JP2021501193A - オキサミドエステル基を有するシロキサンの製造方法 - Google Patents
オキサミドエステル基を有するシロキサンの製造方法 Download PDFInfo
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- JP2021501193A JP2021501193A JP2020524484A JP2020524484A JP2021501193A JP 2021501193 A JP2021501193 A JP 2021501193A JP 2020524484 A JP2020524484 A JP 2020524484A JP 2020524484 A JP2020524484 A JP 2020524484A JP 2021501193 A JP2021501193 A JP 2021501193A
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- Prior art keywords
- group
- hydrocarbon group
- silane
- siloxane
- formula
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- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 title claims abstract description 31
- 238000004519 manufacturing process Methods 0.000 title abstract description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910000077 silane Inorganic materials 0.000 claims abstract description 26
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims description 47
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 21
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 19
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 16
- 239000003054 catalyst Substances 0.000 claims description 14
- 125000005842 heteroatom Chemical group 0.000 claims description 8
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 239000004215 Carbon black (E152) Substances 0.000 claims description 3
- 229930195733 hydrocarbon Natural products 0.000 claims description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 11
- -1 oxamide ester Chemical class 0.000 description 52
- 150000002430 hydrocarbons Chemical group 0.000 description 23
- 150000001875 compounds Chemical class 0.000 description 13
- 239000000047 product Substances 0.000 description 12
- 125000004432 carbon atom Chemical group C* 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- 239000007858 starting material Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 4
- 239000012467 final product Substances 0.000 description 4
- 150000003901 oxalic acid esters Chemical class 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 241001550224 Apha Species 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 125000004474 heteroalkylene group Chemical group 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- AAPLIUHOKVUFCC-UHFFFAOYSA-N trimethylsilanol Chemical compound C[Si](C)(C)O AAPLIUHOKVUFCC-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- HUCVOHYBFXVBRW-UHFFFAOYSA-M caesium hydroxide Chemical compound [OH-].[Cs+] HUCVOHYBFXVBRW-UHFFFAOYSA-M 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 239000007859 condensation product Substances 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 239000003651 drinking water Substances 0.000 description 2
- 235000020188 drinking water Nutrition 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 150000002148 esters Chemical group 0.000 description 2
- 238000007306 functionalization reaction Methods 0.000 description 2
- 125000003827 glycol group Chemical group 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 2
- 125000004043 oxo group Chemical group O=* 0.000 description 2
- 229920001515 polyalkylene glycol Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 239000008213 purified water Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- CPRMKOQKXYSDML-UHFFFAOYSA-M rubidium hydroxide Chemical compound [OH-].[Rb+] CPRMKOQKXYSDML-UHFFFAOYSA-M 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000001542 size-exclusion chromatography Methods 0.000 description 2
- 238000010561 standard procedure Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005292 vacuum distillation Methods 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical group CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- AFFLGGQVNFXPEV-UHFFFAOYSA-N 1-decene Chemical group CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 description 1
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical group CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 238000005133 29Si NMR spectroscopy Methods 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical class OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- YIKSCQDJHCMVMK-UHFFFAOYSA-N Oxamide Chemical group NC(=O)C(N)=O YIKSCQDJHCMVMK-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000001447 alkali salts Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- IYABWNGZIDDRAK-UHFFFAOYSA-N allene Chemical group C=C=C IYABWNGZIDDRAK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000004103 aminoalkyl group Chemical group 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- UXJHQBVRZUANLK-UHFFFAOYSA-N azanylidyne(dichloro)-$l^{5}-phosphane Chemical compound ClP(Cl)#N UXJHQBVRZUANLK-UHFFFAOYSA-N 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 125000003636 chemical group Chemical group 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 125000000068 chlorophenyl group Chemical group 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004977 cycloheptylene group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000004979 cyclopentylene group Chemical group 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- OLLFKUHHDPMQFR-UHFFFAOYSA-N dihydroxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](O)(O)C1=CC=CC=C1 OLLFKUHHDPMQFR-UHFFFAOYSA-N 0.000 description 1
- RBSBUSKLSKHTBA-UHFFFAOYSA-N dihydroxy-methyl-phenylsilane Chemical compound C[Si](O)(O)C1=CC=CC=C1 RBSBUSKLSKHTBA-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- XCLIHDJZGPCUBT-UHFFFAOYSA-N dimethylsilanediol Chemical compound C[Si](C)(O)O XCLIHDJZGPCUBT-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- MLAVWIDZZBIYSI-UHFFFAOYSA-N ethyl 2-[3-[diethoxy(methyl)silyl]propylamino]-2-oxoacetate Chemical compound C(C)O[Si](CCCNC(C(=O)OCC)=O)(C)OCC MLAVWIDZZBIYSI-UHFFFAOYSA-N 0.000 description 1
- WVVRSGYNMHMXRG-UHFFFAOYSA-N ethyl 2-[3-[ethoxy(dimethyl)silyl]propylamino]-2-oxoacetate Chemical compound C(C)O[Si](CCCNC(C(=O)OCC)=O)(C)C WVVRSGYNMHMXRG-UHFFFAOYSA-N 0.000 description 1
- JXBFGXQTFINJDK-UHFFFAOYSA-N ethyl 2-[3-[methoxy(dimethyl)silyl]propylamino]-2-oxoacetate Chemical compound CCOC(=O)C(=O)NCCC[Si](C)(C)OC JXBFGXQTFINJDK-UHFFFAOYSA-N 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000003673 groundwater Substances 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 150000008282 halocarbons Chemical group 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- NDJGGFVLWCNXSH-UHFFFAOYSA-N hydroxy(trimethoxy)silane Chemical compound CO[Si](O)(OC)OC NDJGGFVLWCNXSH-UHFFFAOYSA-N 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 239000008239 natural water Substances 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- SOWBFZRMHSNYGE-UHFFFAOYSA-N oxamic acid Chemical compound NC(=O)C(O)=O SOWBFZRMHSNYGE-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/188—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-O linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/045—Polysiloxanes containing less than 25 silicon atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Silicon Polymers (AREA)
Abstract
Description
(A)一般式
必要に応じて(B)一般式
R4 t(R5O)4−tSi (III)
のシラン、および
(W)水
を反応させることにより、オキサミドエステル基を有するシロキサンを調製する方法を提供する。
[ここで、
R1は、独立に同一でも異なってもよく、一価の、置換されていてもよい、SiC結合した炭化水素基を表すが、当該炭化水素基はヘテロ原子によって中断されていてもよく、
R2は、独立に同一でも異なってもよく、水素原子、または一価の、置換されていてもよい炭化水素基を表すが、当該炭化水素基はヘテロ原子によって中断されていてもよく、
R3は、一価の、置換されていてもよい炭化水素基を表すが、当該炭化水素基は酸素原子によって中断されていてもよく、
Rxは、水素原子、または置換されていてもよい炭化水素基を表し、
Yは、二価の、置換されていてもよい炭化水素基を表すが、当該炭化水素基は酸素原子または窒素原子によって中断されていてもよく、
R4は、独立に同一でも異なってもよく、一価の、置換されていてもよい、SiC結合した炭化水素基を表すが、当該炭化水素基はヘテロ原子によって中断されていてもよく、
R5は、独立に同一でも異なってもよく、水素原子、または一価の、置換されていてもよい炭化水素基を表すが、当該炭化水素基はヘテロ原子によって中断されていてもよく、
sは、0、1または2であり、好ましくは1または2であり、
tは、0、1、2または3であり、好ましくは2または3である。]
R1 = -CH3; R2 = -CH3; R3 = -CH2CH3, Rx = -H; Y = -(CH2)3 -; s=2,
R1 = -CH3; R2 = -CH2CH3; R3 = -CH2CH3; Rx = -H; Y = -(CH2)3 -; s=2,
R1 = -CH3; R2 = -CH2CH3; R3 = -CH3; Rx = -H; Y = -(CH2)3 -; s=2,
R1 = -CH3; R2 = -CH3; R3 = -CH2CH3; Rx = -H; Y = -(CH2)3 -; s=1,
R1 = -CH3; R2 = -CH2CH3; R3 = -CH2CH3; Rx = -H; Y = -(CH2)3 -; s=1,
R1 = -CH3; R2 = -CH2CH3; R3 = -CH3; Rx = -H; Y = -(CH2)3 -; s=1,
R1 = -CH3; R3 = -CH2CH3; Rx = -H; Y = -(CH2)3 -; s=3,
R1 = -CH3; R3 = -CH3; Rx = -H; Y = -(CH2)3 -; s=3,
R1 = -CH3; R2 = -CH3; R3 = -CH2CH3; Rx = -H; Y = -(CH2)-; s=2,
R1 = -CH3; R2 = -CH2CH3; R3 = -CH2CH3; Rx = -H; Y = -(CH2)-; s=2,
R1 = -CH3; R2 = -CH2CH3; R3 = -CH3; Rx = -H; Y = -(CH2)-; s=2,
R1 = -C6H5; R2 = -CH3; R3 = -CH2CH3; Rx = -H; Y = -(CH2)-; s=2,
R1 = -C6H5; R2 = -CH2CH3; R3 = -CH2CH3; Rx = -H; Y = -(CH2)-; s=2, および
R1 = -C6H5; R2 = -CH2CH3; R3 = -CH3; Rx = -H; Y = -(CH2)-; s=2
である。
[R4 2Si−O]n (IV)
[ここでnは3〜5である。]の低分子量環状シロキサンは、従来技術で知られた温度および圧力での下流連続式またはバッチ式真空蒸留を用いて除去することができる。
XaRb(R6O)cSiO4-a-b-c/2 (I)
の単位を有するシロキサンを提供する。
[ここで、
Rは、同一でも異なってもよく、基R1として上記で定義したとおりであり、
R6は、同一でも異なってもよく、基R2として上記で定義したとおりであり、
Xは、基
aは、0または1であり、
bは、0、1、2または3であり、
cは、0、1、2または3であるが、
合計a+b+cは3未満または3に等しく、各々の分子は少なくとも一つの基Xを含むものとする。]
XaRb(R6O)cSiO4-a-b-c/2 (I)
の単位を有するシロキサンをさらに提供する。
[ここで、
Rは、同一でも異なってもよく、基R1として上記で定義したとおりであり、
R6は、同一でも異なってもよく、基R2として上記で定義したとおりであり、
Xは、基
aは、0または1であり、
bは、0、1、2または3であり、
cは、0、1、2または3であるが、
合計a+b+cは3未満または3に等しく、各々の分子は、aが1であり、合計b+cが0または1である式(I)の単位を少なくとも一つ含むものとする。]
Et-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]10-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]10-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]10-O-SiMe2-C3H6-NH-CO-CO-O-Me,
Et-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]4-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]4-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]4-O-SiMe2-C3H6-NH-CO-CO-O-Me,
Et-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]2-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]2-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]2-O-SiMe2-C3H6-NH-CO-CO-O-Me,
Et-O-CO-CO-NH-C3H6-SiMe2-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me-O-CO-CO-NH-C3H6-SiMe2-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me-O-CO-CO-NH-C3H6-SiMe2-O-SiMe2-C3H6-NH-CO-CO-O-Me,
Et-O-CO-CO-NH-C2H4-NH-C3H6-SiMe2-[OSiMe2]2-O-SiMe2-C3H6-NH-C2H4-NH -CO-CO-O-Et,
Et-O-CO-CO-NH-C2H4-NH-C3H6-SiMe2-[OSiMe2]4-O-SiMe2-C3H6-NH-C2H4-NH -CO-CO-O-Et,
Et-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Et]1-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Et-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Et]2-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Et-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Et]3-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Et]1-O-SiMe2-C3H6-NH-CO-CO-O-Me,
Me-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Et]2-O-SiMe2-C3H6-NH-CO-CO-O-Me,
Me-O-CO-CO-NH-C3H6-SiMe2-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Et]3-O-SiMe2-C3H6-NH-CO-CO-O-Me,
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Et]1-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Et]2-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Et]3-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-C2H4-NH-CO-CO-O-Et]1-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-C2H4-NH-CO-CO-O-Et]2-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-C2H4-NH-CO-CO-O-Et]3-O-SiMe2-C3H6-NH-CO-CO-O-Et,
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Et]1-O-SiMe3,
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Et]2-O-SiMe3,
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Et]3-O-SiMe3,
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-C2H4-NH-CO-CO-O-Et]1-O-SiMe3,
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-C2H4-NH-CO-CO-O-Et]2-O-SiMe3,
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-C2H4-NH-CO-CO-O-Et]3-O-SiMe3,
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Me]1-O-SiMe3,
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Me]2-O-SiMe3, および
Me3Si-[OSiMe2]10-[OSiMe-C3H6-NH-CO-CO-O-Me]3-O-SiMe3
であり、ここで、Meはメチル基を、Etはエチル基を表す。
Meは、メチル基を表す。
シラン1:ジメトキシジメチルシラン(120.22g/mol)
シラン2:
エチル 2−((3−(ジエトキシ(メチル)シリル)プロピル)アミノ)−2−オキソアセテート EtO-CO-CO-HN-CH2CH2CH2-Si-Me(EtO)2(291.42g/mol)
シラン3:
エチル 2−((3−(メトキシジメチルシリル)プロピル)アミノ)−2−オキソアセテート EtO-CO-CO-HN-CH2CH2CH2-Si-Me2(MeO)(247.36g/mol)
シラン4:
エチル 2−((3−(エトキシジメチルシリル)プロピル)アミノ)−2−オキソアセテート EtO-CO-CO-HN-CH2CH2CH2-Si-Me2(EtO)(261.39g/mol)
シラン5:トリメチルシラノール(90.20g/mol)
撹拌器、内部温度計および還流冷却器を備えた250mlの三つ口丸底フラスコ中の43.6g(176mmol)のシラン3に、22℃で、撹拌しながら、6.4g(353mmol)の水を加え、混合物を50℃に加熱した。5時間後、過剰の水および形成されたアルコールをロータリーエバポレーターにより圧力10hPaで除去し、37.3gのビスオキサミドエステルプロピル末端ジシロキサンを、透明な粘性液体(512mPas)として得た。
実施例1に記載した手順と類似の方法で、撹拌器、内部温度計および還流冷却器を備えた250mlの三つ口丸底フラスコ中、使用するシラン1〜5を、22℃で撹拌しながら、表1に示す量で連続的に互いに混合した。次いで適切な量の水を撹拌しながら30分かけて滴下し、得られた混合物を50℃に加熱した。5時間後、過剰の水および形成されたアルコールをロータリーエバポレーターにより圧力10hPaで除去し、表2に示す物性を有するシロキサンを得た。
Claims (9)
- (A)一般式
必要に応じて(B)一般式
R4 t(R5O)4−tSi (III)
のシラン、および
(W)水
を反応させることにより、オキサミドエステル基を有するシロキサンを調製する方法。
[ここで、
R1は、独立に同一でも異なってもよく、一価の、置換されていてもよい、SiC結合した炭化水素基を表すが、当該炭化水素基はヘテロ原子によって中断されていてもよく、
R2は、独立に同一でも異なってもよく、水素原子、または一価の、置換されていてもよい炭化水素基を表すが、当該炭化水素基はヘテロ原子によって中断されていてもよく、
R3は、一価の、置換されていてもよい炭化水素基を表すが、当該炭化水素基は酸素原子によって中断されていてもよく、
Rxは、水素原子、または置換されていてもよい炭化水素基を表し、
Yは、二価の、置換されていてもよい炭化水素基を表すが、当該炭化水素基は酸素原子または窒素原子によって中断されていてもよく、
R4は、独立に同一でも異なってもよく、一価の、置換されていてもよい、SiC結合した炭化水素基を表すが、当該炭化水素基はヘテロ原子によって中断されていてもよく、
R5は、独立に同一でも異なってもよく、水素原子、または一価の、置換されていてもよい炭化水素基を表すが、当該炭化水素基はヘテロ原子によって中断されていてもよく、
sは、0、1または2であり、
tは、0、1、2または3である。] - sが1または2である前記式(II)の(A)シランを使用することを特徴とする、請求項1に記載の方法。
- 前記式(III)の(B)シランを使用することを特徴とする、請求項1または2に記載の方法。
- 水(W)を、前記シラン(A)および必要に応じて使用される(B)における反応性の−OR2基および−OR5基(ここでR2およびR5は上記で定義したとおりである)の合計数に対して、0.4〜10倍モル過剰の量で使用することを特徴とする、請求項1〜3の一つ以上に記載の方法。
- R1がメチル基であり、Rxが水素原子であり、Yが−C3H6−であり、sが1または2であり、R2がメチルまたはエチル基であり、R3がエチル基である前記式(II)の(A)シランを、触媒(C)の非存在下、R4がメチル基であり、R5がメチルまたはエチル基であり、tが2または3である前記式(III)の(B)シランと反応させることを特徴とする、請求項1〜4の一つ以上に記載の方法。
- 2〜1000個のケイ素原子を有するシロキサンが得られることを特徴とする、請求項1〜5の一つ以上に記載の方法。
- 前記式(I)の単位のみからなることを特徴とする、請求項7に記載のシロキサン。
- 前記式(I)の単位の少なくとも50%において、合計a+b+cが2であることを特徴とする、請求項7または8に記載のシロキサン。
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