JP2968809B2 - Cleaning water circulation treatment equipment for solder dip machine - Google Patents
Cleaning water circulation treatment equipment for solder dip machineInfo
- Publication number
- JP2968809B2 JP2968809B2 JP1337673A JP33767389A JP2968809B2 JP 2968809 B2 JP2968809 B2 JP 2968809B2 JP 1337673 A JP1337673 A JP 1337673A JP 33767389 A JP33767389 A JP 33767389A JP 2968809 B2 JP2968809 B2 JP 2968809B2
- Authority
- JP
- Japan
- Prior art keywords
- water
- cleaning
- impurities
- washing water
- cleaning water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims description 119
- 238000004140 cleaning Methods 0.000 title claims description 57
- 229910000679 solder Inorganic materials 0.000 title claims description 20
- 238000005406 washing Methods 0.000 claims description 55
- 239000012535 impurity Substances 0.000 claims description 39
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 34
- 238000001179 sorption measurement Methods 0.000 claims description 16
- 230000001954 sterilising effect Effects 0.000 claims description 15
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims description 12
- 244000005700 microbiome Species 0.000 claims description 6
- 238000001914 filtration Methods 0.000 claims description 5
- 150000002500 ions Chemical class 0.000 claims description 5
- 239000003456 ion exchange resin Substances 0.000 claims description 4
- 229920003303 ion-exchange polymer Polymers 0.000 claims description 4
- 239000003957 anion exchange resin Substances 0.000 description 8
- 239000003729 cation exchange resin Substances 0.000 description 8
- 150000001412 amines Chemical class 0.000 description 7
- 239000011362 coarse particle Substances 0.000 description 7
- 150000007524 organic acids Chemical class 0.000 description 7
- 235000005985 organic acids Nutrition 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 238000007598 dipping method Methods 0.000 description 6
- 238000004659 sterilization and disinfection Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 150000001450 anions Chemical class 0.000 description 4
- 150000001768 cations Chemical class 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000003911 water pollution Methods 0.000 description 4
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- 239000002736 nonionic surfactant Substances 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 239000002351 wastewater Substances 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- -1 polypropylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000249 desinfective effect Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Landscapes
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Treatment Of Water By Ion Exchange (AREA)
- Physical Water Treatments (AREA)
- Filtration Of Liquid (AREA)
- Water Treatment By Sorption (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、半田ディップ機の洗浄水循環処理装置に関
し、得に、半田ディップ済の電子部品の洗浄に使用され
る洗浄水を循環処理する半田ディップ機の洗浄水循環処
理装置に適用して有効な技術に関する。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning water circulating apparatus for a solder dipping machine, and more particularly to a solder for circulating cleaning water used for cleaning electronic parts having been dipped in solder. The present invention relates to a technology effective when applied to a washing water circulation treatment device of a dip machine.
半田ディップ済の電子部品の洗浄に使用される洗浄水
においては、反復使用に伴い、半田粒等の粗い粒子やフ
ラックスの溶解による有機酸やアミン等の不純物が増大
し、そのため洗浄性が低下してしまう。In washing water used for cleaning solder-dipped electronic components, with repeated use, coarse particles such as solder particles and impurities such as organic acids and amines due to the dissolution of flux increase, resulting in poor cleaning performance. Would.
そこで、洗浄水を定期的に取り換え、使用済の洗浄水
については、フィルタにより半田粒などの粗い粒子を除
去する処理を経て使用済の洗浄水を廃水として水中に放
出していた。Therefore, the cleaning water is periodically replaced, and the used cleaning water is discharged into the water as wastewater through a process of removing coarse particles such as solder particles using a filter.
前記した洗浄水の排水処理では、半田粒等の粒子が除
去されるものの、アミンや有機物等の不純物は容易に除
去されず、洗浄水とともに水中に放出され、このため水
質汚染をきたし、公害上問題があった。In the above-described washing water drainage treatment, although particles such as solder particles are removed, impurities such as amines and organic substances are not easily removed, and are released into the water together with the washing water, thereby causing water pollution and causing pollution. There was a problem.
また、使用済の洗浄水においては、アミンや有機物等
の不純物を除去することができれば、洗浄水が活性化す
るにもかかわらず、廃水として排水され、このためコス
トの浪費をきたすという問題があった。Also, in the used washing water, if impurities such as amines and organic substances can be removed, the washing water is activated, but the wastewater is drained as waste water, which causes a problem of wasting costs. Was.
本発明は、前記問題点に着目してなされたものであ
り、その目的は、洗浄水中のあらゆる不純物を除去して
水質を向上させ、洗浄水の循環再利用を可能にしてコス
トの節減を図り、水質汚染をなくすことのできる半田デ
ィップ機の洗浄水循環処理装置を提供することにある。The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to improve the quality of water by removing all impurities in the washing water and to reduce the cost by enabling the recycling and reuse of the washing water. Another object of the present invention is to provide a cleaning water circulation treatment device for a solder dip machine that can eliminate water contamination.
本願において、開示される発明のうち、代表的なもの
の概要を簡単に説明すれば、次のとおりである。In the present application, among the disclosed inventions, the outline of a representative one will be briefly described as follows.
本発明の半田ディップ機の洗浄水循環処理装置の構造
は、半田ディップ済の電子部品を洗浄する洗浄装置の洗
浄水排出口を始端とし、洗浄装置の洗浄水供給口を終端
とする洗浄水循環経路に少なくとも洗浄水貯留槽、循環
ポンプ、洗浄水中の不純物を除去する不純物除去部およ
び洗浄水中の微生物を殺菌する殺菌部を下流側に向かっ
て順次配設した構造としたものである。The structure of the cleaning water circulation treatment device of the solder dipping machine according to the present invention is such that the cleaning water circulation path having the cleaning water discharge port of the cleaning device for cleaning the electronic components after the solder dipping as a starting point and the cleaning water supply port of the cleaning device as a terminal end. At least a washing water storage tank, a circulating pump, an impurity removing section for removing impurities in the washing water, and a sterilizing section for sterilizing microorganisms in the washing water are sequentially arranged toward the downstream side.
この場合、前記不純物除去部は、洗浄水中の不純物の
うち、粗成分を濾過するフィルタ、洗浄水中の不純物の
うち、微成分を吸着する活性炭吸着塔および洗浄水中の
不純物のうち、イオンを吸着除去するイオン交換樹脂塔
を下流側に向かって順次接続してなる構造とすることが
できる。In this case, the impurity removing unit removes ions from impurities in the washing water by filtering a crude component, from among impurities in the washing water, from an activated carbon adsorption tower that absorbs fine components, and from impurities from the washing water. The ion exchange resin towers can be sequentially connected toward the downstream side.
本発明の半田ディップ機の洗浄水循環処理装置によれ
ば、半田ディップ済の電子部品を洗浄する洗浄装置の洗
浄水排出口を始端とし、洗浄装置の洗浄水供給口を終端
とする洗浄水循環経路に少なくとも洗浄水貯留槽、循環
ポンプ、洗浄水中の不純物を除去する不純物除去部およ
び洗浄水中の微生物を殺菌する殺菌部を下流側に向かっ
て順次配設した構造としたので、洗浄水中のあらゆる不
純物を除去して水質を向上させ、洗浄水の循環再利用を
可能にし、コストの節減を図り、水質汚染をなくすこと
のできる。ADVANTAGE OF THE INVENTION According to the washing water circulation processing apparatus of the solder dipping machine of this invention, the washing water circulation path which makes the washing water discharge port of the washing apparatus which wash | cleans the electronic component of the solder dipping into a starting end, and the washing water supply port of a washing apparatus as an end. At least the washing water storage tank, circulation pump, impurity removing section for removing impurities in the washing water, and a sterilizing section for disinfecting microorganisms in the washing water are sequentially arranged toward the downstream side. It can be removed to improve water quality, enable the recycling and reuse of wash water, reduce costs and eliminate water pollution.
この場合、前記不純物除去部は、洗浄水中の不純物の
うち、粗成分を濾過するフィルタ、洗浄水中の不純物の
うち、微成分を吸着する活性炭吸着塔および洗浄水中の
不純物のうち、イオンを吸着除去するイオン交換樹脂塔
を下流側に向かって順次接続してなる構造とすれば、洗
浄水中に含有する不純物のうち、粗い粒子はもちろんイ
オン化した有機酸等の不純物をも除去することができ、
前記効果をより一層上げることができる。In this case, the impurity removing unit removes ions from impurities in the washing water by filtering a crude component, from among impurities in the washing water, from an activated carbon adsorption tower that absorbs fine components, and from impurities from the washing water. If the ion exchange resin tower is configured to be sequentially connected to the downstream side, it is possible to remove not only coarse particles but also impurities such as ionized organic acids among the impurities contained in the washing water,
The above effect can be further enhanced.
本発明の前記ならびにその他の目的と新規な特徴と
は、本明細書の記述および添付図面から明らかになるで
あろう。The above and other objects and novel features of the present invention will become apparent from the description of the present specification and the accompanying drawings.
〔実施例１〕 第１図は本発明の一実施例である半田ディップ機の洗
浄水循環処理装置を示す流れ図である。Embodiment 1 FIG. 1 is a flowchart showing a cleaning water circulation processing apparatus for a solder dip machine according to one embodiment of the present invention.
実施例における半田ディップ機の洗浄水循環処理装置
は、半田ディップ済の電子部品の洗浄に使用される洗浄
水中のあらゆる不純物を除去して洗浄水の循環再利用を
可能にしたものである。The cleaning water circulation processing apparatus of the solder dipping machine in the embodiment removes any impurities in the cleaning water used for cleaning the solder-dipped electronic components, thereby enabling the circulation and reuse of the cleaning water.
詳しくは、半田ディップ機の洗浄水循環処理装置は、
洗浄装置１の洗浄水排出口２を始端とし、洗浄装置１の
洗浄水供給口３を終端とする洗浄水循環経路４を有して
いる。Specifically, the cleaning water circulation treatment device of the solder dip machine
A cleaning water circulation path 4 has a cleaning water discharge port 2 of the cleaning device 1 as a starting point and a cleaning water supply port 3 of the cleaning device 1 as a terminal.
この洗浄水循環経路４には、上流側に２方向にソレノ
イドバルブ５を介して洗浄水貯留槽としての原水槽６が
設けられている。In the washing water circulation path 4, a raw water tank 6 as a washing water storage tank is provided on the upstream side via a solenoid valve 5 in two directions.
この原水槽６との間に供給ポンプP1を介在させて予備
槽７が接続され、この予備槽７内に第１のフロートスイ
ッチFS1が設けられ、原水槽６内には第１および第２の
フロートスイッチFS1,FS2が設けられている。第１のフ
ロートスイッチFS1はローレベルの位置に設定されて貯
留水の不足を検知し、第２のフロートスイッチFS2はハ
イレべルの位置に設定されて貯留水の満水を検知する機
能を有する。The preliminary tank 7 is connected to the raw water tank 6 with a supply pump P1 interposed therebetween, and a first float switch FS1 is provided in the preliminary tank 7 and the first and second float switches FS1 are provided in the raw water tank 6. Float switches FS1 and FS2 are provided. The first float switch FS1 is set to a low level position to detect a shortage of stored water, and the second float switch FS2 is set to a high level position to detect a full level of the stored water.
前記異原水槽６との間に循環ポンプP2および圧力計８
を介在させてフィルタ９が接続され、このフィルタ９
は、ポリプロピレン繊維からなるカートリッジフィルタ
で、これに原水槽６からの洗浄水が通過する際、半田粒
等の粗い粒子が濾し分ける機能を有する。A circulation pump P2 and a pressure gauge 8
The filter 9 is connected with the filter 9 interposed therebetween.
Is a cartridge filter made of polypropylene fiber, and has a function of filtering coarse particles such as solder particles when washing water from the raw water tank 6 passes through the cartridge filter.
前記フィルタ９にカプラ10を介して第1,2および３の
活性炭吸着塔11a,11b,11cが順次接続され、これらの活
性炭吸着塔11a,11b,11cは内部に活性炭を充填した塔
で、これらにフィルタ９からの洗浄水が通過する際、ポ
リエチレングリコールや非イオン系界面活性剤等の比較
的分子量の大きい非イオン性の有機物を吸着除去する機
能を有する。First, second and third activated carbon adsorption towers 11a, 11b, 11c are sequentially connected to the filter 9 via a coupler 10, and these activated carbon adsorption towers 11a, 11b, 11c are towers filled with activated carbon therein. Has a function of adsorbing and removing nonionic organic substances having a relatively large molecular weight, such as polyethylene glycol and nonionic surfactants, when the washing water from the filter 9 passes through.
前記第３の活性炭吸着塔11cにカプラ12を介して陽イ
オン交換樹脂塔13が接続され、この陽イオン交換樹脂塔
13は、塔内に設けられた陽イオン交換樹脂に第３の活性
炭吸着塔11cからの洗浄水が通過する際、洗浄水中のア
ミンや鉛等の陽イオンを吸着除去する機能を有する。A cation exchange resin tower 13 is connected via a coupler 12 to the third activated carbon adsorption tower 11c.
Reference numeral 13 has a function of adsorbing and removing cations such as amines and lead in the washing water when the washing water from the third activated carbon adsorption tower 11c passes through the cation exchange resin provided in the tower.
前記陽イオン交換樹脂塔13にカプラ14を介して陰イオ
ン交換樹脂塔15が接続され、この陰イオン交換樹脂塔15
は、塔内に設けられた陰イオン交換樹脂に陽イオン交換
樹脂塔13からの洗浄水が通過する際、洗浄水中の有機酸
等の陰イオンを吸着除去する機能を有する。An anion exchange resin tower 15 is connected to the cation exchange resin tower 13 via a coupler 14, and this anion exchange resin tower 15
Has a function of adsorbing and removing anions such as organic acids in the wash water when the wash water from the cation exchange resin tower 13 passes through the anion exchange resin provided in the tower.
前記陰イオン交換樹脂塔15にカプラ16を介して殺菌塔
17が接続され、この殺菌塔17は内部に紫外線ランプを備
え、この紫外線ランプから照射される紫外線の殺菌作用
により洗浄水中の微生物を殺菌する機能を有する。Sterilization tower via coupler 16 to the anion exchange resin tower 15
The sterilization tower 17 is provided with an ultraviolet lamp therein, and has a function of sterilizing microorganisms in the wash water by a sterilizing action of ultraviolet light emitted from the ultraviolet lamp.
前記殺菌塔17は流量調整バルブ18を介して洗浄水循環
経路４の終端である洗浄装置１の洗浄水供給口３に接続
され、これにより、洗浄水はこれに含まれるあらゆる不
純物を除去した状態で洗浄装置１に再び循環供給される
ようになっている。The sterilization tower 17 is connected to the cleaning water supply port 3 of the cleaning device 1 which is the terminal of the cleaning water circulation path 4 via the flow control valve 18, so that the cleaning water is in a state where any impurities contained therein are removed. The cleaning device 1 is circulated and supplied again.
なお、19は予備槽７、原水槽６、洗浄水循環経路４の
途中に設けられる手動バルブで、洗浄水の排水あるいは
メンテナンスの際に使用されるものである。また、20は
陽イオンないし陰イオンの吸着除去の度合を示す電導度
を計測する電導度計、21は流量計である。Reference numeral 19 denotes a manual valve provided in the preliminary tank 7, the raw water tank 6, and the washing water circulation path 4, and is used for draining washing water or for maintenance. Reference numeral 20 denotes a conductivity meter for measuring the conductivity indicating the degree of cation or anion adsorption and removal, and reference numeral 21 denotes a flow meter.
次に、本実施例の作用を説明する。 Next, the operation of the present embodiment will be described.
洗浄装置１の洗浄水排出口２から排出される洗浄水に
おいては、不純物として有機酸、アミン、非イオン系界
面活性剤、ポリエチレングリコールおよび鉛が含まれて
いる。The cleaning water discharged from the cleaning water outlet 2 of the cleaning device 1 contains organic acids, amines, nonionic surfactants, polyethylene glycol and lead as impurities.
このような不純物を含有する洗浄水を洗浄装置１に循
環供給する場合、まず、洗浄装置１の洗浄水排出口２か
ら排出された洗浄水を原水槽６を経由してフィルタ９に
供給すると、フィルタ９では、ポリプロピレン繊維から
なるカートリッジフィルタにより、半田粒等の粗い粒子
が濾し分けられる。When circulating and supplying the cleaning water containing such impurities to the cleaning device 1, first, the cleaning water discharged from the cleaning water outlet 2 of the cleaning device 1 is supplied to the filter 9 via the raw water tank 6. In the filter 9, coarse particles such as solder particles are filtered out by a cartridge filter made of a polypropylene fiber.
次に、半田粒等の粗い粒子が濾し分けられた洗浄水を
第1,2および３の活性炭吸着塔11a,11b,11cに順次通過さ
せると、これらの活性炭吸着塔11a,11b,11cでは、洗浄
水の通過の際に、塔内に充填された活性炭に洗浄水中の
ポリエチレングリコールや非イオン系界面活性剤等の比
較的分子量の大きい非イオン性の有機物が吸着除去され
る。Next, when the washing water from which coarse particles such as solder particles were filtered out were sequentially passed through the first, second and third activated carbon adsorption towers 11a, 11b and 11c, these activated carbon adsorption towers 11a, 11b and 11c provided: When the washing water passes, non-ionic organic substances having a relatively large molecular weight, such as polyethylene glycol and a nonionic surfactant, in the washing water are adsorbed and removed by the activated carbon filled in the tower.
次に、非イオン性の有機物が吸着除去された洗浄水を
陽イオン交換樹脂塔13に通過させると、陽イオン交換樹
脂塔13では、陽イオン交換樹脂に洗浄水中のアミンや鉛
等の陽イオンが吸着除去される。Next, the washing water from which the nonionic organic substances have been adsorbed and removed is passed through the cation exchange resin tower 13. In the cation exchange resin tower 13, cations such as amines and lead in the washing water are added to the cation exchange resin. Is adsorbed and removed.
次に、アミンや鉛等の陽イオンが吸着除去された洗浄
水を陰イオン交換樹脂塔15に通過させると、陰イオン交
換樹脂塔15では、陰イオン交換樹脂に洗浄水中の有機酸
等の陰イオンが吸着除去される。Next, when washing water from which cations such as amines and lead are adsorbed and removed is passed through the anion exchange resin tower 15, anions such as organic acids in the wash water are applied to the anion exchange resin in the anion exchange resin tower 15. The ions are adsorbed and removed.
最後に、有機酸等の陰イオンが吸着除去された洗浄水
を殺菌塔17に通過させると、殺菌塔17では、紫外線ラン
プから照射される紫外線の殺菌作用により、洗浄水中の
微生物は殺菌除去される。Finally, when the washing water from which anions such as organic acids have been adsorbed and removed is passed through the sterilizing tower 17, microorganisms in the washing water are sterilized and removed by the sterilizing action of the ultraviolet light emitted from the ultraviolet lamp in the sterilizing tower 17. You.
このように洗浄水中に含有するあらゆる不純物を除去
することができ、これにより、洗浄水を再び洗浄装置１
に循環供給することができる。In this manner, any impurities contained in the cleaning water can be removed.
Can be circulated.
以上のような処理を行うことにより次の水質データか
らも明らかなように洗浄水の水質を向上させることがで
きる。By performing the above-described processing, the water quality of the cleaning water can be improved as apparent from the following water quality data.
また、このように洗浄水の水質を向上させることによ
り、洗浄水を循環させて再利用することができるばかり
でなく、コストの節減を図り、水質汚染をなくすことが
できる。 In addition, by improving the water quality of the cleaning water in this way, not only can the cleaning water be circulated and reused, but also the cost can be reduced and the water pollution can be eliminated.
本発明者によってなされた発明を実施例に基づき具体
的に説明したが、本発明は前記実施例に限定されるもの
でなく、その要旨を逸脱しない範囲で種々変更可能であ
ることはいうまでもない。Although the invention made by the inventor has been specifically described based on the embodiment, the present invention is not limited to the embodiment, and it is needless to say that various modifications can be made without departing from the gist of the invention. Absent.
たとえば、本実施例では、活性炭吸着塔を３塔直列に
接続した場合について説明したが、これに限らず、活性
炭吸着塔の塔数を必要に応じて増減させることもでき
る。For example, in this embodiment, the case where three activated carbon adsorption towers are connected in series has been described. However, the present invention is not limited to this, and the number of activated carbon adsorption towers can be increased or decreased as necessary.
また、本実施例では、排水ないしメンテナンス用の手
動バルブを設けた場合について説明したが、これに限ら
ず、この手動バルブに代えて２方向のソレノイドバルブ
を設けることもできる。Further, in this embodiment, the case where the manual valve for drainage or maintenance is provided is described. However, the present invention is not limited to this, and a two-way solenoid valve may be provided instead of the manual valve.
本願において開示される発明のうち、代表的なものに
よって得られる効果を簡単に説明すれば、下記のとおり
である。The effects obtained by typical aspects of the invention disclosed in the present application will be briefly described as follows.
（１）．半田ディップ済の電子部品を洗浄する洗浄装置
の洗浄水排出口を始端とし、洗浄装置の洗浄水供給口を
終端とする洗浄水循環経路に少なくとも洗浄水貯留槽、
循環ポンプ、洗浄水中の不純物を除去する不純物除去部
および洗浄水中の微生物を殺菌する殺菌部を下流側に向
かって順次配設した構造としたので、洗浄水中のあらゆ
る不純物を除去して水質を向上させ、洗浄水の循環再利
用を可能にし、コストの節減を図り、水質汚染をなくす
ことができる。(1). At least a washing water storage tank is provided in a washing water circulation path starting with a washing water discharge port of a washing device for washing solder-dipped electronic components and ending with a washing water supply port of the washing device.
A circulating pump, an impurity removal section that removes impurities in the wash water, and a sterilization section that sterilizes microorganisms in the wash water are sequentially arranged downstream, so that all impurities in the wash water are removed to improve water quality. As a result, it is possible to reuse and reuse the washing water, reduce costs and eliminate water pollution.
（２）．前記（１）の場合、前記不純物除去部は、洗浄
水中の不純物のうち、粗成分を濾過するフィルタ、洗浄
水中の不純物のうち、微成分を吸着する活性炭吸着塔お
よび洗浄水中の不純物のうち、イオンを吸着除去するイ
オン交換樹脂塔を下流側に向かって順次接続してなる構
造とすれば、洗浄水中に含有する不純物のうち、粗い粒
子はもちろんイオン化した有機酸等の不純物も除去する
ことができ、前記効果をより一層上げることができる。(2). In the case of the above (1), the impurity removing unit includes: a filter for filtering a coarse component among impurities in the wash water; an impurity in the activated carbon adsorption tower for absorbing a fine component among impurities in the wash water; and an impurity in the wash water. If the ion exchange resin tower that adsorbs and removes ions is configured to be connected sequentially toward the downstream side, of the impurities contained in the washing water, not only coarse particles but also impurities such as ionized organic acids can be removed. The above effects can be further enhanced.
【図面の簡単な説明】 第１図は本発明の一実施例である半田ディップ機の洗浄
水循環処理装置を示す流れ図である。 １……洗浄装置、 ２……洗浄水排出口、 ３……洗浄水供給口、 ４……洗浄水循環経路、 ５……ソレノイドバルブ、 ６……原子槽、 ７……予備槽、 ８……圧力計、 ９……フィルタ、 10……カプラ、 11a……第１の活性炭吸着塔、 11b……第２の活性炭吸着塔、 11c……第３の活性炭吸着塔、 12……カプラ、 13……陽イオン交換樹脂塔、 14……カプラ、 15……陰イオン交換樹脂塔、 16……カプラ、 17……殺菌塔、 18……流量調整バルブ、 19……手動バルブ、 20……電導度計、 21……流量計、 P1……供給ポンプ、 P2……循環ポンプ、 FS1……第１のフロートスイッチ、 FS2……第２のフロートスイッチ。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a flow chart showing a cleaning water circulation processing apparatus for a solder dip machine according to one embodiment of the present invention. 1 ... cleaning device, 2 ... cleaning water outlet, 3 ... cleaning water supply port, 4 ... cleaning water circulation path, 5 ... solenoid valve, 6 ... atomic tank, 7 ... preliminary tank, 8 ... Pressure gauge, 9 ... Filter, 10 ... Coupler, 11a ... First activated carbon adsorption tower, 11b ... Second activated carbon adsorption tower, 11c ... Third activated carbon adsorption tower, 12 ... Coupler, 13 ... ... Cation exchange resin tower, 14 ... coupler, 15 ... anion exchange resin tower, 16 ... coupler, 17 ... sterilization tower, 18 ... flow control valve, 19 ... manual valve, 20 ... conductivity Meter, 21 ... Flow meter, P1 ... Supply pump, P2 ... Circulation pump, FS1 ... First float switch, FS2 ... Second float switch.
Claims (1)
装置の洗浄水排出口を始端とし、洗浄装置の洗浄水供給
口を終端とする洗浄水循環経路に少なくとも洗浄水貯留
槽、循環ポンプ、洗浄水中の不純物を除去する不純物除
去部および洗浄水中の微生物を殺菌する殺菌部を下流側
に向かって順次配設し、前記不純物除去部は、洗浄水中
の不純物のうち、粗成分を濾過するフィルタ、洗浄水中
の不純物のうち、微成分を吸着する活性炭吸着塔および
洗浄水中の不純物のうち、イオンを吸着除去するイオン
交換樹脂塔を下流側に向かって順次接続してなることを
特徴とする半田ディップ機の洗浄水循環処理装置。1. A cleaning water circulation path, which has a cleaning water discharge port of a cleaning device for cleaning solder-dipped electronic components as a starting point and a cleaning water supply port of the cleaning device as a terminal end, at least a cleaning water storage tank, a circulation pump, and a cleaning device. An impurity removing unit for removing impurities in the water and a sterilizing unit for sterilizing microorganisms in the washing water are sequentially disposed toward the downstream side, and the impurity removing unit is a filter for filtering coarse components of impurities in the washing water, A solder dip characterized by sequentially connecting an activated carbon adsorption tower that adsorbs fine components among the impurities in the wash water and an ion exchange resin tower that adsorbs and removes ions among the impurities in the wash water toward the downstream side. Washing water circulation treatment equipment for the machine.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1337673A JP2968809B2 (en) | 1989-12-26 | 1989-12-26 | Cleaning water circulation treatment equipment for solder dip machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1337673A JP2968809B2 (en) | 1989-12-26 | 1989-12-26 | Cleaning water circulation treatment equipment for solder dip machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03196890A JPH03196890A (en) | 1991-08-28 |
| JP2968809B2 true JP2968809B2 (en) | 1999-11-02 |
Family
ID=18310882
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1337673A Expired - Lifetime JP2968809B2 (en) | 1989-12-26 | 1989-12-26 | Cleaning water circulation treatment equipment for solder dip machine |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2968809B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2711129B1 (en) * | 1993-10-12 | 1996-02-02 | Aerospatiale | Washing water treatment and recycling station for a washing machine. |
| CN105238931B (en) * | 2015-10-27 | 2017-03-29 | 盛隆资源再生（无锡）有限公司 | A kind of evaporated mother liquor continuous washing piece-rate system of spent solder stripper and its using method |
| KR20230164193A (en) * | 2017-10-31 | 2023-12-01 | 가부시키가이샤 기츠 | Washing water treatment method |
| CN109835965A (en) * | 2019-03-07 | 2019-06-04 | 安徽华星化工有限公司 | A kind of abraum salt active carbon for refining adsorbent equipment |
-
1989
- 1989-12-26 JP JP1337673A patent/JP2968809B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03196890A (en) | 1991-08-28 |
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