[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

JP2797384B2 - Method for manufacturing magneto-optical recording medium - Google Patents

Method for manufacturing magneto-optical recording medium

Info

Publication number
JP2797384B2
JP2797384B2 JP1077187A JP7718789A JP2797384B2 JP 2797384 B2 JP2797384 B2 JP 2797384B2 JP 1077187 A JP1077187 A JP 1077187A JP 7718789 A JP7718789 A JP 7718789A JP 2797384 B2 JP2797384 B2 JP 2797384B2
Authority
JP
Japan
Prior art keywords
optical recording
protective film
magneto
film
resin substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1077187A
Other languages
Japanese (ja)
Other versions
JPH02254651A (en
Inventor
美紀子 齋藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP1077187A priority Critical patent/JP2797384B2/en
Publication of JPH02254651A publication Critical patent/JPH02254651A/en
Application granted granted Critical
Publication of JP2797384B2 publication Critical patent/JP2797384B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は光磁気記録媒体に関し特に透光性樹脂基板を
用いた光磁気記録媒体の製造方法に関する。
Description: TECHNICAL FIELD The present invention relates to a magneto-optical recording medium, and more particularly to a method for manufacturing a magneto-optical recording medium using a translucent resin substrate.

(従来の技術) 大量の情報を高密度に記録に記録できることから光デ
ィスクが盛んに研究されている。この光ディスクの記録
媒体としては作成法の容易さ、高い記録感度の点から希
土類−遷移金属からなる非晶質垂直磁化膜がおもに用い
られている。しかし、この非晶質磁性膜は酸化されやす
く特に高湿度環境下におかれると磁気特性が変化し、使
用できなくなるという欠点がある。ここで、透明基板と
して価格、割れにくいなどから樹脂基板を用いた場合、
基板をとおしてのごとくわずかな水が磁性膜の腐食の要
因になったりする。そこで第2図に示すように、通常は
透明基板1上で記録層3を保護膜2,2′で挟みこんだ構
成として磁性膜の酸化、腐食を防ぐことが行われてい
る。
(Prior Art) Optical disks are being actively studied because a large amount of information can be recorded at a high density. As a recording medium for this optical disk, an amorphous perpendicular magnetization film made of a rare earth-transition metal is mainly used in view of the ease of preparation and high recording sensitivity. However, this amorphous magnetic film has a drawback that it tends to be oxidized, and its magnetic properties change when it is placed in a high-humidity environment. Here, if a resin substrate is used as the transparent substrate due to its price and resistance to cracking,
A small amount of water through the substrate may cause corrosion of the magnetic film. Therefore, as shown in FIG. 2, a recording layer 3 is usually sandwiched between protective films 2, 2 'on a transparent substrate 1 to prevent oxidation and corrosion of the magnetic film.

(発明が解決しようとする課題) ここで保護膜2としては保護効果とともにカー回転角
を高め記録再生特性の性能を向上させる為に、基板より
も屈折率の高い膜が選択される。さらに、カー回転角は
保護膜の膜厚とも関連があり、カー回転角が最大となる
ような膜厚が選ばれる(500Å〜1000Å)。保護膜の耐
湿性を考慮すると膜厚は厚ければ厚い程記録膜への保護
作用は増加するが、前記したカー回転角の増加効果、作
成上の困難さからあまり厚くすることはできない。
(Problem to be Solved by the Invention) Here, a film having a higher refractive index than the substrate is selected as the protective film 2 in order to increase the Kerr rotation angle and improve the performance of the recording and reproducing characteristics together with the protective effect. Further, the Kerr rotation angle is related to the thickness of the protective film, and a film thickness that maximizes the Kerr rotation angle is selected (500 ° to 1000 °). In consideration of the moisture resistance of the protective film, the thicker the film thickness, the more the protective effect on the recording film increases, but it cannot be made too thick due to the above-described effect of increasing the Kerr rotation angle and the difficulty in preparation.

そこで、本発明の目的はカー回転角が最大になるよう
な膜厚の保護膜において、安定的に防湿性の優れた効果
を有する保護膜の製造方法を提供することにある。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a method of manufacturing a protective film having a stable and excellent moisture-proof effect in a protective film having a film thickness that maximizes the Kerr rotation angle.

〔課題を解決するための手段〕[Means for solving the problem]

本発明の光磁気記録媒体の製造方法は、透光性樹脂基
板上に保護膜、光磁気記録層、表面保護膜を積層して光
磁気記録媒体を製造する方法において、樹脂基板上にSi
Nx系(SiNx)の保護膜を成膜した後に、高温・高湿雰囲
気中で加熱加湿処理を行って、防湿成に優れた保護膜を
実現することを特徴とする。
The method for manufacturing a magneto-optical recording medium of the present invention is a method for manufacturing a magneto-optical recording medium by laminating a protective film, a magneto-optical recording layer, and a surface protective film on a light-transmitting resin substrate.
After forming an Nx-based (SiNx) protective film, a heating and humidifying treatment is performed in a high-temperature, high-humidity atmosphere to realize a protective film excellent in moisture proofing.

この保護膜としては、SiO2系膜上にSiN系膜を積層し
た保護膜とすることができるし、また、表面保護膜とし
てSiN系保護膜を形成した後、加熱・加湿処理を行うこ
とができる。
This protective film may be a protective film in which a SiN-based film is laminated on an SiO 2 -based film, or a heating / humidifying treatment may be performed after forming a SiN-based protective film as a surface protective film. it can.

加熱温度は、45℃以上で透光性樹脂の許容温度以内で
あればよく、好ましくは60℃である。また湿度は、60%
以上100%以下であればよく、好ましくは90%である。
The heating temperature may be 45 ° C. or higher and within the allowable temperature of the translucent resin, and is preferably 60 ° C. The humidity is 60%
It is sufficient that it is not less than 100% and preferably not more than 90%.

(作用) 樹脂基板に保護膜を成膜した後に高温高湿処理を施す
と透湿性を示していた膜が防湿性に変化することを観測
した。第3図に実験に用いた試料の断面構造図を示す。
図において1は例えばポリカーボネート(以下PCと記
す)基板のような透明の樹脂基板、2は800Å程度のSiN
などの保護膜である。この基板を環境条件を変えた雰囲
気中に放置した時の基板の重量変化を第4図に示す。第
4図の上図に環境条件を示す温度、相対湿度の値を示
す。下図にはそのときの基板の重量変化を示す。この重
量変化は吸湿、脱湿時の基板の水分量変化を現してい
る。60℃90%R.H.約60時間において50mgの重量増加が観
測された。重量増加率は約0.27%であり、PC基板の平衡
吸湿率(0.3%)に近い値である。この結果は保護膜2
が透湿性があることを意味している。即ち、保護膜2で
覆われていない部分からをPC基板内には水は入り込む
が、概算するとその値は高々0.05%であり、0.27%の重
量増加は保護膜2を通した水分量の寄与が大きい。次に
この基板を60℃N2送風下3時間、20℃N2送風下(<10%
R.H.)約60時間の乾燥をおこなっても重量は元のAで示
す初期重量値までもどらなかった。その後60℃90%R.H.
中に約50時間放置したが初期のような重量変化は観測さ
れなかった。以上の重量変化の仮定を60℃90%R.H.の環
境条件に注目した重量変化率の関係を第1図に示す。
(Function) When a high-temperature and high-humidity treatment was performed after forming a protective film on a resin substrate, it was observed that the film that had shown moisture permeability changed to moisture-proof. FIG. 3 shows a sectional structural view of the sample used in the experiment.
In the figure, 1 is a transparent resin substrate such as a polycarbonate (hereinafter, referred to as PC) substrate, and 2 is SiN of about 800 mm.
And the like. FIG. 4 shows a change in weight of the substrate when the substrate is left in an atmosphere in which environmental conditions are changed. The upper diagram of FIG. 4 shows values of temperature and relative humidity indicating environmental conditions. The figure below shows the change in weight of the substrate at that time. This change in weight indicates a change in the moisture content of the substrate during moisture absorption and dehumidification. At 60 ° C. and 90% RH for about 60 hours, a weight increase of 50 mg was observed. The weight increase rate is about 0.27%, which is close to the equilibrium moisture absorption rate (0.3%) of the PC board. The result is the protective film 2
Means moisture permeable. That is, although water enters the PC board from the part not covered with the protective film 2, the value is roughly estimated to be at most 0.05%, and the weight increase of 0.27% is caused by the moisture content through the protective film 2. Is big. Next, the substrate was blown at 60 ° C. N 2 for 3 hours and then blown at 20 ° C. N 2 (<10%
RH) Even after drying for about 60 hours, the weight did not return to the original initial weight value indicated by A. Then 60 ℃ 90% RH
Although it was left for about 50 hours, no change in weight was observed as in the initial stage. FIG. 1 shows the relationship between the weight change rates based on the assumption of the above weight change and the environmental conditions of 60 ° C. and 90% RH.

○印で示したPC基板のみの場合は数時間で平衡状態の
0.3%となる。□印はPCの両面にTiを2000Å形成した試
料であり、●印はPC基盤の両面にSiNを800Å成膜した試
料である。□印で示した試料の重量変化率はTiの成膜さ
れていない部分からPC基板に水が入っていくことで説明
できる。●印で示した試料は第3図で示したように当初
で示すように透湿性を示していた保護膜がに示すよ
うに□印と同程度の水分変化率を示しており、防湿性に
変化したことを示している。ここで、の重量変化率を
算出する場合の試料の初期重量は第4図のB点で示す値
を採用した。このことは記録再生特性を向上させるため
の見かけ上のカー回転角を大きくする際に最適設計され
た薄い保護膜をもちいても信頼性のある膜を形成できる
ことを意味している。
In the case of only the PC board indicated by ○,
0.3%. □ indicates a sample with 2000 mm of Ti formed on both sides of the PC, and ● indicates a sample with 800 nm of SiN formed on both sides of the PC board. The weight change rate of the sample indicated by □ can be explained by the fact that water enters the PC substrate from the portion where the Ti film is not formed. As shown in Fig. 3, the protective film that showed moisture permeability as shown at the beginning shows the same moisture change rate as the square mark as shown in Fig. 3. Indicates that it has changed. Here, the value indicated by point B in FIG. 4 was adopted as the initial weight of the sample when calculating the weight change rate. This means that a reliable film can be formed even if a thin protective film optimally designed when increasing the apparent Kerr rotation angle for improving the recording / reproducing characteristics is used.

比較のために、PC基板およびPC基板の両面に透湿膜を
被覆したものを60℃90%R.H.中に約100時間置いた後、6
0℃N2送風下(<10%R.H.)で乾燥を行なったところ、
約3時間でもとの重量にもどっている。この結果を第8
図に示す。このことと第4図の結果より第4図B点での
PC基板は十分乾燥していると考えられ、その後の高温・
高湿化の重量変化から本発明の保護膜が確かに防湿性に
変化したことがわかる。
For comparison, a PC substrate and a substrate coated with a moisture permeable film on both sides of a PC substrate were placed in a 60% RH 90% RH for about 100 hours, and
After drying at 0 ° C N 2 blast (<10% RH),
It has returned to its original weight in about 3 hours. This result is
Shown in the figure. From this and the result in FIG. 4, the point B in FIG.
The PC board is considered to be sufficiently dry.
It can be seen from the change in weight due to the increase in humidity that the protective film of the present invention certainly changed to moisture-proof.

(第1の実施例) 次に本発明の実施例について図面を参照して説明す
る。第5図(a)〜(d)に本発明をもちいた光磁気記
録媒体の製造工程を示す。厚さ1.2mmのPC基板1に高周
波スパッタリング装置を用いて(b)に示すようにSiN
系保護膜2を約800Å形成する。その後60℃90%R.H.の
雰囲気中に約50時間放置した後乾燥し、高周波スパッタ
リング装置に用いて(d)に示すようにTbFeCo層3、Si
N系保護膜2′をそれぞれ約800Å形成し光磁気記録媒体
とした。この製造方法を用いて作成した光磁気記録媒体
は従来の光磁気記録媒体に比べ信頼性試験においても腐
食することはなく信頼性を向上させることができた。
First Embodiment Next, an embodiment of the present invention will be described with reference to the drawings. 5 (a) to 5 (d) show the steps of manufacturing a magneto-optical recording medium according to the present invention. Using a high-frequency sputtering device on a PC board 1 having a thickness of 1.2 mm, as shown in FIG.
A system protective film 2 is formed to a thickness of about 800. After that, it was left in an atmosphere of 60 ° C. and 90% RH for about 50 hours, dried, and used in a high-frequency sputtering device to form a TbFeCo layer 3 and a Si film as shown in FIG.
N-type protective films 2 'were formed to a thickness of about 800.degree. The magneto-optical recording medium produced by using this manufacturing method did not corrode even in the reliability test as compared with the conventional magneto-optical recording medium, and the reliability was improved.

(第2の実施例) 第6図(a)〜(d)に第2の実施例を説明する為の
製造方法を示す。第2の実施例は単層の保護膜ではなく
複合の保護膜に本発明を適用した場合である。厚さ1.2m
mのPC基板に内部応力の小さいSiO2系保護膜4とSiN系保
護膜5を高周波スパッタリング装置を用いて全体で約80
0Å形成した。その後60℃90%R.H.の雰囲気中に約50時
間放置した後乾燥し、(d)に示すように高周波スパッ
タリング装置を用いてTbFeCo層3、SiN系保護膜2′を
それぞれ約800Å形成し光磁気記録媒体とした。この製
造方法を用いて作成した光磁気記録媒体は従来の光磁気
記録媒体に比べ信頼性試験においても腐食することはな
く信頼性を向上させることができた。
Second Embodiment FIGS. 6 (a) to 6 (d) show a manufacturing method for explaining a second embodiment. In the second embodiment, the present invention is applied to a composite protective film instead of a single-layer protective film. 1.2m thick
The SiO 2 protective film 4 and the SiN protective film 5 having small internal stress are applied to a PC substrate of about 80 m in total by using a high frequency sputtering apparatus.
0 ° formed. Thereafter, the substrate was left in an atmosphere of 60 ° C. and 90% RH for approximately 50 hours, and then dried. As shown in FIG. The recording medium was used. The magneto-optical recording medium produced by using this manufacturing method did not corrode even in the reliability test as compared with the conventional magneto-optical recording medium, and the reliability was improved.

(第3の実施例) 第7図(a)〜(c)に第3の実施例を説明する為の
製造方法を示す。厚さ1.2mmのPC基板1に(b)に示す
ように高周波スパッタリング装置を用いてSiN系保護膜
2,2′を約800ÅとTbFeCo層3を約800Å連続して形成す
る。その後60℃90%R.H.の雰囲気中に約50時間放置した
後乾燥し、光磁気記録媒体とした。この製造方法を用い
て作成した光磁気記録媒体は従来の光磁気記録媒体に比
べ信頼性試験においても腐食することはなく信頼性を向
上させることができた。
Third Embodiment FIGS. 7A to 7C show a manufacturing method for explaining a third embodiment. As shown in (b), a PCN 1 having a thickness of 1.2 mm is coated with a SiN-based protective film using a high-frequency sputtering device.
The TbFeCo layer 3 is formed continuously by about 800 ° for 2,2 ′ and about 800 °. Thereafter, the substrate was allowed to stand in an atmosphere of 60 ° C. and 90% RH for about 50 hours and then dried to obtain a magneto-optical recording medium. The magneto-optical recording medium produced by using this manufacturing method did not corrode even in the reliability test as compared with the conventional magneto-optical recording medium, and the reliability was improved.

(発明の効果) 以上説明したように本発明の製造方法をもちいれば薄
い保護膜においても防湿性に優れた保護膜が得られ、光
磁気ディスクの寿命を高めることができる。
(Effect of the Invention) As described above, by using the manufacturing method of the present invention, a protective film having excellent moisture proofness can be obtained even with a thin protective film, and the life of the magneto-optical disk can be increased.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明を説明する為の吸湿実験結果を示す図、
第2図は光磁気記録媒体の断面構造図、第3図は吸湿実
験に用いた試料の断面構造図、第4図・第8図は吸湿実
験結果を示した図、第5図は本発明の第1実施例を説明
するための製造方法を示す断面構造図、第6図は本発明
の第2の実施例を説明するための製造方法を示す断面構
造図、第7図は本発明の第3の実施例を説明するための
製造方法を示す断面構造図である。 図において1は透明基板、2,2′は保護膜、3はTbFeCo
などの記録層、4,5は保護膜である。
FIG. 1 is a diagram showing the results of a moisture absorption experiment for explaining the present invention,
FIG. 2 is a cross-sectional view of the magneto-optical recording medium, FIG. 3 is a cross-sectional view of the sample used in the moisture absorption test, FIGS. 4 and 8 show the results of the moisture absorption test, and FIG. FIG. 6 is a sectional structural view showing a manufacturing method for explaining a first embodiment of the present invention, FIG. 6 is a sectional structural view showing a manufacturing method for explaining a second embodiment of the present invention, and FIG. FIG. 11 is a sectional structural view illustrating a manufacturing method for describing a third embodiment. In the figure, 1 is a transparent substrate, 2, 2 'are protective films, 3 is TbFeCo
The recording layers 4 and 5 are protective films.

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】透光性樹脂基板上に保護膜、光磁気記録
層、表面保護膜を積層して光磁気記録媒体を製造する方
法において、 前記透光性樹脂基板上に窒化シリコン(SiNx)膜の保護
膜を形成し、 その後窒化シリコン保護膜が生成された透光性樹脂基板
を少なくとも45℃以上から前記透光性樹脂基板の許容温
度の範囲内で、かつ少なくとも60%以上の湿度の雰囲気
中で加熱加湿処理を行い、 乾燥した後、前記光記録層および前記表面保護膜を形成
する ことを特徴とする光磁気記録媒体の製造方法。
1. A method for manufacturing a magneto-optical recording medium by laminating a protective film, a magneto-optical recording layer, and a surface protective film on a light-transmitting resin substrate, comprising the steps of: providing silicon nitride (SiNx) on the light-transmitting resin substrate; After forming a protective film of the film, the light-transmitting resin substrate on which the silicon nitride protective film is formed is at least 45 ° C. or more within the allowable temperature range of the light-transmitting resin substrate, and at least 60% or more of humidity. A method for producing a magneto-optical recording medium, comprising: performing a heating and humidifying treatment in an atmosphere; drying the film; and then forming the optical recording layer and the surface protective film.
【請求項2】透光性樹脂基板上に保護膜、光磁気記録
層、表面保護膜を積層して光磁気記録媒体を製造する方
法において、 前記透光性樹脂基板上に酸化シリコン(SiO2)膜上に窒
化シリコン膜が積層された保護膜を形成し、 その後この樹脂基板上に保護膜が形成された透光性樹脂
基板を少なくとも45℃以上から前記透光性樹脂基板の許
容温度の範囲内で、かつ90%以上の湿度の雰囲気中で加
熱加湿処理を行い、 乾燥した後、前記光磁気記録層および前記表面保護膜を
形成する ことを特徴とする光磁気記録媒体の製造方法。
2. A light-transmissive resin substrate on the protective film, a magneto-optical recording layer, the method by laminating a surface protective film to produce a magneto-optical recording medium, silicon oxide on the light-transmissive resin substrate (SiO 2 A) forming a protective film in which a silicon nitride film is laminated on the film; and then forming the light-transmitting resin substrate having the protective film formed on the resin substrate from at least 45 ° C. to the allowable temperature of the light-transmitting resin substrate. A method for manufacturing a magneto-optical recording medium, comprising: performing a heating and humidifying treatment in an atmosphere having a humidity of 90% or more within a range, drying the magneto-optical recording layer and the surface protective film.
【請求項3】透光性樹脂基板上に保護膜、光磁気記録
層、表面保護膜を積層して光磁気記録媒体を製造する方
法において、 前記透光性樹脂基板上に窒化シリコン膜の保護膜、光磁
気記録層、窒化シリコン膜の表面保護膜を形成し、 この表面保護膜まで形成した透光性樹脂基板を少なくと
も45℃以上から前記透光性樹脂基板の許容温度の範囲内
で、かつ60%以上の湿度の雰囲気中で加熱加湿処理を行
った後乾燥する ことを特徴とする光磁気記録媒体の製造方法。
3. A method for manufacturing a magneto-optical recording medium by laminating a protective film, a magneto-optical recording layer, and a surface protective film on a light-transmitting resin substrate, comprising the steps of: protecting a silicon nitride film on the light-transmitting resin substrate; A film, a magneto-optical recording layer, a surface protection film of a silicon nitride film are formed, and the light-transmitting resin substrate formed up to the surface protection film is at least 45 ° C. or more within an allowable temperature range of the light-transmitting resin substrate, A method for producing a magneto-optical recording medium, comprising performing a heating and humidifying treatment in an atmosphere having a humidity of 60% or more and then drying.
【請求項4】前記保護膜は酸化シリコン膜上に窒化シリ
コン膜を積層した保護膜である請求項1または3記載の
光磁気記録媒体の製造方法。
4. The method for manufacturing a magneto-optical recording medium according to claim 1, wherein said protective film is a protective film in which a silicon nitride film is laminated on a silicon oxide film.
【請求項5】加湿加熱処理は、60℃、90%の湿度の雰囲
気中で行う請求項1ないし4いずれか記載の光磁気記録
媒体の製造方法。
5. The method for manufacturing a magneto-optical recording medium according to claim 1, wherein the humidifying heat treatment is performed in an atmosphere of 60 ° C. and 90% humidity.
JP1077187A 1989-03-28 1989-03-28 Method for manufacturing magneto-optical recording medium Expired - Lifetime JP2797384B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1077187A JP2797384B2 (en) 1989-03-28 1989-03-28 Method for manufacturing magneto-optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1077187A JP2797384B2 (en) 1989-03-28 1989-03-28 Method for manufacturing magneto-optical recording medium

Publications (2)

Publication Number Publication Date
JPH02254651A JPH02254651A (en) 1990-10-15
JP2797384B2 true JP2797384B2 (en) 1998-09-17

Family

ID=13626814

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1077187A Expired - Lifetime JP2797384B2 (en) 1989-03-28 1989-03-28 Method for manufacturing magneto-optical recording medium

Country Status (1)

Country Link
JP (1) JP2797384B2 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62217440A (en) * 1986-03-17 1987-09-24 Fujitsu Ltd Optical disc substrate

Also Published As

Publication number Publication date
JPH02254651A (en) 1990-10-15

Similar Documents

Publication Publication Date Title
CA1234916A (en) Magneto-optic memory element
JPS6129437A (en) Photomagnetic recording medium
JP2797384B2 (en) Method for manufacturing magneto-optical recording medium
JPS6124041A (en) Magnetic recording medium
JPS63285738A (en) Magneto-optical recording medium
JPH03248338A (en) Optical information recording medium
JPH0785314B2 (en) Protective film for magneto-optical recording medium
JP2841764B2 (en) Magneto-optical disk
JP3205921B2 (en) Magneto-optical recording medium
JP2740814B2 (en) Magneto-optical recording medium
JPS6318544A (en) Medium for magneto-optical memory
JPH04318346A (en) Magneto-optical recording medium
JPH02128346A (en) Magneto-optical disk
JP2679218B2 (en) Magneto-optical recording medium and manufacturing method thereof
JPH03113850A (en) Magneto-optical recording medium
JPS62121944A (en) Optical recording medium
JPS639047A (en) Magneto-optical recording medium
JPS5860442A (en) Photothermomagnetic recording medium
JPS6381640A (en) Optical recording medium
JPH0677344B2 (en) Magneto-optical memory medium
JPH02285533A (en) Optical recording medium
JPS61182649A (en) Photomagnetic recording carrier
JPH01138639A (en) Magneto-optical recording medium
JPH02285539A (en) Magneto-optical recording medium
JPH0249237A (en) Magneto-optical disk