JP2020165794A - Inclined mirror multiple reflection type radiation thermometer - Google Patents

Abstract

To provide an inclined mirror multiple reflection type radiation thermometer which can increase apparent emissivity.SOLUTION: An inclined mirror multiple reflection type radiation thermometer that is planarly widened and extended, has an inclination mirror 0102 arranged on a predetermined range of a measuring object 0101 in which the predetermined range is substantially the same temperature, and measures a temperature of a measuring object by multiple reflection of radiation light (including infrared light) from the measuring object between the inclination mirror and the measuring object, includes: the inclination mirror; a radiation thermometer 0104 that causes an optical axis of a radiation light intake port 0103 to face a surface of the inclination mirror and/or a surface in the predetermined range of the measuring object to the side where the inclination mirror is widely opened; and a hemispherical mirror 0105 which forms a hole 0106 that prevents blocking of the radiation light from the inclination mirror and/or the measuring object incident on the radiation light intake port of the radiation thermometer, is arranged in the front of the radiation thermometer, and has a radiation light intake port side as a projection side.SELECTED DRAWING: Figure 1

Description

In the present invention, the apparent emissivity of the temperature-measured object is increased by arranging an inclined mirror with respect to the temperature-measured object to multiplely reflect and receive the radiated light from the temperature-measured object, thereby increasing the apparent emissivity of the temperature-measured object. It relates to a radiation thermometer that measures the temperature by regarding the object as a blackbody.

Non-contact radiation thermometers that do not damage the surface of the metal material are widely used for measuring the surface temperature of the metal material in the manufacturing process of the metal material such as rolling and continuous annealing. The radiation thermometer measures the intensity of thermal radiation from the object (spectral radiance brightness), and converts the intensity of thermal radiation into temperature based on the relationship between the thermal radiation intensity of the blackbody and the temperature. Here, since the emissivity of most metals is low or the emissivity fluctuates due to factors such as oxidation, there is a gap from the temperature conversion value based on the emissivity of the blackbody, and accurate temperature measurement should be performed. There is a problem that it cannot be done.

Therefore, the mirror is tilted with respect to the measurement target such as a steel plate, and the synchrotron radiation from the steel plate is repeatedly reflected by the mirror and the surface of the steel plate to increase the apparent emissivity of the surface of the steel plate and emit blackbody radiation. A temperature measurement method has been proposed that can reduce the error of the temperature conversion value by approaching the emissivity (Patent Document 1).

JP-A-59-87329

According to the temperature measurement method of Patent Document 1, if the emissivity of the steel sheet to be measured is 0.2 or more, the apparent emissivity can be 0.85 or more, and accurate temperature measurement can be performed. It is supposed to be.

However, when the emissivity is less than 0.1 like aluminum whose surface is not oxidized, the apparent emissivity cannot be sufficiently increased to be regarded as blackbody radiation by the method of Patent Document 1.

Therefore, in order to solve the above-mentioned problems, in the present invention, an inclined mirror is arranged on the predetermined range of the measurement target having a planar spread and a predetermined range having substantially the same temperature, and between the tilt mirror and the measurement target. Inclined mirror that measures the temperature of the object to be measured by multiple reflection of the radiation light (including infrared light) from the object to be measured in the tilted mirror and the wide open side of the inclined mirror. A radiation thermometer whose optical axis of the radiation intake is directed to the surface of the tilt mirror and / and the surface of the predetermined range to be measured, and the tilt mirror and / and measurement which are incident on the radiation intake of the radiation thermometer. A tilted mirror multiple reflection type radiation thermometer consisting of a hemispherical mirror that is placed in front of the radiation thermometer with a hole that does not block the radiation from the target and whose convex side is the radiation intake side. provide.

Further, in the above-mentioned tilt mirror multiple reflection type radiation thermometer, the angle formed by the optical axis of the synchrotron radiation intake port and the normal line of the surface of the predetermined range of the measurement target is the angle formed by the tilt mirror and the measurement target. Provided is a tilted mirror multiple reflection type radiation thermometer which is an even multiple.

Further, in the above-mentioned tilted mirror multiple reflection type radiation thermometer, a P-polarized light is arranged in front of the synchrotron radiation intake port of the radiation thermometer so that only P-polarized light is taken into the synchrotron radiation intake port. An inclined mirror multiple reflection type radiation thermometer is provided.

Further, an annealing system including an annealing device for annealing a measurement target in a predetermined range and any one of the above tilted mirror multiple reflection type radiation thermometers is provided. Further, the annealing device provides an annealing system in which the annealing device is a semiconductor wafer annealing device.

Further, the present invention provides an annealing system including an annealing device for annealing a measurement target in a predetermined range, and one of the above tilted mirror multiple reflection type radiation thermometers.

According to the present invention, the apparent emissivity can be increased as compared with the conventional tilted mirror multiple reflection type radiation thermometer, and the accuracy of temperature measurement can be improved.

Conceptual diagram of the tilted mirror multiple reflection type radiation thermometer of the first embodiment Conceptual diagram showing a mechanism for measuring temperature with a radiation thermometer using multiple reflections of an equivalent radiator and a hemispherical mirror Conceptual diagram of a more preferable tilted mirror multiple reflection type radiation thermometer according to the first embodiment Diagram showing the relationship between the emissivity ε to be measured and the apparent emissivity ε _a A table showing the emissivity ε, the apparent emissivity ε _a, and the effective emissivity ε _eff to be measured. The figure which shows the apparent emissivity ε _a and the effective emissivity ε _{eff e} with respect to the emissivity ε to be measured. Conceptual diagram of the tilted mirror multiple reflection type radiation thermometer of the first embodiment FIG. 8 is a diagram showing emissivity characteristics using aluminum as an example. Table showing the apparent emissivity ε _a and the effective emissivity ε _eff by P-polarized light

Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. The present invention should not be limited to these embodiments, and may be implemented in various embodiments without departing from the gist thereof.
<Embodiment 1>
<Overview>

In this embodiment, the synchrotron radiation finally emitted from the measurement target or the tilt mirror through multiple reflections by the tilt mirror is directed to the point finally emitted by the measurement target or the tilt mirror by the hemispherical mirror. This is a radiant thermometer that measures the temperature by receiving the synchrotron radiation that has passed through the holes provided in the hemispherical mirror after further increasing the apparent emissivity due to multiple reflections.
<Composition>

FIG. 1 is a conceptual diagram of the tilted mirror multiple reflection type radiation thermometer of the present embodiment. As shown in the figure, the tilted mirror multiple reflection type radiation thermometer radiates to the tilted mirror 0102, which is tilted with respect to the measurement target 0101 and arranged with the mirror surface facing, and to the side where the tilted mirror is widely opened with respect to the measurement target. The radiation thermometer 0104, which is arranged with the optical axis of the light intake port 0103 facing the surface of the measurement target, and the tilt mirror and / or the radiation light from the measurement target incident on the radiation light intake port of the radiation thermometer are blocked. It is composed of a hemispherical mirror 0105 which is arranged in front of the radiation thermometer with a hole 0106 which does not exist, and whose convex side is the synchrotron radiation intake side. In addition, the trajectory that travels to the radiation thermometer while alternately colliding with and reflecting between the tilted mirror and the measurement target in the figure conceptually indicates the synchrotron radiation emitted in the normal direction from one point x ₀ of the measurement target. It is a thing.

Here, the measurement target has a planar spread, and a predetermined range has substantially the same temperature. This predetermined range is a range in which measurements for temperature control are assumed after undergoing individual steps such as rolling and surface treatment in, for example, a steel sheet manufacturing process. The tilt mirror is arranged within the predetermined range. In addition, the measurement targets are metals and semiconductors, and in particular, low-radiation aluminum, gold, silver, copper, polished steel, etc., which cause measurement errors with conventional tilted mirror multiple reflection thermometers, are measured. Even if this is the case, the temperature can be measured with little error.

Further, as the tilt mirror, a flat plate having a high reflectance whose surface is treated with gold plating or the like is used. In the present invention, the higher the reflectance of the tilted mirror is, the more preferable it is, and the more preferably the reflectance is 0.95 or more.

Further, the higher the reflectance of the hemispherical mirror is, the more preferable it is, and the more preferably the reflectance is 0.95 or more. Since the hemispherical mirror functions to reflect the light from the measurement target or the tilted mirror, the diameter of the hole is preferably small, and the diameter is several mm depending on the performance related to light reception such as the focus of the radiation thermometer. It is enough.
≪Apparent emissivity due to multiple reflection with tilted mirror ε _a ≫

Radiation thermometer 0104 is located toward the optical axis of the emitted light inlet 0103 to x ₄ is one point of a predetermined range of the measurement object described above, light emitted from the x ₄ is focused to be incident ..

In the example of FIG. 1, the focus point on the measurement target of the radiation thermometer is "x ₄ ", and this " ₄ " means that the light incident on the radiation thermometer from the focus point radiates from the focus point. Not only the light that is emitted, but also the radiation that reaches the point of focus through the reflection between the measurement target and the tilt mirror, is reflected at that point, and can be incident on the radiation thermometer. It means the number of reflections that can occur most of the emitted light.

In Figure 1, the regularly reflected substantially at m ₄ emitted light is one point of the inclined mirror from the point x _3, further substantially regularly reflected by x ₄ enters the radiation thermometer. Similarly, light emitted from the point _{x 2 is, m 3, x 3, m} 4, and substantially regularly reflected at each point _{x 4} incident on the radiation thermometer. Thus, light incident on the radiation thermometer, as well as radiation from the _{x 4,} light emitted from each point of _{x 3, x 2, x 1} , x 0 is also included. Since the reflectance of the tilted mirror is extremely high, the synchrotron radiation from the tilted mirror can be ignored by lowering the temperature of the tilted mirror with respect to the measurement target (hereinafter, the same applies).

The synchrotron radiation incident on the radiation thermometer is not only the synchrotron radiation radiated from each point in the direction in which the tilt mirror opens (hereinafter, right direction), but also the direction in which the tilt mirror closes from each point (hereinafter, left). Synchrotron radiation emitted in the direction) is also included. For example, the emitted light towards a synchrotron radiation at point x ₄ to m ₄ is reflected and reaches the x ₀ by multiple reflections between the inclined mirror measured, back to x ₄ through the multiple reflection by the same route It reflects and enters the radiation thermometer. Similarly, radiation from each point _{x 3,} x _2, x ₁ to the left direction reaches the x _0, through multiple reflection reflects back to x ₄ is incident on the radiation thermometer.

Here, the spectral radiance L _λ (T) (wavelength λ, temperature T) from each point of x ₄ , x ₃ , x ₂ , x ₁ , and x ₀ is the blackbody spectral radiance L _{b, λ} ( It is obtained by multiplying T) by the emissivity ε of the measurement target and the reflectance according to the reflection. Assuming that the emissivity of the measurement target is ε, the reflectance is (1-ε) according to Kirchhoff's law and energy conservation law (the measurement target is metal and the transmittance can be regarded as 0). If the reflectance of the tilted mirror is ρ, ρ is multiplied each time it reflects with the tilted mirror, and (1-ε) is multiplied each time it reflects with the measurement target.

For example, light emitted from the point x ₂ in the right direction is reflected inclined mirror and twice with m ₃ and m _4, since the reflected measurement object and twice with x ₃ and x _4, enters the radiation thermometer The spectral radiance is obtained by multiplying L _{b, λ} (T) by ερ ² (1-ε) ² as a coefficient.

Equation 1 shows the coefficient corresponding to such reflection as the coefficient at the point x _i on the measurement target. ε _i is the spectral emissivity at point x _i (i = 1,2,3, ···, n).

Radiation beam incident on the radiation thermometer through the multiple reflections from the point x _i is proportional to the coefficient of (Equation 1). Then, since i can take from 0 to n, the sum phi _r of all the radiant flux incident from each point is proportional to the second equation in Equation 2 below.

On the other hand, the radiant flux heading to the left is reflected at the point x ₀ and travels to the right as described above. Since i can be taken from 0 to n, the sum φ _l of all the radiant fluxes that are reflected from each point to the left at the point x ₀ , travel to the right, and are incident on the radiation thermometer is given by the following mathematical formula 3. Is proportional to the second equation of.

These results are all the radiant flux phi _i the emitted incident on a radiation thermometer from the point x _i, the sum of the phi _l of phi _r and Equation 3 in Equation 2, it is the right-hand side second equation 4 below Proportional to the equation.

Radiation thermometer, a spectral radiance L _a apparent that corresponds to the radiation flux of Equation 4, for measuring the right-hand side of Equation 5 below. The first term on the right side of Equation 5 corresponds to the contribution in the right direction only, and the second term corresponds to the contribution in the left direction.

Since L _{b and λ} (T) are blackbody spectral radiances at temperature T and wavelength λ, the apparent spectral emissivity ε _a of the radiant flux incident on the radiation thermometer due to multiple reflections between the tilted mirror and the measurement target. Is the following formula 6.
_≪Effective emissivity ε _eff by multiple reflection with hemispherical _mirror≫

_(In the example of FIG. 1, point x ₄₎ points x _n through the multiple reflection between the inclined mirror and the measurement object radiation beam towards the radiation thermometer from provided hemispherical mirror disposed in front of the radiation thermometer It enters the radiation thermometer through the hole, but the radiant flux from the point _xn travels with a certain extent, so it is reflected by the mirror surface around the hole of the hemispherical mirror.

By configuring the radius of the curved surface of the hemispherical mirror to be substantially the same as the distance from the point x _n to the mirror surface of the hemispherical mirror, the radiant flux reflected by the hemispherical mirror returns to the point x _n and is measured with the tilt mirror. The radiant flux that travels by multiple reflections in the optical path composed of the object, returns to the point _xn , and heads for the radiation thermometer, enters the radiation thermometer and is reflected again by the hemispherical mirror to return to the point _xn .

Since such multiple reflections occur, the configuration consisting of the tilted mirror and the temperature measurement target is regarded as an equivalent radiator with temperature T and apparent spectral emissivity ε _a (apparent reflectance ρ _a = 1-ε _a ). Can be regarded. Then, as shown in FIG. 2, the tilted mirror multiple reflection type radiation thermometer of the present invention has a mechanism of measuring the temperature with the radiation thermometer 0203 by utilizing the multiple reflection of the equivalent radiator 0201 and the hemispherical mirror 0202. It can be said that it is composed.

Here, the apparent spectral emissivity ε _eff of the radiant flux incident on the radiation thermometer through the hole of the hemispherical mirror (to avoid confusion with ε _a , hereinafter referred to as the effective emissivity ε _eff ) is the equivalent radiation. The multiple reflections between the body and the hemispherical mirror can be shown in Equation 7 (ρ _m in the equation is the emissivity of the hemispherical mirror).

Therefore, the spectral radiance L _eff detected by the radiation thermometer from the object to be measured at the temperature T is expressed by Equation 8.

Here, L _{b and λ} (T) represent the blackbody spectral radiance at the temperature T and the wavelength λ. As described above, the equivalent radiator consisting of the measurement target of the spectral emissivity ε _i and the tilted mirror has an apparent spectral emissivity ε _a , and further, the final effective spectral emissivity from the hole due to multiple reflections with the hemispherical mirror. Increases to ε _eff .

As described above, by superimposing and using not only the reflection with the tilted mirror but also the reflection by the hemispherical mirror, it is possible to increase the apparent spectral emissivity as compared with the conventional tilted mirror multiple reflection type radiation thermometer. It is possible to measure the temperature with little error.

In the above description, the radiation thermometer has been described in a manner in which it is arranged toward the measurement target. However, even if the radiation thermometer is arranged toward the tilt mirror, the effect of increasing the apparent emissivity can be obtained as well. As explained the principle that the apparent emissivity increases using various formulas, the number of reflections at the measurement target is reduced by only one of the coefficients of the emissivity of the measurement target itself, and the apparent emissivity The effect on the effect of increasing is small. Further, two radiation thermometers, a radiation thermometer directed at the measurement target and a radiation thermometer directed at the tilt mirror, may be arranged. In this case, since two relational expressions for obtaining the effective emissivity can be obtained, for example, the emissivity of the measurement target can be calculated.
<More preferred embodiment>

This aspect is based on the above-mentioned tilt mirror multiple reflection type radiation thermometer, and the effective emissivity can be increased more effectively by specifying the installation angle of the tilt mirror and the radiation thermometer with respect to the measurement target. is there.

FIG. 3 is a conceptual diagram showing a tilted mirror multiple reflection type radiation thermometer in this embodiment. As shown in the figure, the tilt mirror 0302 is arranged at an angle β with respect to the measurement target 0301. Then, the radiation thermometer is arranged so that the angle 0304 between the optical axis of the synchrotron radiation intake port of the radiation thermometer 0303 and the normal of the surface of the measurement target is 2nβ (n is the number of reflections with the measurement target). ..

Here, assuming that the distance from the base point at which the measurement target and the tilted mirror virtually intersect to the tilted mirror in the normal direction at a point at a distance x ₀ is h ₀ , h ₀ = x ₀ tan β. Then, the distance x _n from the base point reached by reflecting n times with the measurement target is expressed by Equation 9.

We simulated how large the apparent emissivity would be with such an arrangement. The emissivity ε to be measured was 0.05, 0.1, 0.2, ... 0.9, and the number of reflections n was calculated for 4 times and 8 times.

FIG. 4A is a diagram showing the relationship between the emissivity ε of the measurement target and the apparent emissivity ε _a when n = 8. As shown in the figure, when the emissivity ε of the measurement target was 0.5, the apparent emissivity ε _a exceeded 0.95. If the emissivity is 0.95 or more, it is sufficiently possible to consider it as blackbody radiation and measure it. Further, FIG. 4B shows the result when n = 4, and as shown in the figure, the emissivity ε of the measurement target was 0.6 and the apparent emissivity ε _a exceeded 0.95. ..

Furthermore, we simulated how much the effective emissivity _eff was increased by the combination with the hemispherical mirror. The number of reflections and the crossing angle with the tilted mirror are the same conditions as in the previous simulation. FIG. 5 is a diagram showing as a table the emissivity ε, the apparent emissivity ε _a, and the effective emissivity ε _eff of the measurement target as simulation results.

The emissivity ε to be measured, the apparent emissivity ε _a increased by the tilted mirror, and the effective emissivity ε _eff when a hemispherical mirror is used. As described above, in order for the apparent emissivity ε _a to exceed 0.95 when only the tilt mirror is used, it is necessary that ε is 0.5 or more when the number of reflections is n = 8. Therefore, it was necessary that ε was 0.6 or more when the number of reflections was n = 4.

However, by using the hemispherical mirror, the effective emissivity ε _eff exceeds 0.95 even if ε is 0.1 when the number of reflections is n = 8. Further, even when the number of reflections n = 4, if the emissivity ε to be measured is 0.2 or more, the effective emissivity ε _eff exceeds 0.95. FIG. 6 is a diagram showing this result superimposed on FIG.

The emissivity of unoxidized aluminum and steel sheets may be less than 0.1. With the conventional tilted mirror multiple reflection type radiation thermometer, it was not possible to accurately measure the temperature of such a substance with extremely low emissivity, but in this embodiment, the effective emissivity should be close to the blackbody emissivity. This makes it possible to measure the temperature with sufficient accuracy.
<Application>

The tilted mirror multiple reflection type radiation thermometer of the present embodiment can be applied to various manufacturing processes that require temperature control. For example, a known annealing device that heat-treats various objects and a tilted mirror multiple reflection type radiation thermometer can be combined and applied as an annealing system. Since it is important to control the temperature of the processing target in the annealing treatment, the temperature control is preferably performed by setting the range in which the temperature control is required in the processing target as the measurement target in the predetermined range in the tilt mirror multiple reflection type radiation thermometer. However, the object can be annealed.

The processing target of the annealing device is not limited, but the semiconductor wafer annealing device is particularly suitable. In the semiconductor wafer manufacturing process, annealing is performed to restore crystallinity and improve film quality after ion injection. However, temperature control is important and the degree of oxidation of the target surface changes and the emissivity fluctuates. Although it was difficult to measure the temperature accurately with a radiation thermometer, it is possible to measure the temperature accurately by using this tilt mirror multiple reflection type radiation thermometer.

It is also preferable to combine the annealing device and the tilt mirror multiple reflection type thermometer to form an annealing system. For example, in the manufacturing process of high-brightness stainless steel sheet, continuous annealing treatment is performed to remove internal stress and adjust the crystal structure, but the emissivity of high-brightness stainless steel is low and the surface of the stainless steel sheet is oxidized during the process. The emissivity changes greatly due to film formation. The tilted mirror multiple reflection type radiation thermometer can accurately measure the temperature of such an object by increasing the apparent emissivity.

Further, it can be suitably used for temperature control in a rolling process or a CGL (Continuous Galvanized Line), and it is also preferable to combine it with an apparatus for performing those processes.

It should be noted that although a preferred embodiment in which the system is configured by combining the tilted mirror multiple reflection type radiation thermometer of the present embodiment with various devices is shown, the same applies to the tilted mirror multiple reflection type radiation thermometer of the second embodiment described later. The system can be configured with various devices.
<Effect>

The present embodiment provides a tilted mirror multiple reflection type radiation thermometer capable of increasing the apparent emissivity as compared with a conventional tilted mirror multiple reflection type radiation thermometer and improving the accuracy of temperature measurement. Can be done.
<Embodiment 2>
<Overview>

This embodiment is based on the first embodiment, and by arranging a P-polarizer in front of the synchrotron radiation intake port of the radiation thermometer, only the P-polarized light is taken into the synchrotron radiation intake port. It is a thing.
<Composition>

FIG. 7 is a conceptual diagram showing the tilted mirror multiple reflection type radiation thermometer of the present embodiment. As shown in the figure, by arranging the P-polarizer 0701 in front of the synchrotron radiation intake port 0702 of the radiation thermometer, only the P-polarized light of the radiation from the measurement target 0705 passing through the hole 0704 of the hemispherical mirror 0703 is taken. It is configured to be crowded.

As a characteristic of the emissivity in the radiation direction, as the angle θ with respect to the normal of the material surface increases, the P-polarized emissivity increases, peaks near θ = 85 °, and converges to zero at θ = 90 °. .. FIG. 8 is a diagram showing emissivity characteristics using aluminum as an example, and shows P-polarized emissivity ε _{λ, p} (θ) at a wavelength λ = 1.55 μm, unpolarized emissivity ε _λ (θ), and S-polarized light. It shows the emissivity ε _{λ, s} (θ).

As shown in the figure, the P-polarized emissivity is significantly larger than the vertical (θ = 0 °) emissivity near 80 °, and is larger than the unpolarized emissivity and the S-polarized emissivity. Still, the P-polarized emissivity at 80 ° is only 0.108.

We simulated how large the apparent emissivity of such a substance with extremely low emissivity, such as aluminum, by using multiple reflections of a tilted mirror and a hemispherical mirror and receiving only P-polarized light. .. In addition to aluminum, cold-rolled steel sheets, stainless steel sheets, and silicon wafers were also simulated. In the calculation, the P-polarized emissivity ε _{λ, p} (2nβ) is concretely numerically solved from the complex refractive index of each sample, and this is introduced into the above (Equation 6) and (Equation 7) to obtain the apparent emissivity. The rate ε _a and the effective emissivity ε _eff were obtained. The calculation method from the complex refractive index to the polarized emissivity is based on the following references.
(Reference) Toru Inuchi, Hiroki Ishii, Radiation temperature measurement method for glossy metals near room temperature using polarized brightness, Proceedings of the Society of Instrument and Control Engineers, 36,395/401 (2000)

The result is shown in FIG. It should be noted that this is the case where the number of reflections by the tilt mirror is n = 8. Even for samples with extremely low directional emissivity such as aluminum (0.021 to 0.028 at vertical to 40 °, 0.108 at 80 °), the effective P polarized emissivity ε _eff is increased to 0.908, which is extremely effective. It is clear that there is.
<Effect>

By capturing only P-polarized light with a radiation thermometer, it is possible to make it larger than the effective emissivity, and it is possible to accurately measure the temperature of a substance with an extremely low emissivity.

0101 Measurement target 0102 Tilt mirror 0103 Synchrotron radiation intake 0104 Radiation thermometer 0105 Hemispherical mirror 0106 Hole

Claims (6)

A tilt mirror is placed on the predetermined range of the measurement target, which has a planar spread and the predetermined range is substantially the same temperature, and the radiation light (infrared light) from the measurement target between the tilt mirror and the measurement target is emitted. It is a tilted mirror multiple reflection type radiation thermometer that measures the temperature of the object to be measured by multiple reflections (including).
Tilt mirror and
A radiation thermometer with the optical axis of the synchrotron radiation intake pointed toward the wide open side of the tilted mirror and / or the surface of the predetermined range to be measured.
A tilted mirror incident on the synchrotron radiation intake of the radiation thermometer and / and a hole that does not block the synchrotron radiation from the measurement target are made and placed in front of the radiation thermometer, and the synchrotron radiation intake side is convex. Hemispherical mirror and
Inclined mirror consisting of multiple reflection type radiation thermometer. The tilted mirror multiple reflection according to claim 1, wherein the angle formed by the optical axis of the synchrotron radiation intake port and the normal of the surface of the predetermined range of the measurement target is an even multiple of the angle formed by the tilt mirror and the measurement target. Type radiation thermometer. The tilted mirror multiple reflection according to claim 1 or 2, wherein a P-polarized light is arranged in front of the synchrotron radiation intake of the radiation thermometer so that only P-polarized light is taken into the synchrotron radiation intake. Type radiation thermometer. An annealing device that anneals a measurement target in a predetermined range,
The tilted mirror multiple reflection type radiation thermometer according to any one of claims 1 to 3.
Annealing system consisting of. The annealing system according to claim 4, wherein the annealing device is a semiconductor wafer annealing device. An annealing device that annealates the measurement target in a predetermined range,
The tilted mirror multiple reflection type radiation thermometer according to any one of claims 1 to 3.
Annealing system consisting of.