JP3057991B2 - Manufacturing method of ceramic electronic components - Google Patents
Manufacturing method of ceramic electronic componentsInfo
- Publication number
- JP3057991B2 JP3057991B2 JP5340138A JP34013893A JP3057991B2 JP 3057991 B2 JP3057991 B2 JP 3057991B2 JP 5340138 A JP5340138 A JP 5340138A JP 34013893 A JP34013893 A JP 34013893A JP 3057991 B2 JP3057991 B2 JP 3057991B2
- Authority
- JP
- Japan
- Prior art keywords
- ceramic
- container
- ceramic body
- manufacturing
- ceramic electronic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Ceramic Capacitors (AREA)
Description
【0001】[0001]
【産業上の利用分野】この発明は、セラミック電子部品
の製造方法に関し、詳しくは、セラミック中に内部電極
が埋設された構造を有するセラミック素体を焼成した
後、これを再酸化する工程を含んで製造されるセラミッ
ク電子部品の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a ceramic electronic component, and more particularly to a method for firing a ceramic body having a structure in which internal electrodes are embedded in a ceramic, and then reoxidizing the ceramic body. And a method for manufacturing a ceramic electronic component manufactured by the method described above.
【0002】[0002]
【従来の技術】セラミック電子部品の代表的なものの一
つに積層セラミックコンデンサがある。この積層セラミ
ックコンデンサは、通常、セラミック層と内部電極が交
互に積層された構造となるように、セラミック中に所定
のパターンの内部電極を配設することにより形成されて
いる。2. Description of the Related Art A multilayer ceramic capacitor is one of the typical ceramic electronic components. This multilayer ceramic capacitor is usually formed by arranging a predetermined pattern of internal electrodes in a ceramic so as to have a structure in which ceramic layers and internal electrodes are alternately stacked.
【0003】そして、この積層セラミックコンデンサに
おいては、従来、内部電極として、セラミック素体の焼
成時に酸化されないようにAu、Pt、Pd、Agなど
の貴金属材料が用いられてきたが、近年、製造コストを
低減するために、セラミックとして非還元材料を用い、
内部電極としてNiやCuなどの卑金属材料を用いた積
層セラミックコンデンサが製造されるようになってい
る。In this multilayer ceramic capacitor, noble metal materials such as Au, Pt, Pd, and Ag have been used as internal electrodes so as not to be oxidized when the ceramic body is fired. In order to reduce the use of non-reducing material as ceramic,
A multilayer ceramic capacitor using a base metal material such as Ni or Cu as an internal electrode has been manufactured.
【0004】ところで、内部電極として、NiやCuな
どの卑金属を用いた積層セラミックコンデンサを製造す
る場合、セラミック素体を焼成する工程でセラミック中
に配設された内部電極が酸化されてしまわないように、
還元性雰囲気あるいは中性雰囲気で焼成が行われる。When a multilayer ceramic capacitor using a base metal such as Ni or Cu as an internal electrode is manufactured, the internal electrode provided in the ceramic should not be oxidized in the step of firing the ceramic body. To
The firing is performed in a reducing atmosphere or a neutral atmosphere.
【0005】そのため、セラミックが所定の特性を具備
するように、セラミック素体の焼成後に酸化性の雰囲気
中でセラミック素体の酸化処理を行う再酸化の工程が必
要になる。なお、再酸化を行わないと、セラミックの絶
縁抵抗が不十分になったり、直流バイアス印加時に形成
される容量が小さくなって所望の特性を得ることができ
なくなったりするというような問題点がある。[0005] Therefore, a re-oxidation step of oxidizing the ceramic body in an oxidizing atmosphere after firing the ceramic body is required so that the ceramic has predetermined characteristics. Unless re-oxidation is performed, there is a problem that the insulation resistance of the ceramic becomes insufficient, or the capacity formed when a DC bias is applied becomes small, so that desired characteristics cannot be obtained. .
【0006】そこで、焼成後に再酸化が行われるが、再
酸化の方法としては、従来、焼成さやにセラミック素体
を載置して焼成を行う焼成工程における降温時に雰囲気
中の酸素濃度を上昇させる方法や、焼成後にバッチ炉な
どにおいて酸化雰囲気中で酸化処理を行う方法などが用
いられている。Therefore, re-oxidation is performed after firing. As a method of re-oxidation, conventionally, the oxygen concentration in the atmosphere is increased when the temperature is lowered in the firing step in which the ceramic body is mounted on the fired sheath and firing is performed. A method and a method of performing an oxidation treatment in an oxidizing atmosphere in a batch furnace or the like after firing are used.
【0007】[0007]
【発明が解決しようとする課題】しかし、上記従来の再
酸化の方法では、セラミック素体を必ずしも十分に酸化
することができない場合があり、製品の特性にばらつき
が生じるという問題点がある。特に、大型のチップ型セ
ラミック電子部品の場合、再酸化時に焼成さやの底面と
接するセラミック素体の下面側が酸化雰囲気に十分に接
触せず、酸化されにくい場合があり、均一かつ十分な再
酸化を行うことが困難であるという傾向がある。However, in the above-mentioned conventional reoxidation method, the ceramic body may not always be sufficiently oxidized, and there is a problem that the characteristics of the product vary. In particular, in the case of large chip-type ceramic electronic components, the lower surface side of the ceramic body that is in contact with the bottom surface of the fired sheath at the time of re-oxidation may not be sufficiently in contact with the oxidizing atmosphere and may not be easily oxidized. It tends to be difficult to do.
【0008】この発明は、上記問題点を解決するもので
あり、焼成されたセラミック素体を確実に再酸化するこ
とが可能で、絶縁抵抗や形成される容量の大きさなどに
関し所望の特性を有するセラミック電子部品を製造する
ことが可能なセラミック電子部品の製造方法を提供する
ことを目的とする。The present invention has been made to solve the above-mentioned problems, and it is possible to reliably reoxidize a fired ceramic body, and to obtain desired characteristics with respect to insulation resistance and the size of a formed capacitor. It is an object of the present invention to provide a method for manufacturing a ceramic electronic component capable of manufacturing a ceramic electronic component having the same.
【0009】[0009]
【課題を解決するための手段】上記目的を達成するため
に、この発明のセラミック電子部品の製造方法は、セラ
ミック中に内部電極が埋設された構造を有するセラミッ
ク素体を焼成した後、これを再酸化する工程を含むセラ
ミック電子部品の製造方法において、焼成した後のセラ
ミック素体を、再酸化用の回転可能な容器に入れ、前記
容器を回転させて、内部のセラミック素体を転動させな
がら、酸化雰囲気中で、処理温度600〜900℃、処
理時間30分以上の条件下に、セラミック素体の再酸化
を行うことを特徴とする。In order to achieve the above object, a method for manufacturing a ceramic electronic component according to the present invention comprises: firing a ceramic body having a structure in which internal electrodes are embedded in ceramic; the method of manufacturing a ceramic electronic component comprising the step of re-oxidation, Serra after firing
Mick body, put in a rotatable container for re-oxidation,
Rotate the container and do not roll the ceramic body inside.
Meanwhile, reoxidation of the ceramic body in an oxidizing atmosphere at a processing temperature of 600 to 900 ° C. and a processing time of 30 minutes or more.
Is performed .
【0010】なお、処理温度は600〜900℃の範囲
が好ましいが、これは、600℃未満になると再酸化の
効果が小さくなり、また、900℃を越えると内部電極
の酸化が起こり、好ましくないことによる。The processing temperature is preferably in the range of 600 to 900 ° C., but if it is lower than 600 ° C., the effect of reoxidation is reduced, and if it exceeds 900 ° C., oxidation of the internal electrode occurs, which is not preferable. It depends.
【0011】また、処理時間は、30分以上であれば必
要な再酸化を行うことが可能であり、30分未満になる
と再酸化の効果が小さくなるため、30分以上の処理時
間を確保することが好ましい。If the processing time is 30 minutes or more, necessary reoxidation can be performed, and if the processing time is less than 30 minutes, the effect of reoxidation is reduced. Therefore, a processing time of 30 minutes or more is secured. Is preferred.
【0012】なお、容器の回転速度については、特別の
制約はないが、セラミック素体にカケやワレが生じない
程度の回転速度とすることが好ましい。There is no particular limitation on the rotation speed of the container, but it is preferable that the rotation speed be such that the ceramic element does not chip or crack.
【0013】[0013]
【作用】この発明のセラミック電子部品の製造方法にお
いては、焼成後のセラミック素体が回転可能な容器に入
れられ、酸化雰囲気中で、回転する容器中を転動しなが
ら再酸化処理が行われるため、セラミック素体が酸化雰
囲気と確実に接触して十分な再酸化が行われる。In the method of manufacturing a ceramic electronic component according to the present invention, the fired ceramic body is placed in a rotatable container, and reoxidized in an oxidizing atmosphere while rolling in the rotating container. Therefore, the ceramic body is reliably brought into contact with the oxidizing atmosphere, and sufficient reoxidation is performed.
【0014】[0014]
【実施例】以下、この発明の実施例を図に基づいて説明
する。図1はこの発明のセラミック電子部品の製造方法
の再酸化工程において用いられる装置の一実施例を示す
概略図であって、(a)は斜視図、(b)は側面図であり、
図2は同じく正面断面図である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic view showing one embodiment of an apparatus used in a reoxidation step of the method for manufacturing a ceramic electronic component of the present invention, wherein (a) is a perspective view, (b) is a side view,
FIG. 2 is a front sectional view of the same.
【0015】この実施例においては、再酸化処理を行う
べきセラミック素体を入れる容器(回転容器)1とし
て、ニッケル製で円筒状の容器が用いられている。さら
に、この容器1の両端面側には、容器1の内部と外部雰
囲気(酸化雰囲気)とを連通させるための穴2が形成さ
れている。なお、この実施例では、再酸化処理を行うべ
きセラミック素体としては、ニッケルの内部電極を複数
層埋設し、この内部電極を交互に素体の対向端部に導出
させたコンデンサ素体を、還元性雰囲気中、所定の焼成
温度で焼成したものが用いられている。In this embodiment, a cylindrical container made of nickel is used as a container (rotating container) 1 for holding a ceramic body to be reoxidized. Further, holes 2 for communicating the inside of the container 1 with an external atmosphere (oxidizing atmosphere) are formed on both end surfaces of the container 1. In this embodiment, as the ceramic body to be subjected to the reoxidation treatment, a capacitor body in which a plurality of layers of nickel internal electrodes are buried and the internal electrodes are alternately led to the opposite end of the body, What is fired at a predetermined firing temperature in a reducing atmosphere is used.
【0016】次に、この容器1を用いて行ったセラミッ
ク素体の再酸化処理の工程について説明する。Next, the step of reoxidizing the ceramic body performed using the container 1 will be described.
【0017】まず、焼成後のセラミック素体3を多数個
容器1に収納する。このとき、セラミック素体3が容器
1の回転にともなって、容器1内で十分に転動するよう
な量だけセラミック素体3を容器1に収納する。First, a large number of fired ceramic bodies 3 are housed in a container 1. At this time, the ceramic element 3 is accommodated in the container 1 in such an amount that the ceramic element 3 sufficiently rolls in the container 1 as the container 1 rotates.
【0018】それから、容器の回転速度、温度、雰囲
気、処理時間をそれぞれ、 容器の回転速度 :0.3rpm 温度 :780℃ 雰囲気(酸化雰囲気) :エア雰囲気 処理時間 :60分 とした再酸化用の炉内に、セラミック素体3を充填した
容器1を回転させつつ位置させて再酸化処理を行った。
それから、得られたセラミック素体の対向端部に外部電
極を付与し、埋設されている内部電極と導電接続させ、
積層セラミックコンデンサとした。Then, the rotation speed, temperature, atmosphere, and processing time of the container were respectively set as follows: rotation speed of the container: 0.3 rpm, temperature: 780 ° C. atmosphere (oxidizing atmosphere): air atmosphere, and processing time: 60 minutes. The container 1 filled with the ceramic body 3 was rotated and positioned in the furnace to perform a reoxidation treatment.
Then, an external electrode is applied to the opposite end of the obtained ceramic body, and conductively connected to the embedded internal electrode,
This was a multilayer ceramic capacitor.
【0019】なお、比較のため、セラミック素体を互に
重ならないようにZrO2の焼成さや上に載置し、上記
実施例と同一の条件で処理して再酸化を行い、外部電極
を形成した。For comparison, the ceramic bodies were placed on a baked sheath of ZrO 2 so as not to overlap each other, treated under the same conditions as in the above embodiment, and reoxidized to form external electrodes. did.
【0020】そして、上記実施例及び比較例の方法によ
り得られた試料について、25℃、85℃、150℃に
おける絶縁抵抗、及び1kV/mmの電圧印加時に形成さ
れる容量の低下の割合を測定した。その結果を表1に示
す。Then, for the samples obtained by the methods of the above Examples and Comparative Examples, the insulation resistance at 25 ° C., 85 ° C., and 150 ° C., and the rate of decrease in the capacitance formed when a voltage of 1 kV / mm was applied were measured. did. Table 1 shows the results.
【0021】[0021]
【表1】 [Table 1]
【0022】表1に示すように、絶縁抵抗については、
比較例の試料では25℃で1.4×109Ω、150℃
で5.0×107Ωであるのに対し、実施例の試料では
25℃で2×109Ω、150℃で1.2×108Ωと
高い絶縁抵抗が得られていることがわかる。As shown in Table 1, the insulation resistance is
The sample of the comparative example is 1.4 × 10 9 Ω at 25 ° C. and 150 ° C.
In contrast is the a 5.0 × 10 7 Ω, it can be seen that 2 × 10 9 Ω at 25 ° C. in a sample embodiment, is 1.2 × 10 8 Ω and a high insulation resistance at 0.99 ° C. is obtained .
【0023】また、容量の低下の割合については、比較
例の試料では低下率が−58%であるのに対し、実施例
の試料では−45%となっており、実施例の試料の場
合、容量の低下率が減少していることがわかる。The rate of decrease in capacity is -58% in the sample of the comparative example, whereas it is -45% in the sample of the example. It can be seen that the rate of decrease in capacity has decreased.
【0024】なお、上記実施例においては、容器として
円筒状の容器を用いた場合について説明したが、容器の
形状は、これを回転させることにより内部に充填したセ
ラミック素体を転動させて酸化雰囲気と十分に接触させ
つつ焼成することが可能な種々の形状、例えば、四角筒
状や六角筒状などの形状に構成することも可能であり、
また、セラミック素体の転動を促進するように、内部に
突起(バッファ)などを設けた容器を用いることも可能
である。また、容器の内部と雰囲気(酸化雰囲気)とを
連通させるための穴の形状や配設位置についても特別の
制約はなく、発明の要旨の範囲内において任意に変形を
加えることが可能である。さらに、上記実施例ではニッ
ケル製の容器を用いた場合について説明したが、容器の
材質についても特別の制約はなく、他の金属材料や、ア
ルミナ、ジルコニアなどのセラミックス、あるいは金属
からなるメッシュ状の材料(金網)などを用いて容器を
構成することも可能である。In the above embodiment, the case where a cylindrical container is used as the container has been described. However, the shape of the container is such that the ceramic body filled therein is rolled by rotating the container to oxidize the container. Various shapes that can be fired while being sufficiently in contact with the atmosphere, for example, it is also possible to configure a shape such as a square tube or hexagonal tube,
It is also possible to use a container provided with projections (buffers) or the like inside to promote the rolling of the ceramic body. Further, there is no particular restriction on the shape and arrangement position of the hole for communicating the inside of the container with the atmosphere (oxidizing atmosphere), and it is possible to arbitrarily modify the shape within the scope of the invention. Further, in the above embodiment, the case where a nickel container was used was described. However, there is no particular limitation on the material of the container, and other metal materials, alumina, ceramics such as zirconia, or a mesh-like metal made of metal. It is also possible to configure the container using a material (wire mesh) or the like.
【0025】また、上記実施例では、積層セラミックコ
ンデンサの製造方法を例にとって説明したが、この発明
は積層セラミックコンデンサの製造方法に限られるもの
ではなく、LC複合部品、インダクタなど、セラミック
中に内部電極が埋設された構造を有する種々のセラミッ
ク電子部品の製造方法にも適用することが可能であり、
その場合にも同様の効果を得ることが可能である。特に
内部電極として、ニッケルや銅などの卑金属を用いるも
のに適用して有効である。In the above embodiment, the method of manufacturing a multilayer ceramic capacitor has been described by way of example. However, the present invention is not limited to the method of manufacturing a multilayer ceramic capacitor. It is also possible to apply to the manufacturing method of various ceramic electronic components having a structure in which the electrodes are embedded,
In that case, the same effect can be obtained. In particular, the present invention is effective when applied to an internal electrode using a base metal such as nickel or copper.
【0026】[0026]
【発明の効果】上述のように、この発明のセラミック電
子部品の製造方法は、焼成した後のセラミック素体を、
再酸化用の回転可能な容器に入れ、該容器を回転させ
て、内部のセラミック素体を転動させながら、酸化雰囲
気中で、処理温度600〜900℃、処理時間30分以
上の条件下に、セラミック素体の再酸化を行うようにし
ており、セラミック素体が酸化雰囲気中で、回転する容
器中を転動しながら再酸化処理が行われるため、セラミ
ック素体と酸化雰囲気とを確実に接触させることが 可能
になり、十分な再酸化を行うことができるようになる。As described above, according to the method for manufacturing a ceramic electronic component of the present invention, the fired ceramic body is
Placed in a rotatable vessel for reoxidation, rotating the container
Te, while rolling the interior of the ceramic body, in an oxidizing atmosphere, treatment temperature 600 to 900 ° C., under the conditions of further processing time of 30 minutes, to perform the re-oxidation of the ceramic body
And which, in the ceramic body is oxidizing atmosphere, for re-oxidation process is performed while rolling the container to be rotated, it can be surely contacted with an oxidizing atmosphere between the ceramic element
Now, it made a sufficient re-oxidation to be able to line Ukoto.
【0027】したがって、この発明を適用することによ
り、特に高温での絶縁抵抗が高く、直流バイアス印加時
の容量の低下の割合が小さいセラミック電子部品を得る
ことが可能になり、製品の品質向上に寄与することがで
きる。Therefore, by applying the present invention,
In particular, it is possible to obtain a ceramic electronic component having a high insulation resistance particularly at a high temperature and a small rate of decrease in capacitance when a DC bias is applied, which can contribute to improvement in product quality.
【図1】この発明のセラミック電子部品の製造方法の再
酸化工程において用いられる装置の一実施例を示す図で
あり、(a)は斜視図、(b)は側面図である。FIG. 1 is a view showing an embodiment of an apparatus used in a reoxidation step of the method for manufacturing a ceramic electronic component of the present invention, wherein (a) is a perspective view and (b) is a side view.
【図2】図1の装置の正面断面図であるFIG. 2 is a front sectional view of the apparatus of FIG. 1;
1 容器(回転容器) 2 穴 3 セラミック素体 DESCRIPTION OF SYMBOLS 1 Container (rotary container) 2 Holes 3 Ceramic body
Claims (1)
を有するセラミック素体を焼成した後、これを再酸化す
る工程を含むセラミック電子部品の製造方法において、焼成した後のセラミック素体を、再酸化用の回転可能な
容器に入れ、 前記容器を回転させて、内部のセラミック素体を転動さ
せながら、 酸化雰囲気中で、処理温度600〜900
℃、処理時間30分以上の条件下に、セラミック素体の
再酸化を行うことを特徴とするセラミック電子部品の製
造方法。1. A method for manufacturing a ceramic electronic component comprising the steps of firing a ceramic body having a structure in which an internal electrode is embedded in a ceramic and then reoxidizing the fired ceramic body. Rotatable for re-oxidation
Put in a container and rotate the container to roll the ceramic body inside.
In an oxidizing atmosphere at a processing temperature of 600 to 900
℃, the treatment time is 30 minutes or more , the ceramic body
A method for manufacturing a ceramic electronic component, comprising performing re-oxidation .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5340138A JP3057991B2 (en) | 1993-12-06 | 1993-12-06 | Manufacturing method of ceramic electronic components |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5340138A JP3057991B2 (en) | 1993-12-06 | 1993-12-06 | Manufacturing method of ceramic electronic components |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07161571A JPH07161571A (en) | 1995-06-23 |
JP3057991B2 true JP3057991B2 (en) | 2000-07-04 |
Family
ID=18334095
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5340138A Expired - Lifetime JP3057991B2 (en) | 1993-12-06 | 1993-12-06 | Manufacturing method of ceramic electronic components |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3057991B2 (en) |
-
1993
- 1993-12-06 JP JP5340138A patent/JP3057991B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH07161571A (en) | 1995-06-23 |
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