JP2019085475A - Sealant rubber material and sealant including the same - Google Patents
Sealant rubber material and sealant including the same Download PDFInfo
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- JP2019085475A JP2019085475A JP2017213761A JP2017213761A JP2019085475A JP 2019085475 A JP2019085475 A JP 2019085475A JP 2017213761 A JP2017213761 A JP 2017213761A JP 2017213761 A JP2017213761 A JP 2017213761A JP 2019085475 A JP2019085475 A JP 2019085475A
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- Prior art keywords
- ionic liquid
- mass
- sealing material
- rubber material
- rubber
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- 229920001971 elastomer Polymers 0.000 title claims abstract description 60
- 239000000463 material Substances 0.000 title claims abstract description 33
- 239000000565 sealant Substances 0.000 title abstract 4
- 239000002608 ionic liquid Substances 0.000 claims abstract description 34
- 239000003566 sealing material Substances 0.000 claims description 43
- 239000000203 mixture Substances 0.000 claims description 27
- 229920001973 fluoroelastomer Polymers 0.000 claims description 23
- 150000001768 cations Chemical class 0.000 claims description 14
- 150000001450 anions Chemical class 0.000 claims description 11
- 239000003431 cross linking reagent Substances 0.000 claims description 10
- 125000002091 cationic group Chemical group 0.000 claims description 5
- 150000003949 imides Chemical class 0.000 claims description 5
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 claims description 4
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 claims description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052731 fluorine Inorganic materials 0.000 abstract description 4
- 239000011737 fluorine Substances 0.000 abstract description 4
- 239000004971 Cross linker Substances 0.000 abstract 1
- 238000004132 cross linking Methods 0.000 description 16
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 16
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 13
- 238000000465 moulding Methods 0.000 description 11
- 150000002978 peroxides Chemical class 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 238000012360 testing method Methods 0.000 description 10
- 239000002216 antistatic agent Substances 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- BLTXWCKMNMYXEA-UHFFFAOYSA-N 1,1,2-trifluoro-2-(trifluoromethoxy)ethene Chemical compound FC(F)=C(F)OC(F)(F)F BLTXWCKMNMYXEA-UHFFFAOYSA-N 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 230000006835 compression Effects 0.000 description 6
- 238000007906 compression Methods 0.000 description 6
- -1 hexafluoro borate Chemical compound 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- NJMWOUFKYKNWDW-UHFFFAOYSA-N 1-ethyl-3-methylimidazolium Chemical compound CCN1C=C[N+](C)=C1 NJMWOUFKYKNWDW-UHFFFAOYSA-N 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 4
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- IQQRAVYLUAZUGX-UHFFFAOYSA-N 1-butyl-3-methylimidazolium Chemical compound CCCCN1C=C[N+](C)=C1 IQQRAVYLUAZUGX-UHFFFAOYSA-N 0.000 description 3
- OSCFFOTZWZZXPR-UHFFFAOYSA-N 4-methyl-1-octylpyridin-1-ium Chemical compound CCCCCCCC[N+]1=CC=C(C)C=C1 OSCFFOTZWZZXPR-UHFFFAOYSA-N 0.000 description 3
- 239000002482 conductive additive Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- DMWVYCCGCQPJEA-UHFFFAOYSA-N 2,5-bis(tert-butylperoxy)-2,5-dimethylhexane Chemical compound CC(C)(C)OOC(C)(C)CCC(C)(C)OOC(C)(C)C DMWVYCCGCQPJEA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- 229920006169 Perfluoroelastomer Polymers 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 239000006230 acetylene black Substances 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000005251 gamma ray Effects 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 239000003273 ketjen black Substances 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- HJHUXWBTVVFLQI-UHFFFAOYSA-N tributyl(methyl)azanium Chemical compound CCCC[N+](C)(CCCC)CCCC HJHUXWBTVVFLQI-UHFFFAOYSA-N 0.000 description 2
- KJWHEZXBZQXVSA-UHFFFAOYSA-N tris(prop-2-enyl) phosphite Chemical compound C=CCOP(OCC=C)OCC=C KJWHEZXBZQXVSA-UHFFFAOYSA-N 0.000 description 2
- QEQBMZQFDDDTPN-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy benzenecarboperoxoate Chemical compound CC(C)(C)OOOC(=O)C1=CC=CC=C1 QEQBMZQFDDDTPN-UHFFFAOYSA-N 0.000 description 1
- KDGNCLDCOVTOCS-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy propan-2-yl carbonate Chemical compound CC(C)OC(=O)OOC(C)(C)C KDGNCLDCOVTOCS-UHFFFAOYSA-N 0.000 description 1
- BLKRGXCGFRXRNQ-SNAWJCMRSA-N (z)-3-carbonoperoxoyl-4,4-dimethylpent-2-enoic acid Chemical compound OC(=O)/C=C(C(C)(C)C)\C(=O)OO BLKRGXCGFRXRNQ-SNAWJCMRSA-N 0.000 description 1
- NALFRYPTRXKZPN-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)-3,3,5-trimethylcyclohexane Chemical compound CC1CC(C)(C)CC(OOC(C)(C)C)(OOC(C)(C)C)C1 NALFRYPTRXKZPN-UHFFFAOYSA-N 0.000 description 1
- KCUGPPHNMASOTE-UHFFFAOYSA-N 1,2,3-trimethylimidazol-1-ium Chemical compound CC=1N(C)C=C[N+]=1C KCUGPPHNMASOTE-UHFFFAOYSA-N 0.000 description 1
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 description 1
- HZMRWVMITKPWFK-UHFFFAOYSA-N 1,3,5-tris(2,3,3-trifluoroprop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound FC(F)=C(F)CN1C(=O)N(CC(F)=C(F)F)C(=O)N(CC(F)=C(F)F)C1=O HZMRWVMITKPWFK-UHFFFAOYSA-N 0.000 description 1
- MPJPKEMZYOAIRN-UHFFFAOYSA-N 1,3,5-tris(2-methylprop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound CC(=C)CN1C(=O)N(CC(C)=C)C(=O)N(CC(C)=C)C1=O MPJPKEMZYOAIRN-UHFFFAOYSA-N 0.000 description 1
- HVVRUQBMAZRKPJ-UHFFFAOYSA-N 1,3-dimethylimidazolium Chemical compound CN1C=C[N+](C)=C1 HVVRUQBMAZRKPJ-UHFFFAOYSA-N 0.000 description 1
- IPJGAEWUPXWFPL-UHFFFAOYSA-N 1-[3-(2,5-dioxopyrrol-1-yl)phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC(N2C(C=CC2=O)=O)=C1 IPJGAEWUPXWFPL-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- XUAXVBUVQVRIIQ-UHFFFAOYSA-N 1-butyl-2,3-dimethylimidazol-3-ium Chemical compound CCCCN1C=C[N+](C)=C1C XUAXVBUVQVRIIQ-UHFFFAOYSA-N 0.000 description 1
- REACWASHYHDPSQ-UHFFFAOYSA-N 1-butylpyridin-1-ium Chemical compound CCCC[N+]1=CC=CC=C1 REACWASHYHDPSQ-UHFFFAOYSA-N 0.000 description 1
- SWWLEHMBKPSRSI-UHFFFAOYSA-N 1-hexyl-2,3-dimethylimidazol-3-ium Chemical compound CCCCCCN1C=C[N+](C)=C1C SWWLEHMBKPSRSI-UHFFFAOYSA-N 0.000 description 1
- RVEJOWGVUQQIIZ-UHFFFAOYSA-N 1-hexyl-3-methylimidazolium Chemical compound CCCCCCN1C=C[N+](C)=C1 RVEJOWGVUQQIIZ-UHFFFAOYSA-N 0.000 description 1
- AMKUSFIBHAUBIJ-UHFFFAOYSA-N 1-hexylpyridin-1-ium Chemical compound CCCCCC[N+]1=CC=CC=C1 AMKUSFIBHAUBIJ-UHFFFAOYSA-N 0.000 description 1
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 description 1
- ODBCKCWTWALFKM-UHFFFAOYSA-N 2,5-bis(tert-butylperoxy)-2,5-dimethylhex-3-yne Chemical compound CC(C)(C)OOC(C)(C)C#CC(C)(C)OOC(C)(C)C ODBCKCWTWALFKM-UHFFFAOYSA-N 0.000 description 1
- JGBAASVQPMTVHO-UHFFFAOYSA-N 2,5-dihydroperoxy-2,5-dimethylhexane Chemical compound OOC(C)(C)CCC(C)(C)OO JGBAASVQPMTVHO-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- VFTWMPNBHNNMAV-UHFFFAOYSA-N 2-tert-butylperoxy-1,4-di(propan-2-yl)benzene Chemical compound CC(C)C1=CC=C(C(C)C)C(OOC(C)(C)C)=C1 VFTWMPNBHNNMAV-UHFFFAOYSA-N 0.000 description 1
- BIISIZOQPWZPPS-UHFFFAOYSA-N 2-tert-butylperoxypropan-2-ylbenzene Chemical compound CC(C)(C)OOC(C)(C)C1=CC=CC=C1 BIISIZOQPWZPPS-UHFFFAOYSA-N 0.000 description 1
- PDFSXHZXNZCKNF-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8-dodecafluorodeca-1,9-diene Chemical compound C=CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C=C PDFSXHZXNZCKNF-UHFFFAOYSA-N 0.000 description 1
- WXMVWUBWIHZLMQ-UHFFFAOYSA-N 3-methyl-1-octylimidazolium Chemical compound CCCCCCCCN1C=C[N+](C)=C1 WXMVWUBWIHZLMQ-UHFFFAOYSA-N 0.000 description 1
- KLMZKZJCMDOKFE-UHFFFAOYSA-O 3-octyl-1h-imidazol-3-ium Chemical compound CCCCCCCCN1C=C[NH+]=C1 KLMZKZJCMDOKFE-UHFFFAOYSA-O 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-O Methylammonium ion Chemical compound [NH3+]C BAVYZALUXZFZLV-UHFFFAOYSA-O 0.000 description 1
- PQBAWAQIRZIWIV-UHFFFAOYSA-N N-methylpyridinium Chemical compound C[N+]1=CC=CC=C1 PQBAWAQIRZIWIV-UHFFFAOYSA-N 0.000 description 1
- 239000006057 Non-nutritive feed additive Substances 0.000 description 1
- 229920012104 Pebax® MH 2030 Polymers 0.000 description 1
- 229920008384 Pebax® MV 1074 SP 01 Polymers 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-O Pyrazolium Chemical compound C1=CN[NH+]=C1 WTKZEGDFNFYCGP-UHFFFAOYSA-O 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- HZTNYDWTDTYXQC-UHFFFAOYSA-N bis(prop-2-ynyl) benzene-1,4-dicarboxylate Chemical compound C#CCOC(=O)C1=CC=C(C(=O)OCC#C)C=C1 HZTNYDWTDTYXQC-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- IRVXMVSXMSXNLD-UHFFFAOYSA-N fluoromethoxyethene Chemical compound FCOC=C IRVXMVSXMSXNLD-UHFFFAOYSA-N 0.000 description 1
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- WRIRWRKPLXCTFD-UHFFFAOYSA-N malonamide Chemical compound NC(=O)CC(N)=O WRIRWRKPLXCTFD-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- BLYOHBPLFYXHQA-UHFFFAOYSA-N n,n-bis(prop-2-enyl)prop-2-enamide Chemical compound C=CCN(CC=C)C(=O)C=C BLYOHBPLFYXHQA-UHFFFAOYSA-N 0.000 description 1
- DYUWTXWIYMHBQS-UHFFFAOYSA-N n-prop-2-enylprop-2-en-1-amine Chemical compound C=CCNCC=C DYUWTXWIYMHBQS-UHFFFAOYSA-N 0.000 description 1
- 125000000864 peroxy group Chemical group O(O*)* 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- PNWOTXLVRDKNJA-UHFFFAOYSA-N tert-butylperoxybenzene Chemical compound CC(C)(C)OOC1=CC=CC=C1 PNWOTXLVRDKNJA-UHFFFAOYSA-N 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 1
- GRPURDFRFHUDSP-UHFFFAOYSA-N tris(prop-2-enyl) benzene-1,2,4-tricarboxylate Chemical compound C=CCOC(=O)C1=CC=C(C(=O)OCC=C)C(C(=O)OCC=C)=C1 GRPURDFRFHUDSP-UHFFFAOYSA-N 0.000 description 1
- XHGIFBQQEGRTPB-UHFFFAOYSA-N tris(prop-2-enyl) phosphate Chemical compound C=CCOP(=O)(OCC=C)OCC=C XHGIFBQQEGRTPB-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000004073 vulcanization Methods 0.000 description 1
Landscapes
- Sealing Material Composition (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
本発明は、シール材用ゴム材料及びそれを用いたシール材に関する。 The present invention relates to a rubber material for a sealing material and a sealing material using the same.
フッ素ゴム製のシール材において、その帯電防止のために導電性材料を含有させることが知られている。例えば、特許文献1には、フッ素ゴムにアセチレンブラックやケッチェンブラック等の導電性添加剤を配合したゴム組成物で形成されたシール材が開示されている。 In the sealing material made of fluorine rubber, it is known to contain a conductive material for the purpose of antistatic. For example, Patent Document 1 discloses a sealing material formed of a rubber composition obtained by blending a fluororubber with a conductive additive such as acetylene black or ketjen black.
アセチレンブラックやケッチェンブラック等の導電性添加剤を配合したゴム組成物の場合、導電性添加剤の分散状態により電気特性が安定しない、金属不純物を多く含むことからクリーン度を要求される半導体製造装置や食品関連の用途には使用しにくいという問題があった。また、黒色の為に識別が要求される用途にも使用することができないという問題もあった。 In the case of a rubber composition compounded with a conductive additive such as acetylene black or ketjen black, the electric characteristics are not stable due to the dispersed state of the conductive additive, and a large amount of metal impurities are contained, so semiconductor production is required There is a problem that it is difficult to use in equipment and food related applications. There is also a problem that it can not be used for applications where identification is required because of black.
本発明の課題は、帯電防止性能が安定で且つ識別性も優れるシール材を得ることである。 An object of the present invention is to obtain a sealing material having stable antistatic performance and excellent discrimination.
本発明は、未架橋の架橋性フッ素ゴムと、イオン液体と、架橋剤と、を含有するシール材用ゴム材料である。 The present invention is a rubber material for a sealing material containing an uncrosslinked crosslinkable fluororubber, an ionic liquid and a crosslinking agent.
本発明は、本発明のシール材用ゴム材料の前記架橋性フッ素ゴムが架橋したゴム組成物で形成されたシール材である。 The present invention is a sealing material formed of a rubber composition in which the crosslinkable fluororubber of the rubber material for a sealing material of the present invention is crosslinked.
本発明によれば、イオン液体を含有しているので、得られるシール材では、安定した帯電防止性能とともに、優れた識別性を得ることができる。 According to the present invention, since the ionic liquid is contained, the obtained sealing material can obtain excellent discrimination as well as stable antistatic performance.
以下、実施形態について詳細に説明する。 Hereinafter, the embodiment will be described in detail.
実施形態に係るシール材用ゴム材料は、シール材、特に、エッチング装置やプラズマCVD装置のようなプラズマを使用する半導体製造装置に使用されるOリング等のシール材の製造に好適に用いられるものである。 The rubber material for a sealing material according to the embodiment is suitably used for manufacturing a sealing material, in particular, a sealing material such as an O-ring used in a semiconductor manufacturing apparatus using a plasma such as an etching apparatus or a plasma CVD apparatus. It is.
実施形態に係るシール材用ゴム材料は、未架橋の架橋性フッ素ゴムと、イオン液体と、架橋剤とを含有する。 The rubber material for a sealing material according to the embodiment contains an uncrosslinked crosslinkable fluororubber, an ionic liquid, and a crosslinking agent.
架橋性フッ素ゴムとしては、例えば、テトラフルオロエチレン(TFE)の重合体(PTFE)、ビニリデンフルオライド(VDF)の重合体(PVDF)、ビニリデンフルオライド(VDF)とヘキサフルオロプロピレン(HFP)との共重合体(二元系FKM)、ビニリデンフルオライド(VDF)とヘキサフルオロプロピレン(HFP)とテトラフルオロエチレン(TFE)との共重合体(三元系FKM)、テトラフルオロエチレン(TFE)とプロピレン(Pr)との共重合体(FEP)、ビニリデンフルオライド(VDF)とプロピレン(Pr)とテトラフルオロエチレン(TFE)との共重合体、エチレン(E)とテトラフルオロエチレン(TFE)との共重合体(ETFE)、エチレン(E)とテトラフルオロエチレン(TFE)とパーフルオロメチルビニルエーテル(PMVE)との共重合体、ビニリデンフルオライド(VDF)とテトラフルオロエチレン(TFE)とパーフルオロメチルビニルエーテル(PMVE)との共重合体、テトラフルオロエチレン(TFE)とパーフルオロメチルビニルエーテル(PMVE)との共重合体(FFKM)、ビニリデンフルオライド(VDF)とパーフルオロメチルビニルエーテル(PMVE)との共重合体等が挙げられる。架橋性フッ素ゴムは、これらのうちの1種又は2種以上を用いることが好ましく、三元系FKMを用いることがより好ましい。架橋性フッ素ゴムは、パーオキサイド架橋する場合、分子中にヨウ素や臭素を有することが好ましい。 As the crosslinkable fluororubber, for example, a polymer of tetrafluoroethylene (TFE) (PTFE), a polymer of vinylidene fluoride (VDF) (PVDF), vinylidene fluoride (VDF) and hexafluoropropylene (HFP) Copolymer (binary FKM), copolymer of vinylidene fluoride (VDF), hexafluoropropylene (HFP) and tetrafluoroethylene (TFE) (three-component FKM), tetrafluoroethylene (TFE) and propylene Copolymer (FEP) with (Pr), copolymer of vinylidene fluoride (VDF) with propylene (Pr) and tetrafluoroethylene (TFE), co-polymer of ethylene (E) with tetrafluoroethylene (TFE) Polymer (ETFE), ethylene (E) and tetrafluoroethylene (TF) ) And perfluoromethylvinylether (PMVE), copolymers of vinylidene fluoride (VDF), tetrafluoroethylene (TFE) and perfluoromethylvinylether (PMVE), tetrafluoroethylene (TFE) and perco Examples thereof include copolymers (FFKM) with fluoromethyl vinyl ether (PMVE), copolymers of vinylidene fluoride (VDF) and perfluoromethyl vinyl ether (PMVE), and the like. It is preferable to use 1 type, or 2 or more types in these, and, as for a crosslinkable fluororubber, it is more preferable to use ternary FKM. In the case of peroxide crosslinking, the crosslinkable fluororubber preferably has iodine or bromine in the molecule.
イオン液体とは、カチオン成分及びアニオン成分で構成される塩であって、融点が100℃以下のものをいう。 The ionic liquid is a salt composed of a cationic component and an anionic component, and has a melting point of 100 ° C. or less.
イオン液体のカチオン成分としては、例えば、1-エチル-3-メチルイミダゾリウム、1-メチル-3-メチルイミダゾリウム、1-ブチル-3-メチルイミダゾリウム、1-ヘキシル-3-メチルイミダゾリウム、1-オクチル-3-メチルイミダゾリウム、1-メチル-2,3-ジメチルイミダゾリウム、1-ブチル-2,3-ジメチルイミダゾリウム、1-ヘキシル-2,3-ジメチルイミダゾリウム、1-オクチル-2,3-ジメチルイミダゾリウムなどのイミダゾリウム系カチオン;1-オクチル-4-メチル-ピリジニウム、1-メチル-ピリジニウム、1-ブチル-ピリジニウム、1-ヘキシル-ピリジニウムなどのピリジニウム系カチオン;トリブチルメチルアンモニウムなどの脂肪族アミン系カチオン;ピラゾリウム系カチオン等が挙げられる。 Examples of the cationic component of the ionic liquid include 1-ethyl-3-methylimidazolium, 1-methyl-3-methylimidazolium, 1-butyl-3-methylimidazolium, 1-hexyl-3-methylimidazolium, 1-Octyl-3-methylimidazolium, 1-methyl-2,3-dimethylimidazolium, 1-butyl-2,3-dimethylimidazolium, 1-hexyl-2,3-dimethylimidazolium, 1-octyl- Imidazolium-based cations such as 2,3-dimethylimidazolium; pyridinium-based cations such as 1-octyl-4-methyl-pyridinium, 1-methyl-pyridinium, 1-butyl-pyridinium, 1-hexyl-pyridinium; tributylmethylammonium And aliphatic amine-based cations; pyrazolium-based cations and the like.
アニオン成分としては、例えば、ビスフルオロスルホニルイミド、ビストリフルオロメタンスルホニルイミド、ビストリフルオロブタンスルホニルイミドなどのビスフルオロスルホニルイミド系アニオン;テトラフルオロボレート、ヘキサフルオロボレート、トリフルオロメタンスルホネートなどのフッ素化スルホン酸系アニオン;トリフルオロ酢酸などのフッ素化カルボン酸系アニオン;チオシアネート系アニオン;ジシアナミド系アニオン;テトラシアノボレート系アニオン等が挙げられる。 As an anion component, for example, bisfluorosulfonyl imide type anions such as bisfluorosulfonyl imide, bis trifluoromethane sulfonyl imide, bis trifluoro butane sulfonyl imide, and the like; fluorinated sulfonic acid type such as tetrafluoro borate, hexafluoro borate, trifluoro methane sulfonate and the like Anions; fluorinated carboxylic acid-based anions such as trifluoroacetic acid; thiocyanate-based anions; dicyanamide-based anions; tetracyanoborate-based anions and the like.
イオン液体は、これらのカチオン成分の1種又は2種以上と、アニオン成分の1種又は2種以上を含むことが好ましい。イオン液体のカチオン成分は、イミダゾリウム系カチオン、ピリジニウム系カチオン、脂肪族アミン系カチオンが好ましい。イオン液体のカチオン成分は、イミダゾリウム系カチオンでは、1-エチル-3-メチルイミダゾリウムが好ましく、ピリジニウム系カチオンでは、1-オクチル-4-メチル-ピリジニウムが好ましく、脂肪族アミン系カチオンでは、トリブチルメチルアンモニウムが好ましい。イオン液体のアニオン成分は、ビスフルオロスルホニルイミド系アニオンが好ましく、そのうち、ビストリフルオロメタンスルホニルイミド、ビストリフルオロブタンスルホニルイミドがより好ましい。 The ionic liquid preferably contains one or more of these cationic components and one or more of the anionic components. The cationic component of the ionic liquid is preferably an imidazolium-based cation, a pyridinium-based cation, or an aliphatic amine-based cation. The cation component of the ionic liquid is preferably 1-ethyl-3-methylimidazolium for imidazolium-based cations, and 1-octyl-4-methyl-pyridinium for pyridinium-based cations, and tributyl for aliphatic amine-based cations. Methyl ammonium is preferred. The anion component of the ionic liquid is preferably a bisfluorosulfonylimide type anion, and among these, bistrifluoromethanesulfonylimide and bistrifluorobutanesulfonylimide are more preferable.
実施形態に係るシール材用ゴム材料におけるイオン液体の含有量は、架橋性フッ素ゴム100質量部に対して、好ましくは0.01質量部以上10質量部以下、より好ましくは0.1質量部以上5質量部以下である。 The content of the ionic liquid in the rubber material for a sealing material according to the embodiment is preferably 0.01 parts by mass or more and 10 parts by mass or less, more preferably 0.1 parts by mass or more with respect to 100 parts by mass of the crosslinkable fluororubber It is 5 parts by mass or less.
架橋剤は、パーオキサイド架橋系であればパーオキサイド、ポリオール架橋系であればポリオール、アミン架橋系であればアミンがそれぞれ用いられるが、実施形態に係るシール材用ゴム材料は、パーオキサイド架橋系であって、架橋剤としてパーオキサイドを含有することが好ましい。 As the crosslinking agent, peroxide is used if it is a peroxide crosslinking system, polyol if it is a polyol crosslinking system, and amine if it is an amine crosslinking system, but the rubber material for a sealing material according to the embodiment is a peroxide crosslinking system. It is preferable to contain peroxide as a crosslinking agent.
架橋剤のパーオキサイドとしては、例えば、1,1-ビス(t-ブチルパーオキシ)-3,5,5-トリメチルシクロヘキサン、2,5-ジメチルヘキサン-2,5-ジヒドロパーオキサイド、ジ-t-ブチルパーオキサイド、t-ブチルクミルパーオキサイド、ジクミルパーオキサイド、α,α-ビス(t-ブチルパーオキシ)-p-ジイソプロピルベンゼン、2,5-ジメチル-2,5-ジ(t-ブチルパーオキシ)ヘキサン、2,5-ジメチル-2,5-ジ(t-ブチルパーオキシ)-ヘキシン-3、ベンゾイルパーオキサイド、t-ブチルパーオキシベンゼン、t-ブチルパーオキシマレイン酸、t-ブチルパーオキシイソプロピルカーボネート、t-ブチルパーオキシベンゾエイト等が挙げられる。架橋剤のパーオキサイドは、これらのうちの1種又は2種以上を用いることが好ましく、2,5-ジメチル-2,5-ジ(t-ブチルパーオキシ)ヘキサンを用いることがより好ましい。 The peroxide of the crosslinking agent may be, for example, 1,1-bis (t-butylperoxy) -3,5,5-trimethylcyclohexane, 2,5-dimethylhexane-2,5-dihydroperoxide, di-t -Butyl peroxide, t-butylcumyl peroxide, dicumyl peroxide, α, α-bis (t-butylperoxy) -p-diisopropylbenzene, 2,5-dimethyl-2,5-di (t-butyl) Peroxy) hexane, 2,5-dimethyl-2,5-di (t-butylperoxy) -hexyne-3, benzoyl peroxide, t-butylperoxybenzene, t-butylperoxymaleic acid, t-butyl Peroxy isopropyl carbonate, t-butyl peroxy benzoate and the like can be mentioned. It is preferable to use one or more of these peroxides as a crosslinking agent, and more preferable to use 2,5-dimethyl-2,5-di (t-butylperoxy) hexane.
実施形態に係るシール材用ゴム材料における架橋剤のパーオキサイドの含有量は、架橋性フッ素ゴム100質量部に対して、好ましくは0.5質量部以上10質量部以下、より好ましくは1質量部以上5質量部以下である。 The peroxide content of the crosslinking agent in the rubber material for a sealing material according to the embodiment is preferably 0.5 parts by mass or more and 10 parts by mass or less, more preferably 1 part by mass with respect to 100 parts by mass of the crosslinkable fluororubber It is 5 parts by mass or less.
実施形態に係るシール材用ゴム材料は、架橋助剤を更に含有していてもよい。架橋助剤としては、例えば、トリアリルシアヌレート、トリメタリルイソシアヌレート、トリアリルイソシアヌレート、トリアクリルホルマール、トリアリルトリメリテート、N,N’-m-フェニレンビスマレイミド、ジプロパギルテレフタレート、ジアリルフタレート、テトラアリルテレフタレートアミド、トリアリルホスフェート、ビスマレイミド、フッ素化トリアリルイソシアヌレート(1,3,5-トリス(2,3,3-トリフルオロ-2-プロペニル)-1,3,5-トリアジン-2,4,6-トリオン)、トリス(ジアリルアミン)-S-トリアジン、亜リン酸トリアリル、N,N-ジアリルアクリルアミド、1,6-ジビニルドデカフルオロヘキサン、ヘキサアリルホスホルアミド、N,N,N’,N’-テトラアリルフタルアミド、N,N,N’,N’-テトラアリルマロンアミド、トリビニルイソシアヌレート、2,4,6-トリビニルメチルトリシロキサン、トリ(5-ノルボルネン-2-メチレン)シアヌレート、トリアリルホスファイト等が挙げられる。架橋助剤は、これらのうちの1種又は2種以上を用いることが好ましく、トリアリルイソシアヌレートを用いることがより好ましい。 The rubber material for a sealing material according to the embodiment may further contain a crosslinking aid. Examples of crosslinking assistants include triallyl cyanurate, trimethallyl isocyanurate, triallyl isocyanurate, triacrylic formal, triallyl trimellitate, N, N'-m-phenylene bismaleimide, dipropargyl terephthalate, diallyl. Phthalate, tetraallyl terephthalate amide, triallyl phosphate, bismaleimide, fluorinated triallylisocyanurate (1,3,5-tris (2,3,3-trifluoro-2-propenyl) -1,3,5-triazine -2,4,6-trione), tris (diallylamine) -S-triazine, triallyl phosphite, N, N-diallylacrylamide, 1,6-divinyldodecafluorohexane, hexaallylphosphoramide, N, N, N ', N'- tetraallylphthalamide, N, N, N , N'- tetraallyl malonamide, trivinyl isocyanurate, 2,4,6-vinyl methyl trisiloxane, tri (5-norbornene-2-methylene) cyanurate, triallyl phosphite, and the like. It is preferable to use 1 type, or 2 or more types of these crosslinking adjuvants, and it is more preferable to use triallyl isocyanurate.
実施形態に係るシール材用ゴム材料における架橋助剤の含有量は、架橋性フッ素ゴム100質量部に対して、好ましくは0.1質量部以上20質量部以下である。 The content of the crosslinking aid in the rubber material for a sealing material according to the embodiment is preferably 0.1 parts by mass or more and 20 parts by mass or less with respect to 100 parts by mass of the crosslinkable fluororubber.
実施形態に係るシール材用ゴム材料は、架橋性フッ素ゴム以外のゴム成分であるシリコーンゴム等を含有していてもよい。また、実施形態に係るシール材用ゴム材料は、製造するシール材の用途によっては、カーボンブラックやシリカなどの補強材、可塑剤、加工助剤、加硫促進剤、老化防止剤等を含有していてもよい。但し、プラズマ雰囲気下でのパーティクルの発生が問題となる半導体製造装置で用いられるシール材を製造する場合には、カーボンブラック、シリカ、金属酸化物等の粉状乃至粒状の無機充填材の含有量は、架橋性フッ素ゴム100質量部に対して、好ましくは10質量部以下、より好ましくは5質量部以下、更に好ましくは3質量部以下、最も好ましくは0質量部(配合しない)である。さらに、プラズマ雰囲気下でのパーティクルの発生が問題となる半導体製造装置で用いられるシール材の場合、架橋性フッ素ゴムには、アルケニル基を2以上有するパーフルオロエラストマーを配合した架橋性フッ素ゴム組成物を使用することが好適である。 The rubber material for a sealing material according to the embodiment may contain silicone rubber or the like which is a rubber component other than the crosslinkable fluororubber. In addition, the rubber material for a sealing material according to the embodiment contains a reinforcing material such as carbon black or silica, a plasticizer, a processing aid, a vulcanization accelerator, an antiaging agent, etc. depending on the use of the sealing material to be produced. It may be However, when manufacturing a sealing material used in a semiconductor manufacturing apparatus in which generation of particles in a plasma atmosphere causes a problem, the content of powdery or granular inorganic filler such as carbon black, silica, metal oxide, etc. Is preferably 10 parts by mass or less, more preferably 5 parts by mass or less, still more preferably 3 parts by mass or less, and most preferably 0 parts by mass (not blended) with respect to 100 parts by mass of the crosslinkable fluororubber. Furthermore, in the case of a sealing material used in a semiconductor manufacturing apparatus in which generation of particles in a plasma atmosphere is a problem, a crosslinkable fluorine rubber composition containing a perfluoroelastomer having two or more alkenyl groups in the crosslinkable fluorine rubber It is preferred to use
実施形態に係るシール材用ゴム材料は、オープンロールなどの開放式のゴム混練機、或いは、ニーダーなどの密閉式のゴム混練機を用いて製造することができる。 The rubber material for a sealing material according to the embodiment can be manufactured using an open rubber kneader such as an open roll or a closed rubber kneader such as a kneader.
以上の構成の実施形態に係る未架橋ゴム組成物によれば、イオン液体を含有しているので、得られるシール材では、安定した帯電防止性能とともに、優れた識別性を得ることができる。 According to the non-crosslinked rubber composition according to the embodiment of the above configuration, since the ionic liquid is contained, in the obtained sealing material, excellent identification performance can be obtained together with stable antistatic performance.
次に、実施形態に係るシール材用ゴム材料を用いたシール材の製造方法の一例について説明する。 Next, an example of the manufacturing method of the sealing material using the rubber material for sealing materials which concerns on embodiment is demonstrated.
シール材の製造では、まず、実施形態に係るシール材用ゴム材料の所定量を、所定の成形温度に予熱した金型のキャビティに充填し、次いで型締めした後、その状態で、所定の成形圧力で所定の成形時間だけ保持して一次熱架橋させる。この成形は、プレス成形であってもよく、また、射出成形であってもよい。成形温度は、例えば150℃以上180℃以下である。成形圧力は、例えば0.1MPa以上25MPa以下である。成形時間は、例えば3分以上20分以下である。 In the production of the seal material, first, a predetermined amount of the rubber material for a seal material according to the embodiment is filled in a cavity of a mold preheated to a predetermined molding temperature, and then clamped and then the predetermined molding is performed. The primary thermal crosslinking is performed by holding the pressure for a predetermined molding time. This molding may be press molding or may be injection molding. The molding temperature is, for example, 150 ° C. or more and 180 ° C. or less. The molding pressure is, for example, 0.1 MPa or more and 25 MPa or less. The molding time is, for example, 3 minutes or more and 20 minutes or less.
続いて、金型を型開きして成形品を取り出した後、それを、炉内を所定の加熱温度に予熱した加熱炉に入れ、その状態で、所定の加熱時間だけ保持して二次熱架橋させる。加熱温度は、例えば200℃以上300℃以下である。加熱時間は、例えば1時間以上48時間以下である。 Subsequently, after the mold is opened and the molded product is taken out, it is put into a heating furnace in which the inside of the furnace is preheated to a predetermined heating temperature, and in that state, secondary heat is maintained for a predetermined heating time. Crosslink. The heating temperature is, for example, 200 ° C. or more and 300 ° C. or less. The heating time is, for example, 1 hour or more and 48 hours or less.
そして、加熱炉から成形品を取り出した後、必要に応じて、それに対して放射線を照射して放射線架橋させる。放射線としては、例えば、α線、β線、γ線、電子線、イオン等が挙げられる。放射線は、これらのうちの電子線又はγ線を用いることが好ましい。放射線の照射線量は、耐プラズマ性を高める観点から、好ましくは10kGy以上100kGy以下、より好ましくは30kGy以上80kGy以下である。 Then, after taking out the molded product from the heating furnace, it is irradiated with radiation to crosslink it as necessary. Examples of radiation include α rays, β rays, γ rays, electron beams, ions and the like. As the radiation, it is preferable to use an electron beam or γ ray among them. The irradiation dose of radiation is preferably 10 kGy or more and 100 kGy or less, more preferably 30 kGy or more and 80 kGy or less, from the viewpoint of enhancing plasma resistance.
このようにして、実施形態に係るシール材用ゴム材料の架橋性フッ素ゴムが架橋したゴム組成物で形成されたシール材が得られる。 Thus, the sealing material formed of the rubber composition in which the crosslinkable fluororubber of the rubber material for a sealing material according to the embodiment is crosslinked is obtained.
シール材を形成するゴム組成物の体積抵抗率は、好ましくは1.0×1013Ω・cm以下、より好ましくは1.0×1012Ω・cm以下である。これらの表面抵抗率及び体積抵抗率は、JISK6271−1:2015に基づき測定されるものである。 The volume resistivity of the rubber composition forming the sealing material is preferably 1.0 × 10 13 Ω · cm or less, more preferably 1.0 × 10 12 Ω · cm or less. These surface resistivity and volume resistivity are measured based on JISK6271-1: 2015.
シール材を形成するゴム組成物の帯電性試験の半減期は、好ましくは2.0秒以下、より好ましくは1.0秒以下である。この帯電性試験の半減期は、JISL1094:2014に規定されるA法(半減期測定法)に準じて測定されるものである。 The half life of the chargeability test of the rubber composition forming the sealing material is preferably 2.0 seconds or less, more preferably 1.0 seconds or less. The half life of this chargeability test is measured according to method A (half life measurement method) defined in JIS L1094: 2014.
シール材を形成するゴム組成物の圧縮永久ひずみは、好ましくは30.0%以下である。この圧縮永久ひずみは、JISK6262:2013に基づき、試験時間72時間及び試験温度150℃として測定されるものである。 The compression set of the rubber composition forming the sealing material is preferably 30.0% or less. This compression set is measured as a test time of 72 hours and a test temperature of 150 ° C. based on JIS K6262: 2013.
(ゴム組成物)
以下の実施例1〜15並びに比較例1〜11のゴム組成物を作製した。それぞれの構成については表1〜4にも示す。
(Rubber composition)
The rubber compositions of Examples 1 to 15 and Comparative Examples 1 to 11 below were produced. The respective configurations are also shown in Tables 1 to 4.
<実施例1>
架橋性フッ素ゴムAパーオキサイド架橋用の三元系FKM(テクノフロンP459 SOLVAY社製)に、この架橋性フッ素ゴムA100質量部に対して、イオン液体Aの1-エチル-3-メチルイミダゾリウム・ビストリフルオロメタンスルホニルイミド(EMI-N111 三菱マテリアル社製)1.0質量部、架橋剤のパーオキサイドの2,5−ジメチル−2,5−ジ(t−ブチルパーオキシ)ヘキサン(パーヘキサ25B 日油社製)1.5質量部、及び架橋助剤のトリアリルイソシアヌレート(タイク 日本化成社製)4.0質量部を配合して混練した未架橋ゴム組成物を調製した。続いて、この未架橋ゴム組成物を、成形温度165℃、成形圧力5MPa、及び成形時間15分としてプレス成形して一次熱架橋させた後、加熱温度200℃及び加熱時間4時間で二次熱架橋させてシート状のゴム組成物を得た。そして、このシート状のゴム組成物に対して、照射線量30kGyのγ線を照射して放射線架橋させた。このγ線を照射して作製したシート状のゴム組成物を実施例1とした。
Example 1
Crosslinkable fluororubber A ternary system FKM for peroxide crosslinking (manufactured by TENFLON P459 SOLVAY), 1-ethyl-3-methylimidazolium of ionic liquid A with respect to 100 parts by mass of the crosslinkable fluororubber A. 1.0 parts by mass of bistrifluoromethanesulfonyl imide (EMI-N111 manufactured by Mitsubishi Materials Corporation), 2,5-dimethyl-2,5-di (t-butylperoxy) hexane (perhexa 25B peroxy) peroxydioxide crosslinking agent A non-crosslinked rubber composition was prepared by blending and kneading 1.5 parts by mass of Co., Ltd., and 4.0 parts by mass of triallyl isocyanurate (manufactured by Tyke Nippon Kasei Co., Ltd.) as a crosslinking aid. Subsequently, this uncrosslinked rubber composition is press-molded at a molding temperature of 165 ° C., a molding pressure of 5 MPa, and a molding time of 15 minutes for primary thermal crosslinking, and then the heating temperature of 200 ° C. and the heating time of 4 hours for the secondary heat. It was crosslinked to obtain a sheet-like rubber composition. Then, the sheet-like rubber composition was subjected to radiation crosslinking by being irradiated with γ-rays of an irradiation dose of 30 kGy. A sheet-like rubber composition produced by irradiating this γ-ray was referred to as Example 1.
<実施例2〜9>
イオン液体Aに代えて、それぞれイオン液体Bの1-エチル-3-メチルイミダゾリウム・ビストリフルオロブタンスルホニルイミド(EMI-N441 三菱マテリアル社製)、イオン液体Cの1-ブチル-3-メチルイミダゾリウム・ビストリフルオロメタンスルホニルイミド(BMI-N111 三菱マテリアル社製)、イオン液体Dの1-ブチル-3-メチルイミダゾリウム・ビストリフルオロブタンスルホニルイミド(BMI-N441 三菱マテリアル社製)、イオン液体Eの1-エチル-3-メチルイミダゾリウム・ビスフルオロスルホニルイミド(エレクセルAS−110 第一工業製薬社製)、イオン液体Fの1-エチル-3-メチルイミダゾリウム・ビストリフルオロメタンスルホニルイミド(エレクセルAS−210 第一工業製薬社製)、イオン液体Gの1-オクチル-4-メチルピリジウム・ビスフルオロスルホニルイミド(エレクセルAS−804 第一工業製薬社製)、イオン液体H(エレクセルMP−457 第一工業製薬社製)、及びイオン液体Iのトリブチルメチルアンモニウム・ビストリフルオロメタンスルホニルイミド(FC−4400 スリーエムジャパン社製)を用いたことを除いて、実施例1と同様の操作で作製したシート状のゴム組成物を実施例2〜9とした。
Examples 2 to 9
Instead of the ionic liquid A, 1-ethyl-3-methylimidazolium bistrifluorobutanesulfonylimide (EMI-N 441 manufactured by Mitsubishi Materials Corporation) of the ionic liquid B, 1-butyl-3-methylimidazolium of the ionic liquid C -Bis trifluoromethanesulfonyl imide (BMI-N111 manufactured by Mitsubishi Materials Corporation), 1-Butyl 3-methylimidazolium of ionic liquid D-Bistrifluorobutanesulfonylimide (BMI-N 441 manufactured by Mitsubishi Materials), 1 of ionic liquid E -Ethyl-3-methylimidazolium bisfluorosulfonyl imide (Eleccel AS-110, manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), 1-ethyl-3-methylimidazolium bistrifluoromethanesulfonylimide of ionic liquid F (Eleccel AS-210 Daiichi Kogyo Seiyaku Co., Ltd.), ionic liquid G 1-octyl-4-methylpyridinium bisfluorosulfonylimide (Eccel AS-804, manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), ionic liquid H (Echcel MP-457, manufactured by Daiichi Kogyo Pharmaceutical Co., Ltd.), and ionic liquid I The sheet-like rubber composition produced by the same operation as Example 1 was used as Examples 2-9 except having used tributyl methyl ammonium bis trifluoro methanesulfonyl imide (FC-4400 3M Japan company make). .
<実施例10〜13>
イオン液体Cの配合量を、架橋性フッ素ゴムA100質量部に対して、それぞれ0.1質量部、0.5質量部、1.5質量部、及び2.0質量部としたことを除いて、実施例3と同様の操作で作製したシート状のゴム組成物を実施例10〜13とした。
Examples 10 to 13
Except that the blending amount of the ionic liquid C is 0.1 parts by mass, 0.5 parts by mass, 1.5 parts by mass, and 2.0 parts by mass with respect to 100 parts by mass of the crosslinkable fluororubber A, respectively The sheet-like rubber composition produced by the same operation as Example 3 was set to Examples 10-13.
<比較例1>
イオン液体Aを配合していないことを除いて、実施例1と同様の操作で作製したシート状のゴム組成物を比較例1とした。
Comparative Example 1
A sheet-like rubber composition produced in the same manner as in Example 1 except that the ionic liquid A was not blended, was taken as Comparative Example 1.
<比較例2〜9>
イオン液体Aに代えて、架橋性フッ素ゴムA100質量部に対して、それぞれ高分子型帯電防止剤A(ペレスタットHC250 三洋化成工業社製)5.0質量部、高分子型帯電防止剤B(ペレクトロンPVL 三洋化成工業社製)5.0質量部、高分子型帯電防止剤C(ペバックスMV1074SP01 アルケマ社製)10質量部、高分子型帯電防止剤D(ペバックスMH2030 アルケマ社製)10質量部、高分子型帯電防止剤E(エンティラSD100 三井・デュポン・ポリケミカル社製)15質量部、高分子型帯電防止剤F(エンティラMK400 三井・デュポン・ポリケミカル社製)15質量部、及びLi塩含有帯電防止剤(サンコノールTBX−8310 三光化学工業社製)10質量部、Li塩含有帯電防止剤5.0質量部を用いたことを除いて、実施例1と同様の操作で作製したシート状のゴム組成物を比較例2〜9とした。
<Comparative Examples 2 to 9>
Polymeric Antistatic Agent A (Pelestat HC250 manufactured by Sanyo Chemical Industries, Ltd.) 5.0 parts by mass, Polymeric Antistatic Agent B (Perektron) in place of the ionic liquid A per 100 parts by mass of the crosslinkable fluororubber A 5.0 parts by weight of PVL Sanyo Chemical Industries, Ltd. 10 parts by weight of polymer type antistatic agent C (Pebax MV 1074 SP 01 manufactured by Arkema), 10 parts by weight of polymer type antistatic agent D (Pebax MH2030 Arkema) 15 parts by mass of molecular type antistatic agent E (Entila SD100 manufactured by Mitsui / Dupont Polychemicals Co., Ltd.), 15 parts by mass of polymer type antistatic agent F (Entila MK400 manufactured by Mitsui / Dupont Polychemicals Co., Ltd.) 10 parts by mass of an inhibitor (Sanconol TBX-8310 manufactured by Sanko Chemical Industry Co., Ltd.) and 5.0 parts by mass of a lithium salt-containing antistatic agent The sheet-like rubber composition produced by the same operation as Example 1 was set as Comparative Examples 2-9, except that.
<実施例14及び15>
架橋性フッ素ゴムBのパーオキサイド架橋用の三元系FKM(ダイエルG-912 ダイキン工業社製)に、この架橋性フッ素ゴムB100質量部に対して、イオン液体A5.0質量部、架橋剤のパーオキサイド1.5質量部、架橋助剤4.0質量部、及び粉状の無機充填材の疎水性シリカ(アエロジルR972 エボニック社製)10質量部を配合して混練した未架橋ゴム組成物を用いたことを除いて、実施例1と同様の操作で作製したシート状のゴム組成物を実施例14とした。また、イオン液体Aに代えて、イオン液体Cを用いたことを除いて、実施例14と同様の操作で作製したシート状のゴム組成物を実施例15とした。
Examples 14 and 15
In ternary system FKM (made by Daiel G-912 Daikin Industries, Ltd.) for peroxide crosslinking of crosslinkable fluororubber B, 5.0 parts by mass of ionic liquid A and 100 parts by mass of this crosslinkable fluororubber B as a crosslinking agent An uncrosslinked rubber composition prepared by blending and kneading 1.5 parts by mass of peroxide, 4.0 parts by mass of a cross-linking aid, and 10 parts by mass of hydrophobic silica (Aerosil R972 Evonik Co., Ltd.) of powdery inorganic filler A sheet-like rubber composition produced in the same manner as in Example 1 except for the use was made Example 14. A sheet-like rubber composition produced in the same manner as in Example 14 except that the ionic liquid C was used instead of the ionic liquid A, was taken as example 15.
<比較例11>
イオン液体Aを配合していないことを除いて、実施例14と同様の操作で作製したシート状のゴム組成物を比較例11とした。
Comparative Example 11
A sheet-like rubber composition produced in the same manner as in Example 14 except that the ionic liquid A was not blended, was taken as Comparative Example 11.
(試験・評価方法)
<表面抵抗率及び体積抵抗率>
実施例1〜15並びに比較例1〜11のそれぞれのゴム組成物について、JIS K6271:2008に基づいて体積抵抗率を測定した。そして、体積抵抗率については、1.0×1012Ω・cm以下のものをAA、1.0×1012Ω・cmを越えて1.0×1013Ω・cm以下のものをA、1.0×1013Ω・cmを越えるものをBと評価した。
(Test and evaluation method)
<Surface resistivity and volume resistivity>
The volume resistivity of each of the rubber compositions of Examples 1 to 15 and Comparative Examples 1 to 11 was measured based on JIS K 6271: 2008. And, as for volume resistivity, those having 1.0 × 10 12 Ω · cm or less are AA, those exceeding 1.0 × 10 12 Ω · cm and 1.0 × 10 13 Ω · cm or less are A, Those exceeding 1.0 × 10 13 Ω · cm were evaluated as B.
<帯電性試験>
実施例1〜8及び10〜15並びに比較例1〜2、4、8〜9、及び11のそれぞれのゴム組成物について、JISL1094:2014に規定されるA法(半減期測定法)に準じて帯電性試験を行って半減期を測定した。そして、半減期について、1.0秒以下のものをAA、1.0秒を越えて2.0秒以下のものをA、2.0秒を越えるものをBと評価した。
<Chargeability test>
The rubber compositions of Examples 1 to 8 and 10 to 15 and Comparative Examples 1 to 2, 4, 8 to 9, and 11 are each measured according to method A (half-life measurement method) defined in JIS L 1094: 2014. The chargeability test was conducted to determine the half life. With regard to the half life, those with 1.0 seconds or less were evaluated as AA, those with 1.0 seconds or more but 2.0 seconds or less as A, and those with 2.0 seconds or more as B.
<圧縮永久ひずみ>
実施例1〜13並びに比較例1〜5及び8〜9のそれぞれについて、JIS K6262:2013に基づき、試験時間72時間及び試験温度150℃として圧縮永久ひずみの測定を行った。そして、圧縮永久ひずみについて、30.0%以下のものをA、30.0%を越えるものをBと評価した。
<Compression set>
For each of Examples 1 to 13 and Comparative Examples 1 to 5 and 8 to 9, the compression set was measured at a test time of 72 hours and a test temperature of 150 ° C. based on JIS K6262: 2013. Then, with respect to compression set, those with 30.0% or less were evaluated as A, and those with more than 30.0% were evaluated as B.
(試験結果)
試験結果を表1〜4に示す。これらの結果によれば、架橋性フッ素ゴムにイオン液体を配合すれば、粉状乃至粒状の帯電防止剤を用いなくても、圧縮永久ひずみを損なわずに帯電防止を図ることができることが分かる。また、優れた識別性を得ることもできる。
(Test results)
The test results are shown in Tables 1 to 4. According to these results, it can be seen that if the ionic liquid is blended with the crosslinkable fluororubber, antistatic can be achieved without losing the compression set, even without using powdery or granular antistatic agents. In addition, excellent discrimination can be obtained.
本発明は、シール材用ゴム材料及びそれを用いたシール材の技術分野について有用である。 The present invention is useful in the technical fields of rubber materials for sealing materials and sealing materials using the same.
Claims (5)
前記イオン液体のカチオン成分が、イミダゾリウム系カチオン、ピリジニウム系カチオン、又は脂肪族アミン系カチオンを含むシール材用ゴム材料。 In the rubber material for a sealing material according to claim 1,
The rubber material for sealing materials, wherein the cationic component of the ionic liquid contains an imidazolium-based cation, a pyridinium-based cation, or an aliphatic amine-based cation.
前記イオン液体のアニオン成分がビスフルオロスルホニルイミド系アニオンを含むシール材用ゴム材料。 The rubber material for a sealing material according to claim 1 or 2
The rubber material for sealing materials, wherein the anion component of the ionic liquid contains bisfluorosulfonyl imide type anion.
前記イオン液体の含有量が、前記架橋性フッ素ゴム100質量部に対して0.01質量部以上10質量部以下であるシール材用ゴム材料。 In the rubber material for a sealing material according to any one of claims 1 to 3,
The rubber material for sealing materials whose content of the said ionic liquid is 0.01 mass part or more and 10 mass parts or less with respect to 100 mass parts of said crosslinkable fluororubber.
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