JP2974995B2 - Sample loading / unloading device - Google Patents
Sample loading / unloading deviceInfo
- Publication number
- JP2974995B2 JP2974995B2 JP6496998A JP6496998A JP2974995B2 JP 2974995 B2 JP2974995 B2 JP 2974995B2 JP 6496998 A JP6496998 A JP 6496998A JP 6496998 A JP6496998 A JP 6496998A JP 2974995 B2 JP2974995 B2 JP 2974995B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- sample
- closed container
- chamber
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、試料を処理する例
えば半導体処理装置等の処理装置に対し、試料を搬出入
する試料搬出入装置に係わり、特に試料を真空で連続し
て処理する例えば半導体処理装置等の処理装置に適用し
て好適な試料搬出入装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sample loading / unloading device for loading / unloading a sample from / to a processing device such as a semiconductor processing device for processing a sample, and more particularly, to a semiconductor device for continuously processing a sample in a vacuum. The present invention relates to a sample loading / unloading device suitable for application to a processing device such as a processing device.
【０００２】[0002]
【従来の技術】従来の複数処理装置は、例えば、セミ・
コンダクタ・ワールド（Semi Conductor World）１９８
９、８、３８〜４０頁に記載されているように各処理室
は、真空にされた搬送室等で連結されていた。2. Description of the Related Art Conventional multi-processing apparatuses are, for example, semi-
198 Semi Conductor World
As described on pages 9, 8, 38 to 40, the respective processing chambers were connected by a vacuumed transfer chamber or the like.
【０００３】[0003]
【発明が解決しようとする課題】上記従来技術の放射状
連結は、各処理室が放射状に連結されているため、試料
の大口径化に伴う設置場所の拡がり、又は、連結される
処理室の数にも制限があった。In the above-mentioned radial connection of the prior art, since the processing chambers are connected radially, the installation place is expanded due to the increase in the diameter of the sample, or the number of processing chambers to be connected is increased. Also had restrictions.
【０００４】また、上記従来技術の直線状連結は、各処
理室が放射状に連結されているため、処理前後の試料の
位置が離れ操作性が悪く、各処理室の大きさにより、各
室の標準化が困難であった。In the linear connection of the prior art, since the processing chambers are connected radially, the positions of the samples before and after the processing are separated and the operability is poor. Standardization was difficult.
【０００５】さらに、上記従来技術は、各処理室が真空
の搬送室等で常に連結されているため、各処理室の保守
スペースが不十分で移動等も困難であり、また、各真空
処理室間が連結されるための相互汚染も問題があった。Further, in the above-mentioned prior art, since the processing chambers are always connected by a vacuum transfer chamber or the like, the maintenance space of each processing chamber is insufficient and it is difficult to move the processing chambers. There was also a problem of cross-contamination due to the connection between them.
【０００６】本発明の目的は、閉容器により閉じた状態
で搬送した試料を、半導体処理装置の処理室等の室に容
易に、且つより確実に搬出入可能な試料搬出入装置を得
ることにある。SUMMARY OF THE INVENTION It is an object of the present invention to provide a sample loading / unloading apparatus capable of easily and more reliably loading and unloading a sample transported in a state closed by a closed container into a processing chamber or the like of a semiconductor processing apparatus. is there.
【０００７】上記の目的を達成するために、本発明の特
徴とするところは、各々試料が真空処理される単一の真
空処理室とバッファ室とを備えた複数の真空処理モジュ
ールと、各真空処理モジュールに対応して配置される移
動可能な閉容器と、前記閉容器を開閉する開閉手段と、
前記各バッファ室内に設けられ、前記各真空処理モジュ
ールに対応して前記閉容器が配置された状態で、前記閉
容器に前記各開閉手段を介して前記試料を搬出入する搬
出入手段とを備えたことにある。また、本発明の他の特
徴は、各々試料が真空処理される単一の真空処理室とバ
ッファ室とを備えた複数の真空処理モジュールと、各真
空処理モジュールに対応して配置される移動可能な閉容
器と、該閉容器を所定の前記真空処理モジュールに対応
する位置に移動させる手段と、前記閉容器を開閉する開
閉手段と、前記各バッファ室内に設けられ、前記各真空
処理モジュールに対応して前記閉容器が配置された状態
で、前記閉容器に前記各開閉手段を介して前記試料を搬
出入する搬出入手段とを備えたことにある。In order to achieve the above object, the present invention is characterized in that a plurality of vacuum processing chambers each having a single vacuum processing chamber and a buffer chamber in which a sample is vacuum processed. Module , a movable closed container arranged corresponding to each vacuum processing module, and opening and closing means for opening and closing the closed container,
The vacuum processing module provided in each of the buffer chambers.
In a state where the closed container in correspondence with Lumpur is arranged, transportable for loading and unloading the sample through the respective switching means to said closed container
And access means. Another feature of the present invention is that a single vacuum processing chamber and a vacuum chamber are provided for each sample being vacuum processed.
A plurality of vacuum processing module that includes a Ffa chamber, each true
A movable closed container arranged corresponding to the empty processing module , means for moving the closed container to a position corresponding to a predetermined vacuum processing module, opening / closing means for opening and closing the closed container, and each of the buffers Provided indoors, each said vacuum
State in which the closed container is arranged corresponding to the processing module
In, in that a loading and unloading means for loading and unloading the sample through the respective switching means to said closed container.
【０００８】上記のように構成すれば、閉容器により閉
じた状態で搬送した試料を、汚染させること無く、複数
の真空処理モジュールの各処理室に容易に、且つより確
実に搬出入可能な試料出搬入装置を得ることができる。
また、各真空処理モジュールは単一の真空処理室とバッ
ファ室とを備えており、各バッファ室内に搬出入手段が
設けられ、前記各真空処理モジュールに対応して閉容器
が配置された状態で、閉容器に開閉手段を介して試料を
搬出入するように構成したので、閉容器に搬送手段を設
けたものに比べて、構成が簡単になり、制御が容易にな
る。 特に、真空処理モジュールを単一の真空処理室とバ
ッファ室から構成し、閉容器を移動型としているため、
各真空処理室の処理時間に差が有っても、試料の搬出入
に大きなロスタイムを生ずることはない。 [0008] According to the above configuration , a plurality of samples transported in a closed state by the closed container can be contaminated without contamination.
Thus, it is possible to obtain a sample loading / unloading device capable of easily and more reliably loading / unloading into / from each processing chamber of the vacuum processing module .
Each vacuum processing module has a single vacuum processing chamber and
And a loading / unloading means in each buffer chamber.
A closed vessel provided for each vacuum processing module provided
Is placed in the closed container via the opening and closing means.
Because it is configured to carry in and out, a transport means is installed in the closed container.
It has a simpler configuration and easier control than
You. In particular, vacuum processing modules can be combined with a single vacuum processing chamber
Since it consists of a buffer room and the closed container is a movable type,
Even if there is a difference in the processing time between the vacuum processing chambers,
Does not cause a large loss time.
【０００９】[0009]
【発明の実施の形態】以下、本発明の一実施例を図１お
よび図２により説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to FIGS.
【００１０】図１において、システムの構成は、試料を
大気中から真空中へ、および真空中から大気中へ戻すた
め、ロードアンロード装置１と、そこから試料を真空保
持の状態で受け取り又は受け渡し可能な真空移動装置２
と、その真空移動装置２との間で試料を真空保持状態で
搬出入可能な一つ以上の処理モジュール３ａ〜３ｃでな
る。In FIG. 1, the system is configured so that a sample is returned from the atmosphere to the vacuum and from the vacuum to the atmosphere. Vacuum transfer device 2
And one or more processing modules 3a to 3c capable of carrying a sample in and out of the vacuum transfer device 2 while maintaining the vacuum.
【００１１】図２において、真空移動装置２と一つの処
理モジュールの構成について説明する。Referring to FIG. 2, the structure of the vacuum transfer device 2 and one processing module will be described.
【００１２】まず、真空移動装置２は、試料を真空状態
に保持する移動真空室４と、試料搬出入時開くゲートバ
ルブ５ａとで真空室を形成する。その移動真空室４に
は、試料の搬出入時に稼働する試料搭載装置１０が取り
付けられている。また、真空移動装置２がロードアンロ
ード装置１および各処理モジュール３ａ〜３ｃ間を移動
するために移動装置１１が設けられると共に、移動真空
室４に設けられたロック室６ａを処理モジュール３又は
ロードアンロード装置の真空室のロック室６ｂと連結す
る結合装置９が設けられている。First, the vacuum moving device 2 forms a vacuum chamber by a moving vacuum chamber 4 for holding a sample in a vacuum state and a gate valve 5a which is opened when a sample is carried in and out. The moving vacuum chamber 4 is provided with a sample mounting device 10 that operates when loading and unloading a sample. In addition, a moving device 11 is provided for the vacuum moving device 2 to move between the load / unload device 1 and each of the processing modules 3a to 3c, and a lock chamber 6a provided in the moving vacuum chamber 4 is connected to the processing module 3 or the load module. A coupling device 9 is provided which is connected to the lock chamber 6b of the vacuum chamber of the unloading device.
【００１３】各処理モジュール３は、試料の処理を行う
処理室８と、搬送アーム１６の収納される真空保持のバ
ッファ室７と、真空移動装置２のロック室６ａと連結さ
れるロック室６ｂより真空室が形成され、各室は、ゲー
トバルブ５ｂおよび５ｃにより連通となる。ロック室６
ｂには、ロック室６ａおよび６ｂを大気に戻すためにＮ
2ガス元１４がバルブ１５を介して接続され、また、真
空引きをするために真空ポンプ１２がバルブ１３を介し
て接続されている。また、ロードアンロード装置１にも
上記の処理モジュール３と同様の機構が設けられる。Each processing module 3 includes a processing chamber 8 for processing a sample, a buffer chamber 7 for holding a vacuum in which a transfer arm 16 is housed, and a lock chamber 6b connected to a lock chamber 6a of the vacuum transfer device 2. Vacuum chambers are formed, and each chamber is communicated by gate valves 5b and 5c. Lock room 6
b has N to return the lock chambers 6a and 6b to the atmosphere.
The two gas sources 14 are connected via a valve 15, and the vacuum pump 12 is connected via a valve 13 for evacuating. Further, the load / unload device 1 is provided with a mechanism similar to the processing module 3 described above.
【００１４】以上、本実施例によれば、ロードアンロー
ド装置および各処理モジュールの真空室を単独で切り離
して配置していても、試料は、各処理の開始から終了ま
で真空状態で処理することができる。As described above, according to this embodiment, even if the load / unload device and the vacuum chamber of each processing module are independently separated and arranged, the sample is processed in a vacuum state from the start to the end of each processing. Can be.
【００１５】[0015]
【発明の効果】本発明によれば、閉容器により閉じた状
態で搬送した試料を、汚染させること無く、複数の真空
処理モジュールの各処理室に容易に、且つより確実に搬
出入可能な試料出搬入装置を得ることができる。また、
各真空処理モジュールは単一の真空処理室とバッファ室
とを備えており、各バッファ室内に搬出入手段が設けら
れ、前記各真空処理モジュールに対応して閉容器が配置
されれた状態で、閉容器に開閉手段を介して試料を搬出
入するように構成したので、閉容器に開閉手段を設けた
ものに比べて、構成が簡単になり、制御が容易になる。
特に、真空処理モジュールを単一の真空処理室とバッフ
ァ室から構成し、閉容器を移動型としているため、各真
空処理室の処理時間に差が有っても、試料の搬出入に大
きなロスタイムを生ずることはない。 According to the present invention, a sample transported in a closed state by a closed container can be subjected to a plurality of vacuums without contaminating the sample.
It is possible to obtain a sample loading / unloading device which can easily and more reliably carry in / out the respective processing chambers of the processing module . Also,
Each vacuum processing module has a single vacuum processing chamber and buffer chamber
In each buffer room, a loading / unloading means is provided.
And closed containers are arranged corresponding to the vacuum processing modules.
In the closed state, the sample is carried out to the closed container via the opening / closing means.
So that the closed container is provided with opening and closing means.
The configuration is simpler and the control is easier as compared with those of the first embodiment.
In particular, vacuum processing modules can be combined with a single vacuum processing chamber and buffer.
Each room has a closed container and a movable container.
Even if there is a difference in the processing time in the empty processing chamber, large
No significant loss time occurs.
【００１６】[0016]
【図１】本発明の一実施例の複数真空処理装置の構成を
表した平面図である。FIG. 1 is a plan view illustrating a configuration of a multiple vacuum processing apparatus according to an embodiment of the present invention.
【図２】図１の処理モジュール部の縦断面図である。FIG. 2 is a longitudinal sectional view of the processing module unit of FIG.
１…ロードアンロード室、２…真空移動装置、３…処理
モジュール、４…移動真空室、５ａ〜５ｃ…ゲートバル
ブ、６…ロック室、７…バッファ室、８…処理室、９…
結合装置、１０…試料搭載装置、１１…移動装置、１２
…真空ポンプ、１３…バルブ、１４…Ｎ2ガス元、１５
…バルブ、１６…搬送アーム。DESCRIPTION OF SYMBOLS 1 ... Load / unload chamber, 2 ... Vacuum transfer device, 3 ... Processing module, 4 ... Moving vacuum chamber, 5a-5c ... Gate valve, 6 ... Lock chamber, 7 ... Buffer chamber, 8 ... Processing chamber, 9 ...
Coupling device, 10: sample mounting device, 11: moving device, 12
... vacuum pump, 13 ... valve, 14 ... N 2 gas source 15
... Valve, 16 ... Transfer arm.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 西畑 廣治 山口県下松市大字東豊井794番地 株式 会社 日立製作所 笠戸工場内 (72)発明者 伊藤 温司 山口県下松市大字東豊井794番地 株式 会社 日立製作所 笠戸工場内 (56)参考文献 特開 昭60−184678（ＪＰ，Ａ) 特開 昭63−28047（ＪＰ，Ａ) 特開 昭62−87749（ＪＰ，Ａ) (58)調査した分野(Int.Cl.6，ＤＢ名) H01L 21/68 H01L 21/302 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Hiroji Nishihata 794, Higashi-Toyoi, Kazamatsu, Kamamatsu, Yamaguchi Prefecture Inside the Kasado Plant of Hitachi, Ltd. In the Kasado Factory (56) References JP-A-60-184678 (JP, A) JP-A-63-28047 (JP, A) JP-A-62-87749 (JP, A) (58) Fields investigated ( Int.Cl. 6 , DB name) H01L 21/68 H01L 21/302
Claims (2)
室とバッファ室とを備えた複数の真空処理モジュール
と、各真空処理モジュールに対応して配置される移動可
能な閉容器と、 前記閉容器を開閉する開閉手段と、 前記各バッファ室内に設けられ、前記各真空処理モジュ
ールに対応して前記閉容器が配置された状態で、前記閉
容器に前記各開閉手段を介して前記試料を搬出入する搬
出入手段とを備えたことを特徴とする試料搬出入装置。A plurality of vacuum processing modules each including a single vacuum processing chamber in which a sample is vacuum-processed and a buffer chamber; a movable closed container arranged corresponding to each vacuum processing module; Opening and closing means for opening and closing the closed container, provided in each of the buffer chambers, and in a state where the closed container is arranged corresponding to each of the vacuum processing modules, the sample in the closed container via the opening and closing means And a loading / unloading means for loading / unloading the sample.
室とバッファ室とを備えた複数の真空処理モジュール
と、各真空処理モジュールに対応して配置される移動可
能な閉容器と、 該閉容器を所定の前記真空処理モジュールに対応する位
置に移動させる手段と、 前記閉容器を開閉する開閉手段と、 前記各バッファ室内に設けられ、前記各真空処理モジュ
ールに対応して前記閉容器が配置された状態で、前記閉
容器に前記各開閉手段を介して前記試料を搬出入する搬
出入手段とを備えたことを特徴とする試料搬出入装置。2. A plurality of vacuum processing modules each including a single vacuum processing chamber in which a sample is vacuum-processed and a buffer chamber; a movable closed container arranged corresponding to each vacuum processing module; Means for moving the closed container to a position corresponding to the predetermined vacuum processing module; opening and closing means for opening and closing the closed container; provided in each of the buffer chambers, and the closed container corresponding to each of the vacuum processing modules And a loading / unloading means for loading / unloading the sample into / from the closed container via the opening / closing means in a state where is disposed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6496998A JP2974995B2 (en) | 1998-03-16 | 1998-03-16 | Sample loading / unloading device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6496998A JP2974995B2 (en) | 1998-03-16 | 1998-03-16 | Sample loading / unloading device |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32144189A Division JP2901672B2 (en) | 1989-12-13 | 1989-12-13 | Multiple vacuum processing equipment |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10435098A Division JPH10313040A (en) | 1998-04-15 | 1998-04-15 | Specimen carrying in and out device |
| JP10435198A Division JPH10313041A (en) | 1998-04-15 | 1998-04-15 | A plurality of processors |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10223729A JPH10223729A (en) | 1998-08-21 |
| JP2974995B2 true JP2974995B2 (en) | 1999-11-10 |
Family
ID=13273394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6496998A Expired - Lifetime JP2974995B2 (en) | 1998-03-16 | 1998-03-16 | Sample loading / unloading device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2974995B2 (en) |
-
1998
- 1998-03-16 JP JP6496998A patent/JP2974995B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH10223729A (en) | 1998-08-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5067218A (en) | Vacuum wafer transport and processing system and method using a plurality of wafer transport arms | |
| US5391035A (en) | Micro-enviroment load lock | |
| US6082948A (en) | Controlled environment enclosure and mechanical interface | |
| JP4256551B2 (en) | Vacuum processing system | |
| US20020159864A1 (en) | Triple chamber load lock | |
| JPH0159007B2 (en) | ||
| US6347919B1 (en) | Wafer processing chamber having separable upper and lower halves | |
| JPH04206547A (en) | Interdevice transfer method | |
| US5759334A (en) | Plasma processing apparatus | |
| JP2974995B2 (en) | Sample loading / unloading device | |
| US5980684A (en) | Processing apparatus for substrates | |
| US5098245A (en) | High speed wafer handler | |
| JP2901672B2 (en) | Multiple vacuum processing equipment | |
| JPH08195426A (en) | Interface device for vacuum conveyance | |
| US6000905A (en) | High speed in-vacuum flat panel display handler | |
| EP0797240A2 (en) | Reduced footprint semiconductor processing system | |
| JPH10313041A (en) | A plurality of processors | |
| JPH04271139A (en) | Semiconductor manufacturing equipment | |
| JPS62252128A (en) | Substrate introducing device for semiconductor manufacturing apparatus | |
| JPH0831906A (en) | Substrate process system | |
| JPH10313040A (en) | Specimen carrying in and out device | |
| JPS60160139A (en) | Shifting process | |
| JPH02173263A (en) | Method for treating base of spattering apparatus and apparatus thereof | |
| JPH01120811A (en) | Semiconductor wafer treatment equipment | |
| JPH1098087A (en) | Wafer transportation device |