JP2664220B2 - Liquid jet recording head - Google Patents
Liquid jet recording headInfo
- Publication number
- JP2664220B2 JP2664220B2 JP24511688A JP24511688A JP2664220B2 JP 2664220 B2 JP2664220 B2 JP 2664220B2 JP 24511688 A JP24511688 A JP 24511688A JP 24511688 A JP24511688 A JP 24511688A JP 2664220 B2 JP2664220 B2 JP 2664220B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- recording
- heat generating
- recording liquid
- recording head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14032—Structure of the pressure chamber
- B41J2/1404—Geometrical characteristics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14379—Edge shooter
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/11—Embodiments of or processes related to ink-jet heads characterised by specific geometrical characteristics
Landscapes
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は、液体噴射記録ヘッドに関し、特に記録用液
体に熱エネルギを作用させることにより液体を沸騰さ
せ、これにより液滴を噴射(吐出)して記録を行う形態
の液体噴射記録ヘッドに関するものである。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid ejecting recording head, and more particularly to applying a thermal energy to a recording liquid to boil the liquid, thereby ejecting (discharging) liquid droplets. The present invention relates to a liquid ejecting recording head of a type for performing recording.
[従来の技術] この種液体噴射記録ヘッドないし電気熱変換体に要求
される性能としては、高速駆動時の応答性が高いこと、
液体を沸騰させるのに充分な加熱が可能であることに加
え、耐久性が高いことがある。そのために従来より材
料,構成の面で種々の改良がなされてきた。[Prior art] The performance required of this type of liquid jet recording head or electrothermal transducer is that it has high responsiveness during high-speed driving,
In addition to being capable of heating sufficient to bring the liquid to a boil, it may have high durability. For this purpose, various improvements have been made in terms of materials and configurations.
例えば、本願人の出願になる特開昭58−33471号で
は、電気熱変換体を、電極との接続部における電流密度
を低下させるような抵抗分布を有する構成とし、電気的
耐久性を向上した記録ヘッドを開示している。For example, in Japanese Patent Application Laid-Open No. 58-33471 filed by the present applicant, the electrothermal transducer is configured to have a resistance distribution that reduces the current density at the connection portion with the electrode, thereby improving the electrical durability. A recording head is disclosed.
また、同じく特開昭60−208246号では、電気熱変換体
に、液体供給に伴って生じる機械的衝撃を回避する部材
を設け、機械的耐久性を向上した記録ヘッドを開示して
いる。Japanese Patent Application Laid-Open No. 60-208246 discloses a recording head in which an electrothermal transducer is provided with a member for avoiding mechanical shock caused by liquid supply, thereby improving mechanical durability.
また、特開昭59−95155号では、電気熱変換体(抵抗
器)の中心部に導電領域を設ける構成が開示されてい
る。Japanese Patent Application Laid-Open No. 59-95155 discloses a configuration in which a conductive region is provided at the center of an electrothermal converter (resistor).
さらに、本願人の出願になる特開昭62−73588号で
は、電極および電気熱変換体(発熱抵抗体)に丸みを付
けることによって電流集中をなくすようにした構成を開
示している。Furthermore, Japanese Patent Application Laid-Open No. 62-73588 filed by the present applicant discloses a configuration in which current concentration is eliminated by rounding the electrodes and the electrothermal converter (heating resistor).
[発明が解決しようとする課題] しかしながら、吐出エネルギ発生手段に電気熱変換体
を有する記録ヘッドにあっては、上記条件に加え、沸騰
の再現性が高いことが要求される。[Problems to be Solved by the Invention] However, in a recording head having an electrothermal converter as a discharge energy generating means, in addition to the above conditions, high reproducibility of boiling is required.
本願の発明者によれば、液体を繰り返し沸騰させる場
合、電気熱変換体に前回に与えた駆動信号(加熱パル
ス)によって発生した気泡が消滅する際に、微視的残留
気体が電気熱変換体の表面にランダムに付着し、それが
次のパルス加熱の初期気泡発生時において発泡核となる
ために沸騰の再現性が保証されないということが確認さ
れている。According to the inventor of the present application, when a liquid is repeatedly boiled, when bubbles generated by a drive signal (heating pulse) given last time to the electrothermal converter disappear, microscopic residual gas is generated by the electrothermal converter. It has been confirmed that the reproducibility of boiling is not ensured because it randomly adheres to the surface and becomes foam nuclei when initial bubbles are generated in the next pulse heating.
このように沸騰現象が安定しないと、発生する気泡の
形状や大きさが一定しなくなり、従って液滴径や吐出速
度にバラツキが生じ、ひいては画像品位が低下するとい
う問題点が生じうる。If the boiling phenomenon is not stable as described above, the shape and size of the generated bubbles will not be constant, and therefore, there will be a problem in that the diameter of the droplets and the discharge speed vary, and the image quality is reduced.
本発明の目的は、沸騰の再現性の高い記録ヘッドを提
供することにある。An object of the present invention is to provide a recording head having high reproducibility of boiling.
本発明の他の目的は、液滴径や吐出速度にバラツキが
生じず、画像品位の高い液体噴射記録ヘッドを提供する
ことにある。It is another object of the present invention to provide a liquid jet recording head which has high image quality without variations in droplet diameter and ejection speed.
[課題を解決するための手段] 本発明による液体噴射記録ヘッドは、支持体と、この
支持体上に配され、発熱抵抗体層およびこの発熱抵抗体
層に電気的に接続された一対の電極を有し、これら一対
の電極間に形成された熱発生部に対応する記録用液体接
触面上の記録用液体に生ずる気泡が消滅する位置を含む
部分で、厚みを大とした形状を有する電気熱変換体と、
この電気熱変換体により前記記録用液体を加熱して発泡
させるための駆動手段と、前記記録用液体の液路を形成
するために前記支持体上に設けた部材とを具備し、ΔT
=TH−TOが20℃以上100℃以下であることを特徴とす
る。[Means for Solving the Problems] A liquid jet recording head according to the present invention includes a support, a heating resistor layer disposed on the support, and a pair of electrodes electrically connected to the heating resistor layer. A portion including a position where bubbles generated in the recording liquid on the recording liquid contact surface corresponding to the heat generating portion formed between the pair of electrodes disappear, and having an increased thickness. A heat converter,
A driving unit for heating and bubbling the recording liquid by the electrothermal transducer, and a member provided on the support for forming a liquid path of the recording liquid;
= T H -T O is characterized in that at 100 ° C. or less 20 ° C. or higher.
ここで、TOは、熱発生部に対応する記録用液体接触面
上の記録用液体に生じる気泡が消滅する位置において、
記録用液体を加熱して発泡させるための駆動条件と同一
の条件で、記録用液体が存在しないときの電気熱変換体
の駆動状態での温度のピーク値であり、THは熱発生部に
対応する記録用液体接触面上の記録用液体に生じる気泡
が消滅する位置以外の位置において、記録用液体を加熱
して発泡させるための駆動条件と同一の条件で、記録用
液体が存在しないときの電気熱変換体の駆動状態での温
度のピーク値である。Here, T O is a position where bubbles generated in the recording liquid on the recording liquid contact surface corresponding to the heat generating portion disappear.
Under the same driving conditions for heating and bubbling the recording liquid, the peak value of the temperature in the driving state of the electrothermal transducer when the recording liquid does not exist, and TH is the heat generation portion. When the recording liquid does not exist under the same driving conditions for heating and bubbling the recording liquid at a position other than the position where the bubbles generated in the recording liquid on the corresponding recording liquid contact surface disappear. Is the peak value of the temperature when the electrothermal transducer is driven.
[作 用] 本発明によれば、電気熱変換体の層厚を、電極との電
極との間の電流の通り道の部分であって気泡が消滅する
位置を含む部分において大とすることにより、電気熱変
換体から上部の液体に伝わる熱流束が、その部分におい
て小さくなる。[Operation] According to the present invention, the layer thickness of the electrothermal transducer is increased at a portion of the passage of the current between the electrodes and at a portion including the position where the bubbles disappear, The heat flux transmitted from the electrothermal converter to the upper liquid is reduced at that portion.
従って、この部分は他の部分に比べて温度が低く、気
泡消滅後にその部分に微視的残留気体が付着していて
も、続く駆動時にこれが発泡核となることがない。Therefore, the temperature of this portion is lower than that of the other portions, and even if microscopic residual gas adheres to the portion after the bubbles have disappeared, it does not become a foam nucleus during the subsequent driving.
また、当該温度差を適切に選定して構成することによ
り、高い吐出性能を維持し、これによる効果とあいまっ
て、沸騰の再現性が向上し、ひいては良好な記録品位が
得られる。In addition, by appropriately selecting and configuring the temperature difference, high ejection performance is maintained, and together with the effect of this, the reproducibility of boiling is improved, and good recording quality is obtained.
[実施例] 以下、図面を参照して本発明を詳細に説明する。Examples Hereinafter, the present invention will be described in detail with reference to the drawings.
第1図(A)および(B)は、本発明を適用可能な液
体噴射記録ヘッドの一例として、複数の液路、電気熱変
換体および吐出口(オリフィス)を含む吐出部を複数集
積して配置した形態の液体噴射記録ヘッドを示す斜視図
およびそのX−X′線断面図である。FIGS. 1A and 1B show an example of a liquid jet recording head to which the present invention can be applied, in which a plurality of ejection sections including a plurality of liquid paths, electrothermal transducers, and ejection ports (orifices) are integrated. FIG. 1 is a perspective view showing a liquid jet recording head in a disposed form, and a cross-sectional view taken along line XX ′ of FIG.
これらの図において、基板103上に発熱抵抗体107(10
7−1〜107−6)、および通電のための電極として共通
電極106,選択電極105が配されており、発熱抵抗体107が
丁度溝蓋板102に形成された隔壁101a〜101gにより限界
された溝101(101−1〜101−6)と一致するように接
着層104(104−1〜104−7)によって接合する。これ
に液体(インク)を導入し、通電により発熱抵抗体107
を加熱すると、発熱抵抗体107上の液体に急峻な状態変
化によって気泡が生じ、その体積増加に対応した液滴が
溝蓋板102と基板103とによって形成されたオリフィスよ
り吐出される。In these figures, a heating resistor 107 (10
7-1 to 107-6), and a common electrode 106 and a selection electrode 105 are arranged as electrodes for energization. The bonding is performed by the adhesive layer 104 (104-1 to 104-7) so as to coincide with the groove 101 (101-1 to 101-6). A liquid (ink) is introduced into this, and the heating resistor 107
Is heated, bubbles are generated in the liquid on the heating resistor 107 due to a sharp change in state, and droplets corresponding to the increase in the volume are discharged from the orifice formed by the groove cover plate 102 and the substrate 103.
本例に係る発熱抵抗体107は、後述のように、気泡消
滅位置において層厚が大となった部分を有する構成とす
る。The heating resistor 107 according to the present example has a configuration in which the layer thickness is large at the bubble disappearance position, as described later.
ここで、気泡消滅位置(消泡位置)について考察す
る。Here, the bubble disappearance position (defoaming position) will be considered.
消泡位置は、発熱抵抗体を配設した液路の形状,配設
位置,温度その他の環境条件などにより定まり、気泡周
辺の流域における流体力学的インピーダンスの慣性成分
Zの影響を受け、そのZの逆比で発熱抵抗体を比例配分
した位置付近で消泡することを本願の発明者は確認し
た。つまり、消泡位置は温度によって微妙に変化するも
のの、流路形状にほぼ依存し、同一のヘッドおよび同一
のインクを用いた場合には、ほぼ一定の位置となる。The defoaming position is determined by the shape of the liquid passage in which the heating resistor is disposed, the disposing position, temperature and other environmental conditions, and is affected by the inertia component Z of the hydrodynamic impedance in the flow area around the bubble. The inventor of the present application has confirmed that bubbles are eliminated near the position where the heating resistor is proportionally distributed at the inverse ratio of In other words, although the defoaming position slightly changes depending on the temperature, it almost depends on the shape of the flow path, and is substantially constant when the same head and the same ink are used.
第2図に示すように、流路の開口端、つまり液路の供
給口および吐出口から発熱低抗体107の端部に至るl1,l2
に対応した流域(以下、これを着目する流域と記述す
る)について、流れの方向にとった位置をx,流域の位置
xにおける断面積をS(x),流域の長さをl,流体(記録用
液体)の密度をρとすると、流域のインピーダンス慣性
成分Zは、 によって求められる。As shown in FIG. 2 , l 1 and l 2 extending from the open end of the flow path, that is, the supply port and the discharge port of the liquid path to the end of the low heat antibody 107
For a basin corresponding to the following (hereinafter referred to as a basin of interest), the position taken in the flow direction is x, the cross-sectional area at the position x of the basin is S (x) , the length of the basin is l, and the fluid ( Assuming that the density of the recording liquid is ρ, the impedance inertia component Z of the basin is Required by
例えば、第1図示のように、発熱抵抗体107に対し
て、液体の供給方向と吐出方向とが一致する形態のもの
にあっては、第2図に示すように、断面積S(x)=S=一
定とすると、 Z1=ρl1/S,Z2=ρl2/S (2) C1:C2Z2:Z1=l2:l1 (3) となる。すなわち、この関係式により定まる位置付近で
消泡することになる。For example, as shown in FIG. 1, in the case where the liquid supply direction and the discharge direction coincide with each other with respect to the heating resistor 107, as shown in FIG. 2, the sectional area S (x) Assuming that = S = constant, Z 1 = ρl 1 / S, Z 2 = ρl 2 / S (2) C 1 : C 2 Z 2 : Z 1 = l 2 : l 1 (3) In other words, the bubble disappears near the position determined by this relational expression.
そこで、その位置を含む部位で発熱抵抗体107の層を
厚くしておけば、上部の液体に伝わる熱流束がその部分
において小となる。Therefore, if the layer of the heating resistor 107 is made thicker at a portion including that position, the heat flux transmitted to the liquid at the top becomes smaller at that portion.
以上が一般的な関係であるが、簡易的に位置xにおけ
るノズル天井の高さをh(x)としたとき、 として、C1:C2=w2:w1なる位置において気泡が消滅する
としても十分であった。The above is the general relationship, but simply when the height of the nozzle ceiling at the position x is h (x), It was sufficient even if bubbles disappeared at the position of C 1 : C 2 = w 2 : w 1 .
次に、当該消泡位置を含む領域がそれ以外の領域と何
程の温度差を有している場合に吐出性能を良好に維持で
きるかについて考察する。Next, consideration will be given to how much the temperature difference between the region including the defoaming position and the other region can maintain the ejection performance satisfactorily.
第3図は発熱抵抗体の表面温度のピーク値THと、層厚
を大とした領域に対応した表面温度のピーク値TOとの差
ΔT(=TH−TO)について、液滴吐出速度の平均値お
よび速度の標準偏差σvをプロットしたものである。た
だし、ここに温度差ΔTは、流路内にインクを存在させ
ない状態での値である。Figure 3 is the peak value T H of the surface temperature of the heating resistor, the difference ΔT (= T H -T O) of the peak value T O of the surface temperature corresponding to a region where the layer thickness and large, the droplets The average value of the discharge speed and the standard deviation σv of the speed are plotted. Here, the temperature difference ΔT is a value in a state where ink does not exist in the flow path.
図より明らかなように、温度差ΔTが20℃以上であれ
ば、σvがほぼ一定となり、吐出のばらつきが安定する
が、100℃を超えると平均速度が低下することが確認
された。これより、この場合には温度差ΔTは20℃以上
100℃以下が好ましいことがわかる。As is clear from the figure, it was confirmed that when the temperature difference ΔT was 20 ° C. or more, σv was substantially constant, and the dispersion of ejection was stabilized, but when the temperature difference ΔT exceeded 100 ° C., the average speed was reduced. Thus, in this case, the temperature difference ΔT is 20 ° C. or more.
It turns out that 100 degreeC or less is preferable.
より好ましくは、液体の吐出速度の標準偏差について
はある程度無視し得る場合、すなわち液体の吐出速度を
主として考慮した場合には、ΔTは20℃以上60℃以下、
液体の吐出速度をある程度無視し得る場合、すなわち上
記標準偏差を主として考慮した場合にはΔTは25℃以上
100℃以下であった。さらに、最も好ましくは、ΔTは2
5℃以上60℃以下であった。More preferably, when the standard deviation of the liquid ejection speed can be neglected to some extent, that is, when mainly considering the liquid ejection speed, ΔT is 20 ° C. or more and 60 ° C. or less,
When the liquid discharge speed can be neglected to some extent, that is, when the above-mentioned standard deviation is mainly considered, ΔT is 25 ° C. or more.
It was below 100 ° C. Further, most preferably, ΔT is 2
It was 5 ° C or more and 60 ° C or less.
さらに、本実施例においては、発熱抵抗層の層厚を大
とした消泡位置を含む領域の寸法を適切に定める。Further, in this embodiment, the dimensions of the region including the defoaming position where the thickness of the heat generating resistance layer is increased are appropriately determined.
第4図は、当該領域の発熱部面積SOと発熱抵抗体の全
発熱部面積SHとの比SO/SHについて、およびσvをプ
ロットしたものである。図より明らかなように、SO/SH
を1/10以上1/2以下としたときにおよびσv値が安定
し、吐出性能が良好となることが確認された。FIG. 4 is a plot of the ratio S O / S H between the heat generating area S O of the region and the total heat generating area S H of the heat generating resistor, and σv. As is clear from the figure, S O / S H
Was set to 1/10 or more and 1/2 or less, and the σv value was stabilized, and it was confirmed that the ejection performance was good.
より好ましくは、液体の吐出速度の標準偏差について
はある程度無視し得る場合、すなわち液体の吐出速度を
主として考慮した場合にはSO/SHは1/10以上1/4以下、液
体の吐出速度をある程度無視し得る場合、すなわち上記
標準偏差を主として考慮した場合にはSO/SHは1/8以上1/
2以下であった。さらに、最も好ましくは、SO/SHは1/8
以上1/4以下であった。More preferably, when the standard deviation of the liquid discharge speed is negligible to some extent, that is, when mainly considering the liquid discharge speed, S O / SH is 1/10 or more and 1/4 or less, the liquid discharge speed. Can be neglected to some extent, that is, when mainly considering the above standard deviation, S O / S H is 1/8 or more 1 /
2 or less. Furthermore, most preferably, S O / S H 1/8
More than 1/4 or less.
(実施例1) 第5図(A)および(B)は本発明に係る基板の第1
の実施例を示し、それぞれ、第1図(A)において液路
方向に沿った平面図およびそのA−A′線断面図であ
る。Example 1 FIGS. 5A and 5B show a first example of a substrate according to the present invention.
FIG. 1 (A) is a plan view along a liquid path direction and FIG. 1 (A) is a sectional view taken along line AA ′.
ここで、1は例えば厚さ525μmの基板であり、ガラ
スまたはSi等で形成できる。2は厚さ2.5μmの表面酸
化SiO2層であり、蓄熱層として用いる。3は例えばスパ
ッタリング法で形成した厚さ0.1μm,発熱部幅30μm,発
熱部長さ150μmのHfB2から成る発熱抵抗体層であり、
気泡が消滅する位置を含む3−1の部分(式(2)にお
いてl1l2とすれば、電極4間の電流の通り道の半ば付
近)ではその層厚を0.2μmとしたものである。4は例
えばEB蒸着法で形成した厚さ0.5μmのAl等の電極であ
る。Here, 1 is a substrate having a thickness of, for example, 525 μm, which can be formed of glass, Si, or the like. Reference numeral 2 denotes a 2.5 μm thick surface oxidized SiO 2 layer, which is used as a heat storage layer. Reference numeral 3 denotes a heating resistor layer made of, for example, HfB2 having a thickness of 0.1 μm, a heating portion width of 30 μm, and a heating portion length of 150 μm formed by a sputtering method.
The layer thickness is set to 0.2 μm in the portion 3-1 including the position where the bubble disappears (where l 1 l 2 in the formula (2) is near the middle of the path of the current between the electrodes 4). Reference numeral 4 denotes, for example, an electrode made of Al or the like having a thickness of 0.5 μm and formed by EB evaporation.
5は、例えばスパッタリング法で形成した厚さ1.5μ
mのSiO2,SiN等の層、6は例えばスパッタリング法で形
成した厚さ0.1μmのTa2O5等の層、7はスパッタリング
法で形成した厚さ0.5μmのTa等の層であり、これらは
保護として機能する。また、8は沸騰させられる液体
(インク)である。5 is, for example, a 1.5 μm thick film formed by a sputtering method.
SiO 2, a layer such as SiN of m, a layer such as of Ta 2 O 5 which has a thickness of 0.1μm is formed by sputtering, for example 6, 7 is a layer of Ta or the like having a thickness of 0.5μm was formed by a sputtering method, These serve as protection. Reference numeral 8 denotes a liquid (ink) to be boiled.
本実施例において、発熱抵抗層3の部分3−1の層厚
dと、空焚き時(インクを導入せずに通電を行ったと
き)の温度差ΔTの間の関係は次の通りであった。In the present embodiment, the relationship between the layer thickness d of the portion 3-1 of the heat generating resistance layer 3 and the temperature difference ΔT at the time of idling (when energizing without introducing ink) is as follows. Was.
従って、成分3−1の厚みは0.135μm以上0.155μm
以下であるのが適当であり、本例ではd=0.14μmとし
た。 Therefore, the thickness of the component 3-1 is 0.135 μm or more and 0.155 μm or more.
The following is appropriate, and in this example, d = 0.14 μm.
また、部分3−1の長さを25μmとし、ここにSO=30
×25(μm2)、SH=30×150(μm2)であり、従ってSO/
SHは1/6であるので、第4図について説明した条件も満
たしている。The length of the portion 3-1 is 25 μm, where S O = 30.
× 25 (μm 2 ), S H = 30 × 150 (μm 2 ), so that S O /
Since S H is a 1/6, also meet the conditions described for Figure 4.
なお、発熱抵抗体層3および電極4の平面パターンは
エッチングによって形成した。また、図より明らかなよ
うに、電極4と発熱抵抗体層3との接続部において角に
丸みをつけ、電流集中に伴う耐久性の低下や局所的な発
泡が生じない構成としてある。The plane patterns of the heating resistor layer 3 and the electrode 4 were formed by etching. Further, as is apparent from the figure, the connection portion between the electrode 4 and the heating resistor layer 3 has a rounded corner so that durability is not reduced and local foaming due to current concentration is not caused.
かかる構成において、電極4の間に電圧を印加する
と、発熱抵抗体層3に電流が流れ、発熱が起こる。発熱
抵抗体層3で発生する単位時間・単位面積当たりの発熱
量は発熱抵抗体層の厚みに反比例するから、部分3−1
から上部層5,6および7を通して液体8に伝えられる熱
は、発熱抵抗体3層の他の部分から液体に伝えられる熱
に比べて少なくなる。In such a configuration, when a voltage is applied between the electrodes 4, a current flows through the heating resistor layer 3 to generate heat. The amount of heat generated in the heating resistor layer 3 per unit time / unit area is inversely proportional to the thickness of the heating resistor layer.
The amount of heat transferred to the liquid 8 through the upper layers 5, 6 and 7 is smaller than the amount of heat transferred to the liquid from other portions of the heating resistor 3 layer.
本実施例に係る基板を用いて実際に気泡が発生させて
みたところ、第6図に示すように、部分3−1の上部の
場所9において気泡10が消滅することが観察されたが、
この部分に伝わる熱は少なく、残りの部分に比べて温度
が低いために残留気体が付着してもそこからランダムな
核沸騰が起きて気泡発生を乱すということはなく、残り
の部分から極めて再現性の高い膜沸騰が起きていた。こ
の場合、気泡の形状・大きさは毎回一定であった。そし
て、この基板を第1図のように記録ヘッドに用いて記録
を行ったところ、液滴径・吐出速度が均一となり、良好
な画像が得られた。When bubbles were actually generated using the substrate according to the present example, as shown in FIG. 6, it was observed that bubbles 10 disappeared at the location 9 above the portion 3-1.
The heat transmitted to this part is small, and the temperature is lower than the rest, so even if residual gas adheres, random nucleate boiling does not occur and disturbs bubble generation, it is extremely reproduced from the rest Highly likely film boiling occurred. In this case, the shape and size of the bubbles were constant each time. Then, when recording was performed using this substrate as a recording head as shown in FIG. 1, the droplet diameter and discharge speed became uniform, and a good image was obtained.
部分3−1の上部以外の部分での沸騰の再現性が高い
のは残留気体が付着していない上に液体8が急激に加熱
されるために、液体8が過熱限界付近に到達し、液体内
部の分子運動に基づく自発的核生成現象によって気泡が
形成されるからである。The high reproducibility of boiling in the part other than the upper part of the part 3-1 is because the liquid 8 is heated rapidly because the residual gas is not attached and the liquid 8 reaches the vicinity of the overheating limit. This is because bubbles are formed by a spontaneous nucleation phenomenon based on internal molecular motion.
比較例 第7図(従来例)は、発熱抵抗体層3の多層を均一と
した以外は本実施例と同一の構成からなる電気熱変換体
を用いて気泡を発生させた場合の図を示し、本実施例と
は異なり気泡10が消滅する場合からランダムな核沸騰が
起こり、気泡発生の再現性が低下している。Comparative Example FIG. 7 (conventional example) shows a case in which bubbles are generated using an electrothermal converter having the same configuration as that of the present example except that the multilayered heating resistor layer 3 is made uniform. Unlike the present embodiment, random nucleate boiling occurs when the bubbles 10 disappear and the reproducibility of bubble generation is reduced.
すなわち図中(a)の場合には核沸騰の起こる場所が
1箇所であって比較的良好な気泡生成が実現している
が、いつもそのような気泡生成が実現するわけではな
く、図中(b)あるいは(c)のように複数の場所から
核沸騰が起こる場合もあり、その場合核沸騰熱伝達によ
って熱エネルギが液体中に逃げ、、気泡体積が小さくな
ってしまう。このような例では、気泡の形状・大きさが
一定でないために、記録ヘッドを構成して記録を行った
ところ、液滴径や吐出速度にバラツキが生じ、画像の品
位が低下することが確認された。That is, in the case of (a) in the figure, although there is only one place where nucleate boiling occurs, relatively good bubble generation is realized, but such bubble generation is not always realized. In some cases, nucleate boiling occurs from a plurality of locations as in b) or (c). In this case, heat energy escapes into the liquid due to nucleate boiling heat transfer, and the volume of bubbles decreases. In such an example, since the shape and size of the bubbles are not constant, when a recording head is configured and recording is performed, it is confirmed that the droplet diameter and the discharge speed vary, and the image quality is reduced. Was done.
(実施例2) 第8図は、本発明に係る基板の第2の実施例を示す。Embodiment 2 FIG. 8 shows a second embodiment of the substrate according to the present invention.
上記第1の実施例では部分3−1を発熱抵抗体層3と
同時形成したのに対し、本実施例では発熱抵抗体層3′
の形成後に同じく電気熱変換体をなす部分3′−1を形
成した重層構成としてある。この重層部分3′−1は、
発熱抵抗体層3′と同じ材質(ればHfB2)で形成しても
よく、あるいは異なる材質(例えばTaとTaAl)を用いて
もよい。この実施例においても(実施例1)と同様の効
果が得られた。In the first embodiment, the portion 3-1 is formed simultaneously with the heating resistor layer 3, whereas in the present embodiment, the heating resistor layer 3 'is formed.
Is formed in a multi-layered structure in which a portion 3'-1 forming an electrothermal converter is formed after the formation. This layer portion 3'-1 is
It may be formed of the same material as the heating resistor layer 3 '(lever HfB 2), or different material (e.g., Ta and TaAl) may be used. In this embodiment, the same effect as that of the first embodiment was obtained.
このように、気泡が消滅する位置が完全に含まれるも
のであれば、層を厚くする部分の形成態様はいかなるも
のであってもよい。As long as the position at which the bubble disappears is completely included in this manner, any mode of forming the layer for increasing the thickness may be used.
(実施例3) 以上の実施例では、液路が直線状である記録ヘッドに
本発明を適用した場合について述べたが、供給方向と吐
出方向とが異なる形態の記録ヘッド、例えば第9図に示
すように、基板1′に対して垂直方向に吐出がなされる
形態のものであっても、図示の消泡位置9を含む部分に
おいて発熱抵抗体層107′の層厚を大とすることによ
り、上述と同様の効果が得られる。(Embodiment 3) In the above embodiment, the case where the present invention is applied to the recording head in which the liquid path is linear has been described. However, a recording head in which the supply direction and the ejection direction are different, for example, as shown in FIG. As shown in the drawing, even in the case where the discharge is performed in the direction perpendicular to the substrate 1 ′, by increasing the thickness of the heating resistor layer 107 ′ in the portion including the defoaming position 9 shown in the drawing. The same effect as described above can be obtained.
(さらに他の実施例) 本発明は、発熱抵抗体の形状によらず適用できるのは
勿論である。すなわち、上述した従来例において採用さ
れている発熱抵抗体に対しても、その消泡位置に層を厚
くした部分を設ければよい。(Still Another Embodiment) The present invention can of course be applied regardless of the shape of the heating resistor. That is, a thicker portion may be provided at the defoaming position also in the heating resistor employed in the above-described conventional example.
また、近年開発されている階調表現が可能な形状の電
気熱変換体を有する記録ヘッド、例えば本願人の提案に
なる特公昭59−31943号に開示されるようなものに対し
ても有効に適用可能である。すなわち、電気熱変換体
を、その発熱部において入力される信号のレベルに応じ
て制御可能な温度分布を生じる構造(発熱量調整構造)
とし、信号レベルに応じて気泡を多段階に調整するよう
な構成の記録ヘッドに対しても適用できる。It is also effective for a recording head having an electrothermal transducer of a shape capable of gradation expression developed in recent years, for example, one disclosed in Japanese Patent Publication No. 59-31943 proposed by the present applicant. Applicable. That is, a structure that generates a temperature distribution that can control the electrothermal transducer according to the level of a signal input to the heat generating portion (heat generation amount adjusting structure)
The present invention can also be applied to a recording head having a configuration in which bubbles are adjusted in multiple stages according to a signal level.
例えば、第10図(A)〜(C)に示すような電気熱変
換体において、消泡位置が符号9″で示す位置にあれ
ば、そこを含む部分(破線で示す部分)で電気熱変換体
107″ないし発熱抵抗体層3″の層厚を大とすればよ
い。また、生じる気泡の大きさによって消泡位置が異な
るのであれば、そのような幅広の部分を複数設けてもよ
い(第10図(A)の一点鎖線で示す部分を参照)。For example, in the electrothermal converter as shown in FIGS. 10 (A) to 10 (C), if the defoaming position is at the position indicated by reference numeral 9 ″, the portion including that position (the portion indicated by the broken line) performs the electrothermal conversion. body
What is necessary is just to increase the thickness of 107 "or the heating resistor layer 3". In addition, if the defoaming position is different depending on the size of the generated bubble, a plurality of such wide portions may be provided (see the portion shown by the dashed line in FIG. 10 (A)).
また、気泡を多段階に調整するために発熱抵抗体層の
層厚を電流の向きに沿って変化させた構造(特開昭59−
31943号)や、発熱抵抗体層の厚さを中心線側に向かっ
て段階的に厚くしたような構造(特開昭62−201255号)
に対しても適用できる。In addition, a structure in which the thickness of the heating resistor layer is changed along the direction of the current in order to adjust the bubbles in multiple stages (Japanese Patent Laid-Open No.
No. 31943) and a structure in which the thickness of the heating resistor layer is gradually increased toward the center line (Japanese Patent Laid-Open No. 62-201255).
It can also be applied to
すなわち、例えば前者にあっては、第11図に示すよう
に、消泡位置を含む部分30−1で発熱抵抗体層30を部分
的に厚くすればよい。もちろん、消泡位置が気泡の大き
さによって変化するのであれば、これを複数設けること
もできる。That is, for example, in the former case, as shown in FIG. 11, the heating resistor layer 30 may be partially thickened in the portion 30-1 including the defoaming position. Of course, if the defoaming position changes depending on the size of the bubble, a plurality of such bubbles can be provided.
加えて、本発明は、電気熱変換体を吐出エネルギ発生
手段とするものであれば、第1図に示したような集積型
のものに限られることなく適用できるのは勿論であり、
さらにシリアル走査される形態の記録ヘッドや、記録媒
体の全幅にわたって吐出口を選別させたフルマルチ形態
の記録ヘッドにも適用できるのは言うまでもない。In addition, the present invention is not limited to the integrated type as shown in FIG. 1 as long as the electrothermal converter is used as the discharge energy generating means.
Further, it is needless to say that the present invention can be applied to a print head of a serial scanning type or a full multi-type print head in which discharge ports are selected over the entire width of a print medium.
[発明の効果] 以上説明したように、本発明によれば、電気熱変換体
(発熱抵抗体層)の厚みを、気泡が消滅する位置を含む
部分において大とすることによって、沸騰の再現性が向
上し、得られる画像の品位が向上するという効果が得ら
れた。[Effects of the Invention] As described above, according to the present invention, the reproducibility of boiling is achieved by increasing the thickness of the electrothermal transducer (heating resistor layer) in a portion including the position where bubbles disappear. And the quality of the obtained image is improved.
第1図(A)および(B)は、それぞれ、本発明の一実
施例に係る液体噴射記録ヘッドの分解斜視図および正面
図、 第2図はその消泡位置を説明するための説明図、 第3図は吐出に最適な温度差の範囲を説明するための説
明図、 第4図は同じく面積比を説明するための説明図、 第5図(A)および(B)は、それぞれ、本発明に係る
基板の第1実施例を示す平面図およびそのA−A′線断
面図、 第6図は本発明を用いた場合の気泡挙動を示す説明図、 第7図は従来例における気泡挙動を示す説明図、 第8図は本発明の第2実施例に係る基板の断面図、 第9図は本発明の第3実施例に係る記録ヘッドを示す説
明図、 第10図(A)〜(C)および第11図は本発明のさらに他
の実施例を示す平面図である。 1,1′……基板、 2……蓄熱層、 3、3′、3″……発熱抵抗体層、 3−1,3′−1,30−1……発熱抵抗体層3の厚みを大と
した部分、 4……電極、 5……保護層(SiO2)、 6……保護層(Ta2O5)、 7……保護層(Ta)、 8……液体、 9,9′,9″……気泡の消滅位置、 10……気泡。1A and 1B are an exploded perspective view and a front view, respectively, of a liquid jet recording head according to an embodiment of the present invention, FIG. 2 is an explanatory view for explaining the bubble erasing position, FIG. 3 is an explanatory diagram for explaining a range of an optimum temperature difference for ejection, FIG. 4 is an explanatory diagram for explaining an area ratio in the same manner, and FIGS. FIG. 6 is a plan view showing a first embodiment of the substrate according to the present invention and a sectional view taken along line AA ′ of FIG. 6; FIG. 6 is an explanatory view showing the bubble behavior when the present invention is used; FIG. 8 is a cross-sectional view of a substrate according to a second embodiment of the present invention, FIG. 9 is an explanatory diagram showing a recording head according to a third embodiment of the present invention, and FIGS. (C) and FIG. 11 are plan views showing still another embodiment of the present invention. 1, 1 '... substrate, 2 ... heat storage layer, 3, 3', 3 "... heating resistor layer, 3-1, 3'-1, 30-1 ... thickness of heating resistor layer 3 moiety large, 4 ...... electrode, 5 ...... protective layer (SiO 2), 6 ...... protective layer (Ta 2 O 5), 7 ...... protective layer (Ta), 8 ...... liquid, 9,9 ' , 9 ″… Bubble disappearance position, 10… Bubble.
Claims (5)
抗体層に電気的に接続された一対の電極を有し、これら
一対の電極間に形成された熱発生部に対応する記録用液
体接触面上の記録用液体に生ずる気泡が消滅する位置を
含む部分で、厚みを大とした形状を有する電気熱変換体
と、 この電気熱変換体により前記記録用液体を加熱して発泡
させるための駆動手段と、 前記記録用液体の液路を形成するために前記支持体上に
設けた部材と を具備し、ΔT=TH−TOが20℃以上100℃以下であるこ
とを特徴とする液体噴射記録ヘッド。 TO:前記熱発生部に対応する前記記録用液体接触面上の
前記記録用液体に生じる気泡が消滅する位置において、
前記記録用液体を加熱して発泡させるための駆動条件と
同一の条件で、前記記録用液体が存在しないときの前記
電気熱変換体の駆動状態での温度のピーク値 TH:前記熱発生部に対応する前記記録用液体接触面上の
前記記録用液体に生じる気泡が消滅する位置以外の位置
において、前記記録用液体を加熱して発泡させるための
駆動条件と同一の条件で、前記記録用液体が存在しない
ときの前記電気熱変換体の駆動状態での温度のピーク値1. A heating device comprising: a support; a heating resistor layer disposed on the support; and a pair of electrodes electrically connected to the heating resistor layer. The heating resistor layer is formed between the pair of electrodes. An electrothermal transducer having a thickened shape at a portion including a position where bubbles generated in the recording liquid on the recording liquid contact surface corresponding to the heat generating portion disappear, and the electrothermal transducer performs the recording. and drive means for foaming by heating use liquid, comprising a member provided on said support to form a liquid passage of the recording liquid, ΔT = T H -T O is 20 ° C. or higher A liquid jet recording head having a temperature of 100 ° C. or lower. T O : at a position where bubbles generated in the recording liquid on the recording liquid contact surface corresponding to the heat generating portion disappear,
Under the same driving conditions for heating and foaming the recording liquid, the peak value of the temperature in the driving state of the electrothermal transducer when the recording liquid is not present T H : the heat generating unit In a position other than a position on the recording liquid contact surface corresponding to the position where bubbles generated in the recording liquid disappear, under the same conditions as the driving conditions for heating and bubbling the recording liquid, Peak value of the temperature in the driving state of the electrothermal transducer when no liquid is present
記記録用液体の吐出速度を考慮した場合には20℃以上60
℃以下、主として前記記録用液体の吐出速度の標準偏差
を考慮した場合には25℃以上100℃以下、最も好ましく
は25℃以上60℃以下であることを特徴とする請求項1に
記載の液体噴射記録ヘッド。2. The ΔT is more preferably 20 ° C. or more and 60 ° C. when mainly considering the ejection speed of the recording liquid.
2. The liquid according to claim 1, wherein the temperature is 25 ° C or higher and 100 ° C or lower, most preferably 25 ° C or higher and 60 ° C or lower, in consideration of the standard deviation of the ejection speed of the recording liquid. Jet recording head.
部の長さを前記液路に沿った前記熱発生部の両側にある
流域の流体力学的インピーダンスの慣性成分Zの逆比で
比例配分した位置を、前記気泡が消滅する位置としたこ
とを特徴とする請求項1に記載の液体噴射記録ヘッド。 x:液路の開口端から熱発生部に至る流域について流れ方
向にとった位置 l:液路の開口端から熱発生部に至る流域の長さ S(x):位置xにおける流路の断面積 ρ:記録用液体の密度3. The inverse ratio of the inertial component Z of the hydrodynamic impedance of the basin on both sides of the heat generating section along the liquid path with the length of the heat generating section along the liquid path of the recording liquid. 2. The liquid jet recording head according to claim 1, wherein the position proportionally distributed in (1) is a position where the bubble disappears. x: Position taken in the flow direction from the open end of the liquid channel to the heat generating section l: Length of the flow area from the open end of the liquid path to the heat generating section S (x) : Disconnection of the flow path at position x Area ρ: density of recording liquid
た位置xにおける液路の高さをh(x)としたとき、前記両
側の の逆比で前記熱発生部の前記長さを比例配分した位置
を、前記気泡が消滅する位置としたことを特徴とする請
求項3に記載の液体噴射記録ヘッド。4. When the height of the liquid path at a position x in the flow area in the flow direction of the recording liquid is defined as h (x) , 4. The liquid jet recording head according to claim 3, wherein a position at which the length of the heat generating portion is proportionally distributed at a reciprocal ratio is a position at which the bubble disappears. 5.
SOと、前記熱発生部上の全面積SHとの比SO/SHを、好ま
しくは1/10以上1/2以下、より好ましくは、主として液
体の吐出速度を考慮した場合には1/10以上1/4以下、主
として液体の吐出速度の標準偏差を考慮した場合には1/
8以上1/2以下、最も好ましくは1/8以上1/4以下としたこ
とを特徴とする請求項1に記載の液体噴射記録ヘッド。5. An area on the heat generating portion corresponding to the portion.
S O , the ratio S O / S H of the total area S H on the heat generating portion, preferably 1/10 or more and 以下 or less, more preferably when mainly considering the liquid discharge speed 1/10 or more and 1/4 or less, 1/1 when mainly considering the standard deviation of the liquid ejection speed
2. The liquid jet recording head according to claim 1, wherein the thickness is set to 8 or more and 1/2 or less, most preferably 1/8 or more and 1/4 or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24511688A JP2664220B2 (en) | 1988-09-29 | 1988-09-29 | Liquid jet recording head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24511688A JP2664220B2 (en) | 1988-09-29 | 1988-09-29 | Liquid jet recording head |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0292547A JPH0292547A (en) | 1990-04-03 |
JP2664220B2 true JP2664220B2 (en) | 1997-10-15 |
Family
ID=17128860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24511688A Expired - Fee Related JP2664220B2 (en) | 1988-09-29 | 1988-09-29 | Liquid jet recording head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2664220B2 (en) |
-
1988
- 1988-09-29 JP JP24511688A patent/JP2664220B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0292547A (en) | 1990-04-03 |
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Legal Events
Date | Code | Title | Description |
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LAPS | Cancellation because of no payment of annual fees |