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JP2022053325A - Film manufacturing method and film manufacturing device - Google Patents

Film manufacturing method and film manufacturing device Download PDF

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JP2022053325A
JP2022053325A JP2020160107A JP2020160107A JP2022053325A JP 2022053325 A JP2022053325 A JP 2022053325A JP 2020160107 A JP2020160107 A JP 2020160107A JP 2020160107 A JP2020160107 A JP 2020160107A JP 2022053325 A JP2022053325 A JP 2022053325A
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JP7503466B2 (en
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雄三 佐藤
Yuzo Sato
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Kaneka Corp
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Abstract

To provide a film manufacturing method and a film manufacturing device which can reduce poor appearance.SOLUTION: A film manufacturing method according to the present invention comprises: a step of coating a belt-like base material B being continuously conveyed in a longitudinal direction with coating liquid P; a step of thickening a coated film F formed by the coating, by spraying gas G to the coated film F; and a step of drying the coated film F. A maximum value of speeds of hitting-wind which is an ingredient in a direction perpendicular to the base material B at a surface position of the base material B of wind speeds of the gas is 2.0 m/s or more and 7.0 m/s or less. An average change rate determined from maximum values of the speeds of the hitting-wind in a range of 10 mm between front and rear sides in a conveying direction of the base material B at a position where the speeds of the hitting-wind becomes maximum is 0.25 m/(s.mm) or less.SELECTED DRAWING: Figure 1

Description

本発明は、フィルム製造方法及びフィルム製造装置に関する。 The present invention relates to a film manufacturing method and a film manufacturing apparatus.

樹脂を有機溶媒に溶解した塗工液を基材上に塗工し、塗工により形成される塗膜を乾燥することによって樹脂フィルムを製造する方法が知られている。このような方法でフィルムを製造する場合、必要な機能を得るために40μm以上の厚い塗膜を優れた外観で製膜することが必要になることがある。 A method is known in which a coating liquid in which a resin is dissolved in an organic solvent is applied onto a base material, and a coating film formed by the coating is dried to produce a resin film. When producing a film by such a method, it may be necessary to form a thick coating film having a thickness of 40 μm or more with an excellent appearance in order to obtain a required function.

塗工液として低粘度なものを使用することで塗工液の表面張力等によって塗工から乾燥までの間に塗膜の外観不良が低減されることが知られている。しかしながら、粘度が低い場合、塗工後に塗膜が流れてしまい厚膜を維持することができない。一方、厚膜を得るために粘度を増加させると、塗工部でのビード欠陥に由来した塗工ムラ(スジ、段ムラ)の影響が顕著に現れてしまい優れた外観の塗膜を得ることができない。 It is known that by using a coating liquid having a low viscosity, poor appearance of the coating film is reduced from coating to drying due to the surface tension of the coating liquid and the like. However, if the viscosity is low, the coating film will flow after coating and the thick film cannot be maintained. On the other hand, if the viscosity is increased in order to obtain a thick film, the influence of coating unevenness (streaks, step unevenness) caused by bead defects in the coated portion becomes remarkable, and a coating film having an excellent appearance can be obtained. Can't.

下記特許文献1には、塗料の塗布位置に対して相対的に支持体(ベースフィルム)を移動させながら、この支持体の一方の面に前記塗料を塗布する工程と、この塗布後に前記塗料の塗布面を少なくとも気体の吹きつけにより平滑化する工程とを有する塗膜形成方法が記載されている。特許文献1では、塗布直後の塗膜に気体を吹き付けることにより流動を停止させ、塗布面の平滑化を図ることができるとされている。 The following Patent Document 1 describes a step of applying the paint to one surface of the support while moving the support (base film) relative to the coating position of the paint, and a step of applying the paint after the coating. A coating film forming method including at least a step of smoothing a coated surface by spraying a gas is described. According to Patent Document 1, it is possible to stop the flow and smooth the coated surface by spraying a gas on the coating film immediately after coating.

特開2004-261791号公報Japanese Unexamined Patent Publication No. 2004-261791

上記特許文献1に記載の方法により塗膜を平滑化したフィルムを取得することができるが、Wet膜が厚い塗膜に対して適用すると、塗膜表面に風紋が発生してしまい、人の目で見た場合に外観不良として認識される。このような外観不良をもたらす風紋は、得られたフィルムを光学フィルムとして用いる場合には欠陥となる。 A film in which the coating film is smoothed can be obtained by the method described in Patent Document 1, but when applied to a coating film having a thick Wet film, wind prints are generated on the surface of the coating film, and the human eye. It is recognized as a poor appearance when viewed in. The wind pattern that causes such poor appearance becomes a defect when the obtained film is used as an optical film.

本発明は、外観不良を低減した厚膜フィルム製造方法及びフィルム製造装置を提供することを課題とする。 An object of the present invention is to provide a thick film film manufacturing method and a film manufacturing apparatus with reduced appearance defects.

本発明者らは、鋭意検討の結果、以下の構成により、外観不良を低減した厚膜フィルム製造方法及びフィルム製造装置を提供することを見出した。 As a result of diligent studies, the present inventors have found that a thick film film manufacturing method and a film manufacturing apparatus with reduced appearance defects are provided by the following configurations.

(1).フィルムの製造方法であって、
溶剤可溶性の樹脂と、溶剤と、を含む塗工液を、塗工手段を用いて支持体上に塗布して塗膜を形成する塗工工程と、
前記塗膜へ気体を吹き付けにより前記塗膜の粘度を増加させる厚膜化工程と、前記塗膜を乾燥する工程と、を有し、
前記気体を吹き付けにより前記塗膜の粘度を増加させる厚膜化工程の気体の風速の前記基材の表面位置での前記基材に垂直な方向の成分である衝突風速の最大値が2.0m/s以上7.0m/s以下であり、
前記衝突風速が最大となる位置の前記基材の搬送方向前後10mmにおける前記衝突風速の最大値からの平均変化率が0.25m/(s・mm)以下であるフィルム製造方法。
(1). It ’s a film manufacturing method.
A coating process in which a coating liquid containing a solvent-soluble resin and a solvent is applied onto a support using a coating means to form a coating film.
It has a thickening step of increasing the viscosity of the coating film by spraying a gas onto the coating film and a step of drying the coating film.
The maximum value of the collision wind speed, which is a component of the wind speed of the gas in the thickening step of increasing the viscosity of the coating film by spraying the gas in the direction perpendicular to the base material at the surface position of the base material, is 2.0 m. / S or more and 7.0 m / s or less,
A film manufacturing method in which the average rate of change from the maximum value of the collision wind speed at a position 10 mm before and after the transport direction of the base material at the position where the collision wind speed is maximum is 0.25 m / (s · mm) or less.

(2).前記塗工液の粘度が、1~50cPであることを特徴とする(1)に記載のフィルム製造方法。 (2). The film manufacturing method according to (1), wherein the coating liquid has a viscosity of 1 to 50 cP.

(3).吹き付ける気体の温度が、15~35℃であることを特徴とする(1)または(2)に記載のフィルム製造方法。 (3). The film manufacturing method according to (1) or (2), wherein the temperature of the sprayed gas is 15 to 35 ° C.

(4).前記塗膜の平均厚みが80μm以上、200μm以下である(1)~(3)のいずれかに記載のフィルム製造方法。 (4). The film manufacturing method according to any one of (1) to (3), wherein the average thickness of the coating film is 80 μm or more and 200 μm or less.

(5).帯状の基材を長手方向に連続搬送する搬送装置と、
前記搬送装置により搬送されている前記基材に塗工液を塗工する塗工装置と、
前記塗工装置により形成された塗膜への気体の吹き付けにより前記塗膜の粘度を増加させる厚膜化装置と、を備え、
前記厚膜化装置は、前記基材の表面位置における前記気体の風速の前記基材に垂直な方向の成分である衝突風速の最大値が2.0m/s以上7.0m/s以下、かつ前記衝突風速が最大となる位置の前記基材の搬送方向前後10mmにおける前記衝突風速の最大値からの平均変化率が0.25m/(s・mm)以下となるよう前記気体を吹き付けるフィルム製造装置。
(5). A transport device that continuously transports strip-shaped base materials in the longitudinal direction,
A coating device that applies a coating liquid to the base material transported by the transport device, and a coating device.
A thickening device for increasing the viscosity of the coating film by spraying a gas onto the coating film formed by the coating device is provided.
In the thickening device, the maximum value of the collision wind speed, which is a component of the wind speed of the gas in the direction perpendicular to the base material at the surface position of the base material, is 2.0 m / s or more and 7.0 m / s or less, and A film manufacturing apparatus that blows the gas so that the average rate of change from the maximum value of the collision wind speed at a position 10 mm before and after the transport direction of the base material at the position where the collision wind speed is maximum is 0.25 m / (s · mm) or less. ..

本発明によれば、外観不良を低減した厚膜フィルム製造方法及びフィルム製造装置を提供することができる。 According to the present invention, it is possible to provide a thick film film manufacturing method and a film manufacturing apparatus with reduced appearance defects.

本発明の一実施形態に係るフィルム製造装置の構成を示す模式図である。It is a schematic diagram which shows the structure of the film manufacturing apparatus which concerns on one Embodiment of this invention. 試作例における衝突風速の分布を示すグラフである。It is a graph which shows the distribution of the collision wind speed in the prototype example.

以下、本発明の実施形態について、図面を参照しながら説明する。図1は、本発明の一実施形態に係るフィルム製造装置の構成を示す模式図である。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a schematic diagram showing a configuration of a film manufacturing apparatus according to an embodiment of the present invention.

フィルム製造装置は、帯状の基材B(支持体)を長手方向に連続搬送する搬送装置1と、搬送装置1により搬送されている基材Bに塗工液Pを塗工する塗工装置2と、塗工装置2により形成された塗膜Fへの気体Gの吹き付けにより塗膜Fの粘度を増加させる厚膜化装置3と、厚膜化装置3により厚膜化した塗膜Fを乾燥する乾燥装置4を備える。 The film manufacturing apparatus includes a transport device 1 that continuously transports the strip-shaped base material B (support) in the longitudinal direction, and a coating device 2 that coats the base material B conveyed by the transport device 1 with the coating liquid P. The thickening device 3 that increases the viscosity of the coating film F by spraying the gas G onto the coating film F formed by the coating device 2 and the coating film F that has been thickened by the thickening device 3 are dried. The drying device 4 is provided.

搬送装置1は、図示するように、搬送装置1は、長尺帯状の基材を複数の搬送ローラにより連続搬送する構成とすることができる。この場合、搬送装置1は、リールに巻き取られた基材Bを巻き解いて搬送し、塗膜Fを乾燥して形成される製品フィルムを剥離した後の基材Bを別のリールに巻き取るよう構成されてもよい。
As shown in the figure, the transport device 1 can be configured to continuously transport a long strip-shaped base material by a plurality of transport rollers. In this case, the transport device 1 unwinds and transports the base material B wound on the reel, and winds the base material B after peeling off the product film formed by drying the coating film F on another reel. It may be configured to take.

塗工装置2は、塗工液Pを基材Bの表面に一様に塗布する。具体的には、塗工装置2は、例えばダイコータ、ナイフコータ、バーコータ、グラビアコータ等を挙げることができる。 The coating device 2 uniformly applies the coating liquid P to the surface of the base material B. Specifically, the coating device 2 may include, for example, a die coater, a knife coater, a bar coater, a gravure coater, or the like.

特に限定されないが、図示する例では、塗工装置2は、不図示のタンクから供給される塗工液Pを、基材Bの幅全体に吐出するダイ21を有する構成とされている。 Although not particularly limited, in the illustrated example, the coating device 2 is configured to have a die 21 for discharging the coating liquid P supplied from a tank (not shown) over the entire width of the base material B.

塗工装置2で基材Bに塗布される塗工液Pは、製膜する機能膜の主成分となる樹脂と、この樹脂を溶解する有機溶媒とを含むものを用いることができる。 As the coating liquid P applied to the base material B by the coating apparatus 2, a resin containing a resin as a main component of the functional film to be formed and an organic solvent for dissolving the resin can be used.

塗工液Pに含まれる樹脂としては、特に限定されないが、例えば得られるフィルムを光学用途に用いる場合等には、アクリル樹脂、エポキシ樹脂、ウレタン樹脂、シリコン樹脂等が好適に用いられる。 The resin contained in the coating liquid P is not particularly limited, but for example, when the obtained film is used for optical applications, acrylic resin, epoxy resin, urethane resin, silicon resin and the like are preferably used.

また、前期塗工液Pに含まれる樹脂の重量平均分子量は、500~20000が好ましく、2000~14000がより好ましく、3000~12000が更に好ましい。前期樹脂の重量平均分子量が前記下限以上である場合、塗工装置2により形成させる塗膜Fにおいて、前期樹脂の揮発を抑制することができる。また前期樹脂の重量平均分子量が前記上限以下である場合、前期塗工液Pの過度な粘度増加を抑制することができ、厚膜化装置3によって外観不良を低減した厚膜を得ることができる。 The weight average molecular weight of the resin contained in the early coating liquid P is preferably 500 to 20000, more preferably 2000 to 14000, and even more preferably 3000 to 12000. When the weight average molecular weight of the early resin is equal to or higher than the lower limit, the coating film F formed by the coating apparatus 2 can suppress the volatilization of the early resin. Further, when the weight average molecular weight of the resin in the first half is not more than the upper limit, an excessive increase in viscosity of the coating liquid P in the first half can be suppressed, and a thick film with reduced appearance defects can be obtained by the thickening device 3. ..

また、前記塗工液Pの粘度は1~50cPが好ましく、5~35cPがより好ましく、10~20cPが更に好ましい。粘度が前記下限以上である場合、塗工装置2により形成させる塗膜Fを、厚膜化装置3により厚膜化する効果を十分に得ることができる。また前期塗工液Pの粘度が前記上限以下である場合、厚膜化装置3によって外観不良を低減した厚膜を得ることができる。 The viscosity of the coating liquid P is preferably 1 to 50 cP, more preferably 5 to 35 cP, and even more preferably 10 to 20 cP. When the viscosity is equal to or higher than the lower limit, the effect of thickening the coating film F formed by the coating device 2 can be sufficiently obtained by the thickening device 3. Further, when the viscosity of the early coating liquid P is not more than the upper limit, a thick film having reduced appearance defects can be obtained by the thickening device 3.

また、前期塗工液Pの固形分濃度は、30~70%が好ましく、40~60%がより好ましく、45~55%が更に好ましい。固形分濃度が前記下限以上である場合、塗工装置2により形成させる塗膜Fが過度に厚くならず、厚膜化装置3によって外観不良を低減した厚膜を得ることができる。また前期塗工液Pの固形分濃度が前記上限以下である場合、レベリング効果を十分に発揮でき、厚膜化装置3によって外観不良を低減した厚膜を得ることができる。 The solid content concentration of the early coating liquid P is preferably 30 to 70%, more preferably 40 to 60%, and even more preferably 45 to 55%. When the solid content concentration is at least the above lower limit, the coating film F formed by the coating device 2 does not become excessively thick, and the thickening device 3 can obtain a thick film with reduced appearance defects. Further, when the solid content concentration of the coating liquid P in the first half is not more than the above upper limit, the leveling effect can be sufficiently exhibited, and a thick film having reduced appearance defects can be obtained by the thickening device 3.

塗工液Pに含まれる有機溶媒としては、特に限定されないが、例えば、トルエンやメチルイソエチルケトンやプロピレングリコールモノメチルエーテル等の溶媒が好ましい。このような沸点領域の溶媒を使用することによって、比較的厚みが大きい製品フィルムを製造する場合にも、残留する有機溶媒量の低減および設備コストの観点からも望ましい。 The organic solvent contained in the coating liquid P is not particularly limited, but for example, a solvent such as toluene, methyl isoethyl ketone or propylene glycol monomethyl ether is preferable. By using a solvent in such a boiling point region, it is desirable from the viewpoint of reducing the amount of residual organic solvent and equipment cost even when a product film having a relatively large thickness is produced.

外観不良を抑制するためには塗工部での塗工液Pの粘度を低くする必要がある。塗工液Pの粘度が低くなると、厚膜形成が困難になるが、厚膜化装置3により外観不良を抑制した厚膜塗工が可能となる。 It is necessary to reduce the viscosity of the coating liquid P in the coating portion in order to suppress the appearance defect. When the viscosity of the coating liquid P becomes low, it becomes difficult to form a thick film, but the thick film thickening device 3 enables thick film coating in which poor appearance is suppressed.

塗工装置2により形成される塗膜Fの平均厚みの下限としては、80μmが好ましく、120μmがより好ましい。一方、塗工装置2により形成される塗膜Fの平均厚みの上限としては、200μmが好ましく、160μmがより好ましい。塗工装置2により形成される塗膜Fの平均厚みが前記下限以上である場合、塗膜Fの厚膜を維持することが難しく、外観不良が生じやすいので厚膜化装置3により外観不良を低減した厚膜を得る効果が顕著となる。また、塗工装置2により形成される塗膜Fの平均厚みが前記上限以下である場合、厚膜化装置3によって外観不良を低減した厚膜を得ることができる。 The lower limit of the average thickness of the coating film F formed by the coating device 2 is preferably 80 μm, more preferably 120 μm. On the other hand, the upper limit of the average thickness of the coating film F formed by the coating device 2 is preferably 200 μm, more preferably 160 μm. When the average thickness of the coating film F formed by the coating device 2 is at least the above lower limit, it is difficult to maintain the thick film of the coating film F and the appearance is liable to be poor. The effect of obtaining a reduced thick film becomes remarkable. Further, when the average thickness of the coating film F formed by the coating device 2 is not more than the upper limit, a thick film having reduced appearance defects can be obtained by the thickening device 3.

塗工装置2により形成される塗膜Fの厚膜化装置3により気体Gが吹き付けられる領域(後述する吹付領域)における平均温度(気体の温度)の下限としては、15℃が好ましく、20℃がより好ましい。一方、塗工装置2により形成される塗膜Fの平均温度の上限としては、35℃が好ましく、25℃がより好ましい。塗工装置2により形成される塗膜Fの平均温度を前記下限以上とすることによって、冷却が不要となるため、塗工装置2の設備コスト及びランニングコストの増大を抑制できる。また、塗工装置2により形成される塗膜Fの平均温度を前記上限以下とすることによって、塗工後に厚膜化装置3で厚膜を維持する際に塗膜F中の有機溶媒が多量に蒸発して後のレベリングによる平滑化を阻害することを防止できると考えられる。 The lower limit of the average temperature (gas temperature) in the region where the gas G is sprayed (the sprayed region described later) by the thickening device 3 of the coating film F formed by the coating device 2 is preferably 15 ° C. and 20 ° C. Is more preferable. On the other hand, the upper limit of the average temperature of the coating film F formed by the coating device 2 is preferably 35 ° C, more preferably 25 ° C. By setting the average temperature of the coating film F formed by the coating device 2 to be equal to or higher than the lower limit, cooling is not required, so that an increase in equipment cost and running cost of the coating device 2 can be suppressed. Further, by setting the average temperature of the coating film F formed by the coating device 2 to be equal to or lower than the upper limit, a large amount of organic solvent is contained in the coating film F when the thick film is maintained by the thickening device 3 after coating. It is considered that it can be prevented from evaporating to prevent smoothing due to subsequent leveling.

厚膜化装置3は、塗工装置2により形成された塗膜Fに垂直に気体Gを吹き付けることによって、塗膜Fの厚膜を維持する。 The thickening device 3 maintains the thick film of the coating film F by spraying the gas G perpendicularly to the coating film F formed by the coating device 2.

厚膜化装置3は、塗膜Fに吹き付ける気体Gを噴射するノズル31を有する。ノズル31は、基材Bの搬送方向に垂直かつ基材Bの表面に平行な方向(基材Bの幅方向と平行)に延びるスリット状の吹出口を有し、吹出口の直前の流路が吹出口に向かってテーパ状に縮幅(流路の吹出口の短手方向)の寸法が吹出口に向かって減少する。 The thickening device 3 has a nozzle 31 for injecting a gas G to be sprayed on the coating film F. The nozzle 31 has a slit-shaped outlet extending in a direction perpendicular to the transport direction of the base material B and parallel to the surface of the base material B (parallel to the width direction of the base material B), and a flow path immediately before the outlet. The dimension of the narrowing width (in the lateral direction of the outlet of the flow path) tapering toward the outlet decreases toward the outlet.

基材Bの表面位置における気体Gの風速の基材Bに垂直な方向の成分である衝突風速の最大値の下限としては、2.0m/sが好ましく、3.0m/sがより好ましく、3.8m/sが更に好ましい。一方、衝突風速の最大値の上限としては、7.0m/sが好ましく、6.0m/sがより好ましく、5.4mが更に好ましい。衝突風速の最大値を前記下限以上とすることによって、塗膜Fの厚みを十分に維持することができる。また、衝突風速の最大値を前記上限以下とすることによって、塗膜Fの表面の風紋や塗膜の飛散を抑制することができる。なお、衝突風速は、基材Bがない状態で、基材Bが搬送される位置に配置した風速計により測定される値とする。 The lower limit of the maximum value of the collision wind speed, which is a component of the wind speed of the gas G in the direction perpendicular to the base material B at the surface position of the base material B, is preferably 2.0 m / s, more preferably 3.0 m / s. 3.8 m / s is more preferable. On the other hand, as the upper limit of the maximum value of the collision wind speed, 7.0 m / s is preferable, 6.0 m / s is more preferable, and 5.4 m is further preferable. By setting the maximum value of the collision wind speed to be equal to or higher than the lower limit, the thickness of the coating film F can be sufficiently maintained. Further, by setting the maximum value of the collision wind speed to be equal to or lower than the upper limit, it is possible to suppress the wind pattern on the surface of the coating film F and the scattering of the coating film. The collision wind speed is a value measured by an anemometer arranged at a position where the base material B is conveyed in the absence of the base material B.

衝突風速が最大となる位置の基材Bの搬送方向前後10mmにおける衝突風速の最大値からの平均変化率(最大風速の変化量を前後距離10mmで除した値の平均値、以下、ピーク前後の平均変化率という)の下限としては、0.02m/(s・mm)が好ましく、0.04m/(s・mm)がより好ましく、0.06m/(s・mm)が更に好ましい。一方、ピーク前後の平均変化率の上限としては、0.25m/(s・mm)が好ましく、0.20m/(s・mm)がより好ましく、0.15m/(s・mm)が更に好ましい。ピーク前後の平均変化率を前記下限以上とすることによって、衝突風速の最大値を十分な大きさとしつつ、気体Gが衝突する範囲が大きくなり過ぎることを防止できる。また、ピーク前後の平均変化率を前記上限以下とすることによって、基材Bの搬送方向前後の風力差によって生じる塗膜Fの前後移動を抑制することにより、塗膜Fの表面に風紋が形成されることを抑制できる。 Average change rate from the maximum value of the collision wind speed 10 mm before and after the transport direction of the base material B at the position where the collision wind speed is maximum (the average value of the value obtained by dividing the amount of change in the maximum wind speed by the front-rear distance 10 mm, hereinafter, before and after the peak The lower limit of the average rate of change) is preferably 0.02 m / (s · mm), more preferably 0.04 m / (s · mm), and even more preferably 0.06 m / (s · mm). On the other hand, the upper limit of the average rate of change before and after the peak is preferably 0.25 m / (s · mm), more preferably 0.20 m / (s · mm), and even more preferably 0.15 m / (s · mm). .. By setting the average rate of change before and after the peak to be equal to or higher than the lower limit, it is possible to prevent the range in which the gas G collides becomes too large while making the maximum value of the collision wind speed sufficiently large. Further, by setting the average rate of change before and after the peak to be equal to or less than the upper limit, the wind pattern is formed on the surface of the coating film F by suppressing the back-and-forth movement of the coating film F caused by the difference in wind power before and after the transport direction of the base material B. It can be suppressed.

乾燥装置4は、塗膜Fを乾燥することによって樹脂フィルムとする装置である。塗膜Fを乾燥する方法としては、温風、輻射熱等により塗膜F中の有機溶媒の気化を促進する方法とすることができる。 The drying device 4 is a device for forming a resin film by drying the coating film F. As a method of drying the coating film F, a method of promoting vaporization of the organic solvent in the coating film F by warm air, radiant heat, or the like can be used.

以上の説明から明らかなように、本発明の一実施形態に係るフィルム製造装置は、帯状の基材Bを長手方向に連続搬送する搬送装置1と、搬送装置1により搬送されている基材Bに塗工液Pを塗工する塗工装置2と、塗工装置2により形成された塗膜Fへの気体Gの吹き付けにより塗膜Fを厚膜化する厚膜化装置3と、を備え、厚膜化装置3は、基材Bの表面位置における気体Gの風速の基材に垂直な方向の成分である衝突風速の最大値が2.0m/s以上7.0m/s以下、かつ衝突風速が最大となる位置の前後10mmにおける衝突風速の最大値からの平均変化率が0.25m/s以下となるよう気体Gを噴射する。このフィルム製造装置によれば、衝突風速の最大値を所定の範囲に収めることによって、塗膜の厚みを維持できるとともに、衝突風速のピーク前後の平均変化率が小さいことによって塗膜Fの表面に風紋が形成されることを抑制して外観不良を低減することができる。 As is clear from the above description, in the film manufacturing apparatus according to the embodiment of the present invention, the transport device 1 that continuously conveys the strip-shaped base material B in the longitudinal direction and the base material B that is conveyed by the transfer device 1 The coating device 2 for coating the coating liquid P and the thickening device 3 for thickening the coating film F by spraying the gas G onto the coating film F formed by the coating device 2 are provided. In the thickening device 3, the maximum value of the collision wind speed, which is a component of the wind speed of the gas G at the surface position of the base material B in the direction perpendicular to the base material, is 2.0 m / s or more and 7.0 m / s or less, and The gas G is injected so that the average rate of change from the maximum value of the collision wind speed at 10 mm before and after the position where the collision wind speed is maximum is 0.25 m / s or less. According to this film manufacturing apparatus, the thickness of the coating film can be maintained by keeping the maximum value of the collision wind speed within a predetermined range, and the average rate of change before and after the peak of the collision wind speed is small on the surface of the coating film F. It is possible to suppress the formation of wind patterns and reduce appearance defects.

また、本実施形態のフィルム製造装置は、本発明の一実施形態のフィルム製造方法を実施する装置である。つまり、本発明の一実施形態のフィルム製造方法は、長手方向に連続搬送される帯状の基材Bに塗工液Pを塗工する工程(塗工工程)と、塗工により形成された塗膜Fへの気体Gの吹き付けにより塗膜Fを厚膜化する工程(厚膜化工程)と、塗膜Fを乾燥する工程(乾燥工程)と、を備え、気体Gの風速の基材B表面位置での基材Bに垂直な方向の成分である衝突風速の最大値が2.0m/s以上であり、衝突風速が最大となる位置の基材Bの搬送方向前後10mmにおける衝突風速の最大値からの平均変化率が0.25m/(s・mm)以下である。このフィルム製造方法によれば、衝突風速の最大値を所定の範囲に収めることによって、塗膜の厚みを維持できるとともに、平均変化率が小さいことによって塗膜の表面に風紋が形成されることを抑制して外観不良を低減することができる。 Further, the film manufacturing apparatus of the present embodiment is an apparatus for carrying out the film manufacturing method of one embodiment of the present invention. That is, in the film manufacturing method of one embodiment of the present invention, a step of applying the coating liquid P to the strip-shaped base material B continuously conveyed in the longitudinal direction (coating step) and a coating formed by the coating are applied. A step of thickening the coating film F by spraying the gas G onto the film F (thickening step) and a step of drying the coating film F (drying step) are provided, and the base material B having a wind speed of the gas G is provided. The maximum value of the collision wind speed, which is a component in the direction perpendicular to the base material B at the surface position, is 2.0 m / s or more, and the collision wind speed at the position where the collision wind speed is maximum is 10 mm before and after the transport direction of the base material B. The average rate of change from the maximum value is 0.25 m / (s · mm) or less. According to this film manufacturing method, the thickness of the coating film can be maintained by keeping the maximum value of the collision wind speed within a predetermined range, and the wind pattern is formed on the surface of the coating film due to the small average rate of change. It can be suppressed and the appearance defect can be reduced.

本発明の一実施形態のフィルム製造方法において、気体Gが吹き付けられるときの塗膜Fの平均温度が15℃以上35℃以下であることが好ましい。これによって、塗膜Fの過度な乾燥が抑制されるので、外観不良を抑制した厚膜フィルムを得ることができる。 In the film manufacturing method of one embodiment of the present invention, it is preferable that the average temperature of the coating film F when the gas G is sprayed is 15 ° C. or higher and 35 ° C. or lower. As a result, excessive drying of the coating film F is suppressed, so that a thick film film with suppressed appearance defects can be obtained.

本発明の一実施形態のフィルム製造方法において、塗膜Fの平均厚みが80μm以上200μm以下であることが好ましい。このように、塗膜の厚みが大きい場合に、外観不良を抑制した厚膜フィルムを得られる効果が特に顕著になる。 In the film manufacturing method of one embodiment of the present invention, the average thickness of the coating film F is preferably 80 μm or more and 200 μm or less. As described above, when the thickness of the coating film is large, the effect of obtaining a thick film film having suppressed appearance defects becomes particularly remarkable.

以上、本発明の実施形態について説明したが、本発明は上述した実施形態に限定されることなく、種々の変更及び変形が可能である。 Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments, and various modifications and modifications can be made.

本発明に係るフィルム製造装置において、乾燥装置は必須ではなく、塗膜を自然乾燥してもよい。 In the film manufacturing apparatus according to the present invention, the drying apparatus is not essential, and the coating film may be naturally dried.

以下に、実施例を挙げて本発明をさらに詳しく説明するが、本発明はこれらの実施例に限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.

反応容器にβ-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン100重量部、塩化マグネシウム0.12重量部、水11重量部およびプロピレングリコールモノメチルエーテル11重量部を仕込み、130℃で3時間攪拌後、60℃で減圧脱気してシロキサン樹脂を得て、上記シロキサン系樹脂100重量部、トリアリールスルホニウム・SbF6塩のプロピレンカーボネート溶液2重量部、ポリエーテル変性ポリジメチルシロキサンのキシレン/イソブタノール溶液0.2重量部、プロピレングリコールモノメチルエーテル100重量部を配合し粘度を10cPに調整した塗工液を、2.0m/minの速度で搬送される基材にダイコータにより塗工直後のWET膜厚が150μmとなるように塗工してから、厚膜化装置において送風機、バルブ、ノズル及び塗膜距離の制御により、基材搬送方向の衝突風速の分布を図2のように異ならせて塗膜に気体を吹き付けて厚膜化したものを120℃で2分加熱乾燥し、その後、高圧水銀ランプを用いて波長250~390nmの積算光量が1000mJ/cmとなるように紫外線を照射し、塗膜を硬化させることにより塗工フィルムを得た。得られたフィルムの膜厚及び外観を評価した。 A reaction vessel was charged with 100 parts by weight of β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 0.12 parts by weight of magnesium chloride, 11 parts by weight of water and 11 parts by weight of propylene glycol monomethyl ether, and stirred at 130 ° C. for 3 hours. Then, degas under reduced pressure at 60 ° C. to obtain a siloxane resin, and obtain 100 parts by weight of the above siloxane resin, 2 parts by weight of a propylene carbonate solution of triarylsulfonium / SbF6 salt, and a xylene / isobutanol solution of a polyether-modified polydimethylsiloxane. A coating liquid containing 0.2 parts by weight and 100 parts by weight of propylene glycol monomethyl ether and having a viscosity adjusted to 10 cP is transferred to a substrate at a speed of 2.0 m / min with a die coater to obtain a WET film thickness immediately after coating. After coating to a thickness of 150 μm, the distribution of the impact wind velocity in the substrate transport direction is different as shown in FIG. 2 by controlling the blower, valve, nozzle and coating distance in the thickening device. The thickened film was heated and dried at 120 ° C. for 2 minutes, and then irradiated with ultraviolet rays so that the integrated light amount at a wavelength of 250 to 390 nm was 1000 mJ / cm 2 using a high-pressure mercury lamp. A coated film was obtained by curing the film. The film thickness and appearance of the obtained film were evaluated.

厚みは、山文電気社製の厚み計測装置「TOF-5R01」を用いて測定し、平均値75μm以上、かつ平均値との最大偏差(最大値又は最小値と平均値との差)が平均値の2%以下であったものを「良」、平均値が75μm未満、もしくは最大偏差が2%超であったものを「不良」とした。外観は、光源を用いた反射及び投影による目視において、風紋が視認されなかったものを「良」とし、風紋が視認されたものを「不良」とした。 The thickness is measured using a thickness measuring device "TOF-5R01" manufactured by Yamabun Denki Co., Ltd., and the average value is 75 μm or more, and the maximum deviation from the average value (the difference between the maximum value or the minimum value and the average value) is the average. Those having a value of 2% or less were regarded as "good", and those having an average value of less than 75 μm or a maximum deviation of more than 2% were regarded as "poor". As for the appearance, those in which the wind pattern was not visually recognized in the visual reflection and projection using the light source were regarded as "good", and those in which the wind pattern was visually recognized were regarded as "poor".

塗膜に衝突する気体の風速分布は、基材がない状態で、日本カノマックス社の風速計「アネモマスター6162」を用いて、基材を搬送する面上の各位置での基材に垂直な方向の風速(衝突風速)として測定した。 The wind speed distribution of the gas that collides with the coating film is perpendicular to the base material at each position on the surface on which the base material is transported, using the anemometer "Anemomaster 6162" manufactured by Kanomax Japan, in the absence of the base material. It was measured as the wind speed in the direction (collision wind speed).

図2に、測定した衝突風速の分布を示し、次の表1に、使用した樹脂の種類、衝突風速の最大値及びピーク前後の平均変化率と、膜厚及び外観の良否の評価結果とを示す。 FIG. 2 shows the distribution of the measured collision wind speed, and Table 1 below shows the type of resin used, the maximum value of the collision wind speed, the average rate of change before and after the peak, and the evaluation results of the film thickness and appearance. show.

Figure 2022053325000002
Figure 2022053325000002

この結果から、衝突風速の最大値が一定の範囲であり、かつ衝突風速のピーク前後の平均変化率が一定以下の大きさである場合には、得られるフィルムの膜厚が良好で、風紋による外観異常が生じないことが確認できた。 From this result, when the maximum value of the collision wind speed is in a certain range and the average rate of change before and after the peak of the collision wind speed is less than a certain size, the film thickness of the obtained film is good and it depends on the wind pattern. It was confirmed that no appearance abnormality occurred.

1 搬送装置
2 塗工装置
3 厚膜化装置
4 乾燥装置
11 搬送ローラ
21 ダイ
31 ノズル
B 基材
F 塗膜
G 気体
P 塗工液
1 Transfer device 2 Coating device 3 Thickening device 4 Drying device 11 Transfer roller 21 Die 31 Nozzle B Base material F Coating film G Gas P Coating liquid

Claims (5)

フィルムの製造方法であって、
溶剤可溶性の樹脂と、溶剤と、を含む塗工液を、塗工手段を用いて支持体上に塗布して塗膜を形成する塗工工程と、
前記塗膜へ気体を吹き付けにより前記塗膜の粘度を増加させる厚膜化工程と、前記塗膜を乾燥する工程と、を有し、
前記気体を吹き付けにより前記塗膜の粘度を増加させる厚膜化工程の気体の風速の前記基材の表面位置での前記基材に垂直な方向の成分である衝突風速の最大値が2.0m/s以上7.0m/s以下であり、
前記衝突風速が最大となる位置の前記基材の搬送方向前後10mmにおける前記衝突風速の最大値からの平均変化率が0.25m/(s・mm)以下であるフィルム製造方法。
It ’s a film manufacturing method.
A coating process in which a coating liquid containing a solvent-soluble resin and a solvent is applied onto a support using a coating means to form a coating film.
It has a thickening step of increasing the viscosity of the coating film by spraying a gas onto the coating film and a step of drying the coating film.
The maximum value of the collision wind speed, which is a component of the wind speed of the gas in the thickening step of increasing the viscosity of the coating film by spraying the gas in the direction perpendicular to the base material at the surface position of the base material, is 2.0 m. / S or more and 7.0 m / s or less,
A film manufacturing method in which the average rate of change from the maximum value of the collision wind speed at a position 10 mm before and after the transport direction of the base material at the position where the collision wind speed is maximum is 0.25 m / (s · mm) or less.
前記塗工液の粘度が、1~50cPであることを特徴とする請求項1に記載のフィルム製造方法。 The film manufacturing method according to claim 1, wherein the coating liquid has a viscosity of 1 to 50 cP. 吹き付ける気体の温度が、15~35℃であることを特徴とする請求項1または2に記載のフィルム製造方法。 The film manufacturing method according to claim 1 or 2, wherein the temperature of the sprayed gas is 15 to 35 ° C. 前記塗膜の平均厚みが80μm以上、200μm以下である請求項1~3のいずれかに記載のフィルム製造方法。 The film manufacturing method according to any one of claims 1 to 3, wherein the average thickness of the coating film is 80 μm or more and 200 μm or less. 帯状の基材を長手方向に連続搬送する搬送装置と、
前記搬送装置により搬送されている前記基材に塗工液を塗工する塗工装置と、
前記塗工装置により形成された塗膜への気体の吹き付けにより前記塗膜の粘度を増加させる厚膜化装置と、を備え、
前記厚膜化装置は、前記基材の表面位置における前記気体の風速の前記基材に垂直な方向の成分である衝突風速の最大値が2.0m/s以上7.0m/s以下、かつ前記衝突風速が最大となる位置の前記基材の搬送方向前後10mmにおける前記衝突風速の最大値からの平均変化率が0.25m/(s・mm)以下となるよう前記気体を吹き付けるフィルム製造装置。
A transport device that continuously transports strip-shaped base materials in the longitudinal direction,
A coating device that applies a coating liquid to the base material transported by the transport device, and a coating device.
A thickening device for increasing the viscosity of the coating film by spraying a gas onto the coating film formed by the coating device is provided.
In the thickening device, the maximum value of the collision wind speed, which is a component of the wind speed of the gas in the direction perpendicular to the base material at the surface position of the base material, is 2.0 m / s or more and 7.0 m / s or less, and A film manufacturing apparatus that blows the gas so that the average rate of change from the maximum value of the collision wind speed at a position 10 mm before and after the transport direction of the base material at the position where the collision wind speed is maximum is 0.25 m / (s · mm) or less. ..
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