JP2736421B2 - Member covered with carbon film and method of manufacturing the same - Google Patents
Member covered with carbon film and method of manufacturing the sameInfo
- Publication number
- JP2736421B2 JP2736421B2 JP23316688A JP23316688A JP2736421B2 JP 2736421 B2 JP2736421 B2 JP 2736421B2 JP 23316688 A JP23316688 A JP 23316688A JP 23316688 A JP23316688 A JP 23316688A JP 2736421 B2 JP2736421 B2 JP 2736421B2
- Authority
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- Japan
- Prior art keywords
- carbon
- film
- electrodes
- carbon film
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Chemical Vapour Deposition (AREA)
Description
【発明の詳細な説明】 「発明の利用分野」 本発明は、風雨に曝され得るとともに、風切りがなさ
れる自動車、オートバイ、自転車、船舶、航空機等の輸
送手段のフロントウインド等の窓その他に対し、透光性
の有機物の部材の表面を、炭素または炭素を主成分とす
る保護用被膜で覆ったものである。そして耐摩耗性を向
上させ、ほこりの付着を防ぎ、静電気の発生を防いだも
のである。DETAILED DESCRIPTION OF THE INVENTION "Field of Application of the Invention" The present invention relates to a window, such as a front window of a transportation means such as a car, a motorcycle, a bicycle, a ship, an aircraft, etc., which can be exposed to the wind and rain. The surface of a translucent organic material is covered with carbon or a protective coating containing carbon as a main component. Further, the abrasion resistance is improved, the adhesion of dust is prevented, and the generation of static electricity is prevented.
本発明はかかる薄膜として、可視領域で透光性を有す
るとともに、硬度が十分な炭素または炭素を主成分とす
る被膜を摩耗防止用保護膜としたものである。特にこの
保護膜は、有機物上に密着させ得るとともに、その電気
的固有抵抗として1×106〜5×1012Ωcmを有せしめ
て、静電気の発生を防ぐとともに、表面に平滑性を有せ
しめ、ほこりの付着を防がんとしたものである。According to the present invention, as such a thin film, carbon or a film containing carbon as a main component having sufficient hardness while having a light-transmitting property in a visible region is used as a protective film for preventing wear. In particular, this protective film can be brought into close contact with an organic material, and has an electric resistivity of 1 × 10 6 to 5 × 10 12 Ωcm, thereby preventing the generation of static electricity and having a smooth surface. This is to prevent the adhesion of dust to cancer.
本発明は、かかるフロントガラス、サイドガラス、リ
アウインド等の窓にプラズマCVD法で炭素膜または炭素
を主成分とする被膜を形成せんとしたものである。In the present invention, a carbon film or a film containing carbon as a main component is formed on a window such as a windshield, a side glass, and a rear window by a plasma CVD method.
「従来技術」 一般にプラズマCVD法においては、平坦面を有する導
電性基板上に平面状に成膜する方法が工業的に有効であ
るとされている。さらに、プラズマCVD法でありなが
ら、スパッタ効果を伴わせつつ成膜させる方法も知られ
ている。その代表例である炭素膜のコーティングに関し
ては、本発明人の出願になる特許願『炭素被膜を有する
複合体およびその作製方法』(特願昭56−146936 昭和
56年9月17日出願)が知られている。しかし、これらは
一対の電極のみを用いる平行平板型の一方の電極(カソ
ード側)に基板を配置し、導体基板であるため、自ら発
生するセルフバイアスを用いて平坦面の上面に炭素膜を
成膜する方法である。"Prior Art" Generally, in a plasma CVD method, a method of forming a film in a planar shape on a conductive substrate having a flat surface is considered to be industrially effective. Further, a method of forming a film with a sputtering effect while being a plasma CVD method is also known. Regarding the coating of a carbon film, which is a typical example, with respect to the patent application “Composite having a carbon film and a method for preparing the same” filed by the present inventors (Japanese Patent Application No. 56-146936, Showa)
(Filed September 17, 56). However, since these are conductor substrates, the substrate is disposed on one electrode (cathode side) of a parallel plate type using only a pair of electrodes, and a carbon film is formed on the upper surface of a flat surface using self-bias generated by itself. It is a method of filming.
「従来の問題点」 しかし、かかるスパッタ効果を伴わせつつ成膜させる
従来例は、フロントウインド、特に自動車またはオート
バイ等の曲面を有する基体上または家の窓上に膜を作る
ことができない。このため、大容量空間で一度に多数の
部材に対し膜を形成する方法が求められていた。本発明
はかかる目的のためになされたものである。"Conventional problems" However, in the conventional example in which a film is formed with such a sputtering effect, a film cannot be formed on a front window, particularly on a substrate having a curved surface such as an automobile or a motorcycle or on a window of a house. Therefore, there has been a demand for a method of forming a film on a large number of members at once in a large capacity space. The present invention has been made for such a purpose.
「問題を解決すべき手段」 本発明は、風雨に曝され得るとともに、風切りがなさ
れる自動車、オートバイ、自転車、船舶、航空機等のフ
ロントウインドその他の透光性を有する有機物の表面を
有する部材上に、保護膜として、炭素または炭素を主成
分とする被膜を設けたものである。この被膜に固有抵抗
として1×106〜5×1012Ωcmを有せしめ、ほこり(一
般に絶縁性または鉱物性)を伴う摩擦による静電気の発
生を防ぎ、ひいてはほこりの付着、ほこりによる透光性
表面の微小傷の発生による失透または「にごり」を防
ぎ、常に鮮やかな透光性の面を保存せしめたものであ
る。"Means to Solve the Problem" The present invention is applicable to a windshield, such as a car, a motorcycle, a bicycle, a ship, an aircraft, etc., which is exposed to the wind and rain, and other members having a surface of a transparent organic material such as a front window. In addition, carbon or a film containing carbon as a main component is provided as a protective film. This film has a specific resistance of 1 × 10 6 to 5 × 10 12 Ωcm to prevent the generation of static electricity due to friction caused by dust (generally insulating or mineral), and thus to adhere to dust and to transmit light due to dust. It prevents the devitrification or "smearing" due to the generation of micro scratches, and always preserves a vivid light-transmitting surface.
本発明は、かかる目的の保護膜として、固有抵抗がビ
ッカース硬度として600〜6000Kg/cm2の値を有するプラ
ズマ重合またはCVD法による炭素または炭素を主成分と
する膜を有機物上に密着せしめ得ることの発見に基づ
く。According to the present invention, as a protective film for this purpose, a film having carbon or carbon as a main component by plasma polymerization or a CVD method having a specific resistance of Vickers hardness of 600 to 6000 kg / cm 2 can be adhered to an organic material. Based on the discovery of
本発明は、かかるプラズマ重合即ちプラズマCVD用と
して、反応空間の一端側および他端側に互いに離間して
第1の一対の電極(第1および第2の電極)を配設す
る。さらにこの空間内に交流バイアスを加えるための第
2の一対の電極(第3および第4の電極)を設け、その
間に被形成面を有する基体、部材を基板または部材のホ
ルダ(20)を用いて配設する。このホルダは接地レベル
の反応容器とはキャパシタ(19)を介して連結してい
る。反応性気体のプラズマ化のため、一対の電極間に第
1の交番電圧を印加する。このそれぞれの電極には、接
地に対して互いに位相が180゜または0゜異なった高周
波電圧をそれぞれの高周波電源より印加し、互いに対称
または同相の交番電圧を印加する。そして結果として合
わせて実質的に1つの高周波の交番電圧として枠構造内
に印加し、反応性気体を完全に分解、電離させるための
高周波プラズマを誘起させる。さらにそのそれぞれの高
周波電源の他端を接地せしめる。また基体または部材を
挟んで第2の一対の電極を具備せしめ、ここに第2の交
番電圧を印加する。すると第2の交番電圧で一方の電極
側で加速されたイオンが部材の被形成面上をスパッタし
つつ、被形成面上に強く被膜化させる。この時、プラズ
マ中であるため、部材が絶縁性であっても、この表面の
ポジティブシースをへて不要電荷は反対面に至り、反対
面のプラズマ雰囲気を経て第2の一対の電極の他方に電
流を流すことができる。かくしてたとえ絶縁性の基体ま
たは部材であっても、それを挟んで第2の一対の電極を
設け、その周波数を低くしてイオンを一方の電極から他
方の電極に半周期で到達できるように電極、反応圧力、
周波数を制御することにより、この絶縁性の基体または
部材上にスパッタ効果を伴わせつつ薄膜を形成せんとし
たものである。In the present invention, a first pair of electrodes (first and second electrodes) are provided at one end and the other end of the reaction space so as to be separated from each other for such plasma polymerization, that is, for plasma CVD. Further, a second pair of electrodes (third and fourth electrodes) for applying an AC bias is provided in this space, and a substrate or member having a surface to be formed therebetween is formed using a substrate or a member holder (20). And arrange them. This holder is connected to the ground level reaction vessel via a capacitor (19). A first alternating voltage is applied between the pair of electrodes to convert the reactive gas into plasma. High-frequency voltages having phases different from each other by 180 ° or 0 ° with respect to the ground are applied to the respective electrodes from the respective high-frequency power sources, and alternating voltages having the same phase or the same phase are applied. Then, as a result, a high frequency alternating voltage is applied to the frame structure as substantially one high frequency alternating voltage to induce high frequency plasma for completely decomposing and ionizing the reactive gas. Further, the other end of each high-frequency power supply is grounded. In addition, a second pair of electrodes is provided with a base or a member interposed therebetween, and a second alternating voltage is applied thereto. Then, ions accelerated on one electrode side by the second alternating voltage sputter on the surface on which the member is to be formed, and strongly form a film on the surface on which the member is to be formed. At this time, even if the member is insulative, the unnecessary charges reach the opposite surface through the positive sheath on this surface because the member is in the plasma, and pass through the plasma atmosphere on the opposite surface to the other of the second pair of electrodes. A current can flow. Thus, even if it is an insulating substrate or member, a second pair of electrodes is provided with the electrode interposed therebetween so that the frequency is lowered so that ions can reach from the one electrode to the other electrode in a half cycle. , Reaction pressure,
By controlling the frequency, a thin film is formed on the insulative substrate or member with a sputter effect.
第1の交番電圧を1〜50MHzの反応性気体のプラズマ
グロ−放電の生じやすい周波数とし、第2の交番電圧を
10Hz〜100KHzの反応性気体に運動エネルギを加え被形成
面上にスパッタ作用を与える周波数としてそれぞれを独
立にその出力、周波数を制御して印加する。この第2の
交番電圧発生用の一対の電極はそれぞれ独立の電源より
なり、位相を180゜かえて加えている。その電源の位相
は共通接地レベルとした。またこの第2の交番電界によ
り被形成面上には負の直流の自己バイアスが重畳して印
加される。この直流成分を外部にもらすことを防ぐた
め、ホルダと反応容器との間はキャパシタで遮断してい
る。すると第1の交番電圧により、プラズマ活性化した
気体を自己バイアスにより基体上に加速衝突させ、基体
上での不要のチャージアップした電荷を交流の第2の電
圧により除去する。かくして被形成面が絶縁性を有する
有機物であっても、その表面にも導体面と実質的に同様
に被膜形成を行い得るようにしたものである。The first alternating voltage is a frequency at which plasma glow discharge of a reactive gas of 1 to 50 MHz is likely to occur, and the second alternating voltage is
Kinetic energy is added to a reactive gas of 10 Hz to 100 KHz to apply a sputter action on the surface to be formed. The pair of electrodes for generating the second alternating voltage is composed of independent power supplies, and the phases are changed by 180 °. The phase of the power supply was a common ground level. Further, a negative direct current self-bias is superimposed on the surface to be formed and applied by the second alternating electric field. In order to prevent this DC component from being exposed to the outside, the capacitor is cut off between the holder and the reaction vessel. Then, the plasma-activated gas is caused to accelerate and collide with the substrate by the self-bias by the first alternating voltage, and unnecessary charged-up charges on the substrate are removed by the second AC voltage. Thus, even if the surface to be formed is an organic substance having an insulating property, a film can be formed on the surface substantially in the same manner as the conductor surface.
この薄膜の形成の1例として、エチレン(C2H4),メ
タン(CH4),アセチレン(C2H2)のような炭化水素気
体またはこれと弗化窒素の混合気体またはC2F6,C3F8,CF
4,CH2F2等の弗化炭素の如き炭素弗化物気体を導入し、
分解せしめることによりSP3軌道を有するダイヤモンド
と類似のC−C結合をつくり、比抵抗(固有抵抗)1×
106〜5×1012Ωcm代表的には1×108〜5×1011Ωcmを
有するとともに、光学的エネルギバンド巾(Egという)
が1.0eV以上、好ましくは1.5〜5.5eVを有する可視領域
で透光性のダイヤモンドと類似の特性を有する炭素膜ま
たは炭素を主成分(副成分の主たるものは水素、弗素、
窒素である)とする被膜を形成した。As an example of the formation of this thin film, a hydrocarbon gas such as ethylene (C 2 H 4 ), methane (CH 4 ), acetylene (C 2 H 2 ) or a mixed gas thereof and nitrogen fluoride or C 2 F 6 , C 3 F 8 , CF
4 , a carbon fluoride gas such as carbon fluoride such as CH 2 F 2 is introduced,
By decomposing, a CC bond similar to diamond with SP 3 orbitals is created, and the specific resistance (specific resistance) 1 ×
10 6 to 5 × 10 12 Ωcm, typically 1 × 10 8 to 5 × 10 11 Ωcm, and an optical energy bandwidth (referred to as Eg)
Is 1.0 eV or more, preferably 1.5 to 5.5 eV in the visible region having a property similar to that of a light-transmitting diamond film or carbon as a main component (main components are hydrogen, fluorine,
Nitrogen).
本発明を用いた透光性有機物は、固有抵抗1×1015Ω
cm以上の絶縁性部材であり、材料は、ポリエステル樹
脂、アルキド樹脂、オイルフリ−アルキド樹脂、不飽和
ポリエステル樹脂、アクリル樹脂、アミノ樹脂が用いら
れる。特に自動車ライン用にはアクリルラッカー、アク
リルメラミン、ブロックアクリルウレタンの有機溶融型
の有機物とした。The translucent organic substance using the present invention has a specific resistance of 1 × 10 15 Ω.
It is an insulating member of cm or more, and polyester resin, alkyd resin, oil-free alkyd resin, unsaturated polyester resin, acrylic resin, and amino resin are used as the material. In particular, for an automobile line, an organic melting type organic material of acrylic lacquer, acrylic melamine, and block acrylic urethane was used.
本発明方法での成膜に際し、弗素の如きハロゲン元素
と窒素とを、プラズマCVD中に炭化物気体に加えて同時
に混入させて、厚さ方向に均一な濃度勾配を設けた炭素
を主成分とする被膜または添加物の有無を制御した多層
の複合膜を作ってもよい。When forming a film by the method of the present invention, a halogen element such as fluorine and nitrogen are simultaneously added to a carbide gas during plasma CVD and mixed together, and the main component is carbon having a uniform concentration gradient in a thickness direction. A multilayer composite film with or without a coating or with or without additives may be made.
以下に図面に従って本発明の作製方法を記す。 The manufacturing method of the present invention will be described below with reference to the drawings.
「実施例1」 第2図は、自動車のフロントウインド等の基体または
部材上に薄膜形成方法を実施するためのプラズマCVD装
置の概要を示す。Example 1 FIG. 2 shows an outline of a plasma CVD apparatus for performing a method of forming a thin film on a substrate or a member such as a front window of an automobile.
図面において、プラズマCVD装置の反応容器(7)は
ゲート弁(9)で外部と仕切られている。ガス系(30)
において、キャリアガスであるアルゴンを(31)より、
反応性気体である炭化水素気体、例えばメタン、エチレ
ンを(32)より、添加物気体である弗化炭素(C2F6,C3F
8)を(33)より、反応容器のエッチング用気体である
酸素を(34)より、バルブ(28)、流量計(29)をへて
反応系(50)中にノズル(25)より導入する。エチレン
と二弗化炭素とを導入すると、水素と弗素が添加された
SP3結合を多数有するダイヤモンド状炭素膜(DLCともい
うが、添加物が添加されたDLCを含めて本発明は炭素ま
たは炭素を主成分とする被膜という)を成膜できる。In the drawing, a reaction vessel (7) of a plasma CVD apparatus is separated from the outside by a gate valve (9). Gas system (30)
In the above, argon as a carrier gas was changed from (31) to
Reactive hydrocarbon gases, such as methane and ethylene, were added from (32) to carbon fluoride (C 2 F 6 , C 3 F
8 ) From (33), oxygen as the etching gas for the reaction vessel is introduced from (34) through the valve (28) and the flow meter (29) through the nozzle (25) into the reaction system (50). . When ethylene and carbon difluoride were introduced, hydrogen and fluorine were added.
A diamond-like carbon film having a large number of SP 3 bonds (also referred to as DLC, including DLC to which an additive is added, in the present invention is referred to as carbon or a film containing carbon as a main component) can be formed.
これと同一主成分の被膜を作るため、C2F6,C3F8を(3
2)より、またNH3を(33)より導入して形成してもよ
い。C 2 F 6 and C 3 F 8 (3
Alternatively, NH 3 may be introduced from (33).
この反応容器(7)の上下に第1の一対の電極を同一
形状を有せしめて第1および第2の電極(3−1),
(3−2)をアルミニウムの金属メッシュで構成せしめ
る。反応性気体はノズル(25)より下方向に放出され
る。さらに第2の一対の電極である第3の電極(13−
1),(13−2),・・・(13−n)と他の第4の電極
(13′−1),(13′−2)・・・(13′−n)(それ
ぞれを集合させて第3および第4の電極という)を基体
または部材を互いにはさみこみ配置とする。基体または
部材(1−),(1−2)・・・(1−n)は絶縁材料
であるが、ここに第2の交番電圧を加え、交流的には実
質的に導体化してバイアスを印加した。基体または部材
(1)上の有機物の被形成面(1′)には、プラズマ雰
囲気またはポジティブシースができ、負の自己バイアス
が印加される。この負の自己バイアスが積極的に発生す
るよう、第2の交番電圧の周波数を10Hz〜100KHzとイオ
ンが第3と第4の電極間を半周期(半サイクル)の間に
ゆきわたるように低い周波数とした。基体または部材
(1)は有機物の被形成面(1′)を有し、第1の高周
波の交番電圧によりグロー放電のプラズマ化した反応性
気体は、反応空間(8)で均一に分散し、反応空間での
プラズマ電位を均質にした。A first pair of electrodes are formed above and below the reaction vessel (7) to have the same shape, and the first and second electrodes (3-1),
(3-2) is constituted by an aluminum metal mesh. The reactive gas is discharged downward from the nozzle (25). Further, a third electrode (13-
(1), (13-2),... (13-n) and other fourth electrodes (13′-1), (13′-2). (These are referred to as third and fourth electrodes). The bases or members (1-), (1-2)... (1-n) are insulating materials, to which a second alternating voltage is applied, which is substantially conductive in terms of alternating current to apply a bias. Applied. A plasma atmosphere or a positive sheath is formed on the organic substance forming surface (1 ') on the substrate or the member (1), and a negative self-bias is applied. In order to positively generate this negative self-bias, the frequency of the second alternating voltage is set to 10 Hz to 100 KHz and a low frequency such that ions spread between the third and fourth electrodes for a half cycle (half cycle). And The substrate or the member (1) has a surface (1 ') on which an organic substance is formed, and the reactive gas converted into plasma of the glow discharge by the first high frequency alternating voltage is uniformly dispersed in the reaction space (8). The plasma potential in the reaction space was made homogeneous.
さらにプラズマ反応空間での電位分布をより等しくさ
せるため、電源系(40)には独立した二種類の周波数の
交番電圧が印加できるようになっている。第1の交番電
圧は1〜100MHz例えば13.56MHzの高周波であり、一対を
なす2つの電源(15−1),(15−2)即ち(15)より
LCR回路でできたマッチングボックス(16−1),(16
−2)に至る。このマッチングボックスでの互いの位相
は位相調整器(26)により調整し、互いに180゜または
0゜ずれて供給できるようにしている。そして対称型ま
たは同相型の出力を有し、電源(15−1),(15−2)
のそれぞれの一端(4−1),(4−2)は一対の第1
および第2の電極(3−1),(3−2)にそれぞれ連
結されている。また、それぞれの電源(15−1),(15
−2)の他端は接地(5−1),(5−2)されてい
る。第2の10Hz〜100KHz例えば50Hzの交番電圧が電源
(17)即ち(17−1),(17−2)より一対の第3の電
極(13−1),・・・(13−n)および第4の電極(1
3′−1)・・・(13′−n)に連結されており、印加
されている。その一対の電極(13),(13′)での出力
はこの一対の電極にはさまれた基体または部材(1)に
自己バイアスがかかるようになされている。Further, in order to make the potential distribution in the plasma reaction space more uniform, alternating voltages of two independent frequencies can be applied to the power supply system (40). The first alternating voltage is a high frequency of 1 to 100 MHz, for example, 13.56 MHz, and is provided by a pair of two power supplies (15-1) and (15-2), that is, (15).
Matching boxes (16-1), (16
-2). The phases of the matching boxes are adjusted by a phase adjuster (26) so that they can be supplied 180 ° or 0 ° from each other. It has a symmetric or in-phase output, and power supplies (15-1) and (15-2)
Are connected to a pair of first ends (4-1) and (4-2), respectively.
And the second electrodes (3-1) and (3-2). In addition, each power supply (15-1), (15
The other end of -2) is grounded (5-1) and (5-2). A second 10 Hz to 100 KHz, for example, 50 Hz alternating voltage is supplied from a power supply (17), that is, (17-1), (17-2), and a pair of third electrodes (13-1),. The fourth electrode (1
3'-1)... (13'-n) and are applied. The output at the pair of electrodes (13) and (13 ') is configured to apply a self-bias to the base or member (1) sandwiched between the pair of electrodes.
かくして反応空間にプラズマ(8)が発生する。排気
系(25)は、圧力調整バルブ(21),ターボ分子ポンプ
(22),ロータリーポンプ(23)を経て不要気体を排気
する。Thus, plasma (8) is generated in the reaction space. The exhaust system (25) exhausts unnecessary gas through a pressure adjusting valve (21), a turbo molecular pump (22), and a rotary pump (23).
これらの反応性気体は、反応空間(60)で0.001〜1.0
torr例えば0.05torrとした。These reactive gases are present in the reaction space (60) at 0.001 to 1.0
torr For example, 0.05 torr.
かかる空間において、13.56MHzの周波数の0.5〜5KW
(単位面積あたり0.03〜3W/cm2)例えば1KW(単位面積
あたり0.6W/cm2の高エネルギ)の第1の高周波電圧を加
える。さらに第2の交番電圧による交流バイアスの印加
により、被形成面上には−200〜−600V(例えばその出
力は1KW)の負の自己バイアス電圧が印加されており、
この負の自己バイアス電圧により加速された反応性気体
を基体または部材上にスパッタしつつ成膜し、かつ緻密
な膜とすることができた。In such a space, 0.5 to 5 KW of 13.56 MHz frequency
(Per unit area 0.03~3W / cm 2) for example adding the first high frequency voltage of 1 KW (high energy per unit area 0.6W / cm 2). Further, by applying an AC bias by the second alternating voltage, a negative self-bias voltage of -200 to -600 V (for example, the output is 1 KW) is applied on the surface to be formed,
The reactive gas accelerated by the negative self-bias voltage was formed on the substrate or member while being sputtered, and a dense film could be formed.
反応性気体は、例えばエチレンと弗化炭素の混合気体
とした。その割合はC2F6/C2H4=1/4〜4/1とし、代表的
には1/1である。この割合を可変することにより、透過
率および比抵抗を制御することができる。基体または部
材(1)の温度は〜150℃、代表的には外部加熱をする
ことなく室温に保持させる。かくして被形成面上は比抵
抗1×106〜5×1012Ωcmを有し、有機樹脂上にも密着
させて成膜させる。可視光に対し、透光性のアモルファ
ス構造または結晶構造を有する弗素と水素とが添加され
た炭素または炭素を主成分とする被膜を0.1〜8μm例
えば0.5μm(平面部),1〜3μm(凸部)に生成させ
た。成膜速度は100〜1000Å/分を有していた。The reactive gas was, for example, a mixed gas of ethylene and carbon fluoride. The ratio is C 2 F 6 / C 2 H 4 = 1/4 to 4/1, typically 1/1. By changing this ratio, the transmittance and the specific resistance can be controlled. The temperature of the substrate or member (1) is maintained at 〜150 ° C., typically at room temperature without external heating. Thus, a specific resistance is 1 × 10 6 to 5 × 10 12 Ωcm on the surface to be formed, and a film is formed in close contact with an organic resin. With respect to visible light, carbon or a film containing carbon as a main component to which fluorine and hydrogen having an amorphous structure or a crystal structure that are transparent to light are added is 0.1 to 8 μm, for example, 0.5 μm (flat portion), and 1 to 3 μm (convex). Part). The deposition rate was 100-1000 ° / min.
かくして部材であるフロントウインド、その他の部材
に炭素を主成分とする被膜、特に炭素中に水素を30原子
%以下含有するとともに、0.3〜10原子%弗素が混入し
た炭素を形成させることができた。有機物上に100〜200
0Åの厚さにエチレンのみによる第1の炭素を設け、さ
らにその上に弗素と水素とが添加された炭素を主成分と
する被膜をも多層に形成させることができた。In this way, it was possible to form a carbon-based coating on the front window and other members, particularly carbon containing not more than 30 atomic% of hydrogen in carbon and containing 0.3 to 10 atomic% of fluorine. . 100-200 on organic matter
The first carbon made of only ethylene was provided to a thickness of 0 °, and a multi-layer film mainly composed of carbon to which fluorine and hydrogen were added was formed thereon.
「実施例2」 この実施例は実施例1で用いた装置により、第1図に
示す如く、透光性有機物の部材要部上に炭素を主成分と
する膜を作製した例である。Example 2 In this example, as shown in FIG. 1, a film containing carbon as a main component was formed on a main part of a translucent organic material using the apparatus used in Example 1.
第1図(A)において、自動車のフロントウインド
(1)の縦断面図を示す。その横断面部を第1図(B)
に示す。FIG. 1 (A) is a longitudinal sectional view of a front window (1) of an automobile. Fig. 1 (B) shows the cross section.
Shown in
第1図(A),(B)において、この透光性プラスチ
ックス(1)は軽量であり、例えばアクリル樹脂で設け
られている。その被形成面を有する基体または部材
(1)上に炭素または炭素を主成分とする耐摩耗性の保
護膜(45)を0.1〜8μmの厚さに設けた。In FIGS. 1A and 1B, the light-transmitting plastics (1) is lightweight, and is made of, for example, an acrylic resin. On the substrate or member (1) having the surface to be formed, carbon or a wear-resistant protective film (45) containing carbon as a main component was provided in a thickness of 0.1 to 8 μm.
本発明において、特にこの炭素または弗素が添加され
た炭素を主成分とする被膜は静電気の発生によるゴミの
付着を防ぐため、その比抵抗は1×106〜5×1012Ωcm
の範囲、特に好ましくは1×107〜1×1011Ωcmの範囲
とした。In the present invention, in particular, the coating mainly composed of carbon or carbon to which fluorine is added has a specific resistance of 1 × 10 6 to 5 × 10 12 Ωcm in order to prevent adhesion of dust due to generation of static electricity.
And particularly preferably in the range of 1 × 10 7 to 1 × 10 11 Ωcm.
第1図(C)はこのウインドの表面のみに形成したも
のである。この第1図(A),(C)の縦断面図はサイ
ドウインド、ミラー表面であってもよい。大1図(D)
は球に対し、また(E)は円筒物上に形成したのもので
ある。これら実使用上風切りが強く、また鉱物質のほこ
りが衝突しやすく、結果として失透、濁りが摩耗により
発生しやすいため、本発明は優れたものである。FIG. 1 (C) shows the structure formed only on the surface of the window. The vertical sectional views of FIGS. 1A and 1C may be side windows and mirror surfaces. Large 1 figure (D)
Is for a sphere and (E) is for a cylinder. The present invention is excellent in that these materials are strongly used in practical use, and dust of mineral substances easily collide with them, and as a result, devitrification and turbidity are easily generated by abrasion.
「効果」 本発明は無機ガラス、有機物のいずれの透光性材料に
対しても有効であり、特にその上面を水はけのよい弗素
が添加されたビッカース硬度600〜3000Kg/cm2の炭素を
主成分とする被膜、またはビッカース硬度が1000〜7000
Kg/cm2の炭素(水素も添加されている)の多層膜を有機
物上に密着させてコートした。その結果、風雨に曝さ
れ、またほこりを伴う風切りの多い凸部により厚く耐摩
耗性膜として形成することができた。"Effect" The present invention inorganic glass, is also effective against any translucent material organics, especially carbon based Vickers hardness 600~3000Kg / cm 2 to well-drained fluorine is added the upper surface Coating or Vickers hardness of 1000-7000
A multilayer film of carbon (to which hydrogen was also added) of Kg / cm 2 was coated on an organic material by being in close contact with the organic material. As a result, it was possible to form a thick and wear-resistant film due to the protruding portions that were exposed to the wind and rain and that had a lot of dust with dust.
これまでの自動車等のフロントウインドは晴天時ほこ
りがきわめてつきやすかった。しかし本発明により、そ
の表面に絶縁性のほこりの衝突によって生ずる静電気の
発生およびそれに伴うほこりの付着を軽減することがで
きた。Until now, the front windows of automobiles and the like were extremely easy to get dust in fine weather. However, according to the present invention, it was possible to reduce the generation of static electricity caused by the impact of insulating dust on the surface and the accompanying dust adhesion.
以上に示す如く、透光性の風切りまたほこりの付着を
防ぐ窓に特に透光の遮光もDLCの光学的エネルギバンド
巾を制御することにより可能であり、無機ガラスまたは
有機物において耐熱性を有さない有機物上にも密着させ
得ることはこれまで柔らかいためまったく使えなかった
プラスチック製ウインドを作ることの可能性を実現した
ことで有効である。As shown above, it is possible to control the light energy of the DLC by controlling the optical energy bandwidth of the DLC. Being able to adhere to organic matter that does not exist is effective in realizing the possibility of making a plastic window that could not be used at all because of its softness.
以上の説明より明らかな如く、本発明は有機樹脂また
はこれらの多層膜をコーティングして設けたものに特に
有効である。この複合体は、他の多くの実施例にみられ
る如く、その応用ははかりしれないものであり、特にこ
の炭素が150℃以下の低温で形成でき、このため下地の
塗装面の有機物の変成による色調も変わらず、その硬度
また基体または部材に対する密着性がきわめて優れてい
るのが特徴である。As is clear from the above description, the present invention is particularly effective for those provided with an organic resin or a coating of a multilayer thereof. This composite, as seen in many other embodiments, is of immeasurable application, especially when the carbon can be formed at low temperatures below 150 ° C., and therefore, due to the transformation of organic matter on the underlying painted surface. The feature is that the color tone does not change, and its hardness and adhesion to a substrate or a member are extremely excellent.
第1図は本発明のフロントウインド等の部材上への炭素
膜または炭素を主成分とした保護膜をコートした例およ
びその要部を示す。 第2図は本発明のプラズマCVD装置の製造装置の概要を
示す。FIG. 1 shows an example in which a carbon film or a protective film containing carbon as a main component is coated on a member such as a front window of the present invention, and an essential part thereof. FIG. 2 shows an outline of a plasma CVD apparatus manufacturing apparatus according to the present invention.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 佐々木 麻里 神奈川県厚木市長谷398番地 株式会社 半導体エネルギー研究所内 (72)発明者 土屋 三憲 神奈川県厚木市長谷398番地 株式会社 半導体エネルギー研究所内 (72)発明者 川野 篤 神奈川県厚木市長谷398番地 株式会社 半導体エネルギー研究所内 審査官 吉水 純子 (56)参考文献 特開 平2−80300(JP,A) ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Mari Sasaki 398 Hase, Atsugi-shi, Kanagawa Semiconductor Energy Research Institute, Inc. ) Inventor Atsushi Kawano 398 Hase, Atsugi-shi, Kanagawa Prefecture Examiner at Semiconductor Energy Laboratory Co., Ltd. Sumiko Yoshimizu (56) References JP-A-2-80300 (JP, A)
Claims (4)
部材面に1×106〜5×1012Ωcmの固有抵抗を有する炭
素膜または炭素を主成分とする膜が設けられたことを特
徴とする炭素膜で覆われた部材。1. A light-transmitting member having an insulating property, wherein a carbon film having a specific resistance of 1 × 10 6 to 5 × 10 12 Ωcm or a film containing carbon as a main component is provided on the surface of the member. A member covered with a carbon film.
材は風雨に曝され得る自動車、オートバイ、自転車、船
舶または航空機のフロントウインド、リアウインド、サ
イドミラー、サイドウインドよりなることを特徴とする
炭素膜で覆われた部材。2. The light-transmitting member according to claim 1, wherein the light-transmitting member comprises a front window, a rear window, a side mirror, and a side window of a car, a motorcycle, a bicycle, a ship, or an aircraft which can be exposed to the weather. A member covered with a carbon film.
材は有機物よりなり、前記有機物上に透光性炭素膜が設
けられたことを特徴とする炭素膜で覆われた部材。3. The member covered with a carbon film according to claim 1, wherein the light-transmitting member is made of an organic material, and a light-transmitting carbon film is provided on the organic material.
ための第1の一対の電極を設け、前記反応容器内に絶縁
性部材を配設して、減圧下に保持して、前記部材を挟ん
で第2の一対の電極を有し、この電極間に交流のバイア
スを印加するとともに、前記減圧下の雰囲気中に炭素化
物気体を導入して、前記第1の一対の電極に高周波電圧
を印加して、前記気体をプラズマ化せしめることによ
り、前記部材上に炭素または炭素を主成分とする被膜を
形成することを特徴とする炭素膜で覆われた部材の作製
方法。4. A first pair of electrodes for generating high-frequency plasma in a reaction vessel, an insulating member provided in the reaction vessel, and held under reduced pressure to sandwich the member. And a second pair of electrodes, an AC bias is applied between the electrodes, and a carbide gas is introduced into the atmosphere under the reduced pressure to apply a high-frequency voltage to the first pair of electrodes. Forming a film containing carbon or carbon as a main component on the member by converting the gas into a plasma to produce a member covered with a carbon film.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23316688A JP2736421B2 (en) | 1988-09-16 | 1988-09-16 | Member covered with carbon film and method of manufacturing the same |
US07/403,821 US5041201A (en) | 1988-09-16 | 1989-09-07 | Plasma processing method and apparatus |
KR1019890013120A KR920007022B1 (en) | 1988-09-16 | 1989-09-11 | Plasma processing method and apparatus |
EP89309352A EP0359567B1 (en) | 1988-09-16 | 1989-09-14 | Plasma processing method and apparatus |
DE68917550T DE68917550T2 (en) | 1988-09-16 | 1989-09-14 | Method and device for plasma treatment. |
CN 89107237 CN1025353C (en) | 1988-09-16 | 1989-09-16 | Plasma processing method and apparatus |
CN 93120148 CN1090889A (en) | 1988-09-16 | 1993-12-04 | Method of plasma processing and equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23316688A JP2736421B2 (en) | 1988-09-16 | 1988-09-16 | Member covered with carbon film and method of manufacturing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0280571A JPH0280571A (en) | 1990-03-20 |
JP2736421B2 true JP2736421B2 (en) | 1998-04-02 |
Family
ID=16950757
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23316688A Expired - Lifetime JP2736421B2 (en) | 1988-09-16 | 1988-09-16 | Member covered with carbon film and method of manufacturing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2736421B2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3119172B2 (en) | 1995-09-13 | 2000-12-18 | 日新電機株式会社 | Plasma CVD method and apparatus |
EP1340835B1 (en) * | 1996-06-27 | 2006-10-04 | Nissin Electric Co., Ltd. | Object coated with carbon film and method of manufacturing the same |
US6893720B1 (en) | 1997-06-27 | 2005-05-17 | Nissin Electric Co., Ltd. | Object coated with carbon film and method of manufacturing the same |
JP3669138B2 (en) * | 1998-03-05 | 2005-07-06 | 日新電機株式会社 | Plasma CVD method, plasma CVD apparatus and electrode |
JP4735329B2 (en) * | 2005-03-25 | 2011-07-27 | Jfeスチール株式会社 | Coil processing / conveying method |
-
1988
- 1988-09-16 JP JP23316688A patent/JP2736421B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0280571A (en) | 1990-03-20 |
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