JP2743333B2 - Glass for substrates - Google Patents
Glass for substratesInfo
- Publication number
- JP2743333B2 JP2743333B2 JP1285962A JP28596289A JP2743333B2 JP 2743333 B2 JP2743333 B2 JP 2743333B2 JP 1285962 A JP1285962 A JP 1285962A JP 28596289 A JP28596289 A JP 28596289A JP 2743333 B2 JP2743333 B2 JP 2743333B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- viscosity
- alkali
- substrate
- liquidus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明は、主に液晶やエレクトロルミネセンスのディ
スプレイ、太陽電池、イメージセンサ等の電子機器装置
の基板として用いられる基板用ガラスに関するものであ
る。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate glass mainly used as a substrate of an electronic device such as a liquid crystal display, an electroluminescence display, a solar cell, and an image sensor. .
［従来技術とその問題点］ 従来より液晶やエレクトロルミネセンスのディスプレ
イ、太陽電池、イメージセンサ等の電子機器装置に用い
られるガラス基板としては、板厚が2mm以下のソーダラ
イムガラス、低アルカリガラスまたは無アルカリガラス
の薄板が用いられている。その中でもソーダライムガラ
スは安価であるため大量に生産されているが、ガラスの
アルカリ溶出量が高いために電子機器装置の素子特性が
アルカリイオンによって損なわれるという問題を引き起
こす。通常SiO2等のバリヤー被膜を表面に施してこれら
の問題を回避しているが、SiO2等のバリヤー被膜は高価
なうえに、ピンホール等の発生を皆無にすることが難し
く、被膜のバリヤー効果の信頼性が低くなるという欠点
がある。そこで高い信頼性を必要とする電子機器装置の
場合、アルカリ溶出量の少ない低アルカリガラスまたは
無アルカリガラスを基板として使用する例が多い。[Prior art and its problems] Conventionally, glass substrates used for electronic devices such as liquid crystal and electroluminescence displays, solar cells, image sensors, and the like, have a plate thickness of 2 mm or less, soda lime glass, low alkali glass or A thin plate made of non-alkali glass is used. Among them, soda lime glass is inexpensive and is produced in large quantities. However, the alkali elution amount of the glass is high, which causes a problem that the element characteristics of the electronic device are impaired by alkali ions. Usually, a barrier coating such as SiO 2 is applied to the surface to avoid these problems.However, a barrier coating such as SiO 2 is expensive, and it is difficult to eliminate pinholes and the like. There is a disadvantage that the reliability of the effect is reduced. Therefore, in the case of an electronic device which requires high reliability, a low alkali glass or a non-alkali glass having a small alkali elution amount is often used as a substrate.
ところでガラスを2mm以下の薄板状に成形するには、
リドロー法、フュージョン法、スロットダウンドロー
法、ロールアウト法、フロート法等の成形法が公知であ
る。一般に、液相温度を下回る温度でガラスを形成する
とガラス中に結晶が生成されるため、成形温度は液相温
度以上でなければならない。従って、液相温度の低いガ
ラスほど成形温度の選択幅が大きくなり、安定した成形
が可能になる。フロート法はガラスの成形時の粘度が低
いために高い液相温度のガラスでも容易に成形できると
いう利点があるが、ガラス表面からかなり深い部分まで
Snが拡散するため、電子機器装置に用いられる基板とし
ての信頼性に欠けるという欠点がある。また前述した公
知の成形法のうちフロート法以外の成形法は、フロート
法のような異成分のガラス内部への拡散は少ないが、フ
ロート法に比べて成形する粘度が高いため液相温度の低
いガラスでないと成形できないという制約がある。この
ような成形法（以下、高粘度型成形法と呼ぶ）において
は通常、そのガラスの液相温度における粘度（以下、液
相粘度と呼ぶ）が105.0ポイズ、望ましくは105.5ポイズ
以上あることが必要であると言われている。By the way, to form glass into a thin plate of 2 mm or less,
Molding methods such as a redraw method, a fusion method, a slot down draw method, a rollout method, and a float method are known. In general, if the glass is formed at a temperature lower than the liquidus temperature, crystals are formed in the glass, so the forming temperature must be equal to or higher than the liquidus temperature. Accordingly, the glass having a lower liquidus temperature has a wider selection range of the molding temperature, and stable molding can be performed. The float method has the advantage that glass with a high liquidus temperature can be easily formed due to the low viscosity at the time of forming the glass, but from the glass surface to the deep part
Since Sn is diffused, there is a defect that the reliability as a substrate used in an electronic device is lacking. In addition, among the known molding methods described above, molding methods other than the float method have a low diffusion of heterogeneous components into the inside of glass as in the float method, but have a low liquidus temperature due to a higher molding viscosity than the float method. There is a restriction that molding cannot be performed without glass. Such molding (hereinafter, referred to as a high-viscosity molding method) normally in a viscosity at the liquidus temperature of the glass (hereinafter referred to as liquidus viscosity) is 10 5.0 poise, it preferably is 10 5.5 poise or higher Is said to be necessary.
また電子機器装置に用いられる基板は、装置の製造工
程において各種の薬品と接触するため耐薬品性に優れて
いることが要求される。In addition, a substrate used in an electronic device is required to be excellent in chemical resistance because it comes into contact with various chemicals in a manufacturing process of the device.
しかしながら実際のところ低アルカリガラスや無アル
カリガラスといったアルカリ溶出量の少ないガラスで上
記した基板に要求される液相粘度と耐薬品性を満足する
ものは存在しないのが現状である。例えば、この範疇に
はいるガラスとして知られるコーニング社製の7059ガラ
スは液相粘度が高く、成形性に優れているが、ガラスの
耐薬品性に劣るという欠点を有しており、電子機器装置
の製造工程で用いられる各種の薬品によってガラスの表
面が変質しやすいといった問題がある。また耐薬品性に
優れたガラスとして知られるホーヤ社製のLE−30ガラス
は液相粘度が非常に低く、公知の高粘度型成形法では成
形できないという欠点がある。However, at present, there is no glass having a low alkali elution amount such as low alkali glass or non-alkali glass that satisfies the liquid phase viscosity and chemical resistance required for the above-mentioned substrate at present. For example, Corning 7059 glass, which is known as a glass in this category, has a high liquidus viscosity and is excellent in moldability, but has a disadvantage that the chemical resistance of the glass is inferior, and the There is a problem that the surface of the glass is liable to be deteriorated by various kinds of chemicals used in the manufacturing process. Further, LE-30 glass manufactured by Hoya Co., Ltd., which is known as a glass having excellent chemical resistance, has a very low liquidus viscosity and has a drawback that it cannot be formed by a known high-viscosity molding method.
［発明の目的］ 本発明の目的は、アルカリ溶出量が少なく、耐薬品性
にも優れ、さらに2mm以下の板厚の薄板ガラスを公知の
高粘度型成形法でも安定して成形できるように、液相粘
度が105.0ポイズ以上である基板用ガラスを提供するこ
とである。[Object of the Invention] The object of the present invention is to reduce the amount of alkali elution, have excellent chemical resistance, and to stably form a thin glass sheet having a thickness of 2 mm or less by a known high-viscosity molding method. liquidus viscosity is to provide a glass substrate of 10 5.0 poise or higher.
［発明の構成］ 本発明者らは、種々の研究を重ねた結果、以下に示す
組成範囲のガラスが前述した目的を達成しうることを見
いだし、本発明として提案するものである。[Constitution of the Invention] As a result of various studies, the present inventors have found that glasses having the following composition ranges can achieve the above-mentioned objects, and propose the present invention.
すなわち本発明の基板用ガラスは、モル百分率で、Si
O271〜77％、Al2O32〜７％、B2O39〜15％、CaO0.2〜2.5
％、BaO0.2〜1.5％、Na2O5〜９％、K2O0〜２％、Na2O＋
K2O5〜10％からなる組成を有し、本質的にZnOを含有せ
ず、液相温度における粘度が105.0ポイズ以上であり、
耐薬品性に優れ、アルカリ溶出量の少ないことを特徴と
する。That is, the glass for a substrate of the present invention has a molar percentage of Si
O 2 71 to 77%, Al 2 O 3 2 to 7%, B 2 O 3 9 to 15%, CaO 0.2 to 2.5
%, BaO0.2~1.5%, Na 2 O5~9 %, K 2 O0~2%, Na 2 O +
Having a composition consisting of K 2 O5~10%, essentially contains no ZnO, and a viscosity of 10 5.0 poise or more at the liquidus temperature,
It is characterized by excellent chemical resistance and low alkali elution amount.
また本発明の基板用ガラスは、より好ましくはモル百
分率で、SiO272〜76％、Al2O33.8〜６％、B2O310〜14
％、CaO0.3〜1.2％、BaO0.3〜1.1％、Na2O6〜８％、K2O
0〜２％、Na2O＋K2O6〜９％からなる組成を有し、本質
的にZnOを含有せず、液相温度における粘度が105.5ポイ
ズ以上であり、耐薬品性に優れ、アルカリ溶出量の少な
いことを特徴とする。Glass substrate of the present invention is also more preferably in molar percentages, SiO 2 72~76%, Al 2 O 3 3.8~6%, B 2 O 3 10~14
%, CaO0.3~1.2%, BaO0.3~1.1%, Na 2 O6~8%, K 2 O
0-2%, has a composition consisting of Na 2 O + K 2 O6~9% , essentially contains no ZnO, and a viscosity of 10 5.5 poise or more at the liquidus temperature, excellent chemical resistance, alkali elution It is characterized by a small amount.
以下に本発明の基板用ガラスの組成範囲を上記のよう
に限定した理由について説明する。Hereinafter, the reason why the composition range of the glass for a substrate of the present invention is limited as described above will be described.
SiO2はガラス構造の骨格をなす基本成分であり、その
含量は71〜77％である。71％より少ないとアルカリ溶出
量が多くなると共に耐薬品性が悪化する。一方77％よい
多いとガラスの溶融性が悪化する。SiO 2 is a basic component constituting a skeleton of a glass structure, and its content is 71 to 77%. If it is less than 71%, the alkali elution amount increases and the chemical resistance deteriorates. On the other hand, if it is 77% higher, the melting property of glass deteriorates.
Al2O3の含量は２〜７％である。２％より少ないとガ
ラスのアルカリ溶出量が多くなり、また液相温度が上が
る。一方７％より多いとガラスの溶融性が悪化する。The content of Al 2 O 3 is 2 to 7%. If it is less than 2%, the alkali elution amount of the glass increases, and the liquidus temperature rises. On the other hand, if it is more than 7%, the melting property of the glass deteriorates.
B2O3の含量は９〜15％である。９％より少ないとガラ
スのアルカリ溶出量が多くなると共にガラスの溶融性が
悪化する。また15％より多くなってもガラスのアルカリ
溶出量が多くなる。The content of B 2 O 3 is 9 to 15%. If it is less than 9%, the amount of alkali eluted from the glass increases, and the meltability of the glass deteriorates. Further, even if it exceeds 15%, the alkali elution amount of glass increases.
CaOの含量は0.2〜2.5％である。0.2％より少ないと液
相温度が高くなり、また2.5％より多いとガラスの高温
粘度を下げるために相対的に液相温度が低くなる。The content of CaO is 0.2-2.5%. If it is less than 0.2%, the liquidus temperature becomes high, and if it is more than 2.5%, the liquidus temperature becomes relatively low in order to lower the high-temperature viscosity of the glass.
BaOの含量は0.2〜1.5％である。0.2％より少ないと液
相温度が高くなり、1.5％より多いとガラスの高温粘度
を下げるために相対的に液相粘度が低くなる。The content of BaO is 0.2-1.5%. If it is less than 0.2%, the liquidus temperature becomes high, and if it is more than 1.5%, the liquidus viscosity becomes relatively low in order to lower the high temperature viscosity of the glass.
Na2O及びK2Oの含量は、各々５〜９％と０〜２％であ
る。Na2Oが５％より少ないとガラスの溶融性が悪化す
る。またNa2Oが９％、K2Oが２％より多いとガラスのア
ルカリ溶出量が多くなるとともにガラスの溶融時におけ
る蒸発が多くなりガラスに脈理が発生しやすくなる。Na
2OとK2Oの合量は５〜10％である。５％より少ないとガ
ラスの溶融性が悪化する。一方、10％より多いとガラス
のアルカリ溶出量が多くなるとともにガラス溶融時の蒸
発が多くなりガラスに脈理が発生しやすくなる。The content of Na 2 O and K 2 O are each 5-9% and 0-2%. If the content of Na 2 O is less than 5%, the melting property of the glass deteriorates. If Na 2 O is more than 9% and K 2 O is more than 2%, the amount of alkali eluted from the glass increases, and the evaporation of the glass at the time of melting increases. Na
The total amount of 2 O and K 2 O is 5 to 10%. If it is less than 5%, the melting property of the glass deteriorates. On the other hand, if it is more than 10%, the amount of alkali eluted from the glass increases, and the evaporation at the time of melting the glass increases, so that striae is easily generated in the glass.
尚、本発明においては上記成分に加えて清澄剤として
As2O3、Sb2O3、NaCl、Na2SO4およびCaF2等の弗化物の中
から、少なくとも一種の成分を、モル百分率で0.5％ま
で含有することが可能である。In the present invention, as a fining agent in addition to the above components
From fluorides such as As 2 O 3 , Sb 2 O 3 , NaCl, Na 2 SO 4 and CaF 2, it is possible to contain at least one kind of component up to 0.5% in mole percentage.
しかしながらZnOは、ガラス溶融時に蒸発しやすく、
ガラスに脈理が発生する原因になるため含有しないこと
が肝要である。However, ZnO tends to evaporate when the glass melts,
It is important not to contain glass because it causes striae to occur in the glass.
［実施例］ 以下本発明の基板用ガラスを実施例に基づいて説明す
る。[Examples] Hereinafter, the glass for a substrate of the present invention will be described based on examples.
次表は本発明の実施例（試料No.1〜９）及び比較例
（試料No.10〜12）を示すものである。The following table shows Examples (Samples Nos. 1 to 9) and Comparative Examples (Samples Nos. 10 to 12) of the present invention.
表のNo.1〜12のガラス試料は、表に示す組成になるよ
うに調合した原料バッチを白金ルツボに入れて1550℃で
８時間溶融した後、カーボン板上に流し出して板状に成
形したものであり、各ガラス試料について液相粘度、耐
薬品性、アルカリ溶出量を調べた。 For the glass samples of Nos. 1 to 12 in the table, the raw material batch prepared to have the composition shown in the table was put in a platinum crucible, melted at 1550 ° C for 8 hours, and then poured out onto a carbon plate and formed into a plate shape. Each glass sample was examined for liquidus viscosity, chemical resistance, and alkali elution amount.
液相粘度は温度勾配炉を使用して求めた液相温度の特
性値と周知の白金球引き上げ法によって測定した粘度特
性値を組み合わせて算出した。耐薬品性は、試料ガラス
を鏡面に研磨して、10％の硫酸に各々80℃、８時間の条
件で処理した後の外観上の変化の有無を調べ、外観上の
変化が認められなかったものを○印、外観上の変化が認
められたものを×印で示した。またアルカリ溶出量は、
JIS R−3502に基づいて測定した。The liquidus viscosity was calculated by combining the liquidus temperature characteristic value obtained using a temperature gradient furnace with the viscosity characteristic value measured by a well-known platinum ball pulling-up method. As for chemical resistance, the sample glass was polished to a mirror surface and examined for any change in appearance after treatment with 10% sulfuric acid at 80 ° C. for 8 hours, and no change in appearance was observed. The samples were indicated by a circle, and those with a change in appearance were indicated by a cross. The alkali elution amount is
It was measured based on JIS R-3502.
この結果、本発明の実施例であるNo1〜９の試料は、
液相粘度が105.5ポイズ以上であり、耐薬品性に優れ、
且つアルカリ溶出量が0.1mg以下であることがわかっ
た。As a result, the samples of Nos. 1 to 9 according to the examples of the present invention are:
Liquidus viscosity is not less 10 5.5 poise or more, excellent chemical resistance,
It was also found that the alkali elution amount was 0.1 mg or less.
一方、通常のソーダライムガラス相当として作製した
No.10の試料は、アルカリ溶出量が極めて大きかった。
またNo.11及びNo.12の試料は、いずれもアルカリ溶出量
は0.1mg以下と少なかったが、No.11の試料は耐薬品性に
劣り、No.12の試料は液相粘度が103.4と低かった。On the other hand, it was made as equivalent to ordinary soda lime glass
The sample of No. 10 had an extremely large alkali elution amount.
The samples of No. 11 and No. 12 each had a small alkali elution amount of 0.1 mg or less, but the sample of No. 11 was inferior in chemical resistance, and the sample of No. 12 had a liquidus viscosity of 10 3.4. Was low.
［発明の効果］ 以上のように本発明の基板用ガラスはアルカリ溶出量
が少ないために、電子機器装置のガラス基板として用い
る際にSiO2等のバリヤー被膜を必要としない。また耐薬
品性に優れているために、これらの電子機器装置の製造
工程で用いられる各種の薬品に対して安定である。しか
も液相粘度が高いために、公知の高粘度型成形法によっ
て2mm以下の厚さの薄板に安定して成形することが可能
である。[Effects of the Invention] As described above, since the glass for a substrate of the present invention has a small amount of alkali elution, it does not require a barrier coating such as SiO2 when used as a glass substrate of an electronic device. In addition, since it is excellent in chemical resistance, it is stable against various chemicals used in the manufacturing process of these electronic devices. In addition, since the liquidus viscosity is high, it is possible to stably form a thin plate having a thickness of 2 mm or less by a known high viscosity molding method.
Claims (2)
％、B2O39〜15％、CaO0.2〜2.5％、BaO0.2〜1.5％、Na2
O5〜９％、K2O0〜２％、Na2O＋K2O5〜10％からなる組成
を有し、本質的にZnOを含有せず、液相温度における粘
度が105.0ポイズ以上であり、耐薬品性に優れ、アルカ
リ溶出量の少ないことを特徴とする基板用ガラス。(1) SiO 2 71-77%, Al 2 O 3 2-7 in mole percentage
%, B 2 O 3 9~15% , CaO0.2~2.5%, BaO0.2~1.5%, Na 2
O5~9%, K 2 O0~2%, has a composition consisting of Na 2 O + K 2 O5~10% , essentially free of ZnO, and a viscosity at the liquidus temperature is 10 5.0 poise or more, resistance to Glass for substrates characterized by excellent chemical properties and low alkali elution amount.
６％、B2O310〜14％、CaO0.3〜1.2％、BaO0.3〜1.1％、
Na2O6〜８％、K2O0〜２％、Na2O＋K2O6〜９％からなる
組成を有し、本質的にZnOを含有せず、液相温度におけ
る粘度が105.5ポイズ以上であり、耐薬品性に優れ、ア
ルカリ溶出量の少ないことを特徴とする特許請求の範囲
第１項記載の基板用ガラス。2. The composition according to claim 2, wherein the molar percentage of SiO 2 is 72-76%, and that of Al 2 O 3 3.8-
6%, B 2 O 3 10~14 %, CaO0.3~1.2%, BaO0.3~1.1%,
Na 2 O6~8%, K 2 O0~2 %, has a composition consisting of Na 2 O + K 2 O6~9% , essentially contains no ZnO, viscosity at liquidus temperature be 10 5.5 poise or higher 2. The glass for a substrate according to claim 1, wherein the glass for a substrate is excellent in chemical resistance and has a small amount of alkali elution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1285962A JP2743333B2 (en) | 1989-10-31 | 1989-10-31 | Glass for substrates |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1285962A JP2743333B2 (en) | 1989-10-31 | 1989-10-31 | Glass for substrates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03146435A JPH03146435A (en) | 1991-06-21 |
| JP2743333B2 true JP2743333B2 (en) | 1998-04-22 |
Family
ID=17698214
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1285962A Expired - Fee Related JP2743333B2 (en) | 1989-10-31 | 1989-10-31 | Glass for substrates |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2743333B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8445394B2 (en) | 2008-10-06 | 2013-05-21 | Corning Incorporated | Intermediate thermal expansion coefficient glass |
| US8647995B2 (en) | 2009-07-24 | 2014-02-11 | Corsam Technologies Llc | Fusion formable silica and sodium containing glasses |
| US8975199B2 (en) | 2011-08-12 | 2015-03-10 | Corsam Technologies Llc | Fusion formable alkali-free intermediate thermal expansion coefficient glass |
| US9701567B2 (en) | 2013-04-29 | 2017-07-11 | Corning Incorporated | Photovoltaic module package |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10005088C1 (en) | 2000-02-04 | 2001-03-15 | Schott Glas | Aluminoborosilicate glass used e.g. as substrate glass in thin layer photovoltaic cells contains oxides of silicon, boron, aluminum, sodium, potassium, calcium, strontium, barium, tin, zirconium, titanium and zinc |
| JP4643863B2 (en) * | 2001-07-11 | 2011-03-02 | 富士電機ホールディングス株式会社 | SUBSTRATE FOR INFORMATION RECORDING MEDIUM, INFORMATION MAGNETIC RECORDING MEDIUM, AND METHOD FOR PRODUCING THEM |
| JP4953156B2 (en) * | 2005-06-29 | 2012-06-13 | 日本電気硝子株式会社 | Optical glass |
| US7666511B2 (en) * | 2007-05-18 | 2010-02-23 | Corning Incorporated | Down-drawable, chemically strengthened glass for cover plate |
| IT1397100B1 (en) | 2009-12-24 | 2012-12-28 | Gerresheimer Pisa Spa | GLASS COMPOSITION FOR TUBULAR SOLAR THERMAL COLLECTORS PROVIDED WITH A GLASS-METAL JUNCTION. |
| KR102533219B1 (en) * | 2016-11-30 | 2023-05-16 | 코닝 인코포레이티드 | Fusion-formable automotive glass compositions, articles and laminates |
-
1989
- 1989-10-31 JP JP1285962A patent/JP2743333B2/en not_active Expired - Fee Related
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8445394B2 (en) | 2008-10-06 | 2013-05-21 | Corning Incorporated | Intermediate thermal expansion coefficient glass |
| US9266769B2 (en) | 2008-10-06 | 2016-02-23 | Corsam Technologies Llc | Intermediate thermal expansion coefficient glass |
| US10196297B2 (en) | 2008-10-06 | 2019-02-05 | Corning, Incorporated | Intermediate thermal expansion coefficient glass |
| US8647995B2 (en) | 2009-07-24 | 2014-02-11 | Corsam Technologies Llc | Fusion formable silica and sodium containing glasses |
| US9530910B2 (en) | 2009-07-24 | 2016-12-27 | Corsam Technologies Llc | Fusion formable silica and sodium containing glasses |
| US8975199B2 (en) | 2011-08-12 | 2015-03-10 | Corsam Technologies Llc | Fusion formable alkali-free intermediate thermal expansion coefficient glass |
| US9643883B2 (en) | 2011-08-12 | 2017-05-09 | Corsam Technologies Llc | Fusion formable alkali-free intermediate thermal expansion coefficient glass |
| US9701567B2 (en) | 2013-04-29 | 2017-07-11 | Corning Incorporated | Photovoltaic module package |
| US10407338B2 (en) | 2013-04-29 | 2019-09-10 | Corning Incorporated | Photovoltaic module package |
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| Publication number | Publication date |
|---|---|
| JPH03146435A (en) | 1991-06-21 |
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| LAPS | Cancellation because of no payment of annual fees |