JP2017203885A5 - - Google Patents
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- JP2017203885A5 JP2017203885A5 JP2016095683A JP2016095683A JP2017203885A5 JP 2017203885 A5 JP2017203885 A5 JP 2017203885A5 JP 2016095683 A JP2016095683 A JP 2016095683A JP 2016095683 A JP2016095683 A JP 2016095683A JP 2017203885 A5 JP2017203885 A5 JP 2017203885A5
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016095683A JP6631397B2 (en) | 2016-05-11 | 2016-05-11 | Radiation-sensitive resin composition, method for forming resist pattern, method for producing acid diffusion controller, and method for producing radiation-sensitive resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016095683A JP6631397B2 (en) | 2016-05-11 | 2016-05-11 | Radiation-sensitive resin composition, method for forming resist pattern, method for producing acid diffusion controller, and method for producing radiation-sensitive resin composition |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019214649A Division JP6882703B2 (en) | 2019-11-27 | 2019-11-27 | Acid diffusion control agents and compounds |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017203885A JP2017203885A (en) | 2017-11-16 |
| JP2017203885A5 true JP2017203885A5 (en) | 2018-11-29 |
| JP6631397B2 JP6631397B2 (en) | 2020-01-15 |
Family
ID=60322275
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016095683A Active JP6631397B2 (en) | 2016-05-11 | 2016-05-11 | Radiation-sensitive resin composition, method for forming resist pattern, method for producing acid diffusion controller, and method for producing radiation-sensitive resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6631397B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6910838B2 (en) * | 2016-05-13 | 2021-07-28 | 住友化学株式会社 | Method for Producing Salt, Resist Composition and Resist Pattern |
| JP7202780B2 (en) * | 2017-02-20 | 2023-01-12 | 住友化学株式会社 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern |
| JP7245583B2 (en) * | 2018-05-09 | 2023-03-24 | 住友化学株式会社 | RESIST COMPOSITION AND RESIST PATTERN MANUFACTURING METHOD |
| WO2021002212A1 (en) * | 2019-07-01 | 2021-01-07 | 株式会社ダイセル | Photoresist resin, method for producing photoresist resin, photoresist resin composition, and method for forming pattern |
| JP7527149B2 (en) | 2019-08-08 | 2024-08-02 | 住友化学株式会社 | Resist composition and method for producing resist pattern |
| WO2021039331A1 (en) * | 2019-08-29 | 2021-03-04 | Jsr株式会社 | Radiation-sensitive resin composition, and method for forming resist pattern |
| JP2021103234A (en) * | 2019-12-25 | 2021-07-15 | 東京応化工業株式会社 | Resist composition and resist pattern forming method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6326825B2 (en) * | 2013-02-18 | 2018-05-23 | 住友化学株式会社 | Salt, resist composition and method for producing resist pattern |
| JP5904180B2 (en) * | 2013-09-11 | 2016-04-13 | 信越化学工業株式会社 | Sulfonium salt, chemically amplified resist composition, and pattern forming method |
| JP6010564B2 (en) * | 2014-01-10 | 2016-10-19 | 信越化学工業株式会社 | Chemically amplified negative resist composition and pattern forming method |
| JP6062878B2 (en) * | 2014-03-07 | 2017-01-18 | 信越化学工業株式会社 | Chemically amplified positive resist composition and resist pattern forming method |
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2016
- 2016-05-11 JP JP2016095683A patent/JP6631397B2/en active Active