JP2020176316A - Sputtering device - Google Patents

Abstract

To provide a sputtering device that can deposit a film with a uniform thickness.SOLUTION: A sputtering device 1 includes: a film deposition roll 27; and multiple film deposition chambers 51, 61, 65, 71, 75. In the sputtering device 1, the multiple film deposition chambers respectively include: a target unit 55; and wall parts 52, 62, 66, 72, 76 for partitioning the film deposition chambers. The wall parts are provided with an exhaust port 15. The target unit 55 is disposed on a first virtual line L1 passing through a film deposition roll center C1 and an exhaust port center C2 in a first cross-sectional view.SELECTED DRAWING: Figure 1

Description

The present invention relates to a sputtering apparatus.

Conventionally, a roll-to-roll sputtering apparatus has been known as an apparatus for continuously producing a film with a thin film by forming a uniform thin film on a long film. Further, there is also known a sputtering apparatus in which a plurality of sputtering targets are provided in the conveying direction to perform a plurality of times of sputtering in order to form a plurality of thin films or to thicken the thin film (see Patent Document 1).

In the sputtering apparatus of Patent Document 1, one film forming roll is arranged inside one large film forming chamber (deposition chamber), and three targets and cathodes are arranged in the circumferential direction thereof. .. In addition, each target and cathode are housed in a small film forming chamber partitioned by a partition wall. Further, in order to evacuate each small film forming chamber, one vacuum pump is provided on the wall of a portion other than the small film forming chamber in the large film forming chamber.

In the sputtering apparatus of Patent Document 1, the target can be efficiently arranged in the circumferential direction of the film forming roll, so that the apparatus can be made compact.

JP-A-2015-74820

By the way, in the sputtering apparatus of Patent Document 1, since the thickness of the thin film formed may vary, further uniformization of the thickness is desired.

When the present inventors examined this variation in film thickness, the following findings were obtained. When sputtering is performed, the gas required for sputtering (argon, etc.) is continuously supplied and discharged into the small film formation chamber. Specifically, the gas is ejected from the cathode of each small film forming chamber to the vicinity of the film forming roll, used for sputtering on the film, and then exhausted to the outside from the vacuum pump. At this time, in the apparatus of Patent Document 1, the supplied gas flows toward one vacuum pump provided on a wall other than the plurality of small film forming chambers, and is discharged to the outside from there. Therefore, the gas flow is different in each film forming chamber. That is, in the small film forming chamber upstream in the transport direction, the gas flows in a direction opposite to the film transporting direction, and in the small film forming chamber downstream in the transport direction, the gas flows along the film transporting direction. In the film formation chamber at the center of the transport direction, the above two gas flows coexist, and the gas flowing toward the downstream side in the transport direction merges with the gas in the small film formation chamber on the downstream side in the transport direction and moves to the upstream side in the transport direction. The gas flowing toward it merges with the gas in the small film forming chamber on the upstream side in the transport direction. As a result, the gas flows turbulently, which affects the sputtering, and the resulting thin film becomes non-uniform.

The present invention provides a sputtering apparatus capable of forming a uniform film thickness.

The present invention [1] is a sputtering apparatus including a film forming roll for transporting a film in the circumferential direction and a plurality of film forming chambers arranged along the circumferential direction of the film forming roll. Each of the film chambers includes a target unit that is arranged so as to face the film forming roll at intervals, and a wall portion that partitions the film forming chamber, and the wall portion is provided with an exhaust portion. In the cross-sectional view orthogonal to the axial direction of the film forming roll, the sputtering apparatus is included in which the target unit is arranged on a first virtual line passing through the center of the film forming roll and the center of the exhaust portion.

According to this sputtering apparatus, since each of the plurality of film forming chambers is provided with a target unit, a wall portion, and an exhaust portion, the gas supplied to each film forming chamber is arranged in each film forming chamber. It is exhausted by the exhaust part. Therefore, it is possible to prevent the gas supplied to one film forming chamber from flowing into the film forming chamber adjacent to the film forming chamber in the circumferential direction.

Further, in each film forming chamber, since the target unit is arranged on the first virtual line passing through the center of the film forming roll and the center of the exhaust portion, the gas used for film forming is released from the vicinity of the film forming roll. It is symmetrically divided around the first virtual line by the target unit and discharged to the exhaust section. That is, the flow from the gas supply to the exhaust can be made uniform, and the turbulent flow of the gas can be suppressed.

Therefore, variations in film formation due to gas can be suppressed, and a thin film having a uniform film thickness can be formed on the film.

In the present invention [2], the wall portion includes an exhaust wall provided with the exhaust portion and two partition walls extending radially from the exhaust wall toward the film forming roll and arranged at intervals from each other. The exhaust wall comprises the sputtering apparatus according to [1], which is symmetrical with respect to the first virtual line.

According to this sputtering device, since the exhaust wall is symmetrical with respect to the first virtual line passing through the exhaust portion, the exhausted gas can easily flow evenly into the exhaust portion along the exhaust wall. Therefore, turbulence due to unevenness can be suppressed, and the gas can be exhausted more smoothly. As a result, the variation caused by the gas can be suppressed more reliably.

The present invention [3] includes the sputtering apparatus according to [2], wherein the two partition walls are symmetrical with respect to the first virtual line.

According to this sputtering device, since the two partition walls are symmetrical with respect to the first virtual line passing through the exhaust unit, the exhausted gas can easily flow evenly into the exhaust unit along the two partition walls. Therefore, turbulence due to unevenness can be suppressed, and the gas can be exhausted more smoothly. As a result, the variation caused by the gas can be suppressed more reliably.

In the present invention [4], the wall portion further includes a connecting wall connecting the exhaust wall and the partition wall, and the connecting wall is provided with respect to a second virtual line passing through the axial center in the film forming chamber. The sputtering apparatus according to any one of (1) to (3), which is symmetrical, is included.

According to this sputtering device, since the connecting wall is symmetrical with respect to the second virtual line, turbulence in the film forming chamber can be effectively suppressed, and variation can be suppressed even more reliably.

The present invention [5] includes the sputtering apparatus according to any one of [1] to [4], wherein each of the plurality of film forming chambers is provided with a pump connected to the exhaust unit. ..

According to this sputtering device, since the pumps are directly connected to each of the plurality of film forming chambers, the gas in the film forming chamber can be reliably discharged to the outside.

In the present invention [6], the sputtering according to any one of [1] to [5], wherein the exhaust unit is symmetrical with respect to a second virtual line passing through the axial center in the film forming chamber. Includes equipment.

According to this sputtering device, the exhaust unit is symmetrical with respect to the second virtual line passing through the axial center in the film forming chamber, so that the gas can be evenly exhausted even in the axial direction of the film forming roll. Can be exhausted even more smoothly. As a result, the variation caused by the gas can be suppressed more reliably.

According to the sputtering apparatus of the present invention, variations in film formation due to gas can be suppressed, and a thin film having a uniform film thickness can be formed on the film.

FIG. 1 shows a cross-sectional view in the axial direction of one embodiment of the sputtering apparatus of the present invention. FIG. 2 shows a cross-sectional view taken along the line AA shown in FIG. 3A-B show the gas flow in the first film forming chamber of FIG. 1, FIG. 3A shows the gas flow at the time of supply, and FIG. 3B shows the gas flow at the time of exhaust gas. FIG. 4 shows a modified example of the sputtering apparatus shown in FIG. 1 (a form having two exhaust ports). FIG. 5 shows a modified example of the sputtering apparatus shown in FIG. 1 (a form having three exhaust ports). FIG. 6 shows a modified example of the sputtering apparatus shown in FIG. 1 (a form having two film forming chambers). FIG. 7 shows a modified example of the sputtering apparatus shown in FIG. 1 (a form having two film forming chambers).

1. 1. Sputtering device The sputtering device 1 according to the embodiment of the present invention will be described with reference to FIGS. 1 to 3B. The axial direction of the film forming roll 27, which will be described later, is defined as the “axial direction”, the circumferential direction of the film forming roll 27 is defined as the “circumferential direction”, and the radial direction of the film forming roll 27 is defined as the “diameter direction”. Further, FIG. 1 is a first cross-sectional view, that is, a cross-sectional view in the radial direction (cross-sectional view when cut in a plane direction orthogonal to the axial direction), and more specifically, a cross-sectional view taken along the line BB in FIG. Shown. FIG. 2 is a second cross-sectional view, that is, a cross-sectional view in the axial direction (cross-sectional view when cut in a plane direction orthogonal to the radial direction), and more particularly, a cross-sectional view taken along the line AA in FIG.

The sputtering apparatus 1 shown in FIG. 1 manufactures a laminated film 4 by providing a thin film 3 on one side in the thickness direction while conveying a long film 2.

In the sputtering apparatus 1, the feeding unit 5, the sputtering unit 6, and the winding unit 7 are moved from the upstream side in the transport direction (hereinafter abbreviated as “upstream side”) of the film 2 to the downstream side in the transport direction (hereinafter, “downstream”). Prepare in this order toward (abbreviated as "side"). These will be described in detail below.

The feeding portion 5 is arranged on the most upstream side in the sputtering apparatus 1, and feeds out a long film 2. The feeding portion 5 has a box shape. The feeding unit 5 includes a feeding roll 11, a first guide roll 12, a feeding casing 13, and a vacuum pump (an example of a pump) 14.

In the feeding roll 11, the roll-shaped film 2 is set. That is, a film 2 long in the transport direction is wound around the peripheral surface of the feeding roll 11. The feeding roll 11 is a cylindrical member that has a rotating shaft that rotates in the transport direction and extends in the width direction. In this specification, any of the various rolls (feeding roll 11, first to sixth guide rolls (12, 23, 24, 33, 34, 81), film forming roll 27, winding roll 82) described later will be used. Is also a cylindrical member that has a rotating shaft that rotates in the transport direction and extends in the width direction.

The feeding roll 11 is driven by an external power or the like and is configured to be rotatable in the direction of the arrow shown in FIG. Specifically, a gear (not shown) is provided at the end of the rotation shaft of the feeding roll 11, and the gear is a motor (not shown) for rotating the feeding roll 11 in the direction of the arrow. Is connected. The feeding roll 11 is rotated by the driving force of the motor.

The feeding casing 13 accommodates the feeding roll 11 and the first guide roll 12 inside.

The feeding casing 13 is configured so that the inside thereof can be adjusted to a vacuum state. Specifically, an exhaust port 15 is formed in the feeding casing 13, and a vacuum pump 14 for discharging the air inside the exhaust port 14 to the outside is connected to the exhaust port 15.

The vacuum pump 14 discharges the gas inside the feeding casing 13 to the outside to evacuate the inside of the feeding casing 13. The vacuum pump 14 is arranged on the outside of the feeding casing 13 so as to communicate with the exhaust port 15. Examples of the vacuum pump 14 include a turbo molecular pump and the like.

The sputtering section 6 is arranged on the downstream side of the feeding section 5 and the upstream side of the winding section 7 so as to be adjacent to them. The sputtering section 6 includes a passage section 21 and a film forming section 22.

The passage portion 21 conveys the film 2 from the feeding portion 5 to the film forming section 22, and also conveys the laminated film 4 from the film forming section 22 to the winding section 7.

The passage portion 21 has a box shape. The passage portion 21 includes a second guide roll 23, a third guide roll 24, and a passage casing 25.

The second guide roll 23 is arranged on the upstream side of the passage portion 21. The second guide roll 23 guides the film 2 conveyed from the feeding portion 5 to the fourth guide roll 33 (described later) of the guide roll chamber 31.

The third guide roll 24 is arranged on the downstream side of the passage portion 21. The third guide roll 24 guides the laminated film 4 conveyed from the fifth guide roll 34 (described later) of the guide roll chamber 31 to the winding unit 7.

The passage casing 25 houses the second guide roll 23 and the third guide roll 24 inside. The passage casing 25 is formed so as to communicate with the guide roll chamber 31 (described later) of the film forming portion 22. That is, the passage casing 25 is continuous with the film forming portion 22, and at the position where the passage casing 25 and the film forming portion 22 are continuous, the passage casing 25 is such that the film 2 and the laminated film 4 can be conveyed. Equipped with a communication port.

The film-forming portion 22 has a substantially hexagonal shape in the first cross-sectional view, and has a substantially rectangular shape in the second cross-sectional view. The film forming section 22 includes a central portion 26 and chambers (guide roll chambers 31 and a plurality (five) film forming chambers 51, 61, 65, 71, 75) arranged in the circumferential direction thereof. Specifically, the guide roll chamber 31 and the plurality (five) film forming chambers 51, 61, 65, 71, 75 are arranged adjacent to each other in the circumferential direction of the film forming roll 27, and the central portion 26 is also arranged in the radial direction. Adjacent to each other.

The central portion 26 is arranged at the center of the film forming portion 22 in the first cross-sectional view. The central portion 26 includes a film forming roll 27 and a pair of film forming roll side walls 28 as an example of the connecting wall.

The film forming roll 27 conveys the film 2 in the circumferential direction of the film forming roll 27. The film forming roll 27 also serves as an anode. The film forming roll 27 faces the guide roll chamber 31 described later and the plurality of film forming chambers 51, 61, 65, 71, 75.

The film-forming roll 27 is driven by external power or the like and is configured to be rotatable in the direction of the arrow shown in FIG. Specifically, it is the same as the feeding roll 11.

The pair of film forming roll side walls 28 are arranged on one side and the other side in the axial direction so as to face each other at a distance from the film forming roll 27. The pair of film forming roll side walls 28 have substantially the same shape as each other, and have substantially the same shape as the film forming roll 27 in the first cross-sectional view. The pair of film-forming roll side walls 28 are symmetrical to the second virtual line L2 described later.

The guide roll chamber 31 is arranged so as to communicate with the passage portion 21. Specifically, the guide roll chamber 31 is arranged on the downstream side of the passage portion 21 and the upstream side of the first film forming chamber 51, and on the downstream side of the fifth film forming chamber 75 and the upstream side of the passage portion 21. Have been placed.

The guide roll chamber 31 is partitioned by a guide roll wall portion 32 arranged to face the film forming roll 27. A fourth guide roll 33 and a fifth guide roll 34 are housed in the guide roll chamber 31. The guide roll wall portion 32 includes a first partition wall 41, a sixth partition wall 46, and a pair of guide roll side walls 35. In other words, the guide roll chamber 31 includes the fourth guide roll 33, the fifth guide roll 34, and the guide roll wall portion 32 (the first partition wall 41, the sixth partition wall 46, and the pair of guide roll side walls 35). To be equipped.

The fourth guide roll 33 is arranged near the film forming roll 27 at a distance from the film forming roll 27. The fourth guide roll 33 guides the film 2 conveyed from the second guide roll 23 to the peripheral surface of the film forming roll 27 so that the conveying direction of the film 2 is along the circumferential direction of the film forming roll 27.

The fifth guide roll 34 is arranged near the film forming roll 27 at a distance from the film forming roll 27, and is arranged on the downstream side of the fourth guide roll 33. The fifth guide roll 34 guides the laminated film 4 conveyed from the film forming roll 27 to the third guide roll 24.

The first partition wall 41 is arranged between the guide roll chamber 31 and the first film forming chamber 51 so as to partition them. The first partition wall 41 has a flat plate shape extending in the radial direction and the axial direction. The first partition wall 41 extends in the radial direction from the boundary between the first exhaust wall 53 (described later) and the passage casing 25 in the first cross-sectional view toward the film forming roll center C1. A slight gap through which the film 2 can pass is formed between the radial end of the first partition wall 41 and the film forming roll 27.

As shown in FIG. 2, the pair of guide roll side walls 35 are arranged so as to face each other with each other in the axial direction. The pair of guide roll side walls 35 have a flat plate shape extending in the circumferential direction and the radial direction, respectively. The shape of the pair of guide roll side walls 35 is substantially the same as each other, and has a substantially isosceles trapezoidal shape in the first cross-sectional view.

As shown in FIG. 1, the first film forming chamber 51 is arranged adjacent to the guide roll chamber 31 on the downstream side and the second film forming chamber 61 on the upstream side. That is, the first film forming chamber 51 is arranged on the most upstream side among the plurality of film forming chambers 51, 61, 65, 71, 75.

The first film forming chamber 51 is partitioned by a first wall portion 52 arranged to face the film forming roll 27. A target unit 55 is housed inside the first film forming chamber 51, and a vacuum pump 14 is connected to the outside of the first film forming chamber 51. The first wall portion 52 includes a first exhaust wall 53, a first partition wall 41, a second partition wall 42, and a pair of first side walls 54. In other words, the first film forming chamber 51 includes a first exhaust wall 53, a first partition wall 41, a second partition wall 42, a pair of first side walls 54, a target unit 55, and a vacuum pump 14.

The first exhaust wall 53 constitutes a radial outer outer wall of the film forming portion 22. The first exhaust wall 53 has a flat plate shape extending in the axial direction and the circumferential direction. In the first cross-sectional view, the first exhaust wall 53 is formed so as to be symmetrical with respect to the virtual line L1. Specifically, the first exhaust wall 53 extends vertically from the center C2 of the exhaust port 15 of the first exhaust wall 53 toward both outer sides in the circumferential direction. Further, as shown in FIG. 2, in the second cross-sectional view, the first exhaust wall 53 is formed so as to be symmetrical with respect to the second virtual line L2. Specifically, the first exhaust wall 53 is formed so as to extend perpendicularly to the second virtual line L2.

The first virtual line L1 passes through the film forming roll center C1 and the center C2 of the exhaust port 15 in the first cross-sectional view. Preferably, the first virtual line L1 passes through all of C1, C2, and C3 (the circumferential centers of the two partition walls 41 and 42). In the second cross-sectional view, the second virtual line L2 passes through the axial center C4 of the film forming roll 27 and extends in the radial direction.

As shown in FIGS. 1 and 2, an exhaust port (an example of an exhaust unit) 15 is formed at the center of the first exhaust wall 53 in the circumferential direction and the axial direction.

The first partition wall 41 is the same member as the first partition wall 41 described above in the guide roll chamber 31, and the first film forming chamber 51 and the guide roll chamber 31 share the first partition wall 41.

The second partition wall 42 is arranged between them so as to partition the first film forming chamber 51 and the second film forming chamber 61. The second partition wall 42 has the same shape as the first partition wall 41, and the second partition wall 42 extends from the boundary between the first exhaust wall 53 and the second exhaust wall 63 toward the film forming roll center C1. , Extends in the radial direction.

The pair of first side walls 54 form an outer wall on the outer side in the axial direction of the film forming portion 22. The pair of first side walls 54 are arranged so as to face each other in the axial direction. The pair of first side walls 54 have a flat plate shape extending in the circumferential direction and the radial direction, respectively. The shape of the pair of first side walls 54 is substantially the same as each other, and has a substantially isosceles trapezoidal shape in the first cross-sectional view. Each of the pair of first side walls 54 has each of the circumferential end portions of the first exhaust wall 53, each of the axial end portions of the first partition wall 41, and each of the axial end portions of the second partition wall 42. connect. The pair of first side walls 54 are symmetrical with respect to the second virtual line L2 (described later).

The target unit 55 is arranged to face the film forming roll 27 at a distance from each other. Further, the target unit 55 is arranged so as to be symmetrical with respect to the virtual line L1. The target unit 55 includes a target 56, a cathode 57, and a gas supply machine 58.

The target 56 is a raw material for the thin film 3. The target 29 is arranged to face the film forming roll 27 so that the target material protruding from the target 56 due to the collision of gas ions is deposited on the film forming roll 27.

The material of the target 29 is appropriately determined according to the thin film 3, and is, for example, from In, Sn, Zn, Ga, Sb, Nb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, and W. Examples include metal oxides containing at least one metal selected from the group. Specific examples thereof include indium-containing oxides such as indium tin oxide composite oxide (ITO), and antimony-containing oxides such as antimony tin composite oxide (ATO).

The cathode 57 is arranged on the radial outer side of the target 56 (opposite the film forming roll 27) so that the gas ions are accelerated toward the target 56.

The gas supply machine 58 is arranged near between the target 56 and the cathode 57. The gas supply machine 58 is configured so that the gas can pass through the target 56 and be blown to the film 2 of the film forming roll 27.

The vacuum pump 14 discharges the gas inside the first film forming chamber 51 to the outside to evacuate the inside of the first film forming chamber 51. The vacuum pump 14 is arranged on the outer side in the radial direction of the first exhaust wall 53 so as to communicate with the exhaust port 15 of the first exhaust wall 53. The vacuum pump 14 is the same as the vacuum pump 14 of the feeding portion 5.

The second film forming chamber 61 is arranged on the downstream side of the first film forming chamber 51 and on the upstream side of the third film forming chamber 65 so as to be adjacent to them.

The second film forming chamber 61 is partitioned by a second wall portion 62 arranged to face the film forming roll 27. A target unit 55 is housed inside the second film forming chamber 61, and a vacuum pump 14 is connected to the outside of the second film forming chamber 61. The second wall portion 62 includes a second exhaust wall 63, a second partition wall 42, a third partition wall 43, and a pair of second side walls (not shown). In other words, the second film forming chamber 61 includes a second exhaust wall 63, a second partition wall 42, a third partition wall 43, a pair of second side walls, a target unit 55, and a vacuum pump 14.

The second exhaust wall 63 constitutes a radial outer outer wall of the film forming portion 22. The second exhaust wall 63 has a shape in which the first exhaust wall 53 is rotated by a predetermined angle (for example, 45 degrees or more and 70 degrees or less) in the circumferential direction with the film forming roll center C1 as the center, and the first exhaust wall 53 has a shape. Has the same configuration as.

The second partition wall 42 is the same member as the second partition wall 42 described above in the first film forming chamber 51, and the second film forming chamber 61 and the first film forming chamber 51 share the second partition wall 42.

The third partition wall 43 is arranged between them so as to partition the second film forming chamber 61 and the third film forming chamber 65. The third partition wall 43 has the same shape as the first partition wall 41, and extends radially from the boundary between the second exhaust wall 63 and the third exhaust wall 67 toward the film forming roll center C1.

The pair of second side walls constitutes an outer wall on the outer side in the axial direction. The second side wall has a shape rotated by a predetermined angle in the circumferential direction with the first side wall 54, and has the same configuration as the first side wall 54.

The target unit 55 and the vacuum pump in the second film forming chamber 61 have the same configuration as the first film forming chamber 51, and are arranged in the second film forming chamber 61 like the first film forming chamber 51.

The third film forming chamber 65 is partitioned by a third wall portion 66 arranged to face the film forming roll 27. A target unit 55 is housed inside the third film forming chamber 65, and a vacuum pump 14 is connected to the outside of the third film forming chamber 65. The third wall portion 66 includes a third exhaust wall 67, a third partition wall 43, a fourth partition wall 44, and a pair of third side walls (not shown). In other words, the third film forming chamber 65 includes a third exhaust wall 67, a third partition wall 43, a fourth partition wall 44, a pair of third side walls, a target unit 55, and a vacuum pump 14.

The third exhaust wall 67 constitutes a radial outer outer wall. The third exhaust wall 67 has a shape in which the second exhaust wall 63 is rotated by a predetermined angle in the circumferential direction with the film forming roll center C1 as the center, and has the same configuration as the second exhaust wall 63.

The third partition wall 43 is the same member as the third partition wall 43 described above in the second film forming chamber 61, and the third film forming chamber 65 and the second film forming chamber 61 share the third partition wall 43.

The fourth partition wall 44 is arranged between them so as to partition the third film forming chamber 65 and the fourth film forming chamber 71. The fourth partition wall 44 has the same shape as the first partition wall 41, and extends radially from the boundary between the third exhaust wall 67 and the fourth exhaust wall 73 toward the film forming roll center C1.

The pair of third side walls constitutes an outer wall on the outer side in the axial direction of the film forming portion 22. The third side wall has a shape in which the second side wall is rotated by a predetermined angle in the circumferential direction with the film forming roll center C1 as the center, and has the same configuration as the second side wall.

The target unit 55 and the vacuum pump in the third film forming chamber 65 have the same configuration as the first film forming chamber 51, and are arranged in the third film forming chamber 65 like the first film forming chamber 51.

The fourth film forming chamber 71 is partitioned by a fourth wall portion 72 arranged to face the film forming roll 27. Further, the target unit 55 is housed inside the fourth film forming chamber 71, and the vacuum pump 14 is connected to the outside of the fourth film forming chamber 71. The fourth wall portion 72 includes a fourth exhaust wall 73, a fourth partition wall 44, a fifth partition wall 45, and a pair of fourth side walls (not shown). In other words, the fourth film forming chamber 71 includes a fourth exhaust wall 73, a fourth partition wall 44, a fifth partition wall 45, a pair of fourth side walls, a target unit 55, and a vacuum pump 14.

The fourth exhaust wall 73 constitutes a radial outer outer wall of the film forming portion 22. The fourth exhaust wall 73 has a shape in which the third exhaust wall 67 is rotated by a predetermined angle in the circumferential direction with the film forming roll center C1 as the center, and has the same configuration as the third exhaust wall 67.

The fourth partition wall 44 is the same member as the fourth partition wall 44 described above in the third film forming chamber 65, and the fourth film forming chamber 71 and the third film forming chamber 65 share the fourth partition wall 44.

The fifth partition wall 45 is arranged between them so as to partition the fourth film forming chamber 71 and the fifth film forming chamber 75. The fourth partition wall 44 has the same shape as the first partition wall 41, and extends radially from the boundary between the fourth exhaust wall 73 and the fifth exhaust wall 77 toward the film forming roll center C1.

The pair of fourth side walls constitutes an outer wall on the outer side in the axial direction of the film forming portion 22. The fourth side wall has a shape in which the third side wall is rotated by a predetermined angle in the circumferential direction with the film forming roll center C1 as the center, and has the same configuration as the third side wall.

The target unit 55 and the vacuum pump in the fourth film forming chamber 71 have the same configuration as the first film forming chamber 51, and are arranged in the fourth film forming chamber 71 in the same manner as the first film forming chamber 51.

The fifth film forming chamber 75 is partitioned by a fifth wall portion 76 arranged to face the film forming roll 27. A target unit 55 is housed inside the fifth film forming chamber 75, and a vacuum pump 14 is connected to the outside of the fifth film forming chamber 75. The fifth wall portion 76 includes a fifth exhaust wall 77, a fifth partition wall 45, a sixth partition wall 46, and a pair of fifth side walls (not shown). In other words, the fifth film forming chamber 75 includes a fifth exhaust wall 77, a fifth partition wall 45, a sixth partition wall 46, a pair of fifth side walls, a target unit 55, and a vacuum pump 14.

The fifth exhaust wall 77 constitutes a radial outer outer wall of the film forming portion 22. The fifth exhaust wall 77 has a shape in which the fourth exhaust wall 73 is rotated by a predetermined angle in the circumferential direction with the film forming roll center C1 as the center, and has the same configuration as the fourth exhaust wall 73.

The fifth partition wall 45 is the same member as the fourth partition wall 44 described above in the fourth film forming chamber 71, and the fifth film forming chamber 75 and the fourth film forming chamber 71 share the fifth partition wall 45.

The sixth partition wall 46 is arranged between the fifth film forming chamber 75 and the guide roll chamber 31 so as to partition them. The sixth partition wall 46 has the same shape as the second partition wall 42, and extends radially from the boundary between the fifth exhaust wall 77 and the passage casing 25 toward the film forming roll center C1.

The pair of fifth side walls constitutes an outer wall on the outer side in the axial direction of the film forming portion 22. The fifth side wall has a shape in which the fourth side wall is rotated by a predetermined angle in the circumferential direction with the film forming roll center C1 as the center, and has the same configuration as the fourth side wall.

The target unit 55 and the vacuum pump 14 in the fifth film forming chamber 75 have the same configuration as the first film forming chamber 51, and are arranged in the fifth film forming chamber 75 like the first film forming chamber 51. ..

In the film forming section 22, the first film forming chamber 51, the second film forming chamber 61, the third film forming chamber 65, the fourth film forming chamber 71, and the fifth film forming chamber 75 are rotated by a predetermined angle in the circumferential direction. Except for the fact that it has almost the same structure.

Further, in each exhaust wall, the first exhaust wall 53, the second exhaust wall 63, the third exhaust wall 67, the fourth exhaust wall 73, and the fifth exhaust wall 77 are formed continuously in the circumferential direction. It has a substantially hexagonal shape in one cross-sectional view.

In each partition wall, the first partition wall 41, the second partition wall 42, the third partition wall 43, the fourth partition wall 44, and the fifth partition wall 45 extend radially inward from each exhaust wall at intervals in the circumferential direction. Is formed in. The radial inner ends of the partition walls are separated from the film forming roll 27 by a slight gap through which the film 2 can pass. Further, the first partition wall 41, the second partition wall 42, the third partition wall 43, the fourth partition wall 44, and the fifth partition wall 45 are arranged so as to be evenly spaced in the circumferential direction.

On one side and the other side of the pair of side walls of the film forming portion 22, the film forming roll side wall 28, the guide roll side wall 35, the first side wall 54, the second side wall, the third side wall, the fourth side wall and the fifth side wall are respectively. , It is integrally formed and has a substantially hexagonal shape in the first cross-sectional view.

The plurality of film forming chambers 51, 61, 65, 71, 75 are partitioned by wall portions 52, 62, 66, 72, 76 so as to face the film forming roll 27, and the first film forming chamber 51, No. 1 It includes two film forming chambers 61, a third film forming chamber 65, a fourth film forming chamber 71, and a fifth film forming chamber 75. These film forming chambers are arranged so as to be adjacent to each other in this order along the film conveying direction, that is, along the circumferential direction of the film forming roll 27. The film forming chambers 51, 61, 65, 71, and 75 have substantially the same structure as each other.

The take-up portion 7 is arranged on the most downstream side in the sputtering apparatus 1, and is arranged on the downstream side of the passage portion 21 so as to be adjacent to the passage portion 21. The winding unit 7 winds up the laminated film 4.

The take-up portion 7 has a box shape. The take-up unit 7 includes a sixth guide roll 81, a take-up roll 82, a take-up casing 83, and a vacuum pump 14.

The sixth guide roll 81 guides the laminated film 4 conveyed from the passage portion 21 to the take-up roll 82. The sixth guide roll 81 is arranged on the upstream side of the take-up roll 82.

The take-up roll 82 winds the film with a thin film conveyed from the sixth guide roll 81 into a roll shape. The take-up roll 82 is driven by external power or the like and is configured to be rotatable in the direction of the arrow shown in FIG. Specifically, it is the same as the feeding roll 11.

The take-up casing 83 houses the sixth guide roll 81 and the take-up roll 82 inside. The take-up casing 83 is configured so that the inside thereof can be adjusted to a vacuum state. Specifically, an exhaust port 15 is formed in the take-up casing 83, and a vacuum pump 14 for discharging the air inside the exhaust port 15 to the outside is arranged in the exhaust port 15.

The vacuum pump 14 discharges the gas inside the take-up casing 83 to the outside to evacuate the inside of the feeding casing 13. The vacuum pump 14 is arranged on the outside of the take-up casing 83 so as to communicate with the exhaust port 15. Examples of the vacuum pump 14 include the vacuum pump of the feeding portion 5.

2. Laminated film manufacturing method
A method of manufacturing the laminated film 4 from the film 2 by using the sputtering apparatus 1 will be described.

First, the film 2 to be laminated is prepared on the feeding roll 11. Specifically, the film 2 is prepared and set on the feeding roll 11.

Examples of the film 2 include a polymer film and a glass film (thin film glass). Examples of the polymer film include polyester films (polyethylene terephthalate film, polybutylene terephthalate film, polyethylene naphthalate film, etc.), polycarbonate films, olefin films (polyethylene film, polypropylene film, cycloolefin film, etc.), and acrylic films. Examples thereof include films, polyether sulfone films, polyarylate films, melamine films, polyamide films, polyimide films, cellulose films, and polystyrene films.

Next, the sputtering device 1 is operated. Specifically, various vacuum pumps 14 are operated to adjust all of the feeding section 5, the sputtering section 6 and the winding section 7 to vacuum, and the motors attached to each roll are driven to drive each of them. Rotately drive the roll. In addition, the target unit 55 is also operated to perform sputtering. As a result, the film 2 is fed out from the feeding section 5, the laminated film 4 is formed by sputtering in the sputtering section 6, and is wound by the winding section 7.

In particular, in the sputtering section 6, the film 2 is guided from the passage section 21 to the guide roll chamber 31 by the second guide roll 23, and subsequently guided to the first film forming chamber 51 by the fourth guide roll 33. .. Next, the film forming roll 27 passes through the second film forming chamber 61, the third film forming chamber 65, the fourth film forming chamber 71, and the fifth film forming chamber 75 in this order along the peripheral surface. At this time, sputtering is sequentially performed on the film 2 in the first film forming chamber 51, the second film forming chamber 61, the third film forming chamber 65, the fourth film forming chamber 71, and the fifth film forming chamber 75. Will be done. After that, the laminated film 4 is conveyed to the guide roll chamber 31 again, and is guided to the passage portion 21 by the fifth guide roll 34. Then, the fourth guide roll 33 guides the winding unit 7.

Sputtering in each film forming chamber 51, 61, 65, 71, 75 will be described on behalf of the first film forming chamber 51. The sputtering in the other film forming chamber is the same as the sputtering in the first film forming chamber 51.

In sputtering, gas is supplied from a gas supply machine 58 and a voltage is applied by a power source (not shown) to ionize the gas. Then, the ionized gas is made to collide with the target 56 near the cathode 57, the target material (thin film material) is ejected from the surface of the target 56, and the target material (thin film material) is deposited on the film 2.

Specific examples of the sputtering method include a bipolar sputtering method, an electron cyclotron resonance sputtering method, a magnetron sputtering method, and an ion beam sputtering method.

Examples of the gas to be supplied include an inert gas such as argon (Ar). Preferably, a reactive gas such as oxygen gas can be used in combination.

The atmospheric pressure during sputtering is vacuum, preferably less than 1.0 Pa, more preferably 0.5 Pa or less.

The power source used for sputtering may be, for example, a DC power source, an AC power source, an MF power source, or an RF power source, or may be a combination thereof.

The gas flow during sputtering in the first film forming chamber 51 will be described in detail with reference to the arrows in FIGS. 3A-B.

From the gas supply machine 58, gas (for example, argon gas) is injected toward the film forming roll 27 and the film 2 (see the broken line in FIG. 3A).

The injected gas is ionized by Ar ⁺ or the like, then accelerates toward the cathode 57, collides with the target 56, and knocks out the target material from the target 56 (see the solid line in FIG. 3A). The ionized gas that collides with the target 56 returns from the ionized state to the gaseous state due to the influence of the cathode 57.

Then, the gas flows toward the exhaust port 15, that is, outward in the radial direction by suction of the vacuum pump 14 of the first exhaust wall 53. At this time, the gas branches and flows along the facing surface of the cathode 57 so as to be symmetrical with respect to the first virtual line L1. The gas toward the first partition wall 41 side flows along the first partition wall 41 and the first exhaust wall 53 and is sucked into the exhaust port 15, while the gas toward the second partition wall 42 side flows along the second partition wall 42 and the first exhaust wall 53. 1 Flows along the exhaust wall 53 and is sucked into the exhaust port 15 (see FIG. 3B).

At this time, since the first film forming chamber 51 is symmetrical with respect to the first virtual line L1, the gas flow is also a target, and a smooth flow in the exhaust gas is generated in the first film forming chamber 51. That is, turbulence is unlikely to occur in the region between the cathode 57 and the film forming roll 27 on which film formation is performed, and stable gas supply and discharge are performed.

In the second film forming chamber 61, the third film forming chamber 65, the fourth film forming chamber 71, and the fifth film forming chamber 75, the same sputtering as the first film forming chamber 51, and thus the same, are also performed independently. Gas supply and discharge will be implemented.

Then, in this sputtering apparatus 1, the target unit 55 is placed in the first film forming chamber 51, the second film forming chamber 61, the third film forming chamber 65, the fourth film forming chamber 71, and the fifth film forming chamber 75, respectively. Since the wall portions 52, 62, 66, 72, 76 and the exhaust port 15 are provided, the gas supplied to each film forming chamber is exhausted by the exhaust port 15 arranged in each film forming chamber. Therefore, it is possible to prevent the gas supplied to one film forming chamber from flowing into the film forming chamber adjacent to the film forming chamber in the circumferential direction.

Further, since the target unit 55 is arranged on the first virtual line L1 in each film forming chamber, the gas used for the film forming is the first virtual line by the target unit 55 from the vicinity of the film forming roll 27. It is divided symmetrically around L1 and discharged to the exhaust port 15. That is, the flow from the gas supply to the exhaust can be made uniform, and the turbulent flow of the gas can be suppressed.

Therefore, variations in film formation due to gas can be suppressed, and a thin film 3 having a uniform film thickness can be formed on the film 2.

Further, in the sputtering apparatus 1, the first wall portion 52 includes a first exhaust wall 53, a first partition wall 41, and a second partition wall 42, and the first exhaust wall 53 with respect to the first virtual line L1. It is symmetric.

Therefore, the exhausted gas can easily flow evenly into the exhaust port 15 along the first exhaust wall. Therefore, turbulence due to unevenness can be suppressed, and the gas can be exhausted more smoothly. As a result, the variation caused by the gas can be suppressed more reliably.

Further, in the sputtering apparatus 1, the first partition wall 41 and the second partition wall 42 are symmetrical with respect to the first virtual line L1.

Therefore, the exhausted gas can easily flow into the exhaust portion evenly along the first partition wall 41 and the second partition wall 42. Therefore, turbulence due to unevenness can be suppressed, and the gas can be exhausted more smoothly. As a result, the variation caused by the gas can be suppressed more reliably.

Further, in this sputtering apparatus 1, since the pair of film forming roll side walls 28 are symmetrical with respect to the second virtual line L2, turbulence is effectively suppressed, and the plurality of film forming chambers 51, 61, 65, The variation in each of 71 and 75 can be suppressed more reliably.

Further, in the sputtering apparatus 1, each of the plurality of film forming chambers is provided with a vacuum pump 14 connected to an exhaust port.

Therefore, the gas in the film forming chamber can be reliably discharged to the outside.

Further, in the sputtering apparatus 1, the exhaust port 15 is arranged so as to be centered on the second virtual line L2 in the film forming chambers 51, 61, 65, 71, 75.

Therefore, the exhaust port 15 can evenly exhaust the gas even in the axial direction of the film forming roll 27, and the gas can be exhausted even more smoothly. As a result, the variation caused by the gas can be suppressed more reliably.

4. Modification Example A modification of one embodiment shown in FIG. 1 will be described below. It should be noted that these modified examples also have the same effects as those in the above-described embodiment.

(1) In the embodiment shown in FIG. 1, each film forming chamber 51, 61, 65, 71, 75 is provided with one vacuum pump, respectively, but as shown in FIGS. 4 and 5, for example, Each film forming chamber 51, 61, 65, 71, 75 can be provided with a plurality (two or more) vacuum pumps 14.

In the embodiment shown in FIG. 4, each film forming chamber includes two vacuum pumps 14. The two vacuum pumps 14 are arranged axially spaced apart from each other. The two vacuum pumps 14 are arranged so as to be symmetrical with respect to the second virtual line L2. An exhaust port 15 is formed on each exhaust wall corresponding to the two vacuum pumps 14.

In the embodiment shown in FIG. 5, each film forming chamber includes three vacuum pumps 14. The three vacuum pumps 14 are arranged at equal intervals in the axial direction. The three vacuum pumps 14 are arranged so as to be symmetrical with respect to the third virtual line L2. An exhaust port 15 is formed on each exhaust wall corresponding to the three vacuum pumps 14.

(2) In the embodiment shown in FIG. 1, the film forming section 22 includes five film forming chambers, but the number of film forming chambers is not limited as long as it is a plurality (two or more), for example, FIG. And, as shown in FIG. 7, two or three film forming chambers may be provided.

In the embodiment shown in FIG. 6, the two film forming chambers 51 and 61 have a shape rotated by a predetermined angle in the circumferential direction and have the same structure as each other. Each exhaust wall is symmetrical with respect to the first virtual line L1 in the first cross-sectional view, and has a substantially arc shape.

In the embodiment shown in FIG. 7, the three film forming chambers 51, 61, and 65 have shapes that are rotated by a predetermined angle in the circumferential direction, and have the same structure as each other.

1 Sputtering device 2 Film 6 Sputtering part 14 Vacuum pump 15 Exhaust port 27 Film-forming roll 28 Film-forming roll Side wall 41 First partition 42 Second partition 43 Third partition 44 Fourth partition 45 Fifth partition 46 Sixth partition 51 First Film formation chamber 52 First wall portion 53 First exhaust wall 54 Second side wall 55 Target unit 61 Second film formation chamber 62 Second wall portion 63 Second exhaust wall 65 Third film formation chamber 66 Third wall portion 67 Third Exhaust wall 71 4th film forming chamber 72 4th wall part 73 4th exhaust wall 75 5th film forming chamber 76 5th wall part 77 5th exhaust wall

Claims (6)

A film forming roll that conveys the film in the circumferential direction,
A sputtering apparatus including a plurality of film forming chambers arranged along the circumferential direction of the film forming roll.
Each of the plurality of film forming chambers
The target unit, which is arranged so as to face the film forming roll at a distance,
A wall portion for partitioning the film forming chamber is provided.
An exhaust unit is provided on the wall portion.
In a cross-sectional view orthogonal to the axial direction of the film forming roll, the target unit is arranged on a first virtual line passing through the center of the film forming roll and the center of the exhaust portion. Sputtering equipment. The wall part
An exhaust wall provided with the exhaust unit and
It is provided with two partition walls extending radially from the exhaust wall toward the film forming roll and arranged at intervals from each other.
The sputtering apparatus according to claim 1, wherein the exhaust wall is symmetrical with respect to the first virtual line. The sputtering apparatus according to claim 2, wherein the two partition walls are symmetrical with respect to the first virtual line. The wall portion further includes a connecting wall that connects the exhaust wall and the partition wall.
The sputtering apparatus according to any one of claims 1 to 3, wherein the connecting wall is symmetrical with respect to a second virtual line passing through the axial center in the film forming chamber. The sputtering apparatus according to any one of claims 1 to 4, wherein each of the plurality of film forming chambers is provided with a pump connected to the exhaust unit. The sputtering apparatus according to any one of claims 1 to 5, wherein the exhaust unit is symmetrical with respect to a second virtual line passing through the axial center in the film forming chamber.

Images