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JP3297577B2 - Package for storing semiconductor elements - Google Patents

Package for storing semiconductor elements

Info

Publication number
JP3297577B2
JP3297577B2 JP02697096A JP2697096A JP3297577B2 JP 3297577 B2 JP3297577 B2 JP 3297577B2 JP 02697096 A JP02697096 A JP 02697096A JP 2697096 A JP2697096 A JP 2697096A JP 3297577 B2 JP3297577 B2 JP 3297577B2
Authority
JP
Japan
Prior art keywords
insulating base
semiconductor element
identification mark
package
mounting portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP02697096A
Other languages
Japanese (ja)
Other versions
JPH09223755A (en
Inventor
徳和 石橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP02697096A priority Critical patent/JP3297577B2/en
Publication of JPH09223755A publication Critical patent/JPH09223755A/en
Application granted granted Critical
Publication of JP3297577B2 publication Critical patent/JP3297577B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15192Resurf arrangement of the internal vias
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16195Flat cap [not enclosing an internal cavity]

Landscapes

  • Die Bonding (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はLSI(大規模集積
回路素子)等の半導体素子を収容するための半導体素子
収納用パッケージに関し、詳しくはパッケージ外表面に
おける識別標識の形成に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a package for accommodating a semiconductor device such as an LSI (Large Scale Integrated Circuit) or the like, and more particularly to the formation of an identification mark on the outer surface of the package.

【0002】[0002]

【従来の技術】半導体素子を収容するための半導体素子
収納用パッケージには、外部リード端子の取着位置によ
り、サイドブレーズパッケージやトップブレーズパッケ
ージ・ボトムブレーズパッケージなどの種類がある。こ
のうち従来のトップブレーズパッケージの一般的な構成
を図2に断面図で示す。
2. Description of the Related Art There are various types of semiconductor element housing packages for housing semiconductor elements, such as side blazed packages, top blazed packages, and bottom blazed packages, depending on the mounting positions of external lead terminals. FIG. 2 is a sectional view showing a general configuration of a conventional top braze package.

【0003】図2に断面図で示す従来の半導体素子収納
用パッケージ21は、例えば酸化アルミニウム質焼結体や
ムライト質焼結体・窒化アルミニウム焼結体・炭化珪素
質焼結体等の電気絶縁材料から成り、上面に半導体素子
26を載置収容するための載置部22aおよび載置部22a周
辺から外周縁にかけて導出されたタングステンあるいは
モリブデン・マンガン等の高融点金属粉末の焼結体から
成る複数個のメタライズ配線層23・23を有する絶縁基体
22と、半導体素子26を外部電気回路に電気的に接続する
ためにメタライズ配線層23・23に銀ロウや金−シリコン
ロウ等のロウ材を介して取着された外部リード端子24・
24と、蓋体25とから構成されており、絶縁基体22の載置
部22aに半導体素子26を金−シリコンロウ等のロウ材か
ら成る接着剤27を介して載置固定するとともに、半導体
素子26の各電極をボンディングワイヤ28・28を介してメ
タライズ配線層23・23に電気的に接続し、しかる後、絶
縁基体22上面に蓋体25をロウ材・ガラス・樹脂等の封止
材29・29を介して、あるいは溶接により接合して、絶縁
基体22と蓋体25とから成る容器内部に半導体素子26を気
密に封止している。これにより、製品としての半導体装
置となる。
A conventional package 21 for housing a semiconductor element shown in a sectional view in FIG. 2 is made of, for example, aluminum oxide sintered body, mullite sintered body, aluminum nitride sintered body, silicon carbide sintered body or the like. Made of material, semiconductor element on top
A mounting portion 22a for mounting and housing 26 and a plurality of metallized wiring layers 23, which are made of a sintered body of a refractory metal powder such as tungsten or molybdenum / manganese derived from the periphery of the mounting portion 22a to the outer periphery. Insulating substrate having 23
22 and external lead terminals 24 attached to the metallized wiring layers 23 via a brazing material such as silver brazing or gold-silicon brazing to electrically connect the semiconductor element 26 to an external electric circuit.
24, and a lid 25. The semiconductor element 26 is mounted and fixed on the mounting portion 22a of the insulating base 22 via an adhesive 27 made of a brazing material such as gold-silicon brazing. The electrodes 26 are electrically connected to the metallized wiring layers 23 via bonding wires 28, and then the lid 25 is placed on the upper surface of the insulating base 22 with a sealing material 29 such as brazing material, glass, resin, or the like. The semiconductor element 26 is hermetically sealed inside a container formed of the insulating base 22 and the lid 25 via a joint 29 or by welding. Thereby, a semiconductor device as a product is obtained.

【0004】また、絶縁基体22の下面には、半導体装置
の品番や製造者名、あるいは半導体装置の方向性を示す
識別標識30が被着形成されており、この識別標識30を目
視やカメラ等により認識することによって、半導体装置
の品番や製造者名、あるいは半導体装置の方向性が確認
できるようになっている。このような識別標識30は、一
般にタングステンやモリブデン等の高融点金属から成る
メタライズ層や絶縁基体22と色調が異なる絶縁層によっ
て形成されており、通常、20〜50μm程度の厚みを有し
ている。
On the lower surface of the insulating base 22, an identification mark 30 indicating the product number or manufacturer name of the semiconductor device or the direction of the semiconductor device is formed. Thus, it is possible to confirm the product number and the manufacturer name of the semiconductor device, or the directionality of the semiconductor device. Such an identification mark 30 is generally formed of a metallized layer made of a high melting point metal such as tungsten or molybdenum or an insulating layer having a color tone different from that of the insulating base 22, and usually has a thickness of about 20 to 50 μm. .

【0005】このような半導体素子収納用パッケージ21
において絶縁基体22の載置部22aに半導体素子26を接着
固定する方法としては、接着剤27が溶融する温度以上に
絶縁基体22を加熱し、加熱された絶縁基体22の載置部22
aに上記接着剤27を介して半導体素子26を載置して、半
導体素子26を複数回スクライブすることにより載置部22
aと半導体素子26下面との間に接着剤27を濡れ広がら
せ、しかる後に接着剤27を冷却固化させる方法が採用さ
れている。
[0005] Such a package 21 for housing a semiconductor element.
The method for bonding and fixing the semiconductor element 26 to the mounting portion 22a of the insulating base 22 is as follows: the insulating base 22 is heated to a temperature at which the adhesive 27 is melted or higher, and the mounting portion 22 of the heated insulating base 22 is heated.
a, the semiconductor element 26 is placed via the adhesive 27, and the semiconductor element 26 is scribed a plurality of times.
A method is employed in which the adhesive 27 is wet and spread between a and the lower surface of the semiconductor element 26, and then the adhesive 27 is cooled and solidified.

【0006】そして絶縁基体22を加熱するにはヒーター
ブロックが用いられ、ヒーターブロックの上面に設けら
れた平坦な載置面に絶縁基体22をその下面が密着するよ
うに載置して、所定の温度に加熱することが行なわれて
いる。
A heater block is used to heat the insulating base 22, and the insulating base 22 is mounted on a flat mounting surface provided on the upper surface of the heater block such that the lower surface thereof is in close contact with the heater base. Heating to temperature has been performed.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、従来の
半導体素子収納用パッケージ21では、絶縁基体22の下面
に被着形成された識別標識30の厚みが20〜50μm程度あ
るため、ヒーターブロックの平坦な載置面に絶縁基体22
の下面を載置すると、載置部22aに対向する絶縁基体22
の下面とヒーターブロックの載置面との間に識別標識30
の厚みに起因する隙間が形成されていた。そのため、ヒ
ーターブロックから絶縁基体22への熱の伝達が阻害され
てしまい、絶縁基体22を所定の温度に加熱するのに長時
間を要するという問題点があった。
However, in the conventional package 21 for accommodating a semiconductor element, since the thickness of the identification mark 30 formed on the lower surface of the insulating base 22 is about 20 to 50 μm, the flatness of the heater block is reduced. Insulation base 22 on mounting surface
When the lower surface of the insulating substrate 22 is placed,
Mark 30 between the lower surface of the heater and the mounting surface of the heater block.
A gap was formed due to the thickness of the substrate. Therefore, the transfer of heat from the heater block to the insulating base 22 is hindered, and there is a problem that it takes a long time to heat the insulating base 22 to a predetermined temperature.

【0008】また、絶縁基体22の下面とヒーターブロッ
クの載置面との接触に偏りが生じて両者の接触面積が極
めて小さくなってしまい、絶縁基体22が局部的に加熱さ
れてその内部に急峻な温度勾配が形成されるために、大
きな熱応力が発生して絶縁基体22に割れやクラックを発
生させてしまうという問題点もあった。
Further, the contact between the lower surface of the insulating base 22 and the mounting surface of the heater block is deviated, and the contact area between the two becomes extremely small, and the insulating base 22 is locally heated and steeply enters inside. Since a large temperature gradient is formed, there is also a problem that a large thermal stress is generated and a crack or a crack is generated in the insulating base 22.

【0009】これに対して、絶縁基体の下面に凹部を形
成して、この凹部を識別標識とすることによって絶縁基
体の下面とヒーターブロックの載置面とがほぼ一様に接
触するようにした半導体素子収納用パッケージが提案さ
れている。しかし、これによれば、絶縁基体の加熱のた
めの接触状態は改善されるものの、識別標識と絶縁基体
との色調が同一となるので目視やカメラ等による識別標
識の認識が困難であるという問題点があった。
On the other hand, a concave portion is formed on the lower surface of the insulating substrate, and the concave portion is used as an identification mark, so that the lower surface of the insulating substrate and the mounting surface of the heater block are almost uniformly contacted. A package for housing a semiconductor element has been proposed. However, according to this, although the contact state for heating the insulating base is improved, the color tone of the identification mark and the insulating base becomes the same, so that it is difficult to visually recognize the identification mark by a camera or the like. There was a point.

【0010】本発明はこのような従来技術の問題点に鑑
みて案出されたものであり、その目的は、目視やカメラ
による識別標識の認識が容易であるとともに、絶縁基体
の下面とヒーターブロックの載置面とを一様に接触させ
ることができて、半導体素子を接着固定するための加熱
を短時間でかつ均一に行なうことができる半導体素子収
納用パッケージを提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the prior art, and it is an object of the present invention to make it easy to visually recognize an identification mark by a camera and to recognize the lower surface of an insulating substrate and a heater block. An object of the present invention is to provide a package for housing a semiconductor element, which can uniformly contact the mounting surface of the semiconductor element and can perform heating for bonding and fixing the semiconductor element in a short time and uniformly.

【0011】[0011]

【課題を解決するための手段】本発明は、上面に半導体
素子が載置される載置部を有し、下面に識別標識が被着
されている絶縁基体と、蓋体とから成り、内部に半導体
素子を収容するための空所を有する半導体素子収納用パ
ッケージであって、前記絶縁基体の下面の少なくとも前
記載置部に対向する領域に、前記識別標識の高さと同じ
もしくはそれ以上の高さを有する平坦な被着層が、前記
識別標識を露出させるようにして形成されていることを
特徴とするものである。
According to the present invention, there is provided an insulating base having a mounting portion on which a semiconductor element is mounted on an upper surface and an identification mark attached on a lower surface; A semiconductor element housing package having a space for housing a semiconductor element, wherein at least a region of the lower surface of the insulating base facing the mounting portion has a height equal to or higher than the height of the identification mark. A flat adherent layer having a thickness is formed so as to expose the identification mark.

【0012】[0012]

【発明の実施の形態】本発明の半導体素子収納用パッケ
ージによれば、半導体素子が載置される載置部に対向す
る絶縁基体の下面の領域に、識別標識の高さと同じもし
くはそれ以上の高さを有する平坦な被着層を、識別標識
が露出するように形成したことから、載置部への半導体
素子の接着固定の際に絶縁基体をヒーターブロックに載
置した場合、絶縁基体の下面の少なくとも載置部に対向
する領域に形成された平坦な被着層とヒーターブロック
の載置面とが識別標識に影響されることなく一様に接触
して、ヒーターブロックの熱を良好かつ一様に絶縁基体
に伝達することができる。そのため、絶縁基体の載置部
の温度が短時間で所定の温度となり、半導体素子を効率
良く接着固定することができる。
According to the semiconductor device housing package of the present invention, the height of the identification mark is equal to or higher than the height of the identification mark in the region of the lower surface of the insulating base opposite to the mounting portion on which the semiconductor device is mounted. Since the flat adherent layer having a height is formed so that the identification mark is exposed, when the insulating base is placed on the heater block when the semiconductor element is adhered and fixed to the mounting portion, the insulating base is formed. A flat adhered layer formed at least in a region opposed to the mounting portion on the lower surface and the mounting surface of the heater block are uniformly contacted without being affected by the identification mark, so that the heat of the heater block is good and It can be transmitted uniformly to the insulating substrate. Therefore, the temperature of the mounting portion of the insulating base becomes a predetermined temperature in a short time, and the semiconductor element can be efficiently bonded and fixed.

【0013】また、被着層を絶縁基体の下面のほぼ全面
にわたるように形成した場合には、その被着層の平坦な
広い面積でもって絶縁基体がヒーターブロックの載置面
に接触することから、絶縁基体とヒーターブロックとの
接触に従来の識別標識のみが形成された場合のような偏
りがなくなるので、絶縁基体が局部的に加熱されること
を防止することができる。そのため、絶縁基体中に急峻
な温度勾配が形成されることがなくなり、大きな熱応力
が発生して絶縁基体に割れやクラックが発生するのを防
止することができる。
When the adhered layer is formed so as to cover almost the entire lower surface of the insulating base, the insulating base comes into contact with the mounting surface of the heater block due to the flat large area of the adhered layer. In addition, since the contact between the insulating base and the heater block is not biased as in the case where only the conventional identification mark is formed, it is possible to prevent the insulating base from being locally heated. Therefore, a steep temperature gradient is not formed in the insulating substrate, and it is possible to prevent a large thermal stress from being generated and the insulating substrate from being cracked or cracked.

【0014】さらに、被着層は識別標識が露出するよう
に形成されているので、被着層を絶縁基体の下面のほぼ
全面にわたって形成した場合であっても、目視やカメラ
等により識別標識を容易に認識することができる。
Further, since the identification layer is formed so that the identification mark is exposed, even if the adhesion layer is formed over substantially the entire lower surface of the insulating base, the identification mark can be visually or camera-mounted. It can be easily recognized.

【0015】次に、本発明を添付図面に基づき詳細に説
明する。
Next, the present invention will be described in detail with reference to the accompanying drawings.

【0016】図1は本発明の半導体素子収納用パッケー
ジの一実施例を示す断面図である。
FIG. 1 is a sectional view showing an embodiment of a package for housing a semiconductor element according to the present invention.

【0017】図1の半導体素子収納用パッケージ1にお
いて、2は絶縁基体であり、その上面に半導体素子6を
ロウ材から成る接着剤7を介して接着固定して載置収容
するための凹状の載置部2aを有している。なお、接着
剤7には必要に応じてガラスや樹脂等を用いてもよい。
また、5は蓋体であり、絶縁基体2上面にロウ材・ガラ
ス・樹脂等の封止材9・9を介して、あるいは溶接によ
り接合されることによって、この蓋体5と絶縁基体2と
で半導体素子6を気密に収容するための空所が形成され
る。
In the semiconductor device housing package 1 shown in FIG. 1, reference numeral 2 denotes an insulating base, and a concave shape for mounting and housing the semiconductor device 6 on the upper surface thereof by bonding and fixing the semiconductor device 6 with an adhesive 7 made of brazing material. It has a mounting portion 2a. Note that glass, resin, or the like may be used for the adhesive 7 as necessary.
Reference numeral 5 denotes a lid, which is joined to the upper surface of the insulating base 2 via a sealing material 9 such as a brazing material, glass, resin, or by welding, so that the lid 5 and the insulating base 2 are connected to each other. This forms a space for housing the semiconductor element 6 in an airtight manner.

【0018】絶縁基体2は、酸化アルミニウム質焼結体
やムライト質焼結体・窒化アルミニウム焼結体・炭化珪
素質焼結体等の電気絶縁材料から成り、従来周知のセラ
ミックグリーンシート積層法によって作製されている。
例えば、酸化アルミニウム質焼結体から成る場合には、
酸化アルミニウム・酸化珪素・酸化マグネシウム・酸化
カルシウム等の原料粉末に適当な有機バインダ・溶剤等
を添加混合して泥漿物を作るとともに、その泥漿物をド
クターブレード法やカレンダーロール法を採用すること
によってセラミックグリーンシート(セラミック生シー
ト)と成し、しかる後、前記セラミックグリーンシート
に適当な打ち抜き加工を施すとともにこれを複数枚積層
し、約1600℃の温度で焼成することによって作製され
る。
The insulating substrate 2 is made of an electrically insulating material such as an aluminum oxide sintered body, a mullite sintered body, an aluminum nitride sintered body, and a silicon carbide sintered body, and is formed by a conventionally known ceramic green sheet laminating method. Have been made.
For example, in the case of an aluminum oxide sintered body,
By adding a suitable organic binder, solvent, etc. to the raw material powders such as aluminum oxide, silicon oxide, magnesium oxide, calcium oxide, etc. to make a slurry, and using the doctor blade method or calendar roll method A ceramic green sheet (ceramic green sheet) is formed. Thereafter, the ceramic green sheet is subjected to an appropriate punching process, and a plurality of the green sheets are laminated and fired at a temperature of about 1600 ° C.

【0019】絶縁基体2の載置部2a周辺から外周縁に
かけては複数個のメタライズ配線層3・3が形成されて
おり、このメタライズ配線層3・3の載置部2a周辺部
には半導体素子6の各電極がボンディングワイヤ8・8
を介して電気的に接続され、一方、絶縁基体2の上面外
周縁に導出された部位には外部電気回路と接続される外
部リード端子4・4が銀ロウや金−シリコンロウ等のロ
ウ材を介してロウ付け取着されている。
A plurality of metallized wiring layers 3.3 are formed from the periphery of the mounting portion 2a of the insulating base 2 to the outer peripheral edge, and a semiconductor element is provided around the mounting portion 2a of the metallized wiring layers 3.3. 6 are bonding wires 8.8
The external lead terminals 4.4 connected to an external electric circuit are electrically connected to the outer peripheral edge of the upper surface of the insulating base 2 by a brazing material such as silver brazing or gold-silicon brazing. Is attached via brazing.

【0020】メタライズ配線層3・3は半導体素子6の
各電極を外部電気回路に接続する際の導電路として作用
し、タングステン・モリブデン・マンガン等の高融点金
属粉末の焼結体により形成されている。
The metallized wiring layers 3, 3 function as conductive paths for connecting each electrode of the semiconductor element 6 to an external electric circuit, and are formed of a sintered body of a high melting point metal powder such as tungsten, molybdenum, manganese or the like. I have.

【0021】このメタライズ配線層3・3は、タングス
テン・モリブデン・マンガン等の高融点金属粉末に適当
な有機バインダ・溶剤等を添加混合して得た金属ペース
トを絶縁基体2となるセラミックグリーンシートに予め
従来周知のスクリーン印刷法により所定パターンに印刷
塗布しておき、それらをビアホールによって接続してお
くことによって、絶縁基体2の載置部2a周辺から外周
縁にかけて形成される。
The metallized wiring layers 3 and 3 are formed by adding a metal paste obtained by adding a suitable organic binder and a solvent to a high melting point metal powder such as tungsten, molybdenum and manganese to a ceramic green sheet serving as an insulating substrate 2. A predetermined pattern is printed and applied in advance by a conventionally well-known screen printing method, and these are connected by via holes, so that the insulating base 2 is formed from the periphery of the mounting portion 2a to the outer peripheral edge.

【0022】また、メタライズ配線層3・3の露出表面
には、ニッケル・金等の耐蝕性に優れかつロウ材との濡
れ性に優れる金属を1.0 〜20μmの厚みにメッキ法によ
り層着させておくと、メタライズ配線層3・3の酸化腐
食を有効に防止することができるとともに、メタライズ
配線層3・3への外部リード端子4・4のロウ付けを強
固となすことができて好ましい。
On the exposed surfaces of the metallized wiring layers 3, 3, a metal such as nickel or gold having excellent corrosion resistance and excellent wettability with a brazing material is applied by plating to a thickness of 1.0 to 20 μm. In this case, the oxidation corrosion of the metallized wiring layers 3.3 can be effectively prevented, and the brazing of the external lead terminals 4, 4 to the metallized wiring layers 3.3 is preferable.

【0023】さらに、メタライズ配線層3・3には外部
リード端子4・4が銀ロウや金−シリコンロウ等のロウ
材を介してロウ付け取着されており、外部リード端子4
・4はパッケージ1内部の空所に収容する半導体素子6
の各電極を外部電気回路に電気的に接続する作用をなす
ので、外部リード端子4・4を外部電気回路に接続する
ことによって、半導体素子6はメタライズ配線層3・3
および外部リード端子4・4を介して外部電気回路に接
続されることとなる。
Further, external lead terminals 4.4 are soldered and attached to the metallized wiring layers 3.3 via a brazing material such as silver brazing or gold-silicon brazing.
4 is a semiconductor element 6 housed in a space inside the package 1
Is electrically connected to an external electric circuit. By connecting the external lead terminals 4 to the external electric circuit, the semiconductor element 6 can be connected to the metallized wiring layers 3.3.
In addition, it is connected to an external electric circuit via the external lead terminals 4.

【0024】外部リード端子4・4は鉄−ニッケル−コ
バルト合金や鉄−ニッケル合金等の金属材料から成り、
例えば、鉄−ニッケル−コバルト合金等の金属から成る
インゴット(塊)に圧延加工法や打ち抜き加工法等、従
来周知の金属加工法を採用することによって所定の形状
に形成される。
The external lead terminals 4 are made of a metal material such as an iron-nickel-cobalt alloy or an iron-nickel alloy.
For example, it is formed into a predetermined shape by employing a conventionally known metal working method such as a rolling method or a punching method on an ingot made of a metal such as an iron-nickel-cobalt alloy.

【0025】絶縁基体2の下面には、タングステンやモ
リブデン等の高融点金属から成るメタライズ層や絶縁基
体2と色調が異なる絶縁層によって、半導体装置の品番
や製造者名、あるいは半導体装置の方向性を示す識別標
識10が被着形成されており、この識別標識10は絶縁基体
2の色調とは異なる色調のものであるので目視やカメラ
等により容易に認識することができ、それによって半導
体装置の品番や製造者名、あるいは半導体装置の方向性
が容易に確認できるようになっている。
On the lower surface of the insulating base 2, a metallized layer made of a refractory metal such as tungsten or molybdenum, or an insulating layer having a different color tone from the insulating base 2 provides a semiconductor device number, manufacturer name, or directionality of the semiconductor device. Is formed on the insulating substrate 2. Since the identifying mark 10 has a color tone different from the color tone of the insulating substrate 2, it can be easily recognized visually or by a camera or the like. The product number, manufacturer name, or direction of the semiconductor device can be easily confirmed.

【0026】このような識別標識10は、例えば、タング
ステン等の高融点金属ペーストを絶縁基体2となるセラ
ミックグリーンシートに所定のパターン形状に印刷塗布
して焼成することよって、絶縁基体2の下面にその下面
から20〜50μm程度の高さとなる厚みで被着形成され
る。
The identification mark 10 is formed on a lower surface of the insulating base 2 by printing and firing a high melting point metal paste such as tungsten on a ceramic green sheet serving as the insulating base 2 in a predetermined pattern. It is deposited to a thickness of about 20 to 50 μm from its lower surface.

【0027】本発明の半導体素子収納用パッケージ1
は、その絶縁基体2の下面の少なくとも載置部2aに対
向する領域に、識別標識10の高さと同じもしくはそれ以
上の高さの平坦な被着層11が、識別標識10を露出させる
ようにして形成されていることが特徴であり、この被着
層11は、図1に示すように絶縁基体2の下面のほぼ全面
にわたって形成してもよい。また、載置部2aへの熱伝
導効率を高めるために、載置部2aに対向する領域なら
びにその周辺のみに形成してもよい。この被着層11は、
絶縁基体2の下面から表面までの高さが識別標識10の高
さと同じもしくはそれ以上で、かつその表面を実質的に
平坦に形成することが重要であり、それにより、上述し
た本発明に特有の作用効果を奏するものである。被着層
11の厚みは20〜100 μm程度とすることが、識別標識10
の高さの影響をなくすとともに、絶縁基体2への熱伝導
を効率良く行なえるという点で好ましい。
A package 1 for accommodating a semiconductor element according to the present invention.
In a region of the lower surface of the insulating base 2 facing at least the mounting portion 2a, a flat covering layer 11 having a height equal to or higher than the height of the identification mark 10 exposes the identification mark 10. The deposition layer 11 is characterized in that it is formed over substantially the entire lower surface of the insulating base 2 as shown in FIG. Further, in order to increase the efficiency of heat conduction to the mounting portion 2a, the heat conductive layer may be formed only in the region facing the mounting portion 2a and in the vicinity thereof. This deposition layer 11
It is important that the height from the lower surface to the surface of the insulating base 2 is equal to or higher than the height of the identification mark 10 and that the surface is formed substantially flat. The operation and effect of the present invention are achieved. Deposition layer
The thickness of 11 can be about 20 to 100 μm,
This is preferable in that the effect of the height of the insulating substrate 2 can be eliminated and heat conduction to the insulating base 2 can be efficiently performed.

【0028】この被着層11は、例えば、絶縁基体2と実
質的に同一の材料から成る絶縁層やガラス・樹脂等で形
成すればよい。被着層を絶縁膜基体2と実質的に同一の
材料で形成した場合には、絶縁基体2との間に熱膨張係
数の相違に起因する割れや剥がれが発生することがなく
なるので、被着層11は絶縁基体2と実質的に同一の材料
で形成されることが好ましい。
The covering layer 11 may be formed of, for example, an insulating layer made of substantially the same material as that of the insulating base 2, glass, resin, or the like. When the adhered layer is formed of substantially the same material as that of the insulating substrate 2, cracking or peeling due to a difference in thermal expansion coefficient between the insulating substrate 2 and the insulating substrate 2 does not occur. Preferably, layer 11 is formed of substantially the same material as insulating substrate 2.

【0029】被着層11を形成するには、例えば、絶縁基
体2と実質的に同一の原料粉末に適当な有機バインダ・
溶剤等を添加混合して得た絶縁ペーストを絶縁基体2の
下面あるいは絶縁基体2の下面となるセラミックグリー
ンシートに印刷塗布して焼成することによって被着形成
される。この際、被着層11を識別標識10の近傍にも形成
する場合には、適当な印刷スクリーン等を用いて識別標
識を露出させるように形成する。なお、この被着層11と
識別標識10の形成順序は、パッケージ1の製造工程に応
じてどちらが先となってもよい。
In order to form the deposition layer 11, for example, a suitable organic binder
An insulating paste obtained by adding and mixing a solvent or the like is printed and applied to a lower surface of the insulating substrate 2 or a ceramic green sheet to be a lower surface of the insulating substrate 2 and is baked to be adhered. At this time, when the covering layer 11 is also formed in the vicinity of the identification mark 10, it is formed so as to expose the identification mark using an appropriate printing screen or the like. The order of forming the adhered layer 11 and the identification mark 10 may be either first according to the manufacturing process of the package 1.

【0030】被着層11は、絶縁基体2の下面の少なくと
も載置部2aに対向する領域に形成されていれば本発明
に特有の作用効果を奏し得るが、絶縁基体2の下面の識
別標識10を除くほぼ全面に形成されていれば、絶縁基体
2とヒーターブロックの載置面との接触面積を十分に大
として極めて短時間に絶縁基体2を所定の温度にするこ
とができる。従って、被着層11は絶縁基体2の下面のほ
ぼ全面に形成されていることが好ましい。
If the adhered layer 11 is formed at least in a region on the lower surface of the insulating substrate 2 opposite to the mounting portion 2a, the function and effect unique to the present invention can be obtained. If the insulating substrate 2 is formed on almost the entire surface except for 10, the contact area between the insulating substrate 2 and the mounting surface of the heater block can be made sufficiently large to bring the insulating substrate 2 to a predetermined temperature in a very short time. Therefore, it is preferable that the covering layer 11 is formed on almost the entire lower surface of the insulating base 2.

【0031】かくして上述の半導体素子収納用パッケー
ジ1によれば、絶縁基体2の載置部2aの底面に半導体
素子6を接着剤7を介して載置固定するとともに半導体
素子6の各電極をポンディングワイヤ8・8を介して所
定のメタライズ配線層3・3に接続させ、しかる後、絶
縁基体2の上面に蓋体5を封止材9を介してあるいは溶
接により接合させ、絶縁基体2と蓋体5とで形成される
空所に半導体素子6を気密に収容することによって、製
品としての半導体素子となる。
Thus, according to the above-described semiconductor device housing package 1, the semiconductor device 6 is mounted and fixed on the bottom surface of the mounting portion 2a of the insulating base 2 via the adhesive 7, and the respective electrodes of the semiconductor device 6 are pumped. The lid 5 is connected to the predetermined metallized wiring layers 3 via the wirings 8, 8, and then the lid 5 is joined to the upper surface of the insulating base 2 via the sealing material 9 or by welding. The semiconductor element 6 is hermetically accommodated in a space formed by the lid 5 and the semiconductor element 6 to be a semiconductor element as a product.

【0032】なお、本発明は上述の実施例に何ら限定さ
れるものではなく、本発明の要旨を逸脱しない範囲で種
々の変更・改良などを加えることは何ら差し支えない。
It should be noted that the present invention is not limited to the above-described embodiment, and that various changes and improvements can be made without departing from the spirit of the present invention.

【0033】[0033]

【発明の効果】本発明の半導体素子収納用パッケージに
よれば、絶縁基体の下面の少なくとも半導体素子が載置
される載置部に対向する領域に、その下面に被着形成さ
れた識別標識の高さと同じもしくはそれ以上の高さを有
する平坦な被着層を、その識別標識が露出するように形
成したことから、載置部への半導体素子の接着固定の際
に絶縁基体の下面とヒーターブロックの載置面とを一様
に接触させることができて絶縁基体の加熱を良好かつ一
様に行なうことができる。そのため、絶縁基体の載置部
の温度が短時間で所定の温度となり、半導体素子を効率
良く接着固定することができる。
According to the package for housing a semiconductor element of the present invention, at least a region of the lower surface of the insulating base opposed to the mounting portion on which the semiconductor element is mounted is provided with an identification mark attached to the lower surface thereof. A flat deposition layer having a height equal to or higher than the height is formed so that the identification mark is exposed. Therefore, when the semiconductor element is adhered and fixed to the mounting portion, the lower surface of the insulating base and the heater are removed. The mounting surface of the block can be uniformly contacted, and the insulating base can be heated well and uniformly. Therefore, the temperature of the mounting portion of the insulating base becomes a predetermined temperature in a short time, and the semiconductor element can be efficiently bonded and fixed.

【0034】特に、被着層を絶縁基体の下面のほぼ全面
にわたるように形成した場合には、絶縁基体とヒーター
ブロックとの接触に偏りがなくなって、絶縁基体が局部
的に加熱されることを防止することができ、それによ
り、絶縁基体中の急峻な温度勾配の形成による大きな熱
応力が発生して絶縁基体に割れやクラックが発生するこ
とを防止することができる。
In particular, when the adhered layer is formed so as to cover almost the entire lower surface of the insulating base, there is no bias in the contact between the insulating base and the heater block, so that the insulating base is locally heated. Accordingly, it is possible to prevent a large thermal stress from being generated due to the formation of a steep temperature gradient in the insulating base, thereby preventing the insulating base from being cracked or cracked.

【0035】さらに、被着層は識別標識が露出するよう
に形成されているので、被着層を絶縁基体の下面のほぼ
全面にわたって形成した場合であっても、目視やカメラ
等により識別標識を容易に認識することができる。
Further, since the adhered layer is formed so that the identification mark is exposed, even if the adhered layer is formed over substantially the entire lower surface of the insulating base, the identification mark is visually or camera-mounted. It can be easily recognized.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の半導体素子収納用パッケージの一実施
例を示す断面図である。
FIG. 1 is a cross-sectional view showing one embodiment of a semiconductor element storage package according to the present invention.

【図2】従来の半導体素子収納用パッケージを示す断面
図である。
FIG. 2 is a cross-sectional view illustrating a conventional semiconductor element storage package.

【符号の説明】[Explanation of symbols]

1・・・・・半導体素子収納用パッケージ 2・・・・・絶縁基体 2a・・・・載置部 3・・・・・メタライズ配線層 4・・・・・外部リード端子 5・・・・・蓋体 6・・・・・半導体素子 10・・・・・識別標識 11・・・・・被着層 1 ····· Package for housing semiconductor element 2 ····· Insulating base 2a ······································ Metallized wiring layer 4 ························ · Lid 6 · · · · · Semiconductor element 10 · · · · Identification mark 11 · · · · Deposited layer

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 上面に半導体素子が載置される載置部を
有し、下面に識別標識が被着されている絶縁基体と、蓋
体とから成り、内部に半導体素子を収容するための空所
を有する半導体素子収納用パッケージであって、前記絶
縁基体の下面の少なくとも前記載置部に対向する領域
に、前記識別標識の高さと同じもしくはそれ以上の高さ
の平坦な被着層が、前記識別標識を露出させるようにし
て形成されていることを特徴とする半導体素子収納用パ
ッケージ。
1. An insulating base having a mounting portion on which a semiconductor element is mounted on an upper surface, and an identification mark attached on a lower surface, and a lid, for accommodating the semiconductor element therein. In a semiconductor element storage package having a void, a flat adherend layer having a height equal to or higher than the height of the identification mark is provided on at least a region of the lower surface of the insulating base facing the mounting portion. And a semiconductor element housing package formed so as to expose the identification mark.
JP02697096A 1996-02-14 1996-02-14 Package for storing semiconductor elements Expired - Lifetime JP3297577B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02697096A JP3297577B2 (en) 1996-02-14 1996-02-14 Package for storing semiconductor elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02697096A JP3297577B2 (en) 1996-02-14 1996-02-14 Package for storing semiconductor elements

Publications (2)

Publication Number Publication Date
JPH09223755A JPH09223755A (en) 1997-08-26
JP3297577B2 true JP3297577B2 (en) 2002-07-02

Family

ID=12208023

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02697096A Expired - Lifetime JP3297577B2 (en) 1996-02-14 1996-02-14 Package for storing semiconductor elements

Country Status (1)

Country Link
JP (1) JP3297577B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3614418B2 (en) * 2002-10-04 2005-01-26 株式会社Neomax Thin film magnetic head substrate and manufacturing method thereof
JP4741624B2 (en) * 2008-03-21 2011-08-03 京セラ株式会社 Wiring board

Also Published As

Publication number Publication date
JPH09223755A (en) 1997-08-26

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