JP3020360B2 - Method and apparatus for cleaning electronic parts or precision parts - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for cleaning electronic parts or precision parts.
The present invention relates to a method and an apparatus for cleaning electronic components or precision components to which contaminants such as cutting oil, grease, liquid crystal, and flux have adhered.

[0002]

2. Description of the Related Art
Oils and fats on solid surfaces such as precision parts or tools
For removing dirt mainly composed of organic substances such as machine oil, cutting oil, grease, liquid crystal and flux, hydrocarbon solvents such as kerosene, benzene and xylene; chlorine solvents such as trichloroethylene and tetrachloroethylene; trichlorotrifluoroethane and the like A chlorofluorocarbon-based solvent; an aqueous cleaning solution containing a surfactant or a builder is used. In particular, fluorocarbon-based solvents or chlorine-based solvents have been used for components such as electronics, electricity, and machines, taking advantage of their high detergency and flame retardancy.

[0003] However, it has been revealed that cleaning solutions using the above-mentioned chlorinated solvents and chlorofluorocarbon-based solvents have serious problems in safety, toxicity, environmental pollution, etc., and their abolition has been promoted on an international level. I have.

[0004] From such a background, a solvent-based alternative cleaning solution such as a terpene-based solvent, a hydrocarbon-based solvent, or an alcohol-based solvent, or an aqueous-based cleaning solution containing a surfactant or the like, is used as a cleaning solution in place of a chlorine-based solvent or a fluorocarbon-based solvent. Cleaning methods using these cleaning liquids have been developed.These cleaning steps are usually performed by immersing the cleaning target in the cleaning liquid or spraying the cleaning liquid onto the cleaning target using a shower nozzle. And a rinsing step performed in the same manner.

As a cleaning method applied in the cleaning step or the rinsing step by immersing the object to be cleaned in a cleaning liquid, an ultrasonic vibration method, an oscillating method, a submerged shower method, a submerged rotation method, and the like are used. No. Further, as a cleaning method applied in a cleaning step or a rinsing step by spraying a cleaning liquid or a rinsing liquid onto the object to be cleaned using a shower nozzle, a method using a rotating nozzle as a shower nozzle and rotating the object to be cleaned are used. A method of injecting the cleaning liquid or the rinsing liquid onto the object to be cleaned while rinsing is used.

[0006] However, the ultrasonic vibration method has a problem that the object to be cleaned may be damaged, and the cleaning liquid is applied to the object to be cleaned using the swinging method, the submerged shower method, and the shower nozzle. The method by injecting into
This is effective when the object to be cleaned is a single object.However, when a plurality of objects to be cleaned are set in a jig, it is difficult to efficiently and uniformly clean all the objects to be cleaned. there were. In addition, the above-mentioned liquid rotation method (Japanese Utility Model Application Laid-Open No. 61-10913)
No. 6) is a relatively good means for solving the above problem, but also in this case, when a plurality of objects to be cleaned are set in the jig, the liquid between the objects to be cleaned rotates together. By doing so, it is difficult to renew the liquid around the object to be cleaned, so that there is a problem that the cleaning property is reduced.

SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to easily and efficiently clean a plurality of objects to be cleaned in a short time without damaging the objects to be cleaned in electronic parts or precision parts. It is an object of the present invention to provide a method and an apparatus for cleaning electronic parts or precision parts that can be used.

[0008]

Means for Solving the Problems The inventors of the present invention have conducted intensive studies to achieve the above object, and as a result, the object to be cleaned is held by a jig for holding the object to be cleaned and a plurality of objects to be cleaned are rotated by a submerged rotation method. It has been found that, when cleaning is performed, the cleaning property is improved by inserting a baffle plate between the jigs for holding the object to be cleaned. The present invention has been made based on the above findings, and has a cleaning method for an electronic component or precision parts, which has one or more cleaning steps with a cleaning liquid and / or one or more rinsing steps with a rinsing liquid. Alternatively, a rotating shaft equipped with a jig for holding an object to be washed is disposed in a washing tank charged with a rinsing liquid, and the object to be washed is held by the jig for holding an object to be washed. The object to be cleaned is rotated by rotating the rotating shaft by setting the baffle plate substantially parallel to the rotation surface of the object holding jig and at least a part of the baffle plate within the rotation radius of the object to be cleaned. It is intended to provide a method for cleaning electronic parts or precision parts, which is characterized in that the cleaning is performed by cleaning. Further, the present invention provides, as a preferable cleaning apparatus used in the cleaning method of the present invention, a cleaning tank provided with an inlet / outlet for an object to be cleaned, and a plurality of jigs for holding an object to be cleaned, which are disposed in the cleaning tank. Equipped with a rotating shaft equipped, a plurality of baffle plates that can be inserted between the objects to be washed substantially parallel to the rotation surface of the jig for holding the object to be washed, and rotating means for rotating the rotating shaft. The present invention provides a cleaning device for electronic components or precision components.

Hereinafter, the cleaning method of the present invention will be described in detail. The cleaning step in the cleaning method of the present invention is a step of performing cleaning with a cleaning liquid. The washing method in the washing step is not particularly limited, and includes an immersion method (a method of immersing an object to be cleaned in a washing tank), for example, an ultrasonic method, a rocking method, a submerged shower method, a submerged rotation method, and the like. Also, a shower method (a method of spraying a cleaning liquid onto an object to be cleaned using a shower nozzle), for example, a method using a rotating nozzle as a shower nozzle, or spraying a cleaning liquid onto an object to be cleaned while rotating the object to be cleaned The washing step is performed by appropriately combining them.

[0010] The rinsing step in the cleaning method of the present invention comprises:
This is a step of rinsing the cleaning liquid, contaminants, and the like remaining on the surface of the object to be cleaned with the rinsing liquid. The rinsing method in the rinsing step is not particularly limited, and includes, for example, a shower method, a dipping method, and the like, similar to the cleaning method in the cleaning step. The rinsing step is performed by appropriately combining these.

[0011] Examples of the washing tank include a washing tank used in a washing step by a usual immersion method.

In the cleaning method of the present invention, the jig for holding an object to be cleaned, which is provided on a rotating shaft provided in the cleaning tank, holds the object to be cleaned and removes the baffle plate from the object to be cleaned. It is not particularly limited as long as it can be installed substantially parallel to the rotation surface of the holding jig and at least a part of the baffle plate falls within the rotation radius of the object to be cleaned. For example, those shown in FIGS.

A jig 3 for holding an object to be cleaned shown in FIG. 1 has two holding rods 4 vertically fixed to a rotating shaft 2 and holding sections provided at the ends of the holding rods 4 for holding the object 1 to be cleaned. 5, and the holding portion 5 includes a holding screw 6.
An appropriate number of the cleaning object holding jigs 3 can be provided around the rotation shaft 2 and in the axial direction. Note that the holding rod 4 only needs to be substantially orthogonal to the rotating shaft 2.
There may be some inclination. In the case of the object-to-be-cleaned jig shown in FIG. 1, the object to be cleaned 1 is held by the holding portion 5 by tightening the holding portion 5 with the holding screw 6, as shown in FIG.

The jig 13 for holding an object to be cleaned shown in FIG. 2 is perpendicular to the rotating shaft 2 and penetrates the rotating shaft 2 so that the rotating shaft 2
And a holding portion 15 provided outside the holding plate 14 for holding the object 1 to be cleaned. Note that the holding plate 14 may be substantially perpendicular to the rotation shaft 2 and may have a slight inclination. The holding portion 15 includes a fastener 16, a fastener fixing bar 17, and a fastener fixing screw 18, as shown in FIG.
The object to be cleaned 1 is held by the fastener 16, the fastener fixing bar 17, and the fastener fixing screw 18.
The cleaning object holding jig 13 can be provided in an appropriate number in the axial direction of the rotating shaft 2. In addition, the above-mentioned fastener 1
6 and the holding plate 14 are provided with a concave portion (not shown) corresponding to the shape of the object 1 to be cleaned in order to keep the object 1 to be cleaned in a contact portion with the object 1 to be cleaned. Is provided.
In the case of the cleaning object holding jig 13 shown in FIG. 2, the cleaning object 1 moves the fastener 16 toward the center of the rotating shaft 2 as shown in FIG. It is gripped from both sides by being tightened between the plate 14 and the fastening screws 18.

The cleaning object holding jig 23 shown in FIG. 3 is orthogonal to the rotating shaft 2 and penetrates the rotating shaft 2 so that the rotating shaft 2
And a holding portion 25 provided inside the holding plate 24 for holding the object 1 to be cleaned. Note that the holding plate 24 may be substantially perpendicular to the rotating shaft 2 and may have a slight inclination. As shown in FIG. 3, the holding portion 25 is provided inside the holding plate 24,
It is provided movably in accordance with the shape of the object 1 to be held. That is, the holding portion 25 fixes the radially outer side 25a of the rotary shaft 2 and makes the radially inner side 25b of the rotary shaft 2 movable, and tightens the object 1 to be cleaned using a spring (not shown). It has been done. The holding plate 24 illustrated in FIG. 3 is a rectangular plate,
Examples thereof include a disk or a plate-like body having another shape. An appropriate number of the jigs 23 for holding an object to be washed can be provided in the axial direction of the rotating shaft 2. In the case of the cleaning object holding jig 23 shown in FIG.
As shown in (5), each vertex portion is fixedly held by the holding unit 25.

The jig 33 for holding an object to be cleaned shown in FIG.
Is a jig for holding an object to be cleaned similar to the jig 23 for holding an object to be cleaned, and is the same as the jig for holding an object to be cleaned 23 except that the holding plate 34 is circular. Cleaning object holding jig 3 shown in FIG.
In the case of 3, as shown in FIG. 4, the to-be-cleaned object 1 is held by the holding unit 35 with each apex portion fixed.

The baffle plate used in the cleaning method of the present invention is substantially parallel to the rotation surface of the jig for holding the object to be cleaned, and at least a part of the baffle plate is within the radius of rotation of the object to be cleaned. Installed to enter.

Examples of the shape of the baffle plate include a rectangular shape and a curved shape, but a plate-like body is preferable.

A preferred installation position of the baffle will be described with reference to FIG.

The object to be cleaned 1 is rotated to draw a rotating circle C ₁ as a locus, as shown in FIG. The distance (distance in the radial direction of the rotating disk) between the circumference of the circle C ₂ that is in contact with the inner side of the rotating circle C ₁ of the circumference and the article to be cleaned 1 and L _1, the baffle plate 45 tip and the across the baffle plate 45 the distance between the circumference of the rotating circle C ₁ and L. Above baffle 4
5 is preferably installed so as to be within the rotation radius of the object 1 to be cleaned, and more preferably installed so that L ≧ 0.5L ₁ from the viewpoint of improving the cleaning effect. More preferably, it is set so as to satisfy ≧ L ₁ .

When the tip of the baffle plate 45 does not fall within the radius of rotation of the object 1 to be cleaned, the effect of the baffle plate on the cleaning performance is reduced.

The width B (see FIG. 5) of the baffle plate 45 is not particularly limited as long as there is no problem in strength, assuming that the width of the object to be cleaned is b (see FIG. 5). 1.0
It is preferably b. The length D of the baffle plate 45 in the axial direction of the rotation shaft 2 (the length in the direction perpendicular to the rotation surface of the object to be cleaned) depends on the type and shape of the object 1 to be cleaned.
1 mm or more, the effect of improving the cleaning performance is exhibited as the length D is larger, but when there are a plurality of objects 1 to be cleaned,
And the distance obtained by subtracting the thickness of the article to be cleaned 1 from the interval between the washload holding jig 44, 44 and D _1, 0.1D ₁ ≦ D ≦
Preferably in the 0.9D _1.

The cleaning method of the present invention is particularly effective when the object 1 to be cleaned is to be washed while each of the plurality of jigs 44 for holding the object to be cleaned provided on the rotating shaft 2 is held.

As a method of rotating the rotary shaft used in the present invention, there is a method of connecting one end of the rotary shaft to a rotary driving device using a motor or the like as a drive source. In this case, it is preferable to hold the other end of the rotating shaft with a mechanism such as a bearing for stability.

The rotation speed of the rotating shaft varies depending on the size and shape of the object to be cleaned, but the speed (linear velocity) at the center of the object to be cleaned is preferably 0.1 m / s to 30 m / s.
s, more preferably 1 m / s to 30 m / s. If the velocity (linear velocity) at the center of the object to be cleaned is less than 0.1 m / s, the cleaning effect is small, and even if it exceeds 30 m / s, the improvement of the cleaning effect is small, and power consumption is economically disadvantageous. is there.

The rotation speed may not be based on the center of the object to be cleaned, but may be based on the position of the component if the component is mounted on a printed circuit board or the like. It may be set based on an appropriate part according to the purpose, such as a part to be dropped.

The rotation direction of the rotating shaft may be only one direction, or may be reversed at predetermined time intervals, and may be appropriately selected depending on the shape of the object to be cleaned and the nature of the stain.

The washing liquid used in the washing method of the present invention is not particularly limited, but a terpene solvent containing a terpene such as d-limonene obtained from animals and plants as an active ingredient,
Kerosene, benzene, hydrocarbon-based solvents containing hydrocarbons as active ingredients such as xylene, isopropyl alcohol, ethyl alcohol, solvent-based alternative cleaning liquids such as alcohol solvents containing lower alcohols such as methyl alcohol as active ingredients, surfactants, And an aqueous alternative washing liquid containing an alkaline agent such as sodium hydroxide and sodium orthosilicate, or a diluent thereof.

As the above-mentioned surfactant, anionic, cationic, amphoteric, nonionic surfactants and the like are used, but in consideration of the influence on members such as electronic parts, nonionic surfactants are preferable. Ether type such as alkyl ether type, alkyl allyl ether type and alkyl thioether type; ester type such as alkyl ester type and sorbitan alkyl ester type; condensed type with amine such as polyoxyalkylene alkylamine; polyoxyalkylene alkyl amide A polyurethane or tetronic type obtained by random or block condensation of polyoxyethylene and polyoxypropylene;
A surfactant such as a polyethyleneimine-based surfactant may be used. Among them, those having a hydrocarbon group having 4 to 22 carbon atoms are particularly preferable.

In the cleaning liquid composition containing a nonionic surfactant as described above, the rinse waste liquid after rinsing mixed with the nonionic surfactant shows a clear cloud point, and removes oily stains in the rinse waste liquid and organic substances such as the cleaning liquid. Since it can be easily separated and removed, the load of wastewater treatment is reduced, and wastewater treatment properties are particularly good.

As the water-based alternative cleaning liquid, a cleaning liquid containing a surfactant and a compound selected from hydrocarbon compounds, poorly water-soluble alkyl esters and alkyl ketones can be used.

Examples of the hydrocarbon compound include paraffins, olefins, and aromatic hydrocarbons which are liquid at the temperature of the washing or rinsing step and have linear or branched saturated or unsaturated bonds having 6 to 30 carbon atoms. Hydrocarbon compounds including hydrogen and alicyclic hydrocarbons are exemplified. Examples of the alkyl esters include monoesters, diesters, and triesters having 6 to 40 carbon atoms which are liquid at the temperature of the washing or rinsing step, and particularly include 6 to 18 carbon atoms.
Esters of higher fatty acids and alcohols having 1 to 18 carbon atoms; esters of higher fatty acids having 6 to 18 carbon atoms and diols or triols having 2 to 8 carbon atoms; alcohols having 1 to 18 carbon atoms and 2 to 8 carbon atoms Esters with dicarboxylic or tricarboxylic acids are preferred. Further, as the alkyl ketones, dialkyl ketones having 6 to 40 carbon atoms are preferable.

As the cleaning liquid (cleaning liquid composition) used in the cleaning method of the present invention, a liquid containing a builder, a chelating agent, a rust preventive, an antifoaming agent and the like, if necessary, in addition to the above-mentioned components is used. Alternatively, two or more of the above compounds may be used in combination depending on the application.

In the case where the dirt on the object to be cleaned is a dirt that can be removed with tap water, deionized water, pure water or the like, such water may be used as the cleaning liquid.

The rinsing liquid used in the cleaning method of the present invention is a liquid for rinsing dirt and / or a cleaning liquid composition on an object to be cleaned. The rinsing liquid is not particularly limited. For example, tap water, deionized water, pure water, or a liquid containing several percent of a cleaning liquid is used depending on the application. The rinsing liquid is discharged or reused after purifying. The above-mentioned purification treatment can be performed by a general wastewater treatment method such as coagulation sedimentation, pressure flotation, activated sludge, activated carbon, ion exchange, and a membrane treatment method alone or in an appropriate combination.

The electronic parts or precision parts to be cleaned according to the present invention include jigs (jigs) used for assembling, processing or holding the electronic parts or precision parts during cleaning.
And the like.

The electronic components include, for example, printed wiring boards used in computers and their peripheral devices, home appliances, communication devices, OA devices, and other electronic application devices; ICs
Hoop materials used for contact members such as lead frames, resistors, capacitors, relays; Liquid crystal displays (liquid crystal display devices) used for OA equipment, clocks, computer equipment, toys, home appliances, etc .; Video / audio recording / reproduction parts And magnetic recording parts used for related parts; semiconductor materials such as silicon and ceramic wafers; parts for electrostriction such as quartz oscillators; photoelectric conversion parts used for CD, PD, copying equipment, optical recording equipment, etc. Is mentioned.

Examples of the precision parts include electric parts, precision machine parts, resin processed parts, optical parts and the like. Examples of the electric components include motor components such as brushes, rotors, stators, and housings; ticketing components used in vending machines and various devices; and currency inspection components used in vending machines and cash dispensers. Examples of the precision machine parts include bearings used for precision drive equipment, video recorders, and the like; machining parts such as carbide tips and the like. Examples of the resin processed parts include precision resin processed parts used for cameras, automobiles and the like. Further, examples of the optical components include lenses used for cameras, glasses, optical devices, and the like, and examples of the precision components include eyeglass frames, watch cases, watch belts, and the like.

As the jigs and tools, there are electronic parts or precision parts as shown in the above-mentioned various parts.
In addition to jigs and tools handled in various processes for forming, processing, assembling, finishing, and the like, various devices handling these electronic components or precision components, components thereof, and the like are included.

The cleaning method of the present invention exhibits a suitable performance when cleaning the liquid crystal or the like adhered to a printed wiring board or a glass substrate in which the flux remains, among the above-mentioned electronic parts or precision parts. The electronic parts or precision parts to be covered by the present invention are not limited to these examples, but may be various processing oils, fluxes, and other interfering substances in the subsequent steps in the assembling processing step, or characteristics of the products. The cleaning method of the present invention can be applied to electronic parts or precision parts to which various types of oily contaminants that reduce the contamination are attached.

Further, in the cleaning method of the present invention, the contaminants may be, for example, fats and oils, machine oil, cutting oil, grease, liquid crystal,
In the case of mainly organic components such as rosin flux, the characteristics of the cleaning method of the present invention are particularly exhibited, and the present invention is effective even for contaminants in which metal powder, inorganic powder and the like are mixed.

Although the cleaning method of the present invention is not limited to the shape of the object to be cleaned as described above, it is particularly effective as a method for cleaning a plate-like body such as a printed wiring board.

Hereinafter, the cleaning method of the present invention will be described based on one embodiment. First, the object to be cleaned is held via the object to be cleaned holding jig provided on the rotating shaft as described above. As the orientation when holding the object to be cleaned by the object to be cleaned holding jig, usually, when the object to be cleaned is a plate,
The plate-like body is oriented so that the plane is perpendicular to the rotation axis. Next, the baffle plate is set substantially parallel to the rotation surface of the jig for holding the object to be cleaned and such that at least a part of the baffle plate falls within the rotation radius of the object to be cleaned, and then the cleaning liquid is applied. Prepare so that the washing is immersed. next,
After the object to be cleaned is held by the jig for holding the object to be cleaned and the cleaning step is performed by a cleaning method in which the object to be cleaned is rotated by rotating the rotating shaft and the object to be cleaned is subjected to a liquid phase. The liquid is drained by rotation without immersion. Examples of a method for preventing the object to be cleaned from being immersed in the liquid phase include a method of moving the rotation drive device and the rotation axis of the rotating shaft upward, a method of removing the liquid phase from the bottom of the tank, and the like.

Next, after performing the rinsing step in the same manner as the above-mentioned washing step, the liquid is removed by rotation without being immersed in the rinsing liquid. The rinsing step is usually performed one or more times, but may include only the washing step. Thus, draining by rotating the object to be cleaned in a state where it is not immersed in the liquid phase is effective in reducing the drainage load, and also effective in drying the object to be cleaned after the final rinsing. .

Further, in the cleaning method of the present invention, a well-known drainage promoting method such as a method of blowing a gas such as air onto the object to be cleaned can be used together.

In addition, a normal cleaning method can be appropriately used together with the above-mentioned cleaning method of the electronic parts or precision parts of the present invention.

Next, an embodiment of a preferable cleaning apparatus used in the method for cleaning electronic parts or precision parts of the present invention will be described with reference to the drawings. FIG. 6 (a)
Is a longitudinal sectional view showing the cleaning apparatus of the present invention, and FIG.
FIG. 6A is a plan view illustrating a main part of the cleaning apparatus during cleaning, FIG. 6C is a plan view illustrating a main part of the cleaning apparatus illustrated in FIG. FIG. 7 is a longitudinal sectional view showing another example of the cleaning device of the present invention.

The cleaning apparatus 40 of the present invention shown in FIG. 6 is provided with a cleaning tank 41 provided with an inlet / outlet for an object to be cleaned, and a plurality of jigs 44 for holding the object to be cleaned, which are disposed in the cleaning tank 41. The rotating shaft 42, a plurality of baffle plates 45 which can be inserted between the cleaning object holding jigs 44, 44 substantially in parallel with the rotation surface of the cleaning object holding jig 44, Rotating means for rotating 42. In this embodiment, the rotating shaft 42 is disposed vertically in the cleaning tank 41. The washing tank 41 is provided at its bottom with a discharge hole 43 for the liquid phase in the washing tank 41, the discharge hole 43 is provided with a valve 47 at the tip, and the washing tank 41 is provided at the top. The lid 50 can be attached. At the bottom of the cleaning tank 41, a bearing 48 for rotating a rotary shaft 42 equipped with a plurality of jigs 44 for holding an object to be cleaned is provided. The bearing 48 is
Outside the cleaning tank 41, the cleaning tank 41 is connected to a rotary drive 49 using a motor or the like as a drive source. The baffle plate 45 is rotated around the baffle plate rotation shaft 46 from the state shown in FIG. 6C, so that the cleaning object holding jigs 44 are moved as shown in FIG. 6B. The object to be cleaned 1 can be moved in and out together with the rotating shaft 42 provided with the object to be cleaned holding jig 44 by opening the lid 50 of the cleaning tank.

When cleaning is performed using the cleaning apparatus shown in FIG. 6, the cleaning object 1 is held by the cleaning object holding jig 44 provided on the rotating shaft 42, and the baffle plate 45 is moved to the position shown in FIG.
After moving to the state of (c), the rotating shaft 42 is
8 and the baffle plate 45 is inserted between the jigs 44 to be cleaned as shown in FIG. 6 (b) and fixed at a predetermined position with fixing screws or the like (not shown). Close 50. Next, the valve 47 at the bottom of the cleaning tank 41 is opened to supply the cleaning liquid, and after the supply is completed, the valve 47 is closed and the rotation driving device 49 is closed.
The cleaning process is performed by driving the bearing 48 to rotate the rotating shaft 42 and the object 1 to be cleaned. After the cleaning step, the valve 47 is opened, and the cleaning liquid is discharged from the discharge hole 43. After draining the washing liquid, the liquid can be drained using the centrifugal force of rotation. After the cleaning process is completed, the baffle plate 4
5 can be moved to the position shown in FIG. 6C again, the lid 50 can be opened, and the rotating shaft 42 and the object 1 can be taken out. If necessary, a rinsing step may be performed by the same operation after the above-mentioned cleaning step, and then the rotating shaft 42 and the object 1 to be cleaned may be taken out.

The rotating shaft 42 may be installed horizontally. If necessary, a shower nozzle, an ultrasonic oscillator, and a drying electric heater or a nozzle capable of introducing hot air for drying may be provided in the cleaning tank 41.

In the cleaning apparatus shown in FIG. 6, the number of the baffle plates 45 inserted is two per one jig 44 for holding the object to be cleaned, but one or more than three jigs are inserted. The number may be increased as needed.

The cleaning device shown in FIG. 7 is another example of the cleaning device of the present invention. The cleaning device 60 shown in FIG. 7 is similar to that shown in FIG. 6 except that the baffle plate 65 is moved in parallel by a baffle plate driving device 66 so that the baffle plate 65 can be inserted between the jigs 64 to be cleaned. It has the same configuration as the cleaning device.

[0053]

A rotating shaft equipped with a jig for holding an object to be washed is disposed in a washing tank charged with the washing liquid or the rinsing liquid, and the object to be washed is held by the jig for holding an object to be washed. Is installed substantially parallel to the rotation surface of the object-to-be-washed jig and at least a part of the baffle plate is within the rotation radius of the object to be washed, and by rotating the rotating shaft, When rotating the object to be cleaned,
When the object to be cleaned approaches the baffle plate by rotation, the shear force exerted from the liquid phase on the object to be cleaned temporarily increases,
The effect of removing dirt or residual cleaning liquid adhering to the surface of the object to be cleaned from the surface increases, thereby promoting cleaning and / or rinsing.

This means that when the object to be cleaned approaches the baffle plate by rotation, a pressure rise occurs near the object to be cleaned, and when the object to be cleaned moves away from the baffle plate, the pressure increases near the object to be cleaned. Pressure drop occurs.

For this reason, when a component or the like is mounted on the object to be cleaned, when the mounting portion of the component approaches the baffle plate, the pressure rises as described above, so that the back of the component is placed around (outside) the component. When the flow of the liquid to the inside (inside) occurs and the mounting part of the part moves away from the baffle plate, the liquid flows from the back (inside) of the part to the periphery (outside) of the part due to the pressure drop described above. Flow occurs. As a result, the liquid is reliably renewed even on the back side (inside) of the part, and cleaning and / or rinsing is promoted.

As described above, the object to be cleaned approaches the baffle plate by rotation and moves away from the baffle plate periodically, whereby the cleaning / cleaning of the object to be cleaned is performed as compared with the simple submerged rotation method. The rinsing effect is improved.

As described above, the baffle plate is set so as to be substantially parallel to the rotation surface of the jig for holding the object to be cleaned and so that at least a part of the baffle plate falls within the radius of rotation of the object to be cleaned. Then, by rotating the object to be cleaned and performing cleaning, even when there are a plurality of objects to be cleaned and the holding interval is narrow, the cleaning performance and / or the rinsing performance is not reduced, and the cleaning is efficiently performed. Thus, the processing amount of the object to be cleaned in the same space can be increased.

[0058]

Next, the cleaning method of the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples. Example 1 Size 30 mm × 50 mm, thickness 2 m as shown in FIG.
25 mm × 25 on glass epoxy resin 81
The glass 82 having a thickness of 1 mm and a thickness of 1 mm is fixed so that the center portion 83 of the glass is held at a single point on the glass epoxy resin with an adhesive so that the clearance becomes 100 μm, and as a dirt substance in the gap, Flux 84
(Sample to be cleaned) 85 filled with (Nippon Solder RX363-207B tetrahydrofuran extractables) was produced.

The sample (the object to be cleaned) is held in the cleaning apparatus shown in FIG. 6 by a jig for holding the object to be cleaned as shown in FIG. 3, as shown in FIG. The space between the object to be cleaned was set to 20 mm, and the object to be cleaned was set to be horizontal to the liquid surface. Incidentally L ₁ is 35 mm, the radius of the circle tangent to the inside of the object to be cleaned is 30mm
Met. Next, a baffle plate was inserted between the jigs for holding an object to be cleaned and fixed at the position shown in FIG. The baffle plate has a length L of 50 mm and a length B in a tangential direction of the rotating circle.
Was 10 mm and the length D in the axial direction of the rotating shaft was 10 mm, and the distance a between the surface of the object to be cleaned and the baffle plate (a baffle plate facing the object to be cleaned) was 5 mm. Next, the cleaning object is filled with the cleaning liquid so that the object to be cleaned and the jig for holding the object to be cleaned are completely immersed in the cleaning tank, and the rotation axis is set to 1.5 m / s at the center of the glass of the object to be cleaned. For 10 minutes at 60.degree. In addition, a mixture of 40 wt% of a nonionic surfactant, 40 wt% of C14 olefin, and 20 wt% of water was used as the cleaning liquid. Furthermore,
The distance between the surface of the object to be cleaned and the holding plate facing the object to be cleaned is 30 mm (a = 10 mm) and 40 mm (a = 15 mm).
mm), cleaning was carried out in the same manner as described above. The following Table 1 shows the flux removal rate of the washed sample.

Comparative Example 1 The same procedure as in Example 1 was carried out except that the baffle plate was not used, and the distance between the surface of the object to be cleaned and the holding plate facing the object to be cleaned was set to 20, 30, and 40 mm. Was done. The following Table 1 shows the flux removal rate of the washed sample.

The flux removal rate was calculated as the ratio of the area of the flux-removed portion after cleaning to the area of the flux-filled portion before cleaning.

[0062]

[Table 1]

FIG. 9 is a graph showing the dependence of the flux removal rate in Example 1 and Comparative Example 1 on the distance between the surface of the object to be cleaned and the holding plate facing the object to be cleaned.
Shown in

As can be seen from Table 1 and FIG. 9, according to the cleaning method of the present invention, the flux removal rate is higher than that of the case without the baffle, and the cleaning efficiency is higher when there is no baffle. When the distance between the surface of the object and the holding plate facing the object to be cleaned is reduced, the cleaning property is reduced due to the co-rotation of the liquid, but this can be prevented by using a baffle plate. Therefore, according to the cleaning method of the present invention, the cleaning time can be shortened due to the high cleaning performance, and more objects to be cleaned can be processed in the same space, and an improvement in productivity can be expected.

Example 2 In a cleaning apparatus similar to that shown in FIG. 6 except for the type of the jig for holding an object to be cleaned, a printed circuit board treated with a rosin-based flux having a size of 140 mm × 100 mm was cleaned as shown in FIG. L ₁ is 110mm in the object holding jig, the radius of the circle tangent to the inside of the object to be cleaned is held in the state of 140 mm, and held as shown in FIG. 1 so that 20mm spacing object to be cleaned,該被washed The object was set so as to be horizontal to the liquid surface. Next, a baffle plate was inserted between the objects to be cleaned and fixed at the position shown in FIG. In the above baffle plate, the L is 1
A rectangular plate having a length of 20 mm, a tangential length of the rotating circle of 10 mm, and an axial length of the rotating shaft of 10 mm, which is formed between the surface of the object to be cleaned and the baffle plate (a baffle plate facing the object to be cleaned); The distance a was 5 mm. Next, a rinsing step (preliminary rinsing) was performed using tap water in the same manner as in the above-described cleaning step, and finally, a rinsing step (final rinsing) was performed using pure water in the same manner as in the above-described cleaning step. Thereafter, in order to examine the effect of cleaning, a cleaning test was performed in accordance with MIL-P-28809, and an omega meter (600R-made by Nippon Metal Co., Ltd.) was used.
The SC), result of measurement of ion residue, the measured value is 0.6 [mu] g / in ^2, that good detergency to significantly clear tolerance 14 [mu] g / in ² of ion residue was exerted I understood.

[0066]

According to the method for cleaning electronic parts or precision parts of the present invention, dirt on the object to be cleaned can be easily and efficiently removed in a short time, and a large number of objects to be cleaned can be processed. It is. Furthermore, since the liquid is drained efficiently and simply in the washing step or the rinsing step, the amount of the detergent used, the drainage load and the drying time can be reduced.
Therefore, economical and highly productive cleaning can be performed.

[Brief description of the drawings]

FIG. 1 is a perspective view showing an example of a jig for holding an object to be cleaned used in the cleaning method of the present invention.

FIG. 2 is a perspective view showing another example of a jig for holding an object to be cleaned used in the cleaning method of the present invention.

FIG. 3 is a perspective view showing still another example of the jig for holding an object to be cleaned used in the cleaning method of the present invention.

FIG. 4 is a perspective view showing still another example of the jig for holding an object to be cleaned used in the cleaning method of the present invention.

FIG. 5 is a schematic diagram for explaining a preferable installation position of a baffle plate used in the cleaning method of the present invention.

6 (a) is a longitudinal sectional view showing an example of the cleaning apparatus of the present invention, and FIG. 6 (b) is a plan view showing a main part of the cleaning apparatus of FIG. 6 (a) during cleaning. , FIG. 6C shows FIG.
It is a top view showing one important section at the time of going in and out of a thing to be washed in a washing device of (a).

FIG. 7 is a longitudinal sectional view showing another example of the cleaning apparatus of the present invention.

FIG. 8A is a plan view showing a sample used in Example 1 and Comparative Example 1, and FIG. 8B is a side view thereof.

FIG. 9 is a graph showing the dependence of the flux removal rate on the distance a between the surface of the object to be cleaned and the holding plate facing the object to be cleaned in Example 1 and Comparative Example 1.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 To-be-cleaned object 2 Rotation axis 3 To-be-cleaned object holding jig 4 Holding rod 5 Holding part 6 Nipping screw 13 To-be-cleaned object holding jig 14 Holding plate 15 Holding part 16 Fastening 17 Fastening fixing rod 18 Fastening fixing screw 23 Cleaning object holding jig 24 Holding plate 25a holding unit 25b holding unit 33 Cleaning object holding jig 34 Holding plate 35a holding unit 35b holding unit 40 Cleaning device 41 Cleaning tank 42 Rotating shaft 43 Discharge hole 44 Cleaning object holding jig Component 45 Baffle plate 46 Baffle plate rotation shaft 47 Valve 48 Bearing 49 Rotation drive device 50 Lid 60 Cleaning device 61 Cleaning tank 62 Rotation shaft 63 Discharge hole 64 Cleaning object holding jig 65 Baffle plate 66 Baffle plate drive device 67 Valve 68 Bearing 69 rotation drive device 70 lid 81 glass epoxy resin 82 glass 83 central part 84 flux 85 sample

──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-56-5173 (JP, A) JP-A-60-19061 (JP, A) JP-A-55-115332 (JP, A) 109136 (JP, U) (58) Fields investigated (Int. Cl. ⁷ , DB name) B08B 3/00-3/14

Claims (5)

(57) [Claims] 1. One or more cleaning steps with a cleaning liquid and / or
Alternatively, in a method for cleaning electronic parts or precision parts having one or more rinsing steps with a rinsing liquid, a rotating shaft equipped with a jig for holding an object to be cleaned is disposed in a cleaning tank charged with the cleaning liquid or the rinsing liquid. At the same time, the object to be cleaned is held by the jig for holding the object to be cleaned, and the baffle plate is substantially parallel to the rotation surface of the jig for holding the object to be cleaned and at least a part of the baffle plate is covered by the jig. A method for cleaning an electronic component or a precision component, wherein the cleaning device is installed so as to be within a rotation radius of the cleaning object, and rotates the cleaning object by rotating the rotation shaft. 2. The method for cleaning electronic parts or precision parts according to claim 1, wherein the rotating shaft equipped with the object holding jig is disposed vertically. 3. The method according to claim 1, wherein the object to be cleaned is a plate. 4. The method according to claim 3, wherein the plate is a printed circuit board. 5. A cleaning tank provided with an inlet / outlet for an object to be cleaned, a rotating shaft provided in the cleaning tank and equipped with a plurality of jigs for holding an object to be cleaned, and a rotating shaft provided between the object to be cleaned. Cleaning of electronic parts or precision parts, comprising: a plurality of baffle plates which can be inserted substantially in parallel to the rotation surface of the object to be cleaned, and rotation means for rotating the rotation shaft. apparatus.