JP2024529123A - 投影露光システム及び接着剤層を設計する方法 - Google Patents
投影露光システム及び接着剤層を設計する方法 Download PDFInfo
- Publication number
- JP2024529123A JP2024529123A JP2024508441A JP2024508441A JP2024529123A JP 2024529123 A JP2024529123 A JP 2024529123A JP 2024508441 A JP2024508441 A JP 2024508441A JP 2024508441 A JP2024508441 A JP 2024508441A JP 2024529123 A JP2024529123 A JP 2024529123A
- Authority
- JP
- Japan
- Prior art keywords
- adhesive
- edge
- projection exposure
- adhesive layer
- exposure apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012790 adhesive layer Substances 0.000 title claims abstract description 75
- 238000000034 method Methods 0.000 title claims abstract description 16
- 239000000853 adhesive Substances 0.000 claims abstract description 108
- 230000001070 adhesive effect Effects 0.000 claims abstract description 108
- 238000001459 lithography Methods 0.000 claims abstract description 12
- 239000004065 semiconductor Substances 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 abstract description 3
- 230000003287 optical effect Effects 0.000 description 64
- 238000005286 illumination Methods 0.000 description 49
- 230000005855 radiation Effects 0.000 description 31
- 210000001747 pupil Anatomy 0.000 description 28
- 238000003384 imaging method Methods 0.000 description 17
- 238000006073 displacement reaction Methods 0.000 description 8
- 239000003292 glue Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 230000007704 transition Effects 0.000 description 5
- 238000000576 coating method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000009304 pastoral farming Methods 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005549 size reduction Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/12—Bonding of a preformed macromolecular material to the same or other solid material such as metal, glass, leather, e.g. using adhesives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J5/00—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/025—Mountings, adjusting means, or light-tight connections, for optical elements for lenses using glue
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Organic Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Manufacturing & Machinery (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102021208801.5A DE102021208801B3 (de) | 2021-08-11 | 2021-08-11 | Projektionsbelichtungsanlage und Verfahren zur Auslegung einer Klebstoffschicht |
| DE102021208801.5 | 2021-08-11 | ||
| PCT/EP2022/068269 WO2023016701A1 (de) | 2021-08-11 | 2022-07-01 | Projektionsbelichtungsanlage und verfahren zur auslegung einer klebstoffschicht |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2024529123A true JP2024529123A (ja) | 2024-08-01 |
Family
ID=82493320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024508441A Pending JP2024529123A (ja) | 2021-08-11 | 2022-07-01 | 投影露光システム及び接着剤層を設計する方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2024529123A (de) |
| CN (1) | CN117916667A (de) |
| DE (1) | DE102021208801B3 (de) |
| WO (1) | WO2023016701A1 (de) |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4418284A (en) | 1980-03-17 | 1983-11-29 | Matsushita Electric Industrial Co., Ltd. | Solid-state color-image sensor and process for fabricating the same |
| US4679918A (en) | 1984-10-23 | 1987-07-14 | Ace Ronald S | Ophthalmic glass/plastic laminated lens having photochromic characteristics and assembly thereof |
| US6573978B1 (en) | 1999-01-26 | 2003-06-03 | Mcguire, Jr. James P. | EUV condenser with non-imaging optics |
| DE10317667A1 (de) | 2003-04-17 | 2004-11-18 | Carl Zeiss Smt Ag | Optisches Element für ein Beleuchtungssystem |
| DE102006039894A1 (de) | 2006-08-25 | 2008-03-13 | Carl Zeiss Smt Ag | Baugruppe, optisches System und Verfahren zur Herstellung einer Baugruppe |
| DE102008009600A1 (de) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
| DE102015226531A1 (de) | 2015-04-14 | 2016-10-20 | Carl Zeiss Smt Gmbh | Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik |
| DE102017220586A1 (de) | 2017-11-17 | 2019-05-23 | Carl Zeiss Smt Gmbh | Pupillenfacettenspiegel, Beleuchtungsoptik und optisches System für eine Projek-tionsbelichtungsanlage |
| DE102019213345A1 (de) * | 2019-09-03 | 2021-03-04 | Carl Zeiss Smt Gmbh | Spiegelanordnung und optische Anordnung damit |
-
2021
- 2021-08-11 DE DE102021208801.5A patent/DE102021208801B3/de active Active
-
2022
- 2022-07-01 WO PCT/EP2022/068269 patent/WO2023016701A1/de active Application Filing
- 2022-07-01 JP JP2024508441A patent/JP2024529123A/ja active Pending
- 2022-07-01 CN CN202280055509.9A patent/CN117916667A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE102021208801B3 (de) | 2022-08-11 |
| CN117916667A (zh) | 2024-04-19 |
| WO2023016701A1 (de) | 2023-02-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240410 |