[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

JP3181428U - Touch electrode device - Google Patents

Touch electrode device Download PDF

Info

Publication number
JP3181428U
JP3181428U JP2012007149U JP2012007149U JP3181428U JP 3181428 U JP3181428 U JP 3181428U JP 2012007149 U JP2012007149 U JP 2012007149U JP 2012007149 U JP2012007149 U JP 2012007149U JP 3181428 U JP3181428 U JP 3181428U
Authority
JP
Japan
Prior art keywords
electrode
electrode layer
touch
touch electrode
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012007149U
Other languages
Japanese (ja)
Inventor
彭▲彦▼鈞
Original Assignee
恆▲コウ▼科技股▲分▼有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 恆▲コウ▼科技股▲分▼有限公司 filed Critical 恆▲コウ▼科技股▲分▼有限公司
Application granted granted Critical
Publication of JP3181428U publication Critical patent/JP3181428U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412Digitisers structurally integrated in a display
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/047Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using sets of wires, e.g. crossed wires
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

【課題】非透明導電材料によりタッチ電極パターンを形成させ、或いは露光及び現像を直接行い製造工程を簡略化させたタッチ電極装置を提供する。
【解決手段】電極層22に感光性(photosensitive)材料(例えばアクリル)を採用させ、露光及び現像の製造工程で必要とされる電極形状の電極列を形成させる。例えば、電極列の各電極の外観は菱形パターンの外観を呈する。但し電極形状の外観はこれに限られず、実際の要求に合わせ線状パターン或いは他の多辺形パターン等の外観に設計させて形成させてもよい。従来の酸化インジウム錫(ITO)により形成される電極層の製造工程に比較し、電極層22は露光及び現像の製造工程を直接実行し、製造工程を簡略化させてコストを下げる。
【選択図】図2B
Provided is a touch electrode device in which a touch electrode pattern is formed of a non-transparent conductive material, or exposure and development are directly performed to simplify a manufacturing process.
A photosensitive material (for example, acrylic) is used for the electrode layer 22 to form an electrode array having an electrode shape required in manufacturing processes of exposure and development. For example, the appearance of each electrode in the electrode array has a rhombus pattern appearance. However, the appearance of the electrode shape is not limited to this, and it may be designed and formed to have a linear pattern or other polygonal pattern according to actual requirements. Compared with the manufacturing process of the electrode layer formed with the conventional indium tin oxide (ITO), the electrode layer 22 performs the manufacturing process of exposure and image development directly, simplifies a manufacturing process, and reduces cost.
[Selection] Figure 2B

Description

本考案は非透明導電材料により形成されるタッチ電極パターンのタッチ電極装置に関する。   The present invention relates to a touch electrode device having a touch electrode pattern formed of a non-transparent conductive material.

タッチスクリーンは感知技術及びディスプレイ技術が結合されて形成される出入力装置であり、携帯式及び手持ち式の電子装置に汎用されている。   A touch screen is an input / output device formed by combining sensing technology and display technology, and is widely used in portable and handheld electronic devices.

静電容量方式のタッチパネルは普及するタッチパネルの一種で、容量性カップリング作用によりタッチ位置を検知させる。指が静電容量方式のタッチパネルの表面をタッチさせると、対応する位置の静電容量が変化し、これによりタッチ位置を検知させる。   A capacitive touch panel is a type of touch panel that is widely used, and detects a touch position by a capacitive coupling action. When the finger touches the surface of the capacitive touch panel, the capacitance at the corresponding position changes, thereby detecting the touch position.

図1Aは従来のタッチパネルの平面図であり、図1Bは図1Aの断面線1Bー1B´に沿う断面図である。第一電極12は基板10の上表面に形成され、第二電極14は基板10の下表面に形成される。前記第一電極12及び第二電極14は相互に実質的に直交になる。   1A is a plan view of a conventional touch panel, and FIG. 1B is a cross-sectional view taken along a cross-sectional line 1B-1B ′ in FIG. 1A. The first electrode 12 is formed on the upper surface of the substrate 10, and the second electrode 14 is formed on the lower surface of the substrate 10. The first electrode 12 and the second electrode 14 are substantially orthogonal to each other.

しかしながら、上述の従来のタッチパネルの第一電極12及び第二電極14には一般的には酸化インジウム錫(ITO)等の透明導電材料が用いられる。酸化インジウム錫形成の製造工程が複雑であるほか、酸化インジウム錫材料が湾曲されると切断されて導電されなくなり、このため可撓性(flexible)のタッチパネルを製造できなかった。   However, a transparent conductive material such as indium tin oxide (ITO) is generally used for the first electrode 12 and the second electrode 14 of the conventional touch panel described above. In addition to the complicated manufacturing process for forming indium tin oxide, when the indium tin oxide material is bent, it is cut and no longer conductive, and thus a flexible touch panel cannot be manufactured.

従来のタッチパネルの製造工程は複雑であり、或いは可撓性のタッチパネルの製造が困難であるため、そこで、本発明者は上記の欠点が改善可能と考え、鋭意検討を重ねた結果、合理的設計で上記の課題を効果的に改善する本考案の提案に到った。   The manufacturing process of the conventional touch panel is complicated, or it is difficult to manufacture a flexible touch panel. Therefore, the present inventor considers that the above-mentioned defects can be improved, and as a result of intensive studies, a rational design is achieved. Thus, the present inventors have arrived at a proposal of the present invention that effectively improves the above problems.

本考案は、このような従来の問題に鑑みてなされたものである。上記課題解決のため、本考案は、製造工程を簡略化させるか、或いは可撓性を有するタッチパネルの製造方法を提供することを主目的とする。   The present invention has been made in view of such conventional problems. In order to solve the above problems, the present invention aims to simplify the manufacturing process or to provide a method for manufacturing a flexible touch panel.

よって、本発明のタッチ電極装置は非透明導電材料によりタッチ電極パターンを形成させ、或いは露光及び現像を直接行い製造工程を簡略化させる。   Therefore, the touch electrode device of the present invention simplifies the manufacturing process by forming a touch electrode pattern with a non-transparent conductive material, or directly performing exposure and development.

上述した課題を解決し、目的を達成するために、本考案に係るタッチ電極装置は、基板と、前記基板の表面に設けられ、非透明導電材料を含む少なくとも1つの電極層を備えることを特徴とする。   In order to solve the above-described problems and achieve the object, a touch electrode device according to the present invention includes a substrate and at least one electrode layer provided on a surface of the substrate and including a non-transparent conductive material. And

従来のタッチパネルの平面図である。It is a top view of the conventional touch panel. 図1Aの断面線1Bー1B´に沿う断面図である。1B is a cross-sectional view taken along a cross-sectional line 1B-1B ′ of FIG. 1A. 本考案に係る実施形態によるタッチ電極装置の平面図である。1 is a plan view of a touch electrode device according to an embodiment of the present invention. 図2Aの断面線2ー2´に沿う断面図である。It is sectional drawing which follows sectional line 2-2 'of FIG. 2A. 図2Aの電極層の部分拡大図である。It is the elements on larger scale of the electrode layer of FIG. 2A. 露光及び現像の製造工程により形成される電極列である。It is the electrode row | line | column formed by the manufacturing process of exposure and image development. 変化させた他のタッチ電極装置の断面構造である。It is the cross-sectional structure of the other touch electrode apparatus changed. 本考案に係る他の実施形態によるタッチ電極装置の平面図である。It is a top view of the touch electrode device by other embodiments concerning the present invention. 図3Aの断面線3ー3´に沿う断面図である。FIG. 3B is a cross-sectional view taken along the section line 3-3 ′ of FIG. 3A. 本考案に係るまた他の実施形態のタッチ電極装置の平面図である。It is a top view of the touch electrode device of other embodiments concerning the present invention. 図4Aの断面線4ー4´に沿う断面図である。FIG. 4B is a sectional view taken along section line 4-4 ′ of FIG. 4A. 本実施形態が応用されるタッチスクリーンの断面図である。It is sectional drawing of the touch screen to which this embodiment is applied. 本実施形態が応用されるタッチスクリーンの断面図である。It is sectional drawing of the touch screen to which this embodiment is applied. 本実施形態が応用されるタッチパネルの断面図である。It is sectional drawing of the touchscreen with which this embodiment is applied. 本考案に係る他の実施形態で銅線が用いられる電極層の部分拡大図である。It is the elements on larger scale of the electrode layer in which a copper wire is used by other embodiment concerning this invention.

以下に図面を参照して、本考案を実施するための形態について、詳細に説明する。なお、本考案は、以下に説明する実施形態に限定されるものではない。   Hereinafter, embodiments for carrying out the present invention will be described in detail with reference to the drawings. The present invention is not limited to the embodiments described below.

まず、本考案のタッチ電極装置の第一実施形態について説明する。
本考案の第一実施形態の構成を図1Bから図2Eに示す。図2Aは本考案に係る実施形態のタッチ電極装置200の平面図であり、図2Bは図2Aは断面線2ー2´に沿う断面図であり、図式には実施形態に相関する部材のみ図示する。
本実施形態のタッチ電極装置200は基板21及び少なくとも1つの電極層22を主に備え、電極層22は基板21の表面(例えば上表面)に直接設けられる。本実施形態の特徴によると、電極層22は非透明導電材料、例えば金属線、銅線、或いは銀線を含み、金属線の内径は数ナノメートルから数百ナノメートルの間となる。本考案の実施形態では金属線を採用する。
First, a first embodiment of the touch electrode device of the present invention will be described.
The configuration of the first embodiment of the present invention is shown in FIGS. 1B to 2E. 2A is a plan view of the touch electrode device 200 according to the embodiment of the present invention, FIG. 2B is a cross-sectional view taken along the section line 2-2 ′, and only the members correlated with the embodiment are shown in the diagram. To do.
The touch electrode device 200 of this embodiment mainly includes a substrate 21 and at least one electrode layer 22, and the electrode layer 22 is directly provided on the surface (for example, the upper surface) of the substrate 21. According to a feature of the present embodiment, the electrode layer 22 includes a non-transparent conductive material, such as a metal wire, a copper wire, or a silver wire, and the inner diameter of the metal wire is between a few nanometers and a few hundred nanometers. In the embodiment of the present invention, a metal wire is employed.

金属線24はプラスチック材料(例えば樹脂)或いは感光性(photosensitive)材料(例えばアクリル)により電極層22内に固定される。金属線24は非常に繊細なため、肉眼では目視できず、金属線24により構成される電極層22の透光性は極めて高くなる。   The metal wire 24 is fixed in the electrode layer 22 by a plastic material (for example, resin) or a photosensitive material (for example, acrylic). Since the metal wire 24 is very delicate, it cannot be seen with the naked eye, and the translucency of the electrode layer 22 composed of the metal wire 24 becomes extremely high.

図2Cは、電極層の部分23の拡大図である。図によれば、金属線24は互いに交錯し合い且つ平面に分布されて電極層22に形成され、これにより金属線により構成される電極層22の導電性は平面の各方向へ大方等しくなる。   FIG. 2C is an enlarged view of the portion 23 of the electrode layer. According to the figure, the metal lines 24 cross each other and are distributed in a plane and are formed on the electrode layer 22, whereby the conductivity of the electrode layer 22 constituted by the metal lines is substantially equal in each direction of the plane.

本考案の他の特徴によれば、電極層22に感光性(photosensitive)材料(例えばアクリル)を採用させ、露光及び現像の製造工程で必要とされる電極形状の電極列26を形成させる。例えば図2Dのように実施形態では、電極列26の各電極の外観は菱形パターンの外観を呈する。但し本考案の電極形状の外観はこれに限られず、実際の要求に合わせ線状パターン或いは他の多辺形パターン等の外観に設計させて形成させてもよい。従来の酸化インジウム錫(ITO)により形成される電極層の製造工程に比較し、本実施形態の電極層22は露光及び現像の製造工程を直接実行し、製造工程を簡略化させてコストを下げる。   According to another feature of the present invention, a photosensitive material (for example, acrylic) is used for the electrode layer 22 to form an electrode array 26 having an electrode shape required in the manufacturing process of exposure and development. For example, as shown in FIG. 2D, in the embodiment, the appearance of each electrode of the electrode array 26 has the appearance of a rhombus pattern. However, the appearance of the electrode shape of the present invention is not limited to this, and may be designed and formed to have a linear pattern or other polygonal pattern according to actual requirements. Compared to the conventional manufacturing process of an electrode layer formed of indium tin oxide (ITO), the electrode layer 22 of this embodiment directly executes the manufacturing process of exposure and development, simplifying the manufacturing process and reducing the cost. .

また、この好ましい実施形態では、基板21は透明基板であり、その材質はガラス、プラスチック、或いは他のあらゆる透明材料でもよい。然しながら基板21も実際の要求に合わせ可撓性材料、硬性材料、或いは液晶ディスプレイモジュールを含んでもよい。非透明導電材料の金属線は非常に繊細であるため、そのサイズはナノメートル級になり更に発展性も有し、これにより基板21に組み合わされて可撓性のタッチ電極装置200を形成させる。これに対し従来の透明導電材料は酸化インジウム錫(ITO)等である。然し酸化インジウム錫は破砕され易いため、可撓性のタッチ電極装置の形成は容易ではない。また、その可撓性は本実施形態(含金属線)の導電層22の可撓性に遠く及ばない。   In this preferred embodiment, the substrate 21 is a transparent substrate, and the material thereof may be glass, plastic, or any other transparent material. However, the substrate 21 may include a flexible material, a hard material, or a liquid crystal display module according to actual requirements. Since the metal wire of the non-transparent conductive material is very delicate, the size thereof becomes nanometer class and has further developability, which is combined with the substrate 21 to form the flexible touch electrode device 200. In contrast, a conventional transparent conductive material is indium tin oxide (ITO) or the like. However, since indium tin oxide is easily crushed, it is not easy to form a flexible touch electrode device. Further, the flexibility is far from the flexibility of the conductive layer 22 of the present embodiment (metal-containing wire).

図2Eは変化させた他のタッチ電極装置200の断面構造であり、基板21と導電層22との間に設けられる絶縁層27を更に備え、電極層22は基板21の表面に間接的に設けられる。実施形態では、絶縁層27は感光性材料を含み、露光及び現像の製造工程により電極層22と共に必要な形状で基板21に形成される。他の実施形態では、絶縁層27は感光性材料或いは高分子材料を含み、絶縁層27の表面は粘性を有し、基板21或いは電極層22に更に相互に貼り合わされて固定される。   FIG. 2E shows a changed cross-sectional structure of another touch electrode device 200, further including an insulating layer 27 provided between the substrate 21 and the conductive layer 22. The electrode layer 22 is indirectly provided on the surface of the substrate 21. It is done. In the embodiment, the insulating layer 27 includes a photosensitive material, and is formed on the substrate 21 together with the electrode layer 22 in a necessary shape by an exposure and development manufacturing process. In another embodiment, the insulating layer 27 includes a photosensitive material or a polymer material, and the surface of the insulating layer 27 has viscosity, and is further bonded and fixed to the substrate 21 or the electrode layer 22.

図2B及び図2Eのタッチ電極装置200は全て単面単層の構造であり、基板21の単一の表面には単一の電極層22が設けられる。然しながら、本実施形態では例えば単面二層構造或いは二層構造等の他の構造を用いることもできる。   The touch electrode device 200 of FIGS. 2B and 2E has a single-surface single-layer structure, and a single electrode layer 22 is provided on a single surface of the substrate 21. However, in this embodiment, other structures such as a single-sided two-layer structure or a two-layer structure can also be used.

次は、本考案のタッチ電極装置の第二実施形態について説明する。
図3Aは単面二層構造のタッチ電極装置300の平面図であり、図3Bは図3Aの断面線3ー3´に沿う断面図である。第一電極層22A及び第二電極層22Bは基板21の同じ表面に順に設けられ、第一電極層22Aと第二電極層22Bとの間は絶縁層27により電気的に隔絶される。このほか、絶縁層27は露光及び現像の製造工程で電極層22と共に必要な形状に形成されるが、本考案ではこれに制限させず、絶縁層27の形状は実際の需要に合わせて電極層22の形状とは異なる形状に形成させても良い。
Next, a second embodiment of the touch electrode device of the present invention will be described.
FIG. 3A is a plan view of a touch electrode device 300 having a single-sided two-layer structure, and FIG. 3B is a cross-sectional view taken along a cross-sectional line 3-3 ′ of FIG. The first electrode layer 22A and the second electrode layer 22B are sequentially provided on the same surface of the substrate 21, and the first electrode layer 22A and the second electrode layer 22B are electrically isolated from each other by the insulating layer 27. In addition, the insulating layer 27 is formed in a necessary shape together with the electrode layer 22 in the manufacturing process of exposure and development, but the present invention is not limited to this, and the shape of the insulating layer 27 is adapted to the actual demand. You may form in the shape different from the shape of 22.

上述の第一電極層22A及び第二電極層22Bには皆非透明導電材料(例えば金属線、銅線、或いは銀線)を使用し、或いは何れか1つの電極層は透明導電材料(例えば酸化インジウム錫(ITO)、酸化亜鉛アルミニウム(AZO)、酸化チタン(TZO)、酸化インジウム亜鉛(IZO)、酸化インジウムガリウム(GZO)、或いは酸化フッ化錫(FTO))を選択させて使用させても良い。   The first electrode layer 22A and the second electrode layer 22B are all made of a non-transparent conductive material (for example, a metal wire, a copper wire, or a silver wire), or any one of the electrode layers is made of a transparent conductive material (for example, an oxidation material). Indium tin (ITO), zinc aluminum oxide (AZO), titanium oxide (TZO), indium zinc oxide (IZO), indium gallium oxide (GZO), or tin oxide fluoride (FTO)) may be selected and used. good.

次は、本考案のタッチ電極装置の第三実施形態について説明する。
図4Aは二層構造のタッチ電極装置400の平面図であり、図4Bは図4Aの断面線4ー4´に沿う断面図である。第一電極層22A及び第二電極層22Bは基板21の対向する表面にそれぞれ設けられる。上述の第一電極層22A及び第二電極層22Bには皆非透明導電材料(例えば金属線、銅線、或いは銀線)が用いられ、或いは何れか1つの電極層は透明導電材料(例えば酸化インジウム錫(ITO)、酸化亜鉛アルミニウム(AZO)、酸化チタン(TZO)、酸化インジウム亜鉛(IZO)、酸化インジウムガリウム(GZO)、或いは酸化フッ化錫(FTO))を選択させて使用させても良い。
Next, a third embodiment of the touch electrode device of the present invention will be described.
4A is a plan view of the touch electrode device 400 having a two-layer structure, and FIG. 4B is a cross-sectional view taken along a cross-sectional line 4-4 ′ of FIG. 4A. The first electrode layer 22A and the second electrode layer 22B are provided on the opposing surfaces of the substrate 21, respectively. The first electrode layer 22A and the second electrode layer 22B described above are all made of a non-transparent conductive material (for example, a metal wire, a copper wire, or a silver wire), or any one electrode layer is made of a transparent conductive material (for example, an oxidation material). Indium tin (ITO), zinc aluminum oxide (AZO), titanium oxide (TZO), indium zinc oxide (IZO), indium gallium oxide (GZO), or tin oxide fluoride (FTO)) may be selected and used. good.

従来のタッチ電極に比較し、上述の実施形態のタッチ電極装置200、タッチ電極装置300、及びタッチ電極装置400には非透明導電材料を含む電極層22が用いられ、これにより可撓性を有し且つ製造も便利になる。上述の実施形態のタッチ電極装置200、タッチ電極装置300、及びタッチ電極装置400は各種タッチ関連構造(特に静電容量方式のタッチ構造)、例えばタッチパネル或いはタッチ表示装置等に応用され、上述の長所を示す。以下に例を挙げ説明する。   Compared to a conventional touch electrode, the touch electrode device 200, the touch electrode device 300, and the touch electrode device 400 of the above-described embodiment use the electrode layer 22 including a non-transparent conductive material, thereby having flexibility. In addition, manufacturing is convenient. The touch electrode device 200, the touch electrode device 300, and the touch electrode device 400 according to the above-described embodiments are applied to various touch-related structures (particularly, a capacitive touch structure) such as a touch panel or a touch display device. Indicates. An example will be described below.

(変化実施形態)
図5Aは本実施形態がタッチスクリーン3に応用される断面図である。説明を簡易にするため、図式にはタッチスクリーン3の全ての部材は図示しない。図5Aのタッチスクリーン3は主に表示装置320及びタッチパネル310が重畳されて形成される。表示装置320は液晶層31及びカラー・フィルター(CF)32を主に備え、タッチパネル310は偏光板(polarizer)33及び電極層22を主に含み、電極層22は偏光板33の上表面に設けられ、前記偏光板33は図2A乃至図4Bの構造の基板21に相等する。図5Aの電極層22は、例えば前述の第一電極層22A及び第二電極層22B等の単層或いは多層の電極層を含んでもよい。本実施形態の応用では表示装置320は可撓性の表示装置320(例えば軟性表示装置)でもよく、可撓性のタッチパネル310に合わせて可撓性のタッチスクリーン3を形成させる。
(Variation)
FIG. 5A is a sectional view in which the present embodiment is applied to the touch screen 3. For simplicity of explanation, not all members of the touch screen 3 are shown in the diagram. The touch screen 3 of FIG. 5A is mainly formed by superimposing a display device 320 and a touch panel 310. The display device 320 mainly includes a liquid crystal layer 31 and a color filter (CF) 32, and the touch panel 310 mainly includes a polarizing plate 33 and an electrode layer 22, and the electrode layer 22 is provided on the upper surface of the polarizing plate 33. The polarizing plate 33 is equivalent to the substrate 21 having the structure of FIGS. 2A to 4B. The electrode layer 22 of FIG. 5A may include a single layer or a multilayer electrode layer such as the first electrode layer 22A and the second electrode layer 22B described above. In the application of the present embodiment, the display device 320 may be a flexible display device 320 (for example, a flexible display device), and the flexible touch screen 3 is formed in accordance with the flexible touch panel 310.

図5Bは本実施形態を他のタッチスクリーン3´に応用する断面図である。図5Aと異なる部分は、図5Bの実施形態の応用では電極層22は偏光板33の下表面に設けられる点である。   FIG. 5B is a cross-sectional view in which the present embodiment is applied to another touch screen 3 ′. The difference from FIG. 5A is that the electrode layer 22 is provided on the lower surface of the polarizing plate 33 in the application of the embodiment of FIG. 5B.

他の実施形態では、図5Bに示すように、電極層22はカラー・フィルター(CF)32の上表面に設けられ、前記カラー・フィルター(CF)32は図2A乃至図4Bの構造の基板21に相等する。   In another embodiment, as shown in FIG. 5B, the electrode layer 22 is provided on the upper surface of the color filter (CF) 32, and the color filter (CF) 32 is the substrate 21 having the structure of FIGS. 2A to 4B. Equal to

図6は本実施形態がタッチパネル5に応用される断面図である。本実施形態の応用では、第一電極層22A、絶縁層27、及び第二電極層22Bは被覆レンズ(cover len)51の下表面に順に設けられ、前記被覆レンズ51は図2A乃至図4Bの構造の基板21に相等する2D或いは3Dの輪郭であり、2D或いは3Dのタッチディスプレイにそれぞれ応用される。実施形態では、被覆レンズ51は可撓性材料或いは硬性材料を含み、被覆レンズの表面材質は特殊工芸処理後に、耐摩耗性、耐傷性、反射防止、グレア防止、及び指紋防止等の機能特性を有する。   FIG. 6 is a cross-sectional view in which the present embodiment is applied to the touch panel 5. In the application of this embodiment, the first electrode layer 22A, the insulating layer 27, and the second electrode layer 22B are sequentially provided on the lower surface of the cover lens 51, and the cover lens 51 is formed as shown in FIGS. 2A to 4B. A 2D or 3D outline equivalent to the structure substrate 21 is applied to a 2D or 3D touch display, respectively. In the embodiment, the coated lens 51 includes a flexible material or a hard material, and the surface material of the coated lens has functional characteristics such as wear resistance, scratch resistance, antireflection, glare prevention, and fingerprint prevention after special craft treatment. Have.

上述の図5A乃至図6の各種タッチスクリーン3、タッチスクリーン3´、及びタッチスクリーン5は本考案に係る実施形態によるタッチ電極装置200、タッチ電極装置300、及びタッチ電極装置400の幾つかの応用のみを例示した。本技術分野に習熟する者ならば本実施形態の電極層22を他の可撓式或いは非可撓式のタッチ関連構造に応用させ、従来の電極層を代替させる事が可能である。   The various touch screens 3, touch screen 3 ′, and touch screen 5 shown in FIGS. 5A to 6 are some applications of the touch electrode device 200, the touch electrode device 300, and the touch electrode device 400 according to the embodiments of the present invention. Only illustrated. Those skilled in the art can apply the electrode layer 22 of the present embodiment to other flexible or non-flexible touch-related structures to replace conventional electrode layers.

次は、本考案のタッチ電極装置の第四実施形態について説明する。
図7は他の実施形態で銅線を採用する電極層の部分23の拡大図である。図7に示すように、銅線は複数のグリッド25を有し、各グリッド25は多辺形の外観或いは円形の外観を有し、包囲させる領域は光線を十分透過させ、このほかこれら前記グリッド25の間は電気的に接続され、整列パターンで配列される。これら前記グリッド25の配列により電極を形成させ、これは線状パターン、菱形パターン(diamond pattern)、或いは多辺形パターン等の外観を有する。本実施形態では銅線が用いられるが、但し本考案はこれに制限させず、上述の特徴は銀線等の適切な材料により実現させても良い。
Next, a fourth embodiment of the touch electrode device of the present invention will be described.
FIG. 7 is an enlarged view of a portion 23 of an electrode layer that employs a copper wire in another embodiment. As shown in FIG. 7, the copper wire has a plurality of grids 25, and each grid 25 has a polygonal appearance or a circular appearance. 25 are electrically connected and arranged in an alignment pattern. An electrode is formed by the arrangement of the grids 25 and has an appearance such as a linear pattern, a diamond pattern, or a polygonal pattern. In this embodiment, a copper wire is used. However, the present invention is not limited to this, and the above-described features may be realized by an appropriate material such as a silver wire.

次に他の実施形態では、非透明導電材料は接着材料を含み、例えば光学接着剤等の透明絶縁接着剤であり、これにより電極層22は有効的に貼り合わされて基板上21に固定される。   Next, in another embodiment, the non-transparent conductive material includes an adhesive material, for example, a transparent insulating adhesive such as an optical adhesive, whereby the electrode layer 22 is effectively bonded and fixed to the substrate 21. .

以上、本考案の実施形態について図面を参照して詳述したが、具体的な構成はこの実施形態に限られるものではなく、本考案の要旨を逸脱しない範囲の設計変更等も含まれる。   As mentioned above, although embodiment of this invention was explained in full detail with reference to drawings, the concrete structure is not restricted to this embodiment, The design change etc. of the range which does not deviate from the summary of this invention are included.

10 基板
12 第一電極
14 第二電極
200 タッチ電極装置
300 タッチ電極装置
400 タッチ電極装置
21 基板
22 電極層
22A 第一電極層
22B 第二電極層
23 部分
24 金属線
25 グリッド
26 電極列
27 絶縁層
3 タッチスクリーン
3’ タッチスクリーン
5 タッチパネル
310 タッチパネル
320 表示装置
31 液晶層
32 カラー・フィルター
33 偏光板
51 被覆レンズ
DESCRIPTION OF SYMBOLS 10 Board | substrate 12 1st electrode 14 2nd electrode 200 Touch electrode apparatus 300 Touch electrode apparatus 400 Touch electrode apparatus 21 Board | substrate 22 Electrode layer 22A 1st electrode layer 22B 2nd electrode layer 23 Part 24 Metal wire 25 Grid 26 Electrode row 27 Insulating layer 3 Touch Screen 3 'Touch Screen 5 Touch Panel 310 Touch Panel 320 Display Device 31 Liquid Crystal Layer 32 Color Filter 33 Polarizing Plate 51 Covered Lens

Claims (11)

基板と、
前記基板の表面に設けられ、非透明導電材料を含む少なくとも1つの電極層を備える事を特徴とする、
タッチ電極装置。
A substrate,
It is provided on the surface of the substrate, and comprises at least one electrode layer containing a non-transparent conductive material,
Touch electrode device.
前記電極層と前記基板の間に設けられる絶縁層を更に備える事を特徴とする、請求項1に記載のタッチ電極装置。   The touch electrode device according to claim 1, further comprising an insulating layer provided between the electrode layer and the substrate. 少なくとも1つの前記電極層は、前記基板の同じ表面に順に設けられる第一電極層及び第二電極層を備え、前記絶縁層は前記第一電極層と前記第二電極層との間に設けられて電気的に隔絶される事を特徴とする、請求項2に記載のタッチ電極装置。   At least one of the electrode layers includes a first electrode layer and a second electrode layer that are sequentially provided on the same surface of the substrate, and the insulating layer is provided between the first electrode layer and the second electrode layer. The touch electrode device according to claim 2, wherein the touch electrode device is electrically isolated. 少なくとも1つの前記電極層は、前記基板の対向する表面にそれぞれ設けられる第一電極層及び第二電極層を備える事を特徴とする、請求項1に記載のタッチ電極装置。   The touch electrode device according to claim 1, wherein at least one of the electrode layers includes a first electrode layer and a second electrode layer provided on opposite surfaces of the substrate. 前記非透明導電材料は複数の金属線、銅線、或いは銀線を備える事を特徴とする、請求項1に記載のタッチ電極装置。   The touch electrode device according to claim 1, wherein the non-transparent conductive material includes a plurality of metal wires, copper wires, or silver wires. 前記非透明導電材料は感光性材料を更に備える事を特徴とする、請求項1に記載のタッチ電極装置。   The touch electrode device according to claim 1, wherein the non-transparent conductive material further includes a photosensitive material. 前記電極層はプラスチック材料を更に備え、前記非透明導電材料を前記電極層内に固定させる事を特徴とする、請求項1に記載のタッチ電極装置。   The touch electrode device according to claim 1, wherein the electrode layer further includes a plastic material, and the non-transparent conductive material is fixed in the electrode layer. 前記絶縁層は感光性材料を更に備える事を特徴とする、請求項2に記載のタッチ電極装置。   The touch electrode device according to claim 2, wherein the insulating layer further includes a photosensitive material. 前記基板は偏光板を備え、前記電極層は前記偏光板の上表面或いは下表面に設けられる事を特徴とする、請求項1に記載のタッチ電極装置。   The touch electrode device according to claim 1, wherein the substrate includes a polarizing plate, and the electrode layer is provided on an upper surface or a lower surface of the polarizing plate. 前記基板はカラー・フィルターを備え、前記電極層は前記カラー・フィルターの上表面に設けられる事を特徴とする、請求項1に記載のタッチ電極装置。   The touch electrode device according to claim 1, wherein the substrate includes a color filter, and the electrode layer is provided on an upper surface of the color filter. 前記基板は被覆レンズを備え、少なくとも1つの前記電極層は前記被覆レンズの下表面に設けられる事を特徴とする、請求項2に記載のタッチ電極装置。   The touch electrode device according to claim 2, wherein the substrate includes a coated lens, and at least one of the electrode layers is provided on a lower surface of the coated lens.
JP2012007149U 2012-11-09 2012-11-26 Touch electrode device Expired - Fee Related JP3181428U (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
TW101141954A TWI592843B (en) 2012-11-09 2012-11-09 Touch electrode device
TW101141954 2012-11-09

Publications (1)

Publication Number Publication Date
JP3181428U true JP3181428U (en) 2013-02-07

Family

ID=48145741

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012007149U Expired - Fee Related JP3181428U (en) 2012-11-09 2012-11-26 Touch electrode device

Country Status (6)

Country Link
US (1) US20140131065A1 (en)
JP (1) JP3181428U (en)
KR (1) KR20140002947U (en)
CN (2) CN103809797A (en)
DE (1) DE202012105018U1 (en)
TW (1) TWI592843B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI592843B (en) * 2012-11-09 2017-07-21 恆顥科技股份有限公司 Touch electrode device
US9372587B2 (en) * 2013-11-26 2016-06-21 Synaptics Incorporated Methods and apparatus for arranging electrode layers and associated routing traces in a sensor device
CN105607768A (en) * 2014-05-30 2016-05-25 宸鸿科技(厦门)有限公司 Touch display apparatus and manufacturing method thereof
CN105718091A (en) * 2014-08-17 2016-06-29 宸鸿科技(厦门)有限公司 Touch control panel with flexible touch control sensor and fabrication method of touch control panel
CN105677106A (en) * 2016-01-11 2016-06-15 京东方科技集团股份有限公司 Touch substrate, manufacturing method thereof, touch panel and display device
TWI705364B (en) * 2019-08-02 2020-09-21 恆顥科技股份有限公司 Touch panel

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6936761B2 (en) * 2003-03-29 2005-08-30 Nanosolar, Inc. Transparent electrode, optoelectronic apparatus and devices
US8018568B2 (en) * 2006-10-12 2011-09-13 Cambrios Technologies Corporation Nanowire-based transparent conductors and applications thereof
EP2511806A3 (en) * 2008-07-31 2013-01-02 Gunze Limited Capacitive touch switch
EP2327006A4 (en) * 2008-08-01 2012-12-26 3M Innovative Properties Co Methods of making composite electrodes
US20110279398A1 (en) * 2010-05-12 2011-11-17 Harald Philipp Touch screen electrode enhancements
JP4897982B1 (en) * 2011-01-13 2012-03-14 パナソニック株式会社 Touch panel device and touch position detection method
TWI592843B (en) * 2012-11-09 2017-07-21 恆顥科技股份有限公司 Touch electrode device

Also Published As

Publication number Publication date
US20140131065A1 (en) 2014-05-15
TW201419070A (en) 2014-05-16
CN103809797A (en) 2014-05-21
TWI592843B (en) 2017-07-21
DE202012105018U1 (en) 2013-03-25
CN203038240U (en) 2013-07-03
KR20140002947U (en) 2014-05-19

Similar Documents

Publication Publication Date Title
JP3180898U (en) Touch electrode device
US10203818B2 (en) Touch screen panel including at least one dummy pattern
US9019232B2 (en) Touch screen panel
JP5066272B2 (en) Input device and manufacturing method thereof
KR101905789B1 (en) flexible touch screen panel and flexible display device with the same
KR102028157B1 (en) flexible touch screen panel and flexible display device with the same
US20110007011A1 (en) Capacitive touch screen with a mesh electrode
JP3181428U (en) Touch electrode device
KR102303214B1 (en) Touch screen panel and manufacturing method thereof
KR102230808B1 (en) Touch Screen Panel
US10496232B2 (en) Capacitive touch panel
US9990098B2 (en) Touch screen panel
KR20150009846A (en) Touch Screen Panel and Fabricating Method Thereof
US9058083B2 (en) Touch sensing structure and method for making the same
JP3181933U (en) Touch electrode device
JP2014179063A (en) Touch panel
KR102215448B1 (en) Touch screen panel and manufacturing method thereof
KR101219597B1 (en) Touch Screen Panel and Fabricating Method for the Same
KR101985437B1 (en) Flexible Touch Screen Panel and Fabricating Method Thereof
KR20140016623A (en) Touch screen panel and the method for fabricating of the same
KR102316583B1 (en) Touch Screen Panel
JP2014102547A (en) Conductive pattern-formed substrate, capacitive sensor sheet and method for manufacturing the same
WO2015118879A1 (en) Touch panel
WO2021019823A1 (en) Transparent electrode member, electrostatic capacitance-type sensor, and input/output device
TWM448738U (en) Touch electrode device

Legal Events

Date Code Title Description
R150 Certificate of patent or registration of utility model

Ref document number: 3181428

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees