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JP2909248B2 - Boron nitride coated member - Google Patents

Boron nitride coated member

Info

Publication number
JP2909248B2
JP2909248B2 JP11048191A JP11048191A JP2909248B2 JP 2909248 B2 JP2909248 B2 JP 2909248B2 JP 11048191 A JP11048191 A JP 11048191A JP 11048191 A JP11048191 A JP 11048191A JP 2909248 B2 JP2909248 B2 JP 2909248B2
Authority
JP
Japan
Prior art keywords
boron nitride
boundary layer
base material
intermediate layer
cbn
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP11048191A
Other languages
Japanese (ja)
Other versions
JPH04337064A (en
Inventor
俊哉 渡辺
哲義 和田
信樹 山下
真 小川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to JP11048191A priority Critical patent/JP2909248B2/en
Publication of JPH04337064A publication Critical patent/JPH04337064A/en
Application granted granted Critical
Publication of JP2909248B2 publication Critical patent/JP2909248B2/en
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、切削工具等に適用され
る立方晶窒化硼素皮膜あるいは、立方晶窒化硼素を含む
硬質窒化硼素皮膜を有する窒化硼素被覆部材に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a boron nitride coated member having a cubic boron nitride film applied to a cutting tool or the like or a hard boron nitride film containing cubic boron nitride.

【0002】[0002]

【従来の技術】立方晶窒化硼素(Cubic Boron Nitride
;以下、CBNと記す)は、ダイヤモンドに次ぐ硬さ
を有すると共に、反応性が低いため、優れた耐摩耗性材
料として知られている。このCBNは、従来は高温・高
圧法でしか作製できず、且つ粒状のCBNしか合成でき
なかったため、その利用範囲は、焼結品や砥粒等に限ら
れていた。そこで、現在、利用範囲を拡大する目的で、
CBNを皮膜として合成する方法が研究されており、イ
オンを利用するPVD(物理的蒸着)法や、プラズマC
VD(化学的蒸着)法による合成が提案されている。
2. Description of the Related Art Cubic Boron Nitride
CBN) is known as an excellent wear-resistant material because it has hardness next to diamond and low reactivity. Conventionally, this CBN can only be produced by a high-temperature and high-pressure method, and only a granular CBN can be synthesized. Therefore, its use range has been limited to sintered products and abrasive grains. So, to expand the range of use,
A method of synthesizing CBN as a film has been studied, and PVD (physical vapor deposition) using ions, plasma C
Synthesis by the VD (chemical vapor deposition) method has been proposed.

【0003】[0003]

【発明が解決しようとする課題】前述したPVD法やC
VD法により合成されるCBN皮膜は、いずれも基材上
あるいは基材上に形成された中間層上に直接形成された
ものであり、基材あるいは中間層と皮膜との間には明瞭
な境界が存在している。そのため、これらのCBN皮膜
はいずれも密着性が不良であり、未だ実用に耐え得る皮
膜は形成できていないのが現状である。CBN皮膜の密
着性が不良となる要因は、いずれの作製法も基本的には
非平衡反応を利用したものであり、合成されたCBN皮
膜が大きな内部応力を有し、基材あるいは中間層と皮膜
の境界部における密着力がこの内部応力に耐えきれずに
剥離するためである。また、CBN自身が反応性の低い
物質であるため、基材との密着力が他のセラミック皮膜
に比べて小さいことも原因である。本発明は上記状況に
鑑みなされたもので、密着性を向上させたCBN皮膜を
有する窒化硼素被覆部材を提供することを目的とする。
The above-mentioned PVD method and C
All CBN films synthesized by the VD method are formed directly on a substrate or an intermediate layer formed on the substrate, and a clear boundary is formed between the substrate or the intermediate layer and the film. Exists. Therefore, all of these CBN films have poor adhesion, and at present, films that can withstand practical use have not been formed yet. The reason why the adhesion of the CBN film becomes poor is that any of the manufacturing methods basically utilizes a non-equilibrium reaction, and the synthesized CBN film has a large internal stress, and the substrate or the intermediate layer may not have a large internal stress. This is because the adhesion at the boundary of the film cannot be withstand the internal stress and peels off. Another reason is that CBN itself is a substance having low reactivity, so that the adhesion to the substrate is smaller than that of other ceramic films. The present invention has been made in view of the above circumstances, and has as its object to provide a boron nitride-coated member having a CBN film with improved adhesion.

【0004】[0004]

【課題を解決するための手段】そこで、本発明ではCB
N皮膜の密着性を向上させる手段として、基材あるいは
基材上に形成された中間層上に窒化硼素皮膜を形成して
なる窒化硼素被覆部材において、基材あるいは中間層と
窒化硼素皮膜との境界部に基材あるいは中間層材料と窒
化硼素との混合組成である境界層を形成すると共に当該
境界層の組成を基材あるいは中間層成分が基材側から被
覆側へと順次減少していく傾斜組成とし、且つ当該境界
層中に立方晶窒化硼素を存在させると共に当該境界層中
における当該立方晶窒化硼素の存在量を窒化硼素皮膜側
から基材あるいは中間層側へ順次減少させるようにした
のである。
Therefore, in the present invention, CB
As means for improving the adhesion of the N film, in a boron nitride coating member formed by forming a boron nitride film on a base material or an intermediate layer formed on the base material, A boundary layer, which is a mixed composition of the base material or the intermediate layer material and boron nitride, is formed at the boundary portion, and the composition of the boundary layer is gradually reduced from the base material or the intermediate layer component toward the coating side. The graded composition is used, and cubic boron nitride is present in the boundary layer, and the amount of the cubic boron nitride in the boundary layer is gradually reduced from the boron nitride film side to the base material or the intermediate layer side. It is.

【0005】[0005]

【作用】基材あるいは中間層とCBN皮膜間に傾斜組成
を有する境界層を形成させることにより密着性が向上す
る原因としては、以下のことが挙げられる。CBN皮膜
の密着性が不良である原因は、前述の通り、皮膜の内部
応力が大きいためである。そこで、傾斜組成を有する境
界層を形成させることにより、材料の組成及び構造が連
続的に変化することで、皮膜の内部応力を皮膜側から基
材側あるいは中間層側へと徐々に小さく移行していくこ
とが可能となる。つまり、基材あるいは中間層と皮膜と
の境界をなくすことにより、皮膜の内部応力を境界に集
中させず、境界層の厚さに分散させることで、内部応力
による皮膜の剥離を抑制することができる。また、境界
層中にCBNを含ませ、且つその存在量を皮膜側から基
材あるいは中間層へ順次減少させることで、境界層と皮
膜の構造的な結合が可能となり、これにより境界層自体
の機械的強度が向上し、両者の密着力が一層向上する。
The reason why the adhesion is improved by forming a boundary layer having a gradient composition between the substrate or the intermediate layer and the CBN film is as follows. The reason why the adhesion of the CBN film is poor is that the internal stress of the film is large as described above. Therefore, by forming a boundary layer having a gradient composition, the composition and structure of the material are continuously changed, so that the internal stress of the film gradually shifts from the film side to the substrate side or the intermediate layer side. It becomes possible to go. In other words, by eliminating the boundary between the base material or the intermediate layer and the film, the internal stress of the film is not concentrated on the boundary, but is dispersed in the thickness of the boundary layer, thereby suppressing the peeling of the film due to the internal stress. it can. In addition, by including CBN in the boundary layer and sequentially reducing its abundance from the film side to the base material or the intermediate layer, structural bonding between the boundary layer and the film becomes possible. The mechanical strength is improved, and the adhesion between the two is further improved.

【0006】[0006]

【実施例】以下、本発明を実施例に基づいて説明する。
本実施例の窒化硼素被覆部材は、図1に示すように、高
速度工具鋼(JIS規格:SKH51)からなる基材1
上に、窒化チタンからなる中間層2、傾斜組成を有する
境界層3、及びCBN層4を順次形成させたものであ
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below based on embodiments.
As shown in FIG. 1, the boron nitride-coated member of the present embodiment has a substrate 1 made of high-speed tool steel (JIS standard: SKH51).
An intermediate layer 2 made of titanium nitride, a boundary layer 3 having a gradient composition, and a CBN layer 4 are sequentially formed thereon.

【0007】ここで中間層2は、例えばHCD(ホロカ
ソード)法によるイオンプレーティングによって、厚さ
3μmの窒化チタン皮膜を形成した。具体的には、基材
1に有機溶剤(例えばフロン)による超音波洗浄で前処
理を施した後、例えば0.1TorrAr中で1kv×1Aで
10分間イオンボンバードを行ない、その後、HCDガ
ン出力:45V×400A、基材温度:500℃、反応
ガス:N2 分圧5×10-4Torrの条件でコーティングす
ることにより形成された。なお、中間層は必ずしも形成
させる必要はなく、基材1上に直に境界層3を形成させ
ても同様な効果を得ることができる。
Here, as the intermediate layer 2, a titanium nitride film having a thickness of 3 μm was formed by, for example, ion plating by the HCD (holo cathode) method. Specifically, after performing pretreatment by ultrasonic cleaning with an organic solvent (for example, Freon), the substrate 1 is subjected to ion bombardment at, for example, 1 kv × 1 A in 0.1 Torr Ar for 10 minutes. It was formed by coating under the conditions of 45 V × 400 A, substrate temperature: 500 ° C., and reactive gas: N 2 partial pressure of 5 × 10 −4 Torr. Note that the intermediate layer does not necessarily need to be formed, and the same effect can be obtained even if the boundary layer 3 is formed directly on the base material 1.

【0008】次に、中間層2又は基材1上へ境界層3を
作製する方法を説明する。尚、境界層の作製方法には種
々の方法があるが、その中ではイオン注入法やイオンビ
ームミキシング法等が適している。まず、イオン注入法
での作製法について述べる。この方法においては、イオ
ンの加速電圧を200kv、イオン種を窒素及び硼素と
し、これらのイオン種をそれぞれ8×1017ions/cm2
の数で上記中間層2あるいは基材1に注入する。これに
より、中間層2又は基材1中に窒素及び硼素がめり込
み、これらのめり込み量は深さ方向に自然と減少する。
それに従い、CBNの組成も深さ方向に自然と減少し、
逆に中間層又は基材の成分は深さ方向に増加するという
傾斜組成を有する境界層3が形成された。
Next, a method for producing the boundary layer 3 on the intermediate layer 2 or the substrate 1 will be described. There are various methods for forming the boundary layer, and among them, an ion implantation method, an ion beam mixing method, and the like are suitable. First, a manufacturing method by an ion implantation method is described. In this method, the ion accelerating voltage is 200 kv, the ion species are nitrogen and boron, and these ion species are each 8 × 10 17 ions / cm 2.
Is injected into the above-mentioned intermediate layer 2 or substrate 1. to this
Nitrogen and boron are embedded in the intermediate layer 2 or the base material 1
In fact, the amount of these sinks naturally decreases in the depth direction.
Accordingly, the composition of CBN naturally decreases in the depth direction,
Conversely, the boundary layer 3 having a gradient composition in which the components of the intermediate layer or the base material increase in the depth direction was formed.

【0009】次に、イオンビームミキシングによる作製
法について述べる。この方法は、図2に示すような装置
を用いて行なう。同図に示す装置は、真空容器11内の
上部の基板ホルダー12に取り付けられた基材13に対
して、イオン源14から窒素イオン照射を行なうと同時
に、真空容器11内の下部に設置された蒸発源15内の
金属硼素16を電子ビーム17により蒸発させて、この
硼素蒸気18を基材13に蒸着させるものである。ここ
で、19は硼素蒸気18の基材への蒸着量を測定するモ
ニタである。
Next, a manufacturing method by ion beam mixing will be described. This method is performed using an apparatus as shown in FIG. The apparatus shown in FIG. 1 is installed at the lower portion in the vacuum vessel 11 while irradiating nitrogen ions from the ion source 14 to the base material 13 attached to the upper substrate holder 12 in the vacuum vessel 11. The metal boron 16 in the evaporation source 15 is evaporated by the electron beam 17, and the boron vapor 18 is deposited on the substrate 13. Here, 19 is a monitor for measuring the amount of boron vapor 18 deposited on the substrate.

【0010】作製手順としては、まず、基材13のとこ
ろへ中間層2を有する基材1あるいは基材1のみを設置
し、真空容器11内を2×10-6Torr以下に予備排気す
る。次に、イオン源14に供給した窒素と希ガス(例え
ばアルゴン)を、イオン源14内でイオン化して、その
混合イオン20を基材13へ照射すると共に、蒸発源1
5より金属硼素16を蒸発させた硼素蒸気18を基材1
3上に蒸着させる。このとき、混合イオン20のエネル
ギーを70keV ,2keV ,1keV と段階的に減少させ、
そのときの硼素蒸気18の蒸発速度を、それぞれ加速電
70keV のとき3Å/sec 、2keV のとき2Å/sec
、1keV のとき1Å/sec とし、処理時間を各5分と
することにより、図1に示すような、CBNを含み且つ
傾斜組成を有する境界層3が形成された。ここで、境界
層3中にCBNを含ませるためには、加速電圧を段階的
に変化させることが必要であり、特に2keV ,1keV の
低い加速電圧が重要となる。また、このときの真空度は
およそ1×10-4Torrである。
As a manufacturing procedure, first, the base material 1 having the intermediate layer 2 or only the base material 1 is set at the base material 13 and the inside of the vacuum vessel 11 is pre-evacuated to 2 × 10 −6 Torr or less. Next, the nitrogen and the rare gas (for example, argon) supplied to the ion source 14 are ionized in the ion source 14, and the mixed ions 20 are irradiated to the base 13, and the evaporation source
5. Boron vapor 18 obtained by evaporating metallic boron 16 from
3 on top. At this time, the energy of the mixed ions 20 is reduced stepwise to 70 keV, 2 keV, and 1 keV,
The evaporation rate of the boron vapor 18 at that time was 3 ° / sec when the accelerating voltage was 70 keV, and 2 ° / sec when the accelerating voltage was 2 keV.
The boundary layer 3 containing CBN and having a graded composition was formed as shown in FIG. 1 by setting 1Å / sec at 1 keV and treating for 5 minutes each. Here, in order to include CBN in the boundary layer 3, it is necessary to change the accelerating voltage stepwise. In particular, a low accelerating voltage of 2 keV or 1 keV is important. At this time, the degree of vacuum is about 1 × 10 −4 Torr.

【0011】また、境界層3上にCBN層4を形成させ
る方法は、基本的には境界層3を形成する手順と同様で
ある。具体的には、混合イオン20の照射エネルギーを
0.5keV 、硼素蒸気18の蒸発速度を0.4Å/sec
とすることで、CBN層4を形成することができた。ま
た、イオン注入法で得られた境界層上にも同様な方法で
CBN層4を形成することができる。
The method for forming the CBN layer 4 on the boundary layer 3 is basically the same as the procedure for forming the boundary layer 3. Specifically, the irradiation energy of the mixed ions 20 is 0.5 keV, and the evaporation rate of the boron vapor 18 is 0.4 ° / sec.
As a result, the CBN layer 4 could be formed. Further, the CBN layer 4 can be formed on the boundary layer obtained by the ion implantation method in the same manner.

【0012】以上の実施例により製作した窒化チタンを
中間層に持つ窒化硼素被覆部材をオージュ電子分光分析
にて深さ方向の組成分析を行なった結果、境界層3中の
組成は皮膜側から中間層側へ硼素の原子比が連続的に減
少し、同時にチタンの原子比が連続的に増加しており、
境界層3は傾斜組成をとることが確認された。さらに光
電子分光分析により窒化硼素の構造分析を行なったとこ
ろ、境界層3中にCBNが存在することが確認された。
また、図3に、得られた窒化硼素被覆部材の密着力をス
クラッチ試験により評価した結果を示すが、境界層3を
形成させると、境界層3がないときと比べて8〜10
倍、密着力(スクラッチ試験で皮膜が剥離するときの荷
重)が増大しており、優れた密着性を有することが示さ
れた。また、比較のために、混合イオンの照射エネルギ
ーを70keV のみとして境界層を形成し、その後CBN
膜を合成したとき、オージェ電子分光分析により境界層
中は傾斜組成を有していることが確認されたが、光電子
分光分析によると、境界層中にはCBNが存在していな
かった。さらに、これをスクラッチ試験により密着力を
評価した結果、図3に示すように、その密着力は境界層
がないときよりは大幅に向上しているが、境界層中にC
BNが存在しているときと比べると劣っている。これよ
り、境界層中にCBNを存在させる効果が示された。
As a result of composition analysis in the depth direction of the boron nitride-coated member having titanium nitride as an intermediate layer manufactured by the above-described embodiment by Auger electron spectroscopy, the composition in the boundary layer 3 was changed from the film side to the intermediate position. The atomic ratio of boron continuously decreases toward the layer side, while the atomic ratio of titanium continuously increases,
It was confirmed that the boundary layer 3 had a gradient composition. Further, structural analysis of boron nitride was performed by photoelectron spectroscopy, and it was confirmed that CBN was present in the boundary layer 3.
FIG. 3 shows the results of evaluating the adhesion of the obtained boron nitride-coated member by a scratch test. When the boundary layer 3 is formed, it is 8 to 10 times larger than when the boundary layer 3 is not provided.
The adhesive force (the load at the time of peeling of the film in the scratch test) increased, indicating that it had excellent adhesiveness. For comparison, a boundary layer was formed by setting the irradiation energy of the mixed ions to only 70 keV, and then the CBN was formed.
When the film was synthesized, Auger electron spectroscopy analysis confirmed that the boundary layer had a gradient composition, but photoelectron spectroscopy analysis revealed that CBN was not present in the boundary layer. Further, as a result of evaluating the adhesion by a scratch test, as shown in FIG. 3, the adhesion is significantly improved as compared with the case where there is no boundary layer.
It is inferior to when BN is present. Thus, the effect of having CBN in the boundary layer was shown.

【0013】[0013]

【発明の効果】以上、説明したように、本発明による窒
化硼素被覆部材は、従来のものと比較して優れた密着性
を有しており、切削工具のみならず、各種回転機器の軸
受やスライド等の摺動部材など、他の耐摩耗部材として
実用に耐え得るものであり、工業的に利用価値の大きい
ものである。
As described above, the boron nitride-coated member according to the present invention has excellent adhesion as compared with conventional ones, and can be used not only for cutting tools but also for bearings of various rotating devices. It can withstand practical use as other wear-resistant members such as sliding members such as slides, and is of great industrial value.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例に係る窒化硼素被覆部材の断
面模式図。
FIG. 1 is a schematic sectional view of a boron nitride coating member according to one embodiment of the present invention.

【図2】本発明の一実施例に係る窒化硼素被覆部材形成
装置の概略図。
FIG. 2 is a schematic view of a boron nitride coating member forming apparatus according to one embodiment of the present invention.

【図3】本発明に係る窒化硼素被覆部材に対して被覆の
スクラッチ試験を行って得た臨界荷重を示す図。
FIG. 3 is a view showing a critical load obtained by performing a coating scratch test on the boron nitride-coated member according to the present invention.

【符号の説明】[Explanation of symbols]

1 基材 2 中間層 3 境界層 4 CBN層 11 真空容器 12 基材ホルダ 13 基材 14 イオン源 15 蒸発源 16 金属硼素 17 電子ビーム 18 硼素蒸気 19 モニタ 20 窒素+希ガス混合イオン DESCRIPTION OF SYMBOLS 1 Substrate 2 Intermediate layer 3 Boundary layer 4 CBN layer 11 Vacuum container 12 Substrate holder 13 Substrate 14 Ion source 15 Evaporation source 16 Metal boron 17 Electron beam 18 Boron vapor 19 Monitor 20 Nitrogen + rare gas mixed ion

───────────────────────────────────────────────────── フロントページの続き (72)発明者 山下 信樹 神奈川県横浜市金沢区幸浦一町目8番地 1 三菱重工業株式会社 基盤技術研究 所内 (72)発明者 小川 真 神奈川県横浜市金沢区幸浦一町目8番地 1 三菱重工業株式会社 基盤技術研究 所内 (56)参考文献 特開 平2−236268(JP,A) (58)調査した分野(Int.Cl.6,DB名) C23C 14/00 - 14/58 C23C 16/30 C23C 28/00 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Nobuki Yamashita 1-8-cho, Koura-cho, Kanazawa-ku, Yokohama-shi, Kanagawa 1 In the Basic Technology Research Laboratory Mitsubishi Heavy Industries, Ltd. 8 Machime 1 Mitsubishi Heavy Industries, Ltd. Basic Technology Laboratory (56) References JP-A-2-236268 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) C23C 14/00- 14/58 C23C 16/30 C23C 28/00

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 基材あるいは基材上に形成された中間層
上に窒化硼素皮膜を形成してなる窒化硼素被覆部材にお
いて、基材あるいは中間層と窒化硼素皮膜との境界部に
基材あるいは中間層材料と窒化硼素との混合組成である
境界層を形成すると共に当該境界層の組成を基材あるい
は中間層成分が基材側から被覆側へと順次減少していく
傾斜組成とし、且つ当該境界層中に立方晶窒化硼素を存
在させると共に当該境界層中における当該立方晶窒化硼
素の存在量を窒化硼素皮膜側から基材あるいは中間層側
へ順次減少させたことを特徴とする窒化硼素被覆部材。
1. A boron nitride coating member comprising a base material or an intermediate layer formed on the base material and a boron nitride film formed on the base material or an intermediate layer formed on the base material. Forming a boundary layer that is a mixed composition of the intermediate layer material and boron nitride, and setting the composition of the boundary layer to a gradient composition in which the base material or the intermediate layer component is gradually reduced from the base material side to the coating side; A boron nitride coating, wherein cubic boron nitride is present in the boundary layer and the amount of the cubic boron nitride in the boundary layer is gradually reduced from the boron nitride film side to the substrate or the intermediate layer side. Element.
JP11048191A 1991-05-15 1991-05-15 Boron nitride coated member Expired - Fee Related JP2909248B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11048191A JP2909248B2 (en) 1991-05-15 1991-05-15 Boron nitride coated member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11048191A JP2909248B2 (en) 1991-05-15 1991-05-15 Boron nitride coated member

Publications (2)

Publication Number Publication Date
JPH04337064A JPH04337064A (en) 1992-11-25
JP2909248B2 true JP2909248B2 (en) 1999-06-23

Family

ID=14536820

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11048191A Expired - Fee Related JP2909248B2 (en) 1991-05-15 1991-05-15 Boron nitride coated member

Country Status (1)

Country Link
JP (1) JP2909248B2 (en)

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US5948541A (en) * 1996-04-04 1999-09-07 Kennametal Inc. Boron and nitrogen containing coating and method for making
US5976716A (en) * 1996-04-04 1999-11-02 Kennametal Inc. Substrate with a superhard coating containing boron and nitrogen and method of making the same
US6593015B1 (en) 1999-11-18 2003-07-15 Kennametal Pc Inc. Tool with a hard coating containing an aluminum-nitrogen compound and a boron-nitrogen compound and method of making the same
JP3621943B2 (en) 2003-07-25 2005-02-23 三菱重工業株式会社 High wear resistance and high hardness coating
JP4138630B2 (en) * 2003-11-07 2008-08-27 三菱重工業株式会社 Abrasion resistant hard coating
WO2023157466A1 (en) * 2022-02-15 2023-08-24 Seavac株式会社 Hard coating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10639768B2 (en) 2011-05-27 2020-05-05 P&S Global Holdings Llc Multi-layer coating with cubic boron nitride particles

Also Published As

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