12. The configuration may be such that the signal is transmitted to one integrated circuit chip 11 via a bonding wire and an internal lead or a chip mounting portion.
【0024】図4は、上記共通回路を、メモリチップに
於いて設けられるアドレス遷移検出回路(ATD回路)
とした実施形態の概略構成図である。FIG. 4 shows an example in which the above-mentioned common circuit is replaced with an address transition detection circuit (ATD circuit) provided in a memory chip.
FIG. 2 is a schematic configuration diagram of an embodiment according to the present invention.
【0025】図において、41及び42は、それぞれ、
同一容量のメモリチップ(DRAM、ROM等)であ
る。本実施形態においては、アドレス遷移検出回路(A
TD回路)43を、メモリチップ41の側にのみ設けて
いる。したがって、該ATD回路43の出力信号(AT
D信号)を他方のメモリチップ42に伝達する必要があ
る。上記信号伝達は、ATD回路43の出力信号を受け
る電極44、ボンディングワイヤ45、内部リード46
(封止樹脂の外部には導出されない、すなわち、封止樹
脂の内部に埋設させて設けられるリード)、ボンディン
グワイヤ47、及び、他方のメモリチップ42の電極4
8を介して行われる。また、図において、49は、メモ
リチップ41において、上記ATD回路43の出力を受
ける内部回路であり、例えば、ビット線プリチャージ信
号PRC1を出力する回路であり、50は、メモリチッ
プ42において、上記ATD回路43の出力を受ける内
部回路であり、例えば、ビット線プリチャージ信号PR
C2を出力する回路である。更に、51及び52は、そ
れぞれ、メモリチップ41及び42に設けられるアドレ
ス入力用の電極、53は共通リード端子(アドレス入力
端子。その一端は封止樹脂の外部に導出されている)、
54及び55は、それぞれ、共通リード端子53と、電
極51及び52との間を接続するボンディングワイヤで
ある。また、56及び57は、それぞれ、電極51及び
52に接続されるアドレスバッファ回路である。In the figure, 41 and 42 are respectively
Memory chips (DRAM, ROM, etc.) of the same capacity. In the present embodiment, the address transition detection circuit (A
The TD circuit 43 is provided only on the memory chip 41 side. Therefore, the output signal of the ATD circuit 43 (AT
D signal) to the other memory chip 42. The signal transmission is performed by the electrode 44 receiving the output signal of the ATD circuit 43, the bonding wire 45, and the internal lead 46.
(Leads that are not led out of the sealing resin, that is, are provided by being buried inside the sealing resin), bonding wires 47, and electrodes 4 of the other memory chip 42
8 is performed. In the figure, reference numeral 49 denotes an internal circuit that receives the output of the ATD circuit 43 in the memory chip 41, for example, a circuit that outputs a bit line precharge signal PRC1. An internal circuit receiving the output of the ATD circuit 43, for example, the bit line precharge signal PR
This is a circuit that outputs C2. Further, 51 and 52 are address input electrodes provided on the memory chips 41 and 42, respectively, 53 is a common lead terminal (address input terminal, one end of which is led out of the sealing resin),
54 and 55 are bonding wires connecting between the common lead terminal 53 and the electrodes 51 and 52, respectively. 56 and 57 are address buffer circuits connected to the electrodes 51 and 52, respectively.
【0026】図5に、ATD回路の構成例を示し、ま
た、図6に、プリチャージ信号も含めたタイミングチャ
ートを示す。FIG. 5 shows a configuration example of the ATD circuit, and FIG. 6 shows a timing chart including a precharge signal.
【0027】[0027]
【発明の効果】以上詳細に説明したように、本発明の半
導体集積回路装置によれば、チップ面積の縮小、及び、
消費電力の低減を図ることができるものである。As described above in detail, according to the semiconductor integrated circuit device of the present invention , the chip area can be reduced and
The power consumption can be reduced.
【図1】本発明の一実施形態の概略構成図である。FIG. 1 is a schematic configuration diagram of an embodiment of the present invention.
【図2】従来の両面搭載型半導体集積回路装置の構成図
である。FIG. 2 is a configuration diagram of a conventional double-sided mounted semiconductor integrated circuit device.
【図3】図1に示される各集積回路チップに設けられる
チップ選択制御回路部分の構成図である。FIG. 3 is a configuration diagram of a chip selection control circuit portion provided in each integrated circuit chip shown in FIG. 1;
【図4】本発明の他の実施形態の概略構成図である。FIG. 4 is a schematic configuration diagram of another embodiment of the present invention.
【図5】ATD回路の構成図である。FIG. 5 is a configuration diagram of an ATD circuit.
【図6】ATD回路の動作タイミングチャートである。FIG. 6 is an operation timing chart of the ATD circuit.
【図7】本発明の他の実施形態の概略構成図である。FIG. 7 is a schematic configuration diagram of another embodiment of the present invention.
【図8】DRAMチップの概略構成図である。FIG. 8 is a schematic configuration diagram of a DRAM chip.
11、12 集積回路チップ 13 共通回路 14、18 電極 15、17 ボンディングワイヤ 16 内部リード 41、42 メモリチップ 43 ATD回路 44、48 電極 45、47 ボンディングワイヤ 46 内部リード 71、72 DRAMチップ 73 基板バイアス発生回路 74、76 基板 75 チップ搭載部 11, 12 integrated circuit chip 13 common circuit 14, 18 electrode 15, 17 bonding wire 16 internal lead 41, 42 memory chip 43 ATD circuit 44, 48 electrode 45, 47 bonding wire 46 internal lead 71, 72 DRAM chip 73 substrate bias generation Circuit 74, 76 Substrate 75 Chip mounting section
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平7−130949(JP,A) 特開 平8−18003(JP,A) 特開 平8−139204(JP,A) 特開 平8−167703(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01L 25/00 - 25/18 ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-7-130949 (JP, A) JP-A-8-18003 (JP, A) JP-A 8-139204 (JP, A) JP-A 8- 167703 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) H01L 25/00-25/18
Claims (5)
に、それぞれ集積回路チップが搭載され、該各集積回路
チップの各電極と各リード端子間がボンディングワイヤ
にて接続された樹脂封止型半導体集積回路装置におい
て、上記各集積回路チップに共通の機能を実現する共通回路
が、何れか一方の集積回路チップにのみ設けられ、 上記一方の集積回路チップにのみ設けられた上記共通回
路の出力信号が、この出力信号を受ける電極、封止樹脂
の内部に設けられて外部には導出されないリードおよび
ボンディングワイヤを介して、他方の集積回路チップに
伝達される 構成としたことを特徴とする半導体集積回路
装置。1. A resin-sealed semiconductor integrated circuit in which integrated circuit chips are mounted on both sides of a chip mounting portion of a lead frame, and each electrode of each integrated circuit chip and each lead terminal are connected by bonding wires. In a circuit device, a common circuit that realizes a function common to each of the integrated circuit chips
Is provided only on one of the integrated circuit chips, and the common circuit provided only on the one integrated circuit chip.
The output signal of the path is an electrode receiving this output signal, the sealing resin
And the lead which is provided inside and is not led out
Via bonding wires to the other integrated circuit chip
A semiconductor integrated circuit device having a configuration in which transmission is performed .
に、それぞれ集積回路チップが搭載され、該各集積回路
チップの各電極と各リード端子間がボンディングワイヤ
にて接続された樹脂封止型半導体集積回路装置におい
て、 上記各集積回路チップに共通の機能を実現する共通回路
が、何れか一方の集積回路チップにのみ設けられ、上記 一方の集積回路チップにのみ設けられた上記共通回
路の出力信号が上記一方の集積回路チップの基板に与え
られると共に、上記出力信号を受ける電極、リードフレ
ームのチップ搭載部およびボンディングワイヤを介し
て、他方の集積回路チップに伝達される構成としたこと
を特徴とする半導体集積回路装置。2. Both sides of a chip mounting portion of a lead frame.
Integrated circuit chips are mounted on the respective integrated circuits.
Bonding wire between each chip electrode and each lead terminal
In a resin-sealed semiconductor integrated circuit device connected by
Te, common circuit for realizing the functions common to each of the integrated circuit chip is provided only in one of the integrated circuit chip, the output signal of the common circuit provided only on one of the integrated circuit chip described above one above Given to the substrate of the integrated circuit chip
Electrodes and the lead frame
Via the chip mounting part and bonding wire
Te, other integrated circuit semi-conductor integrated circuit device you characterized by being configured to be transmitted to the chip.
おいて、 上記各集積回路チップが、それぞれメモリチップであ
り、上記共通回路がアドレス遷移検出回路であることを
特徴とする半導体集積回路装置。 3. The semiconductor integrated circuit device according to claim 1,
Oite, each integrated circuit chip, a memory chip der respectively
That is, the common circuit is an address transition detection circuit.
A semiconductor integrated circuit device characterized by the above-mentioned.
おいて、 上記共通回路が、基板バイアス発生回路であることを特
徴とする半導体集積回路装置。 4. The semiconductor integrated circuit device according to claim 2,
Oite, the common circuit, that the substrate bias generating circuit Laid
Semiconductor integrated circuit device.
おいて、 上記各集積回路チップに共通する第1の共通回路が、何
れか一方の集積回路チップにのみ設けられ、上記一方の
集積回路チップにのみ設けられた上記第1の共通回路の
出力信号が、この出力信号を受ける電極、封止樹脂の内
部に設けられて 外部には導出されないリードおよびボン
ディングワイヤを介して、上記他方の集積回路チップに
伝達されると共に、 上記各集積回路チップに共通する第2の共通回路が、上
記他方の集積回路チップにのみ設けられ、上記他方の集
積回路チップにのみ設けられた上記第2の共通回路の出
力信号が、この出力信号を受ける電極、封止樹脂の内部
に設けられて外部には導出されないリードおよびボンデ
ィングワイヤを介して、上記一方の集積回路チップに伝
達される構成としたことを特徴とする半導体集積回路装
置。 5. The semiconductor integrated circuit device according to claim 1,
Oite first common circuit common to each of the integrated circuit chip, what
Provided only on one of the integrated circuit chips,
Of the first common circuit provided only on the integrated circuit chip.
The output signal is applied to the electrode receiving the output signal and the sealing resin.
Leads and Bones that are provided in the
To the other integrated circuit chip via
Transmitted and a second common circuit common to the integrated circuit chips is
The other integrated circuit chip is provided only on the other integrated circuit chip.
The output of the second common circuit provided only in the integrated circuit chip
The force signal is applied to the electrode receiving this output signal and the inside of the sealing resin.
Leads and bonds that are
Via the connecting wire to one of the integrated circuit chips.
Semiconductor integrated circuit device characterized in that
Place.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13223697A JP3342645B2 (en) | 1997-04-25 | 1997-05-22 | Semiconductor integrated circuit device |
TW087105017A TW432669B (en) | 1997-04-25 | 1998-04-02 | Semiconductor integrated circuit device capable of achieving reductions in chip area and consumption power |
US09/054,893 US5949139A (en) | 1997-04-25 | 1998-04-03 | Semiconductor integrated circuit device capable of achieving reductions in chip area and consumption power |
KR1019980014637A KR19980081691A (en) | 1997-04-25 | 1998-04-24 | Semiconductor integrated circuit device can reduce chip area and power consumption |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10866997 | 1997-04-25 | ||
JP9-108669 | 1997-04-25 | ||
JP13223697A JP3342645B2 (en) | 1997-04-25 | 1997-05-22 | Semiconductor integrated circuit device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH118346A JPH118346A (en) | 1999-01-12 |
JP3342645B2 true JP3342645B2 (en) | 2002-11-11 |
Family
ID=26448503
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13223697A Expired - Fee Related JP3342645B2 (en) | 1997-04-25 | 1997-05-22 | Semiconductor integrated circuit device |
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Country | Link |
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JP (1) | JP3342645B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3768744B2 (en) * | 1999-09-22 | 2006-04-19 | 株式会社ルネサステクノロジ | Semiconductor device and manufacturing method thereof |
JP4627286B2 (en) * | 2006-09-05 | 2011-02-09 | エルピーダメモリ株式会社 | Semiconductor memory device and semiconductor device |
-
1997
- 1997-05-22 JP JP13223697A patent/JP3342645B2/en not_active Expired - Fee Related
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