JP2539294B2 - Method for producing translucent conductive zinc oxide film - Google Patents
Method for producing translucent conductive zinc oxide filmInfo
- Publication number
- JP2539294B2 JP2539294B2 JP3004603A JP460391A JP2539294B2 JP 2539294 B2 JP2539294 B2 JP 2539294B2 JP 3004603 A JP3004603 A JP 3004603A JP 460391 A JP460391 A JP 460391A JP 2539294 B2 JP2539294 B2 JP 2539294B2
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- substrate
- zinc oxide
- zinc
- tin oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Surface Treatment Of Glass (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ガラスやセラミツクス
等からなる基盤上に透光性と導電性とを併せ有する酸化
亜鉛膜を製造する方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a zinc oxide film having both translucency and conductivity on a substrate made of glass, ceramics or the like.
【０００２】[0002]
【従来の技術】従来、導電性酸化亜鉛膜を製造するため
の方法としては、アルミニウム原子をトーパントとして
スパツタ法で製膜する方法（Jpn. J. Appl. Phys., 24
(1985)L781）や、ドーパントを用いることなく、スプレ
ー法にて製膜し、酸素空孔等にて導電性を発現させる方
法 (J. Mater. Sci. 22(1987) 1379) 等が知られてい
る。しかしながら、上記スパツタ法は、高価な設備を必
要とし、しかも、量産性に劣り、一方、スプレー法は、
基盤となるガラスやセラミツクス等の形状が制約を受け
る等の欠点がある。2. Description of the Related Art Conventionally, as a method for producing a conductive zinc oxide film, a method of forming aluminum atom as a toupant by a spatter method (Jpn. J. Appl. Phys., 24
(1985) L781) and a method of forming a film by a spray method without using a dopant and expressing conductivity in oxygen vacancies (J. Mater. Sci. 22 (1987) 1379), etc. ing. However, the spatula method requires expensive equipment and is inferior in mass productivity, while the spray method is
There are drawbacks such as restrictions on the shapes of the glass and ceramics that form the base.
【０００３】他方、透光性酸化亜鉛薄膜は、極めて鋭敏
な紫外線遮断機能を有しているので、近年のエコロジー
やバイオロジーの分野の技術の発展に伴つて、生物学的
な見地から照明、温室、微生物関係のガラスの表面処理
等において注目されている。On the other hand, since the translucent zinc oxide thin film has an extremely sensitive ultraviolet ray shielding function, with the recent development of technology in the fields of ecology and biology, lighting from a biological point of view, Attention has been paid to the surface treatment of glass for greenhouses and microorganisms.
【０００４】[0004]
【発明が解決しようとする課題】本発明は、従来の導電
性酸化亜鉛膜の製造における上記した問題を解決するた
めに鋭意研究した結果、基盤上に導電性を有する酸化ス
ズ膜を形成し、更に、その上に透光性酸化亜鉛膜を形成
することによつて、導電性を有すると共に、すぐれた紫
外線遮蔽機能を有する透光性導電性酸化亜鉛膜を得るこ
とができることを見出し、また、基盤上に絶縁性の酸化
スズ膜を形成し、その上に透光性酸化亜鉛膜を形成する
ことによつて、その透光性酸化亜鉛膜に導電性を有せし
めることができることを見出して、本発明に至つたもの
である。DISCLOSURE OF THE INVENTION The present invention has been earnestly studied to solve the above-mentioned problems in the production of a conventional conductive zinc oxide film, and as a result, a conductive tin oxide film was formed on a substrate, Furthermore, by forming a light-transmitting zinc oxide film on it, it was found that it is possible to obtain a light-transmitting conductive zinc oxide film having conductivity and having an excellent ultraviolet shielding function, and By forming an insulative tin oxide film on a substrate and forming a translucent zinc oxide film on it, it was found that the translucent zinc oxide film can have conductivity, The present invention has been achieved.
【０００５】[0005]
【課題を解決するための手段】本発明による透光性導電
性酸化亜鉛膜の製造方法は、基盤上に導電性を有する酸
化スズ膜を形成し、次いで、ｎ−吉草酸亜鉛又はｎ−カ
プロン酸亜鉛を有機溶剤に溶解した溶液に上記基盤を浸
漬した後、焼成して、前記酸化スズ膜上に酸化亜鉛膜を
製膜することを特徴とする。即ち、本発明によれば、ガ
ラスやセラミツクス等の基盤上に、下地として、導電性
を有する酸化スズ膜を形成し、そのような基盤の全面上
に酸化亜鉛膜を製膜することによつて、下地の導電性を
有する酸化スズ膜の導電性とマスクパターンがそのまま
透光性酸化亜鉛膜に発現する。しかも、その酸化亜鉛膜
によつて、可視光の透過率は、基盤上の導電性を有する
酸化スズ膜のそれを凌ぎ、且つ、紫外線領域の光が吸収
されるという機能を併せ有する。The method for producing a translucent conductive zinc oxide film according to the present invention comprises forming a tin oxide film having conductivity on a substrate, and then forming n-zinc valerate or n-carbamate.
The above substrate is immersed in a solution of zinc pronate dissolved in an organic solvent and then baked to form a zinc oxide film on the tin oxide film. That is, according to the present invention, a tin oxide film having conductivity is formed as a base on a substrate such as glass or ceramics, and a zinc oxide film is formed on the entire surface of such a substrate. The electroconductivity and mask pattern of the underlying tin oxide film having electroconductivity are directly expressed in the translucent zinc oxide film. Moreover, the zinc oxide film has a function that the visible light transmittance exceeds that of the conductive tin oxide film on the substrate and that the light in the ultraviolet region is absorbed.
【０００６】更に、本発明によれば、ガラスやセラミツ
クス等の基盤上に、マスクパターン等を用いて、下地と
して、絶縁性の酸化スズ膜を部分的に形成し、そのよう
な基盤の全面上に酸化亜鉛膜を製膜するときは、下地と
して酸化スズ膜を形成した部分上の酸化亜鉛膜にのみ導
電性を有せしめることができ、そうでない部分上の酸化
亜鉛膜は絶縁性とすることができる。Further, according to the present invention, an insulating tin oxide film is partially formed as a base on a substrate such as glass or ceramics by using a mask pattern or the like, and the whole surface of such substrate is When a zinc oxide film is formed on the substrate, only the zinc oxide film on the part where the tin oxide film is formed as the base can be made conductive, and the zinc oxide film on the other part should be insulating. You can
【０００７】本発明の方法によれば、酸化亜鉛膜は、上
述したように、基盤上に酸化スズ膜を形成した後、この
基盤上に前記亜鉛化合物の溶液を塗布し、その亜鉛化合
物の塗膜を焼付けることによつて形成される。焼付け温
度は、通常、３００〜６００°Ｃの範囲であるが、特に
これに限定されるものではない。 According to the method of the invention, the zinc layer is oxidized, as described above, after forming the tin oxide film on a substrate, a solution of the zinc compound is coated on the base, coating of the zinc compound It is formed by baking the film. The baking temperature is usually in the range of 300 to 600 ° C, but is not particularly limited thereto.
【０００８】ここに、本発明の方法においては、上記亜
鉛化合物の溶液としては、ｎ−吉草酸亜鉛又はｎ−カプ
ロン酸亜鉛を有機溶剤に溶解してなるものが用いられ
る。Here, in the method of the present invention, the solution of the above zinc compound is n-zinc valerate or n-cap.
The thing which melt | dissolves zinc ronate in the organic solvent is used.
【０００９】また、亜鉛化合物の溶液を形成するための
有機溶媒としては、例えば、ｎ−ブタノール、ジメチル
ホルムアミド、アセチルアセトン、エチルセルソルブ等
のような比較的沸点の高いアルコール、エステル、ケト
ン等が好ましく用いられるが、これらに限定されるもの
ではない。As the organic solvent for forming the solution of the zinc compound, alcohols, esters, ketones and the like having relatively high boiling points such as n-butanol, dimethylformamide, acetylacetone, ethyl cellosolve, etc. are preferable. It is used, but is not limited to these.
【００１０】[0010]
【発明の効果】以上のように、本発明によれば、ガラス
やセラミックス等からなる基盤上に導電性を有する酸化
スズ膜を形成し、更に、その上に前記亜鉛化合物の溶液
を塗布し、焼成するという簡単な操作によつて、透光性
と導電性を併せ有し、しかも、可視光の透過率にすぐれ
る酸化亜鉛膜を成膜することができる。従つて、かかる
本発明の方法によれば、特に高価な設備を必要とせずし
て、工業的に有利に透光性導電性酸化亜鉛膜を成膜する
ことができる。 更に、基盤上に絶縁性の酸化スズ膜を下
地として成膜した場合であつても、その上に同様に前記
亜鉛化合物の溶液を塗布し、焼成することによつて、そ
の下地の上に透光光性導電性酸化亜鉛膜を形成すること
ができる。 As described above, according to the present invention, the glass
A conductive tin oxide film is formed on a substrate made of metal , ceramics, etc., and the zinc compound solution is further formed on it.
By a simple operation of coating and baking, it is possible to form a zinc oxide film which has both translucency and conductivity and which has excellent visible light transmittance. Therefore, it takes
The method of the present invention eliminates the need for particularly expensive equipment.
To form a transparent conductive zinc oxide film industrially advantageously
be able to. In addition, an insulating tin oxide film is placed on the substrate.
Even when a film is formed as the base, the above
By applying a solution of a zinc compound and baking,
A translucent conductive zinc oxide film on the substrate
Can be.
【００１１】[0011]
【実施例】以下に実施例を挙げて本発明を説明するが、
本発明はこれら実施例により何ら限定されるものではな
い。 実施例１ ガラスからなる基盤上に１０ｃｍ×１０ｃｍの導電性を
有する酸化スズ膜（表面抵抗の平均値６００Ω／□）を
形成した。The present invention will be described below with reference to examples.
The present invention is not limited to these examples. Example 1 A tin oxide film (average surface resistance of 600 Ω / □) having a conductivity of 10 cm × 10 cm was formed on a glass substrate.
【００１２】吉草酸亜鉛１０重量部をアセチルアセトン
９０重量部に溶解してなる溶液に上記基盤を浸漬した
後、５２０℃の温度で１時間焼成して、透光性酸化亜鉛
膜を形成した。酸化亜鉛膜の表面抵抗は、平均９００Ω
／□であつた。ガラス基盤とその上に導電性を有する酸
化スズ膜を形成した基盤の３５０〜７００ｍμの透光性
と、本発明に従つて、ガラス基盤上に導電性を有する酸
化スズ膜を形成し、更に、酸化亜鉛膜を形成した基盤の
３５０〜７００ｍμの透光性とを図１に比較して示す。 実施例２ ガラスからなる基盤上に、マスクパターンを用いて、実
施例１と同様にして、導電性を有する酸化スズ膜（表面
抵抗の平均値６００Ω／□）を形成し、更に、その上
に、実施例１と同様にして、透光性酸化亜鉛膜を形成し
た。The above substrate was immersed in a solution prepared by dissolving 10 parts by weight of zinc valerate in 90 parts by weight of acetylacetone and then baked at a temperature of 520 ° C. for 1 hour to form a translucent zinc oxide film. The surface resistance of zinc oxide film is 900Ω on average.
It was / □. According to the present invention, a transparent tin oxide film having a conductivity of 350 to 700 mμ is formed on a glass substrate and a substrate having a conductive tin oxide film formed thereon, and a tin oxide film having conductivity is formed on the glass substrate. The light transmissivity of 350 to 700 mμ of the substrate on which the zinc oxide film is formed is shown in comparison with FIG. Example 2 Using a mask pattern on a glass substrate, a tin oxide film having conductivity ( surface) was formed in the same manner as in Example 1.
An average resistance value of 600Ω / □ was formed, and a translucent zinc oxide film was further formed thereon in the same manner as in Example 1.
【００１３】基盤上、導電性を有する酸化スズ膜が形成
されていない領域における酸化亜鉛膜は絶縁性であつた
が、導電性を有する酸化スズ膜が形成されている領域に
おける酸化亜鉛膜は、導電性を有する酸化スズ膜と同等
の導電性を示した。 実施例３ ガラスからなる基盤上に１０ｃｍ×１０ｃｍの絶縁性の
酸化スズ膜（表面抵抗は無限大）を形成し、その上に実
施例１と同様にして、透光性酸化亜鉛膜を製膜したとこ
ろ、表面抵抗は４００ＫΩ／□であつた。 比較例１ １０ｃｍ×１０ｃｍのガラス基盤の半分を実施例１と同
じ吉草酸亜鉛の溶液に浸漬し、５２０℃で３０分間焼成
して、透光性酸化亜鉛膜を製膜した。この後、基盤の全
面に導電性を有する酸化スズ膜（表面抵抗は１０ ３ Ω／
□のオーダー）をＣＶＤ法にて製膜した。The zinc oxide film in the region where the conductive tin oxide film is not formed on the substrate is insulative, but the zinc oxide film in the region where the conductive tin oxide film is formed is The conductivity was equivalent to that of the tin oxide film having conductivity. Example 3 A 10 cm × 10 cm insulating tin oxide film (infinite surface resistance ) was formed on a glass substrate, and a translucent zinc oxide film was formed thereon in the same manner as in Example 1. As a result, the surface resistance was 400 KΩ / □. Comparative Example 1 Half of a 10 cm × 10 cm glass substrate was immersed in the same zinc valerate solution as in Example 1 and baked at 520 ° C. for 30 minutes to form a translucent zinc oxide film. After that, a tin oxide film having a conductive property ( surface resistance of 10 3 Ω /
(Order of □ ) was formed by a CVD method.
【００１４】酸化亜鉛膜上の導電性を有する酸化スズ膜
は、亜鉛のオートドープによつて、表面抵抗は１０ ６ Ω
／□のオーダーであつて、基盤の他の半分の導電性を有
する酸化スズ膜の約１０００倍を示した。The conductive tin oxide film on the zinc oxide film has a surface resistance of 10 6 Ω due to autodoping of zinc.
The order was / □, which was about 1000 times that of the tin oxide film having the conductivity of the other half of the substrate.
【図１】は、ガラス基盤とその上に導電性を有する酸化
スズ膜（ＡＴＯ膜）を形成した基盤の３５０〜７００ｍ
μの透光性と、本発明に従つて、ガラス基盤上に導電性
を有する酸化スズ膜を形成し、更に、酸化亜鉛膜を形成
した基盤の３５０〜７００ｍμの透光性とを比較して示
すグラフである。1 is a glass substrate and a substrate on which a conductive tin oxide film (ATO film) is formed, 350 to 700 m.
According to the present invention, the translucency of μ is compared with the translucency of 350 to 700 mμ of a substrate on which a conductive tin oxide film is formed on a glass substrate and further a zinc oxide film is formed. It is a graph shown.
Claims (2)
し、次いで、ｎ−吉草酸亜鉛又はｎ−カプロン酸亜鉛を
有機溶剤に溶解した溶液に上記基盤を浸漬した後、焼成
して、前記酸化スズ膜上に酸化亜鉛膜を製膜することを
特徴とする透光性導電性酸化亜鉛膜の製造方法。1. A conductive tin oxide film is formed on a substrate and then n-zinc valerate or n-zinc caproate is added.
A method for producing a translucent conductive zinc oxide film, which comprises immersing the substrate in a solution dissolved in an organic solvent and then baking the substrate to form a zinc oxide film on the tin oxide film.
いで、ｎ−吉草酸亜鉛又はｎ−カプロン酸亜鉛を有機溶
剤に溶解した溶液に上記基盤を浸漬した後、焼成して、
前記酸化スズ膜上に酸化亜鉛膜を製膜することを特徴と
する透光性導電性酸化亜鉛膜の製造方法。2. An insulating tin oxide film is formed on a substrate, and then n-zinc valerate or n-zinc caproate is organically dissolved.
After immersing the above substrate in the solution dissolved in the agent , fire it,
A method for producing a translucent conductive zinc oxide film, comprising forming a zinc oxide film on the tin oxide film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3004603A JP2539294B2 (en) | 1991-01-18 | 1991-01-18 | Method for producing translucent conductive zinc oxide film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3004603A JP2539294B2 (en) | 1991-01-18 | 1991-01-18 | Method for producing translucent conductive zinc oxide film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04331745A JPH04331745A (en) | 1992-11-19 |
| JP2539294B2 true JP2539294B2 (en) | 1996-10-02 |
Family
ID=11588618
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3004603A Expired - Lifetime JP2539294B2 (en) | 1991-01-18 | 1991-01-18 | Method for producing translucent conductive zinc oxide film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2539294B2 (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2718046B2 (en) * | 1988-01-28 | 1998-02-25 | 旭硝子株式会社 | Transparent conductive film |
-
1991
- 1991-01-18 JP JP3004603A patent/JP2539294B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04331745A (en) | 1992-11-19 |
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