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JP2925795B2 - Method of manufacturing magneto-optical disk - Google Patents

Method of manufacturing magneto-optical disk

Info

Publication number
JP2925795B2
JP2925795B2 JP20811391A JP20811391A JP2925795B2 JP 2925795 B2 JP2925795 B2 JP 2925795B2 JP 20811391 A JP20811391 A JP 20811391A JP 20811391 A JP20811391 A JP 20811391A JP 2925795 B2 JP2925795 B2 JP 2925795B2
Authority
JP
Japan
Prior art keywords
film
optical disk
magneto
magnetic
protective film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP20811391A
Other languages
Japanese (ja)
Other versions
JPH0676377A (en
Inventor
賢一 石塚
直樹 大村
伸一 勝田
順志 川崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Home Electronics Ltd
Original Assignee
NEC Home Electronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Home Electronics Ltd filed Critical NEC Home Electronics Ltd
Priority to JP20811391A priority Critical patent/JP2925795B2/en
Publication of JPH0676377A publication Critical patent/JPH0676377A/en
Application granted granted Critical
Publication of JP2925795B2 publication Critical patent/JP2925795B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は光磁気ディスクの製造法
に関し、特に磁界感度および耐環境信頼性の向上技術に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a magneto-optical disk, and more particularly to a technique for improving magnetic field sensitivity and environmental resistance.

【0002】[0002]

【従来の技術】従来、光磁気ディスクは図7〜8に示す
ように、ガラス基板及びポリカーボネート,ポリメチル
メタクリレート等の透明プラスチック基板1上にSi
N,Si34,AlN,Al23,Y23,SiO2
ZnS等からなる保護膜2(以下、下地保護膜と称
す)、TbFe,TbFeCo等の希土類−遷移金属の
アモルファス合金からなる磁性膜3、SiN,Si
34,AlN,Al23,Y23,SiO2,ZnS等
からなる保護膜2(以下、上地保護膜と称す)、Al,
Au,Ag等の反射率の高い材料からなる反射膜とがス
パッタリング或いは真空蒸着などにより成膜され、この
成膜面を紫外線硬化型樹脂等を用いてスピンコート又は
スクリーン印刷等をもって樹脂コート5により被覆して
いる。
2. Description of the Related Art Conventionally, as shown in FIGS. 7 and 8, a magneto-optical disk is formed on a glass substrate and a transparent plastic substrate 1 such as polycarbonate or polymethyl methacrylate.
N, Si 3 N 4 , AlN, Al 2 O 3 , Y 2 O 3 , SiO 2 ,
A protective film 2 made of ZnS or the like (hereinafter referred to as a base protective film), a magnetic film 3 made of an amorphous alloy of a rare earth-transition metal such as TbFe or TbFeCo, SiN, Si
3 N 4, AlN, Al 2 O 3, Y 2 O 3, SiO 2, a protective film made of ZnS or the like 2 (hereinafter, referred to as upper base protective film), Al,
A reflective film made of a material having a high reflectivity such as Au or Ag is formed by sputtering or vacuum vapor deposition, and the film-formed surface is spin-coated using an ultraviolet-curable resin or the like by resin coating 5 by screen printing or the like. Coated .

【0003】[0003]

【発明が解決しようとする課題】光磁気ディスクに要求
される性能のひとつに長期にわたる耐環境信頼性があ
る。
One of the performance requirements for a magneto-optical disk is long-term environmental reliability.

【0004】光磁気ディスクは、外部環境によって、そ
の性能が劣化する。主なものとして、レーザ光のパワー
に対する記録感度が変化し、これに伴って搬送波対雑音
比(以下、CNRと称す)が低下する。
[0004] The performance of a magneto-optical disk is degraded by the external environment. Mainly, the recording sensitivity with respect to the power of the laser beam changes, and accordingly, the carrier-to-noise ratio (hereinafter, referred to as CNR) decreases.

【0005】光磁気ディスクに要求されるもうひとつの
性能として、データ書き込み時の磁界感度がある。
Another performance required of a magneto-optical disk is a magnetic field sensitivity at the time of data writing.

【0006】磁界感度とは外部磁界強度に対する光磁気
ディスク(磁性膜)の書き込み(磁化反転)の度合いを
示すもので、磁界感度の良いものほど小さな磁界で良好
な書き込みが可能であることを意味する。
The magnetic field sensitivity indicates the degree of writing (magnetization reversal) of the magneto-optical disk (magnetic film) with respect to the intensity of the external magnetic field. The higher the magnetic field sensitivity, the better the writing is possible with a small magnetic field. I do.

【0007】磁界感度を向上する一方法として、磁性膜
3を構成する物質の組成比を変化させる方法が考えられ
るが、この方法では、磁性膜材料の交換が必要になった
り、その他の特性(記録感度などの動特性やカー回転角
などの静特性)も変化し当初の記録再生特性を維持でき
なくなる可能性があるなどの問題が生じる。
As one method of improving the magnetic field sensitivity, a method of changing the composition ratio of the material constituting the magnetic film 3 is considered. In this method, it is necessary to replace the material of the magnetic film or to change other characteristics ( The dynamic characteristics such as the recording sensitivity and the static characteristics such as the Kerr rotation angle also change, and there is a problem that the original recording / reproducing characteristics may not be maintained.

【0008】それ故に、本発明の目的は磁性膜の組成を
変更することなく磁界感度を向上させ、且つ長期にわた
る耐環境信頼性の向上を果たすことのできる光磁気ディ
スクの製造方法を提供することにある。
Therefore, an object of the present invention is to provide a method of manufacturing a magneto-optical disk capable of improving the magnetic field sensitivity without changing the composition of the magnetic film and improving the environmental resistance for a long time. It is in.

【0009】[0009]

【課題を解決するための手段】従って本発明は上述の目
的を達成するために、円盤状の基仮に保護膜,次に磁性
膜を成膜する光磁気ディスクの製造方法において、前記
磁性膜の成膜前に予め前記保護膜の表面に紫外線照射し
ものである。また、この紫外線照射の単位面積当たり
の積算時間を3mW・Hr/cm 2 以下としたものであ
る。
SUMMARY OF THE INVENTION Therefore, in order to achieve the above-mentioned object, the present invention provides a method for manufacturing a magneto-optical disk in which a disk-shaped protective film is formed and then a magnetic film is formed. Before film formation, the surface of the protective film is irradiated with ultraviolet rays in advance.
It is a thing. In addition, per unit area of this UV irradiation
Is 3 mW · Hr / cm 2 or less.
You.

【0010】さらに、本発明は、前記磁性膜の表面にさ
らに上地保護膜を成膜すること、或いは前記磁性膜の表
面にさらに上地保護膜,反射膜の順で成膜すること、或
いは前記磁性膜の表面にさらに上地保護膜,反射膜の順
で成膜し、さらに反射膜の表面を保護樹脂にて被覆する
こと等を、他の特徴とするものである。
Further, the present invention provides a method for manufacturing a magnetic recording medium , comprising the steps of:
In addition, an upper protective film is formed, or the surface of the magnetic film is formed.
Forming an upper protective film and a reflective film in this order on the surface, or
Or an upper protective film and a reflective film on the surface of the magnetic film.
And then coat the surface of the reflective film with a protective resin
This is another feature.

【0011】[0011]

【作用】本発明によれば、下地保護膜表面に紫外線照射
することにより、磁界感度を向上させ、且つ耐環境信頼
性を向上している。
According to the present invention, the surface of the underlying protective film is irradiated with ultraviolet rays.
By improving the magnetic field sensitivity and environmental resistance
Is improving.

【0012】紫外線照射の単位面積当たりの積算時間
は、3mW・Hr/cm 2 以下が好ましい。
[0012] Integrated time per unit area of ultraviolet irradiation
Is preferably 3 mW · Hr / cm 2 or less.

【0013】上記方法によれば、磁性膜の組成などを変
更することがないので、前記間題点を解決している。
According to the above method, the above-mentioned problem is solved because the composition of the magnetic film is not changed.

【0014】[0014]

【実施例】以下、本発明の実施例を、図1〜図4に示す
参考例を踏まえ図5,6を参照して説明する。図1は、
直接は本発明とは関係ないが、磁界感度の向上に役立つ
光磁気ディスクの製造方法の一例を示すフローチャー
ト、図2は、図1に係わる記録レーザパワーの変化を示
す図、図3は、図1に係わる搬送波対雑音比(CNR)
の変化を示す図、図4は、図1に係わる記録時のBia
s磁界強度に対する搬送波の再生レベルの変化を示す図
である。図5は、本発明の製造方法の一実施例を示すフ
ローチャート、図6は、図5に係わる記録時のBias
磁界強度に対する搬送波の再生レベルの変化を示す図で
ある。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS.
This will be described with reference to FIGS. FIG.
Not directly related to the present invention, but helps to improve magnetic field sensitivity
Flowchart showing an example of a method for manufacturing a magneto-optical disk
FIG. 2 shows a change in the recording laser power according to FIG.
FIG. 3 shows the carrier-to-noise ratio (CNR) according to FIG.
FIG. 4 is a diagram showing a change in Bia during recording according to FIG.
A diagram showing a change in a reproduction level of a carrier with respect to an s magnetic field intensity.
It is. FIG. 5 is a flowchart showing one embodiment of the manufacturing method of the present invention.
FIG. 6 is a chart showing the bias at the time of recording according to FIG.
FIG. 7 is a diagram showing a change in a carrier reproduction level with respect to a magnetic field strength.
is there.

【0015】図1は反射膜を有する光磁気ディスクの成
膜プロセスの一例を順を追って示したものであり、下
保護膜を成膜後、この下地保護膜の表面をスパッタエッ
チングするプロセスを追加した点に特徴がある。下地保
護膜に対するスパッタエッチング処理により得られる耐
環境信頼性の向上について、図2及び図3に示す。
[0015] Figure 1 is all SANYO which sequentially show an example of a process for forming the magneto-optical disk having a reflective film, after forming the lower ground protective film, sputter etching the surface of the underlying protective film processes There is a feature in that is added . Shimoho
FIGS. 2 and 3 show the improvement in environmental resistance obtained by sputter etching of the protective film.

【0016】図2では、横軸に温度70℃相対湿度90
%の環境下における放置時間、縦軸には最適な記録レー
ザパワーの初期値に対する比を示した。どちらも100
時間までは、記録感度の上昇が認められるが、下地保護
膜のスパッタエッチングを行なった光磁気ディスクは、
その変化が小さく又100時間以降はほとんど変化しな
くなる。これに対し従来の光磁気ディスクでは初期の記
録感度の上昇が大きく、更に100時間以降も上昇が認
められる。
In FIG. 2, the horizontal axis represents a temperature of 70 ° C. and a relative humidity of 90.
%, And the vertical axis shows the ratio of the optimum recording laser power to the initial value. Both are 100
Until the time, but increasing the recording sensitivity is observed, a magneto-optical disk was subjected to sputter etching of the lower fabric protective film,
The change is small and hardly changes after 100 hours. On the other hand, in the case of the conventional magneto-optical disk, the initial recording sensitivity greatly increases, and further increases after 100 hours.

【0017】図3では、横軸に温度70℃相対湿度90
%環境下における放置時間、縦軸に搬送波対雑音比(C
NR)を示した。従来の光磁気ディスクのCNRは時間
と共に低下していくのに対し、下地保護膜のスパッタエ
ッチングを行なった光磁気ディスクではCNRの低下は
僅かである。
In FIG. 3, the horizontal axis represents a temperature of 70.degree.
%, The vertical axis represents the carrier-to-noise ratio (C
NR). CNR of conventional magneto-optical disk against to decreases over time, decrease in CNR is slight in the magneto-optical disk was subjected to sputter etching of the lower fabric protective film.

【0018】続いて図4に、磁界感度の向上について記
録時のBias磁界強度に対する搬送波(以下、Cと称
す)の再生レベルで表した。ここに示したサンプルは、
下地保護膜スパッタエッチングなしと38W・Hr/m
2の二種類である。図からスパッタエッチングなしに比
べてスパッタエッチングありの方が低いBias磁界強
度の時からキャリアが立ち上がっており、磁界感度が向
上していることが分かる。
Next, FIG. 4 shows the improvement of the magnetic field sensitivity in terms of the reproduction level of a carrier (hereinafter, referred to as C) with respect to the Bias magnetic field strength at the time of recording. The sample shown here is
38W · Hr / m without underlayer protective film sputter etching
Is a 2 of two kinds. From the figure, it can be seen that the carrier rises when the bias magnetic field intensity is lower in the case with sputter etching than in the case without sputter etching, and the magnetic field sensitivity is improved.

【0019】このように、光磁気ディスクの製造工程に
おいて、下地保護膜にスパッタエッチング処理を施すこ
とで、記録感度変化の抑制と磁界感度の向上を図ること
ができるが、スパッタエッチング処理と同じく磁界感度
の向上が期待できる方法として、下地保護膜に対する紫
外線照射法があり、この紫外線照射法に本発明の主要
特徴がある。
Thus, in the manufacturing process of the magneto-optical disk,
Before applying sputter etching to the underlayer protective film.
To suppress the change in recording sensitivity and improve the magnetic field sensitivity
But the magnetic field sensitivity is the same as in sputter etching.
As a method that can be expected to improve the
There are external irradiation, the main of the present invention in the ultraviolet irradiation method
There are features.

【0020】図5は、上記下地保護膜に対する紫外線照
射法について、反射膜を有する光磁気ディスクの成膜プ
ロセスを順を追って示したものである。図7に示す従来
のプロセスに対して、本発明は下地保護膜を成膜後、下
地保護膜の表面に紫外線(UV)照射するプロセスを追
加した。
FIG. 5 is a schematic diagram showing an ultraviolet ray irradiation on the underlayer protective film.
In the projection method, a film forming process of a magneto-optical disk having a reflective film is shown in order. In addition to the conventional process shown in FIG. 7, the present invention adds a process of irradiating the surface of the underlying protective film with ultraviolet light (UV) after forming the underlying protective film.

【0021】この結果得られる磁界感度の向上について
図6に示す。図に示したサンプルは下地保護膜のUV照
射なしと、2.2mW・Hr/cm2のUV照射ありと
の2種類である。図からUV照射なしに比べてUV照射
ありの方が搬送波(C)の立ち上がりの勾配が急であ
り、磁界感度が向上していることが分かる。
FIG. 6 shows the resulting improvement in magnetic field sensitivity. The samples shown in the figure are of two types, that is, no UV irradiation of the underlying protective film and a UV irradiation of 2.2 mW · Hr / cm 2 . From the figure, it can be seen that the rising gradient of the carrier wave (C) is steeper with UV irradiation than with no UV irradiation, and the magnetic field sensitivity is improved.

【0022】[0022]

【発明の効果】以上説明したように本発明の光磁気デ
ィスクの製造法によれば、下地保護膜を成膜後、下地保
護膜の表面に紫外線を照射するようにしたから、紫外線
照射によって搬送波の立ち上がり勾配が急峻になり、そ
れだけ磁界感度が向上し、小さな磁界で良好な書き込み
が可能であり、従来の磁性膜を構成する物質の組成比を
変化させる方法のように、磁性膜材料の交換が必要にな
ったり、その他の特性例えば記録感度などの動特性やカ
ー回転角などの静特性が変化してしまい、当初の記録再
生特性を維持できなくなるといったことはなく、長期に
わたる耐環境信頼性の向上を図ることができる等の優れ
た効果を奏する
As described above, according to the method of manufacturing a magneto-optical disk of the present invention, after forming the undercoat protection film , the undercoat protection film is formed.
Since the surface of the protective film is irradiated with ultraviolet rays,
Irradiation sharpens the rising slope of the carrier wave,
As a result, the magnetic field sensitivity is improved, and good writing is possible with a small magnetic field.
It is possible to adjust the composition ratio of the materials constituting the conventional magnetic film.
It is necessary to change the magnetic film material as in the method of changing
Or other characteristics, such as dynamic characteristics such as recording sensitivity and power.
-Static characteristics such as the rotation angle have changed, and
It is not impossible to maintain the raw characteristics,
Excellent, such as improved environmental reliability
It has the effect .

【図面の簡単な説明】[Brief description of the drawings]

【図1】光磁気ディスクの下地保護膜にスパッタエッチ
ング処理を施す製造方法の一例を示すフローチャートで
ある。
FIG. 1 shows a sputter etch on a protective underlayer of a magneto-optical disk .
5 is a flowchart illustrating an example of a manufacturing method for performing a pitting process .

【図2】図1に係わる記録レーザパワーの変化を示す図
である。
FIG. 2 is a diagram showing a change in recording laser power according to FIG. 1;

【図3】図1に係わる搬送波対雑音比(CNR)の変化
を示す図である。
FIG. 3 is a diagram illustrating a change in a carrier-to-noise ratio (CNR) according to FIG. 1;

【図4】図1に係わる記録時のBias磁界強度に対す
る搬送波の再生レベルの変化を示す図である。
FIG. 4 is a diagram showing a change in a reproduction level of a carrier with respect to a Bias magnetic field intensity during recording according to FIG. 1;

【図5】本発明の光磁気ディスクの製造方法の一実施例
による製造工程を示すフローチャートである。
FIG. 5 shows an embodiment of a method for manufacturing a magneto-optical disk according to the present invention.
Is a flowchart showing a manufacturing process according to the first embodiment.

【図6】図5に係わる記録時のBias磁界強度に対す
る搬送波の再生レベルの変化を示す図である。
6 is a diagram showing a change in the reproduction level of a carrier wave with respect to the Bias magnetic field strength during recording according to FIG. 5;

【図7】従来の光磁気ディスクの製造方法の一例を示す
フローチャートである。
FIG. 7 is a flowchart illustrating an example of a conventional method for manufacturing a magneto-optical disk .

【図8】図7に係わる光磁気ディスクの拡大した一部断
面図である。
8 is an enlarged partial cross-sectional view of the magneto-optical disk according to FIG. 7;

【符号の説明】[Explanation of symbols]

1 透明基板 2 保護膜 3 磁性膜 4 反射膜 5 樹脂コート DESCRIPTION OF SYMBOLS 1 Transparent substrate 2 Protective film 3 Magnetic film 4 Reflective film 5 Resin coat

フロントページの続き (72)発明者 川崎 順志 大阪府大阪市中央区城見一丁目4番24号 日本電気ホームエレクトロニクス株式会 社内 審査官 中村 豊 (56)参考文献 特開 平1−118236(JP,A) (58)調査した分野(Int.Cl.6,DB名) G11B 11/10 541 Continuation of the front page (72) Inventor Junji Kawasaki 1-4-4 Shiromi, Chuo-ku, Osaka City, Osaka Prefecture In-house examiner, NEC Home Electronics Co., Ltd. Yutaka Nakamura (56) References JP-A-1-118236 (JP) , A) (58) Field surveyed (Int. Cl. 6 , DB name) G11B 11/10 541

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 円盤状の基板に保護膜,次に磁性膜を成
膜する光磁気ディスクの製造方法において、前記磁性膜
の成膜前に予め前記保護膜の表面を紫外線照射すること
を特徴とする光磁気ディスクの製造方法。
(1) A protective film and a magnetic film are formed on a disk-shaped substrate.
In the method for manufacturing a magneto-optical disk having a film, the magnetic film
A process for irradiating the surface of the protective film with ultraviolet light before forming the film .
【請求項2】 前記紫外線照射の単位面積当たりの積算
時間が、3mW・Hr/cm 2 以下であることを特徴と
する請求項1記載の光磁気ディスクの製造方法。
2. The integral of the ultraviolet irradiation per unit area.
2. The method according to claim 1 , wherein the time is 3 mW · Hr / cm 2 or less .
【請求項3】 前記磁性膜の表面にさらに上地保護膜を
成膜することを特徴とする請求項1又は2記載の光磁気
ディスクの製造方法。
3. An upper protective film is further provided on the surface of the magnetic film.
3. The method for manufacturing a magneto-optical disk according to claim 1, wherein the film is formed .
【請求項4】 前記磁性膜の表面にさらに上地保護膜,
反射膜の順で成膜することを特徴とする請求項1又は2
記載の光磁気ディスクの製造方法。
4. An upper protective film on the surface of the magnetic film,
3. A film is formed in the order of a reflection film.
The manufacturing method of the magneto-optical disk described in the above .
【請求項5】 前記磁性膜の表面にさらに上地保護膜,
反射膜の順で成膜し、さらに反射膜の表面を保護樹脂に
て被覆することを特徴とする請求項1又は2記載の光磁
気ディスクの製造方法。
5. An upper protective film on the surface of the magnetic film,
The film is formed in the order of the reflective film, and the surface of the reflective film is made of protective resin.
The method for manufacturing a magneto-optical disk according to claim 1, wherein the magnetic disk is coated with the magnetic disk.
JP20811391A 1991-08-20 1991-08-20 Method of manufacturing magneto-optical disk Expired - Fee Related JP2925795B2 (en)

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JP20811391A JP2925795B2 (en) 1991-08-20 1991-08-20 Method of manufacturing magneto-optical disk

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Application Number Priority Date Filing Date Title
JP20811391A JP2925795B2 (en) 1991-08-20 1991-08-20 Method of manufacturing magneto-optical disk

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JPH0676377A JPH0676377A (en) 1994-03-18
JP2925795B2 true JP2925795B2 (en) 1999-07-28

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