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JP2804453B2 - Sealing solution for gold-plated material and sealing method using the same - Google Patents

Sealing solution for gold-plated material and sealing method using the same

Info

Publication number
JP2804453B2
JP2804453B2 JP6576495A JP6576495A JP2804453B2 JP 2804453 B2 JP2804453 B2 JP 2804453B2 JP 6576495 A JP6576495 A JP 6576495A JP 6576495 A JP6576495 A JP 6576495A JP 2804453 B2 JP2804453 B2 JP 2804453B2
Authority
JP
Japan
Prior art keywords
sealing
alkyl
gold
general formula
following general
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP6576495A
Other languages
Japanese (ja)
Other versions
JPH08260194A (en
Inventor
篤志 児玉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Mining Holdings Inc
Original Assignee
Nippon Mining and Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining and Metals Co Ltd filed Critical Nippon Mining and Metals Co Ltd
Priority to JP6576495A priority Critical patent/JP2804453B2/en
Priority to US08/556,569 priority patent/US5650088A/en
Publication of JPH08260194A publication Critical patent/JPH08260194A/en
Application granted granted Critical
Publication of JP2804453B2 publication Critical patent/JP2804453B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、鉄合金、鉄、ステンレ
ス鋼、高ニッケル合金等の金属材料のニッケルまたはニ
ッケル含有合金めっきを下地として具備する金または金
合金めっき材の封孔処理液および封孔処理方法に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sealing solution for a gold or gold alloy plating material provided with nickel or nickel-containing alloy plating of a metal material such as an iron alloy, iron, stainless steel, a high nickel alloy or the like as a base. The present invention relates to a sealing method.

【0002】[0002]

【従来の技術】電子機器用接続部品であるコネクタに
は、黄銅やりん青銅にニッケル下地めっきを施し、さら
にその上に金めっきを施した材料が一般に使用される。
しかし金は高価であるために、コネクタ製造コストを下
げる目的で様々な方法が採られている。その代表的な方
法が金めっきの厚みを下げる方法であるが、金めっき厚
を薄くするとともに、皮膜のピンホールが指数関数的に
増え、耐食性が著しく低下するという問題を抱えてい
る。この問題を解決する方法のひとつに封孔処理があ
る。すなわち、各種の無機あるいは有機性の薬品で金め
っき表面を処理し、ピンホールを塞ぎ、耐食性を向上さ
せようとするものである。封孔処理液には有機系と水系
の2種類がある。有機系では溶媒としてハロゲン系有機
溶剤が一般に使用されているため、オゾン層破壊などの
問題で現在有機系封孔処理液の使用は大きく制限されて
いる。一方水系では溶媒として水を使用するため環境汚
染の点で問題はないが、従来の有機系封孔処理液に使用
されている水に難溶性のパラフィン等の潤滑剤が使用で
きないため、水系で処理しためっきは潤滑性が低く、コ
ネクタの耐久性が溶剤系よりも劣るという問題があっ
た。
2. Description of the Related Art In general, a connector which is a connecting part for electronic equipment is made of a material in which brass or phosphor bronze is plated with nickel and further plated with gold.
However, gold is expensive, and various methods have been adopted for the purpose of reducing connector manufacturing costs. A typical method is to reduce the thickness of the gold plating, but there is a problem that the thickness of the gold plating is reduced, the number of pinholes in the film increases exponentially, and the corrosion resistance is significantly reduced. One of the methods for solving this problem is a sealing treatment. That is, the surface of the gold plating is treated with various inorganic or organic chemicals to close the pinholes and improve the corrosion resistance. There are two types of sealing liquids, organic and aqueous. In the organic system, a halogen-based organic solvent is generally used as a solvent. Therefore, the use of the organic sealing solution is greatly restricted at present due to problems such as destruction of the ozone layer. On the other hand, water-based solvents use water as a solvent, so there is no problem in terms of environmental pollution.However, since lubricants such as paraffin, which is hardly soluble in water used in conventional organic sealing liquids, cannot be used, water-based solvents cannot be used. The treated plating has a problem that lubricity is low and the durability of the connector is inferior to that of the solvent type.

【0003】[0003]

【発明が解決しようとする課題】そこで環境汚染性に問
題なく、かつ従来と同等もしくはそれ以上の封孔処理効
果を有する封孔処理液および封孔処理方法が必要となっ
ている。本発明は、このような要求を満たすことのでき
る改善された封孔処理液およびそれを用いる封孔処理方
法を提供することを目的としたものである。
Therefore, there is a need for a sealing solution and a sealing method which have no problem in environmental pollution and have a sealing effect equal to or higher than the conventional one. An object of the present invention is to provide an improved sealing treatment solution that can satisfy such a demand and a sealing treatment method using the same.

【0004】[0004]

【課題を解決するための手段】上記問題点を解決するた
めに本発明者が研究を行った結果、以下に示す表面処理
液および方法を発明するに至った。すなわち本発明は、 (1)金属材料にニッケルまたはニッケルを含有する合
金を下地めっきとして具備する金または金合金めっき材
の封孔処理液であって、インヒビターとして一般式
(1)で示されるベンゾトリアゾール系化合物、一般式
(2)で示されるメルカプトベンゾチアゾール系化合
物、及び一般式(3)で示されるトリアジン系化合物か
らなる群から選ばれた1種もしくは2種以上合計で0.
001〜1wt%含有し、潤滑剤として下記一般式
(4)で示される脂肪酸を1種もしくは2種以上合計で
0.05〜2wt%含有し、乳化剤として一般式(5)
で示されるモノアルキルりん酸エステル、及び一般式
(6)で示されるジアルキルりん酸エステルからなる群
から選ばれた1種もしくは2種合計で0.05〜2wt
%含有することを特徴とする封孔処理液。
Means for Solving the Problems As a result of research conducted by the present inventors to solve the above problems, the following surface treatment liquid and method have been invented. That is, the present invention provides: (1) a sealing solution for gold or a gold alloy plating material having nickel or an alloy containing nickel as a base plating as a metal material, wherein the benzol represented by the general formula (1) is used as an inhibitor. One or more selected from the group consisting of a triazole compound, a mercaptobenzothiazole compound represented by the general formula (2), and a triazine compound represented by the general formula (3).
001 to 1% by weight, one or two or more fatty acids represented by the following general formula (4) as a lubricant are contained in a total of 0.05 to 2% by weight, and an emulsifier is represented by a general formula (5)
And a total of one or two selected from the group consisting of monoalkyl phosphates represented by the formula (1) and dialkyl phosphates represented by the formula (6): 0.05 to 2 wt.
% Of the sealing liquid.

【0005】[0005]

【化5】 Embedded image

【0006】(式中、R1は水素、アルキル、置換アル
キルを表わし、R2はアルカリ金属、水素、アルキル、
置換アルキルを表わす)
Wherein R 1 represents hydrogen, alkyl, or substituted alkyl, and R 2 represents an alkali metal, hydrogen, alkyl,
Represents a substituted alkyl)

【0007】[0007]

【化6】 Embedded image

【0008】(式中、R3はアルカリ金属又は水素を表
わす)
(Wherein R 3 represents an alkali metal or hydrogen)

【0009】[0009]

【化7】 Embedded image

【0010】〔式中、R4は−SH,アルキル基かアリ
ール基で置換されたアミノ基、又はアルキル置換イミダ
ゾリルアルキル、R5,R6は−NH2,−SH又は−S
M(Mはアルカリ金属を表わす)を表わす〕 潤滑剤として下記一般式(4)で示される脂肪酸を1種
もしくは2種以上合計で0.05〜2wt%含有し、 R7−COOH (4) (式中、R7は炭素数10〜20個の飽和及び不飽和鎖
式炭化水素を表わす) 乳化剤として下記一般式(5)で示されるモノアルキル
りん酸エステル、及び下記一般式(6)で示されるジア
ルキルりん酸エステルからなる群から選ばれた1種もし
くは2種合計で0.05〜2wt%含有することを特徴
とする封孔処理液。
Wherein R 4 is —SH, an amino group substituted with an alkyl group or an aryl group, or an alkyl-substituted imidazolyl alkyl, and R 5 and R 6 are —NH 2 , —SH or —S
M (M represents an alkali metal)] As a lubricant, one or more fatty acids represented by the following general formula (4) are contained in an amount of 0.05 to 2 wt% in total, and R 7 -COOH (4) (Wherein, R 7 represents a saturated or unsaturated chain hydrocarbon having 10 to 20 carbon atoms) As an emulsifier, a monoalkyl phosphate represented by the following general formula (5) and a compound represented by the following general formula (6) A pore-sealing solution containing 0.05 to 2 wt% in total of one or two selected from the group consisting of the dialkyl phosphates shown below.

【0011】[0011]

【化8】 Embedded image

【0012】(式中、R8はアルキル、置換アルキルを
表わし、Mは水素、アルカリ金属を表わす) (2)金属材料にニッケルまたはニッケルを含有する合
金を下地めっきとして具備する金または金合金めっき材
に、請求項1に記載の封孔処理液を塗布することを特徴
とする封孔処理方法。 (3)金属材料にニッケルまたはニッケルを含有する合
金を下地めっきとして具備する金または金合金めっき材
を加工後、前記(1)に記載の封孔処理液を塗布するこ
とを特徴とする封孔処理方法である。
(Wherein, R 8 represents alkyl or substituted alkyl, M represents hydrogen or an alkali metal) (2) Gold or gold alloy plating provided with nickel or an alloy containing nickel as a metal material as a base plating A sealing treatment method comprising applying the sealing treatment liquid according to claim 1 to a material. (3) Sealing characterized by applying a sealing treatment liquid according to (1) above, after processing gold or a gold alloy plating material having nickel or an alloy containing nickel as a base plating as a metal material, Processing method.

【0013】本発明の封孔処理液の第一の必須成分であ
るインヒビターは以下に示される化合物、すなわちベン
ゾトリアゾール系化合物、メルカプトベンゾチアゾール
系化合物、トリアジン系化合物の中から1種もしくは2
種以上選択され、処理液に添加される。これらのインヒ
ビターは、金めっきのピンホール内部の下地金属である
ニッケルと反応して錯化合物を生成し、この錯化合物に
よりピンホールが埋められるので、結果的に金めっきの
耐食性は向上する。本発明に使用されるベンゾトリアゾ
ール系化合物は一般式(1)
The inhibitor, which is the first essential component of the pore-sealing solution of the present invention, is one or two of the following compounds, ie, benzotriazole-based compounds, mercaptobenzothiazole-based compounds, and triazine-based compounds.
At least one species is selected and added to the processing solution. These inhibitors react with nickel, which is a base metal in the gold plated pinhole, to form a complex compound, and the complex compound fills the pinhole, thereby improving the corrosion resistance of the gold plating. The benzotriazole compound used in the present invention has the general formula (1)

【0014】[0014]

【化9】 Embedded image

【0015】(式中、R1は水素、アルキル、置換アル
キルを表わし、R2はアルカリ金属、水素、アルキル、
置換アルキルを表わす)で表わされる。この一般式
(1)で表わされる化合物のうち好ましいものを挙げる
と、例えば、ベンゾトリアゾール(R1,R2とも水
素)、1−メチルベンゾトリアゾール(R1が水素、R2
がメチル)、トリルトリアゾール(R1がメチル、R2
水素)、1−(N,N−ジオクチルアミノメチル)ベン
ゾトリアゾール(R1が水素、R2がN,N−ジオクチル
アミノメチル)などである。
(Wherein, R 1 represents hydrogen, alkyl, or substituted alkyl, and R 2 represents an alkali metal, hydrogen, alkyl,
Represents a substituted alkyl). Preferred examples of the compound represented by the general formula (1) include, for example, benzotriazole (both R 1 and R 2 are hydrogen), 1-methylbenzotriazole (R 1 is hydrogen, R 2
There methyl), tolyltriazole (R 1 is methyl, R 2 is hydrogen), 1-(N, N-dioctyl amino methyl) benzotriazole (R 1 is hydrogen, R 2 is N, N-dioctyl amino methyl), etc. is there.

【0016】本発明に使用されるメルカプトベンゾチア
ゾール系化合物は一般式(2)
The mercaptobenzothiazole compound used in the present invention has the general formula (2)

【0017】[0017]

【化10】 Embedded image

【0018】(式中、R3はアルカリ金属又は水素を表
わす)で表わされる。この一般式(2)で表わされる化
合物のうち好ましいものを挙げると、例えばメルカプト
ベンゾチアゾール、メルカプトベンゾチアゾールのナト
リウム塩、メルカプトベンゾチアゾールのカリウム塩な
どがある。一般式(2)においてR3がアルカリ金属の
場合メルカプトベンゾチアゾール系化合物の水への溶解
が容易となる。トリアジン系化合物は一般式(3)
Wherein R 3 represents an alkali metal or hydrogen. Preferred examples of the compound represented by formula (2) include mercaptobenzothiazole, sodium salt of mercaptobenzothiazole, and potassium salt of mercaptobenzothiazole. When R 3 is an alkali metal in the general formula (2), the mercaptobenzothiazole-based compound can be easily dissolved in water. The triazine compound has the general formula (3)

【0019】[0019]

【化11】 Embedded image

【0020】〔式中、R4は−SH、アルキル基かアリ
ール基で置換されたアミノ基、又はアルキル置換イミダ
ゾリルアルキル、R5、R6は−NH2、−SH又は−S
M(Mはアルカリ金属を表わす)を表わす〕で表わされ
る。この一般式(3)で表わされる化合物のうち好まし
いものを挙げると例えば以下のものがある。
Wherein R 4 is —SH, an amino group substituted with an alkyl group or an aryl group, or an alkyl-substituted imidazolyl alkyl, and R 5 and R 6 are —NH 2 , —SH or —S
M (M represents an alkali metal)]. Preferred examples of the compound represented by the general formula (3) include the following.

【0021】[0021]

【化12】 Embedded image

【0022】あるいはこれらのNaまたはKなどのアル
カリ金属塩がある。一般式(3)においてR5,R6が−
SMである場合にはトリアジン系化合物の水への溶解が
容易となる。インヒビターの添加量は0.001〜1w
t%の範囲であり、0.001wt%未満では封孔処理
効果が認められず、1wt%を越えると接触抵抗への悪
影響が認められる。本発明の封孔処理液の第二の必須成
分である潤滑剤は、脂肪酸のなかから1種もしくは2種
以上選択され、処理液に添加され、金めっき材の潤滑性
向上に寄与する。本発明に使用される脂肪酸は一般式
(4) R7−COOH (4) (式中、R7は炭素数10〜20個の飽和及び不飽和鎖
式炭化水素を表わす)で表わされる。この一般式(4)
で表わされる化合物のうち好ましいものを挙げると、例
えばラウリン酸、ミリスチン酸、パルミチン酸、ステア
リン酸、オレイン酸、リノール酸などである。添加量は
合計で0.05wt%〜2wt%の範囲であり、0.0
5wt%未満では潤滑効果が得られず、2wt%を越え
ると封孔処理後の材料の外観への悪影響が認められる。
Alternatively, there is an alkali metal salt such as Na or K. In the general formula (3), R 5 and R 6 are-
In the case of SM, the triazine compound can be easily dissolved in water. 0.001-1 w of inhibitor
When the content is less than 0.001 wt%, no sealing effect is recognized, and when it exceeds 1 wt%, an adverse effect on contact resistance is recognized. The lubricant, which is the second essential component of the sealing treatment liquid of the present invention, is selected from one or more fatty acids, and is added to the treatment liquid to contribute to improving the lubricity of the gold-plated material. The fatty acid used in the present invention is represented by the general formula (4) R 7 —COOH (4) (where R 7 represents a saturated or unsaturated chain hydrocarbon having 10 to 20 carbon atoms). This general formula (4)
Preferred examples of the compound represented by are lauric acid, myristic acid, palmitic acid, stearic acid, oleic acid, linoleic acid and the like. The addition amount is in the range of 0.05 wt% to 2 wt% in total,
If it is less than 5 wt%, the lubricating effect cannot be obtained, and if it exceeds 2 wt%, an adverse effect on the appearance of the material after the sealing treatment is recognized.

【0023】本発明の第三の必須成分である乳化剤は以
下に示される化合物、すなわちモノアルキルりん酸エス
テル、ジアルキルりん酸エステルのなかから1種もしく
は2種以上選択添加され、処理液に添加され、潤滑剤の
乳化剤としての機能をはたす。さらに乳化剤には潤滑作
用もある。本発明に使用されるモノアルキルりん酸エス
テルは、一般式(5)
The emulsifier, which is the third essential component of the present invention, is selected from one or more of the following compounds, ie, monoalkyl phosphates and dialkyl phosphates, and is added to the treatment solution. It functions as a lubricant emulsifier. In addition, the emulsifier has a lubricating effect. The monoalkyl phosphate used in the present invention has the general formula (5)

【0024】[0024]

【化13】 Embedded image

【0025】(式中、R8はアルキル、置換アルキルを
表わし、Mは水素、アルカリ金属を表わす)で表わされ
る。一般式(5)で表わされる化合物のうち好ましいも
のを挙げるとラウリル酸性りん酸モノエステルなどがあ
る。
(Wherein, R 8 represents alkyl or substituted alkyl, and M represents hydrogen or an alkali metal). Preferred examples of the compound represented by the general formula (5) include lauryl acid monophosphate.

【0026】ジアルキルりん酸エステルは、一般式
(6)
The dialkyl phosphate is represented by the general formula (6)

【0027】[0027]

【化14】 Embedded image

【0028】(式中、R8はアルキル、置換アルキルを
表わし、Mは水素、アルカリ金属を表わす)で表わされ
る。一般式(6)で表わされる化合物のうち好ましいも
のを挙げると、ラウリル酸性ジりん酸エステルなどがあ
る。乳化剤の添加量は0.05wt〜2wt%の範囲で
あり、0.05wt%未満では乳化効果が得られず、2
wt%を越えるとはんだ付け性への悪影響が認められ
る。封孔処理液は上述の成分を有するが、溶媒としては
水またはエタノール、アセトン、ノルマルパラフィン等
のハロゲンを含まない有機溶剤から適宜選択できる。し
かし経済性や引火性などを考慮すると、溶媒としては水
が最適である。溶媒が水の場合は、溶液の温度を40〜
80℃に加熱すると成分の水への乳化がより速やかにな
り、さらに処理後の材料の乾燥が容易になる。
(Wherein, R 8 represents alkyl or substituted alkyl, and M represents hydrogen or an alkali metal). Preferred examples of the compound represented by the general formula (6) include lauryl acid diphosphate. The addition amount of the emulsifier is in the range of 0.05 wt% to 2 wt%.
If it exceeds wt%, an adverse effect on solderability is observed. The sealing treatment liquid has the above-described components, and the solvent can be appropriately selected from water or an organic solvent containing no halogen such as ethanol, acetone, and normal paraffin. However, considering economics and flammability, water is the most suitable solvent. If the solvent is water, adjust the temperature of the solution to 40-
Heating to 80 ° C facilitates emulsification of the components in water and further facilitates drying of the processed material.

【0029】処理方法としては、めっき品を処理液中に
浸漬するか、処理液をスプレー、あるいは塗布するな
ど、いずれの方法によることもできる。しかし本発明に
おいて、めっき品の形状が板・条、プレス部品であるを
問わず、めっき直後すなわち連続ラインであれば、その
ラインの中で処理することが、封孔処理の各種機能を高
める効果が高いことを見出した。さらにめっき品をプレ
スなどの加工後に本発明の封孔処理液で封孔処理するこ
とも有効である。めっき後封孔処理した金属材料であっ
ても、その後のプレス加工で付着したプレス油を洗浄す
る工程において、封孔処理の機能の多くは喪失する。そ
こで再度の封孔処理が有効となる。
As the treatment method, any method such as immersing the plated product in the treatment solution, spraying or applying the treatment solution can be used. However, in the present invention, regardless of the shape of the plated product, whether it is a plate, a strip, or a pressed part, if it is immediately after plating, that is, if it is a continuous line, processing in that line enhances various functions of the sealing process. Was found to be high. It is also effective to seal the plated product with the sealing solution of the present invention after processing such as pressing. Even with a metal material that has been sealed after plating, many of the functions of the sealing process are lost in the step of cleaning the press oil that has adhered in the subsequent press working. Therefore, the re-sealing process is effective.

【0030】[0030]

【実施例】以下に実施例を挙げて本発明を詳細に説明す
る。バネ用りん青銅(C5210)の厚み0.2mmの
冷間圧延材を用い、雄及び雌の連続端子をそれぞれプレ
ス成形した。これらをリール・ツウ・リールの連続めっ
きラインを通して電気めっきを施した。めっきラインに
おいては、脱脂、酸洗後、ワット浴による1μmのニッ
ケルめっき、あるいはアルカリ浴による0.5μmのP
d80%−Ni20%合金めっきを行い。その上に金あ
るいは金−コバルト合金を0.1μmの厚みで接点部に
めっきした。また、連続めっきラインでは金めっき後に
封孔処理工程を設け、連続端子を通入し浸漬させること
により封孔処理を施した。なお封孔処理液の溶媒にはイ
オン交換水を使用し、溶液温度を60℃にした。こうし
て封孔処理をした雄と雌の端子をキャリアー部から切断
しリード線を圧着した後、それぞれを嵌合し評価試験に
供した。
The present invention will be described in detail below with reference to examples. Male and female continuous terminals were each press-formed using a cold-rolled material of spring phosphor bronze (C5210) having a thickness of 0.2 mm. These were electroplated through a reel-to-reel continuous plating line. In the plating line, after degreasing and pickling, nickel plating of 1 μm in a Watts bath or P plating of 0.5 μm in an alkaline bath
d80% -Ni20% alloy plating is performed. Then, gold or a gold-cobalt alloy was plated on the contact portion with a thickness of 0.1 μm. In the continuous plating line, a sealing treatment step was provided after gold plating, and the sealing treatment was performed by penetrating and immersing the continuous terminals. In addition, ion-exchange water was used as a solvent of the sealing treatment liquid, and the solution temperature was set to 60 ° C. The thus-sealed male and female terminals were cut from the carrier portion, and the lead wires were crimped. Then, they were fitted and subjected to an evaluation test.

【0031】接触抵抗は直流10mA、開放電圧200
mVで測定した。潤滑性は処理後のコネクタ端子の挿抜
力で評価した。耐食性は以下の条件で亜硫酸ガス腐食試
験を行い、試験後の試料の表面観察と接触抵抗測定によ
り評価した。 ガス組成:SO2 10ppm 温度:40±2℃ 湿度:80±5%RH 時間:240時間 封孔処理液の成分と、封孔処理後のサンプルの試験結果
を表1に示す。
The contact resistance is DC 10 mA, open voltage 200.
It was measured in mV. Lubricity was evaluated by the insertion / extraction force of the connector terminal after the treatment. The corrosion resistance was evaluated by performing a sulfurous acid gas corrosion test under the following conditions and observing the surface of the sample after the test and measuring the contact resistance. Gas composition: SO 2 10 ppm Temperature: 40 ± 2 ° C. Humidity: 80 ± 5% RH Time: a 240-hour sealing treatment solution components, the test results of the sample after the sealing treatment are shown in Table 1.

【0032】[0032]

【表1】 [Table 1]

【0033】注1)ただし、表中封孔処理液の略号は以
下のとおりである。 A−1 ベンゾトリアゾール A−2 メルカプトベンゾチアゾールのナトリウム塩 A−3 1,3,5−トリアジンチオールのナトリウム
塩 B−1 オレイン酸 C−1 ラウリル酸性りん酸モノエステル(りん酸モノ
ラウリルエステル) C−2 ラウリル酸性りん酸ジエステル(りん酸ジラウ
リルエステル) 注2)試験の判断基準 (1)初期接触抵抗、腐食試験後の接触抵抗 ○:10mΩ以下 △:10〜20mΩ ×:20mΩ以上 (2)腐食試験後の外観 ○:50倍拡大写真の5cm角の範囲において、腐食点
の数が10個以下 △:50倍拡大写真の5cm角の範囲において、腐食点
の数が10〜50個 ×:50倍拡大写真の5cm角の範囲において、腐食点
の数が50個以上 (3)潤滑性(挿抜力) ○:1ピンあたりの挿入力100g以下、抜去力50g
以下 △:1ピンあたりの挿入力100〜150g、抜去力5
0〜100g ×:1ピンあたりの挿入力150g以上、抜去力100
g以上
Note 1) However, the abbreviations of the sealing solution in the table are as follows. A-1 Benzotriazole A-2 Sodium salt of mercaptobenzothiazole A-3 Sodium salt of 1,3,5-triazinethiol B-1 Oleic acid C-1 Lauryl acid phosphate monoester (monolauryl phosphate) C -2 Lauryl acid phosphate diester (dilauryl phosphate) Note 2) Test criteria (1) Initial contact resistance, contact resistance after corrosion test ○: 10 mΩ or less △: 10 to 20 mΩ ×: 20 mΩ or more (2) Appearance after corrosion test :: Number of corrosion points is 10 or less in 5 cm square area of 50 × enlarged photograph Δ: 10 to 50 corrosion points in 5 cm square area of 50 × enlarged photograph ×: The number of corrosion points is 50 or more in the range of 5 cm square of the 50 × enlarged photograph. (3) Lubricity (insertion / extraction force) ○: Insertion force per pin is 100 g or less Removal force 50g
Below △: Insertion force per pin: 100 to 150 g, removal force: 5
0 to 100 g ×: Insertion force per pin is 150 g or more, withdrawal force 100
g or more

【0034】[0034]

【発明の効果】以上説明したように、本発明の封孔処理
液は環境を汚染する物質を含まず、しかもこの液で処理
された金および金合金めっき材は、優れた耐食性と潤滑
性を有する。
As described above, the sealing solution of the present invention does not contain substances that pollute the environment, and the gold and gold alloy plated material treated with this solution has excellent corrosion resistance and lubricity. Have.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平5−311489(JP,A) 特開 平5−311491(JP,A) 特開 平5−311492(JP,A) 特開 平4−159375(JP,A) 特開 平4−160186(JP,A) 特開 平3−215697(JP,A) 特開 平4−160189(JP,A) 特開 平4−160190(JP,A) 特開 平4−160182(JP,A) 特開 平5−311485(JP,A) 特開 平7−258894(JP,A) 特開 平7−258887(JP,A) (58)調査した分野(Int.Cl.6,DB名) C25D 5/00 - 7/12────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-5-311489 (JP, A) JP-A-5-311491 (JP, A) JP-A-5-311492 (JP, A) JP-A-4-111 159375 (JP, A) JP-A-4-160186 (JP, A) JP-A-3-215697 (JP, A) JP-A-4-160189 (JP, A) JP-A-4-160190 (JP, A) JP-A-4-160182 (JP, A) JP-A-5-311485 (JP, A) JP-A-7-258894 (JP, A) JP-A-7-258887 (JP, A) (58) Fields investigated (Int.Cl. 6 , DB name) C25D 5/00-7/12

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 金属材料にニッケルまたはニッケルを含
有する合金を下地めっきとして具備する金または金合金
めっき材の封孔処理液であって、インヒビターとして下
記一般式(1)で示されるベンゾトリアゾール系化合
物、下記一般式(2)で示されるメルカプトベンゾチア
ゾール系化合物、及び下記一般式(3)で示されるトリ
アジン系化合物からなる群から選ばれた1種もしくは2
種以上合計で0.001〜1wt%含有し、 【化1】 (式中、R1は水素、アルキル、置換アルキルを表わ
し、R2はアルカリ金属、水素、アルキル、置換アルキ
ルを表わす) 【化2】 (式中、R3はアルカリ金属又は水素を表わす) 【化3】 〔式中、R4は−SH,アルキル基かアリール基で置換
されたアミノ基、又はアルキル置換イミダゾリルアルキ
ル、R5,R6は−NH2,−SH又は−SM(Mはアル
カリ金属を表わす)を表わす〕 潤滑剤として下記一般式(4)で示される脂肪酸を1種
もしくは2種以上合計で0.05〜2wt%含有し、 R7−COOH (4) (式中、R7は炭素数10〜20個の飽和及び不飽和鎖
式炭化水素を表わす) 乳化剤として下記一般式(5)で示されるモノアルキル
りん酸エステル、及び下記一般式(6)で示されるジア
ルキルりん酸エステルからなる群から選ばれた1種もし
くは2種合計で0.05〜2wt%含有することを特徴
とする封孔処理液。 【化4】 (式中、R8はアルキル、置換アルキルを表わし、Mは
水素、アルカリ金属を表わす)
1. A sealing solution for a gold or gold alloy plating material comprising nickel or an alloy containing nickel as an undercoat as a metal material, wherein a benzotriazole-based inhibitor represented by the following general formula (1) is used as an inhibitor. One or two selected from the group consisting of a compound, a mercaptobenzothiazole-based compound represented by the following general formula (2), and a triazine-based compound represented by the following general formula (3)
0.001 to 1 wt% in total (Wherein, R 1 represents hydrogen, alkyl, or substituted alkyl, and R 2 represents an alkali metal, hydrogen, alkyl, or substituted alkyl.) (Wherein, R 3 represents an alkali metal or hydrogen) [Wherein, R 4 is —SH, an amino group substituted with an alkyl group or an aryl group, or an alkyl-substituted imidazolyl alkyl, and R 5 and R 6 are —NH 2 , —SH or —SM (M represents an alkali metal) Wherein one or more of the fatty acids represented by the following general formula (4) are contained as a lubricant in an amount of 0.05 to 2 wt% in total, and R 7 —COOH (4) (where R 7 is carbon The emulsifier comprises a monoalkyl phosphate represented by the following general formula (5) and a dialkyl phosphate represented by the following general formula (6) as an emulsifier. A pore-sealing solution containing 0.05 to 2 wt% in total of one or two selected from the group. Embedded image (Wherein, R 8 represents alkyl or substituted alkyl, M represents hydrogen or an alkali metal)
【請求項2】 金属材料にニッケルまたはニッケルを含
有する合金を下地めっきとして具備する金または金合金
めっき材に、請求項1に記載の封孔処理液を塗布するこ
とを特徴とする封孔処理方法。
2. A sealing process, wherein the sealing solution according to claim 1 is applied to a gold or gold alloy plating material having nickel or an alloy containing nickel as a base material as a metal material. Method.
【請求項3】 金属材料にニッケルまたはニッケルを含
有する合金を下地めっきとして具備する金または金合金
めっき材を加工後、請求項1に記載の封孔処理液を塗布
することを特徴とする封孔処理方法。
3. A sealing material characterized by applying a sealing treatment liquid according to claim 1 after processing a gold or gold alloy plating material having nickel or an alloy containing nickel as a base plating as a metal material. Hole treatment method.
JP6576495A 1995-03-24 1995-03-24 Sealing solution for gold-plated material and sealing method using the same Expired - Fee Related JP2804453B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP6576495A JP2804453B2 (en) 1995-03-24 1995-03-24 Sealing solution for gold-plated material and sealing method using the same
US08/556,569 US5650088A (en) 1995-03-24 1995-11-13 Treating solution for gold-plated material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6576495A JP2804453B2 (en) 1995-03-24 1995-03-24 Sealing solution for gold-plated material and sealing method using the same

Publications (2)

Publication Number Publication Date
JPH08260194A JPH08260194A (en) 1996-10-08
JP2804453B2 true JP2804453B2 (en) 1998-09-24

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Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009060821A1 (en) 2007-11-05 2009-05-14 Panasonic Electric Works Co., Ltd. Circuit board and method for manufacturing the same

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4489409B2 (en) * 2003-11-10 2010-06-23 大日本印刷株式会社 Method for forming IC module for IC card and IC module for IC card
JP4721827B2 (en) * 2005-08-29 2011-07-13 京セラ株式会社 Wiring board manufacturing method
US7883738B2 (en) * 2007-04-18 2011-02-08 Enthone Inc. Metallic surface enhancement

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009060821A1 (en) 2007-11-05 2009-05-14 Panasonic Electric Works Co., Ltd. Circuit board and method for manufacturing the same

Also Published As

Publication number Publication date
JPH08260194A (en) 1996-10-08

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