JP2020181695A - Organic electroluminescence display device and manufacturing method for the same, and evaporation mask set - Google Patents

Abstract

To provide an organic electroluminescence display device with excellent light transmission performance, a manufacturing method for the same, and an evaporation mask set used for manufacturing the organic electroluminescence display device.SOLUTION: An organic electroluminescence display device 10 includes: a substrate 11 including a first surface 11A and a second surface 11B opposite to the first surface; a plurality of first electrodes 13 positioned in matrix on the first surface 11A of the substrate 11 in a first direction and a second direction orthogonal to the first direction; a plurality of organic compound layers 14 positioned on the first electrodes 13; and a second electrode 15 positioned on the organic compound layers 14. The second electrode 15 includes a non-transparent electrode 151 positioned on each of the organic compound layers 14, and a transparent electrode 152 electrically connected to all of the non-transparent electrodes 151.SELECTED DRAWING: Figure 1

Description

The present disclosure relates to an organic electroluminescence display device, a method for manufacturing the same, and a vapor deposition mask set.

An organic EL display device using an organic electroluminescence (EL) element has high visibility due to self-luminous emission, is an all-solid-state display device unlike a liquid crystal display device, is not easily affected by temperature changes, has a large viewing angle, etc. In recent years, it has been put into practical use as a full-color display device because of its advantages. The organic EL element in the organic EL display device has a structure in which an organic compound layer is sandwiched between an anode (anode electrode) and a cathode (cathode electrode) provided on a substrate. When a voltage is applied to the organic EL element, holes are injected from the anode into the organic compound layer, and electrons are injected from the cathode into the organic compound layer. The energy generated by the bonding of holes and electrons injected into the organic compound layer excites the organic material constituting the organic compound layer, and the organic compound layer emits light when returning from the excited state to the ground state. As a method for extracting the light generated from the organic compound layer in this way, a bottom emission method and a top emission method are known.

Japanese Unexamined Patent Publication No. 2000-82582

In both the bottom emission method and the top emission method, in the conventional organic EL display device, a cathode (cathode electrode) made of a material having a low light transmittance such as Mg / Ag is provided on the entire surface. Therefore, there is a problem that the light transmittance in the thickness direction of the organic EL display device is low. Further, although a technique for increasing the light transmittance by forming the cathode (cathode electrode) in a striped shape is known (see, for example, Patent Document 1), if the light transmittance is increased too much, the cathode (cathode electrode) There is also a problem that the area of the cathode becomes relatively small and the electrical resistance of the cathode (cathode electrode) increases. Further, in the vapor deposition mask used for forming the cathode (cathode electrode) in a striped shape, the slit (opening) corresponding to the striped cathode (cathode electrode) is easily twisted, so that the alignment of the vapor deposition mask is difficult. There is also the problem of being.

In the top emission type organic EL display device, the anode electrode is made of a material having low light transmittance and high reflectance (for example, Ag, Al, etc.), and a translucent conductive film (for example, light transmittance is 40). It is also conceivable to improve the light transmittance by forming a cathode electrode as a common electrode with (a conductive film of about% to 70%) and providing the cathode electrode on the entire surface. Compared with the bottom emission type organic EL display device, it can have a high light transmittance in the thickness direction. However, even in such an organic EL display device, since the cathode electrode composed of the translucent conductive film is provided on the entire surface, the light transmittance in the thickness direction of the organic EL display device can be further improved. There is still the problem of difficulty.

In view of the above problems, one object of the present disclosure is to provide an organic electroluminescence display device having excellent light transmission performance, a method for manufacturing the same, and a vapor deposition mask set used for manufacturing the organic electroluminescence display device. To do.

A first aspect of the present disclosure is a substrate having a first surface and a second surface facing the first surface, and a first surface orthogonal to the first direction and the first direction on the first surface of the substrate. A plurality of first electrodes located in a matrix along two directions, a plurality of organic compound layers each located on the plurality of first electrodes, and a second electrode located on the plurality of organic compound layers are provided. The second electrode is an organic electroluminescence display device including a non-transparent electrode located on each of the organic compound layers and a transparent electrode electrically connected to all the non-transparent electrodes.

As a second aspect of the present disclosure, in the first aspect, the transparent electrode may integrally cover all the non-transparent electrodes.
As a third aspect of the present disclosure, in each of the first aspect and the second aspect, the plurality of organic compound layers are first organic compound layers including a first organic light emitting layer that emits a first emission color. And a second organic compound layer including a second organic light emitting layer that emits a second light emitting color different from the first light emitting color, and the non-existent second electrode located on the first organic compound layer. The thickness of the transparent electrode and the thickness of the non-transparent electrode of the second electrode located on the second organic compound layer may be different from each other.

As a fourth aspect of the present disclosure, in each of the first aspect and the second aspect, the plurality of organic compound layers are first organic compound layers including a first organic light emitting layer that emits a first emission color. And a second organic compound layer including a second organic light emitting layer that emits a second light emitting color different from the first light emitting color, and the non-existent second electrode located on the first organic compound layer. The conductive material constituting the transparent electrode and the conductive material constituting the non-transparent electrode of the second electrode located on the second organic compound layer may be different materials from each other.

As a fifth aspect of the present disclosure, in the fourth aspect, the thickness of the non-transparent electrode of the second electrode located on the first organic compound layer and the thickness of the non-transparent electrode located on the second organic compound layer. The thickness of the non-transparent electrode of the second electrode may be different from each other.

A sixth aspect of the present disclosure is a step of preparing a substrate having a first surface and a second surface facing the first surface, and a first direction and the first direction on the first surface of the substrate. A step of forming a plurality of first electrodes located in a matrix along a second direction orthogonal to the above, a step of forming an organic compound layer overlapping each of the plurality of first electrodes, and the plurality of organic compound layers. The step of forming the second electrode includes the step of forming a plurality of second electrodes overlapping on the top, and the step of forming the non-transparent electrode located on the plurality of organic compound layers and the step of forming all the non-transparent electrodes. A method for manufacturing an organic electroluminescence display device, which comprises a step of forming a transparent electrode electrically connected to the electrode.

As a seventh aspect of the present disclosure, in the sixth aspect, the transparent electrode may be formed so as to integrally cover all the non-transparent electrodes.
As an eighth aspect of the present disclosure, in each of the sixth aspect and the seventh aspect, the plurality of organic compound layers are the first organic compound layer including the first organic light emitting layer that emits the first emission color. The step of forming the non-transparent electrode is performed on the first organic compound layer, which includes at least a second organic compound layer including a second organic light emitting layer that emits a second emission color different from the first emission color. By depositing a conductive material with a first film thickness to form the non-transparent electrode, and by depositing a conductive material on the second organic compound layer with a second film thickness different from the first film thickness. The step of forming the non-transparent electrode may be included.

As a ninth aspect of the present disclosure, in each of the sixth aspect and the seventh aspect, the plurality of organic compound layers are a first organic compound layer including a first organic light emitting layer that emits a first emission color. The step of forming the non-transparent electrode is performed on the first organic compound layer, which includes at least a second organic compound layer including a second organic light emitting layer that emits a second emission color different from the first emission color. May include a step of depositing a first conductive material and a step of depositing a second conductive material different from the first conductive material on the second organic compound layer.

As a tenth aspect of the present disclosure, in the ninth aspect, in the step of forming the non-transparent electrode, the first conductive material is deposited on the first organic compound layer with a first film thickness, and the first conductive material is deposited. The second conductive material may be deposited on the organic compound layer with a second film thickness different from the first film thickness.

An eleventh aspect of the present disclosure is a substrate having a first surface and a second surface facing the first surface, and a first surface orthogonal to the first direction and the first direction on the first surface of the substrate. A plurality of first electrodes located in a matrix along two directions, a plurality of organic compound layers located on the plurality of first electrodes, and a second electrode located on the plurality of organic compound layers are provided. The plurality of organic compound layers include a first organic compound layer including a first organic light emitting layer that emits a first emission color, and a second organic light emitting layer that emits a second emission color different from the first emission color. A second organic compound layer containing the above and a third organic light emitting layer that emits a third light emitting color different from the first light emitting color and the second light emitting color, and the second electrode is the organic compound layer. A plurality of vapor deposition masks used to form the non-transparent electrode in an organic electroluminescence display device including a non-transparent electrode located above and a transparent electrode electrically connected to all the non-transparent electrodes. A set of vapor deposition masks including the first vapor deposition mask used for forming the non-transparent electrode on the first organic compound layer and the non-vapor deposition mask on the second organic compound layer. The first vapor deposition mask includes a second vapor deposition mask used for forming the transparent electrode and a third vapor deposition mask used for forming the non-transparent electrode on the third organic compound layer. A first metal base material having one surface and a second surface facing the first surface, a first through hole corresponding to the non-transparent electrode on the first organic compound layer, and the first metal base material. The second vapor deposition mask has a first alignment mark located on the first surface, and the second vapor deposition mask has a second metal base material having a first surface and a second surface facing the first surface, and the second organic substance. The third vapor deposition mask has a second through hole corresponding to the non-transparent electrode on the compound layer and a second alignment mark located on the first surface of the metal substrate, and the third vapor deposition mask is the first surface and the said. A third metal base material having a second surface facing the first surface, a third through hole corresponding to the non-transparent electrode on the third organic compound layer, and the first surface of the third metal base material. It is a vapor deposition mask set having a third alignment mark located at.

A twelfth aspect of the present disclosure is a substrate having a first surface and a second surface facing the first surface, and a first surface orthogonal to the first direction and the first direction on the first surface of the substrate. A plurality of first electrodes located in a matrix along two directions, a plurality of organic compound layers located on the plurality of first electrodes, and a second electrode located on the plurality of organic compound layers are provided. The plurality of organic compound layers include a first organic compound layer including a first organic light emitting layer that emits a first emission color, and a second organic light emitting layer that emits a second emission color different from the first emission color. A second organic compound layer containing the above and a third organic light emitting layer that emits a third light emitting color different from the first light emitting color and the second light emitting color, and the second electrode is the organic compound layer. A plurality of vapor deposition masks used to form the second electrode in an organic electroluminescence display device including a non-transparent electrode located above and a transparent electrode electrically connected to all the non-transparent electrodes. The plurality of vapor deposition masks include a first vapor deposition mask used for forming the non-transparent electrode on the first organic compound layer and the second organic compound layer, respectively, and the first vapor deposition mask. The first vapor deposition mask includes a second vapor deposition mask used for forming the non-transparent electrode on the organic compound layer, and the first vapor deposition mask has a first surface and a second surface facing the first surface. The metal substrate, the first through hole corresponding to the non-transparent electrode on the first organic compound layer, the second through hole corresponding to the non-transparent electrode on the second organic compound layer, and the first through hole. The second vapor deposition mask has a first alignment mark located on the first surface of the metal substrate, and the second vapor deposition mask includes a second metal substrate having a first surface and a second surface facing the first surface. A vapor deposition mask set having a third through hole corresponding to the non-transparent electrode on the third organic compound layer and a second alignment mark located on the first surface of the metal substrate.

The thirteenth aspect of the present disclosure is an organic electroluminescence display device manufactured by the method for manufacturing the organic electroluminescence display device of each of the sixth to tenth aspects.

According to the present disclosure, an organic electroluminescence display device having excellent light transmission performance, a method for manufacturing the same, and a vapor deposition mask set used for manufacturing the organic electroluminescence display device can be provided.

FIG. 1 is a cut end view showing a schematic configuration of an organic electroluminescence (EL) display device according to an embodiment of the present disclosure. FIG. 2A is a cut end view showing one step of a method for manufacturing an organic electroluminescence (EL) display device according to an embodiment of the present disclosure. FIG. 2B is a cut end view showing a step of a method for manufacturing an organic electroluminescence (EL) display device according to an embodiment of the present disclosure, which follows the step shown in FIG. 2A. FIG. 2C is a cut end view showing a step of a method for manufacturing an organic electroluminescence (EL) display device according to an embodiment of the present disclosure, which follows the step shown in FIG. 2B. FIG. 2D is a cut end view showing a step of a method for manufacturing an organic electroluminescence (EL) display device according to an embodiment of the present disclosure, which follows the step shown in FIG. 2C. FIG. 2E is a cut end view showing a step of a method for manufacturing an organic electroluminescence (EL) display device according to an embodiment of the present disclosure, which follows the step shown in FIG. 2D. FIG. 2F is a cut end view showing a step of a method for manufacturing an organic electroluminescence (EL) display device according to an embodiment of the present disclosure, which follows the step shown in FIG. 2E. FIG. 2G is a cut end view showing a step of a method for manufacturing an organic electroluminescence (EL) display device according to an embodiment of the present disclosure, which follows the step shown in FIG. 2F. FIG. 3A is a cut end view showing a modified example of a step of manufacturing an organic electroluminescence (EL) display device according to an embodiment of the present disclosure, which is a step of forming a non-transparent electrode. FIG. 3B is a cut end view showing a step of a method for manufacturing an organic electroluminescence (EL) display device according to an embodiment of the present disclosure, which follows the step shown in FIG. 3A. It is a partial perspective view which shows the schematic structure of the 1st vapor deposition mask of the 1st vapor deposition mask set in one Embodiment of this disclosure. It is a partial perspective view which shows the schematic structure of the 2nd thin film mask of the 1st thin film mask set in one Embodiment of this disclosure. It is a partial perspective view which shows the schematic structure of the 3rd vapor deposition mask of the 1st vapor deposition mask set in one Embodiment of this disclosure. It is a partial perspective view which shows the schematic structure of the 1st thin-film mask of the 2nd thin-film mask set in one Embodiment of this disclosure. It is a partial perspective view which shows the schematic structure of the 2nd thin film mask of the 2nd thin film mask set in one Embodiment of this disclosure.

In the present specification and the present drawings, unless otherwise specified, terms such as "board", "sheet", and "film" are not distinguished from each other based solely on the difference in designation. For example, "board" is a concept that includes members that can be called sheets or films. Further, the "plane (sheet surface, film surface)" is a plate-like member (sheet-like member) that is a target when the target plate-like (sheet-like, film-like) member is viewed as a whole and in a broad sense. , A film-like member) that coincides with the plane direction. Further, the normal direction used for a plate-shaped (sheet-shaped, film-shaped) member refers to a normal direction with respect to a surface (sheet surface, film surface) of the member. Furthermore, the terms used in this specification, such as "parallel" and "orthogonal", and the values of length and angle, which specify the shape and geometric conditions and their degrees, are bound by strict meanings. Instead, the interpretation will include the range in which similar functions can be expected.

Unless otherwise specified, the present specification and the present drawings specify shapes, geometric conditions, and their degrees, for example, terms such as "parallel" and "orthogonal", and length and angle values. Is to be interpreted including the range in which similar functions can be expected without being bound by the strict meaning.

In the present specification and the drawings, a configuration such as a member or region is "above (or below)", "above (or below)" another configuration such as another member or region. ) ”Or“ upward (or downward) ”, unless otherwise specified, not only when one configuration is in direct contact with another, but also with one configuration and another. It shall be interpreted including the case where another configuration is included between. Further, unless otherwise specified, the term “upper (or upper or upper) or lower (or lower or lower) may be used for explanation, but the vertical direction may be reversed.

In the present specification and the present drawings, unless otherwise specified, the same parts or parts having similar functions are designated by the same reference numerals or similar reference numerals, and the repeated description thereof may be omitted. In addition, the dimensional ratio of the drawing may differ from the actual ratio for convenience of explanation, or a part of the configuration may be omitted from the drawing.

Unless otherwise specified, this specification and the present drawings may be combined with other embodiments and modifications to the extent that there is no contradiction. Further, other embodiments and modifications thereof can be combined within a range that does not cause a contradiction. Further, the modified examples can be combined as long as there is no contradiction.

Unless otherwise specified in the present specification and the present drawings, when a plurality of steps are disclosed with respect to a method such as a manufacturing method, other steps not disclosed are carried out between the disclosed steps. You may. In addition, the order of the disclosed steps is arbitrary as long as there is no contradiction.

Unless otherwise specified in the present specification and the drawings, the numerical range represented by the symbol "~" includes the numerical values placed before and after the symbol "~". For example, the numerical range defined by the expression "34 to 38% by mass" is the same as the numerical range defined by the expression "34% by mass or more and 38% by mass or less".

Embodiments of the present disclosure will be described with reference to the drawings. The embodiments shown below are examples of the embodiments of the present disclosure, and the present disclosure is not construed as being limited to these embodiments.

FIG. 1 is a cut end view showing a schematic configuration of an organic electroluminescence (EL) display device according to the present embodiment.
As shown in FIG. 1, the organic EL display device 10 includes a substrate 11 having a thin film transistor element (TFT element, not shown), a first interlayer insulating film 12, a first electrode 13, an organic compound layer 14, a second electrode 15, and the like. It may be configured as a laminated body including the second interlayer insulating film 16 in this order. In the present embodiment, the organic EL display device 10 may be of the bottom emission type in which the light generated in the organic compound layer 14 is extracted from the substrate 11 side, or the light generated in the organic compound layer 14 is the second. It may be a top emission type taken out from the interlayer insulating film 16 side.

The substrate 11 is a transparent substrate having a first surface 11A and a second surface 11B facing the first surface 11A, and for example, a TFT element may be provided on the first surface 11A side. Examples of the substrate 11 include glass substrates such as alkaline glass, quartz glass, borosilicate glass, and non-alkali glass; sapphire substrates; resin substrates such as acrylic resin, polyester resin, polycarbonate resin, polyolefin resin, cycloolefin polymer, and polyimide. Can be used.

The size (size in plan view) and thickness of the substrate 11 can be appropriately set in consideration of the size of the organic EL display device 10 according to the present embodiment, the handleability of the substrate 11, and the like. It is not limited.

On the first surface 11A of the substrate 11, a plurality of TFT elements are located in a matrix along a first direction and a second direction orthogonal to the first direction, and a plurality of data lines extending in the first direction (not shown). ) And a plurality of gate lines (not shown) extending in the second direction may be located. The "matrix shape" means a state in which the members are arranged in parallel at a predetermined pitch in each of one direction and the direction orthogonal to the one direction. For example, "a plurality of TFT elements are located in a matrix along a first direction and a second direction orthogonal to the first direction" means that each TFT element has a predetermined pitch in each of the first direction and the second direction. The pitch of the TFT elements parallel to each other in the first direction and the pitch of the TFT elements parallel to each other in the second direction may be the same or different. Further, the "first direction" may be any one direction on an arbitrary plane parallel to the first surface 11A of the substrate 11, and the "second direction" is orthogonal to the first direction on the plane. Any direction is acceptable.

Each TFT element may be located at a point (intersection) where the data line and the gate line intersect in a plan view from the second interlayer insulating film 16 to the substrate 11. The TFT element may include, for example, a semiconductor layer located on the gate wire with an insulating film interposed therebetween, a data line located on the semiconductor layer, a source electrode and a drain electrode, and is known, for example, a polycrystalline silicon TFT or the like. There may be. The source electrode may be electrically connected to the first electrode 13 via a through-hole via (not shown). The TFT element can control the voltage selectively applied from the first electrode 13 and the second electrode 15 to the red organic compound layer 14R, the green organic compound layer 14G, and the blue organic compound layer 14B.

Either one of the first electrode 13 and the second electrode 15 may form an anode (anode electrode), and the other of the first electrode 13 and the second electrode 15 may form a cathode (cathode electrode). For example, the first electrode 13 may be an anode electrode and the second electrode 15 may be a cathode electrode. Of course, the first electrode 13 may be the cathode electrode and the second electrode 15 may be the anode electrode. The organic compound layer 14 sandwiched between the first electrode 13 and the second electrode 15 includes a hole injection layer, a hole transport layer, and an organic light emitting layer from the first electrode 13 side to the second electrode 15 side. It may be a laminate containing an electron transport layer and an electron injection layer in this order. When a driving voltage is applied from the first electrode 13 side, holes are injected into the organic light emitting layer from the first electrode 13, and electrons are injected into the organic light emitting layer from the second electrode 15. The energy generated by the bonding of holes and electrons injected into the organic light emitting layer excites the organic material constituting the organic light emitting layer, and the organic light emitting layer emits light when returning from the excited state to the ground state.

The first electrode 13 may be made of a transparent conductive material that is relatively easy to transmit light, or may be made of a non-transparent conductive material that is relatively difficult to transmit light. Examples of the transparent conductive material include ITO (Indium Tin Oxide), InZNO (Indium Zinc Oxide), AlZNO (Aluminum Zinc Oxide), and AlTO (Aluminum Tin Oxide). (Indium tin oxide) and the like. Examples of the non-transparent conductive material that is relatively difficult to transmit light include metal materials such as Mg, Ag, Mg / Ag (magnesium-silver alloy), Al, and Ca. In addition, "transparency" in this embodiment can be defined by the transmittance (%) of light, and of light having a wavelength corresponding to an application that is required to be transparent or is desirable to be transparent. It may be defined by the transmittance (%). For example, in order to provide the organic EL display device 10 with a proximity sensor including a light emitting element that emits near-infrared light and a light receiving element that receives the near-infrared light, it is required or desirable to be transparent. In some cases, "transparency" can be defined by the transmittance (%) of light having a wavelength of 700 nm to 1400 nm. Further, in order to provide the image pickup element in the organic EL display device 10, it is required to be transparent or it is desirable that it is transparent. “Transparency” depends on the transmittance (%) of light having a wavelength of 400 nm to 700 nm. Can be defined. Specifically, "transparent" means that the transmittance of light in the wavelength range corresponding to each application is 30% or more, and preferably the transmittance of light in the wavelength range corresponding to each application or the like. May be 80% or more. On the other hand, "non-transparent" means that the transmittance of light in the wavelength range corresponding to each application is less than 30%, and preferably the transmittance of light in the wavelength range corresponding to each application is high. It may be 5% or less. The transmittance of light in each wavelength range can be measured using, for example, a spectroscopic haze meter (product name: HSP-150VIR, manufactured by Murakami Color Technology Research Institute).

The first electrode 13 may be provided at a position corresponding to the organic compound layer 14. That is, a plurality of first electrodes 13 are provided on the first interlayer insulating film 12 in a matrix along each of the first direction and the second direction. Each first electrode 13 may be positioned so as to overlap each intersection of the data line and the gate line. The plan view shape of the first electrode 13 may be, for example, a circular shape, a substantially circular shape, an oval shape, a polygonal shape, a substantially rectangular shape, a striped shape, or the like. In addition, "omitted" is a concept including a manufacturing error at the time of forming the first electrode 13, and for example, in the case of a substantially circular shape, the range of the minor axis when the major axis is 1 is 0.80. , 0.83 and 0.86 may be defined by the value of the first group and the value of the second group including 0.89, 0.92 and 0.95. For example, the lower limit of the minor axis range may be set by any one of the values included in the first group described above. For example, the lower limit of the minor axis range may be 0.80 or more, 0.83 or more, or 0.86 or more. Further, the upper limit of the range of the minor axis may be determined by any one of the values included in the second group described above. For example, the upper limit of the minor axis range may be 0.89 or less, 0.92 or less, or 0.95 or less. The range of the minor axis may be determined by a combination of any one of the values included in the first group described above and any one of the values included in the second group described above, eg, It may be 0.80 or more and 0.95 or less, 0.83 or more and 0.92 or less, or 0.86 or more and 0.89 or less. Further, the range of the minor axis may be determined by any combination of any two of the values included in the first group described above, and may be, for example, 0.80 or more and 0.86 or less. It may be 83 or more and 0.86 or less. Further, the range of the minor axis may be determined by any combination of any two of the values included in the second group described above, and may be, for example, 0.89 or more and 0.95 or less. It may be 92 or more and 0.95 or less.

In a plan view from the second interlayer insulating film 16 to the substrate 11, the first electrode 13 may be surrounded by, for example, an insulating film 17 made of polyimide or the like. That is, the insulating film 17 may be positioned so as to overlap the outer peripheral edge of the first electrode 13 in the plan view.

The second electrode 15 is transparent so as to cover a plurality of non-transparent electrodes 151 located on each organic compound layer 14 and all the non-transparent electrodes 151 in a plan view on the first surface 11A side of the substrate 11. The electrode 152 may be included. The transparent electrode 152 may be positioned so as to cover the entire surface of the first surface 11A of the substrate 11. The non-transparent electrode 151 may be made of a non-transparent conductive material that is relatively difficult to transmit light. The transparent electrode 152 may be made of a transparent conductive material that is relatively easy to transmit light. The non-transparent electrode 151 may be located at least on the upper surface of the organic compound layer 14, but may also be located on the side surface of the organic compound layer 14.

Examples of the transparent conductive material constituting the transparent electrode 152 include ITO (Indium Tin Oxide), InZNO (Indium Zinc Oxide), AlZNO (Aluminum Zinc Oxide), and the like. Examples thereof include AlTO (Aluminum Tin Oxide). Examples of the non-transparent conductive material constituting the non-transparent electrode 151, which is relatively difficult to transmit light, include metal materials such as Mg, Ag, Mg / Ag (magnesium-silver alloy), Al, and Ca. It is considered that these metal materials have a relatively low work function and can efficiently inject electrons into the electron injecting layer of the organic compound layer 14.

In the present embodiment, the plurality of organic compound layers 14 may include, for example, a red organic compound layer 14R, a blue organic compound layer 14B, and a green organic compound layer 14G. The constituent material of the non-transparent electrode 151 located on the red organic compound layer 14R, the constituent material of the non-transparent electrode 151 located on the blue organic compound layer 14B, and the non-transparent electrode 151 located on the green organic compound layer 14G. The constituent materials may be the same as each other or may be different from each other. Further, the thickness of the non-transparent electrode 151 located on the red organic compound layer 14R, the thickness of the non-transparent electrode 151 located on the blue organic compound layer 14B, and the thickness of the non-transparent electrode 151 located on the green organic compound layer 14G. The thicknesses may also be the same or different from each other.

In an organic EL display device having a red organic compound layer, a blue organic compound layer, and a green organic compound layer, the optimum material constituting the cathode electrode and the optimum film thickness of the cathode electrode exist for each emission color of the organic compound layer. It is known to do. Therefore, by locating the cathode electrodes having the optimum constituent materials and film thickness for each emission color of the organic compound layer, the luminous efficiency in each organic compound layer can be improved and the brightness can be increased. However, in general, since the cathode electrode functions as a common electrode in the organic EL display device, it is often formed of the same material and the same film thickness in the organic compound layers of all emission colors. In the present embodiment, the transparent electrode 152 is provided, which is composed of a different material for each emission color of the organic compound layer 14, has non-transparent electrodes 151 having different thicknesses, and covers all the non-transparent electrodes 151. Therefore, the luminous efficiency in each of the organic compound layers 14R, 14B, and 14G can be improved, and the brightness can be increased.

In the present embodiment, the non-transparent electrode 151 of the second electrode 15 that does not easily transmit light is located on each organic compound layer 14, and a plurality of non-transparent electrodes 151 are covered with the transparent electrodes 152. Therefore, in a plan view from the second interlayer insulating film 16 to the substrate 11, light traveling in the thickness direction of the organic EL display device 10 substantially in the rectangular region defined by the data line and the gate line. It can be a translucent region that is easily transmitted. Due to the presence of this translucent region, the organic EL display device 10 according to the present embodiment has higher transmission performance than the conventional organic EL display device in which the second electrode composed of the non-transparent electrode is provided on the entire surface of the substrate. be able to. The plan view shape of the non-transparent electrode 151 may be, for example, a circular shape, a substantially circular shape, an oval shape, a polygonal shape, a substantially rectangular shape, or the like.

By increasing the area (total area) of the light-transmitting region as much as possible, the transmission performance of the organic EL display device 10 can be further improved. In order to increase the area (total area) of the translucent region, the area (total area) of the non-transparent electrode 151 may be reduced, but in the present embodiment, the non-transparent electrode 151 is the upper surface of the organic compound layer 14. Since they are electrically connected by the transparent electrode 152, the smaller the area (total area) of the non-transparent electrode 151, the greater the electrical resistance of the second electrode 15 as a whole. The area (total area) of the non-transparent electrode 151 can be made as small as possible without doing so. Therefore, in the organic EL display device 10 according to the present embodiment, it is possible to achieve the effect that it is possible to suppress an increase in power consumption while improving the transmission performance.

The organic compound layer 14 arranged between the first electrode 13 and the second electrode 15 (non-transparent electrode 151) is a red organic compound layer 14R and a green organic compound, each of which constitutes a unit pixel of the organic EL display device 10. The layer 14G and the blue organic compound layer 14B may be contained, or a white organic compound layer may be contained. The red organic compound layer 14R, the green organic compound layer 14G, and the blue organic compound layer 14B emit red light, green light, and blue light, respectively. The white organic compound layer emits white light. When the organic compound layer 14 includes the white organic compound layer, a color filter may be provided as long as the organic EL display device 10 displays an image or the like in color. Even when the organic compound layer 14 includes the red organic compound layer 14R, the green organic compound layer 14G, and the blue organic compound layer 14B, a color filter having a coloring layer corresponding to each organic compound layer 14R, 14G, 14B is provided. It may be. The materials constituting the red organic compound layer 14R, the green organic compound layer 14G, and the blue organic compound layer 14B are particularly those containing a fluorescent organic compound that emits light in a desired color when a predetermined voltage is applied. It is not limited. Examples of the fluorescent organic compound include quinolinol complex, oxazole complex, various laser dyes, polyparaphenylene vinylene and the like. Since the organic compound layer 14 is provided on the first electrode 13 arranged in a matrix on the first interlayer insulating film 12, the organic compound layer 14 is also provided in a mattrix shape.

As the material constituting the first interlayer insulating film 12 and the second interlayer insulating film 16, for example, a material having an insulating property can be used. Examples of the material constituting the first interlayer insulating film 12 and the second interlayer insulating film 16 include an inorganic material such as silicon oxide and a resin material (organic material) such as an acrylic resin.

An insulating film having a thickness of about 0.2 nm to 3.0 nm may be provided between the second electrode 15 and the organic compound layer 14 (electron injection layer). It is presumed that the provision of this insulating film facilitates the injection of electrons from the second electrode 15 (non-transparent electrode 151) into the organic compound layer 14 (electron injection layer) due to the tunnel effect. Examples of the material constituting the insulating film include lithium fluoride (LiF), alumina (Al ₂ O ₃ ), polymethyl methacrylate (PMMA) and the like. When the insulating film is provided between the second electrode 15 (non-transparent electrode 151) and the organic compound layer 14, the organic compound layer 14 is formed from the first electrode 13 side to the second electrode 15 (non-transparent electrode 15). A laminate may include a hole injection layer, a hole transport layer, an organic light emitting layer, and an electron transport layer in this order toward the transparent electrode 151) side. In this case, it is considered that the insulating film can function as an electron injection layer.

In the organic EL display device 10 having the above-described configuration, the thickness direction of the organic EL display device 10 (for example, in the case of the organic EL display device 10 shown in FIG. 1, the direction from the substrate 11 toward the second interlayer insulating film 16). It is possible to prevent light traveling in the (or the opposite direction) direction (for example, external light) from being blocked by the non-transparent electrode 151 made of a non-transparent conductive material that is relatively difficult to transmit light, and is transparent. Since the light is transmitted through the light region, the light transmittance in the thickness direction of the organic EL display device 10 can be improved. Therefore, according to the present disclosure, it is possible to provide an organic EL display device 10 having excellent transmission performance.

An example of a manufacturing method of the organic EL display device 10 having the above-described configuration will be described. In the following, a method of manufacturing the organic EL display device 10 having the configuration shown in FIG. 1 will be described as an example.

A substrate 11 having a first surface 11A and a second surface 11B facing the first surface 11A and having a TFT element, a data line and a gate line, and a first interlayer insulating film 12 on the first surface 11A is prepared. The first electrode 13 is formed at a predetermined position on the first interlayer insulating film 12 (see FIG. 2A). For example, a thin-film deposition mask having through holes corresponding to the first electrode 13 is prepared, and a material constituting the first electrode 13 (for example, a transparent conductive material such as ITO or InZNO) is first passed through the vapor deposition mask. The first electrode 13 may be formed so as to overlap the intersection of the data line and the gate line by vacuum-depositing on the interlayer insulating film 12. Further, a material (for example, a transparent conductive material such as ITO or InZNO) constituting the first electrode 13 is formed on the first interlayer insulating film 12, and the first interlayer insulating film 12 is subjected to a photolithography method. The first electrode 13 may be formed. A through hole via may be formed in the first interlayer insulating film 12 at a predetermined position on the first interlayer insulating film 12 (a position where the first electrode 13 is formed), and the first interlayer insulating film 12 may have a through hole via at the predetermined position. By forming the one electrode 13, the first electrode 13 and the source electrode of the TFT element can be electrically connected via the through-hole via.

Next, an insulating film (for example, polyimide) covering the first electrode 13 and the first interlayer insulating film 12 is formed by a conventionally known coating method (for example, a die coating method, a spin coating method, etc.), and the insulating film is patterned. As a result, an insulating film 17 surrounding the outer peripheral edge of the first electrode 13 is formed (see FIG. 2B).

Subsequently, the organic compound layer 14 is formed on the exposed first electrode 13 (see FIG. 2C). For example, a vapor deposition mask having through holes corresponding to the organic compound layer 14 is prepared, and a fluorescent organic compound such as a material constituting the organic compound layer 14 (for example, a quinolinol complex, an oxazole complex, various laser dyes, or polyparaphenylene vinylene) is prepared. Etc.) may be vacuum-deposited on the first electrode 13 via a vapor deposition mask to form the organic compound layer 14. If desired, an insulating film having a thickness of about 0.2 nm to 3.0 nm (for example, lithium fluoride (LiF) or the like) may be formed on the organic compound layer 14.

Next, the non-transparent electrode 151 is formed on each organic compound layer 14 (see FIGS. 2D to 2F and FIGS. 3A to 3B). The non-transparent electrode 151 may be formed by using a first vapor deposition mask set including a first vapor deposition mask 21, a second vapor deposition mask 22, and a third vapor deposition mask 23, or a first vapor deposition mask 31 and a second vapor deposition mask. It may be formed using a second vapor deposition mask set containing 32.

The first vapor deposition mask set forms the first vapor deposition mask 21 (see FIG. 4A) used for forming the non-transparent electrode 151 on the red organic compound layer 14R and the non-transparent electrode 151 on the blue organic compound layer 14B. It includes a second thin-film mask 22 (see FIG. 4B) used to form the non-transparent electrode 151 on the green organic compound layer 14G and a third thin-film mask 23 (see FIG. 4C) used to form the non-transparent electrode 151. May be good.

The first vapor deposition mask 21 includes a metal base material 201 having a first surface 201A and a second surface 201B facing the first surface 201A, a plurality of first through holes 211 formed in the metal base material 201, and a plurality of first through holes 211. It has an alignment mark 202 formed on the first surface 201A (see FIG. 4A). The second thin-film mask 22 includes a metal base material 201 having a first surface 201A and a second surface 201B facing the first surface 201A, and a plurality of second through holes 221 formed in the metal base material 201. It has an alignment mark 202 formed on the first surface 201A (see FIG. 4B). The third vapor deposition mask 23 includes a metal base material 201 having a first surface 201A and a second surface 201B facing the first surface 201A, and a plurality of third through holes 231 formed in the metal base material 201. It has an alignment mark 202 formed on the first surface 201A (see FIG. 4C).

The thickness range of the metal substrate 201 in the first vapor deposition mask 21, the second vapor deposition mask 22, and the third vapor deposition mask 23 is the value of the first group including 5 μm, 8 μm, 12 μm, and 15 μm, and 26 μm, 35 μm, and 50 μm. And the value of the second group including 100 μm. For example, the lower limit of the thickness range of the metal substrate 201 may be determined by any one of the values included in the first group described above. For example, the lower limit of the thickness range of the metal base material 201 may be 5 μm or more, 8 μm or more, 12 μm or more, or 15 μm or more. Further, the upper limit of the thickness range of the metal base material 201 may be determined by any one of the values included in the second group described above. For example, the upper limit of the thickness range of the metal base material 201 may be 26 μm or less, 35 μm or less, 50 μm or less, or 100 μm or less. The thickness range of the metal substrate 201 is determined by the combination of any one of the values included in the first group described above and any one of the values included in the second group described above. For example, it may be 5 μm or more and 100 μm or less, 8 μm or more and 50 μm or less, 12 μm or more and 35 μm or less, or 15 μm or more and 26 μm or less. Further, the range of the thickness of the metal base material 201 may be determined by any combination of any two of the values included in the first group described above, and may be, for example, 5 μm or more and 15 μm or less, 5 μm. It may be 12 μm or less, 8 μm or more and 15 μm or less, or 8 μm or more and 12 μm or less. Further, the range of the thickness of the metal base material 201 may be determined by any combination of any two of the values included in the second group described above, and may be, for example, 26 μm or more and 100 μm or less, or 26 μm. It may be 50 μm or more, 35 μm or more and 100 μm or less, or 35 μm or more and 50 μm or less.

When the non-transparent electrodes 151 on all the organic compound layers 14 are to be formed simultaneously by vacuum vapor deposition, a vapor deposition mask having through holes corresponding to all the non-transparent electrodes 151 (hereinafter, may be referred to as "conventional thin-film deposition mask"). .) Will be used. On the other hand, in the present embodiment, the vapor deposition mask for forming the non-transparent electrode 151 can be changed for each emission color. Compared with the conventional thin-film deposition mask, all of the first vapor deposition mask 21, the second vapor deposition mask 22, and the third vapor deposition mask 23 in the present embodiment have an opening area (total opening area of all through holes) in the vapor deposition mask. small. Therefore, if the thickness of the metal base material of the conventional thin-film deposition mask and the thickness of each metal base material 201 of the first to third vapor deposition masks 21 to 23 in the present embodiment are the same, the strength of the conventional thin-film deposition mask It can be said that the strength of the first to third vapor deposition masks 21 to 23 in the present embodiment is higher than that of the above. In other words, when the strength of the first to third vapor deposition masks 21 to 23 in the present embodiment is equal to the strength of the conventional thin film deposition mask, the metal groups of the first to third vapor deposition masks 21 to 23 in the present embodiment. The thickness of the material 201 can be made thinner than the thickness of the metal base material of the conventional thin-film deposition mask. As a result, in the present embodiment, it is possible to prevent the first vapor deposition mask 21, the second vapor deposition mask 22, and the third vapor deposition mask 23 from being deformed, and the organic compound layer 14 is not formed with high accuracy. The transparent electrode 151 can be formed.

The first through hole 211 in the first vapor deposition mask 21 may be formed corresponding to the red organic compound layer 14R on the first surface 11A of the substrate 11. Since the alignment mark 202 is provided on the metal base material 201 of the first vapor deposition mask 21 in the present embodiment, the alignment mark 202 can be aligned with the alignment mark (not shown) provided on the substrate 11. The conductive material constituting the non-transparent electrode 151 can be deposited on the red organic compound layer 14R through the through holes 211 with high accuracy. That is, the alignment mark 202 of the first vapor deposition mask 21 is positioned so that the non-transparent electrode 151 can be formed on the red organic compound layer 14R through the first through hole 211 when aligned with the alignment mark of the substrate 11. , Is provided on the metal base material 201. Similarly, the second through hole 221 in the second vapor deposition mask 22 may be formed corresponding to the blue organic compound layer 14B on the first surface 11A of the substrate 11, and the third through hole 221 in the third vapor deposition mask 23 may be formed. The holes 231 may be formed corresponding to the green organic compound layer 14G on the first surface 11A of the substrate 11. Since the alignment mark 202 is also provided on the metal base material 201 of the second thin-film mask 22 and the third thin-film mask 23, the alignment mark 202 is aligned with the alignment mark (not shown) provided on the substrate 11. By doing so, the conductive material constituting the non-transparent electrode 151 can be highly accurately formed on the blue organic compound layer 14B and the green organic compound layer 14G via the second through hole 221 and the third through hole 231 respectively. It can be vapor-deposited.

The second vapor deposition mask set consists of the first vapor deposition mask 31 (see FIG. 5A) used for forming the non-transparent electrode 151 on the red organic compound layer 14R and the blue organic compound layer 14B, and the green organic compound layer 14G. A second vapor deposition mask 32 (see FIG. 5B) used to form the non-transparent electrode 151 may be included. In the present embodiment, the first vapor deposition mask 31 emits light of two of the three emission colors of the organic compound layer 14 (red organic compound layer 14R, blue organic compound layer 14B, and green organic compound layer 14G). Anything used to form the non-transparent electrode 151 on the colored organic compound layer 14 may be used, and is limited to those forming the non-transparent electrode 151 on the red organic compound layer 14R and the blue organic compound layer 14B. It's not a thing. For example, the first vapor deposition mask 31 may be used to form the non-transparent electrode 151 on the red organic compound layer 14R and the green organic compound layer 14G, or the blue organic compound layer 14B and the green organic compound 31. It may be used to form the non-transparent electrode 151 on the layer 14G.

The first vapor deposition mask 31 includes a metal base material 201 having a first surface 201A and a second surface 201B facing the first surface 201A, and a plurality of first through holes 311 and a plurality of first through holes formed in the metal base material 201. It has a second through hole 321 and an alignment mark 202 formed on the first surface 201A (see FIG. 5A). The second vapor deposition mask 32 includes a metal base material 201 having a first surface 201A and a second surface 201B facing the first surface 201A, and a plurality of third through holes 331 formed in the metal base material 201. It has an alignment mark 202 formed on the first surface 201A (see FIG. 5B).

The thickness range of the metal substrate 201 in the first vapor deposition mask 31 and the second vapor deposition mask 32 is the value of the first group including 5 μm, 8 μm, 12 μm and 15 μm, and the second including 26 μm, 35 μm, 50 μm and 100 μm. It may be determined by the value of the group. For example, the lower limit of the thickness range of the metal substrate 201 may be determined by any one of the values included in the first group described above. For example, the lower limit of the thickness range of the metal base material 201 may be 5 μm or more, 8 μm or more, 12 μm or more, or 15 μm or more. Further, the upper limit of the thickness range of the metal base material 201 may be determined by any one of the values included in the second group described above. For example, the upper limit of the thickness range of the metal base material 201 may be 26 μm or less, 35 μm or less, 50 μm or less, or 100 μm or less. The thickness range of the metal substrate 201 is determined by the combination of any one of the values included in the first group described above and any one of the values included in the second group described above. For example, it may be 5 μm or more and 100 μm or less, 8 μm or more and 50 μm or less, 12 μm or more and 35 μm or less, or 15 μm or more and 26 μm or less. Further, the range of the thickness of the metal base material 201 may be determined by any combination of any two of the values included in the first group described above, and may be, for example, 5 μm or more and 15 μm or less, 5 μm. It may be 12 μm or less, 8 μm or more and 15 μm or less, or 8 μm or more and 12 μm or less. Further, the range of the thickness of the metal base material 201 may be determined by any combination of any two of the values included in the second group described above, and may be, for example, 26 μm or more and 100 μm or less, or 26 μm. It may be 50 μm or more, 35 μm or more and 100 μm or less, or 35 μm or more and 50 μm or less. In the second thin-film mask set as well, for the same reason as in the first thin-film mask set, it is possible to prevent the first-film mask 31 and the second-film mask 32 from being deformed, and on each organic compound layer 14. The non-transparent electrode 151 can be formed with high accuracy. Since the second vapor deposition mask 32 has an opening area smaller than that of the first vapor deposition mask 31, the thickness of the metal base material 201 can be made thinner than that of the first vapor deposition mask 31.

The first through hole 311 in the first vapor deposition mask 31 may be formed corresponding to the red organic compound layer 14R on the first surface 11A of the substrate 11. Further, the second through hole 321 in the first vapor deposition mask 31 may be formed corresponding to the blue organic compound layer 14B on the first surface 11A of the substrate 11. Since the alignment mark 202 is provided on the metal base material 201 of the first vapor deposition mask 31 in the present embodiment, the alignment mark 202 is aligned with the alignment mark (not shown) provided on the substrate 11. The conductive material constituting the non-transparent electrode 151 can be deposited on the red organic compound layer 14R through the first through hole 311 with high accuracy, and the non-transparent material is deposited on the blue organic compound layer 14B through the second through hole 321. The conductive material constituting the electrode 151 can be vapor-deposited with high accuracy. Similarly, the third through hole 331 in the second vapor deposition mask 32 may be formed corresponding to the green organic compound layer 14G on the first surface 11A of the substrate 11. Since the alignment mark 202 is also provided on the metal base material 201 of the second thin-film mask 32, the alignment mark 202 is aligned with the alignment mark (not shown) provided on the substrate 11 to obtain a third alignment mark 202. The conductive material constituting the non-transparent electrode 151 can be deposited with high accuracy on each of the green organic compound layers 14G via the through holes 331.

A transparent electrode 152 is formed on the entire surface of the first surface 11A of the substrate 11 so as to cover all of the non-transparent electrodes 151 formed as described above to form the second electrode 15, and the second electrode 15 is formed on the second electrode 15. A two-layer insulating film 16 is formed (see FIG. 2G). As a result, all of the plurality of non-transparent electrodes 151 can be electrically connected via the transparent electrode 152. As a result, the organic EL display device 10 according to the present embodiment can be manufactured. According to the organic EL display device 10 manufactured in this way, the light transmittance in the thickness direction of the organic EL display device 10 can be improved.

The embodiments described above are described for facilitating the understanding of the present disclosure, and are not described for limiting the present disclosure. Therefore, each element disclosed in the above embodiment is intended to include all design changes and equivalents belonging to the technical scope of the present disclosure.

In the above embodiment, the first vapor deposition mask set (first vapor deposition mask 21, second vapor deposition mask 22 and third vapor deposition mask 23) or the second vapor deposition mask set (first vapor deposition mask 31 and second vapor deposition mask 32) is used. The method of forming the non-transparent electrode 151 on each organic compound layer 14 has been described as an example, but the present invention is not limited to this embodiment. For example, if the pitches of the organic compound layers 14 parallel in one direction are the same in all of the red organic compound layer 14R, the blue organic compound layer 14B, and the green organic compound layer 14G, the first vapor deposition mask set is included. The non-transparent electrode 151 may be formed on all the organic compound layers 14 by using any one of the 1 vapor deposition mask 21, the 2nd vapor deposition mask 22, and the 3rd vapor deposition mask 23. Further, the non-transparent electrode 151 may be formed on all the organic compound layers 14 by using the second thin-film mask 32 included in the second thin-film mask set. In this case, for example, after forming the non-transparent electrode 151 on the red organic compound layer 14R using the first thin-film deposition mask 21, the first vapor deposition mask 21 is moved to move the non-transparent electrode on the blue organic compound layer 14B. 151 may be formed, and the first vapor deposition mask 21 may be further moved to form the non-transparent electrode 151 on the green organic compound layer 14G.

Claims (12)

A substrate having a first surface and a second surface facing the first surface,
On the first surface of the substrate, a plurality of first electrodes located in a matrix along a first direction and a second direction orthogonal to the first direction,
A plurality of organic compound layers each located on the plurality of first electrodes,
A second electrode located on the plurality of organic compound layers is provided.
The second electrode is an organic electroluminescence display device including a non-transparent electrode located on each of the organic compound layers and a transparent electrode electrically connected to all the non-transparent electrodes. The organic electroluminescence display device according to claim 1, wherein the transparent electrode integrally covers all the non-transparent electrodes. The plurality of organic compound layers include a first organic compound layer including a first organic light emitting layer that emits a first light emitting color, and a second organic light emitting layer that emits a second light emitting color different from the first light emitting color. Containing at least a second organic compound layer
The thickness of the non-transparent electrode of the second electrode located on the first organic compound layer and the thickness of the non-transparent electrode of the second electrode located on the second organic compound layer are different from each other. Item 3. The organic electroluminescence display device according to Item 1 or 2. The plurality of organic compound layers include a first organic compound layer including a first organic light emitting layer that emits a first light emitting color, and a second organic light emitting layer that emits a second light emitting color different from the first light emitting color. Containing at least a second organic compound layer
The conductive material constituting the non-transparent electrode of the second electrode located on the first organic compound layer and the conductive material constituting the non-transparent electrode of the second electrode located on the second organic compound layer. The organic electroluminescence display device according to claim 1 or 2, which is a material different from each other. The thickness of the non-transparent electrode of the second electrode located on the first organic compound layer and the thickness of the non-transparent electrode of the second electrode located on the second organic compound layer are different from each other. Item 4. The organic electroluminescence display device according to Item 4. A step of preparing a substrate having a first surface and a second surface facing the first surface, and
A step of forming a plurality of first electrodes located in a matrix along a first direction and a second direction orthogonal to the first direction on the first surface of the substrate.
A step of forming an organic compound layer overlapping each of the plurality of first electrodes,
Including a step of forming a plurality of second electrodes overlapping on the plurality of organic compound layers.
The step of forming the second electrode includes a step of forming a non-transparent electrode located on the plurality of organic compound layers and a step of forming a transparent electrode electrically connected to all the non-transparent electrodes. A method for manufacturing an organic electroluminescence display device. The method for manufacturing an organic electroluminescence display device according to claim 6, wherein the transparent electrode is formed so as to integrally cover all the non-transparent electrodes. The plurality of organic compound layers include a first organic compound layer including a first organic light emitting layer that emits a first light emitting color, and a second organic light emitting layer that emits a second light emitting color different from the first light emitting color. Containing at least a second organic compound layer
The steps of forming the non-transparent electrode include a step of forming the non-transparent electrode by depositing a conductive material with a first film thickness on the first organic compound layer and the first step of forming the non-transparent electrode on the second organic compound layer. The method for manufacturing an organic electroluminescence display device according to claim 6 or 7, further comprising a step of forming the non-transparent electrode by depositing a conductive material with a second film thickness different from the first film thickness. The plurality of organic compound layers include a first organic compound layer including a first organic light emitting layer that emits a first light emitting color, and a second organic light emitting layer that emits a second light emitting color different from the first light emitting color. Containing at least a second organic compound layer
The steps of forming the non-transparent electrode include a step of depositing a first conductive material on the first organic compound layer and a step of depositing a second conductive material different from the first conductive material on the second organic compound layer. The method for manufacturing an organic electroluminescence display device according to claim 6 or 7, which includes a step. In the step of forming the non-transparent electrode, the first conductive material is deposited on the first organic compound layer with a first film thickness, and a second film different from the first film thickness is deposited on the second organic compound layer. The method for manufacturing an organic electroluminescence display device according to claim 9, wherein the second conductive material is vapor-deposited with a thickness. A substrate having a first surface and a second surface facing the first surface, and a matrix position on the first surface of the substrate along a first direction and a second direction orthogonal to the first direction. The plurality of organic compound layers are provided with a plurality of first electrodes, a plurality of organic compound layers each located on the plurality of first electrodes, and a second electrode located on the plurality of organic compound layers. , A first organic compound layer including a first organic light emitting layer that emits a first emission color, and a second organic compound layer including a second organic light emitting layer that emits a second emission color different from the first emission color. It has a first emission color and a third organic light emitting layer that emits a third emission color different from the second emission color, and the second electrode includes a non-transparent electrode located on each of the organic compound layers. A set of vapor deposition masks including a plurality of vapor deposition masks used to form the non-transparent electrodes in an organic electroluminescence display device including all the non-transparent electrodes and a transparent electrode electrically connected.
The plurality of thin-film deposition masks are used for forming the non-transparent electrode on the first organic compound layer and the first vapor deposition mask used for forming the non-transparent electrode on the first organic compound layer. The second vapor deposition mask to be used and the third vapor deposition mask used to form the non-transparent electrode on the third organic compound layer are included.
The first vapor deposition mask includes a first metal base material having a first surface and a second surface facing the first surface, and a first through hole corresponding to the non-transparent electrode on the first organic compound layer. , With a first alignment mark located on the first surface of the first metal substrate.
The second vapor deposition mask includes a second metal base material having a first surface and a second surface facing the first surface, and a second through hole corresponding to the non-transparent electrode on the second organic compound layer. With a second alignment mark located on the first surface of the metal substrate,
The third vapor deposition mask includes a third metal base material having a first surface and a second surface facing the first surface, and a third through hole corresponding to the non-transparent electrode on the third organic compound layer. , A thin-film deposition mask set having a third alignment mark located on the first surface of the third metal substrate. A substrate having a first surface and a second surface facing the first surface, and a matrix position on the first surface of the substrate along a first direction and a second direction orthogonal to the first direction. The plurality of organic compound layers are provided with a plurality of first electrodes, a plurality of organic compound layers each located on the plurality of first electrodes, and a second electrode located on the plurality of organic compound layers. , A first organic compound layer including a first organic light emitting layer that emits a first emission color, and a second organic compound layer including a second organic light emitting layer that emits a second emission color different from the first emission color. It has a first emission color and a third organic light emitting layer that emits a third emission color different from the second emission color, and the second electrode includes a non-transparent electrode located on each of the organic compound layers. A set of vapor deposition masks including a plurality of vapor deposition masks used to form the second electrode in an organic electroluminescence display device including all the non-transparent electrodes and a transparent electrode electrically connected.
The plurality of thin-film deposition masks are a first vapor deposition mask used for forming the non-transparent electrode on the first organic compound layer and the second organic compound layer, respectively, and the non-deposited mask on the third organic compound layer. Including a second vapor deposition mask used to form a transparent electrode
The first vapor deposition mask includes a first metal base material having a first surface and a second surface facing the first surface, and a first through hole corresponding to the non-transparent electrode on the first organic compound layer. It has a second through hole corresponding to the non-transparent electrode on the second organic compound layer, and a first alignment mark located on the first surface of the first metal base material.
The second vapor deposition mask includes a second metal base material having a first surface and a second surface facing the first surface, and a third through hole corresponding to the non-transparent electrode on the third organic compound layer. , A thin-film deposition mask set having a second alignment mark located on the first surface of the metal substrate.

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