JP2651652B2 - Fluorinated alcohol-based cleaning agent - Google Patents
Fluorinated alcohol-based cleaning agentInfo
- Publication number
- JP2651652B2 JP2651652B2 JP13127693A JP13127693A JP2651652B2 JP 2651652 B2 JP2651652 B2 JP 2651652B2 JP 13127693 A JP13127693 A JP 13127693A JP 13127693 A JP13127693 A JP 13127693A JP 2651652 B2 JP2651652 B2 JP 2651652B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning agent
- hexafluoropropan
- substrate
- trifluoromethyl
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は洗浄剤に関し、特に、半
導体製造工程で使用される基板等の洗浄に有効な洗浄剤
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning agent, and more particularly to a cleaning agent effective for cleaning a substrate or the like used in a semiconductor manufacturing process.
【０００２】[0002]
【従来の技術】ＩＣやＬＳＩ等の半導体の製造に用いら
れるウエハー等の基板、フォトリソグラフィー工程で使
用されるマスクやレチクル及びその前駆体としての石英
基板等の基板、ペリクルを製造する際に使用されるガラ
ス基板、さらには、光ディスクの製造に用いるスタンパ
ーの製造に使用される基板等は、その性質上極めてきれ
いに洗浄されている必要がある。2. Description of the Related Art Substrates such as wafers used in the manufacture of semiconductors such as ICs and LSIs, masks and reticles used in the photolithography process, and substrates such as quartz substrates used as precursors for the production of pellicles. The glass substrate to be manufactured, and furthermore, the substrate used for manufacturing a stamper used for manufacturing an optical disc, and the like, need to be extremely cleanly cleaned due to their properties.
【０００３】このような基板の洗浄方法としては、従
来、超音波洗浄、ブラシ等によるこすり洗い又は硫酸−
過酸化水素水，水酸化アンモニウム−過酸化水素水等に
よる酸化洗浄等で大部分の汚れを除去した後、イソプロ
パノール、２，２，３，３，３−ペンタフルオロプロパ
ノール又はフロン等の洗浄溶媒蒸気中に基板を置き、基
板表面で蒸気を凝縮させて表面を洗い流し、基板の温度
が蒸気温度と等しくなった時点で乾燥状態となる蒸気洗
浄乾燥法が広く用いられている。[0003] As a method for cleaning such a substrate, conventionally, ultrasonic cleaning, scrubbing with a brush or the like or sulfuric acid-
After removing most of the stains by oxidative washing with a hydrogen peroxide solution, ammonium hydroxide-hydrogen peroxide solution, etc., a washing solvent vapor such as isopropanol, 2,2,3,3,3-pentafluoropropanol or chlorofluorocarbon. A steam cleaning and drying method is widely used in which a substrate is placed inside, a vapor is condensed on the surface of the substrate, and the surface is washed away. When the temperature of the substrate becomes equal to the vapor temperature, the substrate is dried.
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、上記の
洗浄乾燥法でイソプロパノールを用いた場合、イソプロ
パノールは可燃性であるため、洗浄工程中に火災，爆発
等の事故が発生しやすいという問題点がある。また、イ
ソプロパノール及び２，２，３，３，３−ペンタフルオ
ロプロパノールはその沸点が高く、エネルギー効率が悪
いという欠点がある。さらに、従来使用されてきたクロ
ロフルオロカーボンは大気中に放出された場合に、成層
圏のオゾン層を破壊し、その結果地球上の生態系に悪影
響を及ぼすことが指摘され、従来のこれらのフロンは生
産及び使用規制が実施されている。However, when isopropanol is used in the above-mentioned washing and drying method, there is a problem that accidents such as fire and explosion are likely to occur during the washing process because isopropanol is flammable. . In addition, isopropanol and 2,2,3,3,3-pentafluoropropanol have the disadvantage that their boiling points are high and their energy efficiency is poor. In addition, it has been pointed out that conventionally used chlorofluorocarbons, when released into the atmosphere, destroy the stratospheric ozone layer and, as a result, adversely affect ecosystems on the planet. And use regulations are in place.
【０００５】本発明は、以上の問題点に鑑みてなされた
ものであり、その目的は、火災や爆発等の事故を防止
し、消費エネルギーが少なく、しかも、地球上の生態系
に悪影響を及ぼさないような洗浄剤を提供することにあ
る。The present invention has been made in view of the above problems, and has as its object to prevent accidents such as fire and explosion, consume less energy, and adversely affect the ecosystem on the earth. It is to provide such a cleaning agent.
【０００６】[0006]
【課題を解決するための手段】本発明者等は、上記の如
き技術の現状に鑑み検討を重ねた結果、１，１，１，
３，３，３−ヘキサフルオロプロパン−２−オール、
１，１，１，３，３，４，４，４−オクタフルオロブタ
ン−２−オール、２−トリフルオロメチル−１，１，
１，３，３，３−ヘキサフルオロプロパン−２−オー
ル、２−トリフルオロメチル−１，１，１−トリフルオ
ロプロパン−２−オールが、不燃性で、かつ塩素原子を
含まないためオゾン層を破壊せず、大気寿命が短いため
地球温暖化への寄与を小さくすることができ、さらに、
低沸点であることから消費エネルギーの少ない極めて優
れた洗浄剤となることを見いだし、本発明を完成するに
至ったものである。Means for Solving the Problems The present inventors have repeatedly studied in view of the current state of the art as described above, and as a result, 1,1,1,
3,3,3-hexafluoropropan-2-ol,
1,1,1,3,3,4,4,4-octafluorobutan-2-ol, 2-trifluoromethyl-1,1,
Ozone layer because 1,3,3,3-hexafluoropropan-2-ol and 2-trifluoromethyl-1,1,1-trifluoropropan-2-ol are nonflammable and contain no chlorine atom And the contribution to global warming can be reduced because of the short atmospheric life.
The inventors have found that the cleaning agent has a low boiling point and thus is an extremely excellent cleaning agent with low energy consumption, and has completed the present invention.
【０００７】すなわち、本発明は、１，１，１，３，
３，３−ヘキサフルオロプロパン−２−オール、１，
１，１，３，３，４，４，４−オクタフルオロブタン−
２−オール、２−トリフルオロメチル−１，１，１，
３，３，３−ヘキサフルオロプロパン−２−オール又は
２−トリフルオロメチル−１，１，１−トリフルオロプ
ロパン−２−オールの少なくともいずれか１種を使用す
ることを特徴とするフッ素化アルコール系洗浄剤であ
る。That is, the present invention relates to 1,1,1,3
3,3-hexafluoropropan-2-ol, 1,
1,1,3,3,4,4,4-octafluorobutane-
2-ol, 2-trifluoromethyl-1,1,1,
A fluorinated alcohol characterized by using at least one of 3,3,3-hexafluoropropan-2-ol and 2-trifluoromethyl-1,1,1-trifluoropropan-2-ol It is a system cleaning agent.
【０００８】以下、本発明をさらに詳細に説明する。本
発明の洗浄剤として使用する１，１，１，３，３，３−
ヘキサフルオロプロパン−２−オール［分子式：ＣＦ3
ＣＨ（ＯＨ）ＣＦ3 ］、１，１，１，３，３，４，４，
４−オクタフルオロブタン−２−オール［分子式：ＣＦ
3 ＣＨ（ＯＨ）ＣＦ2 ＣＦ3 ］、２−トリフルオロメチ
ル−１，１，１，３，３，３−ヘキサフルオロプロパン
−２−オール［分子式：（ＣＦ3 ）3 ＣＯＨ］、２−ト
リフルオロメチル−１，１，１−トリフルオロプロパン
−２−オール［分子式：（ＣＦ3 ）2 （ＣＨ3 ）ＣＯ
Ｈ］は、それぞれ表１に示す物性値を有し、いずれも不
燃性であり、洗浄乾燥工程での火災、爆発等の危険がな
い。Hereinafter, the present invention will be described in more detail. 1,1,1,3,3,3- used as the cleaning agent of the present invention
Hexafluoropropan-2-ol [molecular formula: CF 3
CH (OH) CF 3 ], 1,1,1,3,3,4,4,4
4-octafluorobutan-2-ol [molecular formula: CF
3 CH (OH) CF 2 CF 3 ], 2-trifluoromethyl-1,1,1,3,3,3-hexafluoropropan-2-ol [molecular formula: (CF 3 ) 3 COH], 2-trimethyl Fluoromethyl-1,1,1-trifluoropropan-2-ol [molecular formula: (CF 3 ) 2 (CH 3 ) CO
H] have the physical properties shown in Table 1 and are all nonflammable, and there is no danger of fire, explosion, etc. in the washing and drying process.
【０００９】[0009]
【表１】 [Table 1]
【００１０】なお、比較のためフロン１１３［ＣＦＣ−
１１３］、２，２，３，３，３−ペンタフルオロプロパ
ノール［分子式：ＣＦ3 ＣＦ2 ＣＨ2 ＯＨ］及びイソプ
ロパノールの対応する物性値を表１にあわせて示す。For comparison, Freon 113 [CFC-
113], 2,2,3,3,3-pentafluoropropanol [molecular formula: CF 3 CF 2 CH 2 OH] and the corresponding physical properties of isopropanol are also shown in Table 1.
【００１１】本発明の洗浄剤として使用する１，１，
１，３，３，３−ヘキサフルオロプロパン−２−オー
ル、１，１，１，３，３，４，４，４−オクタフルオロ
ブタン−２−オール、２−トリフルオロメチル−１，
１，１，３，３，３−ヘキサフルオロプロパン−２−オ
ール、２−トリフルオロメチル−１，１，１−トリフル
オロプロパン−２−オールは、それぞれ単独で使用して
も又はこれらの混合物として使用してもよい。混合して
使用する際の混合比は、混合する物質によっても異なり
特に限定するものではないが、製造法に起因する経済性
を考慮して混合することが好ましく、例えば、２種類の
混合物の場合には１：５〜５：１があげられる。なお、
回収再利用等の経済性の面からは、単独で用いることが
特に好ましい。The 1,1, used as the cleaning agent of the present invention
1,3,3,3-hexafluoropropan-2-ol, 1,1,1,3,3,4,4,4-octafluorobutan-2-ol, 2-trifluoromethyl-1,
1,1,3,3,3-Hexafluoropropan-2-ol and 2-trifluoromethyl-1,1,1-trifluoropropan-2-ol may be used alone or as a mixture thereof. You may use as. The mixing ratio when mixed and used differs depending on the substances to be mixed, and is not particularly limited. However, it is preferable to mix them in consideration of the economy resulting from the production method. For example, in the case of two kinds of mixtures, Is 1: 5 to 5: 1. In addition,
From the viewpoint of economy such as recovery and reuse, it is particularly preferable to use it alone.
【００１２】本発明の洗浄剤の洗浄対象となる被洗浄物
としては、１，１，１，３，３，３−ヘキサフルオロプ
ロパン−２−オール、１，１，１，３，３，４，４，４
−オクタフルオロブタン−２−オール、２−トリフルオ
ロメチル−１，１，１，３，３，３−ヘキサフルオロプ
ロパン−２−オール、２−トリフルオロメチル−１，
１，１−トリフルオロプロパン−２−オールに対して安
定なものからなるものであれば特に限定するものではな
いが、特に基板の洗浄に適している。基板としては、例
えば、ガラス、石英又はこれらの表面にクロム等を蒸着
させて被膜を形成したもの、樹脂又はこれらの上に回路
パターン等を有しているもの等をあげることができる。
このような被洗浄物としては具体的には、半導体の製造
に用いられるウエハー等の基板、フォトリソグラフィー
工程で使用されるマスクやレチクル及びその前駆体とし
ての石英基板、ペリクルを製造する際に使用されるガラ
ス基板並びに光ディスクの製造に用いるスタンパーの製
造に使用される基板等をあげることができる。The object to be cleaned with the cleaning agent of the present invention includes 1,1,1,3,3,3-hexafluoropropan-2-ol, 1,1,1,3,3,4 , 4,4
-Octafluorobutan-2-ol, 2-trifluoromethyl-1,1,1,3,3,3-hexafluoropropan-2-ol, 2-trifluoromethyl-1,
The material is not particularly limited as long as it is stable to 1,1-trifluoropropan-2-ol, but is particularly suitable for cleaning a substrate. Examples of the substrate include, for example, glass, quartz, a substrate having a film formed by depositing chromium or the like on the surface thereof, a resin, or a substrate having a circuit pattern or the like thereon.
Specifically, such an object to be cleaned is used when manufacturing a substrate such as a wafer used in semiconductor manufacturing, a mask or reticle used in a photolithography process and a quartz substrate as a precursor thereof, and a pellicle. And a substrate used for manufacturing a stamper used for manufacturing an optical disk.
【００１３】本発明の洗浄剤による洗浄方法は特に限定
するものではなく、洗浄剤中に被洗浄物を浸漬したり、
被洗浄物に洗浄剤をスプレーしたりする方法などによる
こともできるが、特に蒸気洗浄が好ましい。蒸気洗浄法
は洗浄剤の蒸気中に被洗浄物を入れて被洗浄物表面を洗
浄した後乾燥させる。The method of cleaning with the cleaning agent of the present invention is not particularly limited, and the object to be cleaned can be immersed in the cleaning agent,
Although a method of spraying a cleaning agent onto an object to be cleaned can be used, steam cleaning is particularly preferable. In the steam cleaning method, an object to be cleaned is put into the vapor of a cleaning agent, and the surface of the object to be cleaned is washed and then dried.
【００１４】その具体的な方法としては、従来法と同様
に、洗剤水溶液や超純水中に被洗浄物を浸して超音波振
動で被洗浄物に付着している異物を除去する方法、洗剤
水溶液や超純水を用いてＰＶＡ発泡体等のブラシでこす
り洗いする方法又は硫酸−過酸化水素水，水酸化アンモ
ニウム−過酸化水素水等の溶液中に被洗浄物を浸して酸
化反応で有機物を除去する方法等の前処理法により大部
分の汚れを除去した後、本発明の１，１，１，３，３，
３−ヘキサフルオロプロパン−２−オール、１，１，
１，３，３，４，４，４−オクタフルオロブタン−２−
オール、２−トリフルオロメチル−１，１，１，３，
３，３−ヘキサフルオロプロパン−２−オール、２−ト
リフルオロメチル−１，１，１−トリフルオロプロパン
−２−オールの少なくともいずれか１種で表されるフッ
素化アルコールからなる洗浄剤の蒸気中に被洗浄物を置
き被洗浄物表面で蒸気を凝縮させて被洗浄物表面を洗い
流し、被洗浄物の温度が蒸気の温度と等しくなった時点
で乾燥状態となり、洗浄乾燥を終わる。このような方法
を採用した場合、洗浄乾燥された基板表面には洗浄剤は
残留しない。また、洗浄後の乾燥にかかる時間も短く、
短時間で乾燥することができる。As a specific method, as in the conventional method, a method of immersing an object to be cleaned in a detergent aqueous solution or ultrapure water to remove foreign substances adhering to the object to be cleaned by ultrasonic vibration, A method of scrubbing with a brush such as a PVA foam using an aqueous solution or ultrapure water, or immersing an object to be cleaned in a solution of sulfuric acid-hydrogen peroxide solution, ammonium hydroxide-hydrogen peroxide solution, etc., and oxidizing the organic material by an oxidation reaction. After removing most of the stains by a pre-treatment method such as a method for removing, a 1,1,1,3,3 of the present invention
3-hexafluoropropan-2-ol, 1,1,
1,3,3,4,4,4-octafluorobutane-2-
All, 2-trifluoromethyl-1,1,1,3
Vapor of a cleaning agent comprising a fluorinated alcohol represented by at least one of 3,3-hexafluoropropan-2-ol and 2-trifluoromethyl-1,1,1-trifluoropropan-2-ol The object to be washed is placed inside, the vapor is condensed on the surface of the object to be washed, and the surface of the object to be washed is washed away. When the temperature of the object to be washed becomes equal to the temperature of the steam, the object is brought into a dry state, and the washing and drying is completed. When such a method is adopted, no cleaning agent remains on the surface of the substrate that has been cleaned and dried. In addition, the time required for drying after washing is short,
It can be dried in a short time.
【００１５】[0015]
【実施例】以下、実施例を用いて本発明を説明するが、
本発明はこれらの実施例に限定されるものではない。Hereinafter, the present invention will be described with reference to Examples.
The present invention is not limited to these examples.
【００１６】（実施例１〜４）レチクル用のガラス基板
について硫酸洗浄（１２０℃、５分）を行い、水洗（３
分）した後、さらに超音波洗浄（３分）を行った。この
予備洗浄の後、洗浄剤として表１に示す１，１，１，
３，３，３−ヘキサフルオロプロパン−２−オール（実
施例１）、１，１，１，３，３，４，４，４−オクタフ
ルオロブタン−２−オール（実施例２）、２−トリフル
オロメチル−１，１，１，３，３，３−ヘキサフルオロ
プロパン−２−オール（実施例３）、２−トリフルオロ
メチル−１，１，１−トリフルオロプロパン−２−オー
ル（実４例４）を用いて、蒸気乾燥法により基板の洗浄
乾燥を行い目視により観察した。その結果を表２に示
す。(Examples 1 to 4) A reticle glass substrate was washed with sulfuric acid (120 ° C., 5 minutes) and washed with water (3
Min), and ultrasonic cleaning (3 min) was further performed. After this preliminary cleaning, 1,1,1,
3,3,3-hexafluoropropan-2-ol (Example 1), 1,1,1,3,3,4,4,4-octafluorobutan-2-ol (Example 2), 2- Trifluoromethyl-1,1,1,3,3,3-hexafluoropropan-2-ol (Example 3), 2-trifluoromethyl-1,1,1-trifluoropropan-2-ol (actual Using 4 Example 4), the substrate was washed and dried by a steam drying method and visually observed. Table 2 shows the results.
【００１７】（実施例５）洗浄剤として１，１，１，
３，３，４，４，４−オクタフルオロブタン−２−オー
ル（６０重量％）と２−トリフルオロメチル−１，１，
１，３，３，３−ヘキサフルオロプロパン−２−オール
（４０重量％）からなる混合物を用いた以外は実施例１
と同様にして行った。その結果を表２にあわせて示す。EXAMPLE 5 1,1,1,1 was used as a cleaning agent.
3,3,4,4,4-octafluorobutan-2-ol (60% by weight) and 2-trifluoromethyl-1,1,
Example 1 except that a mixture consisting of 1,3,3,3-hexafluoropropan-2-ol (40% by weight) was used.
Was performed in the same manner as described above. The results are shown in Table 2.
【００１８】（実施例６）洗浄剤として１，１，１，
３，３，３−ヘキサフルオロプロパン−２−オール（７
０重量％）と２−トリフルオロメチル−１，１，１，
３，３，３−ヘキサフルオロプロパン−２−オール（３
０重量％）からなる混合物を用いた以外は実施例１と同
様にして行った。その結果を表２にあわせて示す。Example 6 1,1,1,1 was used as a cleaning agent.
3,3,3-hexafluoropropan-2-ol (7
0% by weight) and 2-trifluoromethyl-1,1,1,1
3,3,3-hexafluoropropan-2-ol (3
(0% by weight) except that a mixture consisting of 0% by weight was used. The results are shown in Table 2.
【００１９】（参考例）洗浄剤としてイソプロパノール
を用いた以外は実施例１と同様にして行った。その結果
を表２にあわせて示す。但し、このイソプロパノールは
可燃性であるため、火災，爆発等の危険性がある。(Reference Example) The same procedure as in Example 1 was carried out except that isopropanol was used as a detergent. The results are shown in Table 2. However, since this isopropanol is flammable, there is a danger of fire and explosion.
【００２０】（比較例）洗浄剤として２，２，３，３，
３−ペンタフルオロプロパノールを用いた以外は実施例
１と同様にして行った。その結果を表２にあわせて示
す。Comparative Example 2, 2, 3, 3,
It carried out similarly to Example 1 except having used 3-pentafluoropropanol. The results are shown in Table 2.
【００２１】[0021]
【表２】 [Table 2]
【００２２】[0022]
【発明の効果】以上説明したように、本発明によれば不
燃性のフッ素化アルコールを使用するので、従来の方法
においてイソプロパノールを洗浄溶媒として用いた場合
に問題となる火災や爆発の危険を回避でき、また、２，
２，３，３，３−ペンタフルオロプロパノールよりいず
れも低沸点であることから、消費エネルギーが少なく、
かつ短時間で乾燥することができ、さらに従来の方法と
同等又はそれ以上の洗浄乾燥性で被洗浄物の洗浄乾燥を
行うことができる効果を有するものである。As described above, according to the present invention, since a nonflammable fluorinated alcohol is used, the danger of fire or explosion which is a problem when isopropanol is used as a washing solvent in the conventional method is avoided. Yes, and 2,
Since it has a lower boiling point than 2,3,3,3-pentafluoropropanol, it consumes less energy,
In addition, it can be dried in a short time, and has an effect that the object to be cleaned can be washed and dried with a washing and drying property equal to or higher than that of the conventional method.
───────────────────────────────────────────────────── フロントページの続き (73)特許権者 000000044 旭硝子株式会社 東京都千代田区丸の内２丁目１番２号 (74)上記４名の代理人 弁理士 箕浦 清 (72)発明者 関屋 章 茨城県つくば市東１丁目１番地 工業技 術院物質工学工業技術研究所内 (72)発明者 高橋 満 東京都文京区本郷２−40−17 本郷若井 ビル 財団法人地球環境産業技術研究機 構内 (72)発明者 後藤 嘉彦 東京都文京区本郷２−40−17 本郷若井 ビル 財団法人地球環境産業技術研究機 構内 (72)発明者 須賀 淳雄 東京都文京区本郷２−40−17 本郷若井 ビル 財団法人地球環境産業技術研究機 構内 審査官 佐藤 修 (56)参考文献 特開 平４−127955（ＪＰ，Ａ) 特開 平３−27328（ＪＰ，Ａ) 特開 平３−27329（ＪＰ，Ａ) 特開 平２−286794（ＪＰ，Ａ) 特開 平３−14898（ＪＰ，Ａ) 特開 平４−243504（ＪＰ，Ａ) ──────────────────────────────────────────────────続 き Continued on the front page (73) Patent holder 000000044 Asahi Glass Co., Ltd. 2-1-2-2 Marunouchi, Chiyoda-ku, Tokyo (74) The above four agents Patent Attorney Kiyoshi Minoura (72) Inventor Akira Sekiya Ibaraki 1-1-1 Higashi, Tsukuba City, National Institute of Advanced Industrial Science and Technology (72) Inventor Mitsuru Takahashi 2-40-17 Hongo, Bunkyo-ku, Tokyo Hongo Wakai Building Foundation for Global Environmental Technology Research and Technology (72) Inventor Yoshihiko Goto Hongo Wakai Building, Hongo Wakai Building, 2-40-17 Hongo, Tokyo, Japan (72) Inventor Atsushi Suga 2-40-17 Hongo, Hongo, Bunkyo-ku, Tokyo Hongo Wakai Building Global Environmental Industrial Technology Examiner Osamu Sato on-site of research equipment (56) References JP-A-4-127955 (JP, A) JP-A-3-27328 (JP, A) JP-A JP-A-3-27329 (JP, A) JP-A-2-286794 (JP, A) JP-A-3-14898 (JP, A) JP-A-4-243504 (JP, A)
Claims (1)
タフルオロブタン−２−オール、２−トリフルオロメチ
ル−１，１，１，３，３，３−ヘキサフルオロプロパン
−２−オール又は２−トリフルオロメチル−１，１，１
−トリフルオロプロパン−２−オールの少なくともいず
れか１種を使用することを特徴とするフッ素化アルコー
ル系洗浄剤。1. A 1,1,1,3,3,4,4,4-octafluorobutan-2-ol, 2-trifluoromethyl-1,1,1,3,3,3-hexafluoropropane -2-ol or 2-trifluoromethyl-1,1,1
-A fluorinated alcohol-based detergent comprising at least one of trifluoropropan-2-ol.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13127693A JP2651652B2 (en) | 1993-05-07 | 1993-05-07 | Fluorinated alcohol-based cleaning agent |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13127693A JP2651652B2 (en) | 1993-05-07 | 1993-05-07 | Fluorinated alcohol-based cleaning agent |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06346096A JPH06346096A (en) | 1994-12-20 |
| JP2651652B2 true JP2651652B2 (en) | 1997-09-10 |
Family
ID=15054156
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13127693A Expired - Lifetime JP2651652B2 (en) | 1993-05-07 | 1993-05-07 | Fluorinated alcohol-based cleaning agent |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2651652B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE602007007161D1 (en) | 2006-09-14 | 2010-07-29 | Fujifilm Corp | Agent for removing water from a substrate, method of water removal and drying method therewith |
| JP6010894B2 (en) * | 2011-10-31 | 2016-10-19 | セントラル硝子株式会社 | Cleaning / drying agent and substrate cleaning / drying method using the same |
| JP2015108041A (en) * | 2013-12-03 | 2015-06-11 | ダイキン工業株式会社 | Cleaning composition |
| JP2022514029A (en) | 2018-12-21 | 2022-02-09 | ハネウェル・インターナショナル・インコーポレーテッド | Azeotropic or azeotropic compositions of 1,2,2-trifluoro-1-trifluoromethylcyclobutane (TFMCB) and their uses |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02286794A (en) * | 1989-04-28 | 1990-11-26 | Daikin Ind Ltd | Fluorinated alcoholic solvent |
| JPH0327328A (en) * | 1989-06-23 | 1991-02-05 | Asahi Glass Co Ltd | Fluorinated hydrocarbon-based solvent composition |
| JPH0327329A (en) * | 1989-06-23 | 1991-02-05 | Asahi Glass Co Ltd | Fluorinated hydrocarbon-based solvent composition |
| JPH0314898A (en) * | 1990-04-24 | 1991-01-23 | Mitsui Petrochem Ind Ltd | Detergent |
| JPH04127955A (en) * | 1990-09-20 | 1992-04-28 | Daikin Ind Ltd | Method for cleaning article surface |
| JPH04243504A (en) * | 1991-01-25 | 1992-08-31 | Asahi Chem Ind Co Ltd | Azeotropic composition for drainage |
-
1993
- 1993-05-07 JP JP13127693A patent/JP2651652B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06346096A (en) | 1994-12-20 |
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