JP2938227B2 - Polyamic acid resin - Google Patents
Polyamic acid resinInfo
- Publication number
- JP2938227B2 JP2938227B2 JP3176290A JP17629091A JP2938227B2 JP 2938227 B2 JP2938227 B2 JP 2938227B2 JP 3176290 A JP3176290 A JP 3176290A JP 17629091 A JP17629091 A JP 17629091A JP 2938227 B2 JP2938227 B2 JP 2938227B2
- Authority
- JP
- Japan
- Prior art keywords
- mol
- component
- polyamic acid
- dianhydride
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、特にフレキシブルプリ
ント基板に適したポリアミック酸樹脂に関するものであ
り、さらに詳しくは、2種または3種の芳香族テトラカ
ルボン酸二無水物と3種以上の芳香族ジアミン成分とを
反応させたフレキシブルプリント基板用ポリアミック酸
樹脂に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polyamic acid resin particularly suitable for a flexible printed circuit board, and more particularly to two or three aromatic tetracarboxylic dianhydrides and three or more aromatic tetracarboxylic dianhydrides. and the family diamine component
Polyamic acid flexible printed board was reacted
It is about resin .
【0002】[0002]
【従来の技術】ポリイミドは高耐熱性ポリマーとして広
く知られているが、その分子骨格が剛直なために成形性
に欠点があった。また、近年の電子、電気工業の発展に
伴い、通信用、民生用機器の実装方式は、軽量で立体的
に実装できるフレキシブルプリント回路基板が広く使用
されている。このフレキシブルプリント回路基板には現
在広くポリイミドフィルムが使用されている。この場
合、ポリイミドフィルムに要求される性能として耐熱
性、金属箔との接着力、金属箔との熱膨張係数の一致、
電気絶縁性などがある。これまでに種々のポリイミドが
開発されているが、耐熱性に優れるものは金属との接着
力が劣り、一方接着力に優れるものは、熱膨張係数が金
属箔と比べると大きく、基板にロールを生じるなどの欠
点があった。2. Description of the Related Art Polyimide is widely known as a high heat-resistant polymer, but has a drawback in moldability due to its rigid molecular skeleton. Further, with the recent development of the electronics and electric industries, a flexible printed circuit board that can be mounted three-dimensionally is widely used as a mounting method for communication and consumer devices. Currently, a polyimide film is widely used for the flexible printed circuit board. In this case, the performance required for the polyimide film, such as heat resistance, adhesive strength with the metal foil, coincidence of the coefficient of thermal expansion with the metal foil,
There is electrical insulation. Various polyimides have been developed so far, but those with excellent heat resistance have poor adhesion to metal, while those with excellent adhesion have a larger coefficient of thermal expansion than metal foil, There were drawbacks such as occurrence.
【0003】[0003]
【発明が解決しようとする課題】本発明は、耐熱性、金
属箔との接着力に優れ、さらに熱膨張係数の値が金属箔
の値に近いポリイミド樹脂を得ようとして研究した結果
得られたものである。DISCLOSURE OF THE INVENTION The present invention was obtained as a result of a study aimed at obtaining a polyimide resin having excellent heat resistance and adhesion to a metal foil and having a coefficient of thermal expansion close to that of the metal foil. Things.
【0004】[0004]
【課題を解決するための手段】本発明は、3,3’,
4,4’−ビフェニルテトラカルボン酸二無水物(以下
BPDAと略す)を必須成分とし、3,3’,4,4’
−ベンゾフェノンテトラカルボン酸二無水物(以下BT
DAと略す)および/またはビス(3,4−ジカルボキ
シフェニル)エーテル二無水物(以下ODPAと略す)
を0〜50モル%含むカルボン酸二無水物成分、並びに
p−フェニレンジアミン(以下PPDと略す)を20〜
60モル%を含む一般式(I)SUMMARY OF THE INVENTION The present invention provides a method for producing a 3,3 ',
4,4'-biphenyltetracarboxylic dianhydride (hereinafter abbreviated as BPDA) as an essential component, and 3,3 ', 4,4'
-Benzophenonetetracarboxylic dianhydride (hereinafter BT)
DA) and / or bis (3,4-dicarboxyphenyl) ether dianhydride (hereinafter abbreviated as ODPA)
A carboxylic acid dianhydride component containing 0 to 50 mol% , and
p-phenylenediamine (hereinafter abbreviated as PPD)
General formula (I) containing 60 mol%
【0005】[0005]
【化2】 Embedded image
【0006】で表される芳香族ジアミンと、1,3−ビ
ス(3−アミノフェノキシ)ベンゼン(以下APBと略
す)とのモル比が70:30〜90:10である芳香族
ジアミン成分を、酸成分とジアミン成分とのモル比が
0.9〜1.1で反応させたポリアミック酸樹脂に関す
るものである。An aromatic diamine component having a molar ratio of an aromatic diamine represented by the following formula and 1,3-bis (3-aminophenoxy) benzene (hereinafter abbreviated as APB) of 70:30 to 90:10 is The present invention relates to a polyamic acid resin reacted at a molar ratio of an acid component to a diamine component of 0.9 to 1.1.
【0007】[0007]
【作用】本発明において用いられるポリアミック酸溶液
は、N−メチル−2−ピロリドン、(以下NMPと略
す)、ジメチルアセトアミド、ジメチルホルムアミド、
クレゾール等の溶媒中で、芳香族カルボン酸二無水物成
分と芳香族ジアミン成分とを攪拌することにより得るこ
とができる。芳香族カルボン酸二無水物成分と芳香族ジ
アミン成分のモル比は、0.90〜1.10が好まし
く、さらに好ましくは0.97〜0.99である。酸成
分とアミン成分のモル比が上述の範囲を外れると、生成
するポリイミドの分子量が小さくなり、生成物の物性が
低下する。特に耐熱性を考慮する場合は、ジアミン成分
過剰で反応する方が望ましい。The polyamic acid solution used in the present invention comprises N-methyl-2-pyrrolidone, (hereinafter abbreviated as NMP), dimethylacetamide, dimethylformamide,
It can be obtained by stirring an aromatic carboxylic dianhydride component and an aromatic diamine component in a solvent such as cresol. The molar ratio of the aromatic carboxylic dianhydride component to the aromatic diamine component is preferably from 0.90 to 1.10, and more preferably from 0.97 to 0.99. If the molar ratio between the acid component and the amine component is outside the above range, the molecular weight of the resulting polyimide will be small, and the physical properties of the product will be reduced. In particular, when heat resistance is taken into consideration, it is desirable to react with an excess of the diamine component.
【0008】本発明のポリアミック酸中で用いられる酸
成分としては、BPDA、BTDA、ODPAなどがあ
る。BPDAのモル含量は、酸成分中の50モル%以上
が好ましく、特に好ましくは70〜80モル%である。
BTDAとODPAのモル比は、100:0〜0:10
0の範囲で任意に使用することができるが、90:10
〜50:50が好ましく、特に好ましくは80:20〜
70:30である。BPDAを必須成分として合成され
る樹脂は、BTDA、ODPAと共重合体にすることに
より、接着性をさらに向上させることができる。The acid component used in the polyamic acid of the present invention includes BPDA, BTDA, ODPA and the like. The molar content of BPDA is preferably at least 50 mol% in the acid component, particularly preferably 70 to 80 mol%.
The molar ratio between BTDA and ODPA is from 100: 0 to 0:10
Although it can be used arbitrarily in the range of 0, 90:10
~ 50: 50 is preferred, particularly preferably 80: 20 ~
70:30. The resin synthesized using BPDA as an essential component can further improve the adhesiveness by forming a copolymer with BTDA and ODPA.
【0009】一般式(I)で表される芳香族ジアミンと
しては、p−フェニレンジアミン、m−フェニレンジア
ミン(以下MPDと略す)、2,4−トリレンジアミン
(以下2,4−TDAと略す)、1,4−ジメチル−
2,5−ジアミノベンゼン(以下25PDXと略す)な
どがある。一般式(I)で表される芳香族ジアミンとA
PBのモル比は、70:30〜90:10である。AP
Bをこの範囲で添加することにより、接着力を向上させ
ることができる。APBの添加量が30モル%を起える
と接着力は向上するが、耐熱性が低下し、また熱膨張係
数も大きくなる。一般式(I)で表される芳香族ジアミ
ンのうち、p−フェニレンジアミンの添加量はジアミン
成分全量の20〜60モル%であり、好ましくは30〜
60モル%である。PPD添加量の増加とともにポリイ
ミドフィルムの耐熱性は向上し、熱膨張係数の値は小さ
くなる。一方、接着力は低下する。The aromatic diamine represented by the general formula (I) includes p-phenylenediamine, m-phenylenediamine (hereinafter abbreviated as MPD), and 2,4-tolylenediamine (hereinafter abbreviated as 2,4-TDA). ), 1,4-dimethyl-
2,5-diaminobenzene (hereinafter abbreviated as 25PDX) and the like. Aromatic diamine represented by general formula (I) and A
The molar ratio of PB is 70: 30 to 90: 10. AP
By adding B in this range, the adhesive strength can be improved. When the addition amount of APB is 30 mol%, the adhesive strength is improved, but the heat resistance is reduced and the coefficient of thermal expansion is increased. Among the aromatic diamines represented by the general formula (I), the amount of p-phenylenediamine to be added is 20 to 60 % by mole of the total amount of the diamine components , preferably 30 to 60 %.
60 mol%. As the amount of PPD increases, the heat resistance of the polyimide film increases, and the value of the coefficient of thermal expansion decreases. On the other hand, the adhesive strength decreases.
【0010】本発明のボリアミック酸樹脂は、銅箔、ア
ルミニウム箔等の金属箔へ塗布し、これを乾燥硬化させ
ることによりプリント回路基板を得ることができる。ま
た、ガラスクロス等の基板に含浸してプリプレグとする
ことも可能である。これら基材に塗布した樹脂の乾燥温
度は、通常80〜380℃であり、この温度範囲で10
〜180分間加熱することによってプリント回路基板を
得ることが出来る。A printed circuit board can be obtained by applying the boramic acid resin of the present invention to a metal foil such as a copper foil or an aluminum foil and drying and curing the metal foil. Further, it is also possible to impregnate a substrate such as a glass cloth into a prepreg. The drying temperature of the resin applied to these substrates is usually 80 to 380 ° C.
A printed circuit board can be obtained by heating for up to 180 minutes.
【0011】本発明のポリアミック酸樹脂は、金属とポ
リイミド等のプラスチックの接着に用いることもでき、
また、金属同志、プラスチック同志の接着にも優れてい
る。また、耐熱性に優れていることから、接着層を持た
ないポリイミドと金属箔とから構成される2層のフレキ
シブルプリント回路基板のポリイミド側同志を貼合わせ
ることにより、その両面板を得ることも出来る。さらに
銅箔同志を貼合わせることによっても両面フレキシブル
プリント回路基板を得ることが出来る。また、高耐熱性
のフィルムカバーコート用の接着剤としても用いること
が出来る。The polyamic acid resin of the present invention can be used for bonding metal and plastic such as polyimide.
It is also excellent in bonding metal and plastic. In addition, since it is excellent in heat resistance, a double-sided board can be obtained by laminating two polyimide layers of a flexible printed circuit board composed of a polyimide having no adhesive layer and a metal foil. . Further, a double-sided flexible printed circuit board can be obtained by bonding together copper foils. It can also be used as an adhesive for a high heat resistant film cover coat.
【0012】[0012]
(実施例1)攪拌機、温度計、窒素導入管、還流冷却管
を備えた4ツ口ラスコヘジアミン成分として、PPD
3.24g(0.03モル)、25DPX8.17g
(0.06モル)、APB2.94g(0.01モル)
を加え、NMPを100g添加し、窒素気流下、室温で
充分に攪拌し、ジアミン成分を溶解した。次いで、BP
DA20.18g(0.07モル)、BTDA9.47
g(0.03モル)を徐々に添加し、NMPを75g加
え、室温で4時間攪拌した。ここへエタノール75gを
加え、さらに1時間攪拌した。得られた溶液の還元粘度
(樹脂0.5gを100mlのNMPへ溶解し、30℃
の恒温槽中で測定)は0.5であり、樹脂含量は15重
量%であった。この樹脂溶液を乾燥後の厚みが25μm
になる様に厚さ35μmの銅箔上へ塗布し、100℃/
1時間、350℃/1時間乾燥し、フレキシブル基板を
得た。(Example 1) PPD was used as a four-necked lascohediamine component equipped with a stirrer, a thermometer, a nitrogen inlet tube, and a reflux condenser tube
3.24 g (0.03 mol), 25 DPX 8.17 g
(0.06 mol), 2.94 g (0.01 mol) of APB
Was added, and 100 g of NMP was added, and the mixture was sufficiently stirred at room temperature under a nitrogen stream to dissolve the diamine component. Next, BP
20.18 g (0.07 mol) of DA, 9.47 BTDA
g (0.03 mol) was gradually added, and 75 g of NMP was added, followed by stirring at room temperature for 4 hours. 75 g of ethanol was added thereto, and the mixture was further stirred for 1 hour. Reduced viscosity of the resulting solution (0.5 g of resin dissolved in 100 ml of NMP, 30 ° C
Was measured in a thermostat) and the resin content was 15% by weight. This resin solution has a thickness of 25 μm after drying.
Is applied on a copper foil of 35 μm thickness so that
After drying at 350 ° C. for 1 hour for 1 hour, a flexible substrate was obtained.
【0013】(実施例2)ジアミン成分として、PPD
5.41g(0.05モル)、MPD4.33g(0.
04モル)、APB2.92g(0.01モル)、酸成
分として、BPDA20.18g(0.07モル)、O
DPA9.12g(0.03モル)を用い、実施例1と
同様の装置および方法でフレキシブル基板を得た。Example 2 As a diamine component, PPD was used.
5.31 g (0.05 mol), 4.33 g of MPD (0.3%).
04 mol), 2.92 g (0.01 mol) of APB, 20.18 g (0.07 mol) of BPDA as an acid component, O
Using 9.12 g (0.03 mol) of DPA, a flexible substrate was obtained by the same apparatus and method as in Example 1.
【0014】[0014]
【0015】(比較例1)ジアミン成分として、25D
PX6.81g(0.05モル)、APB14.62g
(0.05モル)、酸成分として、BPDA20.18
g(0.07モル)、BTDA9.47g(0.03モ
ル)を用い、実施例1と同様の装置および方法でフレキ
シブル基板を得た。Comparative Example 1 As a diamine component, 25D
6.81 g (0.05 mol) of PX, 14.62 g of APB
(0.05 mol), BPDA 20.18 as an acid component
g (0.07 mol) and 9.47 g (0.03 mol) of BTDA, a flexible substrate was obtained by the same apparatus and method as in Example 1.
【0016】(比較例2)ジアミン成分として、PPD
7.57g(0.07モル)、24TDA3.67g
(0.03モル)、酸成分として、BTDA22.56
g(0.07モル)、ODPA9.12g(0.03モ
ル)を用い、実施例1と同様の装置および方法でフレキ
シブル基板を得た。Comparative Example 2 PPD was used as a diamine component.
7.57 g (0.07 mol), 3.67 g of 24TDA
(0.03 mol), BTDA22.56 as an acid component
g (0.07 mol) and 9.12 g (0.03 mol) of ODPA, a flexible substrate was obtained by the same apparatus and method as in Example 1.
【0017】以上、実施例1、2及び比較例1、2で得
られたフレキシブル基板及びそのフィルムを評価した結
果を表1に示す。実施例の樹脂を用いたフレキシブル基
板は比較例と比べ、ピール強度、熱膨張係数にバランス
のとれた優れた値を示した。[0017] While the embodiment 1, 2 及 Beauty Comparative Example results obtained were evaluated flexible substrate and the film at 1 and 2 are shown in Table 1. The flexible substrate using the resin of the example exhibited excellent values balanced with the peel strength and the coefficient of thermal expansion as compared with the comparative example.
【0018】[0018]
【表1】 [Table 1]
【0019】[0019]
【発明の効果】本発明により得られたポリイミド樹脂
は、耐熱性、金属箔との接着性に優れ、さらに熱膨張係
数の値が金属箔に近いものである。これを用いることに
より、従来のポリイミド樹脂に比べ、接着性、寸法安定
性、耐熱性に優れたフレキシブル基板を得ることができ
る。また、プリプレグ含浸用樹脂やフィルムカバーコー
ト用接着剤としても有用である。The polyimide resin obtained according to the present invention is excellent in heat resistance and adhesiveness to a metal foil, and has a coefficient of thermal expansion close to that of a metal foil. By using this, a flexible substrate excellent in adhesiveness, dimensional stability and heat resistance can be obtained as compared with a conventional polyimide resin. It is also useful as a prepreg impregnating resin or a film cover coat adhesive.
Claims (1)
カルボン酸二無水物を必須成分とし、3,3’,4,
4’−ベンゾフェノンテトラカルボン酸二無水物および
/またはビス(3,4−ジカルボキシフェニル)エーテ
ル二無水物0〜50モル%含むカルボン酸二無水物成
分、並びにp−フェニレンジアミンを20〜60モル%
を含む一般式(I) 【化1】 で表される芳香族ジアミンと、1,3−ビス(3−アミ
ノフェノキシ)ベンゼンとのモル比が70:30〜9
0:10である芳香族ジアミン成分を、酸成分とジアミ
ン成分とのモル比が0.9〜1.1で反応させたポリア
ミック酸樹脂。1. A method comprising: 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride as an essential component;
20 to 60 mol of a carboxylic acid dianhydride component containing 0 to 50 mol% of 4'-benzophenone tetracarboxylic dianhydride and / or bis (3,4-dicarboxyphenyl) ether dianhydride , and p-phenylenediamine %
General formula (I) containing The molar ratio of the aromatic diamine represented by the formula : 1,3-bis (3-aminophenoxy) benzene is 70:30 to 9
A polyamic acid resin obtained by reacting an aromatic diamine component having a ratio of 0:10 with a molar ratio of an acid component to a diamine component of 0.9 to 1.1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3176290A JP2938227B2 (en) | 1991-04-17 | 1991-04-17 | Polyamic acid resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3176290A JP2938227B2 (en) | 1991-04-17 | 1991-04-17 | Polyamic acid resin |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04318025A JPH04318025A (en) | 1992-11-09 |
JP2938227B2 true JP2938227B2 (en) | 1999-08-23 |
Family
ID=16011004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3176290A Expired - Lifetime JP2938227B2 (en) | 1991-04-17 | 1991-04-17 | Polyamic acid resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2938227B2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0598911B1 (en) * | 1992-06-04 | 1998-05-20 | Sumitomo Bakelite Company Limited | Film adhesive and production thereof |
DE19604774A1 (en) * | 1996-02-09 | 1997-08-14 | Siemens Ag | Plastics carrier with an induction coil |
JP5499555B2 (en) * | 2009-07-31 | 2014-05-21 | 宇部興産株式会社 | Polyimide film and method for producing polyimide film |
WO2011035920A1 (en) * | 2009-09-24 | 2011-03-31 | Corus Technology Bv | A method of preparing a polyetherimide coating on a metallic substrate |
CN106795284B (en) * | 2014-09-30 | 2020-05-05 | 索马龙株式会社 | Polyimide copolymer and molded body using same |
-
1991
- 1991-04-17 JP JP3176290A patent/JP2938227B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH04318025A (en) | 1992-11-09 |
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Legal Events
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LAPS | Cancellation because of no payment of annual fees |